CN103094035A - Method and device of broadband bundle uniformity controlling - Google Patents
Method and device of broadband bundle uniformity controlling Download PDFInfo
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- CN103094035A CN103094035A CN 201110347067 CN201110347067A CN103094035A CN 103094035 A CN103094035 A CN 103094035A CN 201110347067 CN201110347067 CN 201110347067 CN 201110347067 A CN201110347067 A CN 201110347067A CN 103094035 A CN103094035 A CN 103094035A
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Abstract
The invention discloses a device of broadband bundle uniformity controlling. The device of the broadband bundle uniformity controlling mainly comprises an industrial personal computer (IPC) (1), a single program initiation (SPI) adapter (2), a programmable multi axis controller (PMAC) closed loop measurement and control plate (3), a dose controller (4), a linear motor (5), seven sampling faraday cups (6), a closed loop faraday cup 1 (7), a closed loop faraday cup 2 (8), a movable faraday motor (9) and a movable faraday motor (10). The device of the broadband bundle uniformity controlling is characterized in that the PMAC closed loop measurement and control plate (3) is inserted into an industry standard architecture (ISA) slot of the IPC, and the dose controller (4) is communicated with the IPC (1) through the SPI adapter (2) and is used for sending and collecting data. Accurate detecting of broadband bundle ion injection doses, control of uniformity of the distribution of injected ions and the control of the accuracy of the dose can be automatically achieved.
Description
Technical field
The present invention relates to the ion implantor uniformity control method, relate to ion implantor, belong to semiconductor device and prepare the field of making.
Background technology
Ion implantor uniformity control technology is one of key technology of ion implantor, and its operation principle is based on various controls and method of measurement and device ion equably, accurately is injected into whole wafer surface by the dosage of setting.Along with the wafer size is increasing, the unit component size is more and more less, and is also just more and more higher to the performance requirement of semiconductor manufacturing equipment.Present implanter line is narrower, can not be injected into fast on whole wafer, and a kind of effective method is that ion beam current is broadened, and uniformity how to control broadband bundle injection after broadening has just become a new problem.
Summary of the invention
The invention provides a kind of broadband inhomogeneity control method of bundle and device.The method and apparatus that a kind of broadband bundle uniformity is controlled, comprise: industrial computer (1), SPI adapter (2), PMAC closed loop measurement and control plate (3), Dose Controller (4), linear electric motors (5), seven sampling Faraday cups (6), closed loop Faraday cup 1 (7), closed loop Faraday cup 2 (8), mobile faraday's motor (9) and mobile Faraday cup (10).Wherein PMAC closed loop measurement and control plate (3) inserts in the ISA slot of industrial computer, and Dose Controller (4) carries out communication by SPI adapter (2) and industrial computer (2), is used for sending and image data.
Described mobile Faraday cup (9), closed loop Faraday cup 1 (7), closed loop Faraday cup 2 (8) is connected with Dose Controller (4) by coaxial cable with seven sampling Faraday cups (6), and wherein mobile faraday (9) is used for measuring ion beam profile and horizontal direction line distribution density.
The real-time measurement that described closed loop Faraday cup 1 (7) is used for injecting line, and draw the speed of the linear electric motors of target platform according to the size change of injecting line, thus reach the uniformity of Implantation.
Described closed loop Faraday cup 2 (8) is used for the Real-time Collection ion beam current.
Described seven sampling Faraday cups (6) gather angle and the depth of parallelism that line is used for measuring broadband ion beam.
This control method architecture is simple, measures with control accurate, stable, reliable.
Description of drawings
The invention will be described further below in conjunction with the drawings and specific embodiments, but not as the restriction to patent of the present invention.
Fig. 1 broadband bundle uniformity control system system assumption diagram.
A kind of execution mode schematic diagram of Fig. 2 broadband bundle device for controlling uniformity.
Embodiment
The invention will be described further below in conjunction with the specific embodiment of accompanying drawing, and these descriptions are all illustrative, the invention is not restricted to this.Scope of the present invention is only limited by the scope of claims.
In a kind of execution mode schematic diagram of Fig. 2 broadband bundle device for controlling uniformity, PMAC closed loop measurement and control plate inserts in the ISA slot of industrial computer, and Dose Controller carries out communication by SPI adapter and industrial computer, is used for transmission and image data.
mobile Faraday cup, the closed loop Faraday cup is connected with Dose Controller by coaxial cable with the sampling Faraday cup, wherein mobile Faraday cup is used for measuring ion beam profile and the detection of horizontal direction bundle distribution density, mobile faraday can do pinpoint movement in the horizontal direction under the control of PMAC, pulse of an equidistant generation of the every movement of mobile Faraday cup, this pulse signal is delivered to Dose Controller after processing, after Dose Controller detects this signal, the real-time response line gathers interrupt acquisition line value, amplify the fluid drive of processing line value and line scope by Dose Controller, switch to a suitable range ability, be converted into again the A/D conversion that 0～10V signal carries out line, determine to inject size and the quality of beam of line.
Seven sampling Faraday cups are used for measuring angle and the depth of parallelism of ion beam, it is characterized in that seven sampling Faraday cups divide four groups,, all receive on Dose Controller for remaining independent one group by every two one group.
The closed loop Faraday cup is used for the real-time measurement that implanter injects line.One of them receives two closed loop Faraday cups on Dose Controller, with its integration to the time, then this integrated value is delivered to industrial computer, another is changed by I/V and receives PMAC, change the speed of the linear electric motors of traction target platform according to the size of injecting line, thereby reach the uniformity of Implantation.。
The above elaborates content of the present invention.For persons skilled in the art, any apparent change of without departing from the premise in the spirit of the present invention it being done all consists of the infringement to patent of the present invention, will bear corresponding legal liabilities.
Claims (3)
1. the device that uniformity is controlled is restrainted in a broadband, mainly comprise: industrial computer (1), SPI adapter (2), PMAC closed loop measurement and control plate (3), Dose Controller (4), linear electric motors (5), seven sampling Faraday cups (6), closed loop Faraday cup 1 (7), closed loop Faraday cup 2 (8), mobile faraday's motor (9) and mobile Faraday cup (10), its link situation is mutually seen Fig. 1.
2. the described mobile Faraday cup of right 1 (9), closed loop Faraday cup 1 (7), closed loop Faraday cup 2 (8) is connected with Dose Controller (4) by coaxial cable with seven sampling Faraday cups (6), and wherein mobile faraday (9) is used for measuring ion beam profile and horizontal direction line distribution density.
3. the described closed loop Faraday cup 1 (7) of right 1 is used for the real-time measurement of injection line, and changes the speed of the linear electric motors (5) of traction target platform according to the size of injecting line, thereby reaches the uniformity of Implantation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110347067 CN103094035A (en) | 2011-11-07 | 2011-11-07 | Method and device of broadband bundle uniformity controlling |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110347067 CN103094035A (en) | 2011-11-07 | 2011-11-07 | Method and device of broadband bundle uniformity controlling |
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| Publication Number | Publication Date |
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| CN103094035A true CN103094035A (en) | 2013-05-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 201110347067 Pending CN103094035A (en) | 2011-11-07 | 2011-11-07 | Method and device of broadband bundle uniformity controlling |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104332377A (en) * | 2014-09-10 | 2015-02-04 | 中国电子科技集团公司第四十八研究所 | Beam and dosage measurement and control apparatus of ion implantation machine, and dosage control method |
| CN111128656A (en) * | 2018-10-31 | 2020-05-08 | 北京中科信电子装备有限公司 | Method and device for two-dimensional detection of broadband beam current |
| CN111769026A (en) * | 2019-04-02 | 2020-10-13 | 北京中科信电子装备有限公司 | Beam property measuring device and method |
| CN112666592A (en) * | 2019-10-15 | 2021-04-16 | 北京烁科中科信电子装备有限公司 | Method for measuring horizontal angle of ion beam current by utilizing Faraday cups with multiple angles |
-
2011
- 2011-11-07 CN CN 201110347067 patent/CN103094035A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104332377A (en) * | 2014-09-10 | 2015-02-04 | 中国电子科技集团公司第四十八研究所 | Beam and dosage measurement and control apparatus of ion implantation machine, and dosage control method |
| CN104332377B (en) * | 2014-09-10 | 2016-08-17 | 中国电子科技集团公司第四十八研究所 | A kind of ion implantation apparatus line and dosage measure and control device and dosage control method |
| CN111128656A (en) * | 2018-10-31 | 2020-05-08 | 北京中科信电子装备有限公司 | Method and device for two-dimensional detection of broadband beam current |
| CN111769026A (en) * | 2019-04-02 | 2020-10-13 | 北京中科信电子装备有限公司 | Beam property measuring device and method |
| CN111769026B (en) * | 2019-04-02 | 2024-03-12 | 北京中科信电子装备有限公司 | Beam property measuring device and method |
| CN112666592A (en) * | 2019-10-15 | 2021-04-16 | 北京烁科中科信电子装备有限公司 | Method for measuring horizontal angle of ion beam current by utilizing Faraday cups with multiple angles |
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Application publication date: 20130508 |