CN102959470A - Exposure system - Google Patents
Exposure system Download PDFInfo
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- CN102959470A CN102959470A CN2011800317088A CN201180031708A CN102959470A CN 102959470 A CN102959470 A CN 102959470A CN 2011800317088 A CN2011800317088 A CN 2011800317088A CN 201180031708 A CN201180031708 A CN 201180031708A CN 102959470 A CN102959470 A CN 102959470A
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- China
- Prior art keywords
- lens
- assembling body
- exposure
- photomask
- unit lenses
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
Abstract
Disclosed is an exposure system with a lens assembly (11) adapted to be movable in the direction of an arrow (B) within a plane which is parallel to the plane of a workpiece to be exposed to light and the plane of a photo mask. The lens assembly has a plurality of unit lens assemblies (11A to 11C) in which a plurality of lens groups (15) are arrayed at certain pitches in a direction intersecting the direction of the arrow (B) to form a plurality of lens arrays (16), the lens groups being capable of focusing an erect image of the mask pattern of the photo mask at the same magnification on the surface of the workpiece being exposed to light. Furthermore, each of the plurality of unit lens assemblies (11A to 11C) is formed by shifting the lens arrays (16) from each other by a certain amount in the direction intersecting the direction of the arrow (B) so that each lens group (15) of each of the lens arrays (16) is aligned in parallel to an axial line O-O that diagonally intersects the direction of the arrow (B). The unit lens assemblies (11A to 11C) are further arranged in one line so that mutually adjacent ends (11Aa, 11Ba, 11Bb, 11Ca) are cut in parallel to the axial line O-O, and the lens groups (15) of each of the lens arrays (16) are arrayed at certain pitches in the direction intersecting the direction of the arrow (B). This arrangement allows a large-area workpiece to be exposed to a non-periodic pattern at high resolution.
Description
Technical field
The present invention relates to be exposed body irradiation exposure light the expose exposure device of the pattern that form regulation to remaining on the stand via photomask, specifically, relate to and to carry out the large-area exposure device that is exposed the exposure of the acyclic pattern on the body with high exploring power.
Background technology
The existing exposure device of this kind shines exposure light via photomask off and on to the body that is exposed of carrying with fixed speed, thereby the mask pattern of photomask is exposed at assigned position, this exposure device possesses: the first image mechanism, it to be setting the exposure position that obtains based on above-mentioned photomask or the mode of making a video recording by the position of side in front of the above-mentioned throughput direction that is exposed body than this exposure position, and have with above-mentioned throughput direction a plurality of photo detectors of arranging of the direction of quadrature roughly; The second image mechanism, it to be setting the exposure position that obtains based on above-mentioned photomask or the mode of making a video recording by the position of side in front of the above-mentioned throughput direction that is exposed body than this exposure position, and has a plurality of photo detectors with the arrangement of above-mentioned throughput direction almost parallel ground; Correcting mechanism, its make above-mentioned be exposed body and photomask with above-mentioned throughput direction roughly the direction of quadrature relatively move, the exposure position that obtains based on this photomask is revised; Control gear, when detect above-mentioned when being exposed the first reference position that exposure position correction that body sets in advance uses by above-mentioned the first image mechanism, this control gear is controlled the driving of above-mentioned correcting mechanism based on it, when detecting by above-mentioned the second image mechanism when the above-mentioned irradiation opportunity that is exposed the exposure light that body sets in advance is extracted the second reference position of usefulness out, this control gear is controlled the irradiation opportunity (for example, with reference to patent documentation 1) of above-mentioned exposure light based on it.
Technical literature formerly
Patent documentation
Patent documentation 1: TOHKEMY 2008-76709 communique
Summary of the invention
The problem that invention will solve
But, in so existing exposure device, when when being exposed body (substrate) and having the exposure of periodic pattern, only just can easily carry out with the irradiation opportunity of specified period control exposure light with the fixed speed conveying substrate time to a direction, but be difficult to realize the exposure of acyclic pattern.In addition, owing to photomask is exposed near opposed with respect to substrate, therefore may be because of the existence at the visual angle (directional light half-angle) in the light source light of photomask irradiation, cause the picture of the pattern on the substrate fuzzy and make decrease resolution, thus pattern exposure formation that can't be trickle.
For such problem, can tackle by the stepping exposure device that uses picture with photomask to utilize imaging len reduced projection on the substrate to expose, but in the situation that for example the large-area substrate more than square to 1m exposes, the lens opening of using becomes with the big or small corresponding of substrate greatly, thereby has the such problem of exposure device that becomes high price.
Therefore, the object of the invention is to tackle such problem points, providing a kind of can carry out the large-area exposure device that is exposed the exposure of the acyclic pattern on the body with high exploring power.
Be used for solving the means of problem
To achieve these goals, exposure device of the present invention possesses lens assembling body, this lens assembling body forms and can be exposed the stand of body and be formed with between the photomask of mask pattern and mobile in the face parallel with the face of the described face that is exposed body and described photomask in mounting, and, this lens assembling body has a plurality of unit lenses assemblies that are arranged in row in the direction of intersecting with described moving direction, described a plurality of unit lenses assembly is arranged a plurality of lens combination and is formed a plurality of lens arrays with fixing arrangement pitches on the direction of intersecting with described moving direction, described a plurality of lens combination constitutes and times erect image such as grade of the mask pattern of described photomask can be imaged onto described being exposed on the surface, wherein, each described unit lenses assembly so that the mode that each lens combination of each described lens arrays and the axis that tilts to intersect with respect to the moving direction of described lens assembling body are arranged in parallel each described lens arrays is staggered fixed amount mutually and form on the direction of intersecting with described moving direction, and each described unit lenses assembly forms the structure of excising abreast mutually adjacent end with described axis, and the lens combination of each described lens arrays is configured to arranging with fixing arrangement pitches on the whole at described lens assembling body.
By such structure, make lens assembling body mobile in the face parallel with the face that loads the face that is exposed body on stand and photomask, simultaneously times erect image such as grade of the mask pattern of photomask is imaged onto and is exposed on the surface, thereby acyclic pattern is exposed being exposed on the body, wherein, in this lens assembling body, the mode that a plurality of unit lenses assemblies are arranged with fixing arrangement pitches with the lens combination integral body of each lens arrays is configured to row, described a plurality of unit lenses assemblies are so that the mode that the axis that a plurality of lens combination of arranging with fixing arrangement pitches of a plurality of lens arrays and moving direction with respect to lens assembling body tilt to intersect is arranged in parallel mutually staggers fixed amount with each lens arrays and forms on the direction of intersecting with above-mentioned moving direction, and formation and above-mentioned axis excise the structure of mutual adjacent end abreast.
In addition, in each described unit lenses assembly, in the overlapping mode of a part of each described lens combination when the moving direction of described lens assembling body is observed each lens arrays is staggered mutually on the direction of intersecting with described moving direction.Thus, mask pattern with photomask when lens assembling body is moved exposes to being exposed body, wherein, this lens assembling body lens arrays of making the side in the mutually adjacent lens arrays in the overlapping mode of a part of each lens combination of each lens arrays when the moving direction of lens assembling body is observed staggers ormal weight and arranges in the direction of intersecting with above-mentioned moving direction.
And, described unit lenses assembly constitutes, make on the table back side of transparent substrate mutually correspondingly and the first, second, third and the 4th lens arra that be formed with a plurality of convex lens overlaps in the consistent mode of the optical axis of each convex lens of correspondence, and the middle inverted image of the mask pattern of described photomask is imaged onto between described the second lens arra and described the 3rd lens arra.Thus, the scioptics assembly, times erect image such as grade of the mask pattern that will form at photomask is imaged onto and is exposed on the surface, wherein, this lens assembling body constitutes, make on the table back side of transparent substrate mutually correspondingly and the first, second, third and the 4th lens arra that be formed with a plurality of convex lens overlaps in the consistent mode of the optical axis of each convex lens of correspondence, and the middle inverted image of the mask pattern of photomask is imaged onto between the second lens arra and the 3rd lens arra.
And, in the described unit lenses assembly, approach with the surface of the convex lens of the direct of travel upstream side that is positioned at light of described the 3rd lens arra and the first diaphragm of the opening with regulation shape is set, thereby will be limited in based on the exposure area that unit lenses obtains the central portion of lens.Thus, approach the first diaphragm of the opening with regulation shape that arranges by the surface with the convex lens of the direct of travel upstream side of the light of the 3rd lens arra that is positioned at lens assembling body, the exposure area that will obtain based on unit lenses is limited in the central portion of lens.
In addition, the opening of described the first diaphragm forms the shape of its part being carried out shading as follows, namely, in overlooking the opening of lower rectangular shape, when the moving direction of described lens assembling body was observed, the area of the part that the part of the opening of the opening of described the first diaphragm and adjacent the first diaphragm is overlapping became half of area of described overlapping part integral body.Thus, by with in overlooking the opening of lower rectangular shape, when the moving direction of lens assembling body is observed, half the mode that the area of the part that the part of the opening of the opening of the first diaphragm and adjacent the first diaphragm is overlapping becomes the area of overlapping portion integral body is carried out the shape of shading to a part the opening of the first diaphragm limits the exposure area, thereby the mask pattern of photomask is exposed to being exposed the surface.In this case, carry out the exposure of ormal weight by the repeated exposure of the lens combination of front and back existence on the moving direction of lens assembling body.
And, in described unit lenses assembly, approach with the lens surface of the direct of travel upstream side that is positioned at light of described the 4th lens arra and the second diaphragm of confine optical beam diameter be set.Thus, approach the second diaphragm that arranges by the lens surface with the direct of travel upstream side of the light of the 4th lens arra and come the confine optical beam diameter.
And described stand can be carried the described body that is exposed to a direction, and described lens assembling body is mobile under the state that the movement of described stand temporarily stops.Thus, make to be exposed the stand of body in carrying to direction and temporarily to stop, under this halted state, lens assembling body is moved and the mask pattern of photomask is exposed to being exposed body.
The invention effect
According to a first aspect of the invention, expose when the face that can make lens assembling body and photomask is mobile abreast, this lens assembling body forms times erect image such as grade of the mask pattern that forms at photomask to be imaged onto and is exposed on the surface, even and the aforementioned mask pattern is acyclic pattern, also can expose with high exploring power.In this case, the said lens assembly is preferably the size less than the size of photomask.Therefore, though corresponding and make the size of photomask become large with the large-area body that is exposed, the size decreases of lens assembling body that also can use, thus can make component costs cheap.Thus, can make the manufacturing cost of device cheap.In addition, because lens assembling body consists of by a plurality of unit lenses assemblies being arranged in row, therefore compare with a plurality of unit lenses assemblies are arranged differently, can shorten the displacement of lens assembling body, thereby can shorten the beat of exposure process.
In addition, according to a second aspect of the invention, even the size of mask pattern is larger than the size of lens, can not interrupt halfway yet, can conjointly expose continuously.
And, according to a third aspect of the invention we, can easily form a plurality of unit lenses are arranged a plurality of lens assembling bodies in face.Therefore, can make the manufacturing cost of lens assembling body cheap.
And according to a forth aspect of the invention, the impact and times erect image such as grade of the mask pattern of photomask is imaged onto accurately that can get rid of the aberration of lens is exposed on the surface.Therefore, can improve the formation precision of exposing patterns.
In addition, according to a fifth aspect of the invention, even in the situation that for exposing patterns being linked to each other and carrying out repeated exposure, also can prevent overexposure.Therefore, can further improve the formation precision of exposing patterns.
And, according to a sixth aspect of the invention, can the confine optical beam diameter, thus can further improve exploring power based on the lens combination of lens assembling body.
In addition, according to a seventh aspect of the invention, can give at continuous supplying and expose when being exposed body, thereby can improve the efficient of exposure-processed.
Description of drawings
Fig. 1 is the front view of the embodiment of expression exposure device of the present invention.
Fig. 2 is the vertical view of Fig. 1.
Fig. 3 is the vertical view of the effective substrate of film crystal that uses in the exposure device of the present invention of expression.
Fig. 4 represents the signal terminal that uses in the exposure device of the present invention vertical view of one structure example of photomask.
Fig. 5 represents the signal terminal that uses in the exposure device of the present invention vertical view of one structure example of lens assembling body.
Fig. 6 is the above-mentioned signal terminal of expression is used a structure example of unit lenses assembly with the signal terminal of lens assembling body figure, (a) is vertical view, (b) is front view.
Fig. 7 is the vertical view that above-mentioned signal terminal is described with the opening of the first diaphragm of the lens combination of unit lenses assembly.
Fig. 8 is the key diagram of the exposure carried out based on two adjacent on the moving direction of above-mentioned signal terminal with lens assembling body lens combination of expression.
Fig. 9 is the vertical view of other shape of the opening of above-mentioned the first diaphragm of expression.
Figure 10 represents the scanning terminal that uses in the exposure device of the present invention vertical view of one structure example of light mask.
Figure 11 is that the scanning terminal that uses in the expression exposure device of the present invention uses the scanning terminal of lens assembling body with the figure of a structure example of unit lenses assembly, (a) is vertical view, (b) is front view.
Figure 12 is the key diagram that the above-mentioned signal terminal of expression is adjusted with the assembling of lens assembling body with lens assembling body and scanning terminal.
Figure 13 be expression the unit lenses assembly is arranged in row and the signal terminal that consists of with lens assembling body and the scanning terminal key diagram with the displacement of lens assembling body.
Figure 14 be expression the unit lenses assembly arranged differently and the signal terminal that consists of with lens assembling body and the scanning terminal key diagram with the displacement of lens assembling body.
Figure 15 is the concise and to the point vertical view that is illustrated in the example of the multiple mask pattern of formation on the photomask, and (a) the expression signal terminal (b) represents the scanning terminal example of light mask with the example of photomask.
Embodiment
Below, based on accompanying drawing embodiments of the present invention are described in detail.Fig. 1 is the front view of the embodiment of expression exposure device of the present invention, and Fig. 2 is the vertical view of Fig. 1.This exposure device can carry out the large-area exposure that is exposed the acyclic pattern on the body with high exploring power, and it possesses conveying mechanism 1, the first exposure optical unit 2, the second exposure optical unit 3.Need to prove, in the following description, narrate with the situation of substrate being exposed the thin film transistor (TFT) that body is display device (hereinafter referred to as " TFT ").
Fig. 3 is the TFT that uses among the present invention with the vertical view of substrate 4, and this TFT forms with the exposing patterns that specified period forms a plurality of signal wires and sweep trace in length and breadth across in viewing area 5 by other exposure device with substrate 4.In addition, the outside of viewing area 5 by this figure in the zone 6 that represents of dotted line be formed for a plurality of signal wires be connected the zone of the data side terminal that the data side driving circuit that arranges is connected, zone 7 be formed for a plurality of sweep traces be connected the zone of the scan-side terminal that the scan-side driving circuit of setting is connected.
Above-mentioned conveying mechanism 1 be the TFT that applied photoresist in the upper surface of stand 8 mounting with substrate 4 and with this TFT with substrate 4 to the mechanism that a direction (arrow A direction shown in Figure 1) is carried, such as by the travel mechanism that the combinations such as motor and gear are consisted of stand 8 being moved.Perhaps also can be mechanism as follows: possess the ejiction opening of gas on the surface of stand 8 and attract mouth, and so that the ejection power of gas and attractive force are balanced TFT is carried with the state that floats ormal weight at stand 8 with substrate 4.And, be provided with position transducer for detection of the displacement of stand 8 (omitting diagram) at conveying mechanism 1.
Above above-mentioned conveying mechanism 1, be provided with the first exposure optical unit 2.This first exposure optical unit 2 is the unit that the pattern of data side terminal exposed on the zone 6 of substrate 4 at TFT, and it possesses light supply apparatus 9, signal terminal with photomask 10, signal terminal usefulness lens assembling body 11, travel mechanism 12.
At this, above-mentioned light supply apparatus 9 is the devices that shine the directional light of the light source light with uniform Luminance Distribution to signal terminal described later with photomask 10, such as possessing the light source that is made of extra-high-pressure mercury vapour lamp or xenon lamp etc.; Make from for example light integraph of the illuminance distribution of the light source light of this light source radiation; Make light source light after the illuminance distribution become the collector lens of directional light.
In addition, be provided with signal terminal photomask 10 in the downstream of the light source light of radiating from above-mentioned light supply apparatus 9.As shown in Figure 4, the signal terminal that this signal terminal is formed with the shape identical with the data side terminal at transparent substrate surface with photomask 10 is with mask pattern 13, and this signal terminal with photomask 10 so that be formed with signal terminal and remain on the illustrated mask stand of omission with the mode that the face of mask pattern 13 becomes downside.Need to prove, signal terminal is classified as positive type and cloudy type with photomask 10 because of the kind of the photoresist that uses, describes in this situation to positive type.Therefore, signal terminal is formed by opaque film with mask pattern 13, makes the light transmission signal terminal exterior lateral area of mask pattern 13.
Between the stand 8 of above-mentioned signal terminal with photomask 10 and conveying mechanism 1, be provided with signal terminal lens assembling body 11.This signal terminal will be imaged onto on TFT usefulness substrate 4 surfaces at signal terminal that signal terminal forms with the photomask 10 times erect image such as grade with mask pattern 13 with lens assembling body 11, and form can by travel mechanism 12 described later with the signal terminal face parallel with photomask 10 and stand 8 in Fig. 2 the reverse direction (in Fig. 2, being the arrow B direction) of the substrate throughput direction shown in the arrow A mobile, as shown in Figure 5, this signal terminal has a plurality of signal terminals unit lenses assembly 11A with lens assembling body 11,11B, 11C is arranged in the structure of row in the direction of intersecting with above-mentioned moving direction (arrow B direction).
At this, above-mentioned signal terminal is with among unit lenses assembly 11A～11C, lens combination 15 is being formed a plurality of lens arrays 16 along the direction of intersecting with above-mentioned moving direction (arrow B direction) with fixing arrangement pitches arrangement with signal terminal in the parallel face of the face of photomask 10 and stand 8, this lens combination 15 consists of by configuring like that a plurality of convex lens (lenticule) 14a～14h at signal terminal on the normal direction of photomask 10 shown in Fig. 6 (b), as shown in Figure 5, this signal terminal with unit lenses assembly 11A～11C so that the mode that each lens combination 15 of each lens arrays 16 and the axes O-O that tilts to intersect with the moving direction (arrow B direction) of lens assembling body 11 with respect to signal terminal are arranged in parallel each lens arrays 16 is staggered fixed amount mutually and form on the direction of intersecting with the arrow B direction, and formation and above-mentioned axes O-O excise mutually adjacent end 11Aa abreast, 11Ba, 11Bb, the structure of 11Ca, and the lens combination 15 of each lens arrays 16 is configured at signal terminal with arranging with fixing arrangement pitches in the integral body of lens assembling body 11.
More specifically, shown in Fig. 6 (a), signal terminal is with among unit lenses assembly 11A～11C, with lens arrays 16 on the moving direction shown in the arrow B with spacing P
2(for example 150 μ m spacings) arrange three row, wherein, this lens arrays 16 by with respect to signal terminal with the direction of moving direction (arrow B direction) quadrature of lens assembling body 11 on a plurality of lens combination 15 with spacing P
1(for example 150 μ m spacings) are arranged and to be formed, and with the lens arrays 16 of the side in the mutual adjacent lens arrays 16 of the overlapping mode general of the part of each lens combination 15 of when above-mentioned moving direction (arrow B direction) is observed, making each lens arrays 16 at the stagger arrangement pitches P of a plurality of lens combination 15 of the orientation of lens combination 15
11/n (n is the integer more than 2, in Fig. 6, expression n=3) and arrange.
In addition, shown in Fig. 6 (b), each signal terminal consists of as follows with unit lenses assembly 11A～11C: will be on the table back side of transparent substrate 17 mutually corresponding and the first, second, third and the 4th lens arra 18a～18d that be formed with a plurality of convex lens 14 overlaps and engages with the consistent state of the optical axis of each convex lens 14 of correspondence, and signal terminal is imaged onto between the second lens arra 18b and the 3rd lens arra 18c with the signal terminal of the photomask 10 middle inverted image with mask pattern 13.In this case, consistent by mutual optical axis and eight convex lens 14a～14h that arrange consist of lens combination 15.
At this, the function of each convex lens 14 of lens combination 15 is described.At first, the front side convex lens 14a of first lens array 18a is the field lens of the effect on the face of the chief ray that plays the light that the makes incident rear side convex lens 14b that converges to first lens array 18a, thereby increases by the exposure light of signal terminal after with photomask 10 to the interior amount of being taken into of lens combination 15.In addition, the front side convex lens 14c of the rear side convex lens 14b of first lens array 18a and the second lens arra 18b is mutually cooperation and signal terminal is imaged onto between the second lens arra 18b and the 3rd lens arra 18c with the signal terminal of photomask 10 picture with mask pattern 13, thereby plays the imaging len of effect of the middle inverted image of generation signal terminal usefulness mask pattern 13.And the rear side convex lens 14d of the second lens arra 18b is the field lens that plays the effect parallel with optical axis of the chief ray of the light that makes incident.In addition, the front side convex lens 14e of the 3rd lens arra 18c is the field lens of the effect on the face of the chief ray that plays the light that the makes incident rear side convex lens 14f that converges to the 3rd lens arra 18c.And, the front side convex lens 14g of the rear side convex lens 14f of the 3rd lens arra 18c and the 4th lens arra 18d is mutually cooperation and make signal terminal be imaged onto TFT with on 4 of the substrates with middle the inverted image of mask pattern 13, thereby plays the imaging len of effect that the generation signal terminal is used the erect image of mask pattern 13.And the rear side convex lens 14h of the 4th lens arra 18d is the field lens that plays the effect parallel with optical axis of the chief ray of the light that makes incident.Thus, can scioptics group 15 signal terminal be imaged onto TFT with on substrate 4 surfaces with the signal terminal of photomask 10 with times erect image such as grade of mask pattern 13.
In addition, shown in Fig. 6 (b), each signal terminal is with among unit lenses assembly 11A～11C, approach with the surface of the front side convex lens 14e of the 3rd lens arra 18c and the first diaphragm 19 of the opening 20 with regulation shape is set, and will be limited in based on the exposure area that lens combination 15 obtains the central portion of lens.Thus, can get rid of lens aberration impact and with high resolution the signal terminal of signal terminal with photomask 10 exposed with mask pattern 13.
In this case, as shown in Figure 7, the opening 20 of the first diaphragm 19 forms the shape of its part being carried out shading as follows: under the overlooking with four bight 21a, 21b, 21c, 21d in the opening of rectangular shape, at signal terminal during with the observation of the moving direction (arrow B direction) of lens assembling body 11, the area of the part corresponding with the overlapping part (hereinafter referred to as " overlapping portion 22 ") of the part of the opening 20 of the opening 20 of the first diaphragm 19 and adjacent the first diaphragm 19 becomes half of entire area of overlapping portion 22.In the present embodiment, shown in Fig. 6 (a), the shape of the opening 20 of the first diaphragm 19 forms the hexagon that has the bight at the center line of lens arrays 16.Thus, the area of the part corresponding with above-mentioned overlapping portion 22 of the opening 20 of the first diaphragm 19 becomes half of entire area of overlapping portion 22, and the average exposure in the zone corresponding with overlapping portion 22 becomes half of the exposure that needs.Therefore, the zone corresponding with this overlapping portion 22 is by the exposure of the repeated exposure amount of being fixed of two lens combination 15 existing before and after signal terminal is upper with the moving direction (arrow B direction) of lens assembling body 11.Therefore, the zone corresponding with overlapping portion 22 can be by overexposure.
At this, with reference to Fig. 8, illustrate in greater detail signal terminal with the movement of lens assembling body 11 in the zone corresponding with above-mentioned overlapping portion 22 situation about being exposed.
Fig. 8 (a) is the vertical view that is illustrated in the lens combination 15 that signal terminal exists before and after upper with the moving direction (arrow B direction) of lens assembling body 11.In addition, Fig. 8 (b) be in the presentation graphs 8 (a) with overlapping portion 22 outside the key diagram of exposure of corresponding some O.In this case, some O is limited by the opening 20 of the first diaphragm 19, and from t
1Begin the exposure and at t
2Finish exposure.Thus, some O is at above-mentioned t
1～t
2During the light exposure of light quantity that is fixed, thereby be fixed the exposure of the degree of depth.
On the other hand, Fig. 8 (c) is the key diagram of the exposure of the expression point P corresponding with overlapping portion 22.In this case, some P is by the part restriction corresponding with overlapping portion 22 of the opening 20 of the first diaphragm 19, and from t
3Begin the exposure and at t
4Finish for the time being exposure, afterwards by the part restriction corresponding with overlapping portion 22 of the opening 20 of the first follow-up diaphragm 19, thereby from t
5Again begin the exposure and at t
6Finish exposure.Thus, some P is at above-mentioned t
3～t
4, t
5～t
6During the light exposure of light quantity that is fixed, thereby be fixed the exposure of the degree of depth.
In addition, Fig. 8 (d) is the key diagram of the exposure of the expression point Q corresponding with overlapping portion 22.In this case, some Q is by the part restriction corresponding with overlapping portion 22 of the opening 20 of the first diaphragm 19, thereby from t
7Begin the exposure and at t
8Temporary transient finish exposure, afterwards by the part restriction corresponding with overlapping portion 22 of the opening 20 of the first follow-up diaphragm 19, thereby from t
9Again begin exposure and finish exposure at t10.Thus, some Q is at above-mentioned t
7～t
8, t
9～t
10During the light exposure of light quantity that is fixed, thereby be fixed the exposure of the degree of depth.
Need to prove, the shape of the opening 20 of the first diaphragm 19 is not limited to above-mentioned hexagon, as long as so that the area of the part corresponding with overlapping portion 22 of opening 20 becomes half mode of the entire area of overlapping portion 22 is carried out shading to the part of opening 20 shape, such as also being as shown in Figure 9 the arbitrary shape such as trapezoidal shape.
In addition, shown in Fig. 6 (b), each signal terminal is with among unit lenses assembly 11A～11C, approach with the surface of the convex lens 14g of the direct of travel upstream side of the light of the 4th lens arra 18d and the second diaphragm 38 that has with the opening of elliptical shape corresponding to the opening 20 of the first diaphragm 19 is set, come the beam diameter of the light of restricted passage lens combination 15.
And, each signal terminal with unit lenses assembly 11A～11C to carrying out shading around the front side convex lens 14a of first lens array 18a, and so that the lens that in Fig. 6 (a), clipped by two dotted lines form on the extra-regional part by this figure in the width w of this direction in zone before and after the moving direction (direction opposite with arrow A) shown in the arrow B
1At least form the width W of the arrow A direction in zone with mask pattern 13 with the signal terminal of photomask 10 with signal terminal
1The mode that (with reference to Fig. 4) is identical forms.Thus, can the light complete shading of photomask 10 will be used by signal terminal before signal terminal is with the mobile beginning of lens assembling body 11 and behind the mobile end.
So that the mode that above-mentioned signal terminal can move with lens assembling body 11 arranges travel mechanism 12.This travel mechanism 12 be make signal terminal with lens assembling body 11 with the signal terminal face parallel with photomask 10 and stand 8 in the arrow B direction moves in Fig. 1 mechanism, such as being electromagnetic actuators or electronic stand etc.
Above above-mentioned stand 8 and at the first substrate throughput direction front side that exposes optical unit 2, be provided with the second exposure optical unit 3.This second exposure optical unit 3 is the unit that the pattern of scan-side terminal exposed on the zone 7 of substrate 4 at TFT, possesses light supply apparatus 23, scanning terminal with light mask 24, scanning terminal lens assembling body 25, travel mechanism 26.
At this, above-mentioned light supply apparatus 23 is the devices that shine the directional light of the light source light with uniform Luminance Distribution to scanning terminal described later with light mask 24, the light supply apparatus 9 of itself and the first exposure optical unit 2 is same, such as possessing: the light source that is made of extra-high-pressure mercury vapour lamp or xenon lamp etc.; Make from for example light integraph of the illuminance distribution of the light source light of this light source radiation; Make the light source light of illuminance distribution become the collector lens of directional light.
In addition, be provided with scanning terminal light mask 24 in the downstream of the light source light of radiating from above-mentioned light supply apparatus 23.As shown in figure 10, this scanning terminal is to be formed with and the member of the identical shaped scanning terminal of scan-side terminal with mask pattern 27 at transparent substrate surface with light mask 24, and this scanning terminal makes to be formed with light mask 24 and scans terminal and become downside with the face of mask pattern 27 and remain on the illustrated mask stand of omission.Need to prove, the scanning terminal is same with mask pattern 13 with light mask 24 and signal terminal, is categorized as positive type and cloudy type according to the kind of the photoresist that uses, but describes in this situation to positive type.Therefore, the scanning terminal is formed by opaque film with mask pattern 27, makes the light transmission scanning terminal exterior lateral area of mask pattern 27.
Between the stand 8 of above-mentioned scanning terminal with light mask 24 and conveying mechanism 1, be provided with scanning terminal lens assembling body 25.This scanning terminal is to make the scanning terminal that forms with light mask 24 at the scanning terminal be imaged onto TFT usefulness substrate 4 lip-deep assemblies with times erect image such as grade of mask pattern 27 with lens assembling body 25, form can by travel mechanism 26 described later with the scanning terminal face parallel with light mask 24 and stand 8 in to Fig. 2 in direction (in Fig. 2, the being the arrow C direction) movement that intersects of the substrate throughput direction shown in the arrow A, and arrange a row ground in the direction of intersecting with above-mentioned moving direction (arrow C direction) and have a plurality of scanning terminals with unit lenses assembly 25A, 25B, 25C (with reference to Fig. 2), at these a plurality of scanning terminals unit lenses assembly 25A, 25B, among the 25C, lens combination 29 is being formed a plurality of lens arrays 30 along the direction of intersecting with above-mentioned moving direction (arrow C direction) with fixing arrangement pitches arrangement with the scanning terminal in the parallel face of the face of light mask 24 and stand 8, and this lens combination 29 is by configuring like that a plurality of convex lens (lenticule) 28a～28h on the normal direction of light mask 24 and consist of scanning terminal shown in Figure 11 (b).
And, same with lens assembling body 11 with signal terminal shown in Figure 5, each scans terminal with unit lenses assembly 25A～25C so that the mode that each lens combination 29 of each lens arrays 30 and the axis that intersects with the inclination of the moving direction (arrow C direction) of lens assembling body 25 with respect to the scanning terminal are arranged in parallel mutually staggers fixed amount with each lens arrays 30 and forms on the direction of intersecting with arrow C, and formation and above-mentioned axis excise mutually adjacent end 25Aa abreast, 25Ba and 25Bb, the structure of 25Ca (with reference to Fig. 2), and the lens combination 29 of each lens arrays 30 is configured to scanning terminal arranging with fixing arrangement pitches on the whole with lens assembling body 25.
More specifically, shown in Figure 11 (a), at the above-mentioned terminal that respectively scans with among lens assembling body 25A～25C, with lens arrays 30 on the moving direction shown in the arrow C with spacing P
4(for example 150 μ m spacings) arrange three row, this lens arrays 30 by on the direction of intersecting with the moving direction (the arrow C direction shown in Figure 11 (a)) of lens assembling body 25 with respect to the scanning terminal with a plurality of lens combination 29 with spacing P
3(for example 150 μ m spacings) are arranged and are formed, and when above-mentioned moving direction (arrow C direction) is observed, so that the lens arrays 30 of the side in will be the mutually adjacent lens arrays 30 of the overlapping mode of the part of each lens combination 29 of each lens arrays 30 the orientation of lens combination 29 stagger a plurality of lens combination 29 arrangement pitches P3 1/m (m is the integer more than 2, represents m=3 among Figure 10) and arrange.
In addition, shown in Figure 11 (b), each scans terminal and constitutes with lens assembling body 25A～25C, will be on the table back side of transparent substrate mutually corresponding and the first, second, third and the 4th lens arra 31a～31d that be formed with a plurality of convex lens 28 overlaps and engages with the consistent state of the optical axis of each convex lens 28 of correspondence, and will scan terminal and be imaged onto between the second lens arra 31b and the 3rd lens arra 31c with the scanning terminal of the light mask 24 middle inverted image with mask pattern 27.In this case, eight convex lens 28a～28h that as one man arranged by mutual optical axis consist of lens combination 29.Need to prove, the scanning terminal is identical with the structure of unit lenses assembly 11A～11C with the signal terminal of the first exposure optical unit 2 with the structure of lens assembling body 25, therefore in the explanation of the function of the concrete structure of this omission lens combination 29 and each convex lens 28.In addition, in Figure 11, symbol 32 expressions the first diaphragm, the opening of symbol 33 expressions the first diaphragm 32, symbol 34 expressions the second diaphragm.
And, each scan terminal with lens assembling body 25A～25C to carrying out shading around the front side convex lens 28a of first lens array 31a, and so that the lens that in Figure 11 (a), clipped by two dotted lines form on the extra-regional part by this figure in the width w of this direction in zone before and after the moving direction shown in the arrow C
2At least form the width W of direction regional and the arrow A quadrature with mask pattern 27 with the scanning terminal of light mask 24 with the scanning terminal
2The mode that (with reference to Figure 10) is identical forms.Thus, can use by the scanning terminal light complete shading of light mask 24 before the scanning terminal is with the mobile beginning of lens assembling body 25 and behind the mobile end.
So that the mode that above-mentioned scanning terminal can move with lens assembling body 25 arranges travel mechanism 26.This travel mechanism 26 makes the scanning terminal with lens assembling body 25 mechanism that the arrow C direction moves in Fig. 2 in the face parallel with light mask 24 and stand 8 with scanning terminal, such as being electromagnetic actuators or electronic stand etc.
Then, the action of the exposure device of such formation described.
At first, the assembling adjusting gear of the lens assembling body by other setting is assembled adjustment so that the face of constituent parts lens assembling body becomes parallel mode with respect to real estate in permissible value.With reference to Figure 12 concrete adjustment is described.At this, the assembling adjustment with lens assembling body 11 describes to signal terminal, adjusts with the assembling of lens assembling body 25 for the scanning terminal, also can carry out equally, and therefore description thereof is omitted.
At first, with a plurality of reference mark 35a, 35b ... with fixing arrangement pitches P (P
1Integral multiple) arrange in line and on the reference substrate 36 that forms the arranged opposite signal terminal with lens assembling body 11.Then, make a video recording with the 15 couples of reference mark 35a of any lens combination among the unit lenses assembly 11A via signal terminal by microscope 37, and signal terminal is mobile in surface level with lens assembling body 11, thereby reference mark 35a is positioned the center, the visual field of microscope 37.Then, make microscope 37 move horizontally the size P identical with the arrangement pitches P of said reference mark 35a, 35b in the orientation of reference mark 35a, 35b, and observe second reference mark 35b via signal terminal with the lens combination 15 of unit lenses assembly 11B.Then, in the mode at the center, the visual field that above-mentioned second reference mark 35b is positioned microscope 37 signal terminal is moved to for example arrow D direction shown in Figure 12 with unit lenses assembly 11B, be fixed afterwards.Below,, adjust too with unit lenses assembly 11C for signal terminal.Thus, with signal terminal with each lens combination 15 of lens assembling body 11 with Fig. 5 on the direction of intersecting of the moving direction shown in the arrow B with arrangement pitches P
1Be arranged in a linearity.
The above-mentioned signal terminal of assembling like that after the adjustment is set in respectively the first exposure optical unit 2 and second with lens assembling body 11 and scanning terminal with lens assembling body 25 to expose on the optical unit 3.Thus, the preparation that exposes.
Then, the TFT of exposing patterns that will be pre-formed by other exposure device signal wire and sweep trace in viewing area 5 is with substrate 4 location and be positioned in assigned position on the stand 8, drive afterwards conveying mechanism 1 stand 8 is moved with fixed speed to the arrow A direction of Fig. 1, TFT is carried to this direction with substrate 4.At this moment, first and second exposure optical unit 2,3 light source are lit.
Then, detect and set in advance at TFT with the illustrated reference mark of omission on the substrate 4 by leaving the illustrated image mechanism of omission that fixed range arranges at substrate throughput direction opposition side with respect to the first exposure optical unit 2, and the displacement of instrumentation stand 8 is come in the position of the above-mentioned stand 8 of inscribing during take the detection of this reference mark by position transducer as benchmark.Then, make TFT form signal terminals that zone 6 arrives the first exposure optical unit 2 with under the photomask 10 time with the data side terminal of substrate 4 when stand 8 is moved predefined distance, stop the movement of stand 8.
Then, drive the travel mechanism 12 of the first exposure optical unit 2, make signal terminal with the mobile beginning of arrow B direction in Fig. 1 of lens assembling body 11, by to this direction continuously mobile a plurality of lens combination 15 (with reference to Fig. 5) will signal terminal shown in Figure 4 project on 4 of the TFT usefulness substrates with times erect image such as grade of mask pattern 13 with the signal terminal of photomask 10, form on regional 6 with the data side terminal of substrate 4 thereby the exposing patterns of data side terminal is formed on TFT.
At this moment, as shown in Figure 7, in by the exposure area of opening 20 restrictions of the first diaphragm 19 of lens combination 15 zone corresponding with overlapping portion 22 by this figure at the signal terminal shown in the arrow B with two lens combination 15 repeated exposure that exist before and after on the moving direction of lens assembling body 11.Thus, the exposing patterns of data side terminal can not interrupt halfway and link to each other continuously.In this case, half the mode that the part corresponding with overlapping portion 22 becomes the whole area of overlapping portion 22 with area in the opening 20 of the first diaphragm 19 forms, therefore be fixed the exposure of the degree of depth by the repeated exposure of above-mentioned two lens combination 15, thus can overexposure.
When making signal terminal move predetermined distance with lens assembling body 11 when TFT forms zone 6 and forms signal terminals with the whole exposing patterns of mask patterns 13 with the data side terminal of substrate 4, stop travel mechanism 12 and make stand 8 begin to move, and again begin the conveying that TFT uses substrate 4.
And, make TFT form scanning terminals that zone 7 arrives the second exposure optical unit 3 with under the light mask 24 time with the scan-side terminal of substrate 4 when making TFT move fixed range with substrate 4, stop the movement of stand 8.
Then, drive the travel mechanism 26 of the second exposure optical unit 3, make the scanning terminal with the mobile beginning of arrow C direction in Fig. 2 of lens assembling body 25, by to this direction continuously mobile a plurality of lens combination 29 (with reference to Figure 11) will scanning terminal shown in Figure 10 project on 4 of the TFT usefulness substrates with times erect image such as grade of mask pattern 27 with the scanning terminal of light mask 24, form on regional 7 with the scan-side terminal of substrate 4 thereby the exposing patterns of scan-side terminal is formed on TFT.
At this moment, the zone corresponding with the overlapping portion is same with the situation of lens assembling body 11 with the signal terminal of the first exposure optical unit 2 shown in Figure 7 in the exposure area by opening 33 restrictions of the first diaphragm 32 of lens combination 29, by among Figure 11 in two lens combination 29 repeated exposure of the scanning terminal shown in the arrow C with existence before and after on the moving direction of lens assembling body 25.Thus, the exposing patterns of scan-side terminal can not interrupt midway and link to each other continuously.In this case, part corresponding with the overlapping portion in the opening 33 of the first diaphragm 32 is same with the first diaphragm 19 of the first exposure optical unit 2, half the mode that becomes the whole area of overlapping portion with this area forms, therefore be fixed the exposure of the degree of depth by the repeated exposure of above-mentioned two lens combination 29, thus can overexposure.
Then, form zone 7 at TFT with the scan-side terminal of substrate 4 when making the scanning terminal move fixed range with lens assembling body 25 and form when scanning terminals and using the whole exposing patterns of mask pattern 27, stop travel mechanism 26 and TFT is all finished with the exposure of substrate 4.Afterwards, again begin the movement of stand 8 and TFT discharged to the outside with substrate 4.
In the present invention, therefore signal terminal has respectively with lens assembling body 25 with lens assembling body 11 and scanning terminal a plurality of signal terminals is arranged in row and the structure of configuration with unit lenses assembly 11A～11C, scanning terminal with unit lenses assembly 25A～25C, and each lens assembling body 11 shown in Figure 13,25 displacement L1 become the width W of signal terminal being used the regional arrow B direction of mask pattern 13 formation with the signal terminal of photomask 10
1With signal terminal form with the lens of lens assembling body 11 zone the arrow B direction the width addition distance and will scan terminal forms regional arrow C direction with mask pattern 27 with the scanning terminal of light mask 24 width W
2Form the distance of the width addition of regional arrow C direction with the lens of lens assembling body 25 with the scanning terminal.
On the other hand, signal terminal with lens assembling body 11 and scanning terminal with lens assembling body 25 also can have respectively with a plurality of signal terminals with unit lenses assembly 11A～11C, scan that terminal is arranged with unit lenses assembly 25A～25C differently and the structure that configures.In this case, each lens assembling body 11 shown in Figure 14,25 displacement L2 become the width W that signal terminal is formed the arrow B direction in zone with the signal terminal of photomask 10 with mask pattern 13
1With signal terminal form with the lens of unit lenses assembly 11B with unit lenses assembly 11A and signal terminal the zone the arrow B direction the width addition distance and will scan terminal forms regional arrow C direction with mask pattern 27 with the scanning terminal of light mask 24 width W
2Form the distance of the width addition of regional arrow C direction with the lens of unit lenses assembly 25B with unit lenses assembly 25A and scanning terminal with the scanning terminal, thereby than lens assembling body 11 of the present invention, 25 displacement L
1Large (L
1＜L
2).
In the above description, narrate the situation that forms a mask pattern at a photomask, but the invention is not restricted to this, as shown in figure 15, also can form multiple mask pattern at a photomask.In this case, move to select desirable mask pattern to the direction identical with the moving direction of the lens assembling body of photomask.Need to prove, Figure 15 (a) expression signal terminal represents scanning terminal light mask 24 with photomask 10, Figure 15 (b).
In addition, in the above-described embodiment, illustrated that TFT forms the situation of the exposing patterns of a plurality of signal wires and sweep trace in length and breadth across by other exposure device with substrate 4 in viewing area 5, but the present invention is not limited to this, can also possess at the opposition side of substrate throughput direction to leave fixed range with respect to the first exposure optical unit 2 and be used for exposing patterns with above-mentioned signal wire and sweep trace and be formed on TFT with the exposure of the 3rd on the substrate 4 optical unit.In this case, above-mentioned the 3rd exposure optical unit preferably constitutes, on the photomask that the one side of transparency carrier forms, successively form electrode wiring or signal wire and such two the mask pattern groups that require two kinds of different mask patterns of exploring power to consist of of sweep trace by thin film transistor (TFT) on the throughput direction of substrate 4 at TFT, on another side, configure with the mode of substrate 4 sides and be formed with lenticular photomask so that the lenticule side becomes TFT, the mask pattern of the electrode wiring that requires the high thin film transistor (TFT) of exploring power in this lenticule two kinds of mask patterns different from requiring exploring power corresponding and with this mask pattern reduced projection to TFT with on the substrate 4, and to this photomask with regular time interval radiation source light off and on, thereby along the arrow A direction of Fig. 1 with the TFT of fixed speed in conveying with exposing with two kinds of mask patterns of fixed cycle to above-mentioned photomask on the substrate 4.
The concrete structure example of photomask preferably constitutes as used herein, the mask pattern group that is consisted of with mask pattern by the electrode wiring that requires the high thin film transistor (TFT) of exploring power possess with TFT with the throughput direction (arrow A direction) of substrate 4 roughly the direction of quadrature will above-mentioned a plurality of mask patterns arrange a plurality of mask patterns that form in line with prescribed distance and be listed as, by can be additional by a plurality of exposing patterns that formed by follow-up mask pattern row between a plurality of exposing patterns that form with the aforementioned mask pattern row of the throughput direction front side of substrate 4 at TFT, and follow-up mask pattern be listed in and staggers fixed measure each other in the orientation of above-mentioned a plurality of mask patterns and form.
And, in the above-described embodiment, the situation that TFT substrate 4 is exposed has been described, but section of the present invention is confined to this when a direction moves, TFT substrate 4 staged in two dimensional surface is moved and expose.
And in the above description, having narrated and being exposed body is TFT with the situation of substrate 4, but the present invention is not limited to this, is exposed body so long as will form the member of acyclic pattern and get final product, and can be member arbitrarily.
Symbol description:
The 4TFT substrate
8 stands
10 signal terminal photomasks
11 signal terminal lens assembling bodies
11A～11C signal terminal unit lenses assembly
11Aa, 11Ba, 11Bb, the 11Ca signal terminal adjacent end portion of unit lenses assembly
13 signal terminal mask patterns
14,14a～14h, 28,28a～28h convex lens
15,29 lens combination
16,30 lens arrays
17a, 31a first lens array
17b, 31b the second lens arra
17c, 31c the 3rd lens arra
17d, 31d the 4th lens arra
19,32 first diaphragms
20,33 openings
22 overlapping portions (with the part of the superposition of end gap of adjacent the first diaphragm)
23,34 second diaphragms
24 scanning terminal light masks
25 scanning terminal lens assembling bodies
25A～25C scanning terminal unit lenses assembly
25Aa, 15Ba, 15Bb, the 25Ca scanning terminal adjacent end portion of unit lenses assembly
27 scanning terminal mask patterns
Claims (7)
1. an exposure device is characterized in that,
Possesses lens assembling body, this lens assembling body forms and can be exposed the stand of body and be formed with between the photomask of mask pattern and mobile in the face parallel with the face of the described face that is exposed body and described photomask in mounting, and, this lens assembling body has a plurality of unit lenses assemblies that are arranged in row in the direction of intersecting with described moving direction, described a plurality of unit lenses assembly is arranged a plurality of lens combination and is formed a plurality of lens arrays with fixing arrangement pitches on the direction of intersecting with described moving direction, described a plurality of lens combination constitutes and times erect image such as grade of the mask pattern of described photomask can be imaged onto described being exposed on the surface
Each described unit lenses assembly so that the mode that each lens combination of each described lens arrays and the axis that tilts to intersect with respect to the moving direction of described lens assembling body are arranged in parallel each described lens arrays is staggered fixed amount mutually and form on the direction of intersecting with described moving direction, and each described unit lenses assembly forms the structure of excising abreast mutually adjacent end with described axis, and the lens combination of each described lens arrays is configured to arranging with fixing arrangement pitches on the whole at described lens assembling body.
2. exposure device according to claim 1 is characterized in that,
In each described unit lenses assembly, in the overlapping mode of a part of each described lens combination when the moving direction of described lens assembling body is observed each lens arrays is staggered mutually on the direction of intersecting with described moving direction.
3. exposure device according to claim 1 is characterized in that,
Each described unit lenses assembly constitutes, make on the table back side of transparent substrate mutually correspondingly and the first, second, third and the 4th lens arra that be formed with a plurality of convex lens overlaps in the consistent mode of the optical axis of each convex lens of correspondence, and the middle inverted image of the mask pattern of described photomask is imaged onto between described the second lens arra and described the 3rd lens arra.
4. exposure device according to claim 3 is characterized in that,
In each described unit lenses assembly, approach with the surface of the convex lens of the direct of travel upstream side that is positioned at light of described the 3rd lens arra and the first diaphragm of the opening with regulation shape is set, thereby will be limited in based on the exposure area that lens combination obtains the central portion of lens.
5. exposure device according to claim 4 is characterized in that,
The opening of described the first diaphragm forms the shape of its part being carried out shading as follows, namely, in overlooking the opening of lower rectangular shape, when the moving direction of described lens assembling body was observed, the area of the part that the part of the opening of the opening of described the first diaphragm and adjacent the first diaphragm is overlapping became half of area of described overlapping part integral body.
6. exposure device according to claim 3 is characterized in that,
In each described unit lenses assembly, approach with the lens surface of the direct of travel upstream side that is positioned at light of described the 4th lens arra and the second diaphragm of confine optical beam diameter is set.
7. each described exposure device is characterized in that according to claim 1～6,
Described stand can be carried the described body that is exposed to a direction,
Described lens assembling body is mobile under the state that the movement of described stand temporarily stops.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-145865 | 2010-06-28 | ||
| JP2010145865A JP5354803B2 (en) | 2010-06-28 | 2010-06-28 | Exposure equipment |
| PCT/JP2011/063061 WO2012002114A1 (en) | 2010-06-28 | 2011-06-07 | Exposure system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102959470A true CN102959470A (en) | 2013-03-06 |
| CN102959470B CN102959470B (en) | 2015-09-23 |
Family
ID=45401844
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180031708.8A Expired - Fee Related CN102959470B (en) | 2010-06-28 | 2011-06-07 | Exposure device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5354803B2 (en) |
| KR (1) | KR101787155B1 (en) |
| CN (1) | CN102959470B (en) |
| TW (1) | TWI519900B (en) |
| WO (1) | WO2012002114A1 (en) |
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| CN105637422A (en) * | 2013-08-16 | 2016-06-01 | Asml荷兰有限公司 | Lithographic apparatus, programmable patterning device and lithographic method |
| CN110945430A (en) * | 2017-07-25 | 2020-03-31 | 凸版印刷株式会社 | Exposure apparatus and exposure method |
| WO2021035714A1 (en) * | 2019-08-30 | 2021-03-04 | 京东方科技集团股份有限公司 | Texture image acquisition device, display device, and collimation component |
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| JP5515120B2 (en) | 2010-10-29 | 2014-06-11 | 株式会社ブイ・テクノロジー | Scan exposure equipment using microlens array |
| JP5470236B2 (en) * | 2010-12-22 | 2014-04-16 | 東京エレクトロン株式会社 | Local exposure method and local exposure apparatus |
| JP6286813B2 (en) * | 2012-03-26 | 2018-03-07 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
| WO2015179547A2 (en) | 2014-05-21 | 2015-11-26 | New York University | Oxopiperazine helix mimetics for control of hypoxia-inducible gene expression |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN102959470B (en) | 2015-09-23 |
| TWI519900B (en) | 2016-02-01 |
| JP5354803B2 (en) | 2013-11-27 |
| KR20130098989A (en) | 2013-09-05 |
| WO2012002114A1 (en) | 2012-01-05 |
| TW201219988A (en) | 2012-05-16 |
| KR101787155B1 (en) | 2017-10-18 |
| JP2012008427A (en) | 2012-01-12 |
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