CN103008310B - Non-defect optical element cleaning method - Google Patents
Non-defect optical element cleaning method Download PDFInfo
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- CN103008310B CN103008310B CN201210575117.3A CN201210575117A CN103008310B CN 103008310 B CN103008310 B CN 103008310B CN 201210575117 A CN201210575117 A CN 201210575117A CN 103008310 B CN103008310 B CN 103008310B
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Abstract
The invention provides a non-defect optical element cleaning method. In an optical element processing process, optical elements are cleaned, the pollution of auxiliary materials to glazed surfaces is reduced. The method comprises the four procedures: cleaning with acetic acid lotion, cleaning with APG (Alkyl Polyglucoside) lotion, cleaning with pure water and dehydrating with acetone. After the processing is finished, the optical elements are cleaned again. The method is suitable for cleaning finished plates after each surface of a single-side or multi-side precise optical element is polished, so that the purpose of reducing the adhesive force of each polishing auxiliary material to the precise optical elements after polishing the elements is achieved; the pollution of the auxiliary materials to the glazed surfaces is reduced, so that the final optical cleaning difficulty is reduced, and the grade of the surface defects of the optical element is enhanced.
Description
Technical field
The present invention relates to optical processing technology field, in particular to the cleaning method in a kind of zero defect optical effect correction process, the method be applicable to each mirror polish of precision optics part complete after the cleaning of one-tenth dish, object is to improve the beauty defects grade of optical element.
Background technology
Ultraprecision Machining ability has become an important embodiment of current national science and technology level, when Ultra-precision Turning reaches sub-nanometer scale, the clean-up performance on its surface becomes an important technical indicator, the cleaning method being applied to this field is at present a lot, there are solubilize, microcorrosion method and ultrasonic method, million sound methods, plasma method etc., but these cleaning methods are all the cleaning methods for optical element finished product, when some microfabrication auxiliary material, when adsorption capacity as polishing powder is crossed strong, above-mentioned cleaning method just can not play its effect completely.Therefore, need research badly and a kind ofly effectively can reduce the pollution of auxiliary material to polished surface, reduce the difficulty of final optics cleaning, improve the cleaning method of the beauty defects grade of optical element.
Summary of the invention
The object of the present invention is to provide a kind of zero defect optical element cleaning method, the method can improve the surface cleanness degree of precision optics part effectively.
To achieve these goals, present invention employs following technical scheme:
A kind of zero defect optical element cleaning method, comprises the following steps:
In optical effect correction process, optical element is cleaned, reduce auxiliary material to the pollution of polished surface, machine and rear optical element to be cleaned again.
Carry out cleaning to optical element in described process to comprise the following steps: first soak optical element 3-5min with the aqueous acetic acid of mass fraction 20-40%, then with pure water, optical element is rinsed, washing time is 5-10s, after flushing, use zero level long wool absorbent cotton to dip in distillation acetone and complete in 1-2min the wiping on optical element surface is dewatered.Aqueous acetic acid makes the polishing powder from rare earth adhesive ability adsorbed in part process reduce after soaking, and most of polishing powder is removed in distillation acetone wiping dehydration.
In described process, cleaning is carried out to optical element further comprising the steps of: before optical element being rinsed with pure water, the optical element pH after Dichlorodiphenyl Acetate aqueous solution soaking is 7-8, APG washing lotion aqueous solution soaking 3-5min that mass fraction is 3-5%.Make the adhesive ability of the molecule adsorbed in part process reduce after APG washing lotion aqueous solution soaking, and most of molecule is removed in distillation acetone wiping dehydration.
Compared with prior art, the present invention has the following advantages: the present invention immediately cleans optical element in optical effect correction process, effectively can reduce the pollution of auxiliary material to polished surface, thus reduce the difficulty of final optics cleaning, improve the beauty defects grade of optical element, be applicable to one side or each mirror polish of multiaspect precision optics part complete after the cleaning of one-tenth dish.
Detailed description of the invention
Below in conjunction with embodiment, the invention will be further described.
In optical effect correction process, optical element is cleaned, reduce auxiliary material to the pollution of polished surface, machine and rear optical element to be cleaned according to existing method again.The cleaning carried out optical element in process is see following examples.
Embodiment one:
1) utilize mass fraction be 30% acetic acid water lotion soak 5min;
2) after step 1), utilize pH=7, mass fraction be 5% APG washing lotion aqueous solution soaking 5min;
3) through step 2) after, utilize pure water to rinse, the washing time of each optical element is 6s;
4) after step 3), use zero level long wool absorbent cotton to dip in and distill the wiping dehydration that acetone completes optical element surface in 1min.Piece surface is detected without attachment material with 50 power microscopes.Final finished 500 power microscopes detect piece surface without attachment material.
Embodiment two:
1) utilize mass fraction be 40% acetic acid water lotion soak 3min;
2) after step 1), utilize pH=8, mass fraction be 3% APG washing lotion aqueous solution soaking 5min;
3) through step 2) after, utilize pure water to rinse, the washing time of each optical element is 8s;
4) after step 3), use zero level long wool absorbent cotton to dip in and distill the wiping dehydration that acetone completes optical element surface in 2min.Piece surface is detected without attachment material with 50 power microscopes.Final finished 500 power microscopes detect piece surface without attachment material.
Embodiment three:
1) utilize mass fraction be 20% acetic acid water lotion soak 3min;
2) after step 1), utilize pH=8, mass fraction be 5% APG washing lotion aqueous solution soaking 3min;
3) through step 2) after, utilize pure water to rinse, the washing time of each optical element is 10s;
4) after step 3), use zero level long wool absorbent cotton to dip in and distill the wiping dehydration that acetone completes optical element surface in 2min.Piece surface is detected without attachment material with 50 power microscopes.Final finished 500 power microscopes detect piece surface without attachment material.
In above-described embodiment one to three, the APG washing lotion aqueous solution adopts APG washing lotion (RQ1512) and water to prepare.
Embodiment four:
1) utilize mass fraction be 20% acetic acid water lotion soak 3min;
2) after step 1), utilize pure water to rinse, the washing time of each optical element is 10s;
3) through step 2) after, use zero level long wool absorbent cotton to dip in and distill the wiping dehydration that acetone completes optical element surface in 2min.Detect piece surface with 50 power microscopes and have a small amount of attachment material.Final finished detects piece surface with 500 power microscopes pettiness attachment
Reference examples:
Part is not cleaned in process, only carry out wiping.Detect piece surface with 50 power microscopes and have more attachment material.Final finished detects piece surface with 500 power microscopes less attachment.
Claims (1)
1. a zero defect optical element cleaning method, is characterized in that, comprise the following steps:
In optical effect correction process, optical element is cleaned, reduce auxiliary material polishing powder from rare earth to the pollution of polished surface, machine and rear optical element to be cleaned again;
Carry out cleaning to optical element in described process to comprise the following steps: first soak optical element 3-5min with the aqueous acetic acid of mass fraction 20-40%, then with pure water, optical element is rinsed, washing time is 5-10s, after flushing, with distillation acetone, optical element surface wipes is dewatered;
In described process, cleaning is carried out to optical element further comprising the steps of: before optical element being rinsed with pure water, the optical element pH after Dichlorodiphenyl Acetate aqueous solution soaking is 7-8, APG washing lotion aqueous solution soaking 3-5min that mass fraction is 3-5%.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210575117.3A CN103008310B (en) | 2012-12-26 | 2012-12-26 | Non-defect optical element cleaning method |
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| CN201210575117.3A CN103008310B (en) | 2012-12-26 | 2012-12-26 | Non-defect optical element cleaning method |
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| CN103008310A CN103008310A (en) | 2013-04-03 |
| CN103008310B true CN103008310B (en) | 2015-03-11 |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104762622B (en) * | 2015-03-24 | 2017-07-25 | 中国船舶重工集团公司第七二五研究所 | A kind of processing method of corronil tubing surface-brightening |
| CN109622503B (en) * | 2018-12-04 | 2022-12-02 | 天津津航技术物理研究所 | Nondestructive cleaning method for laser gyroscope cavity after optical processing |
| CN113857139A (en) * | 2021-09-10 | 2021-12-31 | 四川富乐德科技发展有限公司 | Cryopump purge |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU841158A2 (en) * | 1980-01-30 | 1985-03-30 | Предприятие П/Я А-7526 | Method of cleaning optical glass |
| US6252725B1 (en) * | 1998-08-18 | 2001-06-26 | Trw Inc. | Semiconductor micro epi-optical components |
| CN1720110A (en) * | 2002-12-03 | 2006-01-11 | 株式会社尼康 | Pollutant removal method and apparatus, and exposure method and apparatus |
| CN101972756A (en) * | 2010-08-30 | 2011-02-16 | 苏州五方光电科技有限公司 | Lens cleaning process during processing |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001107089A (en) * | 1999-10-07 | 2001-04-17 | Jsr Corp | Cleaning agent for semiconductor part, cleaning of the same, polishing composition, and polishing method |
| JP2002273358A (en) * | 2001-03-22 | 2002-09-24 | Olympus Optical Co Ltd | Method for cleaning optical element |
| JP2002336804A (en) * | 2001-05-15 | 2002-11-26 | Nikon Corp | Method for cleaning optical part and exposure device |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU841158A2 (en) * | 1980-01-30 | 1985-03-30 | Предприятие П/Я А-7526 | Method of cleaning optical glass |
| US6252725B1 (en) * | 1998-08-18 | 2001-06-26 | Trw Inc. | Semiconductor micro epi-optical components |
| CN1720110A (en) * | 2002-12-03 | 2006-01-11 | 株式会社尼康 | Pollutant removal method and apparatus, and exposure method and apparatus |
| CN101972756A (en) * | 2010-08-30 | 2011-02-16 | 苏州五方光电科技有限公司 | Lens cleaning process during processing |
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