CN103091885B - A kind of display panels and preparation method - Google Patents
A kind of display panels and preparation method Download PDFInfo
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- CN103091885B CN103091885B CN201310027121.0A CN201310027121A CN103091885B CN 103091885 B CN103091885 B CN 103091885B CN 201310027121 A CN201310027121 A CN 201310027121A CN 103091885 B CN103091885 B CN 103091885B
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- tft array
- black matrix
- control line
- wiring
- contact area
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Abstract
The invention discloses a kind of display panels and preparation method, in order to solve in display panels the large problem that takes up room that connects up, realize the narrow limit of display panels.A kind of display panels provided by the invention, comprise upper substrate, infrabasal plate, driving circuit IC and the liquid crystal layer between upper substrate and infrabasal plate, wherein, upper substrate comprises color rete and black matrix, infrabasal plate comprises thin film transistor (TFT) tft array layer, the control line of tft array, conductive layer, and the insulation course between the control line and conductive layer of tft array, this display panel also comprises: many wires, be positioned at the below of described black matrix on upper substrate, and every bar wire connects the wiring of driving circuit IC and the control line of tft array.
Description
Technical field
The present invention relates to technical field of liquid crystal display, particularly relate to a kind of display panels and preparation method.
Background technology
Current display is progressively developing to high resolving power, and its market share increases year by year.Simultaneously, due to high resolving power, to cause periphery wiring space to take larger, even if gate driver circuit is integrated in liquid crystal panel (GateonArray, GOA) technology and still can not solves the too wide drawback of frame completely by use, become impact to the application of screen and the persistent ailment on narrow limit.In order to adapt to narrow frame, grid line is graph thinning often, and such grid line resistance can increase, and has very large delay to signal, bring a lot of display problem, and the grid line of graph thinning is easily opened a way, and causes final screen abnormal show.
The grid line distribution signal wire that adopts of current mobile phone from driving circuit (IntegratedCircuit more, IC) both sides are drawn respectively, separate from screen perimeter both sides according to parity rows, signal is introduced respectively to viewing area (ActiveArea from both sides, AA), as shown in Figure 1, common wire laying mode details then as shown in Figure 2, in corresponding diagram 1 in dotted line circle shown in structure.Odd-numbered line grid line drives the thin film transistor (TFT) (ThinFilmTransistor of odd-numbered line, TFT), and before entering AA district, due between the width of data line itself and data line because technological requirement needs the summation of the spacing retained larger, cause taking larger space at AA district both sides needs to be used for placing grid line, make frame very large, total utilization factor is not high.
Summary of the invention
Embodiments provide a kind of display panels, in order to solve in display panels the large problem that takes up room that connects up, realize the narrow limit of display panels.
A kind of display panels that the embodiment of the present invention provides, comprise upper substrate, infrabasal plate, driving circuit IC and the liquid crystal layer between upper substrate and infrabasal plate, wherein, upper substrate comprises color rete and black matrix, infrabasal plate comprises thin film transistor (TFT) tft array layer, the control line of tft array, conductive layer, and the insulation course between the control line and conductive layer of tft array, this display panel also comprises:
Many wires, are positioned at the below of described black matrix on upper substrate, and every bar wire connects the wiring of driving circuit IC and the control line of tft array.
The preparation method of a kind of display panels that the embodiment of the present invention provides, be included on upper substrate and prepare color rete and black matrix, infrabasal plate is prepared thin film transistor (TFT) tft array layer, the control line of tft array, conductive layer and insulation course, prepare driving circuit IC, and by liquid crystal to box, this preparation method also comprises: prepare many wires at the lower surface of the black matrix prepared, and wherein, every bar wire connects the wiring of driving circuit IC and the control line of tft array.
A kind of display panels that the embodiment of the present invention provides and preparation method, by arranging the wire for transmitting tft array control signal at the lower surface of black matrix, solve in display panels the large problem that takes up room that connects up, realize the narrow limit of display panels.
Accompanying drawing explanation
Fig. 1 is existing regular display periphery wiring diagram;
Fig. 2 is the detailed routing figure in dotted line in the schematic diagram shown in Fig. 1;
The vertical view of a kind of display panels that Fig. 3 provides for the embodiment of the present invention;
The detailed routing figure of the viewing area periphery of the color film side that Fig. 4 provides for present pre-ferred embodiments;
The cabling sectional view of the wire that Fig. 5 provides for present pre-ferred embodiments;
The sectional structure chart of the contact point that Fig. 6 provides for present pre-ferred embodiments;
The TFT control line that Fig. 7 is the IC end described in present pre-ferred embodiments connects the schematic diagram of contact point;
The wire that Fig. 8 is the CF side described in present pre-ferred embodiments connects the schematic diagram of contact point;
The conductor wiring of Fig. 9 for the CF side described in present pre-ferred embodiments and the detailed distribution plan of contact point;
The control line cabling of Figure 10 for the TFT side described in present pre-ferred embodiments and the detailed distribution plan of contact point.
Embodiment
Embodiments provide a kind of display panels and preparation method, in order to solve in display panels the large problem that takes up room that connects up, realize the narrow limit of display panels.
A kind of display panels that the embodiment of the present invention provides, comprise upper substrate, infrabasal plate, driving circuit IC and the liquid crystal layer between upper substrate and infrabasal plate, wherein, see Fig. 3, upper substrate comprises color rete CF and black matrix B M, infrabasal plate comprises thin film transistor (TFT) tft array layer, the control line 103 of tft array, conductive layer, and the insulation course between the control line and conductive layer of tft array, and this display panel also comprises:
Many wires 102, are positioned at the below of described black matrix on upper substrate, and every bar wire connects the wiring 101 of driving circuit IC and the control line 103 of tft array.Being described for grid line in the present invention, but being not restricted to grid line, such as, can also be the signal wire of other tft array such as data line.
As shown in Figure 3, the IC wiring 101 being positioned at TFT side connects the wire 102 being positioned at CF side, wherein, wire 102 runs through whole CF side, from the non-display area cabling of IC end, through viewing area, arrive the non-display area of CF side again, in the non-display area of CF side, be connected with the control line 103 of the tft array being positioned at TFT side, thus the control signal of IC is outputted to each TFT.
Preferably, on printing opacity direction, the projection of described wire is positioned at the projection of black matrix, and so, the setting of wire can not affect the aperture opening ratio of panel itself.
Preferably, the live width of described wire is 5 ~ 6 μm, and conductor width general in prior art is 3 ~ 4 μm, therefore by wire arrange adopt the technical program time, add live width, and then reduce resistance, ensure that the accuracy of signal, also reduce energy consumption.
Preferably, this display panel also comprises:
First contact area and the second contact area, wherein
Described first contact area is positioned at the non-display area of the side of described display panel, for connecting the wiring of described wire and described driving circuit IC,
Described second contact area is positioned at the non-display area of the opposite side of described display panel, for connecting the control line of described wire and described tft array.
Preferably, described first contact area and described second contact area lay respectively at the adjacent both sides of described display panel, two namely adjacent limits, such as, display panel is rectangle, then the side, long limit that lays respectively at of two contact areas and broadside side, realize narrow frame with this.
Preferably, described IC wiring is positioned at non-display area, for connecting described driving circuit IC and described first contact area;
Wherein, described first contact area comprises multiple contact point, and described second contact area comprises multiple contact point,
The end that the first end of wire described in each is connected up by the described IC that described each contact point is corresponding to each at described first contact area connects,
Second end of wire described in each passes through the signal input part connection of the control line of described each contact point described tft array corresponding to each at described second contact area, the control line of described tft array is used for providing unlatching or cut-off signal to each TFT.
Preferably, described contact point comprises Part I and Part II,
Wherein, described Part I comprises the conductor layer on the surface of the black matrix covering non-display area; The black matrix of described non-display area has bulge-structure;
Described Part II comprises the conductive layer with the infrabasal plate of the bulge-structure opposite position of described black matrix.
Preferably, described first contact area and the second contact area include multiple via hole, and cover conductive layer in described each via hole, the bulge-structure of described black matrix is positioned at described via hole, wherein, described via hole is positioned at described tft array control line and described IC wiring top.
Preferably, described IC wiring is formed at same patterning processes with the control line of the tft array of described viewing area, and wherein, described IC wiring is not connected with the control line of described tft array.
Below in conjunction with accompanying drawing and preferred embodiment, the present invention is described in detail.In the present embodiment, the control line of described tft array, is described for the grid line of TFT.It should be noted that, the present embodiment in order to the present invention is described, but is not limited to the present invention.Technical scheme provided by the invention, is equally applicable to improve wiring in prior art and is distributed in the signal wire of non-display area.
See Fig. 4, the display panels that this preferred embodiment provides, comprises upper substrate and infrabasal plate, and the liquid crystal layer between upper substrate and infrabasal plate, wherein
Infrabasal plate side, comprise IC side wiring 101, the grid line 103 of tft array, insulation course (not shown) and tft array layer (not shown), upper substrate side comprises color rete CF and black matrix (not shown), the many wires 102 be connected with the grid line of IC and tft array, and the liquid crystal layer (not shown) between upper substrate and infrabasal plate, and first contact area 1(illustrate in below AA district) and the second contact area 2(diagram in the left and right sides in AA district), multiple contact point 11 being positioned at the first contact area, multiple contact point 12 being positioned at the second contact area,
Wherein, many wires 102, are positioned at the below of black matrix, and every bar wire 102 connects the wiring 101 of IC side and the grid line 103 of tft array, and in the present embodiment, the signal of described IC side wiring 101 transmission comprises the sweep signal of corresponding grid line, as shown in FIG..Simultaneously, in viewing area, the live width of every bar wire is less than the live width of black matrix, its projection is positioned at the projection of black matrix, cross-section structure as shown in Figure 5, the width in the middle of two pieces of coloring agents (R and G) of color film 20 is less than the plain conductor 102 of black matrix 21 width, blocking downward cabling and can not affect aperture opening ratio at black matrix, wire along the overlay area cabling of black matrix to the contact point of non-display area, i.e. the contact point of the both sides in viewing area AA district; Meanwhile, the live width of wire can be 5 ~ 6 μm, and resistance is relatively little, is conducive to the transmission of signal.
Particularly, the end that the first end of every bar wire 102 passes through the described IC wiring 101 corresponding to each of described each contact point 11 at described first contact area 1 connects; Second end passes through first end and the signal input part connection of the control line 103 of described each contact point 12 described tft array corresponding to each at described second contact area 2, second end of the control line of tft array connects each tft array, thus the sweep signal that IC exports is outputted to the grid of each TFT, the unlatching of control TFT or disconnection.
Be described in detail for the contact point of the second contact area below.
See Fig. 6, contact point 12 comprises upper and lower two parts, wherein Part I 121 is positioned at CF side, conductor layer under the black matrix 21 being arranged in top glass substrate 010 lower surface, horizontal direction is positioned at the two ends of wire, and black matrix herein has bulge-structure, conductor layer 102 is positioned at the lower surface of black matrix, and the conductor layer of corresponding black matrix raised position forms the Part I 121 of contact point 12; Part II 122 comprises with the conductive layer 30 of the infrabasal plate of the bulge-structure opposite position of described black matrix, and herein, on lower glass substrate 011, be followed successively by grid line 103, gate insulation layer 40, passivation layer 50, conductive layer 30 is positioned on passivation layer 50.By gate insulation layer and passivation layer etching are formed via hole, make the conductive layer 30 originally covered on passivation layer form via hole with grid line 103 to be connected, and simultaneously, the conductive layer of via hole position forms the Part II 122 of contact point 12, this Part II 122 forms concave character type with surrounding, and Part I and surrounding form convex, so, the Part I 121 of the contact point 12 formed because of the bulge-structure of black matrix is positioned at the contact point Part II 122 because via hole is formed.
Be more than be described for the structure of the second contact area, the structure difference in the structure opposed second contact region of the first contact area is, the control line of tft array is changed into IC wiring.In specific implementation process, IC wiring is formed by same patterning processes with the control line of tft array, such as, make of GATE metal level or DATE metal level, but can't be interconnected.
Be described below in conjunction with the transmitting procedure of accompanying drawing to signal.See Fig. 7 to Figure 10, in the figure 7, IC side wiring 101, same as the prior art.But connect at the end of each wiring the contact point 11 that is positioned at the first contact area, the wiring of IC side connects the Part II 112 of contact point herein, the Part II 112 of contact point connects with the corresponding of the Part I 111 being connected with the contact point of wire of CF side, as shown in Figure 8.The sweep signal that such IC exports is transferred on wire 102 through contact point, and the connection function of the first contact area leaves it at that;
Further, see Fig. 9, wire 102 sidles line at CF, through AA district, viewing area, extends to non-display area, end connects the Part I 121 being positioned at the contact point of the second contact area 2, and the Part I 121 of contact point and corresponding contact of the Part II 122 of the contact point in TFT side connect, as shown in Figure 10, the other end of contact point Part II 122 connects the grid line of tft array, the equal corresponding tft array of every bar grid line, thus the transmission completing that IC signal holds TFT from IC.
The preparation method of a kind of liquid crystal display that the embodiment of the present invention provides, comprising:
Upper substrate is prepared color rete CF and black matrix 21, infrabasal plate is prepared tft array, the control line 103 of tft array, conductive layer 30 and insulation course, prepare driving circuit IC, and by liquid crystal to box, wherein, prepare many wires 102 on the surface of the black matrix prepared, wherein, every bar wire connects the control line 103 of driving circuit IC wiring 101 and tft array; In specific implementation process, insulation course comprises gate insulation layer 40 and passivation layer 50;
Preferably, at 102 layers, the wire of the surface deposition of the black matrix of preparation, wherein, the width of described wire 102 is less than the width of described black matrix 21, and in specific implementation process, the live width of wire can be 5 ~ 6 μm;
Preferably, the first contact area 1 and the second contact area 2 is prepared respectively in the adjacent both sides of described display panel;
Wherein, prepare the first contact area at the non-display area of the side of described display panel, for connecting described wire 102 and described driving circuit IC wiring 101;
The second contact area is prepared, for connecting the control line 103 of described wire 102 and described tft array at the non-display area of the opposite side of described display panel.
Preferably, described IC wiring 101 is formed at same patterning processes with the control line 103 of the tft array of described viewing area, and described IC wiring is not connected with the control line of described tft array; In specific implementation process, can be made by GATE metal level or DATE metal level.
Preferably, this preparation method also comprises: prepare multiple described contact point 11 and 12, and wherein, described contact point 11 is between the black matrix and IC wiring of non-display area, and described contact point 12 is between the black matrix and the control line of tft array of non-display area.
Preferably, at described contact point, at the black matrix that upper substrate preparation is corresponding, wherein, black matrix has bulge-structure, the surface deposition conductor layer of bulge-structure; The via hole that preparation is corresponding with black matrix on infrabasal plate, wherein, form via hole, above via hole, form conductive layer above TFT control line, the conductor layer of the bulge-structure of described black matrix is connected by via hole with the conductive layer of TFT control line; Identical, also form the via hole corresponding with the conductor layer of black matrix bulge-structure and IC wiring layer at IC end, and connected by via hole.
In sum, a kind of display panels that the embodiment of the present invention provides and preparation method, by the contact of contact point, TFT control line cabling is incorporated into the below of the black matrix in upper substrate side, the wire for grid line is made to transfer in the middle of screen from screen sides, this eliminate the width of both sides, achieve extremely narrow frame.Simultaneously wire is due at upper substrate upward wiring, overlapping with black matrix, both aperture opening ratio can not be affected, also for wiring provides sufficient space, live width can reach 5um ~ 6um, the design of the 3 ~ 4um generally adopted now that compares, and resistance reduces greatly, ensure that the accuracy of signal, also reduce energy consumption.
Obviously, those skilled in the art can carry out various change and modification to the present invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (8)
1. a display panels, comprise upper substrate, infrabasal plate, driving circuit IC and the liquid crystal layer between upper substrate and infrabasal plate, wherein, upper substrate comprises color rete and black matrix, infrabasal plate comprises tft array, the control line of tft array, conductive layer, and the insulation course between the control line and conductive layer of tft array, it is characterized in that, this display panel also comprises:
Many wires, are positioned at the below of described black matrix on upper substrate, and every bar wire connects the wiring of driving circuit IC and the control line of tft array;
First contact area, be positioned at the non-display area of the side of described display panel, for connecting the wiring of described wire and described driving circuit IC, wherein, described first contact area comprises multiple contact point, and the end that the first end of wire described in each is connected up by the IC that each contact point is corresponding to each at described first contact area connects;
Second contact area, be positioned at the non-display area of the opposite side of described display panel, for connecting the control line of described wire and described tft array, wherein, described second contact area comprises multiple contact point, second end of wire described in each passes through the signal input part connection of the control line of described each contact point described tft array corresponding to each at described second contact area, the control line of described tft array is used for providing unlatching or cut-off signal to each TFT;
Wherein, described contact point comprises Part I and Part II, described Part I comprises the conductor layer on the surface of the black matrix covering non-display area, the black matrix of described non-display area has bulge-structure, and described Part II comprises the conductive layer with the infrabasal plate of the bulge-structure opposite position of described black matrix;
Described first contact area and the second contact area include multiple via hole, and cover conductive layer in each via hole, the bulge-structure of described black matrix is positioned at described via hole, and wherein, described via hole is positioned at described tft array control line and described IC wiring top.
2. display panels according to claim 1, is characterized in that, on printing opacity direction, the projection of described wire is positioned at the projection of black matrix.
3. display panels according to claim 2, is characterized in that, the live width of described wire is 5 ~ 6 μm.
4. display panels according to claim 1, is characterized in that, described first contact area and described second contact area lay respectively at the adjacent both sides of described display panel.
5. display panels according to claim 1, is characterized in that, described IC wiring is formed at same patterning processes with the control line of the tft array of described viewing area, and wherein, described IC wiring is not connected with the control line of described tft array.
6. the preparation method of a display panels, be included on upper substrate and prepare color rete and black matrix, infrabasal plate is prepared tft array, the control line of tft array, conductive layer and insulation course, prepare driving circuit IC, and by liquid crystal to box, it is characterized in that, this preparation method also comprises: prepare many wires on the surface of the black matrix prepared in the mode depositing conductor layer, wherein, every bar wire connects the control line of driving circuit IC wiring and tft array, and the width of described wire is less than the width of described black matrix;
Prepare multiple contact point, wherein, described contact point is between the black matrix and the control line of tft array of non-display area, or described contact point is between the black matrix and IC wiring of non-display area;
At the black matrix that upper substrate preparation is corresponding, wherein, black matrix has bulge-structure, the surface deposition conductor layer of bulge-structure; The via hole that preparation is corresponding with black matrix on infrabasal plate, wherein, form via hole, above via hole, form conductive layer above TFT control line, the conductor layer of the bulge-structure of described black matrix is connected by via hole with the conductive layer of TFT control line; Identical, also form the via hole corresponding with the conductor layer of black matrix bulge-structure and IC wiring layer at IC end, and connected by via hole.
7. the preparation method of display panels according to claim 6, is characterized in that, prepares the first contact area and the second contact area respectively in the adjacent both sides of described display panel,
Wherein, prepare the first contact area at the non-display area of the side of described display panel, for connecting the wiring of described wire and described driving circuit IC,
The second contact area is prepared, for connecting the control line of described wire and described tft array at the non-display area of the opposite side of described display panel.
8. the preparation method of display panels according to claim 7, it is characterized in that, many IC wirings, for connecting described driving circuit IC and described first contact area, wherein, described IC wiring is formed at same patterning processes with the control line of the tft array of described viewing area, and described IC wiring is not connected with the control line of described tft array.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310027121.0A CN103091885B (en) | 2013-01-18 | 2013-01-18 | A kind of display panels and preparation method |
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| CN201310027121.0A CN103091885B (en) | 2013-01-18 | 2013-01-18 | A kind of display panels and preparation method |
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| CN103091885A CN103091885A (en) | 2013-05-08 |
| CN103091885B true CN103091885B (en) | 2016-01-20 |
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Families Citing this family (3)
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| CN104199226A (en) * | 2014-08-18 | 2014-12-10 | 合肥鑫晟光电科技有限公司 | Display panel and display device |
| US10923509B2 (en) | 2018-12-04 | 2021-02-16 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Thin film transistor array substrate and display panel |
| CN109659317B (en) * | 2018-12-04 | 2021-01-01 | 武汉华星光电半导体显示技术有限公司 | Thin film transistor array substrate and display device |
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| CN1355896A (en) * | 1999-07-06 | 2002-06-26 | 三洋电机株式会社 | Liquid crystal display |
| JP2006201652A (en) * | 2005-01-24 | 2006-08-03 | Toppan Printing Co Ltd | Color filter for liquid crystal display device |
| CN101842742A (en) * | 2007-12-04 | 2010-09-22 | 夏普株式会社 | Display device and method for manufacturing the same |
| TW201038996A (en) * | 2009-04-21 | 2010-11-01 | Wintek Corp | Flat display panel |
| CN102650763A (en) * | 2011-08-26 | 2012-08-29 | 北京京东方光电科技有限公司 | Liquid crystal display and manufacturing method thereof and monitor |
| CN102681237A (en) * | 2012-05-16 | 2012-09-19 | 深圳市华星光电技术有限公司 | Manufacturing method of liquid crystal panel and liquid crystal display device and liquid crystal glass |
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- 2013-01-18 CN CN201310027121.0A patent/CN103091885B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1355896A (en) * | 1999-07-06 | 2002-06-26 | 三洋电机株式会社 | Liquid crystal display |
| JP2006201652A (en) * | 2005-01-24 | 2006-08-03 | Toppan Printing Co Ltd | Color filter for liquid crystal display device |
| CN101842742A (en) * | 2007-12-04 | 2010-09-22 | 夏普株式会社 | Display device and method for manufacturing the same |
| TW201038996A (en) * | 2009-04-21 | 2010-11-01 | Wintek Corp | Flat display panel |
| CN102650763A (en) * | 2011-08-26 | 2012-08-29 | 北京京东方光电科技有限公司 | Liquid crystal display and manufacturing method thereof and monitor |
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