TWI508347B - Method of manufacturing photo-electric device - Google Patents

Description

Photoelectric element manufacturing method

The present invention relates to a method of fabricating a photovoltaic element.

In general, photovoltaic elements (e.g., liquid crystal displays, etc.) are formed into a alignment layer by a technique of frictional alignment. In the rubbing alignment technique, the alignment liquid is first coated on the substrate of the photovoltaic element, and then the alignment liquid is cured to form a quasi-alignment layer. Thereafter, the quasi-alignment layer is rubbed with a fleece to form an alignment layer. However, since the surface of the substrate of the photovoltaic element is not necessarily flat, the quasi-alignment layer in which the fleece rubs on the surface of the substrate is liable to cause a defect in the alignment layer, and further, the alignment of the optically anisotropic material (for example, liquid crystal) in the photovoltaic element. not ideal. Due to the shortcomings of the friction alignment technology, light alignment technology has been developed. Although the optical alignment technology can solve the problem of the friction alignment technology, the alignment liquid used in the optical alignment technology is expensive, and the cost of the photovoltaic element manufactured by the optical alignment technology is made. Too high.

In view of the above, the present invention provides a method of manufacturing a photovoltaic element, which has a low cost and good quality.

A method of manufacturing a photovoltaic element according to an embodiment of the present invention includes the following steps. A two substrate and a mixture comprising an optically anisotropic material, a film forming material, an alignment material, and a photoinitiator are provided. A mixture is filled between the substrates. The film forming material and the alignment material form a film forming layer and an alignment layer on the substrate, respectively. The alignment layer and the film formation layer are between the optically anisotropic material and the substrate. The film forming layer is located between the alignment layer and the substrate.

In an embodiment of the invention, the two substrates include opposite first and second substrates. The method of forming the alignment material to form an alignment layer on the two substrates includes the following steps. The first polarized light and the second polarized light are provided, wherein the first polarized light is transmitted along a direction from the first substrate to the second substrate, and the second polarized light is transmitted in a direction from the second substrate to the first substrate. The first polarized light and the second polarized light are simultaneously irradiated to the alignment material.

In an embodiment of the invention, the method for forming an alignment layer on an alignment layer comprises the following steps. Provides polarized light. The amount of phase retardation of the optically anisotropic material in the direction of the polarization transfer is substantially zero. When the amount of phase retardation of the optically anisotropic material in the direction of the polarization of the polarized light is substantially zero, the polarized light is irradiated to the alignment material.

In an embodiment of the invention, the method for making the phase retardation of the optically anisotropic material in the direction of polarization of the polarized light substantially zero comprises the following steps. Applying a voltage to a plurality of optically anisotropic molecules of the optically anisotropic material such that the optical axis of each optically isotropic molecule is substantially parallel to the direction of transmission of the polarized light, or heating the optically anisotropic material to cause an optically different direction The temperature of the material is greater than or equal to the light Learn the clarification points of different directional materials.

In an embodiment of the invention, the film forming material is a self-assembling polymer material. A method of forming a film forming material onto a substrate to form a film forming layer includes: bonding the film forming material to the substrate.

In an embodiment of the invention, the method for forming a film forming material on a substrate comprises: heating a film forming material, or irradiating a light beam with a film forming material.

In an embodiment of the invention, the method for forming a film forming layer and an alignment layer on the substrate respectively comprises: providing polarized light; and simultaneously irradiating the polarizing light to the film forming material and the alignment material, Wherein, under the irradiation of the polarized light, the polymerization rate of the film-forming material is substantially greater than the polymerization rate of the alignment material.

In an embodiment of the invention, the film-forming material has an absorption wavelength range different from that of the alignment film material. The method of forming the film forming material and the alignment material on the substrate to form the film forming layer and the alignment layer, respectively, includes the following steps. Polarizing light and a light beam are provided, wherein the polarization distribution of the polarized light is different from the wavelength distribution of the light beam. The light beam is caused to illuminate the film forming material such that the film forming material absorbs the light beam to form a film forming layer. The polarized light is irradiated to the alignment material such that the alignment material absorbs the polarized light to form an alignment film layer.

In an embodiment of the invention, the film forming material is represented by the following chemical formula (1), Wherein X is ruthenium or zinc, R ₁ is a halogen group, an amino group, an acrylate group or an oxyalkyl group, and the oxyalkyl group may be a linear or branched type, and R ₂ includes a hydrogen, an alkyl group, a halogen, and Cyano, m is greater than or equal to 1, a and b are greater than or equal to zero. The concentration of the film forming material in the mixture is greater than 0% and less than or equal to 15%.

In an embodiment of the invention, the alignment material is represented by the following chemical formula (2), Wherein R ₃ includes an alkyl group, a halogen, and a nitrile group, and Y is represented by the following chemical formula (3), Wherein Z is an acrylate group, a nitrile group or a methyl group, and n is greater than or equal to 1. The concentration of the alignment material in the mixture is greater than or equal to 0.1% and less than or equal to 15%.

A method of manufacturing a photovoltaic element according to another embodiment of the present invention includes the following steps. An opposing first substrate and a second substrate and a mixture are provided. The mixture includes an optically anisotropic material as well as an alignment material. A mixture is filled between the first substrate and the second substrate. Providing a first polarized light and a second polarized light, wherein the first polarized light is along The second substrate is transmitted in a direction from the first substrate to the second substrate, and the second polarized light is transmitted in a direction from the second substrate to the first substrate. The first polarized light and the second polarized light are simultaneously irradiated to the mixture such that the alignment material forms an alignment layer on the first substrate and the second substrate.

In an embodiment of the invention, the above mixture further comprises a film forming material. The film forming material is a self-assembling polymer material. The method for manufacturing a photovoltaic element further comprises: forming a self-assembled polymer material naturally bonded to the first substrate and the second substrate to form a film formation layer on the first substrate and the second substrate, wherein the alignment layer and the film formation layer are located The optically anisotropic material is interposed between the first substrate and the second substrate, and the formed layer is located between the alignment layer and the first substrate and the second substrate.

In an embodiment of the invention, the method of fabricating the photovoltaic element further includes heating the film forming material such that the film forming material forms a film forming layer on the first substrate and the second substrate.

In an embodiment of the invention, the above mixture further comprises a film forming material. The first polarized light and the second polarized light simultaneously illuminate the alignment material and the film forming material, so that the film forming material forms a film forming layer on the first substrate and the second substrate, wherein the first polarized light and the second polarized light are irradiated The polymerization rate of the film-forming material is substantially greater than the polymerization rate of the alignment material.

In an embodiment of the invention, the absorption wavelength range of the film-forming material is different from the absorption wavelength range of the alignment film material, and the method for manufacturing the photovoltaic element further includes the following steps. A light beam is provided, wherein the wavelength distribution of the light beam is different from the wavelength distribution range of the first polarized light and the wavelength distribution range of the second polarized light. The light beam is caused to illuminate the film forming material such that the film forming material absorbs the light beam to form a film forming layer.

A method of manufacturing a photovoltaic element according to still another embodiment of the present invention includes the following steps. Two substrates and a mixture are provided. The mixture includes an optically anisotropic material as well as an alignment material. A mixture is filled between the substrates. Provides polarized light. The amount of phase retardation of the optically anisotropic material in the direction of the polarization transfer is substantially zero. When the amount of phase retardation of the optically anisotropic material in the direction of polarization of the polarized light is substantially zero, the polarized light is irradiated to the alignment material such that the alignment material forms an alignment layer on the substrate.

In an embodiment of the invention, the method for making the phase retardation of the optically anisotropic material in the direction of polarization of the polarized light substantially zero comprises: applying a plurality of optically anisotropic molecules to the optically anisotropic material. The voltage is such that the optical axis of each optically heterogeneous molecule is substantially parallel to the direction of transmission of the polarized light, or the optically anisotropic material is heated such that the temperature of the optically anisotropic material is greater than or equal to the clearing point of the optically anisotropic material .

In an embodiment of the invention, the above mixture further comprises a film forming material. The film forming material is a self-assembling polymer material. The method of manufacturing a photovoltaic element further includes: forming a self-assembled polymer material naturally bonded to a substrate to form a film formation layer on the substrate.

In an embodiment of the invention, the method of fabricating the photovoltaic device further includes heating the film forming material to form a film forming material on the substrate.

In an embodiment of the invention, the polarized light simultaneously illuminates the alignment material and the film forming material, so that the film forming material forms a film forming layer on the substrate, wherein the polymerization rate of the film forming material is substantially under the irradiation of the polarized light. The polymerization rate is greater than the alignment material.

In an embodiment of the invention, the film-forming material has an absorption wavelength range different from that of the alignment film material. The manufacturing method of the photovoltaic element further includes the following steps. A light beam is provided in which the wavelength distribution of the polarized light is different from the wavelength distribution of the light beam. The light beam is caused to illuminate the film forming material such that the film forming material absorbs the light beam to form a film forming layer.

Based on the above, in the method of manufacturing a photovoltaic element according to an embodiment of the present invention, the alignment layer is formed using a mixture comprising an optically anisotropic material and an alignment material without using a conventional alignment liquid to form the alignment layer. Therefore, compared with the conventional friction alignment technique, the method for manufacturing a photovoltaic element according to an embodiment of the present invention can eliminate the steps of applying the alignment liquid and the rubbing alignment, thereby avoiding defects caused by frictional alignment, thereby improving the photovoltaic element. Yield. In addition, since the method for manufacturing a photovoltaic element according to an embodiment of the present invention does not require the use of a conventional alignment liquid, the method for manufacturing a photovoltaic element according to an embodiment of the present invention is compared to the conventional friction alignment technique and optical alignment. The fabricated optoelectronic components have a lower cost competitive advantage.

The above described features and advantages of the invention will be apparent from the following description.

100‧‧‧Optoelectronic components

110‧‧‧Mixture

112‧‧‧Optical anisotropic materials

112a‧‧‧Optical heterogeneous molecules

114‧‧‧Alignment materials

116‧‧‧ Film forming materials

120, 130‧‧‧ substrate

122, 132‧‧‧ base

124, 134‧‧ ‧ film layer

140‧‧‧ film formation

150‧‧‧Alignment layer

200‧‧‧heating plate

A‧‧‧ optical axis

1. L3‧‧‧ Beam

L1, L2, L4‧‧‧ polarized light

V‧‧‧voltage source

1A to 1F are schematic flow charts showing a method of manufacturing a photovoltaic element according to an embodiment of the present invention.

Figure 2 illustrates a method of forming a film forming layer in accordance with another embodiment of the present invention.

Figure 3 illustrates a method of forming a film forming layer in accordance with yet another embodiment of the present invention.

Figure 4 illustrates a method of forming an alignment layer in accordance with another embodiment of the present invention.

Figure 5 illustrates a method of forming an alignment layer in accordance with yet another embodiment of the present invention.

6A to 6B illustrate a method of forming a film formation layer and an alignment layer according to another embodiment of the present invention.

7A to 7B illustrate a method of forming a film formation layer and an alignment layer according to still another embodiment of the present invention.

1A to 1F are schematic flow charts showing a method of manufacturing a photovoltaic element according to an embodiment of the present invention. Referring to FIG. 1A and FIG. 1B, first, a mixture 110 (shown in FIG. 1A) and two substrates 120, 130 (shown in FIG. 1B) are provided. The mixture 110 includes an optically anisotropic material 112 and an alignment material 114. In this embodiment, the mixture 110 can optionally include a film forming material 116. Mixture 110 may further comprise a photoinitiator (not shown). The optically anisotropic material 112 includes a plurality of optically anisotropic molecules 112a. In the present embodiment, the optically anisotropic material 112 is, for example, a liquid crystal material, and the optically anisotropic molecules 112a are, for example, liquid crystal molecules. However, the present invention is not limited thereto, and in other embodiments, the optically anisotropic material 112 may be other materials having optical anisotropic properties.

In the present embodiment, the substrate 120 includes a substrate 122 and a film layer 124 disposed on the substrate 122, and the substrate 130 includes a substrate 132 and a film layer 134 disposed on the substrate 132. Further, if the photovoltaic element to be fabricated is a color display, the film layer 124 on the substrate 122 is, for example, a pixel array layer, and the film layer on the substrate 132. 134 is, for example, a color filter layer. However, the present invention is not limited thereto, and the form of the substrates 120, 130 may depend on the kind of the photovoltaic element to be manufactured. For example, if the photovoltaic element to be fabricated is glasses for viewing a stereoscopic display, the substrates 122, 132 may be light transmissive substrates, and the film layers 124, 134 may be light transmissive conductive films (eg, indium tin oxide films).

Referring to FIG. 1B, a mixture 110 is then filled between the two substrates 120, 130. For example, in the present embodiment, the mixture 110 can be filled between the two substrates 120, 130 by vacuum injection. However, the present invention is not limited thereto. In other embodiments, the mixture 110 may be filled between the two substrates 120, 130 by a one drop fill (ODF) method or other suitable method.

Referring to FIG. 1C and FIG. 1D, then, in this embodiment, the film forming material 116 can be selectively formed on the substrates 120, 130 to form the film forming layer 140. The film forming material 116 may be a self alignment type polymer material, and the film forming material 116 may be naturally bonded to the substrates 120 and 130 to form a film forming layer 140 on the substrates 120 and 130. In detail, the side chain groups of the self-assembled polymer material can react with the hydroxyl groups on the surface of the film layers 124, 134 of the substrates 120, 130, and bond with the film layers 124, 134, and further, at the film layer 124, A film formation layer 140 is formed on the surface of 134. The film forming material 116 can be expressed by the following chemical formula (1), Wherein X may be cerium (Si), zinc (Zn) or the like, and R ₁ may be a halogen group, an amino group, an acrylate group or an oxyalkyl group (the oxyalkyl group may be a linear or branched type), and the like. R ₂ may include hydrogen, an alkyl group, a halogen, and a cyano group, m is greater than or equal to 1, and a and b are greater than or equal to zero. The concentration of the film forming material 116 in the mixture 110 may be greater than 0% and less than or equal to 15%. However, the present invention is not limited thereto, and the chemical structure of the film-forming material 116 and the weight percent concentration of the film-forming material 116 in the mixture 110 can be adjusted according to the requirements of the actual process.

It is noted that the alignment molecules 114 can form a more stable alignment layer on the substrates 120, 130 through the film formation layer 140. It should be noted that in other examples, if the alignment molecules 114 can form a stable alignment layer directly on the substrates 120, 130, the film forming material 116 can be omitted in the mixture 110 (ie, the film forming material 116 is in the mixture 110). The weight percentage concentration may be equal to 0%), and the step of forming the film formation layer 140 may be omitted in the photovoltaic element manufacturing method flow.

The method of forming the film formation layer 140 is not limited to the above. In other embodiments, the film formation layer 140 may be formed by other suitable methods, which will be exemplified below with reference to the drawings. Figure 2 illustrates a method of forming a film forming layer in accordance with another embodiment of the present invention. Referring to FIG. 2, in this embodiment, the film forming material 116 may be a thermosetting polymer material. The method of forming the film forming material 116 on the substrate 120, 130 by forming the film forming layer 140 may be: heating the film forming material 116 to form a film forming layer 140 (pictured in FIG. 1D). In particular, the substrates 120, 130 and the mixture 110 that has been filled between the substrates 120, 130 can be placed together on the heating plate 200. At this time, as shown in FIG. 2, the thermosetting polymer material is heated to react with the substrates 120 and 130, and starts to deposit on the surfaces of the substrates 120 and 130. After heating for a suitable period of time, as shown in FIG. 1D, a thermosetting polymer material can be formed. Film layer 140. In this embodiment, the temperature and time at which the film forming material 116 is heated may depend on the characteristics of the film material 116. For example, the temperature at which the film forming material 116 is heated may range from 40 ° C to 500 ° C. In addition, the time between heating the film forming material 116 can be considered as the distance between the substrates 120, 130.

Figure 3 illustrates a method of forming a film forming layer in accordance with yet another embodiment of the present invention. Referring to FIG. 3, in this embodiment, the film forming material 116 may be a photo-curable polymer material. The film forming material 116 is formed on the substrates 120, 130 by forming the film forming layer 140 by irradiating the light beam 1 with the film forming material 116 to form a film forming layer 140 (drawn in FIG. 1D). In this embodiment, the light beam 1 may be linearly polarized light, but the invention is not limited thereto, and in other embodiments, the light beam 1 may be non-polarized. In this embodiment, the light beam 1 can be transmitted along the substrate 120 in the direction of the substrate 130 and first passed through the substrate 120 and then irradiated to the film forming material 116. In other words, the light beam 1 can pass through the substrate 120 to illuminate the film forming material 116. The wavelength distribution of the light beam 1 does not change much after passing through the substrate 120, so that the film forming material 116 can receive the light beam 1 having an appropriate wavelength distribution, thereby making the film forming quality of the film forming layer 140 good. The wavelength of the light beam 1, the irradiation intensity of the light beam 1, and the irradiation time of the light beam 1 may depend on the characteristics of the light-solid polymer material. The wavelength of the light beam 1, the irradiation intensity of the light beam 1, and the irradiation time of the light beam 1 can be determined by considering the absorption spectrum between the substrates 120 and 130 and the distance between the substrates 120 and 130. For example, beam 1 may have a wavelength between 200 nanometers (nm) and 400 nanometers (nm), and beam 1 may have an illumination intensity greater than or equal to 5 millijoules per square centimeter (mj/cm ² ).

Referring to FIG. 1E and FIG. 1F, the alignment material 114 is then formed on the substrates 120, 130 to form an alignment layer 150 (shown in FIG. 1F). In this embodiment, the alignment material 114 may be a photo-curable polymer material. The alignment material 114 can be expressed by the following chemical formula (2), Wherein R ₃ includes an alkyl group, a halogen, and a nitrile group, and Y represents a chemical formula (3): Wherein Z comprises an acrylate group, a nitrile group or a methyl group, and n is greater than or equal to 1. The weight percent concentration of alignment material 114 in mixture 110 can be greater than or equal to 0.1% and less than or equal to 15%. However, the present invention is not limited thereto, and the chemical structure of the alignment material 114 and the weight percentage concentration of the alignment material 114 in the mixture 110 can be adjusted according to the requirements of the actual process.

In the present embodiment, the method of forming the alignment material 114 on the substrate 120, 130 to form the alignment layer 150 may include the following steps. As shown in FIG. 1E, first, polarized light L1 and polarized light L2 are provided, wherein the polarized light L1 is transmitted in the direction from the substrate 120 toward the substrate 130, and the polarized light L2 is transmitted in the direction from the substrate 130 toward the substrate 120. Next, the polarized light L1 and the polarized light L2 are simultaneously irradiated with the alignment material 114 to form an alignment layer 150 on the substrates 120 and 130 (shown in FIG. 1F). As shown in FIG. 1F, after the alignment layer 150 is formed, the optically anisotropic material 112 can be aligned in accordance with the set alignment direction, thereby completing the photovoltaic element 100 of the present embodiment. In the photovoltaic element 100, the alignment layer 150 and the film formation layer 140 are located between the optically anisotropic material 112 and the substrates 120, 130, and the formation layer 140 is located between the alignment layer 150 and the substrates 120, 130. It should be noted that, in this embodiment, since the polarized lights L1 and L2 are simultaneously irradiated with the alignment material 114 from the two sides of the substrates 120 and 130, respectively, The alignment materials 114 on the surfaces of the substrates 120 and 130 can be irradiated with uniform polarized light L1 and L2, and the film formation quality of the alignment layer 150 is good.

In this embodiment, the polarized lights L1, L2 may be linear polarized light. The direction of the polarization of the linear polarized light depends on the direction of the alignment to be formed. The direction of the polarization of the linearly polarized light may be parallel or perpendicular to the direction of alignment formed. For example, if the photovoltaic element to be fabricated is a twisted nematic (TN) type liquid crystal display, the polarization directions of the polarized lights L1, L2 may be substantially perpendicular to each other. If the optoelectronic component to be fabricated is an electrically controlled birefringence (ECB) type, an In-Plane Switching (IPS) type or a fringe field switching (FFS) type liquid crystal display, The polarization directions of the aurora L1, L2 may be substantially parallel to each other. Further, the wavelengths of the polarized lights L1 and L2, the irradiation intensity of the polarized lights L1 and L2, and the irradiation time of the polarized lights L1 and L2 may be determined by the characteristics of the alignment material 114. The wavelengths of the polarized lights L1 and L2, the irradiation intensity of the polarized lights L1 and L2, and the irradiation time of the polarized lights L1 and L2 can also measure the absorption spectrum between the substrates 120 and 130 and the distance between the substrates 120 and 130. For example, the polarized light L1, L2 may have a wavelength of 200 nanometers (nm) to 400 nanometers (nm), and the polarized light L1, L2 may have an intensity greater than or equal to 5 millijoules per square centimeter (mj/cm). ² ).

The method of forming the alignment layer 150 is not limited to the above, and in other embodiments, other suitable methods may be employed to form the alignment layer 150 of good quality. For example, in other embodiments, polarized light can be provided and the phase retardation of the optically anisotropic material in the direction of the polarization of the polarized light is substantially zero. Moreover, the amount of phase retardation in the direction of the polarization transfer of the optically anisotropic material is substantially When it is zero, the polarized light is irradiated to the alignment material to form an alignment layer. The following is a detailed description with the illustration.

Figure 4 illustrates a method of forming an alignment layer in accordance with another embodiment of the present invention. Referring to FIG. 4, in this embodiment, the method of forming the alignment layer includes the following steps. The polarized light L1 is provided, and the polarized light L1 can be linear polarized light. The phase retardation of the optically anisotropic material 112 in the direction of transmission of the polarized light L1 is substantially zero. Specifically, a voltage may be applied to the plurality of optically anisotropic molecules 112a of the optically anisotropic material 112 such that the optical axis A of each of the optically isotropic molecules 112a is substantially parallel to the direction of transmission of the polarized light L1. Then, when the optical axis A of each optically anisotropic molecule 112a is substantially parallel to the direction of transmission of the polarized light L1, the polarized light L1 is caused to illuminate the alignment material 114 to form the alignment layer 150 (shown in FIG. 1F). As shown in FIG. 1F, after the alignment layer 150 is formed, the voltage source V is removed, and the optically anisotropic material 112 can be aligned along the set alignment direction.

It is to be noted that, in FIG. 4, since the polarization direction L1 is substantially parallel to the direction of transmission of the optical axis A and the polarization light L1 of the optical anisotropic molecules 112a when the polarized light L1 is irradiated with the alignment material 114, the polarization of the polarized light L1 is The direction is less susceptible to the optical anisotropic material 112, and all of the alignment materials 114 can sense the polarized light L1 of the same polarization direction. In this way, the alignment material 114 can form the alignment layer 150 of good quality on the substrates 120 and 130, and the alignment of the optically anisotropic material 112 can be improved.

Figure 5 illustrates a method of forming an alignment layer in accordance with yet another embodiment of the present invention. Referring to FIG. 5, in this embodiment, the method of forming the alignment layer includes the following steps. Providing partial polarity Light L1. The amount of phase retardation of the optically anisotropic material 112 in the direction of transmission of the polarized light L1 is substantially zero. In particular, the optically anisotropic material 112 can be heated such that the temperature of the optically anisotropic material 112 is greater than or equal to the clearing point of the optically anisotropic material 112. When the temperature of the optically anisotropic material 112 is greater than or equal to the clearing point of the optically anisotropic material 112, the optically anisotropic material 112 transforms into an optical isotropic material. Then, when the optically anisotropic material 112 is converted into an optically isotropic material, the polarized light L1 is caused to illuminate the alignment material 114 to form the alignment layer 150 (shown in FIG. 1F). As shown in FIG. 1F, after the alignment layer 150 is formed, the temperature of the optical anisotropic material 112 can be made lower than the clearing point of the optical anisotropic material 112. At this time, the optical anisotropic material 112 can be set along the line. Arrange in the direction of alignment.

In FIG. 5, since the polarized light L1 is irradiated with the alignment material 114, the optically anisotropic material 112 has been converted into an optical isotropic material, and thus the polarization direction of the polarized light L1 is not easily affected by the optical anisotropic material 112. All of the alignment materials 114 can sense the polarized light L1 of the same polarization direction. In this way, the alignment material 114 can form the alignment layer 150 of good quality on the substrates 120 and 130, and the alignment of the optically anisotropic material 112 can be improved.

In this embodiment, the film forming material 116 is a self-assembling polymer material and the alignment material 114 is a photo-curable material. In other embodiments, the film forming material 116 and the alignment material 114 may also be light. Solid material. Hereinafter, the formation of the film formation layer 140 and the alignment layer 150 when the film formation material 116 and the alignment material 114 are both photo-curable materials will be described in detail with reference to the drawings. 6A to 6B illustrate a method of forming a film formation layer and an alignment layer according to another embodiment of the present invention. Please refer to FIG. 6A and FIG. 6B, The polarized light L1 is supplied, and the polarized light L1 is simultaneously irradiated to the film forming material 116 and the alignment material 114 to form the film forming layer 140 and the alignment layer 150. The polarized light L1 can be linear polarized light. It should be noted that in this embodiment, under the irradiation of the polarized light L1, the polymerization rate of the film-forming material may be substantially greater than the polymerization rate of the alignment material 114, so that the film-forming material 116 is completely formed before the alignment layer 150 is formed. The film formation layer 140 is formed first, and the alignment material 114 is permeable to the film formation layer 140 to form a stable alignment layer 150 on the substrates 120, 130. In addition, in this embodiment, when the film forming material 116 and the alignment material 114 are irradiated, the method of reducing the influence of the optical anisotropic material 112 on the polarized light L1 corresponding to FIGS. 1E, 4, and 5 may be simultaneously applied. The film formation quality of the film formation layer 140 and the alignment layer 150 is further improved. For related explanation, please refer to the paragraphs corresponding to FIG. 1E, FIG. 4, and FIG. 5, and the description will not be repeated here.

7A to 7B illustrate a method of forming a film formation layer and an alignment layer according to still another embodiment of the present invention. When the film forming material 116 and the alignment material 114 are both photo-curable materials and the absorption wavelength ranges of the film-forming material 116 and the alignment material 114 are different, as shown in FIG. 7A, the film-forming material 116 may be first formed (not shown in FIG. 7A). The light beam L3 of the absorption wavelength range (the light beam L3 may be non-polarized or polarized light) is irradiated to the film forming material 116 to form the film forming material 116 into the film forming layer 140. Then, as shown in FIG. 7B, the alignment material 114 is irradiated with polarized light L4 (for example, linearly polarized light) having an absorption wavelength range of the alignment material 114 (drawn in FIG. 7A) to cause the alignment material 114 to form the alignment layer 150. In this embodiment, when the alignment material 114 is irradiated, the method of reducing the influence of the optical anisotropic material 112 on the polarized light L1 corresponding to FIG. 1E, FIG. 4, and FIG. 5 may be simultaneously applied to make the film formation layer 140 and The film formation quality of the alignment layer 150 is better. Related instructions Please refer to the paragraphs corresponding to FIG. 1E, FIG. 4, and FIG. 5, and will not be repeated here.

As described above, in the method of manufacturing a photovoltaic element according to an embodiment of the present invention, the alignment layer is formed by using a mixture comprising an optically anisotropic material and an alignment material without using a conventional alignment liquid to form an alignment layer. Therefore, compared with the conventional friction alignment technique, the method for manufacturing a photovoltaic element according to an embodiment of the present invention can eliminate the steps of applying the alignment liquid and the rubbing alignment, thereby avoiding defects caused by frictional alignment, thereby improving the photovoltaic element. Yield. In addition, since the method for manufacturing a photovoltaic element according to an embodiment of the present invention does not require the use of a conventional alignment liquid, the method for manufacturing a photovoltaic element according to an embodiment of the present invention is compared to the conventional friction alignment technique and optical alignment. The fabricated optoelectronic components have a lower cost competitive advantage.

In addition, in the method for manufacturing a photovoltaic device according to another embodiment of the present invention, the polarized light is simultaneously irradiated with the alignment material from the two sides of the two substrates, so that the alignment materials close to the surface of the two substrates are uniformly irradiated by the polarized light. The quality of the alignment layer is good.

Further, in the method of manufacturing a photovoltaic element according to an embodiment of the present invention, when the alignment material is irradiated with polarized light, the phase retardation amount of the optical anisotropic material in the polarization direction of the polarization is substantially zero. In this way, the polarization direction of the polarized light is not easily affected by the optical anisotropic material, so that all the alignment materials can sense the polarized light of the same polarization direction, and the alignment layer formed by the alignment material has a good alignment. ability.

110‧‧‧Mixture

112‧‧‧Optical anisotropic materials

114‧‧‧Alignment materials

120, 130‧‧‧ substrate

122, 132‧‧‧ base

124, 134‧‧ ‧ film layer

140‧‧‧ film formation

L1, L2‧‧‧ Aurora

Claims (18)

A method of manufacturing a photovoltaic element, comprising: providing a two substrate and a mixture, the mixture comprising an optically anisotropic material, a film forming material, an alignment material, and a photoinitiator; filling the substrate between the substrates a film forming material and the alignment material respectively form a film forming layer and an alignment layer on the substrates, wherein the alignment layer and the film forming layer are located between the optical anisotropic material and the substrates And the film forming layer is located between the alignment layer and the substrate, wherein the method for forming the alignment layer on the substrate comprises: providing a polarized light; and causing the optical anisotropic material to be at the bias The amount of phase retardation in the direction of the apolar light transmission is substantially zero; and when the amount of phase retardation of the optically anisotropic material in the direction of the polarization of the polarized light is substantially zero, the polarized light is caused to illuminate the alignment material. The method for manufacturing a photovoltaic device according to the first aspect of the invention, wherein the substrate comprises an opposite first substrate and a second substrate, and the method for forming the alignment layer on the substrate comprises: Providing a first polarized light and a second polarized light, wherein the first polarized light is transmitted along a direction from the first substrate to the second substrate, and the second polarized light is directed to the second substrate Transmitting the direction of the first substrate; and causing the first polarized light and the second polarized light to simultaneously illuminate the alignment material. The method of manufacturing a photovoltaic element according to claim 1, wherein the method of making the phase retardation amount of the optically anisotropic material in the direction of the polarization of the polarization is substantially zero comprises: the optically anisotropic material Applying a voltage to the plurality of optically anisotropic molecules such that the optical axis of each of the optically anisotropic molecules and the direction of transmission of the polarized light are substantially Parallel, or heating the optically anisotropic material such that the temperature of the optically anisotropic material is greater than or equal to the clearing point of the optically anisotropic material. The method for manufacturing a photovoltaic device according to claim 1, wherein the film-forming material is a self-assembled polymer material, and the method for forming the film-forming material on the substrate comprises: The film forming material is naturally bonded to the substrates. The method for manufacturing a photovoltaic device according to the above aspect, wherein the method for forming the film-forming material on the substrate comprises: heating the film-forming material, or irradiating a film with the light beam; material. The method for manufacturing a photovoltaic device according to claim 1, wherein the method for forming the film-forming material and the alignment material on the substrate to form the film-forming layer and the alignment layer respectively comprises: providing a polarized light; And causing the polarized light to simultaneously illuminate the film forming material and the alignment material, wherein the polymerization rate of the film forming material is substantially greater than the polymerization rate of the alignment material under the irradiation of the polarized light. The method for manufacturing a photovoltaic device according to the first aspect of the invention, wherein the film-forming material has an absorption wavelength range different from an absorption wavelength range of the alignment film material, and the film-forming material and the alignment material are on the substrates. The method for forming the film forming layer and the alignment layer respectively comprises: providing a polarized light and a light beam, wherein the polarized light has a wavelength distribution range different from a wavelength distribution range of the light beam; and the light beam is irradiated to the film forming material to The film forming material is caused to absorb the light beam to form the film forming layer; and the polarized light is irradiated to the alignment material such that the alignment material absorbs the polarized light to form the alignment film layer. A method of manufacturing a photovoltaic element, comprising: providing a first substrate and a second substrate and a mixture, the mixture comprising an optically anisotropic material and an alignment material; and the first substrate and the second substrate Filling in the mixture; providing a first polarized light and a second polarized light, wherein the first polarized light is transmitted along a direction from the first substrate to the second substrate, and the second polarized light is along The second substrate is transferred to the first substrate; the first polarized light and the second polarized light are simultaneously irradiated to the mixture, so that the alignment material forms an alignment layer on the first substrate and the second substrate. The method of manufacturing a photovoltaic element according to claim 8, wherein the mixture further comprises a film forming material, the film forming material is a self-assembling polymer material, and the manufacturing method of the photovoltaic element further comprises: The self-assembled polymer material is naturally bonded to the first substrate and the second substrate to form a film formation layer on the first substrate and the second substrate, wherein the alignment layer and the film formation layer are located The optically anisotropic material is disposed between the first substrate and the second substrate, and the film forming layer is located between the alignment layer and the first substrate and the second substrate. The method of manufacturing a photovoltaic element according to claim 8, wherein the mixture further comprises a film forming material, and the method of manufacturing the photovoltaic element further comprises: heating the film forming material such that the film forming material is Forming a film formation layer on the first substrate and the second substrate, wherein the alignment layer and the film formation layer are located between the optical anisotropic material and the first substrate and the second substrate, and the film formation layer is located The alignment layer is between the first substrate and the second substrate. The method of manufacturing a photovoltaic element according to claim 8, wherein the mixture further comprises a film forming material, and the first polarized light and the second polarized light simultaneously illuminate the alignment material and the film forming material to The film forming material is at the first base Forming a film formation layer on the plate and the second substrate, wherein the polymerization rate of the film forming material is substantially greater than the polymerization rate of the alignment material under the irradiation of the first polarized light and the second polarized light, the alignment The layer and the film forming layer are located between the optically anisotropic material and the first substrate and the second substrate, and the film forming layer is located between the alignment layer and the first substrate and the second substrate. The method of manufacturing a photovoltaic element according to claim 8, wherein the mixture further comprises a film forming material, the absorption wavelength range of the film forming material is different from the absorption wavelength range of the alignment film material, and the photoelectric element is The manufacturing method further includes: providing a light beam, wherein the wavelength distribution range of the light beam is different from a wavelength distribution range of the first polarized light and a wavelength distribution range of the second polarized light; and causing the light beam to illuminate the film forming material, so that The film forming material absorbs the light beam to form the film forming layer, wherein the alignment layer and the film forming layer are located between the optical anisotropic material and the first substrate and the second substrate, and the film forming layer is located at the film forming layer The alignment layer is between the first substrate and the second substrate. A method of manufacturing a photovoltaic element, comprising: providing a two substrate and a mixture, the mixture comprising an optically anisotropic material and an alignment material; filling the mixture between the substrates; providing a polarized light; The amount of phase retardation of the directional material in the direction of the polarization of the polarization is substantially zero; and when the amount of phase retardation of the optically anisotropic material in the direction of the polarization of the polarization is substantially zero, the polar light is irradiated The alignment material is such that the alignment material forms an alignment layer on the substrates. A method of manufacturing a photovoltaic element according to claim 13, wherein The method for causing the amount of phase retardation of the optically anisotropic material to be substantially zero in the direction of the polarization of the polarized light comprises: applying a voltage to the plurality of optically anisotropic molecules of the optically anisotropic material to make each of the optical The optical axis of the heterogeneous molecule is substantially parallel to the direction of transmission of the polarized light, or the optically anisotropic material is heated such that the temperature of the optically anisotropic material is greater than or equal to the clearing point of the optically anisotropic material. The method of manufacturing a photovoltaic device according to claim 13, wherein the mixture further comprises a film forming material, the film forming material is a self-assembling polymer material, and the manufacturing method of the photovoltaic device further comprises: The self-assembling polymer material is naturally bonded to the substrates to form a film formation layer on the substrates, wherein the alignment layer and the film formation layer are located between the optical anisotropic material and the substrates. The film forming layer is located between the alignment layer and the substrates. The method of manufacturing a photovoltaic element according to claim 13, wherein the mixture further comprises a film forming material, and the method of manufacturing the photovoltaic element further comprises: heating the film forming material to make the film forming material A film forming layer is formed on the substrate, wherein the alignment layer and the film forming layer are located between the optical anisotropic material and the substrate, and the film forming layer is located between the alignment layer and the substrates. The method of manufacturing a photovoltaic device according to claim 13, wherein the mixture further comprises a film forming material, the polarized light simultaneously irradiating the alignment material and the film forming material, so that the film forming material is on the substrates. Forming a film formation layer, wherein the polymerization rate of the film forming material is substantially greater than the polymerization rate of the alignment material under the irradiation of the polarized light, the alignment layer and the film forming layer are located in the optical anisotropic material and Between the substrates, the film formation layer is located between the alignment layer and the substrates. A method of manufacturing a photovoltaic element according to claim 13, wherein The mixture further includes a film forming material, the absorption wavelength range of the film forming material is different from the absorption wavelength range of the alignment film material, and the method of manufacturing the photovoltaic element further comprises: providing a light beam, wherein the wavelength distribution of the polarized light The range is different from the wavelength distribution range of the light beam; and the light beam is irradiated to the film forming material, so that the film forming material absorbs the light beam to form the film forming layer, and the film forming material absorbs the light beam to form a film forming layer, The alignment layer and the film formation layer are located between the optically anisotropic material and the substrate, and the film formation layer is located between the alignment layer and the substrates.