CN102916075A - Method for stabilizing wool-making depth - Google Patents

Method for stabilizing wool-making depth Download PDF

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Publication number
CN102916075A
CN102916075A CN2012103733128A CN201210373312A CN102916075A CN 102916075 A CN102916075 A CN 102916075A CN 2012103733128 A CN2012103733128 A CN 2012103733128A CN 201210373312 A CN201210373312 A CN 201210373312A CN 102916075 A CN102916075 A CN 102916075A
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China
Prior art keywords
wool
depth
nozzle
making
pipeline
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Pending
Application number
CN2012103733128A
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Chinese (zh)
Inventor
张若华
杨乐
陆宇峰
姚猛
豆晓波
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Altusvia Energy Taicang Co Ltd
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Altusvia Energy Taicang Co Ltd
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Priority to CN2012103733128A priority Critical patent/CN102916075A/en
Publication of CN102916075A publication Critical patent/CN102916075A/en
Pending legal-status Critical Current

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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The invention discloses a method for stabilizing wool-making depth, wherein a multi-nozzle pipeline with the thick front part and the thin rear part is arranged at the middle part of a wool-making groove of an NIAK machine, the height of liquid sprayed from front to back by nozzles on the multi-nozzle pipeline is the same. According to the method, the multi-nozzle pipeline is adopted to spray liquid uniformly to all points of the wool-making groove, so as to drive the exchange and circulation of solution at all positions of the wool-making groove; the laminar flow phenomenon does not appear in the wool-making groove any more, so that NOX can be distributed in the wool-making groove uniformly; and the fluctuation of the wool-making depth is smaller, so that the wool-making depth is stable.

Description

The stable method of a kind of making herbs into wool degree of depth
Technical field
The present invention relates to a kind of manufacturing process of polycrystalline solar cell, be specifically related to the stable method of a kind of making herbs into wool degree of depth.
Background technology
In the present polycrystalline solar cell manufacturing process, process for etching is a crucial step, and the fine or not direct relation of making herbs into wool outward appearance and the performance of cell piece.The stable of the making herbs into wool degree of depth is the basis of back segment operation, if the making herbs into wool degree of depth is unstable, can affect the interior uniformity of sheet and the sheet resistance fluctuation of diffused sheet resistance; Also can cause the fluctuation of plated film thickness larger, partially thin rubescent or thick turning white partially, affect the outward appearance of cell piece, and the making herbs into wool fluctuation is larger, matte and sintering temperature are not mated, can cause the aluminium bag occurring behind the cell piece sintering, so stablizing of the control making herbs into wool degree of depth is most important, the stable of the making herbs into wool degree of depth is the ready-made basis of subsequent handling.
Polycrystalline silicon texturing adopts acid corrosion, and acid corrosion liquid is HF, HNO 3Mix by a certain percentage with deionized water, wherein HNO 3Be strong oxidizer, in reaction, provide reaction needed hole; The effect of HF is and the intermediate product SiO that reacts 2Reacting generating complex H 2SiF 6Carry out to promote reaction; Water is to having reacted cushioning effect; Also can generate a small amount of HNO in the reaction 2, it can promote the generation of reacting, so this is a kind of self-catalyzed reaction, HNO 2Amount reach capacity post-reacted speed can be highly stable.
Because the chemical reaction of multiple proportioning has occured in the mixed liquor of HF, HNO3 and deionized water, and is as follows:
Si+2HNO 3+6HF=H 2SiF 6+2HNO 2+2H 2O (1)
3Si+4HNO 3+18HF=3H 2SiF 6+4NO+8H 2O (2)
3Si+2HNO 3+18HF=3H 2SiF 6+2NO+4H 2O+3H 2 (3)
5Si+6HNO 3+30HF=5H 2SiF 6+2NO 2+4NO+10H 2O+3H 2 (4)
The intermediate product HNO of process 2Play autocatalysis, if can not keep stable in the production process, can have influence on whole reaction, the fluctuation of the making herbs into wool degree of depth is larger.
The novel NIAK board of RENA solution is circulated in the process of texturing slot by NaOH solution tank NaOH, because circulation is laminar flow, the NOx that produces mainly concentrates on texturing slot top, the bottom is fewer, solution has just formed the different oxynitride layer of many concentration like this, it is saturated only only having the upper strata, but also solution evaporation, taken away by air draft, short time not film releasing making herbs into wool can not continue to produce NOx, and the amount of the NOx in the top solution of polysilicon chip reaction sharply reduces, the making herbs into wool degree of depth also can sharply descend, and affects the stability of making herbs into wool.
The original solution cyclic design of NIAK board is that solution is sprayed in the texturing slot by shower nozzle by tank, but because solution is laminar flow, polysilicon chip only enters texturing slot and the upper solution reaction, the NOx that reaction produces mainly is enriched in the upper solution, NOx concentration is less in lower floor's solution, and the exchange of each layer solution seldom, if in such cases discontinuous film releasing, just can not continue to produce NOx, the NOx in the top layer is easy to volatilization, causes polysilicon chip with solution reaction the time, NOx content is less, the making herbs into wool degree of depth sharply descends, and fully in the situation of average rate, the fluctuation of the making herbs into wool degree of depth is larger in film releasing speed in this kind cyclic design.
Summary of the invention
Goal of the invention: be the deficiency that exists for prior art, provide a kind of making herbs into wool degree of depth stable method.
Technical scheme: for achieving the above object, the invention provides the stable method of a kind of making herbs into wool degree of depth, the NIAK board thick before texturing slot middle part arranges after thin multiinjector pipeline, the height that the nozzle on the described multiinjector pipeline sprays liquid from front to back is identical.
The present invention adopts the each point that sprays into uniformly texturing slot by the multiinjector pipeline, drives exchange, the circulation of solution everywhere in the texturing slot; No longer include the laminar flow phenomenon in the texturing slot, NOx is evenly distributed in texturing slot, in the time of discontinuous film releasing since in the texturing slot everywhere NOx identical and all be in saturated, the quantity not sufficient of the nitrogen oxide that volatilize this moment from solution is to change solution composition, the fluctuation of the making herbs into wool degree of depth is less, makes the making herbs into wool degree of depth stable.
The position of the pipeline of multiinjector described in the present invention top nozzle nozzle be positioned at delivery roller under; The current limliting circle is installed between nozzle and the multi-jet element road pipe body is regulated the height of each road nozzle ejection liquid, just in time be sprayed on the delivery roller, directly be not sprayed onto on the silicon chip, guaranteed the stability, uniformity of polycrystalline silicon texturing.
Beneficial effect: the present invention compared with prior art has the following advantages:
The present invention adopts the each point that sprays into uniformly texturing slot by the multiinjector pipeline, drives exchange, the circulation of solution everywhere in the texturing slot; No longer include the laminar flow phenomenon in the texturing slot, NOx is evenly distributed in texturing slot, in the time of discontinuous film releasing since in the texturing slot everywhere NOx identical and all be in saturated, the quantity not sufficient of the nitrogen oxide that volatilize this moment from solution is to change solution composition, the fluctuation of the making herbs into wool degree of depth is less, makes the making herbs into wool degree of depth stable.
Description of drawings
Fig. 1 is schematic diagram of the present invention.
Fig. 2 is the exemplary plot of changing the liquid cycle in the prior art.
Fig. 3 is the exemplary plot of changing the liquid cycle in the present embodiment.
Fig. 4 is that prior art and the present invention contrast schematic diagram.
Embodiment
Below in conjunction with the drawings and specific embodiments, further illustrate the present invention, present embodiment is implemented under take technical solution of the present invention as prerequisite, should understand these embodiment and only be used for explanation the present invention and be not used in and limit the scope of the invention.
Embodiment
The stable method of a kind of making herbs into wool degree of depth as described in Figure 1, at the thick rear thin multiinjector pipeline 2 before texturing slot 1 middle part arranges of NIAK board, the height that the nozzle 3 on the described multiinjector pipeline sprays liquid from front to back is identical; The position of described multiinjector pipeline 2 top nozzles 3 nozzles be positioned at delivery roller 5 under; The current limliting circle is installed between nozzle and multiinjector pipeline 2 pipe bodies is regulated the height of each road nozzle ejection liquid, just in time be sprayed on the delivery roller 5, directly be not sprayed onto on the silicon chip.
Be exemplary plot of changing the liquid cycle in the prior art such as Fig. 2; One is changed the liquid cycle and produces 8 groups of super control lines of loss of weight are arranged in 796 groups of silicon chips, and 555 groups of making herbs into wool degree of depth account for 69.7% 3.5~3.7;
Fig. 3 is exemplary plot of changing the liquid cycle of the present invention; One is changed in 524 groups of liquid cycles super control line not, and wherein 428 groups of making herbs into wool degree of depth account for 81.68% between 3.5~3.7.
Average 2~3 groups just need process adjustments once in the prior art; In a single day stable substantially the needs regulated among the present invention.
In the prior art, the standby 5min loss of weight 0.08g that descended under the belt speed of 2.1m/min.
Standby 5min loss of weight decline 0.01g under the belt speed of 2.1m/min in the present embodiment; 2.28m/min belt speed under loss of weight decline 0.02g, obviously be better than prior art, guaranteed the raising (such as Fig. 3) of the stable and battery performance of subsequent handling.

Claims (2)

1. method that the making herbs into wool degree of depth is stable is characterized in that: the NIAK board texturing slot (1) middle part arrange front thick after thin multiinjector pipeline (2), the height that the nozzle (3) on the described multiinjector pipeline sprays liquid from front to back is identical.
2. the stable method of a kind of making herbs into wool degree of depth according to claim 1 is characterized in that: the position of described multiinjector pipeline (2) top nozzle (3) nozzle be positioned at delivery roller (5) under; The current limliting circle is installed between nozzle and multiinjector pipeline (2) pipe body is regulated the height of each road nozzle ejection liquid, just in time be sprayed on the delivery roller (5), directly be not sprayed onto on the silicon chip.
CN2012103733128A 2012-09-27 2012-09-27 Method for stabilizing wool-making depth Pending CN102916075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2012103733128A CN102916075A (en) 2012-09-27 2012-09-27 Method for stabilizing wool-making depth

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Application Number Priority Date Filing Date Title
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CN102916075A true CN102916075A (en) 2013-02-06

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0732424A1 (en) * 1995-03-15 1996-09-18 Gebr. Schmid GmbH & Co. Method and apparatus for heating plate like articles, in particular printed circuit boards
WO2008145231A2 (en) * 2007-05-25 2008-12-04 Gebr. Schmid Gmbh & Co. Method for treating silicon wafers, corresponding treatment liquid and thus treated silicon wafer
CN101331584A (en) * 2005-12-16 2008-12-24 吉布尔·施密德有限责任公司 Device and method for treating the surfaces of substrates
CN101495242A (en) * 2005-12-16 2009-07-29 吉布尔.施密德有限责任公司 Device, system and method for treating the surfaces of substrates
TW201128696A (en) * 2009-09-25 2011-08-16 Toshiba Kk Cleaning method, cleaning system, and method for manufacturing microstructure
CN102695821A (en) * 2009-10-09 2012-09-26 吉布尔·施密德有限责任公司 Method and installation for producing metallised semiconductor substrates

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0732424A1 (en) * 1995-03-15 1996-09-18 Gebr. Schmid GmbH & Co. Method and apparatus for heating plate like articles, in particular printed circuit boards
CN101331584A (en) * 2005-12-16 2008-12-24 吉布尔·施密德有限责任公司 Device and method for treating the surfaces of substrates
CN101495242A (en) * 2005-12-16 2009-07-29 吉布尔.施密德有限责任公司 Device, system and method for treating the surfaces of substrates
WO2008145231A2 (en) * 2007-05-25 2008-12-04 Gebr. Schmid Gmbh & Co. Method for treating silicon wafers, corresponding treatment liquid and thus treated silicon wafer
TW201128696A (en) * 2009-09-25 2011-08-16 Toshiba Kk Cleaning method, cleaning system, and method for manufacturing microstructure
CN102695821A (en) * 2009-10-09 2012-09-26 吉布尔·施密德有限责任公司 Method and installation for producing metallised semiconductor substrates

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Application publication date: 20130206