CN103197470B - The manufacture method of photoelectric subassembly - Google Patents
The manufacture method of photoelectric subassembly Download PDFInfo
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- CN103197470B CN103197470B CN201310076711.2A CN201310076711A CN103197470B CN 103197470 B CN103197470 B CN 103197470B CN 201310076711 A CN201310076711 A CN 201310076711A CN 103197470 B CN103197470 B CN 103197470B
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Abstract
A manufacture method for photoelectric subassembly, comprises the following steps.Two substrates are provided and comprise the potpourri of optics aeolotropic material, filmogen, alignment materials and light initiator.Insert potpourri between the substrates.Filmogen and alignment materials is made to be formed into rete and both alignment layers respectively on substrate.Both alignment layers and film forming layer are between optics aeolotropic material and substrate.Film forming layer is between both alignment layers and substrate.In addition, the manufacture method of another two kinds of photoelectric subassemblys is also suggested.
Description
Technical field
The invention relates to a kind of manufacture method of photoelectric subassembly.
Background technology
Generally speaking, photoelectric subassembly (such as liquid crystal display etc.) forms both alignment layers by the technology of friction matching.In friction matching technology, need first alignment liquid to be coated on the substrate of photoelectric subassembly, and then solidify alignment liquid, to form accurate both alignment layers.Afterwards, recycling flannelette rubs accurate both alignment layers, and forms both alignment layers.But, because the substrate surface of photoelectric subassembly is not necessarily smooth, therefore the accurate both alignment layers that flannelette friction is configured at substrate surface easily causes the bad of both alignment layers, and then makes the orientation situation of optics aeolotropic material (such as liquid crystal etc.) in photoelectric subassembly undesirable.Due to the shortcoming of friction matching technology, someone have developed light alignment technique, although light alignment technique can solve the problem of friction matching technology, the alignment liquid that light alignment technique uses is expensive, and makes the photoelectric subassembly high cost that utilizes light alignment technique to manufacture.
Summary of the invention
In view of this, the invention provides a kind of manufacture method of photoelectric subassembly, the photoelectric subassembly cost manufactured by it is low and quality is good.
The photoelectric subassembly manufacture method of one embodiment of the invention comprises the following steps.Two substrates are provided and comprise the potpourri of optics aeolotropic material, filmogen, alignment materials and light initiator.Insert potpourri between the substrates.Filmogen and alignment materials is made to be formed into rete and both alignment layers respectively on substrate.Both alignment layers and film forming layer are between optics aeolotropic material and substrate.Film forming layer is between both alignment layers and substrate.In one embodiment of this invention, two above-mentioned substrates comprise relative first substrate and second substrate.The method making alignment materials form both alignment layers on two substrates comprises the following steps.There is provided the first polar biased light and the second polar biased light, wherein the first polar biased light transmits along by the direction of first substrate to second substrate, and the second polar biased light transmits along by the direction of second substrate to first substrate.Make the first polar biased light and the second polar biased light irradiate alignment materials simultaneously.
In one embodiment of this invention, the above-mentioned method making alignment materials form both alignment layers on substrate comprises the following steps.Polar biased light is provided.Making in the phase retardation quality entity of optics aeolotropic material on polar biased light direction of transfer is zero.When being zero in the phase retardation quality entity of optics aeolotropic material on polar biased light direction of transfer, polar biased illumination is made to penetrate alignment materials.
In one embodiment of this invention, above-mentioned make in the phase retardation quality entity of optics aeolotropic material on polar biased light direction of transfer be zero method comprise the following steps.Voltage is applied to multiple optics aeolotropic molecules of optics aeolotropic material substantial parallel with the direction of transfer of the optical axis and polar biased light that make each optics aeolotropic molecule, or heat optical aeolotropic material is with the clear point making the temperature of optics aeolotropic material be more than or equal to optics aeolotropic material.
In one embodiment of this invention, above-mentioned filmogen is self assembly type macromolecular material.The method making filmogen be formed into rete on substrate comprises: make filmogen naturally with substrate bond.
In one embodiment of this invention, the above-mentioned method making filmogen be formed into rete on substrate comprises: be heated into membrane material, or makes light beam irradiation filmogen.
In one embodiment of this invention, the above-mentioned method making filmogen and alignment materials be formed into rete and both alignment layers respectively on substrate comprises: provide polar biased light; And make polar biased light irradiate filmogen and alignment materials simultaneously, wherein under polar biased illumination is penetrated, the polymerization rate of filmogen is greater than in fact the polymerization rate of alignment materials.
In one embodiment of this invention, the absorbing wavelength scope of above-mentioned filmogen is different from the absorbing wavelength scope of alignment film material.The method making filmogen and alignment materials be formed into rete and both alignment layers respectively on substrate comprises the following steps.There is provided polar biased light and light beam, wherein the wave spread of polar biased light is different with the wave spread of light beam.Make light beam irradiation filmogen, be formed into rete to make filmogen absorb light beam.Make polar biased illumination penetrate alignment materials, form orientation rete to make alignment materials absorb polar biased light.
In one embodiment of this invention, above-mentioned filmogen is expressed as following chemical formula (1),
---(1), wherein X is silicon or zinc, R
1for halogen, amino, acrylate-based or oxyalkyl group, and oxyalkyl group can be straight chain type or branched chain type, R
2comprise hydrogen, alkyl, halogen and cyano group, m is more than or equal to 1, a and b is more than or equal to 0.Filmogen weight percent concentration is in the mixture greater than 0% and is less than or equal to 15%.
In one embodiment of this invention, above-mentioned alignment materials is expressed as following chemical formula (2),
---(2), wherein R
3comprise alkyl, halogen and itrile group, Y is expressed as following chemical formula (3),
---(3), wherein Z is acrylate-based, itrile group or methyl, and n is more than or equal to 1.Alignment materials weight percent concentration is in the mixture more than or equal to 0.1% and is less than or equal to 15%.
The photoelectric subassembly manufacture method of another embodiment of the present invention comprises the following steps.Relative first substrate and second substrate and potpourri are provided.Potpourri comprises optics aeolotropic material and alignment materials.Potpourri is inserted between first substrate and second substrate.There is provided the first polar biased light and the second polar biased light, wherein the first polar biased light transmits along by the direction of first substrate to second substrate, and the second polar biased light transmits along by the direction of second substrate to first substrate.Make the first polar biased light and the second polar biased light irradiate potpourri simultaneously, on first substrate and second substrate, form both alignment layers to make alignment materials.
In one embodiment of this invention, above-mentioned potpourri also comprises filmogen.Filmogen is self assembly type macromolecular material.The manufacture method of photoelectric subassembly also comprises: make self assembly type macromolecular material naturally on first substrate and second substrate, be formed into rete with first substrate and second substrate bond, wherein both alignment layers and film forming layer are between optics aeolotropic material and first substrate and second substrate, and film forming layer is between both alignment layers and first substrate and second substrate.
In one embodiment of this invention, the manufacture method of above-mentioned photoelectric subassembly also comprises: be heated into membrane material, is formed into rete to make filmogen on first substrate and second substrate.
In one embodiment of this invention, above-mentioned potpourri also comprises filmogen.First polar biased light and the second polar biased light irradiate alignment materials and filmogen simultaneously, on first substrate and second substrate, rete is formed into make filmogen, wherein under the first polar biased light and the second polar biased illumination are penetrated, the polymerization rate of filmogen is greater than in fact the polymerization rate of alignment materials.
In one embodiment of this invention, the absorbing wavelength scope of above-mentioned filmogen is different from the absorbing wavelength scope of alignment film material, and the manufacture method of photoelectric subassembly also comprises the following steps.There is provided light beam, wherein the wave spread of light beam is different from the wave spread of the wave spread of the first polar biased light and the second polar biased light.Make light beam irradiation filmogen, be formed into rete to make filmogen absorb light beam.
The manufacture method of the photoelectric subassembly of another embodiment of the present invention, comprises the following steps.Two substrates and potpourri are provided.Potpourri comprises optics aeolotropic material and alignment materials.Insert potpourri between the substrates.Polar biased light is provided.Making in the phase retardation quality entity of optics aeolotropic material on polar biased light direction of transfer is zero.When being zero in the phase retardation quality entity of optics aeolotropic material on polar biased light direction of transfer, making polar biased illumination penetrate alignment materials, on substrate, form both alignment layers to make alignment materials.
In one embodiment of this invention, above-mentioned make in the phase retardation quality entity of optics aeolotropic material on polar biased light direction of transfer be zero method comprise: voltages are applied to multiple optics aeolotropic molecules of optics aeolotropic material substantial parallel with the direction of transfer of the optical axis and polar biased light that make each optics aeolotropic molecule, or heat optical aeolotropic material is with the clear point making the temperature of optics aeolotropic material be more than or equal to optics aeolotropic material.
In one embodiment of this invention, above-mentioned potpourri also comprises filmogen.Filmogen is self assembly type macromolecular material.The manufacture method of photoelectric subassembly also comprises: make self assembly type macromolecular material naturally on substrate, be formed into rete with substrate bond.
In one embodiment of this invention, above-mentioned photoelectric subassembly manufacture method also comprises: be heated into membrane material and on substrate, be formed into rete to make filmogen.
In one embodiment of this invention, above-mentioned polar biased light irradiates alignment materials and filmogen simultaneously, to make filmogen be formed into rete on substrate, wherein under polar biased illumination is penetrated, the polymerization rate of filmogen is greater than in fact the polymerization rate of alignment materials.
In one embodiment of this invention, the absorbing wavelength model of above-mentioned filmogen
Enclose different from the absorbing wavelength scope of alignment film material.The manufacture method of photoelectric subassembly also comprises the following steps.There is provided light beam, wherein the wave spread of polar biased light is different with the wave spread of light beam.Make light beam irradiation filmogen, be formed into rete to make filmogen absorb light beam.
Based on above-mentioned, in the manufacture method of the photoelectric subassembly of one embodiment of the invention, utilize the potpourri comprising optics aeolotropic material and alignment materials to form both alignment layers, and do not need to use traditional alignment liquid to form both alignment layers.Therefore, compared to known friction matching technology, the manufacture method of the photoelectric subassembly of one embodiment of the invention can save the step of coating alignment liquid and friction matching, and avoid because of friction matching cause bad, and then improve the yield of photoelectric subassembly.In addition, manufacture method due to the photoelectric subassembly of one embodiment of the invention does not need to use known alignment liquid, therefore compared to known friction matching technology and light orientation, also there is with the photoelectric subassembly manufactured by the manufacture method of the photoelectric subassembly of one embodiment of the invention the competitive edge of low cost.
For above-mentioned feature and advantage of the present invention can be become apparent, special embodiment below, and coordinate institute's accompanying drawings to be described in detail below.
Accompanying drawing explanation
Figure 1A to Fig. 1 F is the schematic flow sheet of the photoelectric subassembly manufacture method of one embodiment of the invention.
Fig. 2 illustrates that another embodiment of the present invention is formed into the method for rete.
Fig. 3 illustrates that further embodiment of this invention is formed into the method for rete.
Fig. 4 illustrates that another embodiment of the present invention forms the method for both alignment layers.
Fig. 5 illustrates that further embodiment of this invention forms the method for both alignment layers.
Fig. 6 A to Fig. 6 B illustrates the method being formed into rete and both alignment layers of another embodiment of the present invention.
Fig. 7 A to Fig. 7 B illustrates the method being formed into rete and both alignment layers of further embodiment of this invention.
[primary clustering symbol description]
100: photoelectric subassembly
110: potpourri
112: optics aeolotropic material
112a: optics aeolotropic molecule
114: alignment materials
116: filmogen
120,130: substrate
122,132: substrate
124,134: rete
140: film forming layer
150: both alignment layers
200: heating plate
A: optical axis
L, L3: light beam
L1, L2, L4: polar biased light
V: voltage source
Embodiment
Figure 1A to Fig. 1 F is the schematic flow sheet of the photoelectric subassembly manufacture method of one embodiment of the invention.Please refer to Figure 1A and Figure 1B, first, provide potpourri 110(to be plotted in Figure 1A) and two substrates 120,130(be plotted in Figure 1B).Potpourri 110 comprises optics aeolotropic material 112 and alignment materials 114.In the present embodiment, potpourri 110 optionally comprises filmogen 116.Potpourri 110 also can comprise light initiator (not illustrating).Optics aeolotropic material 112 comprises multiple optics aeolotropic molecule 1 12a.In the present embodiment, optics aeolotropic material 112 is such as liquid crystal material, and optics aeolotropic molecule 1 12a is such as liquid crystal molecule.But the present invention is not limited thereto, in other embodiments, optics aeolotropic material 112 also can be the material that other kind has optics aeolotropic (anisotropic).
In the present embodiment, substrate 120 comprises substrate 122 and is configured at the rete 124 in substrate 122, and substrate 130 comprises substrate 132 and be configured at the rete 134 in substrate 132.Furthermore, if be color monitor for the photoelectric subassembly manufactured, the rete 124 in substrate 122 is such as pel array layer, and the rete 134 in substrate 132 is such as chromatic filter layer.But the present invention is not limited thereto, the pattern of substrate 120,130 is determined by the photoelectric subassembly kind for manufacturing.For example, if the photoelectric subassembly for manufacturing is the glasses for viewing and admiring three-dimensional display, substrate 122,132 can be light-transparent substrate, and rete 124,134 can be transparency conducting film (such as indium tin oxide film).
Please refer to Figure 1B, then, between two substrates 120,130, insert potpourri 110.For example, in the present embodiment, potpourri 110 is inserted between two substrates 120,130 by vacuum available injection method.But, the present invention is not limited thereto, in other embodiments, the formula of dripping also can be adopted to insert (One drop Fill, ODF) method or potpourri 110 is inserted between two substrates 120,130 by other proper method.
Please refer to Fig. 1 C and Fig. 1 D, then, in the present embodiment, optionally make filmogen 116 be formed into rete 140 on substrate 120,130.Filmogen 116 can be self assembly (self alignment) type macromolecular material, and filmogen 116 can be formed into rete 140 with substrate 120,130 bond naturally on substrate 120,130.In detail, the side chain radical of self assembly type macromolecular material can react with the hydroxy on rete 124,134 surface of substrate 120,130, and produces bond with rete 124,134, and then is formed into rete 140 on the surface at rete 124,134.Filmogen 116 can be expressed as following chemical formula (1),
---(1), wherein X can be silicon (Si), zinc (Zn) etc., R
1can be halogen, amino, acrylate-based or oxyalkyl group (oxyalkyl group can be straight chain type or branched chain type) etc., R
2can comprise hydrogen, alkyl, halogen and cyano group, m is more than or equal to 1, and a and b is more than or equal to 0.The percentage by weight of filmogen 116 in potpourri 110 (percent byweight) concentration can be greater than 0% and be less than or equal to 15%.But the present invention is not as limit, the chemical constitution of filmogen 116 and the demand of all visual actual processing procedure of the weight percent concentration of filmogen 116 in potpourri 110 adjust.
It should be noted that orientation molecule 1 14 can pass through film forming layer 140 and form more firm both alignment layers on substrate 120,130.It should be noted that, in other example, if orientation molecule 1 14 directly can form firm both alignment layers on substrate 120,130, then can omit filmogen 116(in potpourri 110 and the weight percent concentration of filmogen 116 in potpourri 110 can equal 0%), and also can omit the step being formed into rete 140 in photoelectric subassembly manufacture method flow process.
The method being formed into rete 140 is not limited to above-mentioned, in other embodiments, other suitable method also can be adopted to be formed into rete 140, below coordinates illustrated exemplary to illustrate.Fig. 2 illustrates that another embodiment of the present invention is formed into the method for rete.Please refer to Fig. 2, in this embodiment, filmogen 116 can be thermosetting macromolecule material.The method making filmogen 116 be formed into rete 140 on substrate 120,130 can be: be heated into membrane material 116, and is formed into rete 140(and is plotted in Fig. 1 D).Specifically, substrate 120,130 and the potpourri 110 inserted between substrate 120,130 can be placed on heating plate 200 together.Now, as shown in Figure 2, thermosetting macromolecule material can be heated and react with substrate 120,130, and starts to be deposited on substrate 120,130 surface.After heating one section of reasonable time, as shown in figure ip, thermosetting macromolecule material just can be formed into rete 140.In this embodiment, the temperature and time being heated into membrane material 116 is determined by the characteristic of filmogen 116.For example, the temperature being heated into membrane material 116 can between 40 ° of C-500 ° of C.In addition, the time being heated into membrane material 116 also can consider the distance between substrate 120,130.
Fig. 3 illustrates that further embodiment of this invention is formed into the method for rete.Please refer to Fig. 3, in this embodiment, filmogen 116 can be light curable type macromolecular material.The method making filmogen 116 be formed into rete 140 on substrate 120,130 can be: make light beam l irradiate filmogen 116, and be formed into rete 140(and be plotted in Fig. 1 D).In this embodiment, light beam l can be linear polar biased light, but the present invention is not limited thereto, and in other embodiments, light beam l can be non-polarization light.In this embodiment, light beam l can transmit along substrate 120 to the direction of substrate 130, and first exposes to filmogen 116 again through after substrate 120.In other words, light beam l can expose to filmogen 116 through substrate 120.The wave spread of light beam l little through change after substrate 120, and makes filmogen 116 receive to have the light beam l of suitable Wavelength distribution, and then makes the quality of forming film of film forming layer 140 good.The characteristic of the irradiation time visible light curable type macromolecular material of the wavelength of light beam l, the exposure intensity of light beam l and light beam l and determining.The irradiation time of the wavelength of light beam l, the exposure intensity of light beam l and light beam l also can be considered the absorption spectrum between substrate 120,130 and the distance between substrate 120,130 and determine.For example, the wavelength of light beam l can how rice (nm) be to 400 how rice (nm) 200, and the exposure intensity of light beam l can be more than or equal to 5 millijoule every square centimeter of (mj/cm
2).
Please refer to Fig. 1 E and Fig. 1 F, then, make alignment materials 114 form both alignment layers 150(on substrate 120,130 and be plotted in Fig. 1 F).In the present embodiment, alignment materials 114 can be light curable type macromolecular material.Alignment materials 114 can be expressed as following chemical formula (2),
---(2), wherein R
3comprise alkyl, halogen and itrile group, Y represents and can be following chemical formula (3),
---(3), wherein Z comprises acrylate-based, itrile group or methyl, and n is more than or equal to 1.The weight percent concentration of alignment materials 114 in potpourri 110 can be more than or equal to 0.1% and be less than or equal to 15%.But the present invention is not as limit, the chemical constitution of alignment materials 114 and the demand of all visual actual processing procedure of the weight percent concentration of alignment materials 114 in potpourri 110 adjust.
In the present embodiment, the method making alignment materials 114 form both alignment layers 150 on substrate 120,130 can comprise the following steps.As referring to figure 1e, first, provide polar biased light L1 and polar biased light L2, wherein polar biased light L1 transmits along by the direction of substrate 120 to substrate 130, and polar biased light L2 transmits along by the direction of substrate 130 to substrate 120.Then, make polar biased light L1 and polar biased light L2 irradiate alignment materials 114 simultaneously, be plotted in Fig. 1 F to form both alignment layers 150(on substrate 120,130).As shown in fig. 1f, after both alignment layers 150 is formed, optics aeolotropic material 112, just as one man can arrange according to set alignment direction, and then complete the photoelectric subassembly 100 of the present embodiment.In photoelectric subassembly 100, both alignment layers 150 and film forming layer 140 are between optics aeolotropic material 112 and substrate 120,130, and film forming layer 140 is between both alignment layers 150 and substrate 120,130.It is worth mentioning that, in the present embodiment, because polar biased light L1, L2 irradiate alignment materials 114 from side, substrate 120,130 place two respectively simultaneously, therefore the alignment materials 114 near substrate 120,130 surface all can be subject to uniform polar biased light L1, L2 and irradiate, and makes the quality of forming film of both alignment layers 150 good.
In the present embodiment, polar biased light L1, L2 can be linear polar biased light.The polar biased direction of linear polar biased light is determined by the alignment direction for being formed.The polar biased direction of linear polar biased light can be parallel or vertical with formed alignment direction.For example, if for manufacture photoelectric subassembly be twisted nematic (twisted nematic, TN) type liquid crystal display, then the polar biased direction of polar biased light L1, L2 can be orthogonal in fact.If for manufacture photoelectric subassembly be electrically conerolled birefringence (electrically controlled birefringence, ECB) type, transverse electric field drive (In-PlaneSwitching, IPS) type or fringe field drive (fringe field switching, FFS) type liquid crystal display, then the polar biased direction of polar biased light L1, L2 can be parallel to each other in fact.In addition, the irradiation time of the wavelength of polar biased light L1, L2, the exposure intensity of polar biased light L1, L2 and polar biased light L1, L2 is determined by the characteristic of alignment materials 114.The irradiation time of the wavelength of polar biased light L1, L2, the exposure intensity of polar biased light L1, L2 and polar biased light L1, L2 also can consider the absorption spectrum between substrate 120,130 and the distance between substrate 120,130.For example, the wavelength of polar biased light L1, L2 can how rice (nm) be to 400 how rice (nm) 200, and the exposure intensity of polar biased light L1, L2 can be more than or equal to 5 millijoule every square centimeter of (mj/cm
2).
The method forming both alignment layers 150 is not limited to above-mentioned, in other embodiments, other suitable method also can be adopted to form the second best in quality both alignment layers 150.For example, in other embodiments, polar biased light can be provided, and make the phase retardation amount (retardation) of optics aeolotropic material on described polar biased light direction of transfer be essentially zero.Further, when being zero in the phase retardation quality entity of optics aeolotropic material on described polar biased light direction of transfer, this polar biased illumination is made to penetrate alignment materials, to form both alignment layers.Diagram is below coordinated to illustrate.
Fig. 4 illustrates that another embodiment of the present invention forms the method for both alignment layers.Please refer to Fig. 4, in this embodiment, the method forming both alignment layers comprises the following steps.There is provided polar biased light L1, polar biased light L1 can be linear polar biased light.The phase retardation amount (retardation) of optics aeolotropic material 112 on described polar biased light L1 direction of transfer is made to be essentially zero.Specifically, voltage can be applied to multiple optics aeolotropic molecule 1 12a of optics aeolotropic material 112 substantial parallel with the direction of transfer of the optical axis A and polar biased light L1 that make each optics aeolotropic molecule 1 12a.Then,
The optical axis A of each optics aeolotropic molecule 1 12a and the direction of transfer of polar biased light L1 substantial parallel time, make polar biased light L1 irradiate alignment materials 114, be plotted in Fig. 1 F to form both alignment layers 150().As shown in fig. 1f, after both alignment layers 150 is formed, remove voltage source V, optics aeolotropic material 112 just can along the alignment direction arrangement of setting.
It is worth mentioning that, in the diagram, because the optical axis A of each optics aeolotropic molecule 1 12a during polar biased light L1 irradiation alignment materials 114 and the direction of transfer of polar biased light L1 are substantial parallel, therefore the polarization direction of polar biased light L1 is not vulnerable to the impact of optics aeolotropic material 112, and makes all alignment materials 114 all can experience the polar biased light L1 of same polarization direction.So, alignment materials 114 just can form the second best in quality both alignment layers 150 on substrate 120,130, and then the orientation making optics aeolotropic material 112 in order.
Fig. 5 illustrates that further embodiment of this invention forms the method for both alignment layers.Please refer to Fig. 5, in this embodiment, the method forming both alignment layers comprises the following steps.Polar biased light L1 is provided.Making in the phase retardation quality entity of optics aeolotropic material 112 on described polar biased light L1 direction of transfer is zero.In detail, can heat optical aeolotropic material 112 with the clear point making the temperature of optics aeolotropic material 112 be more than or equal to optics aeolotropic material 112.When the temperature of optics aeolotropic material 112 is more than or equal to the clear point of optics aeolotropic material 112, optics aeolotropic material 112 changes optics isotropy (isotropic) material into.Then, when optics aeolotropic material 112 changes optics isotropy material into, make polar biased light L1 irradiate alignment materials 114, be plotted in Fig. 1 F to form both alignment layers 150().As shown in fig. 1f, after both alignment layers 150 is formed, the temperature of optics aeolotropic material 112 can be made lower than the clear point of optics aeolotropic material 112, now, optics aeolotropic material 112 just can along the alignment direction arrangement of setting.
In Figure 5, during due to polar biased light L1 irradiation alignment materials 114, optics aeolotropic material 112 has changed optics isotropy material into, therefore the polarization direction of polar biased light L1 is not vulnerable to the impact of optics aeolotropic material 112, and makes all alignment materials 114 all can experience the polar biased light L1 of same polarization direction.So, alignment materials 114 just can form the second best in quality both alignment layers 150 on substrate 120,130, and then the orientation making optics aeolotropic material 112 in order.
In the present embodiment, be self assembly type macromolecular material and alignment materials 114 is light curable type materials illustrates for filmogen 116, in other embodiments, filmogen 116 and alignment materials 114 also can be all light curable type material.Diagram is below coordinated to describe in detail when filmogen 116 and alignment materials 114 are all light curable type material, the generation type of film forming layer 140 and both alignment layers 150.Fig. 6 A to Fig. 6 B illustrates the method being formed into rete and both alignment layers of another embodiment of the present invention.Please refer to Fig. 6 A and Fig. 6 B, polar biased light L1 is provided, and make polar biased light L1 irradiate filmogen 116 and alignment materials 114 simultaneously, to be formed into rete 140 and both alignment layers 150.Polar biased light L1 can be linear polar biased light.It should be noted that, in this embodiment, under polar biased light L1 irradiates, the polymerization rate of filmogen can be greater than in fact the polymerization rate of alignment materials 114, to make filmogen 116 first be formed into rete 140 before both alignment layers 150 is fully formed, and make alignment materials 114 can pass through film forming layer 140 to form firm both alignment layers 150 on substrate 120,130.In addition, in this embodiment, in time irradiating filmogen 116 and alignment materials 114, also can apply the method that the minimizing optics aeolotropic material 112 corresponding with Fig. 1 E, Fig. 4, Fig. 5 affects polar biased light L1, to make the one-tenth film quality of film forming layer 140 and both alignment layers 150 better simultaneously.Relevant explanation please refer to the paragraph corresponding with Fig. 1 E, Fig. 4, Fig. 5, just no longer repeats in this.
Fig. 7 A to Fig. 7 B illustrates the method being formed into rete and both alignment layers of further embodiment of this invention.When filmogen 116 and alignment materials 114 are all light curable type material and the absorbing wavelength scope of filmogen 116 and alignment materials 114 is different, as shown in Figure 7 A, can first not illustrate to have filmogen 116(Fig. 7 A) the light beam L3(light beam L3 of absorbing wavelength scope can be non-polarization light or polar biased light) irradiate filmogen 116, be formed into rete 140 to make filmogen 116.Then, as shown in Figure 7 B, then Fig. 7 A is plotted in have alignment materials 114() the polar biased light L4(such as line polar biased light of absorbing wavelength scope) irradiate alignment materials 114, form both alignment layers 150 to make alignment materials 114.In this embodiment, when irradiating alignment materials 114, also can apply the method that the minimizing optics aeolotropic material 112 corresponding with Fig. 1 E, Fig. 4, Fig. 5 affects polar biased light L1, to make the one-tenth film quality of film forming layer 140 and both alignment layers 150 better simultaneously.Relevant explanation please refer to the paragraph corresponding with Fig. 1 E, Fig. 4, Fig. 5, also no longer repeats in this.
In sum, in the manufacture method of the photoelectric subassembly of one embodiment of the invention, utilize the potpourri comprising optics aeolotropic material and alignment materials to form both alignment layers, and do not need to use traditional alignment liquid to form both alignment layers.Therefore, compared to known friction matching technology, the manufacture method of the photoelectric subassembly of one embodiment of the invention can save the step of coating alignment liquid and friction matching, and avoid because of friction matching cause bad, and then improve the yield of photoelectric subassembly.In addition, manufacture method due to the photoelectric subassembly of one embodiment of the invention does not need to use known alignment liquid, therefore compared to known friction matching technology and light orientation, also there is with the photoelectric subassembly manufactured by the manufacture method of the photoelectric subassembly of one embodiment of the invention the competitive edge of low cost.
In addition, in the manufacture method of the photoelectric subassembly of another embodiment of the present invention, polar biased only irradiates alignment materials from two sides, substrate place two respectively simultaneously, therefore all can be subject to uniform polar biased illumination near the alignment materials of two substrate surfaces and penetrate, and make the quality of both alignment layers good.
Moreover, in the manufacture method of the photoelectric subassembly of one embodiment of the invention, when penetrating alignment materials with polar biased illumination, the phase retardation quality entity of order optics aeolotropic material on this polar biased light direction of transfer is zero simultaneously.Thus, this polar biased polarisation of light direction is not just vulnerable to the impact of optics aeolotropic material, and makes all alignment materials all can experience the polar biased light of same polarization direction, and then the both alignment layers that alignment materials is formed has good orientation ability.
Claims (19)
1. a manufacture method for photoelectric subassembly, comprising:
There is provided two substrates and a potpourri, this potpourri comprises an optics aeolotropic material, a filmogen, an alignment materials and a smooth initiator;
This potpourri is inserted between those substrates; And
Make this filmogen and this alignment materials on those substrates, form a film forming layer and a both alignment layers respectively, wherein this both alignment layers and this film forming layer are between this optics aeolotropic material and those substrates, and this film forming layer is between this both alignment layers and those substrates; Wherein:
The method making this alignment materials form this both alignment layers on those substrates comprises: provide polar biased illumination to penetrate this alignment materials.
2. the manufacture method of photoelectric subassembly as claimed in claim 1, it is characterized in that, those substrates comprise a relative first substrate and a second substrate, and the method making this alignment materials form this both alignment layers on those substrates comprises:
There is provided one first polar biased light and one second polar biased light, wherein this first polar biased light transmits along by the direction of this first substrate to this second substrate, and this second polar biased light transmits along by the direction of this second substrate to this first substrate; And
Make this first polar biased light and this second polar biased light irradiate this alignment materials simultaneously.
3. the manufacture method of photoelectric subassembly as claimed in claim 1, it is characterized in that, the method making this alignment materials form this both alignment layers on those substrates comprises:
One polar biased light is provided;
Making in the phase retardation quality entity of this optics aeolotropic material on this polar biased light direction of transfer is zero; And
When being zero in the phase retardation quality entity of this optics aeolotropic material on this polar biased light direction of transfer, this polar biased illumination is made to penetrate this alignment materials.
4. the manufacture method of photoelectric subassembly as claimed in claim 3, is characterized in that, make in the phase retardation quality entity of this optics aeolotropic material on this polar biased light direction of transfer be zero method comprise:
Voltage is applied to multiple optics aeolotropic molecules of this optics aeolotropic material substantial parallel with the direction of transfer of the optical axis and this polar biased light that make each this optics aeolotropic molecule, or heat this optics aeolotropic material with the clear point making the temperature of this optics aeolotropic material be more than or equal to this optics aeolotropic material.
5. the manufacture method of photoelectric subassembly as claimed in claim 1, it is characterized in that, this filmogen is a self assembly type macromolecular material, and the method making this filmogen form this film forming layer on those substrates comprises:
Make this filmogen naturally with those substrate bonds.
6. the manufacture method of photoelectric subassembly as claimed in claim 1, it is characterized in that, the method making this filmogen form this film forming layer on those substrates comprises:
Heat this filmogen, or make this filmogen of a light beam irradiation.
7. the manufacture method of photoelectric subassembly as claimed in claim 1, it is characterized in that, the method making this filmogen and this alignment materials form this film forming layer and this both alignment layers respectively on those substrates comprises:
One polar biased light is provided; And
Make this polar biased light irradiate this filmogen and this alignment materials, wherein under this polar biased illumination is penetrated, the polymerization rate of this filmogen is greater than in fact the polymerization rate of this alignment materials simultaneously.
8. the manufacture method of photoelectric subassembly as claimed in claim 1, it is characterized in that, the absorbing wavelength scope of this filmogen is different from the absorbing wavelength scope of this alignment film material, and the method making this filmogen and this alignment materials form this film forming layer and this both alignment layers respectively on those substrates comprises:
There is provided a polar biased light and a light beam, wherein the wave spread of this polar biased light is different with the wave spread of this light beam;
Make this filmogen of this light beam irradiation, form this film forming layer to make this filmogen absorb this light beam; And
Make this polar biased illumination penetrate this alignment materials, form this orientation rete to make this alignment materials absorb this polar biased light.
9. a manufacture method for photoelectric subassembly, is characterized in that, comprising:
There is provided a relative first substrate and a second substrate and a potpourri, this potpourri comprises an optics aeolotropic material and an alignment materials;
This potpourri is inserted between this first substrate and this second substrate;
There is provided one first polar biased light and one second polar biased light, wherein this first polar biased light transmits along by the direction of this first substrate to this second substrate, and this second polar biased light transmits along by the direction of this second substrate to this first substrate;
Make this first polar biased light and this second polar biased light irradiate this potpourri simultaneously, on this first substrate and this second substrate, form a both alignment layers to make this alignment materials.
10. the manufacture method of photoelectric subassembly as claimed in claim 9, it is characterized in that, this potpourri also comprises a filmogen, and this filmogen is a self assembly type macromolecular material, and the manufacture method of this photoelectric subassembly also comprises:
This self assembly type macromolecular material is made naturally on this first substrate and this second substrate, to form a film forming layer with this first substrate and this second substrate bond, wherein this both alignment layers and this film forming layer are between this optics aeolotropic material and this first substrate and this second substrate, and this film forming layer is between this both alignment layers and this first substrate and this second substrate.
The manufacture method of 11. photoelectric subassemblys as claimed in claim 9, it is characterized in that, this potpourri also comprises a filmogen, and the manufacture method of this photoelectric subassembly also comprises:
Heat this filmogen, on this first substrate and this second substrate, a film forming layer is formed to make this filmogen, wherein this both alignment layers and this film forming layer are between this optics aeolotropic material and this first substrate and this second substrate, and this film forming layer is between this both alignment layers and this first substrate and this second substrate.
The manufacture method of 12. photoelectric subassemblys as claimed in claim 9, it is characterized in that, this potpourri also comprises a filmogen, this the first polar biased light and this second polar biased light irradiate this alignment materials and this filmogen simultaneously, on this first substrate and this second substrate, a film forming layer is formed to make this filmogen, wherein under this first polar biased light and this second polar biased illumination are penetrated, the polymerization rate of this filmogen is greater than in fact the polymerization rate of this alignment materials, this both alignment layers and this film forming layer are between this optics aeolotropic material and this first substrate and this second substrate, and this film forming layer is between this both alignment layers and this first substrate and this second substrate.
The manufacture method of 13. photoelectric subassemblys as claimed in claim 9, it is characterized in that, this potpourri also comprises a filmogen, and the absorbing wavelength scope of this filmogen is different from the absorbing wavelength scope of this alignment film material, and the manufacture method of this photoelectric subassembly also comprises:
There is provided a light beam, wherein the wave spread of this light beam is different from the wave spread of the wave spread of this first polar biased light and this second polar biased light; And
Make this filmogen of this light beam irradiation, this film forming layer is formed to make this filmogen absorb this light beam, wherein this both alignment layers and this film forming layer are between this optics aeolotropic material and this first substrate and this second substrate, and this film forming layer is between this both alignment layers and this first substrate and this second substrate.
The manufacture method of 14. 1 kinds of photoelectric subassemblys, is characterized in that, comprising:
There is provided two substrates and a potpourri, this potpourri comprises an optics aeolotropic material and an alignment materials;
This potpourri is inserted between those substrates;
One polar biased light is provided;
Making in the phase retardation quality entity of this optics aeolotropic material on this polar biased light direction of transfer is zero; And
When being zero in the phase retardation quality entity of this optics aeolotropic material on this polar biased light direction of transfer, making this polar biased illumination penetrate this alignment materials, on those substrates, form a both alignment layers to make this alignment materials.
The manufacture method of 15. photoelectric subassemblys as claimed in claim 14, is characterized in that, make in the phase retardation quality entity of this optics aeolotropic material on this polar biased light direction of transfer be zero method comprise:
Voltage is applied to multiple optics aeolotropic molecules of this optics aeolotropic material substantial parallel with the direction of transfer of the optical axis and this polar biased light that make each this optics aeolotropic molecule, or heat this optics aeolotropic material with the clear point making the temperature of this optics aeolotropic material be more than or equal to this optics aeolotropic material.
The manufacture method of 16. photoelectric subassemblys as claimed in claim 14, it is characterized in that, this potpourri also comprises a filmogen, and this filmogen is a self assembly type macromolecular material, and the manufacture method of this photoelectric subassembly also comprises:
This self assembly type macromolecular material is made naturally on those substrates, to form a film forming layer with those substrate bonds, wherein this both alignment layers and this film forming layer are between this optics aeolotropic material and those substrates, and this film forming layer is between this both alignment layers and those substrates.
The manufacture method of 17. photoelectric subassemblys as claimed in claim 14, it is characterized in that, this potpourri also comprises a filmogen, and the manufacture method of this photoelectric subassembly also comprises:
Heat this filmogen and on those substrates, form a film forming layer to make this filmogen, wherein this both alignment layers and this film forming layer are between this optics aeolotropic material and those substrates, and this film forming layer is between this both alignment layers and those substrates.
The manufacture method of 18. photoelectric subassemblys as claimed in claim 14, it is characterized in that, this potpourri also comprises a filmogen, this polar biased light irradiates this alignment materials and this filmogen simultaneously, on those substrates, a film forming layer is formed to make this filmogen, wherein under this polar biased illumination is penetrated, the polymerization rate of this filmogen is greater than in fact the polymerization rate of this alignment materials, this both alignment layers and this film forming layer are between this optics aeolotropic material and those substrates, and this film forming layer is between this both alignment layers and those substrates.
The manufacture method of 19. photoelectric subassemblys as claimed in claim 14, it is characterized in that, this potpourri also comprises a filmogen, and the absorbing wavelength scope of this filmogen is different from the absorbing wavelength scope of this alignment film material, and the manufacture method of this photoelectric subassembly also comprises:
There is provided a light beam, wherein the wave spread of this polar biased light is different with the wave spread of this light beam; And
Make this filmogen of this light beam irradiation, this film forming layer is formed to make this filmogen absorb this light beam, this filmogen absorbs this light beam and forms a film forming layer, wherein this both alignment layers and this film forming layer are between this optics aeolotropic material and those substrates, and this film forming layer is between this both alignment layers and those substrates.
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| US6816218B1 (en) * | 1997-04-14 | 2004-11-09 | Merck Patent Gmbh | Homeotropically aligned liquid crystal layer and process for the homeotropic alignment of liquid crystals on plastic substrates |
| CN101861535A (en) * | 2008-09-22 | 2010-10-13 | 索尼公司 | Phase difference plate, method of manufacturing same, and display device |
| CN101968589A (en) * | 2010-10-20 | 2011-02-09 | 华映视讯（吴江）有限公司 | Liquid crystal alignment process |
| CN102156363A (en) * | 2011-04-15 | 2011-08-17 | 福州华映视讯有限公司 | Liquid crystal mixture and liquid crystal display panel |
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2013
- 2013-03-11 CN CN201310076711.2A patent/CN103197470B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6816218B1 (en) * | 1997-04-14 | 2004-11-09 | Merck Patent Gmbh | Homeotropically aligned liquid crystal layer and process for the homeotropic alignment of liquid crystals on plastic substrates |
| CN101861535A (en) * | 2008-09-22 | 2010-10-13 | 索尼公司 | Phase difference plate, method of manufacturing same, and display device |
| CN101968589A (en) * | 2010-10-20 | 2011-02-09 | 华映视讯（吴江）有限公司 | Liquid crystal alignment process |
| CN102156363A (en) * | 2011-04-15 | 2011-08-17 | 福州华映视讯有限公司 | Liquid crystal mixture and liquid crystal display panel |
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