CN103132012B - A kind of preparation method of vacuum plating - Google Patents
A kind of preparation method of vacuum plating Download PDFInfo
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- CN103132012B CN103132012B CN201110389491.XA CN201110389491A CN103132012B CN 103132012 B CN103132012 B CN 103132012B CN 201110389491 A CN201110389491 A CN 201110389491A CN 103132012 B CN103132012 B CN 103132012B
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Abstract
The present invention relates to technical field of material surface treatment, particularly relate to a kind of preparation method of vacuum plating.It comprises the following steps: a. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 3 ~ 20Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 2500 ~ 4000V of high-tension transformer, during electric current 1 ~ 6A, air is ionized to plasma under the situation of glow discharge, and it is 1 ~ 5 minute that workpiece carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply; B. vacuum plating: by the workpiece after high-pressure ion cleaning activation, carry out vacuum plating process in vacuum chamber, prepare metal coating on surface.Vacuum plating prepared by this law, it can destroy the weave construction of nonpolar class material surface, improves surface energy and the performance of product.
Description
Technical field
The present invention relates to technical field of material surface treatment, particularly relate to a kind of preparation method of vacuum plating.
Background technology
Vacuum plating can obtain film at the alloy of the deposited on silicon metals such as metal, semi-conductor, isolator, plastics, paper, fabric, semi-conductor, isolator, heterogeneity ratio, compound and part organic polymer etc., and its range of application is extremely wide.
At present, vacuum plating will obtain good sticking power, often needs to carry out primary coat before plated film.No matter be adopt spraying or adopt dip-coating during primary coat construction, all need plated film oil.And the price of plated film oil costly, greatly increase production cost.Particularly the surfactivity of nonpolar class material is poor, and surface adhesion force is extremely low, needs to be coated with the surfactivity that plated film oil increases material.
Summary of the invention
The invention provides a kind of preparation method of vacuum plating, it can improve surface energy and the performance of nonpolar class material effectively.By this technique, the nonpolar weave construction of nonpolar class material surface can be destroyed, form the surface structure of novel band polarity, improve activity and the sticking power of material surface widely, improve the performance of product.
A preparation method for vacuum plating, it comprises the following steps:
A. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 3 ~ 20Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 2500 ~ 4000V of high-tension transformer, during electric current 1 ~ 6A, air is ionized to plasma under the situation of glow discharge, and it is 1 ~ 5 minute that workpiece carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply;
B. vacuum plating: by the workpiece after high-pressure ion cleaning activation, carry out vacuum plating process in vacuum chamber, prepare metal coating on surface.
Wherein, the vacuum plating step of step b is: vacuumize, and vacuum tightness is 4 × 10
-2~ 5 × 10
-2during Pa, open vacuum plating power supply, vaporization voltage is 0 ~ 5V, and electric current is 0 ~ 2000A, and the plated film time is 25-45 second.
Wherein, when the pressure-controlling of the vacuum chamber of step a is 5 ~ 15Pa, stop vacuumizing.
Wherein, when the pressure-controlling of the vacuum chamber of step a is 10Pa, stop vacuumizing.
Wherein, the output voltage control of the high-tension transformer of step a is 3000 ~ 3500V, and current control is 2 ~ 4A.
Wherein, the output voltage control of the high-tension transformer of step a is 3000V, and current control is 3A.
Wherein, the Bombardment and cleaning soak time of step a is 2 ~ 4 minutes.
Wherein, the Bombardment and cleaning soak time of step a is 2.5 minutes.
The invention has the beneficial effects as follows: it comprises the following steps: a. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 3 ~ 20Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 2500 ~ 4000V of high-tension transformer, during electric current 1 ~ 6A, air is ionized to plasma under the situation of glow discharge, and it is 1 ~ 5 minute that workpiece carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply; B. vacuum plating: by the workpiece after high-pressure ion cleaning activation, carry out vacuum plating process in vacuum chamber, prepare metal coating on surface.Vacuum plating prepared by this law, it can destroy the weave construction of nonpolar class material surface, forms the surface structure of novel band polarity, improves activity and the sticking power of material surface widely, improves surface energy and the performance of product.And, do not need to carry out surface preparation and primary coat to workpiece, reduce the working hour, do not need to use painting plated film oil, greatly reduce production cost.
Embodiment
Below in conjunction with embodiment, the invention of this reality is further detailed.
Embodiment 1.
A preparation method for vacuum plating, comprises the steps:
A. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 3Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 2500V of high-tension transformer, during electric current 1A, air is ionized to plasma under the situation of glow discharge, and it is 1 minute that workpiece carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply;
B. vacuum plating: vacuumize, vacuum tightness is 4 × 10
-2during Pa, open vacuum plating power supply, vaporization voltage is 0.5V, and electric current is 10A, and the plated film time is 25 seconds.
Embodiment 2.
A preparation method for vacuum plating, comprises the steps:
A. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 20Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 4000V of high-tension transformer, during electric current 6A, air is ionized to plasma under the situation of glow discharge, and it is 5 minutes that workpiece carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply;
B. vacuum plating: vacuumize, vacuum tightness is 5 × 10
-2during Pa, open vacuum plating power supply, vaporization voltage is 5V, and electric current is 2000A, and the plated film time is 45 seconds.
Embodiment 3.
A preparation method for vacuum plating, comprises the steps:
A. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 10Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 3000V of high-tension transformer, during electric current 3A, air is ionized to plasma under the situation of glow discharge, and it is 2.5 minutes that workpiece carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply;
B. vacuum plating: vacuumize, vacuum tightness is 4.5 × 10
-2during Pa, open vacuum plating power supply, vaporization voltage is 2V, and electric current is 1000A, and the plated film time is 35 seconds.
Embodiment 4.
A preparation method for vacuum plating, comprises the steps:
A. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 5Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 3000V of high-tension transformer, during electric current 2A, air is ionized to plasma under the situation of glow discharge, and it is 2 minutes that workpiece carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply;
B. vacuum plating: vacuumize, vacuum tightness is 4 × 10
-2during Pa, open vacuum plating power supply, vaporization voltage is 3V, and electric current is 1500A, and the plated film time is 30 seconds.
Embodiment 5.
A preparation method for vacuum plating, comprises the steps:
A. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 15Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 3500V of high-tension transformer, during electric current 4A, air is ionized to plasma under the situation of glow discharge, and it is 4 minutes that workpiece carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply;
B. vacuum plating: vacuumize, vacuum tightness is 5 × 10
-2during Pa, open vacuum plating power supply, vaporization voltage is 4V, and electric current is 500A, and the plated film time is 40 seconds.
After embodiment 1 ~ 5 high-pressure ion cleaning activation, workpiece surface tension test result is as following table 1.
The workpiece surface tension test result table of table 1 embodiment 1 ~ 5
| Embodiment 1 | Embodiment 2 | Embodiment 3 | Embodiment 4 | Embodiment 5 | |
| Surface tension (dyn/cm) | 82 | 83 | 95 | 87 | 85 |
Above content is only preferred embodiment of the present invention, and for those of ordinary skill in the art, according to thought of the present invention, all will change in specific embodiments and applications, this description should not be construed as limitation of the present invention.
Claims (2)
1. for a preparation method for the vacuum plating of non-polar material, it is characterized in that: it comprises the following steps:
A. high-pressure ion cleaning activation: vacuum chamber put into by workpiece, vacuumize, when the pressure of vacuum chamber is 10Pa, stopping vacuumizes, and starts high-tension transformer, as the output voltage 3000 ~ 3500V of high-tension transformer, during electric current 2 ~ 4A, air is ionized to plasma under the situation of glow discharge, and it is 2.5 minutes that the workpiece of non-polar material carries out Bombardment and cleaning soak time through plasma body, closes bombardment power supply;
B. vacuum plating: by the workpiece after high-pressure ion cleaning activation, carry out vacuum plating process in vacuum chamber, prepare metal coating on surface; The vacuum plating step of described step b is: vacuumize, and vacuum tightness is 4 × 10
-2~ 5 × 10
-2during Pa, open vacuum plating power supply, vaporization voltage is 0 ~ 5V, and electric current is 0 ~ 2000A, and the plated film time is 25-45 second.
2. the preparation method of a kind of vacuum plating for non-polar material according to claim 1, is characterized in that: the output voltage control of the high-tension transformer of described step a is 3000V, and current control is 3A.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110389491.XA CN103132012B (en) | 2011-11-30 | 2011-11-30 | A kind of preparation method of vacuum plating |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110389491.XA CN103132012B (en) | 2011-11-30 | 2011-11-30 | A kind of preparation method of vacuum plating |
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| Publication Number | Publication Date |
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| CN103132012A CN103132012A (en) | 2013-06-05 |
| CN103132012B true CN103132012B (en) | 2016-03-23 |
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| CN201110389491.XA Expired - Fee Related CN103132012B (en) | 2011-11-30 | 2011-11-30 | A kind of preparation method of vacuum plating |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108385063B (en) * | 2018-03-30 | 2020-01-14 | 江西泽发光电有限公司 | Coating method for quicksand texture ice drilling black |
| CN114369798A (en) * | 2021-12-14 | 2022-04-19 | 核工业西南物理研究院 | Film plating method for low-temperature vacuum ion plating of plastic surface |
| CN114574828A (en) * | 2022-03-03 | 2022-06-03 | 佛山市高明区捷丰裕金属制品有限公司 | Preparation process of champagne golden coating film |
| CN114561618A (en) * | 2022-03-03 | 2022-05-31 | 佛山市高明区捷丰裕金属制品有限公司 | Preparation process of titanium gray coating film |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101240423A (en) * | 2007-12-30 | 2008-08-13 | 兰州大成自动化工程有限公司 | Automobile wheel hub surface vacuum coating treatment technique |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101240423A (en) * | 2007-12-30 | 2008-08-13 | 兰州大成自动化工程有限公司 | Automobile wheel hub surface vacuum coating treatment technique |
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| CN103132012A (en) | 2013-06-05 |
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