CN101241278A - Fringe field switching mode liquid crystal display device - Google Patents
Fringe field switching mode liquid crystal display device Download PDFInfo
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- CN101241278A CN101241278A CNA2008100081520A CN200810008152A CN101241278A CN 101241278 A CN101241278 A CN 101241278A CN A2008100081520 A CNA2008100081520 A CN A2008100081520A CN 200810008152 A CN200810008152 A CN 200810008152A CN 101241278 A CN101241278 A CN 101241278A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
- G02F1/133555—Transflectors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134336—Matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134318—Electrodes characterised by their geometrical arrangement having a patterned common electrode
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134372—Electrodes characterised by their geometrical arrangement for fringe field switching [FFS] where the common electrode is not patterned
Abstract
Provided is a Fringe Field Switching (FFS) mode Liquid Crystal Display (LCD) In the FFS mode LCD, a lower substrate, an upper substrate and a liquid crystal layer interposed between the substrates are included, each pixel region is defined by gate lines and data lines formed to cross each other on the lower substrate, and switching devices are disposed at intersections of the gate lines and the data lines. The FFS mode LCD includes a transparent pixel electrode, and a transparent common electrode disposed apart from the transparent pixel electrode by an insulating layer interposed between the transparent pixel electrode and the transparent common electrode, in the pixel region to adjust transmittance by applying an electric field to the liquid crystal layer, the transparent common electrode has a plurality of bars having a predetermined width in a direction substantially parallel to the data lines, the transparent common electrode has a first bar formed to cover the data lines and a second bar formed adjacent to the first bar in a central area of the pixel region, a distance between the first bar and the second bar is larger than a distance between bars formed in the pixel region, and one end of the transparent pixel electrode is disposed between the first bar and the adjacent secondbar.
Description
Technical field
[1] the present invention relates to fringe field switching (FFS) mode LCD (LCD), relate more specifically to a kind of with minimum cost and need not process the transmittance that just can realize increase and the FFS mode LCD of aperture opening ratio specially.
Background technology
[2] common, the FFS mode LCD is proposed low aperture opening ratio and the transmittance that is used for improving plane internal switch (IPS) mode LCD device, and this is disclosed by korean patent application No.1998-0009243.
[3] in the FFS mode LCD, public electrode and pixel electrode are made by transparent conductor, thereby comparing with the IPS mode LCD has increased aperture opening ratio and transmittance, and formed space is narrower than the space between the upper and lower glass substrate between public electrode and the pixel electrode, thereby between public electrode and pixel electrode, form fringe field, and drive all liquid crystal molecules that are present in the electrode top, obtain higher transmittance thus.
[4] but in the FFS mode LCD, can on data line, form the shading region that shuts out the light usually, this will reduce aperture opening ratio.
[5] if in order to increase aperture opening ratio shading region is removed, contrast (CR) will worsen because of light leak.So shading region can not be removed.
Summary of the invention
[6] electric field that forms of the present invention central authorities of being intended to make the electric field that forms in the data line to be different from pixel region, thus can remove shading region or reduce wherein to form the area of shading region.
[7] another object of the present invention is to increase aperture opening ratio and prevent light leak.
[8] further aim of the present invention is to adjust the clearance distance of data line, transparent common electrode and transparent pixels electrode, layout or the like, and thus with minimum cost and need not process specially fringe field switching (FFS) mode LCD (LCD) just can be provided.
[9] a further object of the invention is that to form low-impedance metal on the transparent common electrode in non-open region capable, wherein door row and data line pass described non-open region, thereby make electric current flow between the capable and transparent common electrode at metal, and reduced the impedance of transparent common electrode, and provide a kind of FFS mode LCD of high brightness thus, it can reduce the load of the public electrode wire (Vcom) in the LCD panel effectively, and can solve effectively such as picture quality problems such as increased the greening that causes by Vcom load, flash.
[10] one aspect of the present invention provides a kind of FFS mode LCD, it comprises infrabasal plate, upper substrate and be clipped in liquid crystal layer between the described substrate, capable and data line limits and forms each pixel region by door, described door row and data line are intersected with each other and form on infrabasal plate, and the infall of door row and data line is distributed with switchgear, wherein, described FFS mode LCD comprises transparent pixels electrode and transparent common electrode at pixel region, described transparent common electrode is arranged by insulation course and the described transparent pixels electrode branch that is clipped between transparent pixels electrode and the transparent common electrode, thereby just can regulate transmittance by apply electric field to liquid crystal layer, described transparent common electrode has a plurality of, described has predetermined width being basically parallel on the direction of described data line, described transparent common electrode has article one of cover data row at the middle section of pixel region, and the second adjacent with article one, article one and the distance between the second greater than the distance between the bar that forms in the pixel region, and an end of transparent pixels electrode is arranged between article one and the adjacent second.
[11] width of described article one can be set to 1 to 5 times of data line width.
[12] compare with second, an end of transparent pixels electrode can more close article one, and the centre between article one and second.
[13] preferably, in the non-photic zone that is lower than 10% minimum transmittance based on having of data line is comprised the width of data line into,, also may block the top of data line effectively even the shading region on the data line does not exist or sharply reduces.More preferably, the non-photic zone that is lower than 7% minimum transmittance based on having of data line can be included within the width of data line.
[14] the transparent pixels electrode can be tabular or bar seam shape.
[15] transparent common electrode when each pixel region is connected with each other, and same voltage is when putting on the transparent common electrode, and transparent common electrode can reduce whole impedance.
[16] another aspect of the present invention provides a kind of FFS mode LCD, it comprises infrabasal plate, upper substrate and be clipped in liquid crystal layer between the described substrate, capable and data line limits and forms each pixel region by door, described door row and data line intersected with each other forming on infrabasal plate, and the infall of door row and data line is distributed with switchgear, wherein, described FFS mode LCD comprises transparent pixels electrode and transparent common electrode at pixel region, described transparent common electrode is arranged by insulation course and the described transparent pixels electrode branch that is clipped between transparent pixels electrode and the transparent common electrode, thereby just can regulate transmittance by apply electric field to liquid crystal layer, described transparent common electrode has predetermined width being parallel on the direction of data line, and have a plurality of, and a bar covers and the described data line that insulate partially or entirely, and the electric field that forms in the middle section of formed electric field and pixel region in comprising the zone of data line is compared, and has littler ll vertical electric field component.
[17] simultaneously, if adjust the layout, clearance distance etc. of the voltage put on transparent pixels electrode and transparent common electrode and each electrode, the transmittance of data line and adjacent area can significantly reduce.So, can remove the shading region on data line and the adjacent area, perhaps sharply reduce wherein to be formed with the area of shading region, and can also prevent swing offset.
[18] another aspect of the present invention also provides a kind of FFS mode LCD, it comprises infrabasal plate, upper substrate and be clipped in liquid crystal layer between the described substrate, capable and data line limits and forms each pixel region by door, described door row and data line intersected with each other forming on infrabasal plate, and the infall of door row and data line is distributed with switchgear, wherein, described FFS mode LCD comprises transparent pixels electrode and transparent common electrode at pixel region, described transparent common electrode is formed with therein in the non-open region of a row and data line and is arranged by insulation course and the transparent pixels electrode branch that is clipped between transparent pixels electrode and the transparent common electrode, thereby just can regulate transmittance by apply electric field to liquid crystal layer, and on the transparent common electrode of non-open region or below, the metal that is provided with specific thicknesses is capable, to be electrically connected, be formed with a row and data line in the described non-open region with transparent common electrode.
Description of drawings
[19] in conjunction with the accompanying drawings exemplary embodiment of the present invention is elaborated, above-mentioned and other purpose of the present invention, feature and advantage will be more apparent to those of ordinary skill in the art.In the accompanying drawings:
[20] Figure 1A～Fig. 1 E is illustrated in the planimetric map that forms the process of pixel region layer on the infrabasal plate of FFS mode LCD device of exemplary embodiment of the present;
[21] Fig. 2 is the sectional view along I-I ' line among Figure 1A;
[22] Fig. 3 is the sectional view along II-II ' line among Figure 1A;
[23] Fig. 4 is the planimetric map that some layer among Figure 1A is shown;
[24] according to an exemplary embodiment of the present, Fig. 5 A～Fig. 5 D shows the comparison simulation result that transmittance changes along with end the position being set of transparent pixels electrode.
[25] Fig. 6 is the image that is illustrated in the minimum transmittance on the data line basis;
[26] Fig. 7 is the planimetric map of the FFS mode LCD device of another exemplary embodiment of the present invention;
[27] Fig. 8 is the sectional view along I-I ' line among Fig. 7;
[28] Fig. 9 is the sectional view along II-II ' line among Fig. 7;
[29] Figure 10 is the sectional view along I-I ' line among the improvement embodiment of Fig. 7;
[30] Figure 11 is the sectional view along II-II ' line among the improvement embodiment of Fig. 7.
Embodiment
[31] following will elaborating to exemplary embodiment of the present invention.But the present invention is not limited to following the disclosed embodiments, and can implement with various forms.In order to make those of ordinary skill in the art can implement and put into practice the present invention, following examples are described.
[32] the FFS mode LCD comprises infrabasal plate, upper substrate and is clipped in liquid crystal layer between the described substrate.Capable and data line limits and forms each pixel region by door, and described door row and data line are intersected with each other and form on described infrabasal plate.The infall of door row and data line is distributed with switchgear.In order to regulate transmittance by applying electric field to liquid crystal layer, the FFS mode LCD has transparent pixels electrode and transparent common electrode, described transparent pixels electrode is in the pixel region, described transparent common electrode is arranged by insulation course and the described transparent pixels electrode branch that is clipped between transparent pixels electrode and the transparent common electrode, thereby makes described transparent common electrode partly overlapping with described transparent pixels electrode.
[33] according to exemplary embodiment of the present invention, Figure 1A is the planimetric map that passes through the part of the pixel region of making processing and forming on the infrabasal plate of FFS mode LCD.Figure 1B～Fig. 1 E is a planimetric map of representing to form successively and pile up the process of each layer.Fig. 2 is the sectional view along I-I ' line among Figure 1A, and Fig. 3 is the sectional view along II-II ' line among Figure 1A.
[34] with reference to Figure 1A～Fig. 1 E, Fig. 2 and Fig. 3, door row G that is made by opaque metal and data line 600 arranged crosswise that meets at right angles on infrabasal plate 100 forms unit pixel thus.In this unit pixel district, transparent common electrode 800 and transparent pixels electrode 400 are provided with the insulation course 700 that is clipped between two electrodes 800 and 400.Transparent pixels electrode 400 is for example to be in the form setting of the flat board on the identical layer with data line 600, transparent common electrode 800 has a plurality of by the transparency conducting layer that is deposited on the insulation course 700 is graphically formed, and partly overlapping with transparent pixels electrode 400.
[35] on the gate pole 200 in the capable G of door, active patterns (active pattern) 500, source electrode 600a and drain electrode 600b are provided with the door insulation course 300 that is clipped between gate pole 200 and the active patterns 500, active patterns 500 has amorphous silicon (a-Si) layer and the n+a-Si layer of deposition successively, forms thin film transistor (TFT) (TFT) T thus.Drain electrode 600b is electrically connected with transparent pixels electrode 400, thereby provides data-signal to unit pixel.
[36] simultaneously, be formed at infrabasal plate 100 on each pixel region color filter (accompanying drawing is not shown) corresponding and that be used for manifesting screen color be arranged on upper substrate.Be different from conventional art, the shading region on data line 600, for example black matrix" can be removed, and perhaps compares with conventional art and can reduce.Be different from conventional art, shading region is preferably removed from data line 600.In addition, transparent common electrode 800 is not formed on the data line 600 in conventional art, but is formed on the data line 600 in exemplary embodiment of the present invention.
[37] describe the method for making the FFS mode LCD in detail now with reference to Figure 1A～Fig. 1 E, Fig. 2 and Fig. 3.
[38], comprise that the door row G of gate pole 200 is formed on the infrabasal plate 100 with reference to Figure 1A～Fig. 1 E, Fig. 2.More specifically, opaque metal layer deposits on infrabasal plate 100 and forms pattern, and thus, and the door row G that comprises gate pole 200 is formed in the TFT T zone on the infrabasal plate 100.
[39] subsequently, door insulation course 300 is deposited on the whole infrabasal plate 100, thereby cover the door row G that comprises gate pole 200, by deposition on door insulation course 300 and graphical transparency conducting layer, tabular transparent pixels electrode 400 is formed and is distributed in each pixel region then.
[40] on above-mentioned synthetic substrate, a-Si layer and n+a-Si layer deposit and successively by graphical, thereby form active patterns 500 on the door insulation course 300 above the gate pole 200.
[41] be used for the layer metal deposition of source electrode and drain electrode after, with described metallic layer graphic, thereby form the data line 600 comprise source electrode 600a and drain electrode 600b, form TFT T thus.Herein, drain electrode 600b is set to be electrically connected with pixel electrode 400.
[42] subsequently, for example the insulation course of being made by silicon nitride (SiNx) 700 is deposited on the composite structure that wherein is formed with TFT T, and the transparent common electrode 800 of bar seam shape is overlapping with transparent pixels electrode 400 partially or entirely then.After this, though not shown in figures, alignment is deposited on the topmost of the synthetic substrate that wherein is formed with public electrode 800, finishes the manufacturing of array base palte thus.
[43] simultaneously, color filter selectively is formed on the upper substrate, and alignment is formed on the synthetic substrate.Upper substrate and infrabasal plate 100 are finished the FFS mode LCD of exemplary embodiment of the present thus with the liquid crystal layer that is clipped between described substrate.Needless to say, after described substrate was linked together, polarizer can be connected on the outside surface of each substrate.
[44] in Figure 1A, transparent pixels electrode 400 is represented as flat type.Transparent pixels electrode 400 can also have shapes such as bar seam shape, but tabular is more effective than other shapes.
[45] with reference to Fig. 4, the structure that comprises a plurality of transparent common electrode 800 has covered the entire portion except the zone (referring to Figure 1A and Fig. 2) that wherein is formed with TFT T, and need not interconnection line and just can be electrically connected with each pixel region.
[46] with reference to Fig. 3 and Fig. 4 exemplary embodiment of the present invention is described in further detail below.
[47] transparent common electrode 800 has a plurality of, and described has predetermined width on the direction that is basically parallel to data line 600.Article one C of transparent common electrode 800
1Form and cover whole data line 600, thereby the shading region on the data line 600 that conventional art adopted can be removed or significantly reduce.
[48] in other words, article one C
1Be arranged on the data line 600, thereby can reduce swing offset and increase transmittance.Herein, article one C
1Width L
1Width L greater than data line 600
3, this can cover whole data line 600 effectively.In this structure, article one C
1Can be used in the electric field of block data row 600.Preferably, article one C
1Width L
1Can be set to data line 600 width L
31 to 5 times, and more preferably, article one C
1Width L
1Can be set to data line 600 width L
32 to 4.5 times.
[49] article one C of transparent common electrode 800
1With second C
2Between distance D
1Be provided with greater than the distance D between the bar that in pixel, forms
2In this structure, with compare with the electric field that transparent common electrode 800 forms by transparent pixels electrode 400 among the middle section A of pixel region, the electric field that is formed by transparent pixels electrode 400, transparent common electrode 800 and data line 600 in the area B that comprises data line 600 has littler ll vertical electric field component.Article one, C
1With adjacent second C
2Between distance D
1Can be provided with than the distance D between the bar that forms in the pixel
2Big 0.5～3 μ m.
[50] preferably, second C
2Width L
2Be set to less than article one C
1With second C
2Between distance D
1, also less than second C
2With adjacent to second C
2The 3rd C
3Between distance D on the pixel region direction
2More preferably, second C
2Width L
2Be set to than article one C
1With second C
2Between distance D
1Little 2～4 μ m.In addition, second C
2Width L
2Be set to than second C
2With the 3rd C
3Between distance D
2Little 1.5～2.5 μ m.
[51] an end E of transparent pixels electrode 400 is arranged on article one C of the transparent common electrode 800 of cover data row 600
1With adjacent second C
2Between.Preferably and second C
2Compare the more close article one C of an end E of transparent pixels electrode 400
1More preferably, an end E of transparent pixels electrode 400 is positioned at article one C
1With second C
2Between central portion.Term " central portion " expression is essentially the zone of central authorities, and central portion in reality processing, compare and can have predetermined error with accurate central authorities (about accurate central authorities ± 0.5 μ m in).
[52] simultaneously, in this structure, non-photic zone can be formed on the data line 600, and has the width that is similar to data line 600, and this will reduce the deterioration of transmittance and prevent light leak.Therefore, even the shading region on the data line 600 that conventional art adopted reduced or when removing, light also can be blocked.
[53] according to an exemplary embodiment of the present, Fig. 5 A～Fig. 5 D represented transmittance along with an end E of transparent pixels electrode 400 at article one C
1With second C
2Between the position is set and the comparison simulation result that changes.
[54] with reference to Fig. 5 A～Fig. 5 D, when with article one C
1Compare the more close second C of an end E of transparent pixels electrode 400
2The time, transmittance is 63.94% (referring to Fig. 5 A).When an end E of transparent pixels electrode 400 is arranged on article one C
1With second C
2Between accurate centre the time, transmittance is 74.46% (referring to Fig. 5 B).As the more close article one C of an end E of transparent pixels electrode 400
1The time, transmittance is 75.72% (referring to Fig. 5 C).End E extend through article one C when transparent pixels electrode 400
1The time, transmittance is 76.12% (referring to Fig. 5 D).In theory, the transmittance of Fig. 5 A～Fig. 5 D is in that install additional will be divided by 2 under the situation of polarizer.
[55] in the situation of Fig. 5 A, if will think it is non-photic zone corresponding to for example zone less than 10% minimum transmittance, the width X of non-photic zone is set to relatively the width L greater than data line 600
3So aperture opening ratio reduces, and transmittance also integral body is lower.
[56] in the situation of Fig. 5 D, transmittance is higher, but the smallest point of the light transmittance curve corresponding with the top of data line 600 is higher than 10%.So non-photic zone does not almost form, and light leak occurred.Therefore, can not remove or reduce shading region on the data line 600.
[57] the present inventor finds, situation shown in Fig. 5 B or Fig. 5 C and second C
2Compare, an end E of transparent pixels electrode 400 is at article one C
1With second C
2Between be set to be near article one C
1, perhaps be set to be in article one C
1With second C
2Between central portion can be more effective.
[58] with reference to Fig. 5 B and Fig. 5 C, if will think it is non-photic zone corresponding to for example zone less than 10% minimum transmittance, the width X of non-photic zone can be set to be equal to or less than the width L of data line 600
3More particularly, the present inventor finds can guarantee transmittance in non-photic zone, prevents light leak, and forms the suitable non-photic zone that is similar to data line 600.
[59] simultaneously, in Fig. 5 A, the curve that the transmittance on data line 600 tops draws reduces from maximal value, and far below the maximal value of pixel region, reduces so transmittance is whole.In Fig. 5 D, the minimum transmittance on data line 600 tops is higher than the minimum transmittance on data line 600 tops among Fig. 5 A, Fig. 5 B and Fig. 5 C, thereby does not form non-photic zone.
[60] be described in further detail with reference to Fig. 6 below.
[61] Fig. 6 is the image of expression based on the minimum transmittance of data line.With reference to Fig. 6, show the para-curve of transmittance, described para-curve has smallest point (referring to Fig. 5 A～Fig. 5 D) in the central authorities of data line 600.
[62] herein, suppose light transmittance curve wherein corresponding to 10% or be restricted to non-photic zone less than 10% zone, the present inventor finds, is set to be equal to or less than the width L of data line 600 when non-photic zone
3The time, effect of the present invention is best.
[63] in other words, when with light transmittance curve (a)～(d) when shown in Figure 6, the width L of data line 600
3Can compare with the width of the non-photic zone of each light transmittance curve.Then, light transmittance curve (a) is much larger than the width L of data line 600
3, the non-photic zone of light transmittance curve (b) and the width L of data line 600
3Have approximate size, light transmittance curve (c) is than the width L of data line 600
3Little, light transmittance curve (d) does not have non-photic zone.
[64] simultaneously, if the non-photic zone of light transmittance curve is equal to or less than the width L of data line 600
3, just can guarantee transmittance, and can prevent light leak, and suitable non-photic zone is set to be similar to data line 600.So, may not have shading region (being formed on the substrate usually), perhaps can not form the shading region that significantly reduces.
[65] in Fig. 6, non-photic zone has the transmittance less than 10%.Preferably, transmittance is confirmed to be non-photic zone less than 10% zone, but transmittance can be less than 5% or less than 7%.
[66] Fig. 7 is the planimetric map of the FFS mode LCD device of another exemplary embodiment of the present invention.Fig. 8 is the sectional view along I-I ' line among Fig. 7, and Fig. 9 is the sectional view along II-II ' line among Fig. 7.Figure 10 is the sectional view along I-I ' line among the improvement embodiment of Fig. 7, and Figure 11 is the sectional view along II-II ' line among the improvement embodiment of Fig. 7.
[67] with reference to Fig. 7～Figure 11, the FFS mode LCD of another exemplary embodiment of the present invention roughly comprises upper substrate 1100 and the infrabasal plate 1200 that links together and face with each other, and is filled in by the liquid crystal layer 1300 in two substrates and the formed liquid crystal spatial of escapement (not shown).
[68] herein, upper substrate 1100 is often referred to color filter array substrate, and roughly comprises insulated substrate 1110, shading region 1120, color filter 1130 or the like.
[69] shading region 1120 is the lightproof unit that are used to prevent light leak, and is formed on the substrate 1110 with specific distance.Usually, shading region 1120 limits the border of red (R), green (G) and blue (B) color filter, and is formed by the sensitization organic material that comprises carbon black.
[70] color filter 1130 comprises the redness (R) that is arranged between each shading region 1120, green (G) and blue (B) color filter pattern, and color filter 1130 is used for giving color to light, and described light is from the emission of back light unit (not shown) and pass liquid crystal layer 1300.
[71] more particularly, door row GL that forms by opaque metal and the data line DL arranged crosswise that on infrabasal plate 1200, meets at right angles, thus form unit pixel.In the unit pixel district, transparent common electrode 1220 and transparent pixels electrode 1230 are provided with the insulation course 1240 that is clipped between two electrodes 1220 and 1230.Transparent pixels electrode 1230 is on the layer identical with data line DL, with for example dull and stereotyped form setting, by the transparency conducting layer that is deposited on the insulation course 1240 is carried out graphically, transparent common electrode 1220 forms has a plurality of, and partly overlapping with transparent pixels electrode 1230.
[72] on the gate pole 1250 in the capable GL of door, active patterns 1270, source electrode 1280a and drain electrode 1280b are provided with the door insulation course 1260 that is clipped between gate pole 1250 and the active patterns 1270, active patterns 1250 comprises the a-Si layer and the n+a-Si layer of deposition successively, forms TFT thus.Drain electrode 1280b is electrically connected with transparent pixels electrode 1230, thereby provides data-signal to unit pixel.
[73] especially, the Low ESR metal capable 1290 that is used for reducing transparent common electrode 1220 impedances is at non-open region, for example form on the transparent common electrode 1220 of non-photic zone and have specific thickness, and be electrically connected with transparent common electrode 1220, be formed with a row GL and a data line DL in the wherein said non-open region.
[74] herein, the thickness of low-impedance metal capable 1290 is about hundreds of dust (), therefore the transparent common electrode 1220 that forms on metal capable 1290 is not disconnected by jump (step difference), and perhaps the described light leak that is caused by friction (rubbing) jump also is minimized.Yet along with the increase of LCD size, in order to reduce the impedance of transparent common electrode 1220, the thickness of metal capable 1290 can be about 1000 or bigger.
[75] simultaneously, as shown in Figure 10 and Figure 11, low-impedance metal capable 1290 can be formed at transparent common electrode 1220 below.
[76] low-impedance metal capable 1290 can be formed by low-impedance metal material, and described metal material for example comprises at least a or at least a their alloy in copper (Cu), aluminium (Al), neodymium aluminium (AlNd), molybdenum (Mo), titanium (Ti) and the tungsten molybdenum (MoW).
[77] as mentioned above, in order to reduce the impedance of transparent common electrode 1220, above the transparent common electrode 1220 in non-open region or below, be formed with Low ESR metal capable 1290 and be electrically connected being used for, wherein door row GL and data line DL pass described non-open region.So, can reduce the load of the public electrode wire (Vcom) in the LCD panel effectively, and can solve effectively such as picture quality problems such as increase the greening that causes by Vcom load, flash.
[78] according to FFS mode LCD of the present invention, can be at the shading region that is used for shutting out the light, remove or reduce to be formed at shading region on the data line, and can prevent light leak and swing offset.
[79] in addition, the present invention adjusts width, layout of data line, transparent common electrode and transparent pixels electrode or the like, and thus with minimum cost and need not just process specially and can increase aperture opening ratio.
[80] in addition, the present invention can easily be applied to the liquid crystal board of FFS structure, is being used for the medium-sized liquid crystal board and the compact liquid crystal panels of notebook etc., has higher brightness and does not have picture quality problems, reduces greening problem or the like such as aperture opening ratio.
[81] although show the present invention and be described with reference to certain exemplary embodiments, but those skilled in the art are to be understood that, under the situation that does not deviate from the spirit and scope of the present invention that claims limit, can do conversion on various forms and the details to the present invention.
Claims (18)
1. a fringe field switching (FFS) mode LCD (LCD), comprising infrabasal plate, upper substrate and be clipped in liquid crystal layer between the described substrate, capable and data line limits and forms each pixel region by door, described door row and data line are intersected with each other and form on described infrabasal plate, and the infall of described door row and data line is distributed with switchgear
Wherein, described FFS mode LCD comprises transparent pixels electrode and transparent common electrode at described pixel region, described transparent common electrode is arranged by insulation course and the described transparent pixels electrode branch that is clipped between described transparent pixels electrode and the transparent common electrode, thereby just can regulate transmittance by apply electric field to liquid crystal layer
Described transparent common electrode has a plurality of, and described has predetermined width being basically parallel on the direction of described data line,
Described transparent common electrode has article one of cover data row at the middle section of described pixel region, and the second adjacent with described article one,
Distance between described article one and the second is greater than the distance between the bar that forms in the pixel region, and
One end of described transparent pixels electrode is arranged between described article one and the second.
2. FFS mode LCD according to claim 1, wherein, the width of article one of described transparent common electrode that covers described data line is greater than the width of the second of adjacent described transparent common electrode.
3. FFS mode LCD according to claim 1, wherein, described transparent pixels electrode is arranged on the layer identical with described data line.
4. FFS mode LCD according to claim 1, wherein, described transparent pixels electrode and data line are provided with the insulation course that is clipped between them.
5. FFS mode LCD according to claim 1 wherein, is compared with described second, the more close described article one of an end of described transparent pixels electrode.
6. FFS mode LCD according to claim 1, wherein, an end of described transparent pixels electrode is arranged at the central portion between described article one and the second.
7. FFS mode LCD according to claim 1 wherein, has the non-photic zone that is lower than 10% minimum transmittance and is comprised in the width of described data line into based on described data line.
8. FFS mode LCD according to claim 7 wherein, has the non-photic zone that is lower than 7% minimum transmittance and is comprised in the width of described data line into based on described data line.
9. FFS mode LCD according to claim 1, wherein, described transparent pixels electrode can be tabular or bar seam shape.
10. FFS mode LCD according to claim 1, wherein, the transparent common electrode of each described pixel region is connected with each other, and same voltage puts on the described transparent common electrode.
A 11. fringe field switching (FFS) mode LCD (LCD), comprising infrabasal plate, upper substrate and be clipped in liquid crystal layer between the described substrate, capable and data line limits and forms each pixel region by door, described door row and data line are intersected with each other and form on described infrabasal plate, and the infall of described door row and data line is distributed with switchgear
Wherein, described FFS mode LCD comprises transparent pixels electrode and transparent common electrode at described pixel region, described transparent common electrode is arranged by insulation course and the described transparent pixels electrode branch that is clipped between described transparent pixels electrode and the transparent common electrode, thereby just can regulate transmittance by apply electric field to liquid crystal layer
Described transparent common electrode has predetermined width being parallel on the direction of described data line, and has a plurality of, and a bar is set to partly or wholly cover and insulate described data line, and
The electric field that forms in the middle section of formed electric field and described pixel region in comprising the zone of described data line is compared, and has littler ll vertical electric field component.
12. FFS mode LCD according to claim 11, wherein, described transparent common electrode has the article one that covers described data line fully in described pixel region, and the second adjacent with described article one.
13. FFS mode LCD according to claim 12, wherein, an end of described transparent pixels electrode is arranged between article one and second of described transparent common electrode.
14. FFS mode LCD according to claim 12 wherein, is compared with described second, more close article one of an end of described transparent pixels electrode.
15. FFS mode LCD according to claim 12, wherein, an end of described transparent pixels electrode is arranged at the central portion between described article one and the second.
16. FFS mode LCD according to claim 12 wherein, has the non-photic zone that is lower than 10% minimum transmittance and is comprised in the width of described data line into based on described data line.
A 17. fringe field switching (FFS) mode LCD (LCD), comprising infrabasal plate, upper substrate and be clipped in liquid crystal layer between the described substrate, capable and data line limits and forms each pixel region by door, described door row and data line are intersected with each other and form on described infrabasal plate, and the infall of described door row and data line is distributed with switchgear
Wherein, described FFS mode LCD comprises transparent pixels electrode and transparent common electrode at described pixel region, described transparent common electrode is arranged by being clipped in described transparent pixels electrode in the non-open region and the insulation course between the transparent common electrode and described transparent pixels electrode branch, be formed with described door row and data line in the described non-open region, thereby just can regulate transmittance by apply electric field to liquid crystal layer, and
On the described transparent common electrode of non-open region or below, the metal that is provided with specific thicknesses is capable, to be electrically connected with described transparent common electrode, is formed with described door row and data line in the described non-open region.
18. FFS mode LCD according to claim 17, wherein, described metal is capable to be formed by low-impedance metal material, and described metal material comprises at least a or at least a their alloy in copper (Cu), aluminium (Al), neodymium aluminium (AlNd), molybdenum (Mo), titanium (Ti) and the tungsten molybdenum (MoW).
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| KR1020070011855A KR100849599B1 (en) | 2007-02-05 | 2007-02-05 | Fringe field switching mode liquid crystal display device |
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| KR10-2007-0011855 | 2007-02-05 | ||
| KR1020070071631A KR100862926B1 (en) | 2007-07-18 | 2007-07-18 | Fringe field switching mode liquid crystal display device and manufacturing method thereof |
| KR1020070071631 | 2007-07-18 | ||
| KR10-2007-0071631 | 2007-07-18 |
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| CN108983510A (en) * | 2018-08-02 | 2018-12-11 | 上海天马微电子有限公司 | Display panel and 3D printing system |
| CN108983510B (en) * | 2018-08-02 | 2022-03-29 | 上海天马微电子有限公司 | Display panel and 3D printing system |
| CN111103734A (en) * | 2018-10-25 | 2020-05-05 | 京东方科技集团股份有限公司 | Array substrate, display panel and display device |
| US11392002B2 (en) | 2018-10-25 | 2022-07-19 | Chongqing Boe Optoelectronics Technology Co., Ltd. | Array substrate, display panel and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101241278B (en) | 2012-12-19 |
| KR100849599B1 (en) | 2008-07-31 |
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