CN102956424A - Honeycomb beam homogeneity detecting device - Google Patents
Honeycomb beam homogeneity detecting device Download PDFInfo
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- CN102956424A CN102956424A CN2011102411423A CN201110241142A CN102956424A CN 102956424 A CN102956424 A CN 102956424A CN 2011102411423 A CN2011102411423 A CN 2011102411423A CN 201110241142 A CN201110241142 A CN 201110241142A CN 102956424 A CN102956424 A CN 102956424A
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- beam current
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- implantor
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Abstract
The invention discloses a beam homogeneity detecting device for an ion implanter. The ion implanter can generate wide beam bundles or flat beam bundles, and the beam homogeneity detecting device enables the ion implanter to work normally. The beam homogeneity detecting device mainly comprises a beam collecting panel (1), a rack (2), a motor fixing block (3), a gear (4) and the like, and is characterized in that the beam collecting panel (1) is provided with beam collecting frames arrayed to form a honeycomb shape, each beam collecting frame can independently detect sizes of beams, and the device can detect the density distribution of beam spot sections of ion beams under the focusing condition and the distribution of the beam homogeneity of the ion beams under the scanning condition, and particularly can detect the wide beam bundles or the flat beam bundles. Working principles of the device are described in detail in a manual, and specific implementation schemes are given.
Description
Technical field
The present invention relates to a kind of honeycomb fashion beam homogeneity checkout gear, be particularly suitable for the ion implantor in the semiconductor manufacturing equipment.
Background technology
Ion implantor is the exemplary apparatus that the semiconductor technology intermediate ion mixes, and ion source produces the ion beam that needs doping, and ion beam passes through quality analysis, correction, acceleration again, is transferred to the silicon chip surface that is in target chamber end process cavity.
Along with the more and more miniaturization of semiconductor integrated circuit manufacturing process, also just more and more higher to the performance requirement of semiconductor manufacturing facility.Ion implantor is one of implantation equipment crucial during semiconductor device is made, when device fabrication marches toward below the characteristic size 90nm, the wafer size 300mm epoch, in order to guarantee the consistency of device performance on the whole wafer, must higher requirement be arranged to the uniformity of in the ion implantation doping process whole wafer being kept dopant profiles.Therefore, for injection technology, the ion implantor of low-yield large speed stream is the direction of development.The ion source that is applicable to such ion implantor need to produce broadband bundle or flat-shaped band bundle.The shape and the uniform distribution that detect in real time and accurately Implantation bundle spot become more important.The present invention has realized that bundle section, scanning beam uniformity detect, for the condition that provides accurately is provided.
Summary of the invention
Requirement for existing semiconductor technology intermediate ion implanter equipment development, the present invention be directed in the existing Implantation machine technology, can not detect in real time the situation of beam profile and scanning beam flow point cloth, a kind of new checkout gear has been proposed, this device can directly draw bundle spot section from the device testing result and distribute and scanning beam flow point cloth, and the changes in distribution of accurate control line provides hardware foundation thereby make in real time.
This device also relates to honeycomb fashion collection of beam current frame on the collection of beam current panel, and this collection of beam current frame has the circuit unit of independent detection line.
This device also relates to the mode that a kind of collection of beam current plate moves up and down, so that detect in real time line.This mode is fixed the motor fixed block, and by gear and tooth bar transmission of power is arrived the collection of beam current plate, drives the collection of beam current plate and moves up and down.
The present invention has following distinguishing feature:
1. can detect in real time line, output signal is easy to observe and compare;
2. simple in structure, be convenient to processing and manufacturing;
Description of drawings
Fig. 1 is a kind of honeycomb fashion uniformity detection front view.
Fig. 2 detects the device schematic diagram of ion beam current in the focusing situation.
Fig. 3 is the device schematic diagram when detecting broadband line or flat-shaped line.
Embodiment
The invention will be described further below in conjunction with the drawings and specific embodiments, but not as the restriction to patent of the present invention.
The invention discloses a kind of ion beam current uniformity detection for ion implantor, as shown in Figure 1, and ion implantor uses together with ion source.This device is for making its normal operation that a kind of beam homogeneity checkout gear is provided.As shown in Figure 1, this device mainly comprises: collection of beam current panel (1), tooth bar (2), motor fixed block (3), gear (4) etc.
The collection of beam current frame that collection of beam current panel (1) adopts honeycomb fashion to arrange, integrated collection of beam current frame in a large number, as shown in Figure 1, each collection of beam current frame is test point independently, all can the independent detection line size, and can be for each collection of beam current frame output detection signal.
Motor fixed block (3) is fixed in the cavity of ion implantor, and by gear (4) and tooth bar (2) transmission of power is arrived collection of beam current plate (1), drives collection of beam current plate (1) and moves up and down.
This device can detect the bundle spot profile density of ion beam current in the focusing situation and distribute, and as shown in Figure 2, wherein round spot is line.
This device can also detect the broadband line or flat-shaped beam homogeneity distributes, and as shown in Figure 3, wherein square spot is the broadband line.
Specific embodiment of the present invention elaborates content of the present invention.For persons skilled in the art, any apparent change of without departing from the premise in the spirit of the present invention it being done all consists of the infringement to patent of the present invention, will bear corresponding legal liabilities.
Claims (5)
1. ion beam current uniformity detection that is used for ion implantor, wherein ion implantor can produce broadband bundle or flat-shaped band bundle, and this device is for making its normal operation that a kind of beam homogeneity checkout gear is provided.This device mainly comprises: collection of beam current panel (1), tooth bar (2), motor fixed block (3), gear (4) etc.
2. such as claim 1 described a kind of ion beam current uniformity detection for ion implantor, this device characteristic is, the collection of beam current frame that collection of beam current panel (1) adopts honeycomb fashion to arrange, integrated collection of beam current frame in a large number.
3. such as claim 2 described a kind of ion beam current uniformity detections for ion implantor, this device characteristic is, each collection of beam current frame all can independent detection line size, and can be for each bleeding point output detection signal.
4. such as claim 1 described a kind of ion beam current uniformity detection for ion implantor, this device characteristic also is, the bundle uniform distribution of ion beam current in the distribution of the bundle spot profile density in the focusing situation and scanning situation be can detect, broadband line or flat-shaped band bundle especially can be detected.
5. such as claim 1 described a kind of ion beam current uniformity detection for ion implantor, this device characteristic also is, motor fixed block (3) is fixing, and by gear (4) and tooth bar (2) with transmission of power to collection of beam current plate (1), driving collection of beam current plate (1) moves up and down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102411423A CN102956424A (en) | 2011-08-22 | 2011-08-22 | Honeycomb beam homogeneity detecting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102411423A CN102956424A (en) | 2011-08-22 | 2011-08-22 | Honeycomb beam homogeneity detecting device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102956424A true CN102956424A (en) | 2013-03-06 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011102411423A Pending CN102956424A (en) | 2011-08-22 | 2011-08-22 | Honeycomb beam homogeneity detecting device |
Country Status (1)
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| CN (1) | CN102956424A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108010827A (en) * | 2016-11-02 | 2018-05-08 | 北京中科信电子装备有限公司 | A kind of method for detecting line angle |
| CN108895945A (en) * | 2018-05-15 | 2018-11-27 | 首钢集团有限公司 | A kind of measuring device and method of converter bottom seam refractory material pack uniformity |
| CN105738940B (en) * | 2016-04-26 | 2019-02-05 | 西北核技术研究所 | A kind of detector for beam profile uniformity on-line measurement |
| CN110444458A (en) * | 2019-08-09 | 2019-11-12 | 德淮半导体有限公司 | A kind of method for visualizing of the ion concentration distribution of detection device, ion implantation equipment and ion beam profile |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1247986A (en) * | 1998-07-22 | 2000-03-22 | 日新电机株式会社 | Method for measuring distribution of charged particle beam and its relative method |
| US20060033041A1 (en) * | 2004-08-12 | 2006-02-16 | Nanya Technology Corporation | Ion implantation monitor system and method thereof |
| CN2796083Y (en) * | 2005-04-22 | 2006-07-12 | 北京中科信电子装备有限公司 | Scanning generator |
| CN1851867A (en) * | 2005-04-22 | 2006-10-25 | 北京中科信电子装备有限公司 | Ion injection uniformity control system and control method |
| CN201667601U (en) * | 2010-01-21 | 2010-12-08 | 张正泉 | Linear motor |
-
2011
- 2011-08-22 CN CN2011102411423A patent/CN102956424A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1247986A (en) * | 1998-07-22 | 2000-03-22 | 日新电机株式会社 | Method for measuring distribution of charged particle beam and its relative method |
| US20060033041A1 (en) * | 2004-08-12 | 2006-02-16 | Nanya Technology Corporation | Ion implantation monitor system and method thereof |
| CN2796083Y (en) * | 2005-04-22 | 2006-07-12 | 北京中科信电子装备有限公司 | Scanning generator |
| CN1851867A (en) * | 2005-04-22 | 2006-10-25 | 北京中科信电子装备有限公司 | Ion injection uniformity control system and control method |
| CN201667601U (en) * | 2010-01-21 | 2010-12-08 | 张正泉 | Linear motor |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105738940B (en) * | 2016-04-26 | 2019-02-05 | 西北核技术研究所 | A kind of detector for beam profile uniformity on-line measurement |
| CN108010827A (en) * | 2016-11-02 | 2018-05-08 | 北京中科信电子装备有限公司 | A kind of method for detecting line angle |
| CN108010827B (en) * | 2016-11-02 | 2021-08-27 | 北京中科信电子装备有限公司 | Method for detecting beam angle |
| CN108895945A (en) * | 2018-05-15 | 2018-11-27 | 首钢集团有限公司 | A kind of measuring device and method of converter bottom seam refractory material pack uniformity |
| CN108895945B (en) * | 2018-05-15 | 2020-06-19 | 首钢集团有限公司 | Device and method for measuring filling uniformity of refractory material of converter bottom joint |
| CN110444458A (en) * | 2019-08-09 | 2019-11-12 | 德淮半导体有限公司 | A kind of method for visualizing of the ion concentration distribution of detection device, ion implantation equipment and ion beam profile |
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Application publication date: 20130306 |