KR20050097663A - Substrate for display device and method for exposing photosensitive film formed on the substrate and exposure system - Google Patents

Abstract

Disclosed are a substrate for a display device, a substrate exposure method, and an exposure system having improved mass productivity. The substrate for a display device is disposed on a substrate body, a substrate body, a first display portion having a first planar area, a second display portion disposed on the substrate body, and having a first planar area and spaced apart from the first display portion by a predetermined distance. A first measurement unit and a second display unit disposed on the body and interposed between the first and second display units and disposed on the substrate body in association with the third display unit, the first display unit and the third display unit having a second planar area; And a second metrology portion disposed on the substrate body in association with. As a result, at least two display units having different planar areas and different exposure patterns can be simultaneously or individually exposed to the substrate body of one display device substrate, thereby greatly improving mass productivity.

Description

Substrate for display device, substrate exposure method and exposure system {SUBSTRATE FOR DISPLAY DEVICE AND METHOD FOR EXPOSING PHOTOSENSITIVE FILM FORMED ON THE SUBSTRATE AND EXPOSURE SYSTEM}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display device substrate, a substrate exposure method, and an exposure system, and more particularly, to a display device substrate, a substrate exposure method, and an exposure system for forming two types of photosensitive patterns having different planar areas.

In general, an exposure technique is a technique for patterning a photosensitive film by locally supplying light to the photosensitive film formed on a substrate. Exposure techniques are widely used in the manufacture of semiconductor devices, flat panel displays, and electronic components. In general, the patterning of the photosensitive film is performed by an exposure apparatus.

The conventional exposure apparatus exposes all the photosensitive films formed on the substrate in the same pattern. That is, the products manufactured on the substrate by the conventional exposure apparatus are all the same product.

However, in recent years, as the size of the substrate is gradually increased in order to further improve mass productivity, the number of products that can be manufactured simultaneously on one substrate is increased, while the parts which are difficult to manufacture on the substrate are also greatly increased. It is becoming.

For example, when manufacturing a 40-inch display on a substrate, if two 40-inch displays can be formed simultaneously on the substrate, if three 40-inch displays cannot be formed at the same time, the utilization efficiency of the substrate is It is greatly reduced.

Recently, in order to further improve the utilization efficiency of a substrate, for example, while manufacturing a 40-inch display on a substrate, a method of manufacturing a 17-inch display device where a 40-inch display device is difficult to manufacture has been developed. have.

However, when the 40-inch display and the 17-inch display are simultaneously formed on one substrate, many problems occur in the exposure process.

Accordingly, the present invention has been made in view of such a conventional problem, and a first object of the present invention is to provide a display device substrate for forming a high-quality exposure pattern in regions having different planar areas.

A second object of the present invention is to provide a substrate exposure method for manufacturing the substrate for a display device.

Further, a third object of the present invention is to provide an exposure system for exposing a photosensitive film formed on the substrate for a display device.

In order to implement the first object of the present invention, a substrate for a display device according to the present invention is disposed on a substrate body and a substrate body, and is disposed on a first display unit having a first planar area and a substrate body. A second display portion having a planar area and spaced apart from the first display portion by a predetermined distance, disposed on the substrate body, interposed between the first and second display portions, and having a second display area, a third display portion, a first display portion, and a third display portion; And a first measurement portion disposed on the substrate body in association with the display portion and a second measurement portion disposed on the substrate body in association with the second display portion.

In addition, a substrate exposure method embodying the second object of the present invention is a substrate having first and second display portions having a first planar area and third display portions having a second planar area and interposed between the first and second display portions. A method of exposing a light source, the method comprising: aligning first and third display parts and a mask using a first measuring part disposed around the first and third display parts, and measuring a gap between the mask and the substrate; Exposing the first and third display portions, aligning the second display portions and the mask using a second measurement portion disposed around the second display portion, and measuring a gap between the mask and the substrate; Exposing step.

Further, in order to realize the third object of the present invention, the exposure system according to the present invention is an optical system for supplying light, a first mask area having a first planar area and a second having a second planar area, disposed on a path of light. Mask body having a mask area, a mask having a first mask area disposed around the first mask area and the second mask area, and a second mask area located around the first mask area, a path of light passing through the mask A substrate having a first and second display area disposed on and corresponding to the first and second mask areas, respectively, and a first and second measurement part disposed corresponding to the first and second mask measurement keys, respectively. It includes a substrate plate to be mounted.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Display Board

Example 1

1 is a plan view showing a substrate for a display device according to a first embodiment of the present invention.

Referring to FIG. 1, a substrate 700 for a display device includes a substrate body 100, a first display unit 200, a second display unit 300, a third display unit 400, a first measurement unit 500, and a second. The measurement unit 600 is included.

The substrate body 100 includes a transparent substrate, for example, a glass substrate so that an image can be displayed. In this embodiment, the substrate body 100 has a cuboid plate shape.

The first display unit 200 is disposed on the substrate body 100. The first display portion 200 has a rectangular shape having a first planar area when viewed on a plane. At this time, the diagonal length of the first display portion 200 is 40 inches, for example.

The second display unit 300 is disposed on the substrate body 100. The second display unit 300 is spaced apart from the first display unit 200 in the second direction by a predetermined distance L, and the second display unit 300 has a rectangular shape having a first planar area when viewed in plan view. At this time, the diagonal length of the second display portion 300 is 40 inches, for example.

Preferably, the first display unit 200 and the second display unit 300 are disposed on the substrate body 100 in the same planar area and in the same shape.

The third display unit 400 is disposed on the substrate body 100. The third display unit 400 is disposed between the first display unit 200 and the second display unit 300. The third display portion 400 has a rectangular shape having a second planar area when viewed on a plane. At this time, the diagonal length of the third display unit 400 is, for example, 17 inches.

Reference numeral 450 is a fourth display unit arranged in series with the third display unit 400.

The third display unit 400 having a rectangular shape has two long sides and two short sides. Hereinafter, two long sides will be defined as a first long side 410 and a second long side 420. The first long side 410 is disposed near the first display unit 200, and the second long side 420 is disposed near the second display unit 300.

The first display unit 200 having a rectangular shape has two long sides and two short sides. Hereinafter, two long sides will be defined as a third long side 210 and a fourth long side 220. The third long side 210 is disposed near the first long side 410 of the third display unit 400, and the fourth long side 220 is disposed facing the third long side 210.

The second display unit 300 having a rectangular shape has two long sides and two short sides. Hereinafter, two long sides will be defined as a fifth long side 310 and a sixth long side 320. The fifth long side 310 is disposed close to the second long side 420 of the third display unit 400, and the sixth long side 320 faces the fifth long side 310 of the third display unit 400. Is placed.

The first measurement unit 500 may include corner portions that meet the short sides of the first display unit 200 connected to the fourth long side 220 and the fourth long side 220 of the first display unit 200, the third display unit 400, and the first side. 4 are respectively formed at portions facing the short sides of the display portion 450. Hereinafter, reference numerals 505, 510, 515, 520, 525, and 530 are assigned to the first measurement units 500, respectively.

The first measurement unit 500 is aligned with the mask measurement unit formed in the mask (not shown). Patterns for simultaneously exposing the first display unit 200 and the third display unit 400 are formed in the mask.

In the present embodiment, reference numeral 230 is a stitch line, and the area A and the third display unit 400 of the first display unit 200 are the first measurement unit 500 and the stitches shown by reference numerals 505, 510, 525, and 530. It is simultaneously exposed by lines 230. In addition, the area D and the fourth display unit 450 of the first display unit 200 are simultaneously exposed by the first measurement unit 500 and the stitch line 230 shown by reference numerals 510, 515, 520, and 525.

The second measurement unit 600 is formed at corner portions where the fifth long side 310, the sixth long side 320, and the short side of the second display unit 200 meet, respectively. Hereinafter, reference numerals 605, 610, 615, and 620 will be assigned to each of the second measurement units 600.

The second measurement unit 600 is aligned with the mask measurement unit formed in the mask. The second display unit 300 is aligned with the mask measurement unit formed in the mask by the second measurement unit 600. Hereinafter, reference numerals 605, 610, 615, 620, 625, and 630 will be assigned to each second measurement unit 600.

In the present embodiment, reference numeral 330 denotes a stitch line, and the C region of the second display unit 300 is exposed by the second measurement unit 600 and the stitch lines 330 shown as reference numerals 605, 610, 625, and 630. do. In addition, the F region of the second display unit 300 is exposed by the second measurement unit 600 and the stitch lines 330 shown by reference numerals 610, 615, 620, and 625.

Substrate Exposure Method

Example 2

2 is a flowchart illustrating a substrate exposure method according to a second embodiment of the present invention. The substrate used in the substrate exposure method according to the present embodiment is the same as the substrate for the display device shown in FIG.

1 and 2, first and third display parts 200 and 400 and a mask are aligned using the first measurement part 500 (step 100).

At this time, the position of the substrate body 100 and the mask is aligned by the first measurement unit 500, and the gap formed between the substrate body 100 and the mask is also measured.

A region of the first display portion 200 and B region of the third display portion 400, D region of the first display portion 200, and fourth display portion 450 of the first display portion 200 formed by the mask pattern formed on the mask. The region E is sequentially exposed, so that the first display unit 200, the third display unit 400, and the fourth display unit 450 are all exposed (step 200).

Subsequently, the second display unit 300 and the mask are aligned with each other using the second measurement unit 600 (step 300).

At this time, the position of the substrate body 100 and the mask is aligned by the second measurement unit 600, and the gap formed between the substrate body 100 and the mask is also measured.

The C region of the second display portion 300 and the D region of the second display portion 300 formed in the substrate body 100 are sequentially exposed by the mask pattern formed on the mask, thereby exposing both of the second display portions 300 ( Step 400).

Through such a process, the first display unit 200 to the fourth display unit 450 having different planar areas may be precisely exposed to the display device substrate 700.

Example 3

3 is a flowchart illustrating a substrate exposure method according to a third embodiment of the present invention. The substrate used in the substrate exposure method according to the present embodiment is the same as the substrate for the display device shown in FIG.

1 and 3, according to the present exemplary embodiment, the first display unit 200, the second display unit 300, the third display unit 400, and the fourth display unit 450 are exposed separately.

In order to implement this, first, the first and second mask patterns formed on the mask and the first display unit 200 formed on the substrate body 100 are formed by using the first alignment unit 500 and the mask alignment keys formed on the mask. The third display unit 400 and / or the fourth display unit 450 are each aligned (step 510).

Subsequently, the third display unit 400 and / or the fourth display unit 450 are covered by a light blocking member (not shown) (step 520).

Subsequently, the first display unit 200 is selectively exposed using the first mask pattern formed on the mask (step 530).

Subsequently, the first display unit 200 which has already undergone the exposure process is covered by the light blocking member (step 540), and the third display unit 400 and / or the fourth display unit 450 using the second mask pattern formed on the mask. Is exposed (step 550). In this case, since the third display unit 400 and / or the fourth display unit 450 are already aligned with the second mask pattern, only the position of the light blocking member is adjusted.

Subsequently, the second display unit 300 formed on the substrate body 100 with the first mask pattern formed on the mask using the second alignment unit 600 and the mask alignment key formed on the mask are aligned (step 560).

Subsequently, in a state where the first display unit 200 is covered by the light blocking member (step 570), the second display unit 300 is exposed using the first mask pattern of the mask (step 580). In this embodiment, since the first display unit 200 and the second display unit 300 have the same exposure pattern, the second mask pattern is equally applied to the first display unit 200 and the second display unit 300. . If the second display unit 300 and the first display unit 200 have different exposure patterns, the second display unit 300 should be exposed by a mask having a third mask pattern.

Exposure system

Example 4

4 is a conceptual diagram illustrating an exposure system according to a fourth embodiment of the present invention. In the present embodiment, since the display device substrate is the same as the display device substrate described in Embodiment 1, duplicated description thereof will be omitted, and the same reference numerals are used for the same parts as the display device substrate shown in Embodiment 1. The code and name will be given.

Referring to FIG. 4, the exposure system 800 includes a substrate plate 830 on which an optical system 810, a mask 820, and a substrate 700 for a display device are mounted.

Mask 820 and substrate plate 830 are disposed on a scanning path of light generated in optical system 810. In the present exemplary embodiment, a mask 820 is disposed under the optical system 810, and a substrate plate 830 on which the substrate 700 for a display device is mounted is disposed under the mask 820.

FIG. 5 is a plan view illustrating a substrate for a display device mounted on the substrate plate illustrated in FIG. 4. FIG. 6 is a plan view of the mask shown in FIG. 4.

5 and 6, the mask 820 includes a first mask region 822 and a second mask region 824, a first mask measuring unit 826, and a second mask measuring unit 828.

The first mask region 822 includes a first mask pattern for exposing an A region, a B region, a C region, and a D region of the second display unit 300 illustrated in FIG. 5.

The second mask region 824 includes a second mask pattern for exposing regions B and E of the third display unit 400 and the fourth display unit 450 illustrated in FIG. 5, respectively.

In order to align the first mask region 822 and the second mask region 824 with the first to third display units 200 and 400, the mask 820 includes a first mask measuring unit 826 and a second mask measuring unit 828. Is placed.

The first mask measurement unit 826 is disposed at a position corresponding to the first measurement unit 500 formed on the display device substrate 700, and the mask 820 is formed by the first mask measurement unit 826 and the first measurement unit 500. ) And the gap formed between the mask 820 and the display substrate 700 and the position of the display apparatus substrate 700 are corrected. The first mask measuring section 826 is shown by reference numerals 826a, 826b, 826c, and 826d, respectively.

In addition, the second mask measuring unit 828 is disposed at a position corresponding to each of the second measuring unit 600 formed on the display device substrate 700, and is masked by the second mask measuring unit 828 and the second measuring unit 600. 820 and the position of the display device substrate 700 and the gap formed between the mask 820 and the display device substrate 700 are corrected. The second mask measuring section 828 is shown by reference numerals 828a, 828b, 828c, and 828d, respectively.

As described in detail above, at least two display units having different planar and different exposure patterns can be simultaneously or individually exposed to the substrate body of one display device substrate, thereby greatly improving mass productivity. .

In the detailed description of the present invention described above with reference to a preferred embodiment of the present invention, those skilled in the art or those skilled in the art having ordinary knowledge in the scope of the invention described in the claims to be described later It will be understood that various modifications and variations can be made in the present invention without departing from the scope of the present invention.

1 is a plan view showing a substrate for a display device according to a first embodiment of the present invention.

2 is a flowchart illustrating a substrate exposure method according to a second embodiment of the present invention.

3 is a flowchart illustrating a substrate exposure method according to a third embodiment of the present invention.

4 is a conceptual diagram illustrating an exposure system according to a fourth embodiment of the present invention.

FIG. 5 is a plan view illustrating a substrate for a display device mounted on the substrate plate illustrated in FIG. 4.

FIG. 6 is a plan view of the mask shown in FIG. 4.

Claims (10)

A substrate body; A first display unit disposed on the substrate body and having a first planar area; A second display unit disposed on the substrate body and having a first planar area and spaced apart from the first display unit by a predetermined distance; A third display unit disposed on the substrate body and interposed between the first and second display units and having a second planar area; A first measurement unit disposed on the substrate body in association with the first display unit and the third display unit; And And a second measurement unit disposed on the substrate body in association with the second display unit. The display device of claim 1, wherein the first to third display parts have a rectangular shape when viewed in a plan view. The third display unit has a first long side disposed near the first display unit and a second long side disposed near the second display unit, The first display unit has a third long side proximate to the first long side and a fourth long side parallel to the third long side, And the second display portion has a fifth long side close to the second long side and a sixth long side parallel to the fifth long side. The display device substrate of claim 2, wherein at least two first measuring units are disposed around the short sides of the third display units and around the fourth long side. The substrate of claim 2, wherein at least two second measuring units are disposed around the fifth long side and around the sixth long side. The substrate of claim 2, wherein a fourth display unit disposed in series with the third display unit is disposed between the first and second display units. A method of exposing a substrate having first and second display portions having a first planar area and third display portions having the second planar area and interposed between the first and second display portions, the method comprising: Aligning the mask with the first and third displays and measuring a gap between the mask and the substrate using a first measurement unit disposed around the first and third displays; Exposing the first and third display portions through the mask; Aligning the second display parts and the mask and measuring a gap between the mask and the substrate by using a second measuring part disposed around the second display part; And Exposing the second display portion through the mask. A method of exposing a substrate having first display portions having a first planar area and second display portions having the second planar area and disposed adjacent to the first display portions, the method comprising: Aligning the first display unit with a mask and measuring a gap between the mask and the substrate using a first measurement unit disposed around the first display units; Selectively exposing the first display portion by light passing through the mask; Aligning the second display parts and the mask between the second display parts and a gap between the mask and the substrate by using a second measuring part disposed around the second display part; And And exposing the second display portion by the light that has passed through the mask. 8. The method of claim 7, wherein when exposing the first displays, the light directed to the second displays is obscured by a light absorbing portion. 8. The method of claim 7, wherein when exposing the second displays, the light directed to the first displays is obscured by a light absorbing portion. An optical system for supplying light; A mask body disposed on the path of light and having a first mask area having a first planar area and a second mask area having the second planar area, a first disposed around the first mask area and the second mask area A mask having a mask measurer and a second mask measurer disposed around the first mask region; The first and second display areas disposed on the traveling path of the light passing through the mask, respectively corresponding to the first and second mask areas, and the first and second mask measurement keys, respectively. And a substrate plate on which the substrate having the first and second measurement portions is mounted.