CN102955373A - Approaching exposure apparatus and approaching type exposure method - Google Patents
Approaching exposure apparatus and approaching type exposure method Download PDFInfo
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- CN102955373A CN102955373A CN2012102852469A CN201210285246A CN102955373A CN 102955373 A CN102955373 A CN 102955373A CN 2012102852469 A CN2012102852469 A CN 2012102852469A CN 201210285246 A CN201210285246 A CN 201210285246A CN 102955373 A CN102955373 A CN 102955373A
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Abstract
The invention relates to an approaching type exposure apparatus and an exposure method which can correct the bending of the mask and keep the mask with a simple structure, thereby carrying out exposure duplication with a high precision. The mask-carrying table (1) comprises a mask-holding rack (26) which attaches the mask (M) in a vacuum manner and keeps the mask at the lower surface thereof, a glass covering sheet (32) kept to the upper surface side of the mask-holding rack (26), a suction mechanism (40) that sucks the air in the space (33) defined by the mask-holding rack (26), the mask (M) and the glass covering sheet (32), thereby reducing the pressure inside the space (33), and at least one air lead-in groove (35) that provides air to the interior of the space from the outside. Under the state of attaching the mask (M) in a vacuum manner and keeping the mask to the lower surface of the mask-holding rack (26) and sucking the pressure inside the space (33) via the suction mechanism (40), the air lead-in groove (35) is used for providing air to the space (33) from outside, thereby adjusting the air inside the space (33) to the regulated pressure.
Description
Technical field
The present invention relates to a kind of proximity printing device and proximity printing method, more specifically, relate to and be suitable for employed proximity printing device and proximity printing method when the pattern exposure with mask is replicated on the substrate of large-sized panel display devices such as liquid crystal display and plasma display etc.
Background technology
Proximity printing is that the light-transmitting substrate (being exposed part) that will be coated with emulsion on the surface remains on the worktable of exposure device, and make this substrate close to the mask on the mask holder that remains on the mask mounting table, make both for example tens of μ m～hundreds of μ m that are spaced apart, pass through irradiation unit, from the side direction mask irradiation exposure light opposite with substrate of mask, the pattern exposure that will be plotted on the mask thus is replicated on the substrate.
In addition, although exist in the proximity printing mask made the size identical with substrate and the mode of disposable exposure, but under this mode, when the pattern exposure with mask is replicated on the large substrate, mask is tending towards maximizing, and will cause in the deflection of mask the aspects such as the impact of the precision of pattern and cost are gone wrong.Owing to such reason, up to now, under the pattern exposure with mask is replicated in situation on the large substrate, adopt sometimes so-called step-type proximity printing mode, namely, the mask that use is less than substrate makes worktable move with respect to the mask stepping, in each step, with mask configuration under the state near substrate, the irradiation pattern exposure light thus, is replicated in a plurality of pattern exposures that are plotted on the mask on the substrate.
The deflection of mask has very large impact to exposure accuracy, and particularly aspect large-scale mask, the deflection of mask has the trend of increase, therefore preferably does one's utmost to reduce deflection.Up to now, mask holding device as the mask correction deflection, known have, by the mask absorption road that forms on the mask holder mask absorption is kept, and, the space that mask, mask holder and loam cake are consisted of is connected with air suction path and air importing path, regulate the pressure that the pressure of this interior volume balances each other to the deadweight with mask, thereby make mask to the direction deflection opposite with gravity direction, offset the device (for example, with reference to patent documentation 1) of the deadweight deflection of mask.In addition, following exposure device is also disclosed: mask, transparent panel and the frame body space that surrounds and the gas outlet that is connected in exhaust apparatus and the ingress pipe that is connected in the air gatherer are connected, import with the Bas Discharged of this interior volume or with air, thereby the deflection of mask correction (for example, referring to Patent Document 2).In addition, also have the transparency glass plate fixed configurations in the framework of the vacuum suction framework of vacuum suction mask, by the air between vacuum draw transparency glass plate and the mask, by vacuum suction framework and transparency glass plate with the mask vacuum suction, improve the confining force of mask, thereby prevent the device (for example, with reference to patent documentation 3) of the changing of the relative positions of mask.
Patent documentation 1: TOHKEMY 2009-277900 communique
Patent documentation 2: Japanese kokai publication hei 8-82919 communique
Patent documentation 3: TOHKEMY 2006-93604 communique
Summary of the invention
The problem that invention will solve
But according to patent documentation 1, air that path supplies with supplies to the air suction path via the composition surface of mask holder and mask and mask adsorbs path because import from air, so can only supply with few air from the composition surface.Therefore, loam cake and mask are very fast to the inner side deflection of mask holder, mask and on be stamped the possibility of losing.In addition, in the patent documentation 2, because the ingress pipe that will be connected in the gas outlet of exhaust apparatus and be connected in the air gatherer is connected with the space, by with Bas Discharged or import the pressure of controlling interior volume, so the vacuum generating device periphery needs a lot of control device.In addition, owing to using rubber blanket that mask is installed on the frame body, cost might uprise.And according to patent documentation 3, owing to not importing the mechanism of air from the outside, the interior volume negative pressure surplus that becomes might be damaged mask and transparency glass plate.
The present invention proposes in view of above-mentioned problem, its purpose is, a kind of proximity printing device and proximity printing method are provided, and it can be revised the deflection of mask and with the mask maintenance, copy thereby can expose with high precision with fairly simple structure.
Solve the means of problem
Reach above-mentioned purpose of the present invention by following structure.
(1) a kind of proximity printing device, it has:
Substrate-placing platform, it keeps as the substrate that is exposed part;
The mask mounting table, its maintenance has the mask of answering exposing patterns; And
Illumination unit, its by aforementioned mask to aforesaid substrate irradiation pattern exposure light,
This proximity printing device aforementioned mask and aforesaid substrate approach and state with the exposing clearance subtend configuration of regulation under, the pattern exposure of aforementioned mask is replicated on the aforesaid substrate,
It is characterized in that, the aforementioned mask mounting table has:
Mask holder, it also keeps the aforementioned mask vacuum suction at lower surface;
Cover glass, it is maintained at upper surface one side of aforementioned mask retainer;
Aspirating mechanism, the air of the interior volume that its suction is defined by aforementioned mask retainer, aforementioned mask and above-mentioned cover glass at least makes this interior volume decompression; And
Air imports path, and it is from the outside to the above-mentioned interior volume air supply that is depressurized, and has one at least.
(2) according to above-mentioned (1) described proximity printing device, it is characterized in that,
It is the air lead-in groove that is disposed at the junction surface of above-mentioned cover glass and aforementioned mask retainer that above-mentioned air imports path.
(3) according to above-mentioned (1) or (2) described proximity printing device, it is characterized in that, the aforementioned mask mounting table also has mask frame, and it is with aforementioned mask retainer vacuum suction and remain on lower surface, and is driven by the mask drive division.
(4) according to above-mentioned (3) described proximity printing device, it is characterized in that,
The upper surface of aforementioned mask retainer has jut or recess,
The lower surface of aforementioned mask framework has recess or jut,
The above-mentioned jut of aforementioned mask retainer or recess engage with above-mentioned recess or the jut of aforementioned mask framework, the aforementioned mask retainer are remained on the lower surface of aforementioned mask framework.
(5) according to above-mentioned (3) or (4) described proximity printing device, it is characterized in that, the aforementioned mask framework also has the mask holder supporting device, and its supporting aforementioned mask retainer prevents that the aforementioned mask retainer from coming off from the aforementioned mask framework.
(6) according to the described proximity printing device of any one in above-mentioned (1)～(3), it is characterized in that,
The aforementioned mask retainer has maintaining body, and it remains on above-mentioned cover glass the position of the regulation of aforementioned mask retainer.
(7) according to (6) described proximity printing device, it is characterized in that,
The aforementioned mask retainer selects its superficial density to be higher than the member of the superficial density of mask M.
(8) according to above-mentioned (1) described proximity printing device, it is characterized in that,
The aforementioned mask mounting table has mask frame, and its lower surface is equipped with the aforementioned mask retainer, and with above-mentioned cover glass vacuum suction and remain on lower surface,
Above-mentioned space is defined by aforementioned mask framework, aforementioned mask retainer, aforementioned mask and above-mentioned cover glass,
It is the air lead-in groove that is configured in the junction surface of aforementioned mask framework and mask holder that above-mentioned air imports path.
(9) according to above-mentioned (8) described proximity printing device, it is characterized in that,
Above-mentioned air imports channel setting at the central portion of mask holder.
(10) a kind of proximity printing method,
It utilizes the described proximity printing device of any one in above-mentioned (1)～(9), under the state that aforementioned mask and aforesaid substrate approach and configure with the exposing clearance subtend of regulation, the pattern exposure of aforementioned mask is replicated on the aforesaid substrate,
It is characterized in that, it has:
With the lower surface of aforementioned mask vacuum suction at the aforementioned mask retainer, and the operation that mask is kept; And
When aspirating the pressure of above-mentioned interior volume by above-mentioned aspirating mechanism, import path via above-mentioned air and supply with the air of said external to above-mentioned space, thereby the pressure of above-mentioned interior volume is adjusted to the operation of the pressure of regulation.
The invention effect
According to proximity printing device of the present invention and proximity printing method, the mask mounting table has: mask holder, and it also keeps the mask vacuum suction at lower surface; Cover glass, it is maintained at upper surface one side of mask holder; Aspirating mechanism, the air of the interior volume that its suction is defined by mask holder, mask and cover glass at least makes this interior volume decompression; And air imports path, and it is from the outside to the interior volume air supply that is depressurized, and has one at least.And, with the lower surface of mask vacuum suction at mask holder, and mask kept, in addition, in the pressure by aspirating mechanism suction space inside, import path via air and supply with outside air to the space, thereby the pressure of interior volume is adjusted to the pressure of regulation.Therefore, the mask mounting table can be revised the deflection of mask and mask is kept with fairly simple structure, thereby can be replicated on the substrate with the pattern exposure of high precision with mask.
Description of drawings
Fig. 1 is the broken section front view for the proximity printing device that first embodiment of the invention is described.
Fig. 2 is the cross-sectional schematic of the brief configuration of mask mounting table shown in Figure 1.
Fig. 3 is that mask frame is with the cut-open view of short span with the mask mounting table of mask holder maintenance.
Fig. 4 is the decomposition cross-sectional schematic of mask mounting table shown in Figure 2.
Fig. 5 is the 1st variation of the proximity printing device of the 1st embodiment, is the cross-sectional schematic of the major part of the mask mounting table of the jut fastening state of the recess of mask frame and mask maintaining part.
Fig. 6 is the 2nd variation of the proximity printing device of the 1st embodiment, is the mechanism explanation schematic diagram of mask holder supporting device.
Fig. 7 (a) is the amplification view of major part of mask mounting table of the 3rd variation of the 1st embodiment, (b) is the major part amplification view of the mask mounting table of the 4th variation.
Fig. 8 (a) is the cross-sectional schematic of the brief configuration of the mask mounting table of the present invention's the 2nd embodiment, (b) is the cross-sectional schematic of the air lead-in groove of the joint portion that is formed at mask frame and mask holder.
Fig. 9 is the cut-open view suitable with Fig. 8 (a) of the brief configuration of the mask mounting table of the variation of expression the 2nd embodiment.
Symbol description
M: mask
PE: proximity printing device
W: substrate
1: the mask mounting table
2: worktable (substrate-placing platform)
3: illumination unit
25: mask frame
25a: recess
26: mask holder
26a: jut
32: cover glass
33: the space
35: air lead-in groove (air importing path)
40: aspirating mechanism
60: the mask holder supporting device
70: maintaining body
73: glass casting die (maintaining body)
74: filler (maintaining body)
Embodiment
Below, be elaborated based on accompanying drawing each embodiment to proximity printing device of the present invention.
(the 1st embodiment)
Fig. 1 is the broken section front view of the proximity printing device of first embodiment of the invention.As shown in Figure 1, proximity printing device PE adopts and is compared to the little mask M of substrate W that is exposed part, mask M is kept by mask mounting table 1, and substrate W is kept by worktable 2, mask M and substrate W are approached and the gap subtend configuration to stipulate, under this state, from illumination unit 3 to mask M irradiation pattern exposure light, the pattern exposure with mask M is replicated on the substrate W thus.In addition, worktable 2 is moved with respect to mask M to X-direction and this both direction stepping of Y direction, expose in the stepping each time and copy.
On device pedestal 4, dispose the guide rail 51 of many (in the illustrated embodiment being 4) X-axis line slideways along X-direction, the slide block 51 that is fixed on the lower surface of X-axis feeding platform 5a is striden frame on each guide rail 51.Thus, X-axis feeding platform 5a can be driven by the 1st linear motor 20 of X-axis mounting table feed mechanism 5 and move back and forth in X-direction along guide rail 51.In addition, on X-axis feeding platform 5a, dispose the guide rail 53 of many Y-axis linear guidings along Y direction, the slide block 54 that is fixed on the lower surface of Y-axis feeding platform 6a is striden frame on each guide rail 53.Thus, Y-axis feeding platform 6a can be driven by the 2nd linear motor 21 of Y-axis mounting table feed mechanism 6 and move back and forth in Y direction along guide rail 53.
Be provided with between Y-axis mounting table feed mechanism 6 and the work stage 2 be used to making the mobile along the vertical direction location resolution of worktable 2 thick and shift motion and the larger up and down rack and rinion adjustment 7 of translational speed, thereby and can take position and make than rack and rinion adjustment 7 higher resolutions up and down worktable about in the of 2 fine motion with the clearance fine adjustment of the opposite face of mask M and the substrate W up and down micromatic setting 8 as ormal weight.
Rack and rinion adjustment 7 makes worktable 2 move up and down with respect to fine motion mounting table 6b by the suitable driving mechanism that is arranged on the fine motion mounting table 6b described later up and down.The mounting table coarse adjustment axle 14 at 4 positions that is fixed in the bottom surface of worktable 2 is combined with the straight dynamic bearing 14a that is fixed in fine motion mounting table 6b, and guides along the vertical direction with respect to fine motion mounting table 6b.In addition, although rack and rinion adjustment 7 resolutions are lower up and down, the also preferred repeatedly higher device of bearing accuracy.
Micromatic setting 8 has the fixed station 9 that is fixed in Y-axis feeding platform 6a up and down; And the guide rail 10 that is installed on the line slideway of fixed station 9 with the state that the oblique below of inner side direction tilts, come and go on the mobile slide mass 12 along guide rail 10 at the slide block 11 on this guide rail 10 via striding frame, be linked with the nut (not shown) of ball-screw, and the upper surface of slide mass 12 contacts with the ring flange 12a that is fixed in fine motion mounting table 6b, and can be free to slide in the horizontal direction with respect to it.
And when the motor 17 that is installed on fixed station 9 when utilization drove the lead screw shaft rotation of ball-screws, nut, slide block 11 and slide mass 12 became one, and along guide rail 10 oblique movements, thus, ring flange 12a is along up and down fine motion.
Need to prove, in the micromatic setting 8, also can drive slide mass 12 by linear motor up and down, replace by motor 17 and the driving of ball-screw to slide mass 12.
Micromatic setting 8 is provided with 1, is provided with 2 at the other end at an end (left end of Fig. 1) of the Y direction of Z axis feeding platform 6a up and down, is provided with altogether 3, is controlled by drive respectively.Therefore, inching gear 8 is based on the measurement result of the gap value of the mask M that utilizes the resulting a plurality of positions of gap sensor that consist of aftermentioned mask side displacement transducer 27 and substrate W up and down, height to the ring flange 12a at 3 positions is independently finely tuned, thereby realizes height and the degree of tilt of worktable 2 are finely tuned.
In addition, when utilizing in the situation that micromatic setting 8 can fully be regulated the height of worktable 2 up and down, also can omit up and down rack and rinion adjustment 7.
In addition, on Y-axis feeding platform 6a, be provided with for detection of the Y-axis laser interferometer 18 opposed stripe mirror groups (bar mirror) 19 of the position of the Y-direction of worktable 2 and with the opposed stripe mirror group of X-axis laser interferometer (not shown) for detection of the position of the directions X of worktable 2.Be configured in the side of Y-axis feeding platform 6a along X-direction with Y-axis laser interferometer 18 opposed stripe mirror groups 19, be configured in the end of Y-axis feeding platform 6a along Y direction with the opposed stripe mirror group of X-axis laser interferometer.
Y-axis laser interferometer 18 and X-axis laser interferometer are supported on device pedestal 4, are configured to respectively with always corresponding stripe mirror group is opposed with it.Need to prove, Y-axis laser interferometer 18 is divided along X-direction and is arranged 2.By 2 Y-axis laser interferometer 18, detect position and the Run-out error of the Y direction of Y-axis feeding platform 6a and even worktable 2 by stripe mirror group 19.In addition, by the X-axis laser interferometer, by opposed stripe mirror group, detect the position of the X-direction of X-axis feeding platform 5a and even worktable 2.
With reference to Fig. 2, mask mounting table 1 has the mask pedestal 24 of the framework formation of roughly being rectangle; And the central portion opening that inserts and be supported on this mask pedestal 24 via the gap, and can be along X, Y, the mobile mask frame 25 of θ direction (in X, the Y plane).Mask pedestal 24 is by the assigned position that remains on the top of worktable 2 from the device pedestal 4 outstanding pillar 4a that arrange.
The lower surface of the central portion opening of mask frame 25 is provided with the mask holder 26 of frame shape.That is, at the lower surface of mask frame 25, be provided with a plurality of mask holder adsorption tanks 30 that are connected in not shown vacuum type aspirator, by a plurality of mask holder adsorption tanks 30, mask holder 26 absorption remained on the mask frame 25.
The lower surface of mask holder 26 offers a plurality of mask adsorption tanks 31 for the circumference of not drawing mask pattern of absorption mask M, by mask adsorption tank 31, by not shown vacuum type aspirator, mask M handle is held in the lower surface of mask holder 26, and can freely loads and unloads.In addition, the upper surface of mask holder 26 mounting is useful on the cover glass 32 of the opening of coverage mask retainer 26.Therefore, define space 33 by mask holder 26, mask M and cover glass 32.
Be formed with the suction path 34 that is communicated with space 33 on the mask holder 26, this suction path 34 is connected with aspirating mechanism.And, on mask holder 26, with the part at its cover glass that loads 32 contacted junction surfaces, be formed with space 33 and outside at least one (being many in the present embodiment) air lead-in groove (air importing path) 35 that is communicated with.Thereby space 33 is the state by the outside sealing except the part of air lead-in groove 35.
Need to prove, among Fig. 2, mask adsorption tank 31, suction path 34, air lead-in groove 35 are illustrated on the same profile, but are not limited to this, and suction path 34, air lead-in groove 35 can be formed on the position desired when overlooking.For example, when space 33 was the structure that is connected with the outside of mask holder 26, suction path 34 can be formed on arbitrarily position.In addition, the size of air lead-in groove 35 namely, by air lead-in groove 35 and cover glass 32 formed section sizes, is set as the size of utilizing aspirating mechanism 40 to be enough to regulate pressure.
Particularly, adjust flux adjustment structure and pressure regulating mechanism by the air of blower fan 42 and negative pressure auxiliary tank 43 suction space 33 inside, make the pressure decompression of these 33 inside, space, thus will be owing to deadweight the deflection correction of the mask M of deflection downwards.In addition, because the decompression along with 33 inside, space, outside air flow into 33 inside, space via air lead-in groove 35, so the pressure of 33 inside, space is determined with the balance of the influx of the extraneous air that flows into from the air lead-in groove by the 33 air aspirations that aspirate from the space due to blower fan 42 and the negative pressure auxiliary tank 43.In addition, for making the not deadweight deflection of reason mask M of mask holder 26, the thickness t of mask holder 26 can be chosen as the superficial density that makes its superficial density be higher than mask M.
Thereby, pressure and the pressure of atmospheric pressure differential or 33 inside, space and the pressure differential of mask adsorption tank 31 with not shown pressure gauge detection space 33 inside, and simultaneously adjust flux meter 44, flow control device 45 or pressure regulating mechanism 46, just the pressure of 33 inside, space can be adjusted to thus the pressure of regulation.In addition, when utilizing air lead-in groove 35 and aspirating mechanism 40 to realize the debugging at initial stage of above-mentioned balance, in the running, owing to just utilizing the continuously 33 suction air from the space of aspirating mechanism 40, so utilize the stable pressure that simple mechanism just can 33 inside, implementation space, deflection that thus can mask correction M.
And, when the pressure drop of 33 inside, space, because outside air flow into 33 inside, space via air lead-in groove 35, therefore, even the air of blower fan 42 and 33 inside, negative pressure auxiliary tank 43 continuous sucking spaces, the pressure of 33 inside, space can excessive descent yet, can be owing to excessive pressure differential is damaged mask M and cover glass 32.
Need to prove, aspirating mechanism 40 can be the structure that has at least a flowmeter 44, in addition, also can be any one the structure that has in flow control device 45 and the pressure regulating mechanism 46.
In addition, as shown in Figure 3, mask frame 25 also can be to cut apart to form a plurality of and can be close to each other and the structure of separating.Thus, can with mask M(mask holder 26) size correspondingly, mask holder 26 is kept with short span by mask frame 25, and then deflection that can mask correction retainer 26.Consequently, can suppress the impact that the deflection of mask holder 26 causes, further improve exposure accuracy.
In addition, as shown in Figure 4, be adsorbed maintenance because consist of each parts of mask mounting table 1 by vacuum suction, so can disassemble easily.Thereby, for example, when by not shown robot etc. mask M absorption being remained in mask holder 26, in the mutually mutual interference because of mask M and mask holder 26 mask of mask holder 26 is kept in the situations such as face (lower surface) sustains damage, be easy to it is disassembled, this mask maintenance face is ground reparation.
Need to prove; get back to Fig. 1; above mask holder 26; dispose respectively mask side displacement transducer 27 and the calibration camera 28 that can move; aforementioned mask side displacement transducer 27 be configured for measuring the top height of substrate W and measure mask M and the subtend face of substrate W between the gap sensor in gap; above-mentioned calibration camera 28 conducts are taken the alignment mark (not shown) of mask M and are located at the alignment mark (not shown) of substrate W side, perhaps are located at the mechanism of the benchmark alignment mark (not shown) of worktable 2 or mask pedestal 24.In addition, limiting aperture mechanism 29 has the shadow shield (not shown) of the exposure light that covers as required any range on the mask M that remains in mask frame 25, limits thus exposure range.
As mentioned above, according to the proximity printing device PE of present embodiment, mask mounting table 1 has: with mask M vacuum suction and remain in the mask holder 26 of its lower surface; Remain in the cover glass 32 of the upper surface side of mask holder 26; The air of 33 inside, space that suction is defined by mask holder 26, mask M and cover glass 32 makes the aspirating mechanism 40 of these space 33 inner pressure relieves; And from the outside at least one air lead-in groove 35 of the space 33 internal feed air that are depressurized.And, with mask M vacuum suction at the lower surface of mask holder 26 so that mask M is kept, and, by the pressure of aspirating mechanism 40 suction space 33 inside, and 33 supply with outside air via air lead-in groove 35 to the space, thus the pressure of 33 inside, space is adjusted to the pressure of regulation.
Thus, mask mounting table 1 just can be revised the deflection of mask M and mask M is kept with simple structure, thereby is replicated on the substrate W with the pattern exposure of high precision with mask M.
In addition, because air lead-in groove 35 is configured in the junction surface of cover glass 32 and mask holder 26, therefore, and by the processing of only mask holder 26 being carried out seldom, just can low cost and air lead-in groove 35 is set simply.
Because mask mounting table 1 also has mask holder 26 vacuum suction and remains in its lower surface, mask frame 25 by the driving of mask drive division, therefore, can easily mask frame 25 and mask holder 26 be disassembled, thus the repair in the time of can carrying out simply mask holder 26 damage.
Fig. 5 is the 1st variation of the 1st embodiment, and mask frame 25 is formed with recess 25a on the composition surface of itself and mask holder 26.In addition, on mask holder 26, be formed with the opposed jut 26a with recess 25a.And, mask holder 26 vacuum suction during in mask frame 25, by jut 26a being engaged with recess 25a and adsorbing, can remained in mask holder 26 with the high position precision with mask frame 25.
In addition, although in case mask holder 26 produces deflection, will skid between mask holder 26 and the mask M, the deflected of mask M might change, but because the recess 25a of mask frame 25 engages with the jut of mask holder 26, suppress the deflection of mask holder 26, reduced the impact on mask M.And, the function that also plays as the anti-drop device of mask holder 26 that engages of recess 25a and jut 26a.Need to prove, form recess 25a at mask frame 25, formed jut 26a at mask holder 26, but also can be opposite, at mask frame 25 jut is set, at mask holder recess is set, both are engaged.
Fig. 6 represents the 2nd variation of the 1st embodiment, is the mechanism explanation schematic diagram of mask holder supporting device.Mask holder supporting device 60 comprises mask holder supporting mass 61 and driving mechanism 62.On the top of mask holder supporting mass 61, be formed with mask holder receiving portion 61a, its for can with the dip plane that the dip plane 26b of the lower, outer perimeter edge that is arranged on mask holder 26 is combined.Mask holder supporting mass 61 is by guiding parts 63 guiding of being located at mask frame 25 lower surfaces, can approach or move away from the direction of mask holder 26.
Driving mechanism 62 is comprised of cylinder mechanism, and mask holder supporting mass 61 is fixed in the piston rod 65 of cylinder 64.And, by making cylinder 64 actions make piston rod 65 elongations, the mask holder receiving portion 61a of mask holder supporting mass 61 is combined with the dip plane of mask holder 26 26b, from below supporting mask holder 26, even the pressure of mask holder adsorption tank 30 has occured can prevent reliably that also mask holder 26 from coming off from mask frame 25 in the situation of change between right in phase not.
Need to prove, mask holder 26 also can have the mechanism identical with mask holder supporting device 60, the mask supporting device that configuration is not given prominence to downwards from the lower surface of mask M supports the lower surface of mask M, thereby prevents coming off and deflection of mask M.
Fig. 7 (a) is the main position amplification view of mask mounting table of the 3rd variation of the 1st embodiment, and this mask mounting table has maintaining body 70, will load the position that remains on regulation in the cover glass 32 of the upper surface of mask holder 26.Maintaining body 70 has: the base portion 71 that is fixed in the upper surface of mask holder 26; With centered by the latching of being located at base portion 71, rotate freely, and along the glass casting die 73 of mask holder 26 all-round configurations.Glass casting die 73 as shown in phantom in FIG., under its state that stands vertically, cover glass 32 is placed after the upper surface of mask holder 26, this casting die is approximately rotated 90 °, and become horizontality, thereby be pressed in the upper surface of cover glass 32, thus cover glass 32 be fixed on the position of the regulation of mask holder 26.Prevent thus the changing of the relative positions of cover glass 32, eliminated the changing of the relative positions of cover glass 32 and the impact on exposure accuracy that causes.
Fig. 7 (b) is the major part amplification view of mask mounting table of the 4th variation of the 1st embodiment, as maintaining body, around the cover glass 32 and between the end difference of mask holder 26, disposes the filler 74 that is formed by elastic bodys such as rubber.Thus cover glass 32 is fixed on the position of the regulation of mask holder 26, thereby can prevents the changing of the relative positions of cover glass 32.
Need to prove, in the 3rd and the 4th variation, can configure maintaining body 70 and filler 74 to guarantee having air lead-in groove 35, perhaps also can walk around the maintaining body 70 or the filler 74 that form along 32 1 weeks of cover glass, form air lead-in groove 35.
(the 2nd embodiment)
Fig. 8 (a) (b) is the cross-sectional schematic of air lead-in groove for the cross-sectional schematic of the brief configuration of the mask mounting table of the present invention's the 2nd embodiment.Need to prove, different from the 1st embodiment in the configuration aspects of mask mounting table in the present embodiment, other parts are identical with the 1st embodiment.Identical with the 1st embodiment or be equal to part mark same-sign or respective symbol are simplified or the description thereof will be omitted.
The lower surface of mask frame 25 offers a plurality of cover glass adsorption tanks 36 of circumference for absorption cover glass 32, by not shown vacuum type adsorbent equipment by cover glass adsorption tank 36 with cover glass 32 vacuum suction and remain in mask frame 25.In addition, at the lower surface of mask frame 25, by secure components such as bolts mask holder 26 and mask frame 25 are fixed as and are in fact one.Thus, be defined as space 33 by mask frame 25, mask holder 26, mask M and cover glass 32.
In addition, shown in Fig. 8 (b), at the edge of the mask frame 25 of not offering cover glass adsorption tank 36, the part at its junction surface that engages with mask holder 26 is formed with space 33 and outside at least one air lead-in groove (air importing path) 35 that is communicated with.Preferably air lead-in groove (air importing path) 35 is located at the central portion of mask holder 26, to avoid producing pressure differential in the inside of mask holder 26.Thereby except the part of air lead-in groove 35, space 33 is the state by the outside sealing.
Need to prove, although in the present embodiment, air lead-in groove 35 is formed at mask frame 25 sides, also can be formed at mask holder 26 sides, and in addition, the quantity of air lead-in groove 35 can be arbitrary value.
As mentioned above, proximity printing device PE according to present embodiment, mask mounting table 1 has mask frame 25, its lower surface is equipped with mask holder 26, and cover glass 32 vacuum suction are remained in its lower surface, the space 33 of being defined by mask frame 25, mask holder 26, mask M and cover glass 32 is communicated with the outside with the air lead-in groove 35 at the junction surface of mask holder 26 by being located at mask frame 25, therefore can realize the effect same with the proximity printing device PE of the 1st embodiment shown in Figure 2.
Fig. 9 represents the brief configuration of mask mounting table of the variation of the 2nd embodiment, is equivalent to the cut-open view of Fig. 8 (a).The mask mounting table 1 of this variation is equipped with the seal members 37 such as O shape ring in the outside that is positioned at cover glass adsorption tank 36, in case leak-stopping gas at the junction surface of the cover glass 32 that is kept by vacuum suction with mask frame 25.Need to prove, same with Fig. 8 (b), at the edge of the mask frame 25 of not offering cover glass adsorption tank 36, in the part of mask frame 25 with the junction surface of mask holder 26, be formed with not shown air lead-in groove.
In addition, the present invention is not limited to above-mentioned embodiment and variation, can suitably be out of shape and improvement etc.
Need to prove, in the above-described embodiment, air of the present invention imports path and is made of air lead-in groove 35, but is not limited to this, for example, also can in mask holder 26 or cover glass 32, form space 33 and the outside through hole that is communicated with.
Claims (10)
1. proximity printing device is characterized in that having:
Substrate-placing platform, it keeps as the substrate that is exposed part;
Mask mounting table, its maintenance have the mask that needs exposing patterns; And
Illumination unit, its by described mask to described substrate irradiation pattern exposure light,
Described proximity printing device approaches at described mask and described substrate, and under the state with the exposing clearance subtend configuration of regulation, the pattern exposure of described mask is replicated on the described substrate,
Described mask mounting table has:
Mask holder, it remains in its lower surface with described mask vacuum suction;
Cover glass, it is maintained at the upper surface side of described mask holder;
Aspirating mechanism, the air of the interior volume that its suction is defined by described mask holder, described mask and described cover glass at least makes described interior volume decompression; And
Air imports path, and it is from the outside to the interior volume air supply that is depressurized, and described air importing path has one at least.
2. proximity printing device according to claim 1 is characterized in that,
It is the air lead-in groove that is disposed at the junction surface of described cover glass and described mask holder that described air imports path.
3. proximity printing device according to claim 1 and 2 is characterized in that,
Described mask mounting table also has mask frame, and described mask frame is with described mask holder vacuum suction and remain in the lower surface of described mask frame, and described mask mounting table is driven by the mask drive division.
4. proximity printing device according to claim 3 is characterized in that,
The upper surface of described mask holder has jut or recess,
The lower surface of described mask frame has recess or jut,
The described jut of described mask holder or described recess engage with described recess or the described jut of described mask frame, described mask holder are remained on the lower surface of described mask frame.
5. according to claim 3 or 4 described proximity printing devices, it is characterized in that,
Described mask frame also has the mask holder supporting device, and described mask holder supporting device supports described mask holder, prevents that described mask holder from coming off from described mask frame.
6. the described proximity printing device of any one is characterized in that according to claim 1～3,
Described mask holder has maintaining body, and described maintaining body remains on described cover glass the position of the regulation of described mask holder.
7. proximity printing device according to claim 6 is characterized in that,
Described mask holder selects its superficial density to be higher than the member of the superficial density of mask M.
8. proximity printing device according to claim 1 is characterized in that,
Described mask mounting table has mask frame, and the lower surface of described mask frame is equipped with described mask holder, and with described cover glass vacuum suction and remain in the lower surface of described mask holder,
Described space is defined by described mask frame, described mask holder, described mask and described cover glass,
It is the air lead-in groove that is configured in the junction surface of described mask frame and mask holder that described air imports path.
9. proximity printing device according to claim 8 is characterized in that,
Described air imports channel setting at the central portion of mask holder.
10. proximity printing method,
It utilizes the described proximity printing device of any one in the claim 1～9, described mask and described substrate approach and state with the exposing clearance subtend configuration of regulation under, the pattern exposure of described mask is replicated on the described substrate,
It is characterized in that, it has:
With the lower surface of described mask vacuum suction at described mask holder, and keep the operation of described mask; With
When aspirating the pressure of described interior volume by described aspirating mechanism, import path via described air and supply with the air of described outside to described space, thereby the pressure of described interior volume is adjusted to the operation of the pressure of regulation.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
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| JP2011174848 | 2011-08-10 | ||
| JP2011-174848 | 2011-08-10 | ||
| JP2012-158204 | 2012-07-16 | ||
| JP2012158204A JP6142214B2 (en) | 2011-08-10 | 2012-07-16 | Proximity exposure apparatus and proximity exposure method |
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| CN102955373A true CN102955373A (en) | 2013-03-06 |
| CN102955373B CN102955373B (en) | 2015-01-07 |
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| CN201210285246.9A Expired - Fee Related CN102955373B (en) | 2011-08-10 | 2012-08-10 | Approaching exposure apparatus and approaching type exposure method |
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