CN102944914A - High-coupling-efficiency optical waveguide device in three-dimensional conical port structure and production method thereof - Google Patents
High-coupling-efficiency optical waveguide device in three-dimensional conical port structure and production method thereof Download PDFInfo
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- CN102944914A CN102944914A CN2012104954185A CN201210495418A CN102944914A CN 102944914 A CN102944914 A CN 102944914A CN 2012104954185 A CN2012104954185 A CN 2012104954185A CN 201210495418 A CN201210495418 A CN 201210495418A CN 102944914 A CN102944914 A CN 102944914A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 52
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 238000005342 ion exchange Methods 0.000 claims abstract description 47
- 239000011521 glass Substances 0.000 claims abstract description 34
- 230000008878 coupling Effects 0.000 claims abstract description 30
- 238000010168 coupling process Methods 0.000 claims abstract description 30
- 238000005859 coupling reaction Methods 0.000 claims abstract description 30
- 230000005684 electric field Effects 0.000 claims abstract description 4
- 239000000835 fiber Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 30
- 238000005260 corrosion Methods 0.000 claims description 24
- 230000007797 corrosion Effects 0.000 claims description 24
- 239000010410 layer Substances 0.000 claims description 21
- 238000001259 photo etching Methods 0.000 claims description 19
- 239000007888 film coating Substances 0.000 claims description 17
- 238000009501 film coating Methods 0.000 claims description 17
- 150000003839 salts Chemical class 0.000 claims description 16
- 238000006243 chemical reaction Methods 0.000 claims description 15
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 10
- 230000004888 barrier function Effects 0.000 claims description 9
- 238000007654 immersion Methods 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 6
- 238000001312 dry etching Methods 0.000 claims description 5
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 5
- 238000001039 wet etching Methods 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 150000002500 ions Chemical group 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract 4
- 238000005516 engineering process Methods 0.000 description 5
- 238000000465 moulding Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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Abstract
The invention discloses a high-coupling-efficiency optical waveguide device in a three-dimensional conical port structure and a production method thereof. The production method of the high-coupling-efficiency optical waveguide device includes steps of: primary ion exchange: primary ion exchange is performed on a glass substrate to lead planar optical waveguides to be formed on the surface of the glass substrate; optical waveguide burying: optical waveguides are buried in the middle of the glass substrate in electric field and high temperature environments to form buried planar optical waveguides; and secondary ion exchange: secondary ion exchange is performed on the first lateral surface of the glass substrate and a three-dimensional conical structure is formed at the port position of planar optical waveguides. According to the high-coupling-efficiency optical waveguide device in the three-dimensional conical port structure and the production method thereof, waveguide overall tapering can be achieved in the three-dimensional direction, optical coupling difficulty of optical waveguides is greatly reduced, optical coupling efficiency of optical waveguides is greatly improved, and the divergence angle and the coupling efficiency of optical waveguides can be adjusted conveniently.
Description
Technical field
The present invention relates to the optical waveguide field, relate in particular to three-dimensional tapering point mouth structure fiber waveguide device of a kind of high coupling efficiency and preparation method thereof.
Background technology
Optoelectronic device is just towards miniaturization, integrated future development.Optical waveguide technique is a kind of important technology of integrated opto-electronic device.By semiconductor integrated circuit technique, the optical waveguide manufacturing technology is flourish.An important performance of fiber waveguide device is the coupling efficiency of optical waveguide.How realizing the high coupling efficiency between waveguide and light source, waveguide and optical fiber or different structure waveguide, is a primary study direction of prior art.In order to improve coupling efficiency, need to carry out various special design and fabrications to the structure of optical waveguide, the taper processing of waveguide port is exactly an effective means that improves coupling efficiency.But the optical waveguide of prior art mainly is based on the planar optical waveguide of plane fine process, and namely waveguiding structure mainly in one plane changes, and structure is consistent on third dimension degree, and is difficult to realize in the 3 D stereo direction comprehensive taper of waveguide.
Summary of the invention
Technical matters to be solved by this invention is: the method for making that a kind of three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency is provided, adopt the method to make fiber waveguide device, can realize in the 3 D stereo direction comprehensive taper of waveguide, greatly reduce optical waveguide the optically-coupled difficulty, increase substantially its coupling efficiency and be convenient to regulate its angle of divergence and coupling efficiency.
The further technical matters to be solved of the present invention is: the three-dimensional tapering point mouth structure fiber waveguide device that a kind of high coupling efficiency is provided, this fiber waveguide device can be realized in the 3 D stereo direction comprehensive taper of waveguide, greatly reduce optical waveguide the optically-coupled difficulty, increase substantially its coupling efficiency and be convenient to regulate its angle of divergence and coupling efficiency.
For solving the problems of the technologies described above, the present invention adopts following technical scheme:
A kind of method for making of three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency comprises:
The primary ions exchange step is carried out the ion-exchange first time at glass basis, forms the planar optical waveguide on glass basis surface;
Optical waveguide is buried step, under electric field and the hot environment described optical waveguide being buried in the middle of the glass basis, forms the planar optical waveguide of burying;
The secondary ion exchange step is carried out the ion-exchange second time in the first side of described glass basis, forms three-dimensional pyramidal structure in the port position of described planar optical waveguide.
Preferably, described secondary ion exchange step specifically includes:
The secondary film coating step, the plated surface ion-exchange barrier film in the first side of described glass basis forms the secondary film coating layer;
Secondary photoetching corrosion step carries out photoetching, corrosion on described secondary film coating layer surface, produces the secondary shield figure of selecting ion-exchange, exposes the port position of described optical waveguide;
Secondary exchange reaction step with carrying out ion-exchange reactions in the described secondary film coating layer immersion exchange fused salt, makes its optical waveguide port position form three-dimensional pyramidal structure.
Preferably, before described secondary exchange reaction step, also include:
The exchange mask steps described glass basis is inserted in the ion exchange screen layer of both ends open, and the opening that makes described secondary film coating layer pass the one end exposes.
Preferably, described ion-exchange barrier film is the chromium film.
Preferably, described exchange fused salt is the silver nitrate fused salt.
Preferably, realize corrosion by wet etching or dry etching mode in the described secondary photoetching corrosion step.
Preferably, a described exchange step specifically includes:
A plated film step at described glass basis plated surface ion-exchange barrier film, forms one time film plating layer;
A photoetching corrosion step is carried out photoetching, corrosion on a described film plating layer surface, produces the primary shielding figure of selecting ion-exchange;
An exchange reaction step with carrying out ion-exchange reactions in the described glass basis immersion exchange fused salt, forms the planar optical waveguide that is positioned at the glass basis surface.
Preferably, described exchange fused salt is the silver nitrate fused salt.
Preferably, realize corrosion by wet etching or dry etching mode in the described photoetching corrosion step.
Correspondingly, the invention also discloses a kind of three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency, this fiber waveguide device is made by above-mentioned any method.
The invention has the beneficial effects as follows:
Embodiments of the invention carry out the ion-exchange second time by the side at glass basis, thereby the port position in planar optical waveguide has formed three-dimensional pyramidal structure, greatly reduce optical waveguide the optically-coupled difficulty, increased substantially the production efficiency of optically-coupled and be convenient to regulate its angle of divergence and coupling efficiency.
The present invention is described in further detail below in conjunction with accompanying drawing.
Description of drawings
Fig. 1 carries out the product structure front view that forms after for the first time ion-exchange among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Fig. 2 carries out the product structure side view that forms after for the first time ion-exchange among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Fig. 3 carries out the product structure front view that forms after the secondary film coating among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Fig. 4 carries out the product structure side view that forms after the secondary film coating among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Fig. 5 carries out the product structure front view that forms behind the secondary photoetching corrosion among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Fig. 6 carries out the product structure side view that forms behind the secondary photoetching corrosion among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Fig. 7 is the original state synoptic diagram that carries out for the second time ion-exchange among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Fig. 8 is the completion status synoptic diagram that carries out for the second time ion-exchange among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Fig. 9 carries out the product structure front view that forms after for the second time ion-exchange among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Figure 10 carries out the product structure side view that forms after for the second time ion-exchange among embodiment of method for making of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Figure 11 is the structural representation of an embodiment of high efficiency three-dimensional tapering point mouth structure fiber waveguide device of the present invention.
Embodiment
Describe the embodiment of method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency provided by the invention in detail below with reference to Fig. 1-Figure 10, present embodiment realizes that the making of a fiber waveguide device mainly comprises step:
The primary ions exchange step is carried out the ion-exchange first time at glass basis 1, forms the planar optical waveguide on glass basis surface;
Optical waveguide is buried step, under electric field and hot environment, described optical waveguide is buried in the middle of the glass basis 1, the planar optical waveguide that formation is buried, the product of this step moulding can be with reference to figure 1 and Fig. 2, and the center of described planar optical waveguide of burying can be apart from described glass basis upper surface or lower surface 0-30um;
The secondary ion exchange step is carried out the ion-exchange second time in the first side 11 of described glass basis 1, and in the three-dimensional pyramidal structure of port position 20 formation of described planar optical waveguide 2, the product of this step moulding can be with reference to figure 9 and Figure 10.
During specific implementation, described secondary ion exchange step can specifically include:
The secondary film coating step, the plated surface ion-exchange barrier film in the first side 11 of described glass basis 1 forms secondary film coating layer 3, and the product of this step moulding can be with reference to figure 3 and Fig. 4;
Secondary photoetching corrosion step carries out photoetching, corrosion on described secondary film coating layer 3 surface, produces the secondary shield figure 31 of selecting ion-exchange, exposes the port position 20 of described optical waveguide 2, and the product of this step moulding can be with reference to figure 5 and Fig. 6;
Secondary exchange reaction step with carrying out ion-exchange reactions in the described secondary film coating layer 3 immersion exchange fused salt 4, makes its optical waveguide port 20 positions form three-dimensional pyramidal structure, and the original state of this step and completion status can be respectively with reference to figure 7 and Fig. 8.
Further, before described secondary exchange reaction step, also can include:
The exchange mask steps described glass basis 1 is inserted in the ion exchange screen layer 5 of both ends open, and the opening that makes described secondary film coating layer 3 pass the one end is exposed.
During specific implementation, described ion-exchange barrier film is preferably the chromium film, and described exchange fused salt is preferably the silver nitrate fused salt, can realize corrosion by wet etching or dry etching mode in the described secondary photoetching corrosion step.
In addition, a described exchange step specifically includes:
A plated film step at described glass basis plated surface ion-exchange barrier film, forms one time film plating layer;
A photoetching corrosion step is carried out photoetching, corrosion on a described film plating layer surface, produces the primary shielding figure of selecting ion-exchange;
An exchange reaction step with carrying out ion-exchange reactions in the described glass basis immersion exchange fused salt, forms the planar optical waveguide that is positioned at the glass basis surface.
Can directly adopt prior art by once exchanging the technology of making planar optical waveguide, repeat no more.
With reference to Figure 11, this figure is the structural representation of an embodiment of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency provided by the invention.Present embodiment can directly be made by the method that previous embodiment provides, and repeats no more.
The above is preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention; can also make some improvements and modifications, these improvements and modifications also are considered as protection scope of the present invention.
Claims (10)
1. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of a high coupling efficiency is characterized in that the method may further comprise the steps:
The primary ions exchange step is carried out the ion-exchange first time at glass basis, forms the planar optical waveguide on glass basis surface;
Optical waveguide is buried step, under electric field and the hot environment described optical waveguide being buried in the middle of the glass basis, forms the planar optical waveguide of burying;
The secondary ion exchange step is carried out the ion-exchange second time in the first side of described glass basis, forms three-dimensional pyramidal structure in the port position of described planar optical waveguide of burying.
2. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency as claimed in claim 1 is characterized in that, described secondary ion exchange step specifically includes:
The secondary film coating step, the plated surface ion-exchange barrier film in the first side of described glass basis forms the secondary film coating layer;
Secondary photoetching corrosion step carries out photoetching, corrosion on described secondary film coating layer surface, produces the secondary shield figure of selecting ion-exchange, exposes the port position of described optical waveguide;
Secondary exchange reaction step with carrying out ion-exchange reactions in the described secondary film coating layer immersion exchange fused salt, makes its optical waveguide port position form three-dimensional pyramidal structure.
3. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency as claimed in claim 2 is characterized in that, also includes before described secondary exchange reaction step:
The exchange mask steps described glass basis is inserted in the ion exchange screen layer of both ends open, and the opening that makes described secondary film coating layer pass the one end exposes.
4. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency as claimed in claim 2 or claim 3 is characterized in that:
Described ion-exchange barrier film is the chromium film.
5. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency as claimed in claim 4 is characterized in that:
Described exchange fused salt is the silver nitrate fused salt.
6. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency as claimed in claim 5 is characterized in that:
Realize corrosion by wet etching or dry etching mode in the described secondary photoetching corrosion step.
7. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency as claimed in claim 6 is characterized in that, a described exchange step specifically includes:
A plated film step at described glass basis plated surface ion-exchange barrier film, forms one time film plating layer;
A photoetching corrosion step is carried out photoetching, corrosion on a described film plating layer surface, produces the primary shielding figure of selecting ion-exchange;
An exchange reaction step with carrying out ion-exchange reactions in the described glass basis immersion exchange fused salt, forms the planar optical waveguide that is positioned at the glass basis surface.
8. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency as claimed in claim 7 is characterized in that:
The described glass basis upper surface of the center position of described planar optical waveguide of burying or lower surface 0-30um, described exchange fused salt is the silver nitrate fused salt.
9. the method for making of the three-dimensional tapering point mouth structure fiber waveguide device of high coupling efficiency as claimed in claim 8 is characterized in that:
Realize corrosion by wet etching or dry etching mode in the described photoetching corrosion step.
10. the three-dimensional tapering point mouth structure fiber waveguide device of a high coupling efficiency, it is characterized in that: described fiber waveguide device is by being made such as each described method among the claim 1-9.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106461873A (en) * | 2014-04-30 | 2017-02-22 | 华为技术有限公司 | Inverse taper waveguides for low-loss mode converters |
CN113671730A (en) * | 2021-07-28 | 2021-11-19 | 中南大学 | Silicon photon pin junction light attenuation structure |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60145934A (en) * | 1983-12-30 | 1985-08-01 | Shimadzu Corp | Manufacture of optical waveguide |
US6751391B2 (en) * | 2001-07-24 | 2004-06-15 | Agilent Technologies, Inc. | Optical systems incorporating waveguides and methods of manufacture |
CN102590941A (en) * | 2012-04-05 | 2012-07-18 | 上海光芯集成光学股份有限公司 | Integrated optical chip based on glass-based ion exchange buried optical waveguide and manufacturing method |
-
2012
- 2012-11-28 CN CN201210495418.5A patent/CN102944914B/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60145934A (en) * | 1983-12-30 | 1985-08-01 | Shimadzu Corp | Manufacture of optical waveguide |
US6751391B2 (en) * | 2001-07-24 | 2004-06-15 | Agilent Technologies, Inc. | Optical systems incorporating waveguides and methods of manufacture |
CN102590941A (en) * | 2012-04-05 | 2012-07-18 | 上海光芯集成光学股份有限公司 | Integrated optical chip based on glass-based ion exchange buried optical waveguide and manufacturing method |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106461873A (en) * | 2014-04-30 | 2017-02-22 | 华为技术有限公司 | Inverse taper waveguides for low-loss mode converters |
CN106461873B (en) * | 2014-04-30 | 2021-04-20 | 华为技术有限公司 | Low-loss analog converter and method of making the same |
CN113671730A (en) * | 2021-07-28 | 2021-11-19 | 中南大学 | Silicon photon pin junction light attenuation structure |
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Address after: 518000, Zhongxing new industrial park, 1 new head road, Bantian street, Longgang District, Guangdong, Shenzhen Patentee after: SHENZHEN ZHONGXING SINDI TECHNOLOGIES CO., LTD. Address before: 518129, Zhongxing new industrial park, 1 new road, Shenzhen street, Bantian street, Longgang District, Guangdong, China Patentee before: Shenzhen Zhongxing Xindi Telecom Equipment Co., Ltd. |
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