CN103064137A - Electric field induction imprinting method of aspheric surface micro-lens array - Google Patents
Electric field induction imprinting method of aspheric surface micro-lens array Download PDFInfo
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- CN103064137A CN103064137A CN2013100067666A CN201310006766A CN103064137A CN 103064137 A CN103064137 A CN 103064137A CN 2013100067666 A CN2013100067666 A CN 2013100067666A CN 201310006766 A CN201310006766 A CN 201310006766A CN 103064137 A CN103064137 A CN 103064137A
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Abstract
Disclosed is an electric field induction imprinting method of an aspheric surface micro-lens array. A micro-column array is placed on information technology outsourcing (ITO) conducting glass base materials in an imprinting mode, then another piece of ITO conducting glass is used as a top electrode, then a pair of parallel plate electrodes are formed with the base materials, and direct voltage is applied between the electrodes. When the base materials are heated to a temperature higher than a glassy state transition temperature of a polymer, under the induction impact of an electric field, the micro-column array deforms into the aspheric surface micro-lens array in a flowing mode, and the specific steps includes preparing and processing a imprinting mould, then selecting the base materials, electrodes and the polymer, then imprinting, demolding, applying an external electric field to conduct electric field induction remolding, and last, the polymer is solidified and the aspheric surface micro-lens array is acquired. The electric field induction imprinting method of the aspheric surface micro-lens array does not need complex process control, greatly reduces processing cost and improves processing efficiency.
Description
Technical field
The invention belongs to technical field of micro-nano manufacture, the electric field that is specifically related to a kind of aspherical microlens array is induced method for stamping.
Background technology
Lenticule refers to micro lens, usually its diameter is that 10 μ m are to 1 ㎜ level, and according to the difference of surface curvature, lenticule can be divided into spherical microlens and aspherical microlens, wherein aspherical microlens is more practical because it can eliminate spherical aberration better, is exactly microlens array by these micro lens according to the array that certain filling rate and arrangement mode form.In view of its in the communication technology, the huge applications of the numerous areas such as optical measurement and flat pannel display and shooting, various preparation methods about microlens array propose in succession, such as the melting photoresist method, ink-jet printing process and excimer laser ablation etc.But these methods all can only prepare the lenticule of spherical, have had a strong impact on its employing and popularization in application.
Summary of the invention
In order to overcome the shortcoming of above-mentioned prior art, the object of the present invention is to provide a kind of electric field of aspherical microlens array to induce method for stamping, can produce the polymkeric substance aspherical microlens array, cutting down finished cost, when improving working (machining) efficiency, also guaranteed lenticular surface smoothness.
In order to achieve the above object, the technical scheme taked of the present invention is:
A kind of electric field of aspherical microlens array is induced method for stamping, stay micro-pillar array at ITO electro-conductive glass base material, then use another piece ITO electro-conductive glass as top electrode, form the pair of parallel plate electrode with base material, and between electrode, apply DC voltage, when heated substrate is above to the glassy state inversion temperature of polymkeric substance, be subjected to the electric field force inducing action, micro-pillar array again stream becomes the microlens array with aspheric surface face type.
A kind of electric field of aspherical microlens array is induced method for stamping, may further comprise the steps:
1) preparation of impressing mould and processing: utilize photoetching and etching technics to process required array of circular apertures graphic structure at crystal column surface, and it is carried out surface treatment, the demoulding after making it be beneficial to impression;
2) selection of base material, electrode and polymkeric substance: base material and electrode all adopt surperficial evaporation a layer thickness be the ITO electro-conductive glass of the electrical-conductive nanometer indium tin metal compound of 50nm-300nm, polymkeric substance adopts has thermoplastic material, or has simultaneously the material of thermoplasticity and ultraviolet curable;
3) impression and the demoulding: utilize sol evenning machine spin coating one layer of polymeric on base material, polymer thickness is 10um-50um, impressing mould after will processing with the pressure P of 10Mpa is pressed on the base material, combine closely with base material, and guarantee that environment temperature more than the glassy state inversion temperature of polymkeric substance, after 1-20 minute, is cooled to room temperature, the demoulding stays polymkeric substance column array at base material;
4) apply external electric field: utilize another piece ITO electro-conductive glass as top electrode, form the pair of plates electrode with substrate combination, one deck clearance is arranged between two plate electrodes, the clearance is 2-4 times of columnar arrays height, adopt direct supply, the voltage-regulation scope is at 300-500V, and positive pole connects electrode, negative pole connects base material, and the polymkeric substance microtrabeculae array that forms is applied external electric field;
5) electric field is induced reshaping: environment temperature is risen to more than the glass transition temperature, the regulation voltage size makes electric field force greater than polymer surfaces tension force, continues 1-20 minute again, until forming process finishes;
6) curing of polymkeric substance: in the situation that it is constant to keep applying voltage, according to polymeric material character, select corresponding curing mode, finally obtaining aspheric surface is lens arra.
Described polymkeric substance is PMMA, PS or SU-8 glue.
The present invention has broken through the restriction that conventional microlens array preparation technology can only prepare spherical lens, and the microlens array that obtains has the super-smooth surface characteristic, more is conducive to the widespread use of optical field.Because the present invention does not need complicated technology controlling and process, greatly reduce processing cost simultaneously, improved working (machining) efficiency.The technical program can be widely used in the many-sides such as chip lab, flat-panel monitor, optical system detection and observation.
Description of drawings:
Fig. 1-1 is the impressing mould front view.
Fig. 1-2 is the upward view of impressing mould.
Fig. 2 is that spin coating has polymeric material base material schematic diagram.
Fig. 3 is for being pressed in template the schematic diagram on the polymeric material.
Fig. 4 is the polymkeric substance column array schematic diagram that forms after the demoulding.
Fig. 5 carries out electricity and induces the reshaping schematic diagram for apply external electric field under heated condition.
Fig. 6 is that electric field is induced the local rheology principle schematic of polymkeric substance in the reshaping process.
Fig. 7 is the Polymer microlenses arrays schematic diagram behind the curing molding.
Embodiment
Below in conjunction with accompanying drawing the present invention is described in detail.
Impressing mould is pressed in the surfaces of conductive substrates that is coated with in advance polymkeric substance with the pressure of 10Mpa, impressing mould and base material are combined closely, guarantee that environment temperature is more than polymer glass attitude inversion temperature, to realize the fully filling of polymkeric substance in the impressing mould cavity, then be cooled to the room temperature demoulding, obtain the polymkeric substance microtrabeculae array on conductive base, with another piece conductive plate as top electrode, form the pair of parallel electrode pair with base material, between apply the DC voltage of 300-500V, and again environment temperature is risen to more than the glassy state inversion temperature of polymkeric substance, under the inducing action of electric field force, polymkeric substance microtrabeculae array is rheoforging again, obtain having the Polymer microlenses arrays of aspheric surface face type, at last according to polymeric material character, by corresponding curing mode, with polymer cure.
A kind of electric field of aspherical microlens array is induced method for stamping, may further comprise the steps:
1) preparation of impressing mould and processing: with reference to Fig. 1, impressing mould 1 adopts the traditional handicraft of photoetching and etching, make microwell array 2 at wafer, carrying out low-surface-energy after finishing processes, be the anti-sticking layer 3 of 20-100nm in the positive making of impressing mould a layer thickness namely, damage mini column array structure when preventing the demoulding;
2) selection of base material, electrode and polymkeric substance: with reference to Fig. 2, select the ITO electro-conductive glass as base material 4 and top electrode 5, the two plane plate electrode that partners, polymkeric substance 6 can adopt has thermoplastic, or has simultaneously the material of thermoplasticity and ultraviolet curable;
3) impression and the demoulding: with reference to Fig. 3 and Fig. 4, be the polymkeric substance 6 of 10-50um in base material 4 usefulness sol evenning machine spin coating a layer thickness, impressing mould 1 after will processing with constant pressure P=10MPa is pressed on the base material 4, impressing mould and base material are combined closely, and with hot plate 7 heated substrates to more than the glassy state inversion temperature of material, after 1-20 minute, be cooled to room temperature, the demoulding has stayed polymkeric substance microtrabeculae array 8 at base material 4;
4) apply extra electric field: with reference to Fig. 5, with another piece ito glass as top electrode 5, between the pair of plates electrode, apply constant voltage, one deck clearance is arranged between two plate electrodes, and the clearance is 2-4 times of columnar arrays height, adopts direct supply, voltage 300-500V is adjustable continuously, electrical-conductive nanometer indium tin metal on the base material 4 is oxidized to the negative pole that the ITO layer connects power supply, and the ITO layer of top electrode 5 connects the positive pole of power supply, and the polymkeric substance microtrabeculae array 8 that forms is applied external electric field;
5) electric field is induced reshaping: with reference to Fig. 6, again heat by 7 pairs of base materials 4 of hot plate, temperature is risen to more than the glassy state inversion temperature, regulate the size of DC voltage 9, electric field force is increased to is enough to overcome the surface tension of material, thereby drive the reshaping of polymkeric substance microtrabeculae array 8, to obtain the structure of aspheric surface face type, be in the effect that polymkeric substance microtrabeculae array 8 between the lower plate electrode is subject to an electric field force F who makes progress, electric field force F can make herein polymeric material overcome surface tension and viscosity resistance upwards flows.Under the acting in conjunction of these power, the final rheology of polymkeric substance forms the structure 10 with aspheric surface face type;
6) curing of polymkeric substance: with reference to Fig. 7, make polymeric material under constant voltage, voltage swing is that certain value of 300-500V all can, kept 1-20 minute, cure polymer, the curing mode of polymkeric substance is determined by the character of polymkeric substance, such as uv-exposure curing, cooling curing etc., after curing is finished, withdraw top electrode, final aspherical microlens array 10 has just been stayed on the base material 4.
Said method, the aspherical microlens array that can realize is of a size of: mould bossing size W1 and sunk part size W2 are 10 microns to 100 micron orders, between the plate electrode apart from d be 50 microns to 100 micron orders, impression height and lens height h1, h2 be 10 microns to 100 micron orders, the impression stay film and final molding to stay film thickness h3, h4 be 1 micron to 10 micron orders, final lens sizes W3 be 10 microns to 100 micron orders, lens gap W4 be 10 microns to 100 micron orders.
Imprint lithography and electric field are induced the sub-translucent array of polymkeric substance aspheric surface of reshaping, to utilize imprint lithography to finish large-area location to microlens array, this step simple economy, the rate of output is high, the micro-pillar array that forms is induced in the forming process at follow-up electric field, further rheology, finally formed the microlens array with excellent surface structure, any material is removed and ablation because this kind processing technology does not relate to, and in the process of polymkeric substance natural flow, lenticular surfaceness is very tiny, can reach 10 below the nanometer, so be a kind of very simple and practical preparation method, the product excellent optical performance can be used for various optical fields.
On the other hand, the present invention has overcome the restriction that conventional microlens preparation technology can only prepare spherical microlens, induce the reshaping of micro-pillar array by electric field, the microlens array of formation has aspheric surface face type, is suitable for application and the popularization of various optical fields.
Claims (2)
1. the electric field of an aspherical microlens array is induced method for stamping, it is characterized in that, may further comprise the steps:
1) preparation of impressing mould and processing: utilize photoetching and etching technics to process required array of circular apertures graphic structure at crystal column surface, and it is carried out surface treatment, the demoulding after making it be beneficial to impression;
2) selection of base material, electrode and polymkeric substance: base material and electrode all adopt surperficial evaporation a layer thickness be the ITO electro-conductive glass of the electrical-conductive nanometer indium tin metal compound of 50nm-300nm, polymkeric substance adopts has thermoplastic material, or has simultaneously the material of thermoplasticity and ultraviolet curable;
3) impression and the demoulding: utilize sol evenning machine spin coating one layer of polymeric on base material, polymer thickness is 10um-50um, impressing mould after will processing with the pressure P of 10Mpa is pressed on the base material, combine closely with base material, and guarantee that environment temperature more than the glassy state inversion temperature of polymkeric substance, after 1-20 minute, is cooled to room temperature, the demoulding stays polymkeric substance column array at base material;
4) apply external electric field: utilize another piece ITO electro-conductive glass as top electrode, form the pair of plates electrode with substrate combination, one deck clearance is arranged between two plate electrodes, the clearance is 2-4 times of columnar arrays height, adopt direct supply, the voltage-regulation scope is at 300-500V, and positive pole connects electrode, negative pole connects base material, and the polymkeric substance microtrabeculae array that forms is applied external electric field;
5) electric field is induced reshaping: environment temperature is risen to more than the glass transition temperature, the regulation voltage size makes electric field force greater than polymer surfaces tension force, continues 1-20 minute again, until forming process finishes;
6) curing of polymkeric substance: in the situation that it is constant to keep applying voltage, according to polymeric material character, select corresponding curing mode, finally obtain aspherical microlens array.
2. the electric field of a kind of aspherical microlens array according to claim 1 is induced method for stamping, it is characterized in that, described polymkeric substance is PMMA, PS or SU-8 glue.
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Cited By (11)
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| CN103387206A (en) * | 2013-07-18 | 2013-11-13 | 中国科学院合肥物质科学研究院 | Manufacturing method of ultramicropore broadband flexible micro-perforated plate |
| CN103771336A (en) * | 2014-01-21 | 2014-05-07 | 西安交通大学 | Manufacturing method of energy harvester based on piezoelectric polymer micro-structure array |
| CN104045054A (en) * | 2014-05-14 | 2014-09-17 | 中国科学院合肥物质科学研究院 | Method for preparing high-adhesion micro-nano array structure film through wet etching and reverse transfer printing |
| CN104330841A (en) * | 2014-10-30 | 2015-02-04 | 西安交通大学 | Electric assistant manufacturing method of controllable numerical aperture microlens array |
| CN106405692A (en) * | 2016-06-14 | 2017-02-15 | 西安交通大学 | Preparation technology of fly's-eye lens multi-level structure through electric field induction |
| CN107850833A (en) * | 2015-06-15 | 2018-03-27 | 沙特基础工业全球技术公司 | The metal electrode of OLED illumination applications is formed |
| CN109188862A (en) * | 2018-10-11 | 2019-01-11 | 京东方科技集团股份有限公司 | Stamping structure and its manufacturing method, impression block |
| CN109240040A (en) * | 2018-11-16 | 2019-01-18 | 京东方科技集团股份有限公司 | Impression block and method for stamping |
| CN111170270A (en) * | 2020-01-07 | 2020-05-19 | 南昌大学 | Surface microstructure preparation method based on electric field regulation and control morphology |
| CN112357876A (en) * | 2020-11-25 | 2021-02-12 | 四川大学 | Method for preparing polymer array by combining 3D printing with electric field induced molding |
| CN112357876B (en) * | 2020-11-25 | 2024-06-04 | 四川大学 | Method for preparing polymer array by combining 3D printing with electric field induction molding |
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Cited By (15)
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| CN103387206A (en) * | 2013-07-18 | 2013-11-13 | 中国科学院合肥物质科学研究院 | Manufacturing method of ultramicropore broadband flexible micro-perforated plate |
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| CN106405692A (en) * | 2016-06-14 | 2017-02-15 | 西安交通大学 | Preparation technology of fly's-eye lens multi-level structure through electric field induction |
| CN109188862A (en) * | 2018-10-11 | 2019-01-11 | 京东方科技集团股份有限公司 | Stamping structure and its manufacturing method, impression block |
| WO2020073632A1 (en) * | 2018-10-11 | 2020-04-16 | Boe Technology Group Co., Ltd. | Imprint template, method of fabricating imprint template, apparatus for performing method of fabricating imprint template, imprint mold for fabricating an imprint template |
| US11420361B2 (en) | 2018-10-11 | 2022-08-23 | Boe Technology Group Co., Ltd. | Imprint template, method of fabricating imprint template, apparatus for performing method of fabricating imprint template, imprint mold for fabricating an imprint template |
| CN109240040A (en) * | 2018-11-16 | 2019-01-18 | 京东方科技集团股份有限公司 | Impression block and method for stamping |
| US11531265B2 (en) | 2018-11-16 | 2022-12-20 | Beijing Boe Technology Development Co., Ltd. | Imprint template and imprint method |
| CN111170270A (en) * | 2020-01-07 | 2020-05-19 | 南昌大学 | Surface microstructure preparation method based on electric field regulation and control morphology |
| CN112357876A (en) * | 2020-11-25 | 2021-02-12 | 四川大学 | Method for preparing polymer array by combining 3D printing with electric field induced molding |
| CN112357876B (en) * | 2020-11-25 | 2024-06-04 | 四川大学 | Method for preparing polymer array by combining 3D printing with electric field induction molding |
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