CN103084600B - Superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade and preparation method thereof - Google Patents
Superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade and preparation method thereof Download PDFInfo
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Abstract
The invention discloses a superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade and a preparation method of the superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade. The blade is formed by carrying out glow cleaning of hydrogen and argon to a chemical cleaned carbide blade, and then an arc ion plating method is adopted to deposit a Ti layer, a TiN layer, a TiN/TiSiN layer, a TiSiN layer, a TiSiN/CN layer and a CN layer. The coating of the superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade and the preparation method is reasonable in structural design, the combination of multiple materials is adopted in structure, and gradient characteristics are provided in composition, therefore the inner stress of the coating is greatly reduced, the defect that the coating of an existing blade is insufficient in abrasion resistance is overcome, and the cutting service life and the adaptability of the blade are greatly improved.
Description
Technical field
The present invention relates to thin-film material technical field, particularly the superhard TiN-TiSiN-CN multilayer of one replaces complex gradient coating carbide chip and preparation method.
Background technology
The high-efficiency automatic lathe being applicable to processed complex part that numerical control machining center is made up of plant equipment and digital control system.Numerical control machining center is current one of the highest, most widely used Digit Control Machine Tool of output in the world.It concentrates on functions such as milling, boring, drilling, tapping and screw cuttings on an equipment, makes it have kinds of processes means.Its comprehensive process ability is stronger, more processing content can be completed after workpiece clamped one time, machining accuracy is higher, with regard to the batch workpiece of medium difficulty of processing, its efficiency is 5 ~ 10 times of conventional equipment, particularly it can complete the processing that many conventional equipments can not complete, more complicated to shape, the single-piece work that required precision is high or small batch multi-item production more applicable.Machining center is provided with tool magazine, deposits various cutter or the cubing of varying number, automatically selected and change in process by program in tool magazine.This is the main distinction of it and CNC milling machine, numerical control borer.Particularly for frock and special plane equipment must be adopted to ensure the workpiece of product quality and efficiency, adopt Cutter Body Processing with Machining Center, frock and special plane can be saved.This can be the development of new product and saving a large amount of time and the expense of regenerating of retrofiting, thus makes enterprise have stronger competitiveness.Carbide chip is the widely used cutting tool of numerical control machining center, during carbide chip high-speed milling steel part, because it is at high temperature subject to the effect of alternation thermic load, the final breakage of cutter shows as following multiple pattern: (1) cutter brittle flaking off; (2) produce and the roughly orthogonal thermal shock reeds of cutting edge on cutter front-back; (3) cutter flank wearing and tearing; (4) blade produces bulk tipping.
The appearance of cutting tool coated with hard alloy is an important milestone in cutter development history.It is in intensity and the good hard alloy substrate of toughness, utilizes CVD method apply the good refractory metal of skim wearability or nonmetallic compound and formed.Coating, as a chemical barrier and thermodynamic barrier, decreases the diffusion between cutter and workpiece and chemical reaction, thus decreases crescent hollow abrasion.Coating has very high hardness and heat resistance, and reduces the coefficient of friction between cutter and workpiece, and therefore coated cutting tool can improve service life significantly than non-coated tool, and the life-span comparable non-coated tool height 2-5 of usual coated cutting tool doubly.According to the investigation of SUMITOMO CHEMICAL company, the tool bit life 2-3 after coating doubly account for 36%, more than 3 times account for 30%, raising working (machining) efficiency (comprising cutting speed and feed speed) account for 19%.In addition its versatility is wide, and a kind of cutting tool coated with hard alloy of the trade mark often can be competent at the cutwork of the non-coated chip of several grade, thus can simplify tool management.According to statistics, in some industrially developed country, the use amount of coated cutting tool has accounted for the 60-70% of cutter sum.The cutter that the U.S. uses on Digit Control Machine Tool is all coated cutting tool.
TiN is the hard coating material be widely used at first.As far back as 20 beginnings of the century, TiN just can be accurately controlled composition and carry out Prof. Du Yucang, and from sixties Mo, oneself is through being widely used in cutter coat, and incrustation is protected, mould wear-and corrosion-resistant coating.Since the seventies, be widely used on knife mold and various wear part and decorative coveringn by TiN coating prepared by physical vapour deposition (PVD) PVD technology.Enter the eighties, titanium nitride is almost unique business-like hard layer material.The utilization rate of current industrially developed country TiN Coated HSS Cutters has accounted for the 50-70% of high-speed steel tool, ratio shared by the coating of the complex cutting tool that minority can not be refaced oneself more than 90%.The research of people to TiN coating also gets more and more.Because TiN coating performance is superior, theory that technical process meets again " green manufacturing industry ", it is expected to still have larger development space in early stage 21 century.TiN heatproof is limited, and when serviceability temperature is more than 500 DEG C, coating starts to lose efficacy.Along with the progress of technology, people require more and more higher to the combination property of coating, and the product to different service condition, its dominant failure resistance index requires to be not quite similar, the coating of different performance feature should be had to adapt with it, to increase the multifarious selection of coating.Therefore, on the basis of single tin coating, developed much new advanced TiN base complex nitride coating in recent years, namely TiN coating is multi-element alloyed.
Nineteen ninety-five, the people such as the Veprek of Germany publish an article and claim Late Cambrian a kind of novel superhard material Ti-Si-N on Appl. Phys. Lett.Vickers hardness is at 50GPa, and elastic modelling quantity reaches 500GPa, and aerial non-oxidizability is greater than 800 DEG C.2000, S.Veprek prepared the Ti-Si-N material that Vickers hardness reaches 80-105GPa.The primary structure of material is also nc-TiN/a-Si
3n
4structure.Heatproof reaches 1100 DEG C.And find that the hardness of TiN intercrystalline silicon nitride material to whole material plays vital effect.Due to high rigidity and the high-temperature resistant characteristic of Ti-Si-N material, become the hot subject of domestic and international superhard cutter coating research over nearly 10 years.
Within 1989, A.Y. Liu and M.L.Cohen is according to β-Si
3n
4crystal structure, replace Si with C, method can be with to have foretold β-C theoretically in the approximate lower primary pseudo potential that adopts of the local density of state
3n
4(i.e. carbonitride) this hardness can compare favourably with diamond and at the still undiscovered new covalent compound of occurring in nature.1996, Teter and Hemley thought C by calculating
3n
45 kinds of structures may be had, i.e. α phase, β phase, Emission in Cubic, accurate Emission in Cubic and class graphite-phase.Except class graphite-phase, the hardness of other 4 kinds of structural materials can be comparable with diamond.Carbonitride (CN) film has the feature of high rigidity, low-friction coefficient and high thermal stability, is a kind of state-of-the art superhard material, and its theoretical hardness, close to diamond, is expected to replacing diamond in some occasion.
Nano-multilayer film is the recent tendency of current cutter development, and its mechanical property is better than the performance of the conventional coating of component nitride greatly.Due to the cutting characteristic that nano laminated coating is superior, there is cutting ability more better than coatings such as conventional TiN, TiCN, TiSiN and TiAlN.According to the feature of carbide chip machining, high-temperature resistant TiSiN coating and low-friction coefficient CN coating are combined and prepares the preparation of multi-layer nano composite coating and blade face, make carbide cutting blade have good flexibility (adaptability) of operation.
Summary of the invention
Object of the present invention is exactly the present situation for above-mentioned prior art, provides a kind of superhard TiN-TiSiN-CN multilayer and replaces complex gradient coating carbide chip and preparation method.
The technical scheme of product of the present invention is: have the composite coating be made up of binder course, transition zone, supporting layer, wearing layer I, wearing layer II, anti-attrition layer from inside to outside at the matrix surface of carbide chip, and: binder course is Ti layer; Transition zone is TiN layer; Supporting layer is TiN/TiSiN layer; Wearing layer I is TiSiN layer; Wearing layer II is TiSiN/CN layer; Anti-attrition layer is CN layer.
Preferably:
Described joint thickness is 5-30 nanometer; Transition region thickness is 500-2000 nanometer; Supporting layer thickness is 500-4000 nanometer; Wearing layer I thickness is 500-4000 nanometer; Wearing layer II thickness is 100-4000 nanometer; Anti-attrition layer thickness is 500-1000 nanometer.
Described supporting layer is the TiN/TiSiN laminated coating that TiN layer and TiSiN layer are alternately formed, and wherein individual layer TiSiN layer thickness is 3-8 nanometer, and individual layer TiN layer thickness is 2-7 nanometer, and every layer of TiSiN+TiN thickness sum is 5-10 nanometer.
Described wearing layer II is the TiSiN/CN laminated coating that TiSiN layer and CN layer are alternately formed, and wherein individual layer TiSiN layer thickness is 3-8 nanometer, and individual layer CN layer thickness is 2-7 nanometer, and every layer of TiSiN+CN thickness sum is 5-10 nanometer.
Described wearing layer I comprises TiN nano-crystalline and amorphous SiNx, and wherein TiN is nanocrystalline is of a size of 5-20 nanometer, and every layer of (whether more suitable) amorphous SiNx layer thickness is 0.1-2nm.
The technical scheme of preparation method of the present invention is: formed successively by following step:
1) to after the carbide chip of Chemical cleaning carries out aura cleaning, at its surface deposition binder course, this binder course is Ti layer;
2) binder course obtained in upper step deposits transition zone, and this transition zone is TiN layer;
3) depositing support layer on the transition zone obtained in upper step, supporting layer is TiN/TiSiN layer;
4) supporting layer obtained in upper step deposits wearing layer I, and this wearing layer I is TiSiN layer;
5) the wearing layer I obtained in upper step deposits wearing layer II, and this wearing layer II is TiSiN/CN layer;
6) the wearing layer II obtained in upper step deposits anti-attrition layer, and this anti-attrition layer is CN layer, naturally cools, to obtain final product.
As preference:
The condition of described aura cleaning is: temperature is 400-600 DEG C, under hydrogen and ar gas environment;
The sedimentary condition of described binder course is: air pressure 0.01-0.1Pa, voltage-1000V to-1200V;
The sedimentary condition of described transition zone is: under nitrogen environment, air pressure 0.1-0.5Pa, voltage-100V to-250V;
The sedimentary condition of described supporting layer is: under nitrogen environment, and air pressure 0. 5-2.3Pa, voltage-150V are to 250V;
The sedimentary condition of described wearing layer I is: under nitrogen environment, air pressure 0.1-1Pa, voltage-150V to-250V;
The sedimentary condition of described wearing layer II is: under nitrogen environment, air pressure 1-1Pa, voltage-150V to-250V;
The sedimentary condition of described anti-attrition layer is: under nitrogen environment, and voltage-150V is to-250V, air pressure 0.1-0.5Pa.
The present invention utilizes the high ionization level of arc ion plating to prepare nanocomposite laminated coating material as shown from the above technical solution.In order to improve the adhesion of coatings and substrate, the oxide on surface of the argon ion cleaning carbide chip that first the method utilizes hydrogen and argon gas glow discharging process to produce, generally because oxide can reduce the adhesion of coatings and substrate, the place to go of oxide is technology very crucial in coating for this reason.Conventional chemical cleaning can place to go oxide layer in cleaning process, but ingress of air rear surface can form oxide layer very soon, and this patent adopts the high reduction characteristic place to go oxide of the hydrogen glow ion in vacuum chamber to have certain superiority for this reason.Glow ion cleaning is generally carried out under the back bias voltage of 800-1000V, and scavenging period is from 30-120 minute.
After Ion Cleaning terminates, surface is in cleaner state.Subsequently, this patent adopt arc ion plating (aip) from Ti target by Ti ion at high temperature evaporation and under high bias effect high-speed motion to carbide chip surface, the negative high voltage of 1000-1200V is added with on carbide chip surface, the Ti ion of high pressure to ionization has acceleration, through the Ti ion meeting high-speed impact carbide chip surface of accelerating, knockout process can produce high temperature, and Ti ion can form metallurgical bonding layer with carbide blade base, and general diffusion depth reaches 5-10nm.The bombardment effect one of Ti ion to form metallurgical bonding layer, and two is can in the surface deposition pure ti layers of carbide chip, and because bombardment and deposition process are carried out simultaneously, the Ti coating of formation can be very fine and close, inhibits the coarse grained growth of column Ti.Then pass into nitrogen and Ti to react and generate TiN transition zone.Transition region thickness is generally 100-300 nanometer.On the basis of TiN coating, progressively open TiSi target, TiSi and nitrogen react and generate TiSiN coating, TiN coating will be formed when alloy knife moves to before Ti target, to form TiSiN coating when moving to TiSi target and being anterior, alloy knife continuous print rotates will form TiSiN/TiN nano-composite coating.
The object both combined is mainly from the viewpoint of as follows: one, the hardness of pure TiSiN coating is high, but stress is comparatively large, needs to reduce its stress for this reason; Two, the coefficient of friction of TiSiN is comparatively large, in order to obtain good result of use, needs to reduce its coefficient of friction; And TiN coating not only stress is less, its coefficient of friction is lower simultaneously, is doped to by TiN in TiSiN coating, not only makes the TiN of TiSiN and bottom have good adhesion, on the basis keeping hardness, considerably reduce coating internal stress, supporting layer thickness is generally 500-1500nm simultaneously.
After supporting layer deposition terminates, coating is provided with certain thickness and hardness, in order to improve its temperature tolerance, close Ti target, deposition has the pure TiSiN coating of good heat resistance, the size that in TiSiN coating, TiN is nanocrystalline has larger impact to coating hardness and temperature tolerance, for this reason must the nanocrystalline size of control TiN, and general control is in 5-20 nanometer.After the preparation of TiSiN coating terminates, ion gun is opened, carry out the preparation of CN coating, TiSiN coating is formed when blade is before TiSi, CN coating is formed when blade is before ion gun, will form TiSiN/CN multi-layer nano coating when repeating preparation process, the TiSiN/CN multilayer film number of plies is 100-400 layer.Hardness is 35-40GPa, and thickness is 100-4000 nanometer.After TiSiN/CN coating, continue preparation CN coating, reduce the coefficient of friction of coating.Total coating thickness controls at 2-15 micron.
This coating not only has good anti-wear performance, simultaneously because sandwich construction has good decay resistance.Compared with the individual layer TiN of routine, due to adding of TiSiN and CN coating material, make coating not only have good anti-wear performance, its greasy property significantly rises simultaneously.In addition, the high hardness wear-resisting layer that is designed to of TiN/TiSiN gradient layer provides good supporting role, makes surperficial TiSiN and CN composite wear-resistant layer have better abrasion resistant effect.On the basis of TiN/TiSiN coating, the use of TiSiN nanocrystalline composite coating, mainly in order to provide composition gradual change between TiN/TiSiN coating and TiSiN-CN composite bed, plays the effect of good reduction stress.On the basis of TiSiN coating, by TiSiN and CN coating alternating deposit, form TiSiN/CN composite bed, this layer not only has high rigidity, has certain Wear vesistance simultaneously.At TiSiN/CN composite bed top, present invention also adds pure CN anti-attrition layer, this is mainly in order to reduce the coefficient of friction of composite coating, provides good greasy property when processing various material, improves processing effect.For this this coating, not only structural design is advanced, simultaneously multiple material with the use of making coating have good conformability.Increase substantially the processing characteristics of carbide chip.There is good market application foreground.
Therefore tool of the present invention has the following advantages: the first, and compared with conventional knife coating, the present invention adopts two kinds of superhard coatings to construct new superhard coating; Two, the present invention makes full use of nanocrystalline and amorphous compound, nanometer multilayer compound, graded composite and sandwich construction coating technology, and form structure and composition gradual change, coatings and substrate is metallurgical binding, has good adhesive force; 3rd, compared with conventional arc ion plating (aip), the present invention adopts sandwich construction technology to inhibit the growth of column crystal, and improve the density of coating, this not only increases the corrosion resistance of coating, and wearability also increases substantially simultaneously; 4th, good for heatproof TiSiN coating and the lower CN of coefficient of friction are coated with layer building novel wear resistant and self-lubricating coat in use by the present invention, break through the shortcoming that existing cutter coat greasy property is poor; 6th, the composite coating of TiSiN and CN coating is applied on cemented carbide cutting tool by the present invention, will increase substantially adaptability and the machinability of carbide chip; 7th, the present invention adopts arc ion plating (aip) close with existing coating apparatus, and coating apparatus structure is simple simultaneously, and be easy to control, prospects for commercial application is good;
Prepared by the present invention, TiN-TiSiN-CN super hard nano multi-layer composite coatings carbide cutter tool has good adhesion and abrasion-proof and temperature-resistant performance, ensure that carbide chip long-term stable operation, carbide cutter tool processing characteristics is increased substantially, crudy is stablized, working (machining) efficiency improves, and reduces the production cost of producer.
Accompanying drawing explanation
Fig. 1. be the plater schematic diagram adopted in the present invention;
Fig. 2. be the coating structure schematic diagram that the present invention designs;
Fig. 3. be the TiN-TiSiN-CN surface topography that the present invention designs;
Fig. 4. be the TiN-TiSiN-CN coating cross sections pattern that the present invention designs.
In above-mentioned Fig. 1: 1-work rest; 2-Ti target; 3-TiSi target; 4-TiSi; 5-bleeding point; 6-Ti target; 7-heater; 8-ion gun; 9-ion gun; 10-fire door:
In above-mentioned Fig. 2: 1--matrix; 2--binder course; 3--transition zone; 4---supporting layer; 5--wearing layer I; 6---wearing layer II; 7--anti-attrition layer;
Detailed description of the invention
Below in conjunction with specific embodiment, technical scheme of the present invention is described further:
Implement the device of the inventive method as shown in Figure 1, the vacuum chamber of device is surrounded by furnace wall, and vacuum chamber height is 0.5-1.5 rice, and diameter is 700-1500mm.Vacuum chamber side is provided with fire door 3, to facilitate the handling of workpiece.Vacuum chamber is provided with vacuum orifice 5, and vacuumize unit and vacuumized by vacuum orifice 5 pairs of vacuum chambers, vacuumizing unit can be made up of molecular pump and mechanical pump, and end vacuum can reach 5 × 10
-4pa.The centre of vacuum chamber is heater 7, heating power 20 kilowatts, and 18 arc sources divide 6 row to be arranged on furnace wall, and every two are classified as one group, totally three groups.Install Ti target, TiSi target and hollow cathode ion source respectively, sample is contained on work rest.This layout makes plasma density in vacuum chamber increase considerably, and the complete submergence of workpiece in the plasma.Coating deposition rate, hardness, adhesive force are greatly improved.Owing to being optimized target structure, Distribution of Magnetic Field evenly, make electric arc homogenous combustion on target surface, improve the uniformity of coating.
embodiment 1:400 DEG C, under hydrogen and ar gas environment, to carbide chip after aura cleaning terminates, at 0.01Pa ,-1000V condition depositing Ti binder course; Joint thickness is 5 nanometers, passes into nitrogen, deposits 500 nano TiN transition zones in 0.1Pa ,-100V condition; Under 0.5Pa ,-150V condition, deposit 500 nanometer TiSiN/TiN supporting layers, individual layer TiN nanometer layer thickness 2 nanometer, individual layer TiSiN thickness is 3 nanometers, and TiN+TiSiN thickness is 5 nanometers.Under 0.5Pa ,-150V condition, deposit 500 nanometer TiSiN wearing layer I, TiN is nanocrystalline is of a size of 5 nanometers, and SiNx thickness is 2 nanometers.Under 1Pa ,-150V condition, deposit TiSiN/CN wearing layer II thickness is 100 nanometers, and individual layer TiSiN nanometer layer thickness 5 nanometer, individual layer CN thickness is 5 nanometers, and CN+TiSiN thickness is 10 nanometers.Under 0.1Pa ,-150V condition, deposit thickness is 500 nanometer anti-attrition layers.Total coating thickness is controlling at 2.1 microns, and preparation terminates rear cooling naturally, obtains TiN-TiSiN-CN super hard nano multi-layer composite coatings blade.
embodiment 2:600 DEG C, under hydrogen and ar gas environment, to carbide chip after aura cleaning terminates, at 0.1Pa ,-1200V condition depositing Ti binder course; Joint thickness is 30 nanometers, passes into nitrogen, deposits 2000 nano TiN transition zones in 0.5Pa ,-250V condition; Under 2.3Pa ,-250V condition, deposit 4000 nanometer TiSiN/TiN supporting layers, individual layer TiN nanometer layer thickness 2 nanometer, individual layer TiSiN thickness is 8 nanometers, and TiN+TiSiN thickness is 10 nanometers.Under 1Pa ,-250V condition, deposit 4000 nano wearproof layer I, TiN is nanocrystalline is of a size of 20 nanometers, and SiNx thickness is 0.1 nanometer.Under 2.3Pa ,-250V condition, deposit wearing layer II thickness is 4000 nanometers, and individual layer TiSiN nanometer layer thickness 2 nanometer, individual layer CN thickness is 8 nanometers, and CN+TiSiN thickness is 10 nanometers.Under 0.5Pa ,-250V condition, deposit thickness is 1000 nanometer anti-attrition layers.Total coating thickness is controlling at 15.09 microns, and preparation terminates rear cooling naturally, obtains TiN-TiSiN-CN super hard nano multi-layer composite coatings blade.
embodiment 3:500 DEG C, under hydrogen and ar gas environment, to carbide chip after aura cleaning terminates, at 0.05Pa ,-1100V condition depositing Ti binder course; Joint thickness is 20 nanometers, passes into nitrogen, deposits 1000 nano TiN transition zones in 0.3Pa ,-150V condition; Under 1Pa ,-200V condition, deposit 1000 nanometer TiSiN/TiN supporting layers, individual layer TiN nanometer layer thickness 3 nanometer, individual layer TiSiN thickness is 7 nanometers, and TiN+TiSiN thickness is 10 nanometers.Under 0.8Pa ,-200V condition, deposit 1000 nano wearproof layer I, TiN is nanocrystalline is of a size of 10 nanometers, and SiNx thickness is 1.2 nanometers.Under 2Pa ,-200V condition, deposit nano wearproof layer II thickness is 2000 nanometers, and individual layer TiSiN nanometer layer thickness 5 nanometer, individual layer CN thickness is 5 nanometers, and CN+TiSiN thickness is 10 nanometers.Under 0.4Pa ,-200V condition, deposit thickness is 800 nanometer anti-attrition layers.Total coating thickness is controlling at 5.87 microns, and preparation terminates rear cooling naturally, obtains TiN-TiSiN-CN super hard nano multi-layer composite coatings blade.
embodiment 4:550 DEG C, under hydrogen and ar gas environment, to carbide chip after aura cleaning terminates, at 0.05Pa ,-1100V condition depositing Ti binder course; Joint thickness is 30 nanometers, passes into nitrogen, deposits 2000 nano TiN transition zones in 0.5Pa ,-150V condition; Under 1Pa ,-200V condition, deposit 2000 nanometer TiSiN/TiN supporting layers, individual layer TiN nanometer layer thickness 3 nanometer, individual layer TiSiN thickness is 7 nanometers, and TiN+TiSiN thickness is 10 nanometers.Under 1Pa ,-200V condition, deposit 2000 nano wearproof layer I, TiN is nanocrystalline is of a size of 15 nanometers, and SiNx thickness is 0.5 nanometer.Under 2Pa ,-200V condition, deposit nano wearproof layer II thickness is 3000 nanometers, and individual layer TiSiN nanometer layer thickness 6 nanometer, individual layer CN thickness is 4 nanometers, and CN+TiSiN thickness is 10 nanometers.Under 0.4Pa ,-200V condition, deposit thickness is 1000 nanometer anti-attrition layers.Total coating thickness is controlling at 10.08 microns, and preparation terminates rear cooling naturally, obtains TiN-TiSiN-CN super hard nano multi-layer composite coatings blade.
, as can be seen from the figure, coating structure there is composition and hardness gradient, reduces the stress of coating, thicker coating can be deposited in the coating structure schematic diagram that Fig. 2 designs for the present invention.
The TiN-TiSiN-CN surface topography that Fig. 3 designs for the present invention, as can be seen from the figure coating surface has certain particle, and this is the large drop that arc process produces, but coating is without comparatively large significantly hole.
The TiN-TiSiN-CN coating cross sections pattern that Fig. 4 designs for the present invention, as can be seen from the figure coatings and substrate combines good, uniform coating thickness.
Claims (5)
1. a superhard TiN-TiSiN-CN multilayer replaces complex gradient coating carbide chip, it is characterized in that: the matrix surface of described carbide chip has the composite coating be made up of binder course, transition zone, supporting layer, wearing layer I, wearing layer II, anti-attrition layer from inside to outside, and:
1) binder course is Ti layer;
2) transition zone is TiN layer;
3) supporting layer is TiN/TiSiN layer;
4) wearing layer I is TiSiN layer;
5) wearing layer II is TiSiN/CN layer;
6) anti-attrition layer is CN layer;
Described supporting layer is the TiN/TiSiN laminated coating that TiN layer and TiSiN layer are alternately formed, and wherein individual layer TiSiN layer thickness is 3-8 nanometer, and individual layer TiN layer thickness is 2-7 nanometer, and every layer of TiSiN+TiN thickness sum is 5-10 nanometer;
Described wearing layer II is the TiSiN/CN laminated coating that TiSiN layer and CN layer are alternately formed, and wherein individual layer TiSiN layer thickness is 3-8 nanometer, and individual layer CN layer thickness is 2-7 nanometer, and every layer of TiSiN+CN thickness sum is 5-10 nanometer.
2. superhard TiN-TiSiN-CN multilayer as claimed in claim 1 replaces complex gradient coating carbide chip, it is characterized in that: the thickness of described composite coating is 2-15 micron, wherein
1) joint thickness is 5-30 nanometer;
2) transition region thickness is 500-2000 nanometer;
3) supporting layer thickness is 500-4000 nanometer;
4) wearing layer I thickness is 500-4000 nanometer;
5) wearing layer II thickness is 100-4000 nanometer;
6) anti-attrition layer thickness is 500-1000 nanometer.
3. superhard TiN-TiSiN-CN multilayer as claimed in claim 1 replaces complex gradient coating carbide chip, it is characterized in that: described wearing layer I comprises TiN nano-crystalline and amorphous SiNx, wherein TiN is nanocrystalline is of a size of 5-20 nanometer, and amorphous SiNx layer thickness is 0.1-2nm.
4. superhard TiN-TiSiN-CN multilayer as claimed in claim 1 replaces a preparation method for complex gradient coating carbide chip, it is characterized in that: formed successively by following step:
1) to after the carbide chip of Chemical cleaning carries out aura cleaning, at its surface deposition binder course, this binder course is Ti layer;
2) binder course obtained in upper step deposits transition zone, and this transition zone is TiN layer;
3) depositing support layer on the transition zone obtained in upper step, supporting layer is TiN/TiSiN layer;
4) supporting layer obtained in upper step deposits wearing layer I, and this wearing layer I is TiSiN layer;
5) the wearing layer I obtained in upper step deposits wearing layer II, and this wearing layer II is TiSiN/CN layer;
6) the wearing layer II obtained in upper step deposits anti-attrition layer, and this anti-attrition layer is CN layer, naturally cools, to obtain final product;
Described supporting layer is the TiN/TiSiN laminated coating that TiN layer and TiSiN layer are alternately formed, and wherein individual layer TiSiN layer thickness is 3-8 nanometer, and individual layer TiN layer thickness is 2-7 nanometer, and every layer of TiSiN+TiN thickness sum is 5-10 nanometer;
Described wearing layer II is the TiSiN/CN laminated coating that TiSiN layer and CN layer are alternately formed, and wherein individual layer TiSiN layer thickness is 3-8 nanometer, and individual layer CN layer thickness is 2-7 nanometer, and every layer of TiSiN+CN thickness sum is 5-10 nanometer.
5. superhard TiN-TiSiN-CN multilayer as claimed in claim 4 replaces the preparation method of complex gradient coating carbide chip, it is characterized in that:
1) condition of the aura cleaning described in is: temperature is 400-600 DEG C, under hydrogen and ar gas environment;
2) sedimentary condition of described binder course is: air pressure 0.01-0.1Pa, voltage-1000V to-1200V;
3) sedimentary condition of described transition zone is: under nitrogen environment, air pressure 0.1-0.5Pa, voltage-100V to-250V;
4) sedimentary condition of described supporting layer is: under nitrogen environment, and air pressure 0. 5-2.3Pa, voltage-150V are to-250V;
5) sedimentary condition of described wearing layer I is: under nitrogen environment, air pressure 0.5-1Pa, voltage-150V to-250V;
6) sedimentary condition of described wearing layer II is: under nitrogen environment, air pressure 1-2.3Pa, voltage-150V to-250V;
7) sedimentary condition of described anti-attrition layer is: under nitrogen environment, air pressure 0.1-0.5Pa, voltage-150V to-250V.
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|---|---|---|---|---|
| CN103510061A (en) * | 2013-10-12 | 2014-01-15 | 萨姆森涂层纳米科技（上海）有限公司 | Method for preparing high-rigidity and high-elasticity modulus TiSiN protection coating |
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