CN103014620A - OLED (Organic Light Emitting Diode) glass substrate thermal evaporator - Google Patents

OLED (Organic Light Emitting Diode) glass substrate thermal evaporator Download PDF

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Publication number
CN103014620A
CN103014620A CN2013100011923A CN201310001192A CN103014620A CN 103014620 A CN103014620 A CN 103014620A CN 2013100011923 A CN2013100011923 A CN 2013100011923A CN 201310001192 A CN201310001192 A CN 201310001192A CN 103014620 A CN103014620 A CN 103014620A
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glass substrate
evaporation
oled
sub
evaporator
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CN2013100011923A
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CN103014620B (en
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南一虎
金铉东
赵芳
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Sichuan CCO Display Technology Co Ltd
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Sichuan CCO Display Technology Co Ltd
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Abstract

The invention provides an OLED (Organic Light Emitting Diode) glass substrate thermal evaporator which comprises a main baffle and a first point evaporator source and a second point evaporator source which are arranged below the main baffle, wherein a glass substrate is arranged above the main baffle, and evaporating areas of the first point evaporator source and the second point evaporator source are overlapped on the glass substrate. The OLED glass substrate evaporator also comprises a sub baffle, wherein the sub baffle is arranged below the glass substrate and capable of shielding the overlapping area. Through controlling the time of opening or closing the sub baffle, the amounts of evaporation materials attached to the overlapping area on the glass substrate and evaporation materials attached to other parts is almost balanced, the uniformity of evaporation is improved, and then the consistency of the thickness of an upper film layer of the glass substrate is improved, and the product quality is improved.

Description

OLED glass substrate evaporator
Technical field
The present invention relates to a kind of OLED glass substrate evaporator.
Background technology
As shown in Figure 1, existing OLED glass substrate evaporator all adopts the mode of an evaporation source, and major part is to adopt two some evaporation sources.First evaporation source 2 and second point evaporation source 3 are arranged on glass substrate 4 belows, and in the both sides of the geometric centre that is symmetricly set on glass substrate 4, are provided with master shield 1 between glass substrate 4 and some evaporation source.Master shield 1 is in closing condition before the evaporation, during work, the material that needs evaporation is put into an evaporation source, and heating; Glass substrate 4 rotates centered by the geometric centre of self in the horizontal direction, when the jet velocity of steam reaches set(ting)value, opens master shield 1, and the material that is evaporated is attached on the glass substrate 4; When deposition material when glass substrate 4 forms the rete of specific thickness, close master shield 1, shelter from glass substrate 4, and close the close point evaporation source, finish evaporation.The mode of this employing two point evaporation source is conducive to improve evaporation efficient, control evaporation area.But there is a defective in the mode of two point evaporation source, as shown in Figure 1, occur when preventing evaporation omitting, the evaporation scope of two some evaporation sources on glass substrate 4 partially overlaps, zone 6 appears overlapping, overlap the mid-way that zone 6 is positioned at glass substrate 4, be attached to the amount that overlaps the evaporation material in the zone 6 and be the twice of other parts, so almost be the twice of edge section at the thicknesses of layers of middle portion.The thicknesses of layers of evaporation is inhomogeneous will to cause OLED device performance difference, comprises brightness disproportionation, the unequal bad phenomenon of chromaticity coordinates.
Summary of the invention
Technical problem to be solved by this invention provides a kind of OLED glass substrate evaporator, and this OLED glass substrate evaporator greatly improves the homogeneity of evaporation, and then improves the consistence of thicknesses of layers on the glass substrate, improves the quality of products.
The technical scheme that technical solution problem of the present invention adopts is: this OLED glass substrate evaporator comprises master shield and is positioned at first evaporation source and the second point evaporation source of described master shield below, glass substrate is arranged at described master shield top, there is the coincidence zone in described first evaporation source and the second point evaporation source evaporation scope on glass substrate, also comprise sub-baffle plate, described sub-baffle plate is arranged at described glass substrate below, and can block described coincidence zone.By controlling the time of sub-baffle plate opening and closing, make the regional evaporation material that adheres to other parts of coincidence on the glass substrate approach equilibrium, improve the evaporation homogeneity.
Time ratio for the opening and closing of controlling better sub-baffle plate obtains better evaporation homogeneity, and the geometric centre in the vertical direction of the geometric centre of described sub-baffle plate and described glass substrate is coaxial.
The invention has the beneficial effects as follows: this OLED glass substrate evaporator arranges sub-baffle plate by increase, when having changed the evaporation glass substrate, be positioned at the evaporation time in the coincidence zone of middle portion, effectively controlled the amount of adhering to evaporation material in the zone that overlaps, make more homogeneous of the distribution of evaporation material on whole glass substrate, the consistence of the thicknesses of layers of formation is better.Adopt this OLED glass substrate evaporator, greatly improved the brightness homogeneity of glass substrate various piece and the accuracy of chromaticity coordinates, and then improve the whole optical property of glass substrate, improve the quality of products, lower scrap rate.This OLED glass substrate evaporator is easy to operate, and level of automation is high.
Description of drawings
Fig. 1 is the principle of work synoptic diagram of existing OLED glass substrate evaporator.
Fig. 2 is the principle of work synoptic diagram of OLED glass substrate evaporator of the present invention.
Embodiment
As shown in Figure 2, sub-baffle plate 5 is set below glass substrate to be processed 4.Evaporate process is, closes master shield 1 and sub-baffle plate 5, opens first evaporation source 2 and second point evaporation source 3, make evaporation material be subjected to thermal evaporation, when the flow velocity of evaporation material and density reach setup parameter and require, open master shield 1, evaporation material is attached on the glass substrate 4.Because blocking of sub-baffle plate 5 do not have evaporation material in the coincidence zone 6 on the glass substrate 4.Open sub-baffle plate 5 in due course, evaporation material continues to adhere on whole glass substrate 4, but the evaporation material that is evaporated from first evaporation source 2 and second point evaporation source 3 all is attached to and overlaps in the zone 6, the accumulating rate that overlaps zone 6 interior evaporation materials is other regional twices, continuing evaporation after for some time like this, the amount that overlaps the evaporation material that adheres in zone 6 and other zones approaches balanced, if time control accurately, can accomplish to equate, close master shield 1 this moment, finishes evaporate process.The thicknesses of layers that forms after the evaporation material cooling is more even, and the glass substrate 4 behind the evaporation is better in the optical property of the aspects such as brightness, chromaticity coordinates, and the product total quality is higher.
Based on the inhomogeneity requirement of evaporation, with the simplification sequence of control, first evaporation source 2 and second point evaporation source 3 be general to adopt product of the same race, angle and the area coverage of the vapour stream that penetrates from first evaporation source 2 and second point evaporation source 3 like this are basic identical, overlap the central position that zone 6 just in time is in glass substrate 4.So, the geometric centre of sub-baffle plate 5 is coaxial in the geometric centre in the vertical direction of glass substrate 4, more be conducive to calculate and control the opening time of sub-baffle plate 5, and when the shape and size of the sub-baffle plate 5 of design, also be more convenient for calculating.
The shape of sub-baffle plate 5, size, the time point of opening and the length of time length are set according to the factors such as distance between vapor-deposited film layer thickness, the area that overlaps zone 6, glass substrate 4 and the some evaporation source.Take the requirement of present evaporation OLED glass substrate as example, the thickness that adheres to evaporation material at glass substrate 4 is 1500 dusts, the evaporation rate of a single point evaporation source was 3 dust/seconds, because glass substrate 4 is in rotating state in evaporate process, so glass substrate 4 whenever rotates a circle, each position is successively through first evaporation source 2 and second point evaporation source 3 tops, so the whole evaporation time is 250 seconds.Can extrapolate accordingly, begin timing when opening master shield 1, after master shield 1 is opened 125 seconds, the thickness that overlaps evaporation material on the zone 6 is 0 dust, and the thickness of other regional evaporation materials is 750 dusts on the glass substrate 4, opens sub-baffle plate 5 this moment, the evaporation material that is evaporated from first evaporation source 2 and second point evaporation source 3 is attached to simultaneously and overlaps zone 6, the evaporation rate that overlaps zone 6 was 12 dust/seconds, and again through 125 seconds, the thickness that overlaps the evaporation material in zone 6 is 1500 dusts; And other the regional evaporation rates except overlapping zone 6 were always for 6 dust/seconds on the glass substrate 4, and evaporation is 250 seconds altogether, and the thickness of evaporation material is similarly 1500 dusts, and it is balanced that the thickness of the evaporation material that various piece is adhered on the whole glass substrate 4 reaches.

Claims (2)

1.OLED glass substrate evaporator, comprise master shield (1) and be positioned at first evaporation source (2) and the second point evaporation source (3) of described master shield (1) below, glass substrate (4) is arranged at described master shield (1) top, there is coincidence zone (6) in described first evaporation source (2) and second point evaporation source (3) the evaporation scope on glass substrate (4), it is characterized in that: also comprise sub-baffle plate (5), described sub-baffle plate (5) is arranged at described glass substrate (4) below, and can block described coincidence zone (6).
2. OLED glass substrate evaporator according to claim 1, it is characterized in that: the geometric centre in the vertical direction of the geometric centre of described sub-baffle plate (5) and described glass substrate (4) is coaxial.
CN201310001192.3A 2013-01-04 2013-01-04 OLED (Organic Light Emitting Diode) glass substrate thermal evaporator Expired - Fee Related CN103014620B (en)

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CN201310001192.3A CN103014620B (en) 2013-01-04 2013-01-04 OLED (Organic Light Emitting Diode) glass substrate thermal evaporator

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CN103014620B CN103014620B (en) 2015-04-08

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103243302A (en) * 2013-05-21 2013-08-14 上海和辉光电有限公司 Baffle mechanism, thin film deposition device and thin film deposition method
CN106435483A (en) * 2016-12-12 2017-02-22 福州大学 High-accuracy organic light-emitting device (OLED) component preparation device and method
CN112144017A (en) * 2020-09-09 2020-12-29 福建华佳彩有限公司 Glass substrate coating device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1718844A (en) * 2005-07-12 2006-01-11 中国科学院上海光学精密机械研究所 The modification method of evenness of film thickness of electron beam evaporation film coating
KR20070097632A (en) * 2006-03-28 2007-10-05 문대규 Arrangement method for deposition apparatus of point source and deposition apparatus
CN101280418A (en) * 2008-04-29 2008-10-08 南京邮电大学 Multi-source vacuum evaporation device having multi-layer radial type evaporation source distribution structure
CN203021641U (en) * 2013-01-04 2013-06-26 四川虹视显示技术有限公司 OLED (Organic Light Emitting Diode) glass substrate evaporator

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1718844A (en) * 2005-07-12 2006-01-11 中国科学院上海光学精密机械研究所 The modification method of evenness of film thickness of electron beam evaporation film coating
KR20070097632A (en) * 2006-03-28 2007-10-05 문대규 Arrangement method for deposition apparatus of point source and deposition apparatus
CN101280418A (en) * 2008-04-29 2008-10-08 南京邮电大学 Multi-source vacuum evaporation device having multi-layer radial type evaporation source distribution structure
CN203021641U (en) * 2013-01-04 2013-06-26 四川虹视显示技术有限公司 OLED (Organic Light Emitting Diode) glass substrate evaporator

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103243302A (en) * 2013-05-21 2013-08-14 上海和辉光电有限公司 Baffle mechanism, thin film deposition device and thin film deposition method
CN103243302B (en) * 2013-05-21 2015-07-08 上海和辉光电有限公司 Baffle mechanism, thin film deposition device and thin film deposition method
CN106435483A (en) * 2016-12-12 2017-02-22 福州大学 High-accuracy organic light-emitting device (OLED) component preparation device and method
CN112144017A (en) * 2020-09-09 2020-12-29 福建华佳彩有限公司 Glass substrate coating device
CN112144017B (en) * 2020-09-09 2024-05-17 福建华佳彩有限公司 Glass substrate coating device

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