CN103029373A - Stone with functional thin film layer and manufacturing method thereof - Google Patents
Stone with functional thin film layer and manufacturing method thereof Download PDFInfo
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- CN103029373A CN103029373A CN2011102948715A CN201110294871A CN103029373A CN 103029373 A CN103029373 A CN 103029373A CN 2011102948715 A CN2011102948715 A CN 2011102948715A CN 201110294871 A CN201110294871 A CN 201110294871A CN 103029373 A CN103029373 A CN 103029373A
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Abstract
The present invention provides a stone with a functional thin film layer and a manufacturing method thereof. The stone of the present invention is characterized in that the surface of the natural stone is adhered with the thin film layer having a certain characteristic. The stone of the present invention uses a physical sputtering method, wherein the substrate is a natural stone, and the target is a thin film material. The beneficial effects of the present invention are that: by using the industrial method, the surface of the natural stone is adhered with the thin film layer to change wear resistance or corrosion resistance on stone surface, so that the stove has better overall performances than natural stone and the designer has more selection space. The manufacturing method of the present invention enables the stone having the functional thin film layer to be mass-produced by an industrial method. The production scale can be very large in order to facilitate cost reduction.
Description
Technical field
The present invention relates to a kind of stone material with functional thin film layer, namely take from lithotome, the surface artificial reconstructed formation of process has the stone material of thin layer, and the manufacture method of this kind stone material.
Background technology
Stone material is applied to build the history in existing several thousand.Stone material directly applies to building decoration as natural minerals its distinctive feature, but people recognize gradually: stone material is applied to inside and outside the mansion as construction material, stand all-environment test, its limitation is arranged, wearability, corrosion resistance such as the surface are not ideal enough, ornamental various not, color is gorgeous not, and these limitation have had influence on the service life of building and the color change of building.How promoting performance and the quality of lithotome, improve the building service life of stone material, is the problem that the present invention pays close attention to.
Summary of the invention
An object of the present invention is to provide a kind of stone material with functional thin film layer, make and adhere to the thin layer that one deck character is fully different from stone material character, have certain function on the lithotome surface, in order to improve the surface property of lithotome, film is to gain in strength to stone material character Main Function.
Another object of the present invention provides a kind of manufacture method with stone material of functional thin film layer.
The technical scheme that realizes the object of the invention is that a kind of stone material with functional thin film layer is characterized in that, adheres to the thin layer that one deck has certain specific character on the lithotome surface.
In the such scheme, described thin layer is metallic diaphragm or ceramic film.Metallic diaphragm can be the rete of gold, silver, platinum, titanium, copper, aluminium, tin, manganese, zinc, nickel or chromium, also can be the rete (such as the rete of titanium aluminium) of titanium alloy, the rete (such as the rete of aluminium silicon) of aluminium alloy or the rete (being the rete of chromium nickel) of nickel alloy.Ceramic film can be the rete of silicon nitride, carborundum, aluminium oxide, titanium oxide, tin oxide or silica.
In the such scheme, described thin layer is transparent film layer or colored film.
In the such scheme, described lithotome itself is flat-plate stone or non-tablet stone material.
The technical scheme that realizes another object of the present invention is, a kind of manufacture method with stone material of functional thin film layer adopts the manufacturing of physical sputtering method, and wherein base material is lithotome, and target is the material of film.Described method is carried out at enclosure space, and target is sputtered out with atomic group or ionic species, sputters on the stone material, and finally is deposited on stone surface, and the experience film forming procedure finally forms film, and stone surface is set up because obtaining film, thereby forms new interface.Rete has good uniformity, is fit to the processing of stone material product itself.
In the said method, described physical sputtering method adopts magnetron sputtering method, ion beam sputtering or Laser vaporization.
The invention has the beneficial effects as follows: utilize commercial run, make lithotome surface attachment upper film layer, in order to wearability or the corrosion resistance that changes stone surface, make it have the combination property that is better than lithotome, so that the designer has had more more options space.Manufacture method of the present invention makes described stone material with functional thin film layer can adopt the commercial run batch production.Production scale can be very large, is beneficial to cost.
Description of drawings
Fig. 1 is the structural representation with stone material of functional thin film layer of the present invention.
1. stone material, 2. thin layer.
The specific embodiment
The present invention will be further described below in conjunction with the drawings and specific embodiments, and following each embodiment only is used for explanation the present invention but not limitation of the present invention.
Embodiment 1: as base material, gold is together sent in the magnetron sputtering operation storehouse as target, according to magnetron sputtering method, produces sputter, absorption with plate lithotome, and gold is attached to the surface of described stone material and to diffusion inside, forms gold film.Obtain thus the stone material with functional thin film layer of the present invention, make the surface of stone material have the decorate properties of gold.Especially when the thin layer very thin thickness, the texture on lithotome surface is also faintly visible, and decorative effect is splendid.
Embodiment 2: as base material, titanium-aluminium alloy is together sent in the magnetron sputtering operation room as target with plate lithotome, according to magnetron sputtering method, produce sputter, absorption, titanium-aluminium alloy is attached to the surface of described stone material and to diffusion inside, forms titanium or titanium alloy thin films.Obtain thus the stone material with functional thin film layer of the present invention, because titanium-aluminium alloy because having intensity height, good, the heat resistance high of corrosion resistance, makes the surface of stone material have the characteristic of titanium-aluminium alloy.
Embodiment 3: as base material, silicon nitride is together sent in the ion beam sputtering operation room as target with lithotome, according to ion beam sputtering, produces sputter, absorption, and silicon nitride is attached to the surface of described stone material, forms silicon nitride film.Obtain thus the stone material with functional thin film layer of the present invention, present white or canescence, make the surface of stone material have the antiwear characteristic of silicon nitride.
Embodiment 4: as base material, carborundum is together sent in the magnetron sputtering operation storehouse as target, according to magnetron sputtering method, produces sputter, absorption with lithotome, and carborundum is attached to the surface of described stone material, forms carborundum films.Obtain thus the stone material with functional thin film layer of the present invention, present green or black, make the surface of stone material have wear-resisting, resistance to oxidation, the corrosion resistance characteristic of carborundum.
Embodiment 5: as base material, alusil alloy is together sent in the laser splash operation storehouse as target, according to Laser vaporization, produces sputter, absorption with lithotome, and alusil alloy is attached to the surface of described stone material, forms aluminium silicon film.Obtain thus the stone material with functional thin film layer of the present invention, present gray characteristics, make the surface of stone material have wear-resisting, resistance to oxidation, the corrosion resistance characteristic of aluminium silicon.
Embodiment 6: as base material, silica is together sent in the magnetron sputtering operation storehouse as target, according to magnetron sputtering method, produces sputter, absorption with lithotome, and silica is attached to the surface of described stone material, forms silica membrane.Obtain thus the stone material with functional thin film layer of the present invention, present transparent feature, make the surface of stone material have the hardness of silica, wear-resisting, resistance to oxidation characteristic.
Embodiment 7: as base material, tin oxide is together sent in the magnetron sputtering operation storehouse as target, according to magnetron sputtering method, produces sputter, absorption with lithotome, and tin oxide is attached to the surface of described stone material, forms SnO 2 thin film.Obtain thus the stone material with functional thin film layer of the present invention, present light blue feature, make the surface of stone material have the energy conservation characteristic of the thermal reflecting coating of tin oxide.
Embodiment 8: as base material, chromium nickel is together sent in the magnetron sputtering operation storehouse as target, according to magnetron sputtering method, produces sputter, absorption with lithotome, and tin oxide is attached to the surface of described stone material, forms chromium nickel film.Obtain thus the stone material with functional thin film layer of the present invention, present silvery white feature, make the surface of stone material have high strength and the anticorrosion properties of chromium nickel.
Embodiment 9: as base material, titanium oxide is together sent in the magnetron sputtering operation storehouse as target, according to magnetron sputtering method, produces sputter, absorption with lithotome, and titanium oxide is attached to the surface of described stone material, forms thin film of titanium oxide.Obtain thus the stone material with functional thin film layer of the present invention, present golden feature, make the surface of stone material have wear-resisting, the resistance to oxidation characteristic of titanium oxide.
Thin-film material is that people adopt special method for base material, at the surface deposition of base material or one deck character and the diverse material layer of base material character of preparation.The performance of every kind of material has its limitation, and thin-film material often has special material property or performance combination.Various material can be combined with each other flexibly, consist of the material with complex system with excellent specific property, bring into play every kind of material advantage separately, avoid the limitation of homogenous material.
Claims (13)
1. the stone material with functional thin film layer is characterized in that, adheres to the thin layer that one deck has certain specific character on the lithotome surface.
2. stone material according to claim 1 is characterized in that, described thin layer is metallic diaphragm or ceramic film.
3. stone material according to claim 2 is characterized in that, described metallic diaphragm is the rete of gold, silver, platinum, titanium, copper, aluminium, tin, manganese, zinc, nickel, chromium, titanium alloy, aluminium alloy or nickel alloy.
4. stone material according to claim 3 is characterized in that, the rete of described titanium alloy is the rete of titanium aluminium.
5. stone material according to claim 3 is characterized in that, the rete of described aluminium alloy is the rete of aluminium silicon.
6. stone material according to claim 3 is characterized in that, the rete of described nickel alloy is the rete of chromium nickel.
7. stone material according to claim 2 is characterized in that, described ceramic film is the rete of silicon nitride, carborundum, aluminium oxide, titanium oxide, tin oxide or silica.
8. stone material according to claim 1 is characterized in that, described thin layer is transparent film layer or colored film.
9. arbitrary described stone material is characterized in that according to claim 1 ~ 8, and described lithotome itself is flat-plate stone or non-tablet stone material.
10. the manufacture method with stone material of functional thin film layer is characterized in that, adopts the manufacturing of physical sputtering method, and wherein base material is lithotome, and target is the material of film.
11. manufacture method according to claim 10 is characterized in that, described physical sputtering method adopts magnetron sputtering method.
12. manufacture method according to claim 10 is characterized in that, described physical sputtering method adopts the ion sputtering method.
13. manufacture method according to claim 10 is characterized in that, described physical sputtering method adopts Laser vaporization.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102948715A CN103029373A (en) | 2011-09-30 | 2011-09-30 | Stone with functional thin film layer and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102948715A CN103029373A (en) | 2011-09-30 | 2011-09-30 | Stone with functional thin film layer and manufacturing method thereof |
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| Publication Number | Publication Date |
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| CN103029373A true CN103029373A (en) | 2013-04-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011102948715A Pending CN103029373A (en) | 2011-09-30 | 2011-09-30 | Stone with functional thin film layer and manufacturing method thereof |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02299833A (en) * | 1989-05-16 | 1990-12-12 | Nippon Puresuton Kk | Stone paper and preparation thereof |
| CN1080670A (en) * | 1992-06-26 | 1994-01-12 | 北京青云仪器厂 | Non-metal electroplating process |
| CN1210124A (en) * | 1997-09-02 | 1999-03-10 | 王卫中 | Glass hot sprayed film material and manufacture thereof |
| CN2547807Y (en) * | 2002-05-29 | 2003-04-30 | 杨丽香 | Stone-ceramic brick |
| CN102112416A (en) * | 2008-08-01 | 2011-06-29 | 科森蒂诺有限公司 | Stone agglomerate slab or flagstone with tio2 or zno coating |
| CN202264438U (en) * | 2011-09-30 | 2012-06-06 | 孙宝春 | Stone with functional thin film layer |
-
2011
- 2011-09-30 CN CN2011102948715A patent/CN103029373A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02299833A (en) * | 1989-05-16 | 1990-12-12 | Nippon Puresuton Kk | Stone paper and preparation thereof |
| CN1080670A (en) * | 1992-06-26 | 1994-01-12 | 北京青云仪器厂 | Non-metal electroplating process |
| CN1210124A (en) * | 1997-09-02 | 1999-03-10 | 王卫中 | Glass hot sprayed film material and manufacture thereof |
| CN2547807Y (en) * | 2002-05-29 | 2003-04-30 | 杨丽香 | Stone-ceramic brick |
| CN102112416A (en) * | 2008-08-01 | 2011-06-29 | 科森蒂诺有限公司 | Stone agglomerate slab or flagstone with tio2 or zno coating |
| CN202264438U (en) * | 2011-09-30 | 2012-06-06 | 孙宝春 | Stone with functional thin film layer |
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Application publication date: 20130410 |