CN103088290A - Mask alignment optical system - Google Patents
Mask alignment optical system Download PDFInfo
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- CN103088290A CN103088290A CN2012104171965A CN201210417196A CN103088290A CN 103088290 A CN103088290 A CN 103088290A CN 2012104171965 A CN2012104171965 A CN 2012104171965A CN 201210417196 A CN201210417196 A CN 201210417196A CN 103088290 A CN103088290 A CN 103088290A
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- mask
- guide path
- fixed frame
- substrate
- metal mask
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a mask alignment optical system where a transparent illumination method is utilized and which is excellent in performance and can effectively use a mask. The mask alignment optical system aligns a metal mask (102) with a substrate (6), and is provided with a fixed frame (101) and a carrying platform (201), wherein the fixed frame (101) is formed around the metal mask with L-shaped light guide paths forming at the four corners, and the carrying platform (201) carries the substrate on the surface with light guide paths forming at the four corners. Alignment with the metal mask is performed by using transmission images of alignment marks formed by light guided into the light guide paths formed on part of the fixed frame and the light guide paths formed on part of the carrying platform.
Description
Technical field
The present invention relates in order to make organic el device to be used for the mask registration with respect to substrate configuration metal mask, relate in particular to the mask registration optical system of the part of the framework that has utilized mask.
Background technology
As making organic EL(electroluminescent) the strong method of equipment has vacuum vapour deposition.In this vacuum evaporation, need to be with substrate and mask registration.In addition, in recent years, for organic el device, the stormy waves of the maximization of its treatment substrate constantly gushes, and for example, G6 substrate size from generation to generation is 1500mm * 1800mm, thereupon, in the maximization of substrate size, mask also maximizes certainly, and its size has even reached about 2000mm * 2000mm.Especially in the organic el device of the mask that uses steel, its weight has also reached 300kg, in the past, will make its contraposition after substrate and mask horizontal positioned.Moreover the prior art is for example open in following patent documentation 1.
Patent documentation 1: TOHKEMY 2006-302896 communique
In organic EL evaporation coating device, with metal mask with the luminescent material evaporation on substrate, at this moment, along with the maximization of equipment, need high-precision alignment system.
In addition, organic EL evaporated device carries out evaporation under the state that this metal mask and substrate are close to after using metal mask and aiming at as the mark on the substrate of target.The configuration of this moment is carried out in the following order, at first configures vapor deposition source, and next configures mask, and placement substrate, this moment, especially due to the characteristic of vapor deposition source, can not arrange fixed mechanism between this vapor deposition source and mask afterwards.
In addition, because above-mentioned program is all carried out in the high vacuum in vacuum chamber, therefore can not configure complicated mechanism.
And, the problem points below existing in the alignment system of in the past evaporation coating device.
1. pattern efficient
In the past, owing to disposing alignment mark (pattern) in the evaporation zone of pattern, therefore dwindled as the product pattern zone for the manufacture of the zone of product, and then exist this alignment mark (pattern) by the problem of evaporation.
2. transillumination
Aspect the illumination that is used for aiming at, so-called " reflection mode " and " transmission mode " are arranged, in general transmission mode is better, but due to the restriction between above-mentioned vapor deposition source and mask, can not configure optical system, therefore the reflection modes that adopt more.Moreover, as device, no matter be reflection mode or transmission mode, it is optimal using respectively according to situation.
3. non-luminouslighting
If alignment mark is configured in outside the evaporation zone, therefore mask frame and this mask overlap be created in the problem points that is difficult to this alignment mark of identification in the backside reflection of mask frame.
Summary of the invention
So the present invention makes in view of the problem points of above-mentioned prior art, more particularly, its purpose especially is to be provided at when adopting the transillumination mode, can effectively use the mask registration optical system of mask.
in order to achieve the above object, according to the present invention, at first a kind of mask registration optical system is provided, in the vacuum evaporation chamber to the substrate with the deposition material evaporation, carry out aiming at of this substrate and the metal mask that is consisted of by metallic film, possess fixed frame and Stage microscope, described fixed frame be formed on described metal mask around, and be formed with the guide path of " L " word shape on Qi Sijiao, described Stage microscope carries described substrate from the teeth outwards, and be formed with the guide path of " L " word shape on Qi Sijiao on the position corresponding with the guide path of described fixed frame, utilization is located at the metal mask mark on the part of described metal mask and is located at the picture that is formed by transillumination of alignment mark on the part of described substrate, carry out and the aiming at of metal mask, described transillumination is to form by importing to the light that is formed on the guide path on described fixed frame and is formed in guide path on described Stage microscope.
And then, in the present invention, in the mask registration optical system of above record, an end of guide path that is preferably formed in " L " word shape on the part of described fixed frame is in the top of described fixed frame or opening is set below, and an end of guide path that is formed on " L " word shape on the part of described Stage microscope is in the top of described Stage microscope or opening is set below.And the outside that is preferably in described vacuum evaporation chamber is provided with: to the light source of described guide path incident light; And the pick up camera section of be used for taking the picture that the transillumination by the described alignment mark that penetrates from described guide path forms.
The present invention has following beneficial effect.
According to the invention described above, can access the good technique effect of following practicality, that is, can provide and utilize the transillumination mode and functional, and can effectively use the mask registration optical system of mask.
Description of drawings
Fig. 1 means the stereographic map of an example of the internal structure of the organic el device manufacturing installation that adopts mask registration optical system of the present invention.
Fig. 2 means the local amplification stereogram of an example of detailed construction of the mask section of the aligned portions that consists of said apparatus.
Fig. 3 means the local amplification stereogram of an example of detailed construction of the mask section of the aligned portions that consists of said apparatus.
Fig. 4 comprises the local amplification view of details of the mask alignment system of aforementioned mask section and Stage microscope section for explanation.
Fig. 5 means the figure of an example that takes simultaneously the picture of the lip-deep alignment mark that is formed on substrate and metal mask with imaging apparatus.
In figure:
1-vacuum evaporation chamber, 8-aligned portions, 100-mask section, the 101-fixed frame, 102-metal mask, 103, the 202-communicating pores, 104,203-end face, 106, the 204-speculum, 200-Stage microscope section, the 201-Stage microscope, the 6-substrate, 61-alignment mark, 301,303-window section, the 302-light source, the 304-pick up camera.
Embodiment
Below, explain embodiments of the present invention with reference to accompanying drawing.Moreover in the following detailed description, at first, for adopting organic el device manufacturing installation of the present invention, especially its organic EL film deposition system illustrates its summary, and explains the mask registration optical system of the present invention that becomes in this device.
Consist of organic EL film deposition system of organic el device manufacturing installation, thereby work as evaporation luminescent material in vacuum environment forms the EL floor on substrate vacuum evaporation chamber, below, about this vacuum evaporation chamber, be illustrated in appended Fig. 1 together with conveying chamber.In figure, the transfer robot 5 in conveying chamber has the arm 51 of three bar linkage structures, and this arm 51 can move whole (with reference to the arrow 59 of Fig. 1) up and down, and can rotate to the left and right, has at its front end the comb teeth-shaped hand 58 that substrate is carried use.
On the other hand, vacuum evaporation chamber 1 roughly comprises: steam plating part 71,76 makes the rear evaporation of luminescent material distillation on substrate 6; Aligned portions 8, carry out and shadow mask between contraposition, and such as the required part evaporation luminescent material on the substrates such as sheet glass 6; And junction 91,93, and above-mentioned transfer robot 5 between carry out the handing-over of substrate 6, and this substrate 6 is moved to steam plating part 71,76.Aligned portions 8 and junction 91,93 are divided into right side R line and these two systems of left side L line and arrange.
Namely, mask is clamped with electrode not only form luminous material layer (EL layer) on substrate after, also form positive hole injecting layer or transfer layer on anode, and then form multilayer electronic input horizon or transfer layer etc. with various materials with the form of film on negative electrode, perhaps cleaning base plate, in general, roughly comprise the group of packing into of moving into the substrate 6 of processing object, process a plurality of groups of aforesaid substrate and between each group or a plurality of handing-over chamber of group and the setting between group or next operation (sealing process) of packing into etc.Moreover, in the present embodiment, the evaporation face of substrate as the upper surface conveying substrate, on the other hand, when evaporation, is carried out evaporation under the state that this substrate is erected.
And, according to embodiments of the invention, above-mentioned aligned portions 8(namely, the mask registration optical system) comprise the following mask section that is described in detail 100 and Stage microscope section 200.
At first, the structure that has represented mask section 100 in appended Fig. 2, as shown in the figure, possess fixed frame 101 and metal mask 102, wherein, fixed frame 101 for example utilizes metallic substance profile to be formed " mouth " word shape, and metal mask 102 is arranged on the one side (being the back side in legend) of this fixed frame with the state to direction stretching (giving tension force) in length and breadth, and formed by metallic film, and thickness of slab is 40 ~ 100 μ m.And, in the part of this fixed frame 101, more particularly, be in this example on four jiaos, the periphery of " mouth " word shape, be formed with respectively the communicating pores 103 that forms guide path.
Moreover, as appended shown in Figure 4, this details of communicating pores 103 that becomes guide path is as follows, end face 104 extending towards vertical direction along above-mentioned metal mask 102 from the top that consists of fixed frame 101, and form so-called " L " word shape from the scarp (for example, angle of inclination=45 degree) 105 of the inner peripheral surface that forms this framework to the direction vertical with respect to the face of above-mentioned metal mask 102.And, on this scarp 105 (that is, on the bottom of these communicating poress 103), with angle of inclination=45 degree, speculum 106 is installed.That is, formed the guide path of " L " word shape by communicating pores 103 and speculum 106.Moreover in Fig. 2 and Fig. 3, label 107 is illustrated in and forms poroid metal mask mark on above-mentioned metal mask 102.
On the other hand, as appended shown in Figure 4, the tabular Stage microscope 201 of load board 6 consists of by being used in its surface in Stage microscope section 200, and on Qi Sijiao, namely, on the position corresponding with the communicating pores 103 on a part that is formed on above-mentioned fixed frame 101, with the above-mentioned communicating pores that becomes guide path 202 that forms " L " word shape that similarly is formed with.Moreover in this Fig. 3, label 61 expressions are formed on the lip-deep alignment mark of aforesaid substrate 6.
Moreover, with above-mentioned same, represented the details of this communicating pores that becomes guide path 202 in appended Fig. 4, as as we know from the figure, from end face 203 the extending towards vertical direction along above-mentioned metal mask 102 that consists of its top, and form on the direction vertical with respect to the face of above-mentioned metal mask 102, and, bottom at these communicating poress 202 (for example forms the scarp, angle of inclination=45 degree) 204, and, with angle of inclination=45 degree, speculum 205 is installed on this scarp 204.That is, formed the guide path of " L " word shape by communicating pores 202 and speculum 205.
Next, with reference to Fig. 4, the action of aforementioned mask alignment optical system is described.That is, as shown in Figure 4, the Stage microscope 201 of above-mentioned Stage microscope section 200 in its surface load board 6 and upright after, mobile aforementioned mask section 100 is so that metal mask 102 is in preposition (that is, carrying out mask registration) with respect to aforesaid substrate 6.In addition, at this, for example, the vapor deposition source that is used for evaporation EL material is located at the left side of figure.
At this moment, according to the above mask registration optical system that describes its structure in detail, via the window section (transmission material such as glass) 301 on a part that is formed on vacuum evaporation chamber 1, to come from and be located at the outside illumination light such as the light sources such as lamp 302, form the communicating pores 103(of end face 104 to the top with the fixed frame 101 of aforementioned mask section 100 namely, guide path) irradiation (with reference to the arrow in figure).This illumination light by relative substrate 6, incides the lip-deep communicating pores 202(guide path that is formed on Stage microscope 201 by speculum 106 reflections (with reference to the arrow in figure) of the bottom that is arranged on above-mentioned communicating pores 103).The light of this incident is again by speculum 204 reflection of the bottom that is arranged on this communicating pores 202, the communicating pores 202(guide path from the top end face 203 that is formed on above-mentioned Stage microscope 201) penetrate.As the arrow from figure as can be known, this ejaculation light incides the pick up camera section 304 that is located at equally the outside of vacuum evaporation chamber 1 with above-mentioned light source 302 via other window section (transmission material such as glass) 303.
Namely, this pick up camera section 304 possesses imaging apparatus such as the incident optical system that comprises lens and CCD simultaneously, this imaging apparatus can be with the illumination light that comes from above-mentioned light source 302 as transillumination, takes simultaneously the lip-deep alignment mark 61 that is formed on aforesaid substrate 6 and metal mask 102(with reference to Fig. 5).Then, utilize alignment mark and the metal mask taken by this imaging apparatus, utilize not shown driving mechanism and its control part to adjust the position of metal mask 102 at this, so that metal mask 102 is in preposition with respect to aforesaid substrate 6.
As from the above description, mask registration optical system according to the invention described above, by on the part of the mask frame that consists of aforementioned mask section, guide path being set, alignment mark can be configured in metal mask the evaporation zone the outside (more particularly, between metal mask and mask frame), therefore can not cause because of metal mask dwindling as the product pattern zone for the manufacture of the zone of product, just can realize effective application of mask.In addition, according to the mask registration optical system of the invention described above, utilize the transillumination mode, can realize metal mask that performance is better and the mask registration of substrate.
Claims (3)
1. mask registration optical system in the vacuum evaporation chamber to the substrate with the deposition material evaporation, is carried out aiming at of this substrate and the metal mask that is made of metallic film, it is characterized in that,
Possess fixed frame and Stage microscope,
Described fixed frame be formed on described metal mask around, and be formed with the guide path of " L " word shape on Qi Sijiao,
Described Stage microscope carries described substrate from the teeth outwards, and is being formed with the guide path of " L " word shape on Qi Sijiao on the position corresponding with the guide path of described fixed frame,
Utilization is located at the metal mask mark on the part of described metal mask and is located at the picture that is formed by transillumination of alignment mark on the part of described substrate, carry out and the aiming at of metal mask, described transillumination is to form by importing to the light that is formed on the guide path on described fixed frame and is formed in guide path on described Stage microscope.
2. mask registration optical system as claimed in claim 1, is characterized in that,
An end of guide path that is formed on " L " word shape on the part of described fixed frame is in the top of described fixed frame or opening is set below, and an end of guide path that is formed on " L " word shape on the part of described Stage microscope is in the top of described Stage microscope or opening is set below.
3. mask registration optical system as claimed in claim 2, is characterized in that,
Outside in described vacuum evaporation chamber is provided with: to the light source of described guide path incident light; And the pick up camera section of be used for taking the picture that the transillumination by the described alignment mark that penetrates from described guide path forms.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011236856A JP2013095930A (en) | 2011-10-28 | 2011-10-28 | Mask alignment optical system |
| JP2011-236856 | 2011-10-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103088290A true CN103088290A (en) | 2013-05-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012104171965A Pending CN103088290A (en) | 2011-10-28 | 2012-10-26 | Mask alignment optical system |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2013095930A (en) |
| KR (1) | KR101363202B1 (en) |
| CN (1) | CN103088290A (en) |
| TW (1) | TWI444486B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111270200A (en) * | 2018-12-05 | 2020-06-12 | 合肥欣奕华智能机器有限公司 | Evaporation equipment and alignment method |
| CN112534564A (en) * | 2018-08-07 | 2021-03-19 | 应用材料公司 | Material deposition apparatus, vacuum deposition system and method for processing large area substrates |
| CN112962061A (en) * | 2017-08-25 | 2021-06-15 | 佳能特机株式会社 | Alignment mark position detection device, vapor deposition device, and method for manufacturing electronic device |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102399575B1 (en) | 2014-09-26 | 2022-05-19 | 삼성디스플레이 주식회사 | Deposition accuracy inspecting apparatus and the inspecting method using the same |
| CN112771198A (en) * | 2018-10-22 | 2021-05-07 | 应用材料公司 | Material deposition apparatus, vacuum deposition system and method for processing large area substrates |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101783397A (en) * | 2008-12-15 | 2010-07-21 | 株式会社日立高新技术 | Organic el device manufacture apparatus, deposition apparatus and deposition method thereof, liquid crystal display manufacture apparatus, alignment apparatus and alignment method |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050097663A (en) * | 2004-04-02 | 2005-10-10 | 삼성전자주식회사 | Substrate for display device and method for exposing photosensitive film formed on the substrate and exposure system |
| KR101388345B1 (en) | 2005-09-09 | 2014-04-22 | 가부시키가이샤 니콘 | Exposure apparatus, exposure method, and device production method |
| KR20080049491A (en) * | 2006-11-30 | 2008-06-04 | 엘지전자 주식회사 | Apparatus and method for aligning mask in laser beam direct writing process, and apparatus and method for manufacturing flat panel display using mask in laser beam direct writing process |
| JP2008293798A (en) * | 2007-05-24 | 2008-12-04 | Toyota Industries Corp | Manufacturing method of organic el element |
| JP2008300056A (en) * | 2007-05-29 | 2008-12-11 | Shinko Electric Co Ltd | Mask alignment device |
| JP5167103B2 (en) * | 2008-12-15 | 2013-03-21 | 株式会社日立ハイテクノロジーズ | Deposition equipment |
| JP5277059B2 (en) * | 2009-04-16 | 2013-08-28 | 株式会社日立ハイテクノロジーズ | Film forming apparatus and film forming system |
| US20110143287A1 (en) | 2009-09-14 | 2011-06-16 | Nikon Corporation | Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method |
-
2011
- 2011-10-28 JP JP2011236856A patent/JP2013095930A/en active Pending
-
2012
- 2012-10-25 KR KR1020120118859A patent/KR101363202B1/en not_active IP Right Cessation
- 2012-10-26 TW TW101139705A patent/TWI444486B/en not_active IP Right Cessation
- 2012-10-26 CN CN2012104171965A patent/CN103088290A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101783397A (en) * | 2008-12-15 | 2010-07-21 | 株式会社日立高新技术 | Organic el device manufacture apparatus, deposition apparatus and deposition method thereof, liquid crystal display manufacture apparatus, alignment apparatus and alignment method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112962061A (en) * | 2017-08-25 | 2021-06-15 | 佳能特机株式会社 | Alignment mark position detection device, vapor deposition device, and method for manufacturing electronic device |
| CN112962061B (en) * | 2017-08-25 | 2023-10-03 | 佳能特机株式会社 | Alignment mark position detection device, vapor deposition device, and method for manufacturing electronic device |
| CN112534564A (en) * | 2018-08-07 | 2021-03-19 | 应用材料公司 | Material deposition apparatus, vacuum deposition system and method for processing large area substrates |
| CN111270200A (en) * | 2018-12-05 | 2020-06-12 | 合肥欣奕华智能机器有限公司 | Evaporation equipment and alignment method |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20130047601A (en) | 2013-05-08 |
| TWI444486B (en) | 2014-07-11 |
| KR101363202B1 (en) | 2014-02-13 |
| JP2013095930A (en) | 2013-05-20 |
| TW201323635A (en) | 2013-06-16 |
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Application publication date: 20130508 |