CN103184483A - Tin electroplating solution - Google Patents

Tin electroplating solution Download PDF

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Publication number
CN103184483A
CN103184483A CN 201110458863 CN201110458863A CN103184483A CN 103184483 A CN103184483 A CN 103184483A CN 201110458863 CN201110458863 CN 201110458863 CN 201110458863 A CN201110458863 A CN 201110458863A CN 103184483 A CN103184483 A CN 103184483A
Authority
CN
China
Prior art keywords
tin
electroplating solution
formula
methylguanidine
balance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 201110458863
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Chinese (zh)
Inventor
赵春美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN 201110458863 priority Critical patent/CN103184483A/en
Publication of CN103184483A publication Critical patent/CN103184483A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a tin electroplating solution which is characterized in that a formula of the invention comprises 200 g/L-400 g/L of ethanesulfonic acid, 30 g/L-60 g/L of tin methanesulfonate, 1 g/L-5 g/L of silver hydroxyl propyl sulfonate, 50 g/L-150 g/L of methylguanidine, 20 g/L-50 g/L of sodium phosphate, 30 g/L-80 g/L of aminophenol, 5 g/L-15 g/L of chlorinated hexadecyl trimethylamine, 3 g/L-10 g/L of imidazole, and the balance being deionized water. The tin electroplating solution is reasonable in formula, can effectively overcome crystal whiskers produced by the tin-plating layer, with a plated layer having high bonding strength and good welding properties, and is suitable for electroplating tin of various electronic elements.

Description

A kind of plating tin liquor
Technical field
The present invention relates to a kind of plating tin liquor.
Background technology
Has good welding property after metal is zinc-plated, but having grown, the zinc-plated time can influence the product use by the growth whisker, can cause the equipment short trouble when serious, though adopt leaded tin coating effective but have and pollute harmfully, we need a kind ofly do not have whisker growth but the tin plating solution prescription of environmental protection.
Summary of the invention
The object of the invention is to provide a kind of prescription reasonable, does not produce tin palpus and the good plating tin liquor of weldability.
Technical solution of the present invention:
A kind of plating tin liquor is characterized in that: just its prescription is: ethyl sulfonic acid 200g/L-400g/L; Tin methane sulfonate 30g/L-60g/L; Hydroxy-propanesulfonic acid silver 1g/L-5g/L; Methylguanidine 50g/L-150g/L; Sodium phosphite 20g/L-50g/L; Amino-phenol 30g/L-80g/L; Chlorination hexadecyl trimethylamine 5g/L-15g/L imidazoles 3g/L-10g/L; Balance of deionized water.
The present invention fills a prescription rationally, and it is good effectively to overcome tin coating generation whisker and coat binding strength high welding performance, is applicable to the zinc-plated of various electronic components.
Embodiment:
Embodiment 1
A kind of plating tin liquor, just its prescription is: ethyl sulfonic acid 300g/L; Tin methane sulfonate 50g/L; Hydroxy-propanesulfonic acid silver 2g/L; Methylguanidine 100g/L; Sodium phosphite 30g/L; Amino-phenol 50g/L; Chlorination hexadecyl trimethylamine 10g/L imidazoles 5g/L fully mixes with balance of deionized water and gets final product.

Claims (1)

1. electroplate tin liquor for one kind, it is characterized in that: just its prescription is: ethyl sulfonic acid 200g/L-400g/L; Tin methane sulfonate 30g/L-60g/L; Hydroxy-propanesulfonic acid silver 1g/L-5g/L; Methylguanidine 50g/L-150g/L; Sodium phosphite 20g/L-50g/L; Amino-phenol 30g/L-80g/L; Chlorination hexadecyl trimethylamine 5g/L-15g/L imidazoles 3g/L-10g/L; Balance of deionized water.
CN 201110458863 2011-12-31 2011-12-31 Tin electroplating solution Pending CN103184483A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201110458863 CN103184483A (en) 2011-12-31 2011-12-31 Tin electroplating solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201110458863 CN103184483A (en) 2011-12-31 2011-12-31 Tin electroplating solution

Publications (1)

Publication Number Publication Date
CN103184483A true CN103184483A (en) 2013-07-03

Family

ID=48675920

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201110458863 Pending CN103184483A (en) 2011-12-31 2011-12-31 Tin electroplating solution

Country Status (1)

Country Link
CN (1) CN103184483A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104060307A (en) * 2014-06-30 2014-09-24 句容市博远电子有限公司 Pure tin electroplating solution for inhibiting growth of tin whiskers and application thereof
CN106757212A (en) * 2016-11-30 2017-05-31 深圳市创智成功科技有限公司 For the ELECTROPLATING Sn-Ag ALLOY solution of wafer-level packaging

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104060307A (en) * 2014-06-30 2014-09-24 句容市博远电子有限公司 Pure tin electroplating solution for inhibiting growth of tin whiskers and application thereof
CN106757212A (en) * 2016-11-30 2017-05-31 深圳市创智成功科技有限公司 For the ELECTROPLATING Sn-Ag ALLOY solution of wafer-level packaging

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Legal Events

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C06 Publication
PB01 Publication
C05 Deemed withdrawal (patent law before 1993)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20130703