CN103426706A - Microwave ion source - Google Patents

Microwave ion source Download PDF

Info

Publication number
CN103426706A
CN103426706A CN 201210152561 CN201210152561A CN103426706A CN 103426706 A CN103426706 A CN 103426706A CN 201210152561 CN201210152561 CN 201210152561 CN 201210152561 A CN201210152561 A CN 201210152561A CN 103426706 A CN103426706 A CN 103426706A
Authority
CN
Grant status
Application
Patent type
Prior art keywords
chamber
microwave
ion
discharge
source
Prior art date
Application number
CN 201210152561
Other languages
Chinese (zh)
Inventor
崔保群
蒋渭生
唐兵
马瑞刚
马鹰俊
陈立华
黄青华
Original Assignee
中国原子能科学研究院
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

The invention discloses a microwave ion source which comprises a waveguide, a discharge chamber, a magnet exciting coil, a vacuum chamber and an extraction system. The waveguide is connected with one end of the discharge chamber through a microwave window, the magnet exciting coil is wound around the discharge chamber, an ion outlet at the other end is communicated with the vacuum chamber, the extraction system is arranged on an ion beam leading-out channel and leads irons out of the discharge chamber to form beam flows, a middle partition plate is arranged in the waveguide and tightly adheres to the microwave window, and cooling water is led into the middle partition plate to perform forced cooling. The microwave ion source is good in symmetry, the plasma concentration evenness in the discharge chamber is good, improvement of the quality of led-out beam flows is facilitated, and the lifetime of a microwave source can be further prolonged.

Description

一种微波离子源 A microwave ion source

技术领域 FIELD

[0001] 本发明涉及离子源技术领域,特别涉及一种微波离子源的新结构。 [0001] Technical Field The present invention relates to ion sources, and particularly relates to a novel structure of a microwave ion source.

背景技术 Background technique

[0002] 微波离子源的原理是选用合适的微波,通过微波耦合窗将微波功率馈入到一个放电室中。 Principle [0002] is the choice of a microwave ion source suitable microwave, the microwave coupling window by microwave power was fed into a discharge chamber. 放电室处于一定的磁场之中,当放电室内绕磁力线作回旋运动的电子本征回旋频率与馈入的微波频率相等时,电子与微波场发生共振并从微波中吸收能量,获得能量的电子使放电室中的工作气体电离形成等离子体,等离子体中的离子被加速电场引出后形成所需的离子束。 The discharge chamber is in a certain magnetic field, when the equal discharge chamber around the lines of magnetic force for turning motion of an Electronic cyclotron frequency and the feeding of microwave frequency, the electron and the microwave field resonance and absorb energy from the microwave, the electrons gain energy so working gas ionization discharge chamber forming a plasma, ions in the plasma are accelerated to form a desired electric field after the ion beam extraction. 微波离子源具有放电效率高、引出束流强、束流品质好、单原子离子比例高、工作寿命长等优点,可广泛的应用于加速器、中子发生器及离子注入机等方面。 Microwave ion source having a high discharge efficiency aspect, strong beam leads, good beam quality, high proportion of single atomic ion, long working life, etc., can be widely applied to the accelerator, the neutron generator and ion implantation machine.

[0003] 微波离子源没有热阴极,理论上其工作寿命应该很长。 [0003] The microwave ion source is not hot cathode, which theoretically should be very long working life. 但是,在实际运用中,在离子加速引出区不可避免的会产生二次电子,它们被加速后以很高的能量回轰微波窗中心部位,而微波窗由陶瓷类材料制成,自身导热性能差,通常采用的波导设计,中心部位不能冷却,而波导同微波窗的接触面有限,不能帮助微波窗很好的将热量带走。 However, in practice, the ion acceleration in the lead-out area will inevitably generate secondary electrons, which are accelerated to high energy microwave window center back portion H, and the microwave window made of a ceramic-based material, their thermal conductivity difference waveguide commonly used design, the central portion can not be cooled, and the microwave window with a limited contact surface of the waveguide, the microwave window does not help a good heat away. 在电子束的轰击下微波窗很快就因高温而裂开或者蒸发,形成通孔,导致离子源不能正常工作。 In the electron beam bombardment of the microwave window quickly cracked due to heat or evaporation, the through holes are formed, resulting in the ion source does not work. 因此,微波离子源的使用寿命受到了很大的限制。 Therefore, the service life of the microwave ion source has been greatly restricted.

[0004] 在本申请人另一份中国专利说明书CN100580858C(授权公告日为2010年I月13日)中曾描述过一种微波离子源,该结构中,波导采用单脊设计,波导脊的端面与微波耦合窗紧密贴合,这种结构的设计使微波离子源真正成为有超长寿命的离子源,但是波导采用单脊设计,微波馈入不对称,使得放电室中等离子浓度均匀性差,严重影响了引出束流的品质。 [0004] In another Chinese patent applicant of the present specification CN100580858C (authorized announcement I 2010 May 13) has been described in A microwave ion source, this configuration, a single ridge waveguide design, the end face of the waveguide ridge microwave coupling window close contact, such a structure design of the microwave ion source become truly long life ion source, but a single ridge waveguide design, asymmetric microwave feed, so that the concentration of plasma in the discharge chamber poor uniformity, severe affect the quality of the extraction beam.

发明内容 SUMMARY

[0005] 本发明克服了现有技术中结构不对称、等离子浓度均匀性差的缺点,提供了一种结构对称性好,放电室中等离子浓度均匀性好,有利于提高引出束流品质,且能够进一步延长微波源寿命的微波离子源。 [0005] The present invention overcomes the prior art structural asymmetry, ion concentration and other shortcomings of poor uniformity, a good structural symmetry, the concentration of plasma in the discharge chamber uniformity, help to improve the beam quality of the lead and capable of further extension of the microwave source a microwave ion source life.

[0006] 为了解决上述技术问题,本发明是通过以下技术方案实现的: [0006] To solve the above problems, the present invention is achieved by the following technical solution:

[0007] —种微波离子源,包括波导、放电室、励磁线圈、真空室、引出系统,其中波导通过微波窗同放电室的一端相连,放电室周围缠绕励磁线圈,另一端的离子出口与真空室相通,在离子束引出的通道上设置引出系统,引出系统将离子从放电室引出形成束流。 [0007] - seed microwave ion source comprising a waveguide, a discharge chamber, an exciting coil, a vacuum chamber, the extraction system, wherein the waveguide is connected to one end of the microwave window with the discharge chamber surrounding the discharge chamber winding the exciting coil, the other end of the ion outlet vacuo chamber communicating, on the passage of the extracted ion beam extraction system is provided, the ion extraction system is formed from the discharge chamber leads beam. 本发明所提供的技术方案中,关键在于,所述的波导内设置一块中分板,中分板与微波窗紧密贴合,中分板内部通冷却水进行强制冷却。 Aspect of the present invention provided herein, the key is provided according to an equatorial plate waveguide, the microwave window carved plate in close contact with the inner plate through-carved forcibly cool the cooling water.

[0008] 本发明还可以: [0008] The present invention may also be:

[0009] 所述的中分板由金属制成。 Carve plate [0009] according made of metal.

[0010] 所述的中分板用铁磁材料制成。 Carve plate [0010] is made of the ferromagnetic material.

[0011] 在微波窗的中心位置开设一直径大于返流电子束截面的中心孔。 [0011] defines a larger diameter than the central aperture of the electron beam cross section at the reflux position of the center of the microwave window. [0012] 所述的中分板与微波窗相连的一端厚度大于微波窗中心孔的孔径。 [0012] The thickness of the end plate and the equatorial connected to the microwave window aperture is larger than the center hole of the microwave window.

[0013] 在中分板上与微波窗的中心孔正对的位置开设一个中心孔。 [0013] defines a central hole in the equatorial position of the center hole of the plate and facing the microwave window.

[0014] 与现有技术相比,本发明的有益效果是: [0014] Compared with the prior art, the beneficial effects of the present invention are:

[0015] 本发明在波导内设置一块中分板,中分板与微波窗可以充分接触,既能保证放电室内气体的密封,又可以将微波窗的热量通过中分板内的冷却水带走,实现对微波窗进行很好的冷却。 [0015] The present invention is provided a plate carved in the waveguide, the microwave window carved plate can be sufficiently in contact with, both to ensure the seal gas discharge chamber, and heat of the microwave window may be carried away by cooling water in the equatorial plate to realize the microwave window it is well cooled. 同时中分板又将微波在馈入放电室前对称的分成两路,等离子体均匀性好,有利于提闻引出束的品质。 While the carved board before the turn microwave feed discharge chamber is divided into two symmetrical, plasma uniformity, and is conducive to mention smell quality beam extraction.

[0016] 微波窗与中分板中心部分开一中心孔,让二次电子主要轰击在中分板上,而不是直接轰击在微波窗上,减小了微波窗的热负荷,大大的延长了微波窗的使用寿命。 [0016] The microwave window opening portion and a central equatorial plate central aperture, so that the secondary electron bombardment carve main board, rather than directly on the bombardment of the microwave window, reduces the thermal load of the microwave window, greatly extended the life of the microwave window.

附图说明 BRIEF DESCRIPTION

[0017] 图1微波离子源结构示意图 [0017] Fig 1 a schematic view of the structure of a microwave ion source

[0018] I微波功率输入、2波导、3中分板、4冷却水槽、5进气管、6中分板中心孔、7微波窗中心孔、8微波窗、9放电室外套、10励磁线圈、11真空室、12放电室、13回轰二次电子、14等离子体电极、15抑制电极、16地电极、17引出束流 [0018] I microwave power input waveguide 2, 3 equatorial plate, a cooling water bath 4, the intake pipe 5, the plate 6 central hole carved, microwave window center hole 7, the microwave window 8, 9 discharge chamber jacket, the exciting coil 10, the vacuum chamber 11, discharge chamber 12, secondary electrons 13 back to H, the plasma electrode 14, suppression electrode 15, ground electrode 16, beam lead 17

具体实施方式 detailed description

[0019] 下面结合附图与具体实施方式对本发明作进一步详细描述: [0019] The present invention will be described in further detail in conjunction with the accompanying drawings DETAILED DESCRIPTION:

[0020] 如图1所示,一种微波离子源,包括波导2、放电室12、励磁线圈10、真空室11及引出系统,其中波导2通过微波窗8同放电室外套9的一端相连,放电室12周围缠绕励磁线圈10,另一端的离子出口与真空室11相通,在离子束引出的通道上设置引出系统,引出系统将离子从放电室12引出形成束流,本实施例中引出系统采用三电极结构,即等离子体电极14、抑制电极15和地电极16,等离子体电极14与抑制电极15形成加速场将离子从放电室12等离子体内引出形成引出束流17。 [0020] As shown, the A microwave ion source 1, comprises a waveguide 2, a discharge chamber 12, the exciting coil 10, chamber 11 and vacuum extraction system, wherein the waveguide 2 is connected to the discharge end of the microwave window 8 with the outer chamber 9, discharge chamber 12 is wound around the exciting coil 10, the other end of the ion outlet 11 in communication with the vacuum chamber disposed on a passage of the extracted ion beam extraction system, the extraction system 12 drawn out from the plasma discharge chamber is formed beam, embodiments of the present embodiment extraction system three-electrode structure, i.e. the plasma electrode 14, suppression electrode 15 and ground electrode 16, the ion beam extraction from the plasma discharge chamber 17 the lead 12 is formed and the plasma electrode 14 to suppress acceleration field electrode 15 is formed. 在所述的波导2内设置一块中分板3,中分板3与微波窗8紧密贴合,中分板3内部设置有冷却水槽4,通冷却水进行强制冷却。 2 disposed within the waveguide according to an equatorial plate 3, the microwave window plate 3 and carve 8 snug fit inside the equatorial plate 3 is provided with a cooling water tank 4, through the cooling water forced cooling. 另外,在微波窗8的中心位置开设一直径大于返流电子束截面的微波窗中心孔7。 Additionally, the microwave window defines a larger diameter than the central bore reflux beam section 7 of the center position of the microwave window 8. 所述的中分板3与微波窗8相连的一端厚度大于微波窗中心孔7的孔径。 Said central hole carved microwave window plate 3 and the thickness of the microwave window 8 connected to one end of the aperture is greater than 7. 在中分板3上与微波窗8的微波窗中心孔7正对的位置开设一个中分板中心孔6。 Plate defines a central aperture 6 in the equatorial position of the center hole 3 and the window 7 of the microwave window 8 facing the equatorial plate.

[0021]中分板3采用金属材料制成,本实施例优选采用铁磁材料制成,有利于改善放电室12内磁场分布,也节省了励磁功率。 [0021] equatorial plate 3 is made of a metal material, the present embodiment uses a preferred embodiment of a ferromagnetic material, it will help to improve the discharge chamber 12 within the magnetic field distribution, the field of power saving.

[0022] 工作时,工作气体通过进气管5通入放电室12并保证一定气压,微波功率输入I经馈入波导2通过微波窗8馈入放电室12,当放电室12内绕磁力线作本征回旋运动的电子回旋频率与馈入的微波频率相等时,电子将从微波中共振吸收能量,高能电子碰撞工作气体形成等离子体,通过等离子体电极14与抑制电极15的加速场将离子引出形成离子束。 When [0022] the work, the working gas passes through the inlet pipe 5 into the discharge chamber 12 and to ensure a certain pressure, microwave power input I was fed into the waveguide 2 for this through the microwave window 8 is fed into the discharge chamber 12, when the discharge chamber 12 around the magnetic field lines electron cyclotron motion equal sign cyclotron frequency and the feeding of microwave frequency, electron energy from the microwave resonance absorption, high energy electrons impact the working gas into a plasma by the plasma electrode 14 and an accelerating field of the suppression electrode 15 is formed ion extraction the ion beam. 微波窗8与微波馈入波导2及中分板3的端面紧贴用于密封放电室12内气体不向波导2内扩散,在微波窗8和中分板3中心开一孔,孔径大于回轰二次电子13束径,二次电子直接轰击在中分板3上,冷却水对中分板3强制冷却将热量带走。 Microwave window 8 and the microwave feed waveguide 2 and the inner sheet 12 carved seal gas discharge chamber 3 against the end face is not diffused into the waveguide for 2, 3 to open a hole in the center of the microwave window 8 and the carved boards, back pore size greater than H secondary electron beam path 13, a secondary electron bombardment directly on the equatorial plate 3, the cooling water forced cooling of 3 equatorial plate heat away.

[0023] 本发明采用这些独特的设计,放电室12中等离子浓度均匀性好,有利于提高引出束流17的品质,同时也使微波离子源从根本上避免了回轰二次电子13对微波窗8的损坏,使微波离子源真正成为了有超长寿命的离子源。 [0023] The present invention employs a unique design, the concentration of plasma in the discharge chamber 12 good uniformity, help to improve the beam quality of the lead 17, while also avoiding the microwave ion source 13 pairs of secondary electrons back to H microwave fundamentally damage to the window 8, the microwave ion source has become a truly long life ion source. 它用于相应的加速器、离子注入机等设备,必将大大提高设备运行的可靠性及运行效率,从而产生良好的社会效益和经济效益。 It is appropriate for the accelerator, ion implantation equipment, etc., will greatly improve the reliability and operation efficiency of equipment operation, resulting in a good social and economic benefits.

[0024] 例如,采用本发明所提供的新结构的一台微波离子源,其主要参数是,工作气体:氢气;最高引出电压:75kV;最大引出流强:150mA,束流密度:452mA/cm2 ;质子比约90%。 [0024] For example, the use of a microwave ion source according to the present invention, a novel structure is provided, the main parameter is the working gas: hydrogen; maximum extraction voltage: 75kV; maximum intensity extraction stream: 150mA, current density: 452mA / cm2 ; about 90% by proton ratio. 在引出电压75kV、引出电流IOOmA质子流条件下,运行超过400小时,微波窗8无明显损坏。 In the extraction voltage 75kV, current draw IOOmA proton flow condition, running over 400 hours, no damage to the microwave window 8.

Claims (6)

  1. 1.一种微波离子源,包括波导、放电室、励磁线圈、真空室、引出系统,其中波导通过微波窗同放电室的一端相连,放电室周围缠绕励磁线圈,另一端的离子出口与真空室相通,在离子束引出的通道上设置引出系统,引出系统将离子从放电室引出形成束流,其特征在于,所述的波导内设置一块中分板,中分板与微波窗紧密贴合,中分板内部通冷却水进行强制冷却。 A microwave ion source comprising a waveguide, a discharge chamber, an exciting coil, a vacuum chamber, the extraction system, wherein the waveguide is connected to one end of the microwave window with the discharge chamber, the discharge chamber is wound around the exciting coil, the other end of the vacuum chamber of the ion outlet communication, the channel is provided in the extraction of the ion beam extraction system, the extraction system is formed the ion beam extraction from the discharge chamber, wherein said waveguide is disposed within a carved board, board and carve close contact with the microwave window, carved board internal cooling water through forced cooling.
  2. 2.根据权利要求1所述的一种微波离子源,其特征在于,所述的中分板由金属制成。 2. A microwave ion source according to claim 1, wherein said plate is made of metal equatorial.
  3. 3.根据权利要求2所述的一种微波离子源,其特征在于,所述的中分板用铁磁材料制成。 A microwave ion source according to claim 2, wherein said plate is made of a ferromagnetic material equatorial.
  4. 4.根据权利要求2所述的一种微波离子源,其特征在于,在微波窗的中心位置开设一直径大于返流电子束截面的中心孔。 4. A microwave ion source according to claim 2, characterized in that the central bore defines a larger diameter than the cross section of the electron beam reflux in a central position of the microwave window.
  5. 5.根据权利要求4所述的一种微波离子源,其特征在于,所述的中分板与微波窗相连的一端厚度大于微波窗中心孔的孔径。 A microwave ion source according to claim 4, wherein the thickness of the end plate and the equatorial connected to the microwave window is larger than the pore size of the central hole of the microwave window.
  6. 6.根据权利要求4所述的一种微波离子源,其特征在于,在中分板上与微波窗的中心孔正对的位置开设一个中心孔。 A microwave ion source according to claim 4, wherein the aperture defines a central aperture in the equatorial position of the center plate and facing the microwave window.
CN 201210152561 2012-05-17 2012-05-17 Microwave ion source CN103426706A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201210152561 CN103426706A (en) 2012-05-17 2012-05-17 Microwave ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201210152561 CN103426706A (en) 2012-05-17 2012-05-17 Microwave ion source

Publications (1)

Publication Number Publication Date
CN103426706A true true CN103426706A (en) 2013-12-04

Family

ID=49651296

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201210152561 CN103426706A (en) 2012-05-17 2012-05-17 Microwave ion source

Country Status (1)

Country Link
CN (1) CN103426706A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103956314A (en) * 2014-05-04 2014-07-30 北京大学 Microwave drive cesium-free negative hydrogen ion source
CN106561446A (en) * 2016-10-27 2017-04-19 合肥优亿科机电科技有限公司 Microwave source high-density low-energy ion beam biological modification equipment

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4409520A (en) * 1980-03-24 1983-10-11 Hitachi, Ltd. Microwave discharge ion source
EP0505066A1 (en) * 1991-03-14 1992-09-23 Varian Associates, Inc. Microwave waveguide window
CN1416307A (en) * 2002-12-13 2003-05-07 北京工业大学 Method for averaging plasma by using microwave electron cyclotron resonance
CN1945782A (en) * 2006-11-21 2007-04-11 中国原子能科学研究院 Microwave ion source

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4409520A (en) * 1980-03-24 1983-10-11 Hitachi, Ltd. Microwave discharge ion source
EP0505066A1 (en) * 1991-03-14 1992-09-23 Varian Associates, Inc. Microwave waveguide window
CN1416307A (en) * 2002-12-13 2003-05-07 北京工业大学 Method for averaging plasma by using microwave electron cyclotron resonance
CN1945782A (en) * 2006-11-21 2007-04-11 中国原子能科学研究院 Microwave ion source

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103956314A (en) * 2014-05-04 2014-07-30 北京大学 Microwave drive cesium-free negative hydrogen ion source
CN103956314B (en) * 2014-05-04 2016-02-17 北京大学 A microwave-driven inorganic cesium negative hydrogen ion source
CN106561446A (en) * 2016-10-27 2017-04-19 合肥优亿科机电科技有限公司 Microwave source high-density low-energy ion beam biological modification equipment

Similar Documents

Publication Publication Date Title
US4713585A (en) Ion source
US6250250B1 (en) Multiple-cell source of uniform plasma
US3315125A (en) High-power ion and electron sources in cascade arrangement
Ueno et al. Surface production dominating Cs-free H− ion source for high intensity and high energy proton accelerators
US20040195521A1 (en) Ion sorces
US2934665A (en) Ion source
CN101463763A (en) Magnetically stabilized plasma flow ignition generator
CN103410694A (en) Magnetic field configuration adjustable multistage cusped magnetic plasma thruster
US5078950A (en) Neutron tube comprising a multi-cell ion source with magnetic confinement
CN2377794Y (en) Self-target high-current ceramic neutron tube of microwave ion source
CN101916607A (en) Small neutron source adopting windowless gas target
CN102103972A (en) Vacuum ultraviolet lamp ionization device
CN1589088A (en) Double anode heat plasma generator
CN1494603A (en) Arc evaporator with powerful magnetic guide for targets having large surface area
CN1412343A (en) Bicathode-high frequency glow ion diffusion coating equipment and its process
JP2004523069A (en) Flow field plate geometry
CN101752174A (en) Ionization device of vacuum UV lamp
CN2566580Y (en) High power air plasma generator
CN201568964U (en) Micro-combustor adopting applied electric field
Holland et al. The operation of a glow discharge ion gun used for specimen thinning
JP2001042099A (en) High-frequency negative ion source
CN2898056Y (en) Winding film coating machine
Leung et al. Development of an advanced ‘‘volume’’H− source for neutral beam application
CN201158701Y (en) Coupling magnetic field assisted electric arc ion plating deposition device
CN102196655A (en) Multi-filament wide-beam electronic curtain

Legal Events

Date Code Title Description
C06 Publication
C10 Entry into substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)