CN103160174A - 抗指纹剂，应用该抗指纹剂进行表面处理的方法及制品 - Google Patents
抗指纹剂，应用该抗指纹剂进行表面处理的方法及制品 Download PDFInfo
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Abstract
一种抗指纹剂，该抗指纹剂的主要由聚四氟乙烯和硅烷溶液组成，所述聚四氟乙烯与硅烷溶液的体积比为0.5～0.8，所述硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成。本发明还提供一种应用该抗指纹剂进行表面处理的方法及制品。
Description
技术领域
本发明涉及一种抗指纹剂，应用该抗指纹剂进行表面处理的方法及制品。
背景技术
随着3C电子产品的使用越来越频繁，消费者对产品的外观也有了越来越高的要求。除了要求其色彩美观、手感舒适，还要求其表面具有较好的耐磨性、抗刮伤性以及抗指纹性。为了提高真空镀膜层表面的抗指纹性，现有技术采用真空镀膜技术形成的抗指纹层通常呈现出雾状，严重影响了真空镀膜产品高光的金属外观。
现有技术中还有通过在真空镀膜层上沉积聚四氟乙烯层，使真空镀膜产品具有良好的抗指纹性。但，聚四氟乙烯与金属基体、金属化合物镀覆的基体之间的结合力差，且聚四氟乙烯难以在低温下成膜。
发明内容
有鉴于此，有必要提供一种可解决上述问题的抗指纹剂。
同时，提供一种应用所述抗指纹剂进行表面处理的方法。
另，还提供一种经上述表面处理方法制得的制品。
一种抗指纹剂，该抗指纹剂的主要由聚四氟乙烯和硅烷溶液组成，所述聚四氟乙烯与硅烷溶液的体积比为0.5～0.8，所述硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成。
一种应用上述抗指纹剂进行表面处理的方法，包括如下步骤：
提供一基体，该基体表面的材质为金属或金属化合物；
提供抗指纹剂，该抗指纹剂主要由液态的聚四氟乙烯和硅烷溶液组成，聚四氟乙烯与所述硅烷溶液的体积比为0.5～0.8，该硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成；
采用浸涂的方式，以抗指纹剂为浸泡液，于所述基体上形成抗指纹层。
一种由经权利上述的表面处理的方法制得的制品，所述制品包括基体及形成于基体上的抗指纹层，形成该抗指纹层的抗指纹剂的主要由聚四氟乙烯和硅烷溶液，所述聚四氟乙烯与硅烷溶液的体积比0.5～0.8，所述硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成。
所述抗指纹层与所述基体之间结合力较好力。经由上述处理方法后制得的制品在保持基体的光亮的金属质感的外观的同时具有良好的抗指纹性、耐化学品性、耐溶剂性及耐磨性。另外，所述抗指纹剂简单易得；应该所述抗指纹剂进行表面处理的方法操作简单，对环境几乎没有污染。
具体实施方式
本发明一较佳实施方式的抗指纹剂的主要由液态的聚四氟乙烯和硅烷溶液组成。其中，所述聚四氟乙烯与硅烷溶液的体积比为0.5～0.8。
所述硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成。其中，甲基三乙氧基硅烷的体积百分含量为60％～63％、正硅酸乙酯的体积百分含量为2％～3％、无水乙醇的体积百分含量为2％～3％、去离子水的体积百分含量为25％～27％，稀硫酸的体积百分含量为4％～11％。配置所述硅烷溶液所采用的稀硫酸的质量百分含量为45％。
应用所述抗指纹剂进行表面处理的方法，包括如下步骤：
提供一基体，该基体的材质可为金属。所述金属可为铝合金、不锈钢或镁合金。该金属材质的基体的表面还可镀覆有金属化合物层或金属层。该基体还可为镀覆有金属化合物层、金属层的塑料或陶瓷基体。所述金属化合物可为铝、钛、铬、镁、锆及镍等金属元素中的至少一种与氧、碳、氮及磷等非金属元素中的至少一种的化合物。该金属化合物层可通过真空镀膜及化学气相沉积等方式形成。所述金属层可为铝、钛、铬、镁、锆及镍等材质的金属层。该金属层可通过真空镀膜、电镀等方式形成。
提供抗指纹剂。所述抗指纹剂主要由液态的聚四氟乙烯和硅烷溶液组成。其中，所述聚四氟乙烯与硅烷溶液的体积比为0.5～0.8。
所述抗指纹剂通过如下方法制得：
提供一硅烷溶液。该硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成。其中，甲基三乙氧基硅烷的体积百分含量为60％～63％、正硅酸乙酯的体积百分含量为2％～3％、无水乙醇2％～3％、去离子水的体积百分含量为25％～27％及稀硫酸的体积百分含量为4％-11％。配置所述硅烷溶液所采用的稀硫酸的质量百分含量为45％。
将液态的聚四氟乙烯与所述硅烷溶液以体积比为0.5～0.8的比例混合得到一混合液，搅拌均匀后静置30～40min；之后，对所述混合液进行过滤，以去除混合液中少量的悬浮的杂质，制得所述抗指纹剂。
采用浸涂的方式，在所述基体表面形成一抗指纹层。该抗指纹层通过如下方式形成：将所述基体完全置于抗指纹剂中浸泡20～30s后，将该基体于150～200℃的温度下烘烤30～45min，最终于所述基体上形成抗指纹层。所述抗指纹层的厚度为5～10μm。
一种经由上述表面处理方法制得的制品包括基体及形成于该基体上的抗指纹层。
所述基体的材质可为金属。所述金属可为铝合金、不锈钢或镁合金。该金属材质的基体的表面还可镀覆有金属化合物层或金属层。该基体还可为镀覆有金属化合物层、金属层的塑料或陶瓷基体。所述金属化合物可为铝、钛、铬、镁、锆及镍等金属元素中的至少一种与氧、碳、氮及磷等非金属元素中的至少一种的化合物。该金属化合物层可通过真空镀膜及化学气相沉积等方式形成。所述金属层可为铝、钛、铬、镁、锆及镍等材质的金属层。该金属层可通过真空镀膜、电镀等方式形成。
所述抗指纹层的厚度为5～10μm。
本发明应用所述抗指纹剂对基体进行表面处理的方法，通过采用含有甲基三乙氧基硅烷、正硅酸乙酯及聚四氟乙烯的抗指纹剂，于所述基体上形成抗指纹层。该抗指纹层与所述基体之间结合力较好。经由上述处理方法后制得的制品在保持基体光亮的金属质感的外观的同时，还具有良好的疏水性、耐化学品性、耐溶剂性及耐磨性。另外，所述抗指纹剂简单易得；应该所述抗指纹剂进行表面处理的方法操作简单，对环境几乎没有污染。
实施例1
提供一基体，该基体上依次形成有碳化铬层、氮化钛层。该碳化铬层、氮化钛层均通过真空镀膜的方式形成。
制备抗指纹剂：提供一硅烷溶液。该硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸。其中，甲基三乙氧基硅烷的体积百分含量为60％、正硅酸乙酯的体积百分含量为2％、无水乙醇2％、去离子水的体积百分含量为25％及稀硫酸的体积百分含量为5％。配置所述硅烷溶液所采用的稀硫酸的质量百分含量为45％。
将液态的聚四氟乙烯与所述硅烷溶液以体积比为0.6∶1的比例混合制得混合液，搅拌均匀后静置30min；之后，对所述混合液进行过滤，以去除混合液中少量的悬浮的杂质，制得所述抗指纹剂。
形成抗指纹层：将所述基体完全置于所述抗指纹剂中浸泡30s后，并将该基体在150℃的温度下烘烤45min，最终于所述基体上形成抗指纹层。所述抗指纹层的厚度为6μm。
实施例2
提供一基体，该基体与实施例1提供的基体相同。
制备抗指纹剂：提供一硅烷溶液。该硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸。其中，甲基三乙氧基硅烷的体积百分含量为63％、正硅酸乙酯的体积百分含量为3％、无水乙醇3％、去离子水的体积百分含量为26.5％及稀硫酸的体积百分含量为9％。配置所述硅烷溶液所采用的稀硫酸的质量百分含量为45％。
将液态的聚四氟乙烯与所述硅烷溶液以体积比为0.8∶1的比例混合制得混合液，搅拌均匀后静置40min；之后，对所述混合液进行过滤，以去除混合液中少量的悬浮的杂质，制得所述抗指纹剂。
形成抗指纹层：将所述基体完全置于在所述抗指纹剂中浸泡30s后，并将该基体在180℃的温度下烘烤50min，最终于所述基体上形成抗指纹层。所述抗指纹层的厚度为8μm。
实施例3
采用与实施例2相同的方式在基体上形成抗指纹层，与实施例2不同的是所述基体上形成有氮化锆层，代替所述碳化铬层和氮化钛层。所述氧化锆层通过真空镀膜的方式形成。
实施例4
采用与实施例2相同的方式在基体上形成抗指纹层，与实施例2不同的是所述基体上形成有镍层，代替所述碳化铬层和氮化钛层。所述镍层通过阳极氧化的方式形成。
实施例5
采用与实施例2相同的方式在基体上形成抗指纹层，与实施例2不同的是所述基体表面未形成有膜层。
对比例1
提供一基体，该基体与实施例1的基体相同。
形成聚四氟乙烯层：将所述基体完全置于在所述聚四氟乙烯溶液中浸泡30s后，并将该基体在150℃的温度下烘烤45min，最终于所述基体上形成抗指纹层。所述聚四氟乙烯溶液中，溶剂为无水乙醇，聚四氟乙烯的体积百分含量为60％。所述聚四氟乙烯层的厚度为10μm。
对比例2
提供一基体，该基体与实施例1的基体相同。
形成硅烷溶液抗指纹层：将所述基体完全置于所述硅烷溶液中浸泡30s后，并将该基体在180℃的温度下烘烤45min，最终于所述基体上形成硅烷溶液抗指纹层。
该硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸。其中，甲基三乙氧基硅烷的体积百分含量为57％、正硅酸乙酯的体积百分含量为3％、无水乙醇13％、去离子水的体积百分含量为20％，稀硫酸的体积百分含量为7％。配置所述硅烷溶液所采用的稀硫酸的质量百分含量为45％。
所述硅烷溶液抗指纹层的厚度为6μm。
性能测试
将实施例1-5制得的制品及对比例1、2处理后的基体进行疏水性测试、耐化学品测试、耐溶剂测试、附着力测试及耐磨性测试，具体测试方法及结果如下：
(1)疏水性测试
由实施例1-5制得的制品及对比例1、2处理后的基体表面的疏水性，参见表一。
表一
| 样品 | 疏水角 |
| 实施例1 | 150° |
| 实施例2 | 153° |
| 实施例3 | 153° |
| 实施例4 | 151° |
| 实施例5 | 150° |
| 对比例1 | 106° |
| 对比例2 | 68° |
可见，以本发明方法制得的制品具有超疏水性能。
(2)耐化学品测试
将护手霜，防晒霜，唇膏，粉底霜，杀虫剂及食用油分别涂覆在由实施例1-5制得的制品及经对比例1-2处理后的基体表面，并在室温下放置1天后，清洗掉制品及经对比例处理后的基体表面的上述化学品，观察其表面是否出现腐蚀、剥落等现象。上述化学品的品牌和型号参见表二。
表二
| 化学品 | 品牌 | 型号 |
| 护手霜 | 妮维雅细致美白护手霜 | Art No：84663 |
| 防晒霜 | 妮维雅防晒紧肤精华露 | Art No：85656 |
| 唇膏 | 嫣资莹润唇膏 | 07-XK-0003 |
| 粉底霜 | 玉兰油透白无痕粉底液 | OB-2 |
| 杀虫剂 | TEHO Hytty sgeeli | 64003740 |
| 食用油 | 金龙鱼 | 金龙鱼调和油 |
结果表明，由本发明实施例1-5的方法所制得的制品分别进行上述化学品的测试后，基体上的金属层/金属化合物层、抗指纹层均完好、未发生脱落、异色及点蚀现象。而，经对比例1、2处理后的表面的出现轻微的点蚀现象。可见，以本发明方法制得的制品具有良好的耐化学品性能。
(3)耐溶剂测试
分别采用60-90石油醚、异丙醇(纯度为99.7％)及人工汗液为溶剂，将被所述溶剂浸湿的棉布，以6N～12N的力于2分钟内在制品表面擦拭200次。
结果表明，由本发明实施例1-5的方法所制得的制品分别经60-90石油醚、异丙醇擦拭、人工汗液2h后表面未发生异色。而，经对比例1处理后的表面的出现轻微的点蚀现象，对比例2出现的点蚀现象较对比例1更为严重。
(4)附着力测试(ISO 2409标准)
根据ISO 2409标准进行附着力测试，其结果参见表三。
表三
可见，经实施例1-5制得的制品的抗指纹层具有良好附着力。
(5)耐刮擦测试
采用MCJ-01耐刮擦测试仪(济南格瑞特测试仪器有限公司提供)，在起始载荷为1N力的作用下，以10mm/秒的速度摩擦由实施例1-5制得的制品及经对比例1-2处理后的基体表面；并且每1秒增加1N的力，直至被测件表面出现刮痕为止，其结果参见表四。
表四
可见，经实施例1-5制得的制品具有较好的耐刮擦性。
Claims (10)
1.一种抗指纹剂，该抗指纹剂主要由液态的聚四氟乙烯和硅烷溶液组成，其特征在于：所述聚四氟乙烯与硅烷溶液的体积比为0.5～0.8，所述硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成。
2.如权利要求1所述的抗指纹剂，其特征在于：所述硅烷溶液中，甲基三乙氧基硅烷的体积百分含量为60％～63％、正硅酸乙酯的体积百分含量为2％～3％、无水乙醇的体积百分含量为2％～3％、去离子水的体积百分含量为25％～27％、稀硫酸的体积百分含量为4％～11％；配置所述硅烷溶液所采用的稀硫酸的质量百分含量为45％。
3.一种应用权利要求1-2中任一项的抗指纹剂进行表面处理的方法，包括如下步骤：
提供一基体，该基体表面的材质为金属或金属化合物；
提供抗指纹剂，该抗指纹剂主要由液态的聚四氟乙烯和硅烷溶液组成，聚四氟乙烯与所述硅烷溶液的体积比为0.5～0.8，该硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成；
采用浸涂的方式，以抗指纹剂为浸泡液，于所述基体上形成抗指纹层。
4.如权利要求3所述的表面处理的方法，其特征在于：所述硅烷溶液中，甲基三乙氧基硅烷的体积百分含量为60％～63％、正硅酸乙酯的体积百分含量为2％～3％、无水乙醇的体积百分含量为2％～3％、去离子水的体积百分含量为25％～27％及稀硫酸的体积百分含量为4％～11％，配置所述硅烷溶液所采用的稀硫酸的质量百分含量为45％。
5.如权利要求3或4所述的表面处理的方法，其特征在于：所述抗指纹剂通过如下方式获得：将聚四氟乙烯与硅烷溶液以体积比为0.5～0.8的比例混合制得混合液，搅拌均匀后静置30～40min；之后，对所述混合液进行过滤，制得所述抗指纹剂。
6.如权利要求3或4所述的表面处理的方法，其特征在于：所述抗指纹层通过如下方式制得：将所述基体置于在所述抗指纹剂中浸泡20～30s，再将该基体在150～200℃的温度下烘烤30～45min。
7.一种由经权利要求3-6中任一项所述的表面处理的方法制得的制品，该制品包括基体及形成于基体上的抗指纹层，其特征在于：形成该抗指纹层的抗指纹剂的主要由聚四氟乙烯和硅烷溶液组成，所述聚四氟乙烯与硅烷溶液的体积比0.5～0.8，所述硅烷溶液的主要由甲基三乙氧基硅烷、正硅酸乙酯、无水乙醇、去离子水及稀硫酸组成。
8.如权利要求7所述的制品，其特征在于：所述抗指纹层的厚度为5～10μm。
9.如权利要求7或8所述的制品，其特征在于：所述基体为铝合金、不锈钢或镁合金。
10.如权利要求7或8所述的制品，其特征在于：所述基体为镀覆有金属化合物层、金属层的塑料、陶瓷或金属基材。
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