CN103097569A - Vacuum film formation device - Google Patents
Vacuum film formation device Download PDFInfo
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- CN103097569A CN103097569A CN2011800428767A CN201180042876A CN103097569A CN 103097569 A CN103097569 A CN 103097569A CN 2011800428767 A CN2011800428767 A CN 2011800428767A CN 201180042876 A CN201180042876 A CN 201180042876A CN 103097569 A CN103097569 A CN 103097569A
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- film formation
- formation apparatus
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- Engineering & Computer Science (AREA)
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
This vacuum film formation device (100) forms a plurality of substrates (20) in a vacuum state, and comprises: a plurality of substrate holders (23) for supporting a substrate; a substrate unit (2) for supporting and conveying the plurality of substrate holders (23); and a vacuum chamber (1) for forming a vacuum state, the vacuum chamber having a conveyance entrance (10) via which the substrate unit (2) is conveyed in and out, and a conveyance entrance door (11) for opening and closing the conveyance entrance (10). The substrate unit (2) supports the plurality of substrate holders (23) so as to be arranged in-line with the conveyance direction in relation to the vacuum chamber (1), and the conveyance entrance (10) is formed in accordance with the dimensions of the substrate unit (2). The vacuum film formation device (100) can thereby reduce the time required to discharge moisture and minimize the time required for the film formation process.
Description
Technical field
The present invention relates to make the vacuum film formation apparatus of a plurality of base material film forming under vacuum state.
Background technology
In recent years, applied film is made various goods.As the goods of applied film, for example enumerate the example of the reverberator that is used in lamps for vehicle.Keep base material in the vacuum tank that vacuum film formation apparatus possesses, and the film forming cell operation that makes evaporation source etc. can be made this reverberator to form film on base material with this.More particularly, reverberator is folded catoptrical reflectance coating and makes for the protection of the protective membrane of this reflectance coating at this layers on substrates.Stacked protective membrane on the reflectance coating that is consisted of by metallic substance (for example aluminium) like this, with this can the inhibitory reflex film deteriorated along with the time.
Vacuum film formation apparatus as the manufacturing that is used in like this reverberator, the inner surface side that discloses at the door of vacuum tank possesses into film unit and base material keeper, and this becomes film unit and base material keeper to be configured in the vacuum film formation apparatus (for example patent documentation 1,2) of the structure in the inner space of vacuum tank when forming this and closing.
For example, in patent documentation 1,2, disclosed vacuum film formation apparatus forms symmetrical door is set on a vacuum tank, the structure of base material keeper etc. is installed on this, and to during being arranged at that base material on this implements that film forming processes, can carry out the dismounting of base material etc. at the door of closing a side on the opposing party's door.
The prior art document:
Patent documentation 1: the international volume that discloses No. 2009/084408;
Patent documentation 2: No. 4246570 communique of Japan's special permission.
Summary of the invention
The problem that invention will solve:
But, exist film forming to process long problem of required time in above-mentioned prior art.
More particularly, patent documentation 1,2 vacuum film formation apparatus form at the door (first) of closing a side and to (during several minutes of the batch processing time) during being arranged at that base material on this implements that film forming processes, the opposing party's door (second) is in the state in the air (extraneous air) that is exposed to the vacuum tank outside.
Here, the operation vacuum film formation apparatus, when for example carrying out the manufacturing of reverberator as above, the face (vacuum tank inwall side) of a side of the part of the formation vacuum tank inwall of door, the face that namely is provided with a side of base material is covered by filmogen.This vacuum tank inwall side becomes the state that is very easy to adsorption moisture when being covered by filmogen, and with this face be exposed in extraneous air time accordingly the water adsorption amount increase.During the vacuum tank inwall side adsorption moisture of door, the discharge of moisture needs the time, and the batch processing time is long like this.
Therefore, in order to suppress the adsorptive capacity of moisture, the vacuum tank inwall side of the door that need to reduce to be covered by filmogen is exposed to the time in extraneous air.
But, in patent documentation 1,2 vacuum film formation apparatus, close first carry out that film forming processes during, second is exposed in extraneous air and adsorption moisture.And, complete when the film forming that is arranged at the base material on first is processed, open this and carry out the dismounting etc. of the base material of film forming, close simultaneously second, carry out the film forming that is arranged at the base material on this and process.At this moment, second has adsorbed more moisture, is therefore further lengthened in the film forming treatment time.
Again, the surface-area of door depends on the tool size of base material and is disposed at base material quantity on door etc., and surface-area is larger, and the adsorptive capacity of moisture more increases.
Like this, in patent documentation 1,2 disclosed vacuum film formation apparatus, due to the structure that is configuration base material etc. on door, so during several minutes of batch processing time, a side door is exposed in extraneous air, and the water adsorption amount increases.Again, in order effectively to configure base material, the surface-area of door increases, and result is that the water adsorption amount increases.
Therefore, in patent documentation 1,2 disclosed vacuum film formation apparatus, the time that the moisture of absorption need to be discharged, thus film forming is processed required time lengthening.
The present invention puts in view of the above problems and forms, and its purpose is to provide the discharge required time that reduces moisture to process the vacuum film formation apparatus of required time can suppress film forming.
The means of dealing with problems:
Vacuum film formation apparatus according to the present invention be in order to address the above problem under vacuum state to the vacuum film formation apparatus of a plurality of base material film forming, possess: a plurality of support sections that are used for supporting described base material; Support and carry the carrying unit of described a plurality of support sections; And have be used to the peristome of moving into and take out of described carrying unit and the door section that is used for opening and closing this peristome, and be used to form the vacuum tank of vacuum state; Described a plurality of support sections are supported so that described a plurality of support section is configuring in upright arrangemently in described carrying unit on the carrying direction of described vacuum tank; Described peristome forms according to the size of described carrying unit.
Here, base material refers to become the member of film forming object, such as the example of enumerating formed body with specific shape moulding etc.
According to said structure, because vacuum tank possesses peristome and door section, therefore by this peristome, support the carrying unit of support section to move into to this vacuum tank, perhaps can take out of from vacuum tank.
Again, the carrying unit configures in upright arrangemently and supports a plurality of support sections in carrying on direction, and therefore the size of this carrying unit depends on the size of each support section that supports.That is, the size of the sectional area when carrying perpendicular direction ground cuts and a support section is corresponding with the carrying unit.
Here, the opening size of peristome is to form according to the size of carrying the unit.That is, the opening size of peristome is to make a support section being held in the carrying unit from the size of vacuum tank turnover, more particularly, becomes the sectional area when carrying unit and carrying perpendicular direction ground are cut.
Again, the size that be used for to open and close the door section of this peristome also reduces together with the opening size of peristome as far as possible.That is, reduce as far as possible the surface-area of a section.
But the vacuum tank inwall side of door section is covered by the filmogen that produces when the base material film forming is processed, thereby is in the state that is very easy to adsorption moisture.
In vacuum film formation apparatus of the present invention, the vacuum tank inwall side of door section is exposed to during time in extraneous air only carries unit turnover vacuum tank.That is, as disclosed vacuum film formation apparatus in patent documentation 1,2, do not become the state of a section (door) in being exposed to extraneous air during the film forming treatment time, and can reduce the water adsorption amount.
In addition, reduce as far as possible as mentioned above the surface-area of a section, therefore can reduce an amount of moisture of section's absorption.
Like this, in vacuum film formation apparatus of the present invention, can suppress an amount of moisture of section's absorption.
Therefore, the vacuum film formation apparatus performance minimizing moisture required time of discharge according to the present invention is suppressed the effect that film forming is processed the time that spends.
Again, vacuum film formation apparatus according to the present invention is in said structure, and described carrying unit also can form possesses the heating evaporation film forming material, is used for the more than one evaporation source that forms film on the base material of described support section being held in; Described support section and described evaporation source configure on described carrying direction in upright arrangemently, and set the structure of this evaporation source between this support section.
According to said structure, because a plurality of support sections configure in upright arrangemently, therefore can configure support section on the carrying direction for carrying the unit on the carrying direction in upright arrangemently.Again, possess evaporation source between support section, therefore in the vacuum tank that forms vacuum state, by method of evaporating can be on the base material of being supported by the support section that clips evaporation source film forming.
Again, vacuum film formation apparatus according to the present invention is in said structure, and described support section also can form the structure that base material is supported in rotation freely.
According to said structure, because base material is supported in support section rotation freely, so film forming makes the base material rotation when processing, and processes thereby can implement equably film forming on whole base material.
Again, vacuum film formation apparatus according to the present invention also can possess and load described carrying unit in said structure, and the transfer table that can move this on horizontal plane carry the unit on the direction different from described carrying direction.
According to said structure, owing to possessing transfer table, therefore can will carry single element move to another place by this transfer table, simultaneously with the front of new carrying single element move to vacuum tank, and carry to vacuum tank.That is the switching of the carrying unit that, can effectively carry out moving into to vacuum tank.
Again, vacuum film formation apparatus according to the present invention is in said structure, and described door section also can form with respect to described peristome and move left and right, thereby opens and closes the structure of this peristome.
Again, vacuum film formation apparatus according to the present invention is in said structure, and described door section also can form sidepiece on one side and engage with described vacuum tank by hinge, and draws the structure of the described peristome of arc ground switching take this hinge as axle.
The invention effect:
The present invention consists of as described above like that, discharges the required time and can suppress the effect that film forming is processed the time of cost thereby performance reduces moisture.
Description of drawings
Fig. 1 is the vertical view that illustrates according to an example of the schematic configuration of the vacuum film formation apparatus of this example;
Fig. 2 is according to process the block diagram of an example of relevant structure in the vacuum film formation apparatus of this example to vacuum exhaust;
Fig. 3 is according to process the block diagram of an example of relevant structure in the vacuum film formation apparatus of this example to vacuum exhaust;
Fig. 4 is the figure of an example of the configuration of base material in the base material unit of schematically illustrated variation according to this example;
Fig. 5 is the figure of an example of the configuration of base material in the base material unit of schematically illustrated variation according to this example.
Embodiment
Below, illustrate referring to the drawings preferred example of the present invention.In addition, also the description thereof will be omitted to be marked with identical reference symbol for identical or corresponding member of formation below in institute's drawings attached.
(structure of vacuum film formation apparatus)
At first, with reference to the structure of Fig. 1 explanation according to the vacuum film formation apparatus 100 of this example.Fig. 1 is the vertical view that illustrates according to an example of the schematic configuration of the vacuum film formation apparatus 100 of this example.
In this example; illustrate use as the resin-formed body of the reverberator of the formation headlamp of base material 20; and in a vacuum, carry out successively reflectance coating that the evaporating film by aluminium consists of and the batch type film deposition system of the film forming of the protective membrane that consisted of by synthetic resins on the surface of this base material 20.
As shown in Figure 1, vacuum film formation apparatus 100 is to possess vacuum tank 1, base material unit (carrying unit) 2, exhaust unit 4, common pedestal 5 and carrying pedestal 6 and the structure of formation.
Vacuum tank 1 is the gas tight container for the state (vacuum) lower than pressure on every side of section's formation within it, and forms roughly cubes in this example.But the shape of vacuum tank 1 is not limited to such cubes, gets final product so long as can form the shape of the vacuum state of hope.Again, vacuum tank 1 has and can make moving into mouthful (peristome) 10, and being used for carrying out that this moves into mouthfuls 10 switching removes entrance door (door section) 11 of base material unit 2 turnover.In this example, remove entrance door 11 and be set to sliding door, horizontally slip and can open and close with this with respect to moving into mouthfuls 10.Again, close when removing entrance door 11, moving into mouthfuls 10 and remove on the contact part of entrance door 11 and containment member (not illustrating) is installed to guarantee stopping property.
In addition, although remove entrance door 11 for sliding door, being not limited to this, can be also that the sidepiece of removing one side of entrance door 11 engages with vacuum tank 1 by hinge, and can be the hinged door that axle draws arc ground switching with this hinge.
In this example, be provided with a side of moving into mouth 10 and be called the front in vacuum tank 1, the face relative with it is called the back side, and the face of the left and right that is connected with the front is called left surface, right flank, and the face on top is called upper surface.
In addition, vacuum tank 1 possesses plasma discharge electrode 12 as shown in Figure 1 on the left surface of its face shaping.This plasma discharge electrode 12 is when carrying out film forming by plasma polymerization to being configured in base material 20 in vacuum tank 1, is used for making the electrode of plasma discharge.
Exhaust unit 4 is for the inside of vacuum tank 1 being carried out the unit of vacuum exhaust, and it possesses backing vacuum pump (lobe pump (roots pump) 31 and oil rotary pump 32) and high-vacuum pump (oil diffusion pump 33 and cold-trap (cool trap) 34) and consists of.Again, in order to control the circulation of the air between these various pumps and vacuum tank 1, and possess main valve 13, slightly take out (roughing vacuum) valve 14, fore line valve (fore line valve) 15, vent valve (vent valve) 16 and gate valve (gate valve) 17.In addition, in Fig. 1, because considering the big or small limited of paper, not shown gate valve 17 and cold-trap 34.The below describes the explanation of other valves about processing relevant vacuum tank 1, this exhaust unit 4 to vacuum exhaust and comprising the main valve 13 of the upper surface that is arranged at vacuum tank 1 in Fig. 1 in detail.
In addition, above-mentioned vacuum tank 1 and exhaust unit 4 prop up together and are held in common pedestal 5.
That is, on the surface of carrying pedestal 6, be provided with the first track 51 on the direction (changing to direction) of the carrying perpendicular direction of the vacuum tank 1 of base material unit 2.And, by by the first track 51 guiding, transfer table 25 being moved, can make the base material unit 2 that is loaded on transfer table 25 to changing to direction, namely move left and right with respect to moving into mouthfuls 10.
In addition, be provided with the second track 52 along carrying direction (move into direction or take out of direction) on transfer table 25.Again, also be provided with track in the inside of vacuum tank 1 to be connected with this second track 52, base material unit 2 is upper mobile by the track (vacuum tank track 53) in this second track 52 and vacuum tank 1, can be from vacuum tank 1 turnover.
In addition, in this example, transfer table 25 form with the direction of carrying perpendicular direction on mobile structure, but travel direction is not limited to this, if from the different direction of carrying direction on move so that the different substrate materials unit 2 that is loaded on transfer table 25 can alternately be moved into and take out of to vacuum tank 1 respectively.
As mentioned above, movably base material unit 2 possesses the base material support (support section) 23 that keeps base material 20, the support pedestal 24 that is configured in evaporation source 21, support base material support 23 and evaporation source 21 between base material support 23 as shown in Figure 1.
(processing relevant structure to vacuum exhaust in vacuum film formation apparatus)
Form in the vacuum tank 1 of vacuum state according to the vacuum film formation apparatus 100 of this example, carry out the structure of the film forming such as aluminium film, protective membrane on base material 20.Therefore, form when disposing base material 20 in vacuum tank 1 according to the vacuum film formation apparatus 100 of this example, carry out that vacuum exhaust is processed so that this vacuum tank 1 inside reaches the structure of vacuum.Below, process relevant structure with reference to Fig. 2, Fig. 3 explanation to this vacuum exhaust.Fig. 2, Fig. 3 are according to process the block diagram of an example of relevant structure in the vacuum film formation apparatus 100 of this example to vacuum exhaust.
As shown in Figures 2 and 3, exhaust unit 4 forms the structure of possess backing vacuum pump (lobe pump 31 and oil rotary pump 32) and high-vacuum pump (oil diffusion pump 33 and cold-trap 34).In order to control the circulation of the air between these various pumps and vacuum tank 1, possess main valve 13, slightly take out valve 14, fore line valve 15, vent valve 16 and gate valve 17 again.
More particularly, main valve 13 is arranged in exhaust channel between the venting port that is formed on vacuum tank 1 and oil diffusion pump 33, and controls the switching of this exhaust channel.Slightly take out valve 14 and control the switching of the pipe arrangement between vacuum tank 1 and backing vacuum pump (lobe pump 31 and oil rotary pump 32) when carrying out thick exhaust.Again, fore line valve 15 is controlled the switching of the pipe arrangement between oil diffusion pump 33 and backing vacuum pump (especially lobe pump 31).Vent valve 16 is controlled the switching of the pipe arrangement that is communicated with vacuum tanks 1 and extraneous air and arranges.Gate valve 17 is controlled the switching of the pipe arrangement between vacuum tank 1 and cold-trap 34.
Form for vacuum tank 1 inside is vented to vacuum by normal atmosphere according to the vacuum film formation apparatus 100 of this example, and be divided into thick exhaust and high vacuum exhaustion to carry out the structure of exhaust interimly.
At first, by the backing vacuum pump of continuous operation oil rotary pump 32 and lobe pump 31, until carry out exhaust reach the operating pressure of high-vacuum pump from normal atmosphere till.In addition, oil rotary pump 32 form rotor will be by the vacuum pump of the emptying structure in oil-tightening space during once.Again, lobe pump 31 is arranged between vacuum tank 1 and oil rotary pump 32, also brings into play the function of force (forcing) pump (booster pump).
In the stage of this thick exhaust, main valve 13, fore line valve 15, vent valve 16 and gate valve 17 are closed, and only slightly take out valve 14 and are in open mode.And, carry out exhaust (thick exhaust) by oil rotary pump 32 and lobe pump 31, until till vacuum tank 1 inside reaches the operating pressure of high-vacuum pump from normal atmosphere.
When vacuum tank 1 inside reached the operating pressure of high-vacuum pump, the valve 14 of slightly taking out of open mode was closed as shown in Figure 3, replaces, and opens main valve 13, fore line valve 15 and gate valve 17.By means of this, vacuum tank 1 and oil diffusion pump 33 are communicated with, and oil diffusion pump 33 and backing vacuum pump (lobe pump 31 and oil rotary pump 32) connection.In addition, vacuum tank 1 and cold-trap 34 are communicated with.
And, move continuously oil diffusion pump 33, backing vacuum pump (lobe pump 31 and oil rotary pump 32) and cold-trap 34, with this vacuum exhaust to the vacuum territory that reaches regulation.In addition, oil diffusion pump 33 heated oil to be forming steam, and spray this steam from narrow gap, take away together gas molecule with work by oil molecule.Again, cold-trap 34 captures the water vapor that is present in vacuum tank 1.
When vacuum tank 1 inside reaches the vacuum tightness of regulation, carry out the film forming of base material 20 is processed.In the vacuum film formation apparatus 100 according to this example, adopt vacuum evaporation method in order to form reflectance coating on base material 20.That is, use the evaporation source 21 that is configured between base material support 23 to form reflectance coating on the base material 20 that is fixed in base material support 23.In addition, the rotation centered by the axial region of base material support 23 in vacuum tank 1 of base material 20 this moment is by means of this surface uniform ground formation reflectance coating at base material 20.
After reflectance coating forms, form protective membrane on this reflectance coating.In the formation operation of this protective membrane, form resin molding by Plasma Polymerization on the surface of base material 20.At this moment, base material 20 is also transferred the surface uniform ground formation protective membrane (resin molding) at base material 20 certainly in vacuum tank 1.
Like this, complete when the film forming of the regulation of base material 20 is processed, main valve 13, fore line valve 15 and gate valve 17 are closed, and vent valve 16 is opened.By means of this, the pressure in vacuum tank 1 can turn back to normal atmosphere.
Afterwards, open and remove entrance door 11, take out of the base material unit 2 of completing processing from vacuum tank 1, the base material unit 2 that replaces and move into other preparation.Like this, by removing the switching of entrance door 11, carry out the replacing of base material unit 2.
(base material unit move into and take out of processing)
Then, process relevant structure about above-mentioned base material unit 2 to moving into and take out of referring again to Fig. 1 explanation.
On base material unit 2, along the carrying direction to vacuum tank 1, dispose two base material supports 23 that clip evaporation source 21 respectively in upright arrangemently.This base material unit 2 forms and is loaded in as mentioned above on the second track 52 that is arranged on transfer table 25, and can be to the structure of vacuum tank 1 turnover by these second track, 52 guiding.By means of this, the operating personnel can move into base material unit 2 to vacuum tank 1, perhaps takes out of the base material unit 2 that is contained in vacuum tank 1.
Again, transfer table 25 is loaded on the first track 51 that is arranged on carrying pedestal 6.This first track 51 is set to extending on direction substantially vertical on horizontal plane with the second track 52.Therefore, transfer table 25 can upward move on the surface of carrying pedestal 6 in the direction (change to direction) substantially vertical with the carrying direction.
, in this example, be provided with transfer table 25 on the surface of carrying pedestal 6 here, and be mounted with respectively two base material unit 2 on transfer table 25.Therefore, in two base material unit 2, make a direction change to direction and slide to arrive corresponding to the position of moving into mouthfuls 10.And, afterwards, can move into this base material unit 2 through sliding in the vacuum tank 1 along the carrying direction.
In addition, base material unit 2 after film forming is processed moves to prescribed position on transfer table 25 from vacuum tank 1, and with carrying pedestal 6, transfer table 25 is slided to changing to direction, thereby be that the base material unit 2 that makes that film forming not processes is positioned at corresponding to the position of moving into mouthfuls 10 specifically.
By forming such structure, can be in a side base material unit 2 being implemented the process that film forming process, the base material unit 2 dismounting base materials 20 after processing from the opposing party's film forming, and change the new base material 20 that film forming is not processed into.
Here, in base material unit 2, two base material supports 23 clip evaporation source 21 and configure respectively along the carrying direction for vacuum tank 1.That is, the order according to base material support 23, evaporation source 21, base material support 23 configures on the carrying direction in upright arrangemently.
Therefore, when overlooking base material unit 2, the carrying direction is for than length direction and corresponding with the width of the base material unit 2 of the direction of carrying perpendicular direction and size that base material support 23 has.
Therefore, move into mouthfuls 10 A/F (opening size) as long as corresponding with the dimension width of the base material support 23 of base material unit 2, for example, patent documentation 1 as above, 2, whole opening of a side relative with base material unit 2 that does not need to make vacuum tank 1.
Therefore, stop up this move into surface-area of removing entrance door 11 of mouthfuls 10 also with whole opening of the side relative with base material unit 2 of vacuum tank 1 and compare as the structure of moving into mouth 10 and reduce.
That is, in the vacuum film formation apparatus 100 according to this example, the surface-area of entrance door 11 can be reduced to remove, thereby the amount of the back side (the vacuum tank inwall side) adsorption moisture of removing entrance door 11 can be reduced.
The time that the back side of removing entrance door 11 again, touches extraneous air is only to move into and take out of the required time of base material unit 2.That is, with patent documentation 1,2 like that the film forming of implementing to be provided in the base material 20 on a side door process during, the structure that the opposing party's door is exposed in extraneous air is always compared, and reduces and removes the time that entrance door 11 is exposed to extraneous air.Therefore, can reduce the amount of removing entrance door 11 adsorption moistures.
In this example, when moving into and taking out of base material unit 2 to vacuum tank 1 as shown in Figure 1, remove entrance door 11 and form with respect to moving into mouthful 10 structures that move to the left again.Therefore, need to guarantee to be equivalent to the space that this removes the width of entrance door 11 on the left lateral sides of vacuum tank 1, can move so that this removes entrance door 11.
But the structure of whole opening of a side relative with base material unit 2 that makes like that vacuum tank 1 with above-mentioned for example patent documentation 1,2 is compared, in order to reduce in the mobile space of removing entrance door 11 and should guarantee in advance.
More particularly, the width of supposing to remove entrance door 11 be vacuum tank 1 width pact half, in the situation that identical arranging arranges according to the vacuum film formation apparatus 100 of this example and the size identical with it and have vacuum film formation apparatus with the door of patent documentation 1,2 identical structures on area, the former can arrange the approximately device of 1.5 times of quantity.
In addition, moving into of vacuum tank 1 mouthfuls 10 is formed in the situation of structure of left-half in front of vacuum tank 1 as shown in Figure 1, makes when removing entrance door 11 and sliding to the right side in front, and further reduce in the space that should guarantee in advance for the movement of removing entrance door 11.
In vacuum film formation apparatus 100 according to this example, the space that to guarantee in advance in order to move into mouthful movement of door 11 can be reduced like this, therefore the degree of freedom that it arranges the place can be improved.Compare and to configure thick and fast with disclosed vacuum film formation apparatus in patent documentation 1,2 again.
Again, in the vacuum film formation apparatus 100 according to this example, because the structure relevant to the closing mechanism of removing entrance door 11 and the structure relevant with the movement of base material unit 2 are very simple mechanisms as mentioned above, the film forming of base material 20 are processed easily realized automatization.
(variation 1)
Below, with reference to the variation of Fig. 4 and Fig. 5 explanation according to the vacuum film formation apparatus 100 of this example.Fig. 4 and Fig. 5 are the figure of an example of the configuration of base material 20 in the base material unit 2 of schematically illustrated variation according to this example.
The base material unit 2 that possesses according to the vacuum film formation apparatus 100 of this example forms possesses two base material supports 23 as shown in Figure 1, and evaporation source 21 is configured in the structure between these base material supports 23.But the number of base material support 23 and evaporation source 21 is not limited to this.For example, as shown in Figure 4, also can form and possess three base material supports 23 and two evaporation sources 21, and three base material supports 23 are equipped with the structure of evaporation source 21 between the upper configuration of a direction (carrying direction) and each base material support 23.And, prop up the structure that each base material 20 that is held in base material support 23 also can form rotation centered by the axle of base material support 23 when film forming is processed.
In addition, as shown in Figure 5, also can form the structure that possesses at grade a plurality of base materials 20 for each base material support 23.And, also can form between 20 groups of this base materials that forms on each base material support 23, that is, be respectively arranged with the structure of evaporation source 21 between two different base material supports 23.
More particularly, on each base material support 23, be provided with in the side identical with central shaft upwardly extending a plurality of axis of rotation (example of Fig. 5 is four axis of rotation) in the position that is arranged on same circumference centered by this central shaft.And, form the assembling fixture (not illustrating) that is respectively arranged with base material 20 on this axis of rotation, the structure of base material 20 is installed on each axis of rotation by this tool.Each base material 20 forms that the central shaft with each base material support 23 revolves round the sun as turning axle when film forming is processed, the structure of rotating centered by the axis of rotation simultaneously.
Like this, the width that the structure of arranging base material support 23 on direction in carrying can reduce base material unit 2 in upright arrangemently more (perhaps, cross section with the ground cutting of carrying perpendicular direction), consequently can reduce to move into mouthfuls 10 opening size and open and close this and move into mouthfuls 10 the size of removing entrance door 11, remove in reduction entrance door 11 absorption amount of moisture aspect better.
(variation 2)
Again, form on carrying pedestal 6 according to the vacuum film formation apparatus 100 of this example and be provided with transfer table 25, by moving left and right changing on direction, a side base material unit 2 carry out that film forming processes during, the structure of carrying out the dismounting of base material 20 on the opposing party's base material unit 2.
But, be not limited to this structure, also can form carrying pedestal 6 and be rotary conveyor mobile on a direction, the transfer table 25 that loading is equipped with the base material unit 2 of base material 20 is arranged with predetermined distance on this rotary conveyor, and carries out successively the structure that film forming is processed.
That is, when the transfer table 25 that will load base material unit 2 by carrying pedestal 6 is transported to the front of moving into mouth 10, removes entrance door 11 and be opened, base material unit 2 is moved in vacuum tank 1.And to implementing that film forming are processed and when taking out of from vacuum tank 1 in base material unit 2, new base material unit 2 is transported to moves into mouthfuls 10 front, and the base material unit 2 of film forming after processing moves to the mobile point of destination of carrying pedestal 6.
Like this, also can form base material unit 2 is arranged on carrying pedestal mobile on certain orientation with predetermined distance, and implement successively the structure that film forming is processed.
From above-mentioned explanation, those skilled in the art are clearly to more improvement of the present invention and other examples etc.Therefore, above-mentioned explanation should be only explains as example, and implements most preferred form of the present invention and provide as purpose to instruct to those skilled in the art.In the scope that does not break away from spirit of the present invention, can substantially change the particular content of its structure and/or function.
Industrial applicability:
Vacuum film formation apparatus of the present invention is useful as the device of automobile, household electrical appliances parts being decorated, the resin of optical applications and glass component etc. carry out the film forming such as metallic membrane, protective membrane.
Nomenclature:
1 vacuum tank;
2 base material unit (carrying unit);
4 exhaust units;
5 common pedestals;
6 carrying pedestals;
10 move into mouthful (peristome);
11 remove entrance door (door section);
12 plasma discharge electrodes;
13 main valves;
14 slightly take out valve;
15 fore line valves;
16 vent valves;
17 gate valves;
20 base materials;
21 evaporation sources;
23 base material supports (support section);
24 support pedestal;
25 transfer tables;
27 filaments;
28 evaporations are heated by resistive electrode;
31 lobe pumps;
32 oil rotary pumps;
33 oil diffusion pumps;
34 cold-traps;
51 first tracks;
52 second tracks;
53 vacuum tank tracks;
100 vacuum film formation apparatus.
Claims (according to the modification of the 19th of treaty)
1. vacuum film formation apparatus, be under vacuum state to the vacuum film formation apparatus of a plurality of base material film forming, possess:
Be used for supporting a plurality of support sections of described base material;
The heating evaporation film forming material is used for the more than one evaporation source that forms film on the base material that is held in described support section propping up;
Possess described a plurality of support section and described more than one evaporation source, carrying is by the carrying unit of the base material of this support section's support; With
Have be used to the peristome of moving into and take out of described carrying unit and the door section that is used for opening and closing this peristome, and be used to form the vacuum tank of vacuum state;
Described peristome forms according to the size of described carrying unit.
2. vacuum film formation apparatus, be under vacuum state to the vacuum film formation apparatus of a plurality of base material film forming, possess:
Be used for supporting a plurality of support sections of described base material;
Support and carry the carrying unit of described a plurality of support sections; With
Have be used to the peristome of moving into and take out of described carrying unit and the door section that is used for opening and closing this peristome, and be used to form the vacuum tank of vacuum state;
Described a plurality of support sections are supported so that described a plurality of support section is configuring in upright arrangemently in described carrying unit on the carrying direction of described vacuum tank, and possess the heating evaporation film forming material, be used for the more than one evaporation source that forms film on the base material that is held in described support section propping up;
Described support section and described evaporation source configure on described carrying direction in upright arrangemently, and set this evaporation source between this support section;
Described peristome forms according to the size of described carrying unit.
3. vacuum film formation apparatus according to claim 1 and 2, is characterized in that, base material is supported in the rotation of described support section freely.
4. the described vacuum film formation apparatus of any one according to claim 1 to 3, is characterized in that, possess to load described carrying unit, and the transfer table that can move this on horizontal plane carry the unit on the direction different from described carrying direction.
5. the described vacuum film formation apparatus of any one according to claim 1 to 4, is characterized in that, described door section moves left and right with respect to described peristome, thereby opens and closes this peristome.
6. the described vacuum film formation apparatus of any one according to claim 1 to 4, is characterized in that, described door section forms sidepiece on one side and engages with described vacuum tank by hinge, and draws the described peristome of arc ground switching take this hinge as axle.
Claims (6)
1. vacuum film formation apparatus, be under vacuum state to the vacuum film formation apparatus of a plurality of base material film forming, possess:
Be used for supporting a plurality of support sections of described base material;
Support and carry the carrying unit of described a plurality of support sections; With
Have be used to the peristome of moving into and take out of described carrying unit and the door section that is used for opening and closing this peristome, and be used to form the vacuum tank of vacuum state;
Described a plurality of support sections are supported so that described a plurality of support section is configuring in upright arrangemently in described carrying unit on the carrying direction of described vacuum tank;
Described peristome forms according to the size of described carrying unit.
2. vacuum film formation apparatus according to claim 1, is characterized in that,
Described carrying unit possesses the heating evaporation film forming material, is used for the more than one evaporation source that forms film on the base material that is held in described support section propping up;
Described support section and described evaporation source configure on described carrying direction in upright arrangemently, and set this evaporation source between this support section.
3. vacuum film formation apparatus according to claim 1 and 2, is characterized in that, base material is supported in the rotation of described support section freely.
4. the described vacuum film formation apparatus of any one according to claim 1 to 3, is characterized in that, possess to load described carrying unit, and the transfer table that can move this on horizontal plane carry the unit on the direction different from described carrying direction.
5. the described vacuum film formation apparatus of any one according to claim 1 to 4, is characterized in that, described door section moves left and right with respect to described peristome, thereby opens and closes this peristome.
6. the described vacuum film formation apparatus of any one according to claim 1 to 4, is characterized in that, described door section forms sidepiece on one side and engages with described vacuum tank by hinge, and draws the described peristome of arc ground switching take this hinge as axle.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2011/004819 WO2013030872A1 (en) | 2011-08-30 | 2011-08-30 | Vacuum film formation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103097569A true CN103097569A (en) | 2013-05-08 |
| CN103097569B CN103097569B (en) | 2016-06-22 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180042876.7A Active CN103097569B (en) | 2011-08-30 | 2011-08-30 | Vacuum film formation apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5816189B2 (en) |
| KR (1) | KR101968256B1 (en) |
| CN (1) | CN103097569B (en) |
| WO (1) | WO2013030872A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013125159A1 (en) * | 2012-02-20 | 2013-08-29 | 新明和工業株式会社 | Conveyance system |
| CN109267033A (en) * | 2018-12-07 | 2019-01-25 | 沈阳爱科斯科技有限公司 | Evaporation coating device and coating system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04174327A (en) * | 1989-12-26 | 1992-06-22 | Hitachi Ltd | Infrared rays temperature image measuring method and device and heating device which is equipped with it, control method of heating temperature, and film-forming device |
| JPH05271935A (en) * | 1992-03-26 | 1993-10-19 | Shin Meiwa Ind Co Ltd | Vacuum deposition device for continuous film formation |
| JP2004099947A (en) * | 2002-09-06 | 2004-04-02 | Shincron:Kk | Thin-film-forming apparatus |
| CN101044260A (en) * | 2004-10-22 | 2007-09-26 | 株式会社昭和真空 | Thin film forming apparatus and method thereof |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3595272B2 (en) * | 1993-03-15 | 2004-12-02 | 株式会社神戸製鋼所 | Arc ion plating equipment |
| JP2004099948A (en) * | 2002-09-06 | 2004-04-02 | Shincron:Kk | Thin-film-forming apparatus |
| JP4246570B2 (en) | 2003-08-26 | 2009-04-02 | 新明和工業株式会社 | Vacuum deposition system |
| JP2006225709A (en) * | 2005-02-17 | 2006-08-31 | Shin Meiwa Ind Co Ltd | Vacuum treatment system |
| JP5167282B2 (en) | 2007-12-28 | 2013-03-21 | 株式会社アルバック | Film forming apparatus and film forming method |
-
2011
- 2011-08-30 CN CN201180042876.7A patent/CN103097569B/en active Active
- 2011-08-30 JP JP2012542057A patent/JP5816189B2/en active Active
- 2011-08-30 KR KR1020137004774A patent/KR101968256B1/en active IP Right Grant
- 2011-08-30 WO PCT/JP2011/004819 patent/WO2013030872A1/en active Application Filing
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04174327A (en) * | 1989-12-26 | 1992-06-22 | Hitachi Ltd | Infrared rays temperature image measuring method and device and heating device which is equipped with it, control method of heating temperature, and film-forming device |
| JPH05271935A (en) * | 1992-03-26 | 1993-10-19 | Shin Meiwa Ind Co Ltd | Vacuum deposition device for continuous film formation |
| JP2004099947A (en) * | 2002-09-06 | 2004-04-02 | Shincron:Kk | Thin-film-forming apparatus |
| CN101044260A (en) * | 2004-10-22 | 2007-09-26 | 株式会社昭和真空 | Thin film forming apparatus and method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101968256B1 (en) | 2019-04-12 |
| WO2013030872A1 (en) | 2013-03-07 |
| KR20140053803A (en) | 2014-05-08 |
| JPWO2013030872A1 (en) | 2015-03-23 |
| CN103097569B (en) | 2016-06-22 |
| JP5816189B2 (en) | 2015-11-18 |
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