CN102931047A - Long-life electron cyclotron resonance (ECR) ion source - Google Patents
Long-life electron cyclotron resonance (ECR) ion source Download PDFInfo
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- CN102931047A CN102931047A CN 201110227874 CN201110227874A CN102931047A CN 102931047 A CN102931047 A CN 102931047A CN 201110227874 CN201110227874 CN 201110227874 CN 201110227874 A CN201110227874 A CN 201110227874A CN 102931047 A CN102931047 A CN 102931047A
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- ion source
- microwave window
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Abstract
The invention discloses a new structure of a long-life electron cyclotron resonance (ECR) ion source. According to the structure, ridge waveguides are adopted, and magnetic fields are applied to the peripheries of the ridge waveguides; and a microwave window connected with the waveguides is positioned on the upper middle part of the ion source, and the lower end of the microwave window is higher than the center of the ion source. By the unique design, the microwave window is fundamentally prevented from being damaged by a high-energy reflux secondary electron beam, so that the life of the ECR ion source is prolonged, the ECR ion source can continuously work for more than one year, and industrial production equipment can run for a long time.
Description
Technical field
The present invention relates to electron cyclotron resonace (ECR) plasma source and electron cyclotron resonace (ECR) plasma device.
Background technology
The operation principle of Electron cyclotron resonance ion source (Electron Cyclotron Resonance Ion Source) is: when electronics is done circumnutation in the magnetic field of vertical its direction of motion, the frequency of its circumnutation is only relevant with the size in the electric weight of the quality of electronics, electronics, magnetic field, it doesn't matter with the movement velocity of electronics, under the condition of not considering relativistic effect, quality, the electric weight of electronics are constant, that is to say for electronics, under the fixing condition in magnetic field, electronics frequency in circumnutation in magnetic field is constant.If electronics in the process of Movement in Magnetic Field, adds an electromagnetic wave identical with its cyclotron frequency, just can make electronics obtain enough energy by resonance, thereby molecule or atomic ionization around it, form plasma.Ecr ion source utilizes this principle and makes.
Electron cyclotron resonance ion source does not have hot cathode, and its working life is very long in theory.But in the microwave ion source course of work, inevitably can produce secondary electron at the ion accelerating region, these secondary electrons instead bang to the microwave window of arc chamber bottom with very high energy, microwave window generally is made of the insulator that can transmit microwave, because the energy of secondary electron is very high, the relative thermal conductivity of these microwave window materials can be relatively poor, common ion source design, the cooling at microwave window position is also relatively poor, can not in time derive the heat of microwave window, thereby microwave window under the bombardment of electron beam, be easy to because overheated and the cracking or the evaporation, cause the damage of microwave window, cause the ion source cisco unity malfunction.Usually the Electron cyclotron resonance ion source continuous operation life-span that line is stronger is at 1-2 about week.
Summary of the invention
The present invention is directed to existing Electron cyclotron resonance ion source short problem in useful life, provide a kind of and can greatly improve the Electron cyclotron resonance ion source new construction in useful life.
A kind of Electron cyclotron resonance ion source comprises several parts such as waveguide, arc chamber, vacuum chamber, magnet exciting coil, accelerating electrode.The arc chamber rear end is connected with waveguide through microwave window, and the other end links to each other with vacuum chamber.The arc chamber outside is permanent magnet or magnet exciting coil, in order to form the required magnetic field of electron cyclotron resonace in arc chamber.After working gas enters arc chamber, with the ionization that bumps of circulating electrons in the arc chamber, then enter accelerating region by said ion leadout hole, under the effect of accelerating region high voltage electric field, form high energy ion beam.In the technology provided by the invention, key is the off-centre design of microwave window, and microwave window is made with pottery, and it is positioned at the top of arc chamber rear end flange center bellmouth, and logical cooling water in the middle of the bellmouth is used for taking away anti-Hong electron energy.
The benefit of this eccentric structure design is, side flange is made by stainless steel behind the arc chamber, good heat conductivity, and anti-a Hong electronics bombardment position is done tapered, and make and bombarded area and increase, during work, the unit are received heat reduces, and heat can in time be dispersed.This structure has avoided ordinary electronic cyclotron resonance ion source microwave window to be subjected to instead Hong electronic action to hold flimsy problem, can greatly improve the ionogenic life-span.
Description of drawings
Fig. 1 Electron cyclotron resonance ion source structural representation
1 waveguide; 2 ridge waveguides; 3 permanent magnets; 4 large flanges; 5 microwave windows; 6 bellmouths; 7 magnet exciting coils; 8 arc chambers; 9 anti-Hong electronics; 10 vacuum chambers; 11 fairleads; 12 extraction electrodes; 13 ion beams; 14 cooling waters; 15 air inlets
Embodiment
Below in conjunction with accompanying drawing technical scheme provided by the present invention is further elaborated.
As shown in Figure 1, a kind of Electron cyclotron resonance ion source comprises several parts such as waveguide 1, arc chamber 8, magnet exciting coil 7, vacuum chamber 9, accelerating electrode 10.Wherein waveguide 1 connects by the end of microwave window 5 with arc chamber 8, the other end of arc chamber 8 be installed in vacuum chamber 10 above, the external diameter of next-door neighbour's arc chamber is magnet exciting coil 7.In the present embodiment, add the efficiency of transmission that ridge waveguide 2 is mainly used in improving microwave in the waveguide 1; The outer permanent magnet 3 of ridge waveguide 2 and waveguide all adopts Ferrite Material, is used on the one hand regulating arc chamber internal magnetic field intensity, utilizes on the other hand Ferrite Material to the guide effect of microwave transmission, reduces the reflection power of microwave.The microwave window 5 that is connected with waveguide adopts high dielectric constant ceramic material, and microwave window 5 is positioned at bellmouth 6 tops.Vacuum chamber 8 inwalls adopt boron nitride material, are conducive to improve microwave discharge efficient.
During ion source work, working gas enters arc chamber 8 by air inlet 15.Microwave enters arc chamber 8 by waveguide 1, process microwave window 5, electronics in the arc chamber 8 is externally done circumnutation under the effect in magnetic field, the circumnutation frequency is identical with the frequency of microwave, the two forms resonance, electronics can absorb by resonance and obtain very high energy, these electrons make the gas ionization that enters in the arc chamber 8, and the ion that forms after the ionization enters vacuum chamber 10 by fairlead 11, are accelerated to form ion beam 13 by extraction electrode 12 again.
The advantage of this technical scheme has:
1. unique waveguiding structure design namely is conducive to improve the efficiency of transmission of microwave, and again to improving the utilance of microwave, and field shape that can condition arc chamber internal magnetic field distributes and size.
2. unique microwave window counnter attack Hong Electronic Structure Design is protected structure by this microwave window, and instead Hong high energy electron is directly beaten at the large flange of arc chamber and instead banged in the electron collection conical bore, can not cause the damage of microwave window; The circular cone pore structure has increased the area that anti-Hong electronics receives, and makes its unit are hot joining receive energy and reduces, and the water that more easily is cooled is derived.
3. microwave window adopts the method for minor diameter pottery, has effectively reduced ionogenic volume, and the arc chamber inwall adopts boron nitride material, has effectively prevented from causing because of the microwave window structural change reduction of ion source educt beaming flow.
Adopt an Electron cyclotron resonance ion source of structure of the present invention, at operating voltage 80kV, under the condition of work of educt beaming flow 30mA, for a long time normal operation accumulative total reaches six months.
Claims (7)
1. Electron cyclotron resonance ion source, comprise waveguide (1), arc chamber (8), magnet exciting coil (6), vacuum chamber (10), several parts such as accelerating electrode (11), wherein waveguide (1) links to each other by same arc chamber (8) one ends of microwave window (5), arc chamber (8) twines magnet exciting coil (6) on every side, the ion outlet () of the other end links to each other with vacuum chamber, extraction channel at ion beam arranges accelerating electrode (11), it is characterized in that: described microwave window is the round ceramic microwave window, and microwave window is positioned at the top of ion source discharge chamber center line.
2. described ion source according to claim 1 is characterized in that: two ridge waveguides (2) are arranged in the described waveguide (1), and waveguide (1) is outer two permanent magnets (3).
3. according to right 1 described ion source, it is characterized in that: there is a conical bore (6) at large flange (4) center, arc chamber (8) left side, and its diameter is greater than the beam cross section that backflows.
4. according to right 1 described ion source, it is characterized in that: arc chamber (8) inwall claims boron nitride material.
5. according to right 1 described ion source, it is characterized in that: the inner logical cooling water (13) of large flange (4) is forced cooling.
6. according to right 3 described ion sources, it is characterized in that: the inner logical cooling water (13) of large flange (4) is forced cooling.
7. according to right 3 described ion sources, it is characterized in that: microwave window (5) is positioned at conical bore (6) top.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110227874 CN102931047A (en) | 2011-08-10 | 2011-08-10 | Long-life electron cyclotron resonance (ECR) ion source |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110227874 CN102931047A (en) | 2011-08-10 | 2011-08-10 | Long-life electron cyclotron resonance (ECR) ion source |
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| CN102931047A true CN102931047A (en) | 2013-02-13 |
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| CN 201110227874 Pending CN102931047A (en) | 2011-08-10 | 2011-08-10 | Long-life electron cyclotron resonance (ECR) ion source |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104091741A (en) * | 2014-07-14 | 2014-10-08 | 兰州大学 | Multifunctional ion gun |
| CN109411319A (en) * | 2018-11-16 | 2019-03-01 | 合肥飞帆等离子科技有限公司 | A kind of novel plasma cathode electronics electron gun and 3D printer |
| CN109887832A (en) * | 2019-03-01 | 2019-06-14 | 金华职业技术学院 | A kind of photoelectron time flight spectrum instrument |
| CN109887832B (en) * | 2019-03-01 | 2024-05-10 | 金华职业技术学院 | Photoelectron time-of-flight spectrometer |
-
2011
- 2011-08-10 CN CN 201110227874 patent/CN102931047A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104091741A (en) * | 2014-07-14 | 2014-10-08 | 兰州大学 | Multifunctional ion gun |
| CN104091741B (en) * | 2014-07-14 | 2016-06-08 | 兰州大学 | Multifunction ion rifle |
| CN109411319A (en) * | 2018-11-16 | 2019-03-01 | 合肥飞帆等离子科技有限公司 | A kind of novel plasma cathode electronics electron gun and 3D printer |
| CN109887832A (en) * | 2019-03-01 | 2019-06-14 | 金华职业技术学院 | A kind of photoelectron time flight spectrum instrument |
| CN109887832B (en) * | 2019-03-01 | 2024-05-10 | 金华职业技术学院 | Photoelectron time-of-flight spectrometer |
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| DD01 | Delivery of document by public notice |
Addressee: Lin Shiyong Document name: Notification that Application Deemed to be Withdrawn |
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130213 |