CN102253435A - Micromachining method for manufacturing polymer cylindrical microlens by electric field induction - Google Patents
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- CN102253435A CN102253435A CN2011101930998A CN201110193099A CN102253435A CN 102253435 A CN102253435 A CN 102253435A CN 2011101930998 A CN2011101930998 A CN 2011101930998A CN 201110193099 A CN201110193099 A CN 201110193099A CN 102253435 A CN102253435 A CN 102253435A
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- 230000005684 electric field Effects 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title claims abstract description 30
- 229920000642 polymer Polymers 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 230000006698 induction Effects 0.000 title claims abstract 3
- 238000005459 micromachining Methods 0.000 title claims abstract 3
- 229920006254 polymer film Polymers 0.000 claims abstract description 37
- 239000003292 glue Substances 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract 10
- 229910052681 coesite Inorganic materials 0.000 claims abstract 5
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract 5
- 239000000377 silicon dioxide Substances 0.000 claims abstract 5
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract 5
- 229910052682 stishovite Inorganic materials 0.000 claims abstract 5
- 229910052905 tridymite Inorganic materials 0.000 claims abstract 5
- 238000000206 photolithography Methods 0.000 claims abstract 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 6
- 238000009826 distribution Methods 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 230000003068 static effect Effects 0.000 claims description 3
- 230000005686 electrostatic field Effects 0.000 claims description 2
- 238000000518 rheometry Methods 0.000 abstract description 9
- 239000000126 substance Substances 0.000 description 18
- 238000005516 engineering process Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 238000003672 processing method Methods 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 238000001259 photo etching Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- -1 indium tin metal oxide Chemical class 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 230000006378 damage Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
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- 230000008878 coupling Effects 0.000 description 1
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- 230000007547 defect Effects 0.000 description 1
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- 230000005611 electricity Effects 0.000 description 1
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- 239000000835 fiber Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
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- 238000004088 simulation Methods 0.000 description 1
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- 239000011800 void material Substances 0.000 description 1
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Abstract
一种利用电场诱导制造聚合物柱面微透镜的微加工方法，先在SiO2基材上加工形成透明导电栅线结构，旋涂SU-8胶，光刻显影成一圈支架，形成柱面电场等值面，再在SiO2基材的底部蒸镀导电ITO层，然后旋涂紫外光固化聚合物，再将透明模板压在紫外光固化聚合物上，使SU-8胶制成的支架压入聚合物薄膜中，再使用直流电源使平面的导电栅线结构在聚合物薄膜表面产生呈柱面的电场强度等值面，并形成柱面微透镜结构，在稳定电压值的电场下保持至聚合物流变形成柱面微透镜结构，最后采用紫外光曝光固化聚合物，脱去模板，即可得到所需的聚合物柱面微透镜阵列，本发明具有生产效率高、工艺简单、成本低的优点。
A micromachining method that uses electric field induction to manufacture polymer cylindrical microlenses. Firstly, a transparent conductive grid line structure is formed on the SiO2 substrate, then SU-8 glue is spin-coated, and photolithography is developed to form a circle of brackets to form a cylindrical electric field. isosurface, then vapor-deposit a conductive ITO layer on the bottom of the SiO2 substrate, and then spin-coat the UV-curable polymer, and then press the transparent template on the UV-curable polymer to press the bracket made of SU-8 glue. into the polymer film, and then use a DC power supply to make the planar conductive grid line structure generate a cylindrical electric field intensity equivalence surface on the surface of the polymer film, and form a cylindrical microlens structure, which is maintained under an electric field with a stable voltage value up to The polymer rheology forms a cylindrical microlens structure, and finally adopts ultraviolet light exposure to cure the polymer, and the template is removed to obtain the required polymer cylindrical microlens array. The invention has the advantages of high production efficiency, simple process and low cost. advantage.
Description
Technical field
The invention belongs to technical field of micro-nano manufacture, be specifically related to a kind of electric field that utilizes and induce the lenticular micro-processing method of manufacturing polymkeric substance cylinder.
Background technology
Lens are one of basic optical elements that constitute optical system, convergence is arranged, disperse, multiple optical effects such as collimation, imaging.Cylindrical lens is called GRIN Lens again, and referring to have at least a plane of refraction is the lens of cylinder, and the refractive index of its lens radially changes.Lenticule is meant that characteristic dimension is micron-sized micro lens, and it is called microlens array by the array that definite shape is arranged on substrate.The cylindrical microlenses array has advantages such as size is little, in light weight, integration is good, can be used for a plurality of technical fields such as optical information processing, ccd array, light interconnection, laser instrument, light data transmission.Lenticule can be by multiple materials processing, and glass is most widely used material, but glass hard (HRC65 height, flexible poor.Compare the glass lenticule, the micro polymer lens are not only more light, and because its flexibility is good, bigger design freedom arranged, and can be applicable to the flexible optical system.
The technology of existing preparation polymkeric substance cylinder microlens array has laser processing technology and hot-die forming technique.Laser processing technology utilizes the thermal effect of laser directly to process the cylindrical microlenses structure at substrate surface.This method need be processed lenticule one by one, and speed is slow, and production efficiency is low.And the thermal effect of Laser Processing can make polymkeric substance produce melt substance, increases the roughness on lenticule surface, influences its optical effect.The hot-die forming technique processes the cylindrical microlenses structure on master mold, order is heated to the polymkeric substance of molten state and fills mould, obtains the lenticule of replica after the cooling.But hot-die technology one-shot forming large tracts of land microlens array, but the heating cooling procedure can make polymkeric substance occur shrinking, and influences the replica precision.The processing of cylinder microscale mould simultaneously is also very difficult, has influenced this The Application of Technology.
Summary of the invention
In order to overcome the shortcoming of above-mentioned prior art, the object of the present invention is to provide a kind of electric field that utilizes to induce the lenticular micro-processing method of manufacturing polymkeric substance cylinder, easy processing microtrabeculae face, adding can not influence the lenticule precision man-hour, has production efficiency height, technology is simple, cost is low advantage.
In order to achieve the above object, the technical scheme taked of the present invention is:
A kind of electric field that utilizes is induced the lenticular micro-processing method of manufacturing polymkeric substance cylinder, may further comprise the steps:
1) at SiO
2Process the negative patterning of conductive gate line structure on the base material with photoetching process, using sputtering deposition device sputter one layer thickness on patterned photoresist layer is nano level transparent metal layer, peels off photoresist layer promptly at transparent SiO
2Just formed electrically conducting transparent grid line structure on the base material, spin coating one deck SU-8 glue on graphical template, and photoetching development afterwards forms a coil support around graph area, form cylinder electric field contour surface;
2) use sputtering deposition device at SiO
2The bottom evaporation electroconductive ITO layer of base material;
3) use sol evenning machine that the SiO of electroconductive ITO is arranged at evaporation
2Substrate surface spin coating UV curable polymer film, the thickness of UV curable polymer film is micron order;
4) pressure P with 0.5MPa is pressed in the transparent template that has the conductive gate line structure that the first step prepares on the UV curable polymer, the support that SU-8 glue is made is pressed in the UV curable polymer film, with the distance between control conductive gate line structure and the UV curable polymer film;
5) use direct supply, voltage-regulation scope 0-200V, conductive gate line structure place at transparent template connects positive pole, connect negative pole being coated with the base material place that is covered with the UV curable polymer film, the conductive gate line structure on plane can produce the electric field intensity contour surface that is cylinder at the UV curable polymer film surface, the interior pressure that the static pressure that electrostatic field produces can change the UV curable polymer film distributes, make its distribution carry out rheology, and form the cylindrical microlenses structure by cylinder electric field intensity contour surface;
6) UV curable polymer was kept 20 minutes to 2 hours under the electric field of stable voltage, form the cylindrical microlenses structure until polymeric rheology;
7) ultraviolet light of employing 365nm wavelength, the exposure cure polymer is sloughed template, can obtain required polymkeric substance cylinder microlens array.
The polymkeric substance cylinder microlens array that the electric field inductive technology makes has the advantage that technology is simple, cost is low.The cylinder electric field intensity contour surface that utilizes the conductive gate line structure spatially to produce, induced polymer film are pressed the rheology of cylinder electric field intensity contour surface and are formed cylindrical microlenses.Can adapt the pattern of electric field intensity contour surface by the distance between control voltage swing and grid line structure and the thin polymer film, obtain to have the cylindrical microlenses array of differing heights and radian.Owing to used UV curable polymer as rapidoprint, can realize normal temperature processing, solved the problem that lenticule that the heating cooling procedure causes shrinks.
Because the present invention does not need special processing conditions and complex apparatus, can cut down finished cost; The electric field inductive technology has been simplified the manufacturing procedure of cylindrical microlenses, shortened process time, improved production efficiency, the cylindrical microlenses array that the present invention is prepared can be applicable to multiple optical systems such as various semiconductor laser alignments, laser fiber coupling, photometry calculation, machine vision, three-dimensional imaging.
Description of drawings
Fig. 1 has the synoptic diagram of the template of conductive gate line structure for the present invention.
Fig. 2 is covered with the synoptic diagram of the base material of liquid UV curable polymer film for the present invention is coated with.
The transparent template that Fig. 3 will have a conductive gate line structure for the present invention is pressed into the synoptic diagram of UV curable polymer film.
The cylinder electric field intensity contour surface synoptic diagram that Fig. 4 produces at the UV curable polymer film surface for the transparent template that has the conductive gate line structure behind the impressed voltage of the present invention.
Fig. 5 induces the UV curable polymer film for electric field of the present invention and forms the synoptic diagram of cylindrical microlenses array.
Fig. 6 solidifies the synoptic diagram of the microlens array that has been shaped for the present invention's ultraviolet ray irradiation.
Fig. 7 is the synoptic diagram of the cylindrical microlenses array that obtains after the demoulding of the present invention.
Embodiment
Below in conjunction with accompanying drawing the present invention is done detailed description.
A kind of electric field that utilizes is induced the lenticular micro-processing method of manufacturing polymkeric substance cylinder, may further comprise the steps:
1) negative patterning of conductive gate line structure is designed to micron order grid line structure, according to Numerical Simulation Analysis, the grid line structure of conduction can spatially produce the electric field contour surface of cylinder, adopts sputtering sedimentation, etching system to prepare electrically conducting transparent grid line template, as shown in Figure 1, at SiO
2Base material 1 usefulness photoetching process processes the negative patterning of conductive gate line structure, and is nano level transparent metal layer with sputtering deposition device sputter one layer thickness on patterned photoresist layer, peels off photoresist layer promptly at transparent SiO
2Just formed electrically conducting transparent grid line structure 3 on the base material, spin coating one deck SU-8 glue on graphical template afterwards, and photoetching development, around graph area, form a coil support 2, the thickness k of conductive gate line structure 3 is a nanoscale, the width w of conductive gate line structure 3 is a micron order, and the spacing w1 of conductive gate line structure 3 is a micron order, and the height H of SU-8 support 2 is a micron order;
2) as shown in Figure 2, use sputtering deposition device at SiO
2The bottom 4 evaporation electrical-conductive nanometer indium tin metal oxide ITO layers 5 of base material;
3) as shown in Figure 3, use sol evenning machine at electrical-conductive nanometer indium tin metal oxide ITO layer 5 surperficial spin coating UV curable polymer film 6, the thickness d of UV curable polymer film 6 is a micron order;
4) as shown in Figure 4, pressure P 7 with 0.5MPa is pressed into UV curable polymer film 6 with the transparent template that has the conductive gate line structure that the first step prepares, make being pressed into fully in the UV curable polymer film 6 of support 2 that SU-8 glue makes, guarantee that the height H of the support 2 that the void size between conductive gate line structure 3 and the UV curable polymer film 6 is made for SU-8 glue deducts the thickness d of UV curable polymer film 6;
5) use digital direct supply 8, voltage-regulation scope 0-200V, connect the positive pole of direct supply at conductive gate line structure 3 places of transparent template, connect the negative pole of direct supply at electrical-conductive nanometer indium tin metal oxide ITO layer 5 place, adjust voltage swing, make conductive gate line structure 3 produce the electric field intensity contour surface 9 that is cylinder on UV curable polymer film 6 surfaces, and make electric field intensity big to the obstruction that can overcome UV curable polymer film 6 surface tension and gravity, rheology forms the cylindrical microlenses structure, as shown in Figure 4, there is cylinder electric field contour surface in UV curable polymer film 6 surfaces, by Maxwell's strain theory, being subjected to the internal pressure of the UV curable polymer film 6 that static pressure influences also to be cylinder distributes, because polymkeric substance can produce rheological behaviour by isopressure surface in the rheology process, final UV curable polymer film 6 can rheology form cylindrical microlenses structure 7;
6) as shown in Figure 5, the UV curable polymer film was kept 20 minutes to 2 hours under the electric field intensity contour surface of cylinder, the cylindrical microlenses structure of rheology formation and cylinder electric field contour surface consistent appearance;
7) as shown in Figure 6, adopt commercial ultraviolet curing equipment to produce ultraviolet light 11, UV curable polymer is solidified in exposure, sloughs template, can obtain required cylindrical microlenses structure 10.
Pass through said method, the size combinations of attainable cylindrical microlenses array is: the thickness d of the UV curable polymer film of spin coating on the base material is a micron order, the width w of transparent template conductive gate line structure is a micron order, the spacing w1 of transparent template conductive gate line structure is a micron order, the thickness k of transparent template conductive gate line structure is a nanoscale, the height H of SU-8 support is a micron order, the height d1 of the cylindrical microlenses array that makes is a micron order, the cycle 1 of cylindrical microlenses array is a micron order, the width w2 of single cylindrical microlenses is a micron order, and the radius-of-curvature r of single cylindrical microlenses is a micron order.
The normal temperature electric field of polymkeric substance cylinder microlens array is induced manufacturing process, utilize the conductive gate line structure to produce cylinder electric field contour surface at polymer surfaces, according to Maxwell's strain theory the pressure of liquid polymer film inside is distributed and also be the cylinder distribution, the pressure that makes polymkeric substance press cylinder distributes and produces rheological behaviour, thereby form the cylindrical microlenses structure, the disposable polymkeric substance cylinder microlens array that processes.The principle that tension effect that this manufacture method produces material by electric field and gate line electrode can produce cylinder electric field contour surface realizes the manufacturing of cylindrical microlenses structure, has the advantages such as cylinder mould that technology is simple, equipment cost is low, do not need processed complex.Have and conduct electricity the template of grid line and utilize Maxwell's tension force that electric field produces, do not need directly contact polymkeric substance to be processed, avoided at knockout course the cylindrical microlenses structural damage that is shaped as driving force.The figure of change conductive gate line structure and the size of adjustment impressed voltage can realize the control to size, height and the radius-of-curvature of cylinder microlens structure.
Compare with the cylindrical microlenses array that laser processing technology and hot-die forming technique make, electric field induces the cylindrical microlenses array that makes that the advantage that process time is short, can regulate cylinder height and radius-of-curvature by the adjusting Electric Field Distribution is arranged.Process combination of the present invention has the advantage that procedure of processing is simple, tooling cost is low.Because the characteristic of Electric Field Distribution, the grid line conductive pattern can spatially produce the electric field contour surface that cylinder distributes, the cylindrical microlenses structure that does not need processed complex has reduced the Mould Machining cost as mould, and can disposablely process large tracts of land cylindrical microlenses array.And use UV curable polymer can finish whole technological process at normal temperatures, avoided high-temperature technology and the intensification temperature-fall period destruction to lenticule cylinder surface topography, the cylindrical microlenses array defect that makes still less.
The present invention has overcome the spot heating that exists in the conventional laser process technology and has caused polymer melt to destroy the problem of lenticule pattern, and overcome the difficulty of hot-die forming technique processing cylinder micro-mould, the disposable polymkeric substance cylinder lenticule that makes large tracts of land, low defective.The present invention adopts the conductive gate line structure to form the rheology that cylinder electric field contour surface is induced UV curable polymer in the space, makes it form the cylindrical microlenses structure.The size that can be by changing the conduction grid line and the size and the radius-of-curvature of impressed voltage size control cylindrical microlenses array develop and a kind of new cylindrical microlenses array process technology.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103064137A (en) * | 2013-01-09 | 2013-04-24 | 西安交通大学 | Electric field induction imprinting method of aspheric surface micro-lens array |
| CN103149607A (en) * | 2013-03-01 | 2013-06-12 | 西安交通大学 | Micro-lens array manufacturing method based on template electric induction forming |
| CN103852972A (en) * | 2014-03-28 | 2014-06-11 | 西安交通大学 | Micrometer impressing and laser induction forming method of double-focus microlens array |
| CN105824063A (en) * | 2016-05-17 | 2016-08-03 | 西安交通大学 | Variable-focus micro lens array structure based on electric actuation and preparation process thereof |
| CN109467046A (en) * | 2018-09-28 | 2019-03-15 | 西安交通大学 | Fabrication method of composite material based on three-dimensional micro-nano structured arrangement of nanoparticles |
| CN111170270A (en) * | 2020-01-07 | 2020-05-19 | 南昌大学 | A method for preparing surface microstructures based on electric field control of morphology |
| CN115437044A (en) * | 2022-07-29 | 2022-12-06 | 深圳通感微电子有限公司 | Microlens preparation method and microlens |
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| US6964793B2 (en) * | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
| CN1729428A (en) * | 2001-05-16 | 2006-02-01 | 德克萨斯州大学系统董事会 | Method and system for fabricating nanoscale patterns in photocurable compositions by applying an electric field |
| CN101446762A (en) * | 2008-12-31 | 2009-06-03 | 西安交通大学 | Micro-complex type method for inducing electric field under the restrict of non-contact moulding board |
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2011
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103064137A (en) * | 2013-01-09 | 2013-04-24 | 西安交通大学 | Electric field induction imprinting method of aspheric surface micro-lens array |
| CN103064137B (en) * | 2013-01-09 | 2015-07-08 | 西安交通大学 | Electric field induction imprinting method of aspheric surface micro-lens array |
| CN103149607A (en) * | 2013-03-01 | 2013-06-12 | 西安交通大学 | Micro-lens array manufacturing method based on template electric induction forming |
| CN103149607B (en) * | 2013-03-01 | 2015-08-05 | 西安交通大学 | A kind of fabricating method of microlens array be shaped based on template electric induction |
| CN103852972A (en) * | 2014-03-28 | 2014-06-11 | 西安交通大学 | Micrometer impressing and laser induction forming method of double-focus microlens array |
| CN103852972B (en) * | 2014-03-28 | 2016-08-17 | 西安交通大学 | Micron impressing and the induced with laser manufacturing process of a kind of bifocus microlens array |
| CN105824063A (en) * | 2016-05-17 | 2016-08-03 | 西安交通大学 | Variable-focus micro lens array structure based on electric actuation and preparation process thereof |
| CN105824063B (en) * | 2016-05-17 | 2018-03-16 | 西安交通大学 | A kind of zoom microlens array structure and preparation technology based on electric actuation |
| CN109467046A (en) * | 2018-09-28 | 2019-03-15 | 西安交通大学 | Fabrication method of composite material based on three-dimensional micro-nano structured arrangement of nanoparticles |
| CN111170270A (en) * | 2020-01-07 | 2020-05-19 | 南昌大学 | A method for preparing surface microstructures based on electric field control of morphology |
| CN115437044A (en) * | 2022-07-29 | 2022-12-06 | 深圳通感微电子有限公司 | Microlens preparation method and microlens |
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Application publication date: 20111123 |