CN103084600A - Superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade and preparation method thereof - Google Patents
Superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade and preparation method thereof Download PDFInfo
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Abstract
The invention discloses a superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade and a preparation method of the superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade. The blade is formed by carrying out glow cleaning of hydrogen and argon to a chemical cleaned carbide blade, and then an arc ion plating method is adopted to deposit a Ti layer, a TiN layer, a TiN/TiSiN layer, a TiSiN layer, a TiSiN/CN layer and a CN layer. The coating of the superhard TiN-TiSiN-CN multilayer alternate composite gradient coating carbide blade and the preparation method is reasonable in structural design, the combination of multiple materials is adopted in structure, and gradient characteristics are provided in composition, therefore the inner stress of the coating is greatly reduced, the defect that the coating of an existing blade is insufficient in abrasion resistance is overcome, and the cutting service life and the adaptability of the blade are greatly improved.
Description
Technical field
The present invention relates to the thin-film material technical field, particularly a kind of superhard TiN-TiSiN-CN multilayer replaces complex gradient coating carbide chip and preparation method.
Background technology
The high-efficiency automatic lathe that is applicable to the processed complex part that numerical control machining center is comprised of plant equipment and digital control system.Numerical control machining center is one of the highest, most widely used Digit Control Machine Tool of output in the world at present.It concentrates on the functions such as milling, boring, drilling, tapping and screw cutting on an equipment, makes it have the kinds of processes means.Its comprehensive process ability is stronger, can complete more processing content after the workpiece clamped one time, machining accuracy is higher, batch workpiece with regard to medium difficulty of processing, its efficient is 5～10 times of conventional equipment, particularly it can complete the processing that many conventional equipments can not be completed, and is more complicated to shape, and the many variety production of the single-piece work that required precision is high or small batch are more applicable.Machining center is provided with tool magazine, is depositing various cutters or the cubing of varying number in tool magazine, is automatically selected and is changed by program in process.This is the main distinction of it and CNC milling machine, numerical control borer.Particularly for adopting frock and special plane equipment to guarantee the workpiece of product quality and efficient, adopt Cutter Body Processing with Machining Center, can save frock and special plane.This can save a large amount of time and expense for development and the remodeling replacement of new product, thereby makes enterprise have stronger competitiveness.Carbide chip is the widely used cutting tool of numerical control machining center, during carbide chip high-speed milling steel part, because it at high temperature is subject to the effect of alternation thermic load, the final breakage of cutter shows as following multiple pattern: (1) cutter brittle flaking off; (2) produce on the cutter front-back and cutting edge orthogonal thermal shock reeds roughly; (3) cutter flank wearing and tearing; (4) blade produces the bulk tipping.
The appearance of cutting tool coated with hard alloy is an important milestone on the cutter development history.It is in intensity and toughness preferably on hard alloy substrate, utilizes CVD method to apply the good refractory metal of skim wearability or nonmetallic compound and forms.Coating has reduced diffusion and chemical reaction between cutter and workpiece, thereby has reduced crescent hollow abrasion as a chemical barrier and thermodynamic barrier.Coating has very high hardness and heat resistance, and has reduced the coefficient of friction between cutter and workpiece, so coated cutting tool can improve service life significantly than non-coated tool, and the high 2-5 of comparable non-coated tool of life-span of coated cutting tool doubly usually.According to the investigation of SUMITOMO CHEMICAL company, the cutter life after coating extends 2-3 accounting for doubly and accounts for 30% more than 36%, 3 times, and that improves working (machining) efficiency (comprising cutting speed and feed speed) accounts for 19%.Its versatility is wide in addition, and a kind of cutting tool coated with hard alloy of the trade mark often can be competent at the not cutwork of coated chip of several grades, thereby can simplify tool management.According to statistics, in some industrially developed country, the use amount of coated cutting tool has accounted for the 60-70% of cutter sum.The cutter that the U.S. uses on Digit Control Machine Tool is all coated cutting tool.
TiN is the hard coating material that is widely used at first.As far back as 20 beginnings of the century, TiN just can be accurately controlled composition and manually synthesize, and since sixties Mo, oneself is through being widely used in cutter coat, incrustation protection, mould wear-and corrosion-resistant coating.Since the seventies, the TiN coating for preparing with physical vapour deposition (PVD) PVD technology has been widely used on knife mold and various wear part and decorative coveringn.Enter the eighties, titanium nitride is almost unique business-like hard layer material.The utilization rate of the current TiN of industrially developed country Coated HSS Cutters has accounted for the 50-70% of high-speed steel tool, and oneself surpasses 90% the shared ratio of the coating of the complex cutting tool that minority can not be refaced.People are also more and more to the research of TiN coating.Because the TiN coating performance is superior, technical process meets again " green manufacturing industry " theory, can be expected at 21 century in earlier stage to still have larger development space.The TiN heatproof is limited, and coating begins to lose efficacy when serviceability temperature surpasses 500 ℃.Progress along with technology, people require more and more higher to the combination property of coating, and to the product of different service conditions, its resistance index requirement of mainly losing efficacy is not quite similar, should there be the coating of different performance characteristics to adapt with it, to increase the multifarious selection of coating.Therefore on the basis of single tin coating, developed in recent years many new advanced TiN base complex nitride coatings, namely the TiN coating is multi-element alloyed.
Nineteen ninety-five, the people such as Veprek of Germany publish an article on Appl. Phys. Lett and claim to have found first a kind of novel superhard material Ti-Si-N.Vickers hardness is at 50GPa, and elastic modelling quantity reaches 500GPa, and aerial non-oxidizability is greater than 800 ℃.2000, S.Veprek prepared the Ti-Si-N material that Vickers hardness reaches 80-105GPa.The primary structure of material is also nc-TiN/a-Si
3N
4Structure.Heatproof reaches 1100 ℃.And find that the intercrystalline silicon nitride material of TiN plays vital effect to the hardness of whole material.Due to high rigidity and the high-temperature resistant characteristic of Ti-Si-N material, make it become the hot subject of superhard cutter coating research both at home and abroad over nearly 10 years.
A.Y. Liu in 1989 and M.L.Cohen are according to β-Si
3N
4Crystal structure, replace Si with C, can the band method foretell theoretically β-C in the approximate lower primary pseudo potential that adopts of the local density of state
3N
4(being carbonitride) this hardness can compare favourably with diamond and at occurring in nature undiscovered new covalent compound still.1996, Teter and Hemley thought C by calculating
3N
4May have 5 kinds of structures, i.e. α phase, β phase, Emission in Cubic, accurate Emission in Cubic and class graphite-phase.Except the class graphite-phase, the hardness of other 4 kinds of structural materials can be comparable with diamond.Carbonitride (CN) film has the characteristics of high rigidity, low-friction coefficient and high thermal stability, is a kind of state-of-the art superhard material, and its theoretical hardness is expected to replacing diamond in some occasion near diamond.
Nano-multilayer film is the recent tendency of present cutter development, and its mechanical property is better than the performance of the conventional coating of component nitride greatly.Due to the superior cutting characteristic of nano laminated coating, have than better cutting abilities of coating such as conventional TiN, TiCN, TiSiN and TiAlN.According to the characteristics of carbide chip machining, high-temperature resistant TiSiN coating and low-friction coefficient CN coating are prepared and blade face in conjunction with preparation multi-layer nano composite coating, make carbide cutting blade have good flexibility (adaptability) of operation.
Summary of the invention
Purpose of the present invention is exactly the present situation for above-mentioned prior art, provides a kind of superhard TiN-TiSiN-CN multilayer to replace complex gradient coating carbide chip and preparation method.
The technical scheme of product of the present invention is: the matrix surface at carbide chip has the composite coating that is made of binder course, transition zone, supporting layer, wearing layer I, wearing layer II, anti-attrition layer from inside to outside, and: binder course is the Ti layer; Transition zone is the TiN layer; Supporting layer is the TiN/TiSiN layer; Wearing layer I is the TiSiN layer; Wearing layer II is the TiSiN/CN layer; Anti-attrition layer is the CN layer.
As preferred version:
Described joint thickness is the 5-30 nanometer; Transition region thickness is the 500-2000 nanometer; Supporting layer thickness is the 500-4000 nanometer; Wearing layer I thickness is the 500-4000 nanometer; Wearing layer II thickness is the 100-4000 nanometer; Anti-attrition layer thickness is the 500-1000 nanometer.
Described supporting layer is the TiN/TiSiN laminated coating that TiN layer and TiSiN layer alternately consist of, and wherein individual layer TiSiN layer thickness is the 3-8 nanometer, and individual layer TiN layer thickness is the 2-7 nanometer, and every layer of TiSiN+TiN thickness sum is the 5-10 nanometer.
Described wearing layer II is the TiSiN/CN laminated coating that TiSiN layer and CN layer alternately consist of, and wherein individual layer TiSiN layer thickness is the 3-8 nanometer, and individual layer CN layer thickness is the 2-7 nanometer, and every layer of TiSiN+CN thickness sum is the 5-10 nanometer.
Described wearing layer I comprises TiN nano-crystalline and amorphous SiNx, the nanocrystalline 5-20 nanometer that is of a size of of TiN wherein, and every layer of (whether more suitable) amorphous SiNx layer thickness is 0.1-2nm.
Preparation method's of the present invention technical scheme is: formed successively by following step:
1) to carrying out through the carbide chip of Chemical cleaning after aura cleans, at its surface deposition binder course, this binder course is the Ti layer;
2) deposit transition zone on the binder course that obtained in the upper step, this transition zone is the TiN layer;
3) deposit supporting layer on the transition zone that obtained in the upper step, supporting layer is the TiN/TiSiN layer;
4) deposition wearing layer I on the supporting layer that obtained in the upper step, this wearing layer I is the TiSiN layer;
5) deposition wearing layer II on the wearing layer I that obtained in the upper step, this wearing layer II is the TiSiN/CN layer;
6) deposit anti-attrition layer on the wearing layer II that obtained in the upper step, this anti-attrition layer is the CN layer, and is naturally cooling, and get final product.
As preference:
The condition that described aura cleans is: temperature is 400-600 ℃, under hydrogen and ar gas environment;
The sedimentary condition of described binder course is: air pressure 0.01-0.1Pa, and voltage-1000V arrives-1200V;
The sedimentary condition of described transition zone is: under nitrogen environment, and air pressure 0.1-0.5Pa, voltage-100V arrives-250V;
The sedimentary condition of described supporting layer is: under nitrogen environment, and air pressure 0. 5-2.3Pa, voltage-150V is to 250V;
The sedimentary condition of described wearing layer I is: under nitrogen environment, and air pressure 0.1-1Pa, voltage-150V arrives-250V;
The sedimentary condition of described wearing layer II is: under nitrogen environment, and air pressure 1-1Pa, voltage-150V arrives-250V;
The sedimentary condition of described anti-attrition layer is: under nitrogen environment, voltage-150V arrives-250V, air pressure 0.1-0.5Pa.
The present invention utilizes the high ionization level of arc ion plating to prepare the nanocomposite laminated coating material as shown from the above technical solution.In order to improve the adhesion of coatings and substrate, the argon ion that at first the method utilizes hydrogen and argon gas glow discharging process to produce cleans the oxide on surface of carbide chip, generally can reduce the adhesion of coatings and substrate due to oxide, the place to go of oxide is technology very crucial in coating for this reason.Conventional chemical cleans in cleaning process can the place to go oxide layer, but the ingress of air rear surface can form oxide layer very soon, and this patent adopts the high reduction characteristic place to go oxide of hydrogen glow ion in vacuum chamber to have certain superiority for this reason.Glow ion cleans and generally carries out under the back bias voltage of 800-1000V, and scavenging period was from 30-120 minute.
After Ion Cleaning finished, the surface was in cleaner state.Subsequently, this patent adopt arc ion plating (aip) from the Ti target with the evaporation of Ti ion at high temperature and under high bias effect high-speed motion to the carbide chip surface, be added with the negative high voltage of 1000-1200V on the carbide chip surface, high pressure has acceleration to the Ti ion of ionization, through the Ti ion meeting high-speed impact carbide chip surface of accelerating, knockout process can produce high temperature, and the Ti ion can form metallurgical bonding layer with carbide blade base, and general diffusion depth reaches 5-10nm.The bombardment effect one of Ti ion is to form metallurgical bonding layer, the 2nd, can be at the surface deposition of carbide chip pure Ti layer, carry out simultaneously due to bombardment and deposition process, the Ti coating of formation can be very fine and close, suppressed the coarse grained growth of column Ti.Then pass into nitrogen and Ti reaction and generate the TiN transition zone.Transition region thickness is generally the 100-300 nanometer.On the basis of TiN coating, progressively open the TiSi target, TiSi and nitrogen reaction generate the TiSiN coating, when moving to Ti target front, alloy knife will form the TiN coating, to form the TiSiN coating when moving to TiSi target front portion, the continuous rotation of alloy knife will form the TiSiN/TiN nano-composite coating.
Be mainly to consider from following aspect with the purpose of both combinations: one, the hardness of pure TiSiN coating is high, but stress is larger, needs to reduce its stress for this reason; Two, the coefficient of friction of TiSiN is larger, in order to obtain result of use preferably, needs to reduce its coefficient of friction; And the TiN coating not only stress is less, its coefficient of friction is lower simultaneously, and TiN is doped in the TiSiN coating, not only makes the TiN of TiSiN and bottom have good adhesion, simultaneously on the basis that keeps hardness decrease the coating internal stress, supporting layer thickness is generally 500-1500nm.
After the supporting layer deposition finishes, coating has had certain thickness and hardness, in order to improve its temperature tolerance, close the Ti target, deposition has the pure TiSiN coating of good heat resistance, in the TiSiN coating, the nanocrystalline size of TiN has larger impact to coating hardness and temperature tolerance, must control the nanocrystalline size of TiN for this reason, and general control is in the 5-20 nanometer.After the preparation of TiSiN coating finishes, ion gun is opened, carry out the preparation of CN coating, form the TiSiN coating when blade process TiSi front, form the CN coating when blade process ion gun front, will form TiSiN/CN multi-layer nano coating when repeating preparation process, the TiSiN/CN multilayer film number of plies is the 100-400 layer.Hardness is 35-40GPa, and thickness is the 100-4000 nanometer.Continue preparation CN coating after the TiSiN/CN coating, reduce the coefficient of friction of coating.Total coating thickness is controlled at the 2-15 micron.
This coating not only has anti-wear performance preferably, simultaneously because sandwich construction has good decay resistance.Compare with the individual layer TiN of routine, due to adding of TiSiN and CN coating material, make coating not only have good anti-wear performance, its greasy property significantly rises simultaneously.In addition, the high hardness wear-resisting layer that is designed to of TiN/TiSiN gradient layer provides supporting role preferably, makes surperficial TiSiN and CN composite wear-resistant layer have better wear-resisting effect.On the basis of TiN/TiSiN coating, the use of TiSiN nanocrystalline composite coating is mainly in order to provide the composition gradual change between TiN/TiSiN coating and TiSiN-CN composite bed, to play the effect of good reduction stress.On the basis of TiSiN coating, with TiSiN and CN coating alternating deposit, form the TiSiN/CN composite bed, this layer not only has high rigidity, has simultaneously certain Wear vesistance.At TiSiN/CN composite bed top, the present invention has also increased pure CN anti-attrition layer, and this is mainly in order to reduce the coefficient of friction of composite coating, provide greasy property preferably when the various material of processing, improving processing effect.Not only structural design is advanced for this this coating, and being used in conjunction with of multiple material makes coating have good conformability simultaneously.Increased substantially the processing characteristics of carbide chip.Has good market application foreground.
Therefore the present invention has following advantage: the first, compare with conventional cutter coat, and the present invention adopts two kinds of superhard coatings to construct new superhard coating; Two, the present invention takes full advantage of that nanocrystalline and amorphous is compound, nanometer multilayer is compound, and the compound and sandwich construction coating technology of gradient forms structure and composition gradual change, and coatings and substrate is metallurgical binding, has good adhesive force; The 3rd, compare with conventional arc ion plating (aip), the present invention adopts the sandwich construction technology to suppress the growth of column crystal, improves the density of coating, and this has not only improved the corrosion resistance of coating, and wearability also increases substantially simultaneously; The 4th, the present invention with heatproof preferably TiSiN coating and the lower CN of coefficient of friction be coated with layer building novel wear resistant and self-lubricating coat in use, break through the existing relatively poor shortcoming of cutter coat greasy property; The 6th, the present invention is applied to the composite coating of TiSiN and CN coating on cemented carbide cutting tool, will increase substantially adaptability and the machinability of carbide chip; The 7th, the present invention adopts arc ion plating (aip) close with existing coating apparatus, and coating apparatus is simple in structure simultaneously, is easy to control, and prospects for commercial application is good;
The prepared TiN-TiSiN-CN super hard nano of the present invention multi-layer composite coatings carbide cutter tool has good adhesion and abrasion-proof and temperature-resistant performance, guaranteed the carbide chip long-term stable operation, the carbide cutter tool processing characteristics is increased substantially, crudy is stable, working (machining) efficiency improves, and has reduced the production cost of producer.
Description of drawings
Fig. 1. be the plater schematic diagram that adopts in the present invention;
Fig. 2. the coating structure schematic diagram that designs for the present invention;
Fig. 3. the TiN-TiSiN-CN surface topography that designs for the present invention;
Fig. 4. the TiN-TiSiN-CN coating Cross Section Morphology that designs for the present invention.
In above-mentioned Fig. 1: the 1-work rest; The 2-Ti target; The 3-TiSi target; 4-TiSi; The 5-bleeding point; The 6-Ti target; The 7-heater; The 8-ion gun; The 9-ion gun; The 10-fire door:
In above-mentioned Fig. 2: the 1--matrix; The 2--binder course; The 3--transition zone; The 4---supporting layer; 5--wearing layer I; 6---wearing layer II; The 7--anti-attrition layer;
The specific embodiment
Below in conjunction with specific embodiment, technical scheme of the present invention is described further:
Implement the device of the inventive method as shown in Figure 1, the vacuum chamber of device is surrounded by the furnace wall, and the vacuum chamber height is 0.5-1.5 rice, and diameter is 700-1500mm.The vacuum chamber side is provided with fire door 3, to facilitate the loading and unloading of workpiece.Vacuum chamber is provided with vacuum orifice 5, vacuumizes unit and vacuumizes by 5 pairs of vacuum chambers of vacuum orifice, and vacuumizing unit can be comprised of molecular pump and mechanical pump, and end vacuum can reach 5 * 10
-4Pa.The centre of vacuum chamber is heater 7,20 kilowatts of heating powers, and 18 arc sources divide 6 row to be arranged on the furnace wall, and every two classify one group as, totally three groups.Ti target, TiSi target and hollow cathode ion source are installed respectively, and sample is contained on work rest.This layout increases considerably vacuum chamber ionic medium volume density, and workpiece is immersed in plasma fully.Coating sedimentation rate, hardness, adhesive force are greatly improved.Due to target structure is optimized, Distribution of Magnetic Field is more even, makes electric arc evenly burning on target surface, has improved the uniformity of coating.
Embodiment 1:Under 400 ℃, hydrogen and ar gas environment, to carbide chip through aura clean finish after, at 0.01Pa ,-1000V condition depositing Ti binder course; Joint thickness is 5 nanometers, passes into nitrogen, at 0.1Pa, and-100V condition deposition 500 nano TiN transition zones; At 0.5Pa ,-150V condition deposit 500 nanometer TiSiN/TiN supporting layers, individual layer TiN nanometer layer thickness 2 nanometers, individual layer TiSiN thickness is 3 nanometers, TiN+TiSiN thickness is 5 nanometers.At 0.5Pa ,-150V condition deposit 500 nanometer TiSiN wearing layer I, nanocrystalline 5 nanometers that are of a size of of TiN, SiNx thickness is 2 nanometers.At 1Pa ,-150V condition deposit TiSiN/CN wearing layer II thickness is 100 nanometers, individual layer TiSiN nanometer layer thickness 5 nanometers, and individual layer CN thickness is 5 nanometers, CN+TiSiN thickness is 10 nanometers.At 0.1Pa ,-150V condition deposit thickness is 500 nanometer anti-attrition layers.Total coating thickness is being controlled at 2.1 microns, and preparation is naturally cooling after finishing, and obtains TiN-TiSiN-CN super hard nano multi-layer composite coatings blade.
Embodiment 2:Under 600 ℃, hydrogen and ar gas environment, to carbide chip through aura clean finish after, at 0.1Pa ,-1200V condition depositing Ti binder course; Joint thickness is 30 nanometers, passes into nitrogen, at 0.5Pa, and-250V condition deposition 2000 nano TiN transition zones; At 2.3Pa ,-250V condition deposit 4000 nanometer TiSiN/TiN supporting layers, individual layer TiN nanometer layer thickness 2 nanometers, individual layer TiSiN thickness is 8 nanometers, TiN+TiSiN thickness is 10 nanometers.At 1Pa ,-250V condition deposit 4000 nano wearproof layer I, nanocrystalline 20 nanometers that are of a size of of TiN, SiNx thickness is 0.1 nanometer.At 2.3Pa ,-250V condition deposit wearing layer II thickness is 4000 nanometers, individual layer TiSiN nanometer layer thickness 2 nanometers, and individual layer CN thickness is 8 nanometers, CN+TiSiN thickness is 10 nanometers.At 0.5Pa ,-250V condition deposit thickness is 1000 nanometer anti-attrition layers.Total coating thickness is being controlled at 15.09 microns, and preparation is naturally cooling after finishing, and obtains TiN-TiSiN-CN super hard nano multi-layer composite coatings blade.
Embodiment 3:Under 500 ℃, hydrogen and ar gas environment, to carbide chip through aura clean finish after, at 0.05Pa ,-1100V condition depositing Ti binder course; Joint thickness is 20 nanometers, passes into nitrogen, at 0.3Pa, and-150V condition deposition 1000 nano TiN transition zones; At 1Pa ,-200V condition deposit 1000 nanometer TiSiN/TiN supporting layers, individual layer TiN nanometer layer thickness 3 nanometers, individual layer TiSiN thickness is 7 nanometers, TiN+TiSiN thickness is 10 nanometers.At 0.8Pa ,-200V condition deposit 1000 nano wearproof layer I, nanocrystalline 10 nanometers that are of a size of of TiN, SiNx thickness is 1.2 nanometers.At 2Pa ,-200V condition deposit nano wearproof layer II thickness is 2000 nanometers, individual layer TiSiN nanometer layer thickness 5 nanometers, and individual layer CN thickness is 5 nanometers, CN+TiSiN thickness is 10 nanometers.At 0.4Pa ,-200V condition deposit thickness is 800 nanometer anti-attrition layers.Total coating thickness is being controlled at 5.87 microns, and preparation is naturally cooling after finishing, and obtains TiN-TiSiN-CN super hard nano multi-layer composite coatings blade.
Embodiment 4:Under 550 ℃, hydrogen and ar gas environment, to carbide chip through aura clean finish after, at 0.05Pa ,-1100V condition depositing Ti binder course; Joint thickness is 30 nanometers, passes into nitrogen, at 0.5Pa, and-150V condition deposition 2000 nano TiN transition zones; At 1Pa ,-200V condition deposit 2000 nanometer TiSiN/TiN supporting layers, individual layer TiN nanometer layer thickness 3 nanometers, individual layer TiSiN thickness is 7 nanometers, TiN+TiSiN thickness is 10 nanometers.At 1Pa ,-200V condition deposit 2000 nano wearproof layer I, nanocrystalline 15 nanometers that are of a size of of TiN, SiNx thickness is 0.5 nanometer.At 2Pa ,-200V condition deposit nano wearproof layer II thickness is 3000 nanometers, individual layer TiSiN nanometer layer thickness 6 nanometers, and individual layer CN thickness is 4 nanometers, CN+TiSiN thickness is 10 nanometers.At 0.4Pa ,-200V condition deposit thickness is 1000 nanometer anti-attrition layers.Total coating thickness is being controlled at 10.08 microns, and preparation is naturally cooling after finishing, and obtains TiN-TiSiN-CN super hard nano multi-layer composite coatings blade.
The coating structure schematic diagram that Fig. 2 designs for the present invention as can be seen from the figure, exists composition and hardness gradient on coating structure, reduced the stress of coating, can deposit thicker coating.
The TiN-TiSiN-CN surface topography that Fig. 3 designs for the present invention, as can be seen from the figure coating surface has certain particle, and this is the large drop that arc process produces, but coating is without large significantly hole.
The TiN-TiSiN-CN coating Cross Section Morphology of Fig. 4 for designing for the present invention, as can be seen from the figure coatings and substrate is in conjunction with good, and coating layer thickness is even.
Claims (7)
1. a superhard TiN-TiSiN-CN multilayer replaces the complex gradient coating carbide chip, it is characterized in that: the matrix surface of described carbide chip has the composite coating that is made of binder course, transition zone, supporting layer, wearing layer I, wearing layer II, anti-attrition layer from inside to outside, and:
1) binder course is the Ti layer;
2) transition zone is the TiN layer;
3) supporting layer is the TiN/TiSiN layer;
4) wearing layer I is the TiSiN layer;
5) wearing layer II is the TiSiN/CN layer;
6) anti-attrition layer is the CN layer.
2. superhard TiN-TiSiN-CN multilayer as claimed in claim 1 replaces the complex gradient coating carbide chip, it is characterized in that: the described thickness of checking coating is the 2-15 micron, wherein
1) joint thickness is the 5-30 nanometer;
2) transition region thickness is the 500-2000 nanometer;
3) supporting layer thickness is the 500-4000 nanometer;
4) wearing layer I thickness is the 500-4000 nanometer;
5) wearing layer II thickness is the 100-4000 nanometer;
6) anti-attrition layer thickness is the 500-1000 nanometer.
3. superhard TiN-TiSiN-CN multilayer as claimed in claim 1 replaces the complex gradient coating carbide chip, it is characterized in that: described supporting layer is the TiN/TiSiN laminated coating that TiN layer and TiSiN layer alternately consist of, wherein individual layer TiSiN layer thickness is the 3-8 nanometer, individual layer TiN layer thickness is the 2-7 nanometer, and every layer of TiSiN+TiN thickness sum is the 5-10 nanometer.
4. superhard TiN-TiSiN-CN multilayer as claimed in claim 1 replaces the complex gradient coating carbide chip, it is characterized in that: described wearing layer II is the TiSiN/CN laminated coating that TiSiN layer and CN layer alternately consist of, wherein individual layer TiSiN layer thickness is the 3-8 nanometer, individual layer CN layer thickness is the 2-7 nanometer, and every layer of TiSiN+CN thickness sum is the 5-10 nanometer.
5. superhard TiN-TiSiN-CN multilayer as claimed in claim 1 replaces the complex gradient coating carbide chip, it is characterized in that: described wearing layer I comprises TiN nano-crystalline and amorphous SiNx, the nanocrystalline 5-20 nanometer that is of a size of of TiN wherein, amorphous SiNx layer thickness is 0.1-2nm.
6. a superhard TiN-TiSiN-CN multilayer as claimed in claim 1 replaces the preparation method of complex gradient coating carbide chip, it is characterized in that: formed successively by following step:
1) to carrying out through the carbide chip of Chemical cleaning after aura cleans, at its surface deposition binder course, this binder course is the Ti layer;
2) deposit transition zone on the binder course that obtained in the upper step, this transition zone is the TiN layer;
3) deposit supporting layer on the transition zone that obtained in the upper step, supporting layer is the TiN/TiSiN layer;
4) deposition wearing layer I on the supporting layer that obtained in the upper step, this wearing layer I is the TiSiN layer;
5) deposition wearing layer II on the wearing layer I that obtained in the upper step, this wearing layer II is the TiSiN/CN layer;
6) deposit anti-attrition layer on the wearing layer II that obtained in the upper step, this anti-attrition layer is the CN layer, and is naturally cooling, and get final product.
7. superhard TiN-TiSiN-CN multilayer as claimed in claim 6 replaces the preparation method of complex gradient coating carbide chip, it is characterized in that:
1) condition of described aura cleaning is: temperature is 400-600 ℃, under hydrogen and ar gas environment;
2) sedimentary condition of described binder course is: air pressure 0.01-0.1Pa, and voltage-1000V arrives-1200V;
3) sedimentary condition of described transition zone is: under nitrogen environment, and air pressure 0.1-0.5Pa, voltage-100V arrives-250V;
4) sedimentary condition of described supporting layer is: under nitrogen environment, and air pressure 0. 5-2.3Pa, voltage-150V arrives-250V;
5) sedimentary condition of described wearing layer I is: under nitrogen environment, and air pressure 0.5-1Pa, voltage-150V arrives-250V;
6) sedimentary condition of described wearing layer II is: under nitrogen environment, and air pressure 1-2.3Pa, voltage-150V arrives-250V;
7) sedimentary condition of described anti-attrition layer is: under nitrogen environment, and air pressure 0.1-0.5Pa, voltage-150V arrives-250V.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN107419223A (en) * | 2017-07-18 | 2017-12-01 | 西安热工研究院有限公司 | A kind of TiSi base nano composite structure ganoine thin films of hobboing cutter cutter ring and preparation method thereof |
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| CN103510061A (en) * | 2013-10-12 | 2014-01-15 | 萨姆森涂层纳米科技（上海）有限公司 | Method for preparing high-rigidity and high-elasticity modulus TiSiN protection coating |
| CN103586520A (en) * | 2013-10-17 | 2014-02-19 | 厦门金鹭特种合金有限公司 | Coating cutting cutter and production method thereof |
| CN104593737A (en) * | 2015-01-13 | 2015-05-06 | 上海应用技术学院 | Preparation process for high-silicon super-hard PVD coating |
| CN104785602A (en) * | 2015-04-10 | 2015-07-22 | 广东龙丰精密铜管有限公司 | Machining mold with high-hardness working face |
| CN105624618B (en) * | 2016-02-11 | 2018-01-19 | 广东工业大学 | TiAlSiZrN base composite coatings, the gradient ultra-fine cemented carbide cutter with the composite coating and preparation method thereof |
| WO2017136970A1 (en) * | 2016-02-11 | 2017-08-17 | 广东工业大学 | Tialsizrn composite coating, graded structure ultrafine hard alloy cutting tool with the composite coating, and method for manufacturing same |
| CN105624618A (en) * | 2016-02-11 | 2016-06-01 | 广东工业大学 | TiAlSiZrN-based composite coating, gradient superfine cemented carbide cutter with composite coating and preparation method of cutter |
| CN108569841A (en) * | 2017-03-10 | 2018-09-25 | 北京沃尔德金刚石工具股份有限公司 | A kind of band coating alloy cutter shaft |
| CN108569841B (en) * | 2017-03-10 | 2023-07-21 | 北京沃尔德金刚石工具股份有限公司 | Alloy cutter shaft with coating |
| CN107177845A (en) * | 2017-05-03 | 2017-09-19 | 上海理工大学 | A kind of TiSiN/CNx nano laminated coatings and preparation method thereof |
| CN107354436A (en) * | 2017-07-18 | 2017-11-17 | 西安热工研究院有限公司 | A kind of TiSi base multilayer hard films of hobboing cutter cutter ring and preparation method thereof |
| CN107419223A (en) * | 2017-07-18 | 2017-12-01 | 西安热工研究院有限公司 | A kind of TiSi base nano composite structure ganoine thin films of hobboing cutter cutter ring and preparation method thereof |
| CN112981333A (en) * | 2021-02-05 | 2021-06-18 | 苏州吉恒纳米科技有限公司 | Preparation method of refined crystal grain type high-aluminum coating for difficult-to-machine material |
| CN112981333B (en) * | 2021-02-05 | 2023-04-25 | 苏州吉恒纳米科技有限公司 | Preparation method of refined grain type high-alumina coating for difficult-to-process material |
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