CN207756132U - A kind of plasma chemical vapor reaction prepares silicon nitride device - Google Patents
A kind of plasma chemical vapor reaction prepares silicon nitride device Download PDFInfo
- Publication number
- CN207756132U CN207756132U CN201721772463.5U CN201721772463U CN207756132U CN 207756132 U CN207756132 U CN 207756132U CN 201721772463 U CN201721772463 U CN 201721772463U CN 207756132 U CN207756132 U CN 207756132U
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- Prior art keywords
- silicon nitride
- chemical vapor
- babinet
- plasma chemical
- support column
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Abstract
The utility model discloses a kind of plasma chemical vapor reactions to prepare silicon nitride device, including support column, mounting bracket, react babinet, internal circulation apparatus, tremie pipe partition board and filtration body, support column is installed on the outside of the mounting bracket, the support column is contemptible to be equipped with support foot, reaction babinet is plugged with inside the mounting bracket, the reaction box house middle position is equipped with filtration body, it is provided with sheet frame on the outside of the filtration body, filter screen is installed inside the sheet frame, the sheet frame side is equipped with handle, the reaction box house top is equipped with internal circulation apparatus, the internal circulation apparatus upper end is provided with gas pressure pump, the gas pressure pump side is equipped with taper air intake duct, the gas pressure pump lower end is equipped with ammonia recycle pipe.The utility model can effectively be utilized ammonia by the internal circulation apparatus of ammonia, reused, kept reaction more thorough, obtained silicon nitride is purer.
Description
Technical field
The utility model is related to the equipment technical field that plasma (orifice) gas phase reaction prepares silicon nitride, specially a kind of plasma
Body gas phase reaction prepares silicon nitride device.
Background technology
Plasma chemical vapor refers to silicon chloride and ammonia simultaneous reactions, chlorination pasc reaction is generated silicon nitride, to convenient
It carries out preparing silicon nitride film, the solar panel for producing solar energy, ammonia, which is passed into storage, to be had in the babinet of silicon chloride, ammonia
Gas moves upwards, and is moved to the inner tip of equipment, just can not be in the reaction for carrying out next step, this is just wasted largely
Ammonia makes old for preparing silicon nitride and gets higher, it is therefore desirable to which a kind of equipment, can recycle ammonia.
Utility model content
The purpose of this utility model is to provide a kind of plasma chemical vapor reactions to prepare silicon nitride device, and having can incite somebody to action
The problem of the advantages of ammonia is recycled solves present equipment after city north, and ammonia can only utilize one time.
To achieve the above object, the utility model provides the following technical solutions：A kind of plasma chemical vapor reaction prepares nitrogen
SiClx device, including support column, mounting bracket, reaction babinet, internal circulation apparatus, tremie pipe partition board and filtration body, the installation
Support column is installed on the outside of frame, the support column is contemptible to be equipped with support foot, and reaction babinet is plugged with inside the mounting bracket,
The reaction box house middle position is equipped with filtration body, and sheet frame, the sheet frame are provided on the outside of the filtration body
Inside is equipped with filter screen, and the sheet frame side is equipped with handle, and the reaction box house top is equipped with internal circulation apparatus,
The internal circulation apparatus upper end is provided with gas pressure pump, and the gas pressure pump side is equipped with taper air intake duct, the gas
Body compression pump lower end is equipped with ammonia recycle pipe.
Preferably, there are four the support foot and support column are all provided with, and four support foots and support column are divided into peace
At the position for shelving four angles.
Preferably, the reaction babinet lower end side is equipped with wastewater outlet pipe.
Preferably, the filtration body lower end is equipped with limited block.
Preferably, tremie pipe partition board is installed above the filtration body.
Preferably, the filtration body and blanking partition board side middle position are equipped with and pick and place door.
Preferably, the reaction babinet top is equipped with the gas overflow valve being equally spaced, and gas overflow valve is equipped with altogether
Three.
Compared with prior art, the beneficial effects of the utility model are as follows：
1, the utility model has reached by the way that tremie pipe partition board and filtration body is arranged and had carried out the solution that reaction terminates
The effect of filter, by opening the valve of tremie pipe, the solution after enabling upper end to react flows down, by filtration body into
Row filtering, by the reaction of cycle, makes to generate many silicon nitrides inside silicon chloride to obtain more pure silicon nitride,
It is filtered again, the improved efficiency of preparation can be made.
2, the utility model by be arranged internal circulation apparatus, achieved the effect that recycle ammonia, pass through by
An opening is picked and placeed, filtration body is installed, by the way that the sheet frame of filtration body is placed into limited block upper end, you can by sheet frame
It is fixed, then door will be picked and placeed and shut, silicon chloride solution is first passed into the upper end of reaction box house by ammonia imports pipe,
It is passed through ammonia again, is reacted, when ammonia rises to reaction box house top by silicon chloride solution, by interior
Circulator recycles ammonia, will be sucked by ammonia by gas pressure pump, then is sprayed onto chlorine by ammonia recycle pipe
SiClx solution bottom, is reacted again, until silicon chloride reacts completely, is stopped, by the way that internal circulation apparatus, energy is arranged
The normal operation of enough effective guarantee equipment, and the using effect of ammonia can be reached best.
Description of the drawings
Fig. 1 is the main structure diagram of the utility model；
Fig. 2 is the internal circulation apparatus main structure diagram of the utility model；
Fig. 3 is the filtration body main structure diagram of the utility model.
In figure：Support foot；2- support columns；3- mounting brackets；4- limited blocks；5- ammonia imports pipes；6- reacts babinet；7-
Internal circulation apparatus；8- gas overflow valves；9- tremie pipe partition boards；10- picks and places door；11- filtration bodies；12- wastewater outlet pipes；13-
Taper air intake duct；14- gas pressure pumps；15- ammonia recycle pipes；16- sheet frames；17- handles；18- filter screens.
Specific implementation mode
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
The every other embodiment obtained, shall fall within the protection scope of the present invention.
It please refers to Fig.1 to 3, a kind of embodiment provided by the utility model：A kind of plasma chemical vapor reaction preparation nitridation
Silicon device, including support column 2, mounting bracket 3, reaction babinet 6, internal circulation apparatus 7, tremie pipe partition board 9 and filtration body 11, installation
The outside of frame 3 is equipped with support column 2, and support column 2 is contemptible to be equipped with support foot 1, there are four support foot 1 and support column 2 are all provided with,
And four support foots 1 and support column 2 are divided at the position at 3 four angles of mounting bracket, and reaction babinet is plugged with inside mounting bracket 3
6,6 lower end side of reaction babinet is equipped with wastewater outlet pipe 12, and reaction babinet is equipped with filtration body at 6 bosom position
11,11 lower end of filtration body is equipped with limited block 4, and 11 top of filtration body is equipped with tremie pipe partition board 9, by by tremie pipe
Valve is opened, and the solution after enabling upper end to react flows down, and is filtered by filtration body 11, more pure to obtain
Net silicon nitride makes to generate many silicon nitrides inside silicon chloride, then be filtered, can make preparation by the reaction of cycle
Improved efficiency, filtration body 11 and 9 side middle position of blanking partition board be equipped with and pick and place door 10, and 11 outside of filtration body is set
It is equipped with sheet frame 16, filter screen 18 is installed inside sheet frame 16,16 side of sheet frame is equipped with handle 17, reacts 6 inner tip of babinet
Internal circulation apparatus 7 is installed, is opened by the way that door 10 will be picked and placeed, filtration body 11 is installed, by by filtration body 11
Sheet frame 16 is placed into 4 upper end of limited block, you can sheet frame 16 is fixed, then will pick and place door 10 and shut, passes through ammonia imports pipe 5
Silicon chloride solution is first passed into the upper end inside reaction babinet 6, then is passed through ammonia, is reacted, when ammonia passes through silicon chloride
Ammonia is recycled by internal circulation apparatus 7 when rising to reaction 6 inner tip of babinet, passes through gas by solution
Compression pump 14 will be sucked by ammonia, then be sprayed onto silicon chloride solution bottom by ammonia recycle pipe 1, be reacted again, until
After silicon chloride reaction completely, stops, by the way that internal circulation apparatus 7 is arranged, can effectively ensure that the normal operation of equipment, and energy
Enough that the using effect of ammonia is reached best, 7 upper end of internal circulation apparatus is provided with gas pressure pump 14,14 side of gas pressure pump
Taper air intake duct 13 is installed, 14 lower end of gas pressure pump is equipped with ammonia recycle pipe 15, and 6 top of reaction babinet is equipped with equidistantly
The gas overflow valve 8 of distribution, and there are three gas overflow valve 8 sets altogether.
Operation principle：In utility model works, user is opened by that will pick and place door 10, and filtration body 11 is pacified
Dress, by the way that the sheet frame 16 of filtration body 11 is placed into 4 upper end of limited block, you can sheet frame 16 is fixed, then door will be picked and placeed
10 shut, and silicon chloride solution are first passed into the upper end inside reaction babinet 6 by ammonia imports pipe 5, then be passed through ammonia, carried out
Reaction, when ammonia rises to reaction 6 inner tip of babinet by silicon chloride solution, by internal circulation apparatus 7 by ammonia
It is recycled, will be sucked by ammonia by gas pressure pump 14, then silicon chloride solution bottom is sprayed onto by ammonia recycle pipe 1
Portion is reacted again, until silicon chloride reacts completely, is stopped, being crossed and open the valve of tremie pipe, upper end is made to react
Later solution can flow down, and be filtered by filtration body 11, so far, whole to obtain more pure silicon nitride
The workflow of a equipment is completed.
It is obvious to a person skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and
And without departing substantially from the spirit or essential attributes of the utility model, it can realize that this practicality is new in other specific forms
Type.Therefore, in all respects, the present embodiments are to be considered as illustrative and not restrictive, this practicality is new
The range of type is indicated by the appended claims rather than the foregoing description, it is intended that containing in the equivalent requirements of the claims will be fallen
All changes in justice and range are embraced therein.Any reference numeral in claim should not be considered as limitation
Involved claim.
Claims (7)
1. a kind of plasma chemical vapor reaction prepares silicon nitride device, including support column (2), mounting bracket (3), reaction babinet (6),
Internal circulation apparatus (7), tremie pipe partition board (9) and filtration body (11), it is characterised in that：It is equipped on the outside of the mounting bracket (3)
Support column (2), the support column (2) is contemptible to be equipped with support foot (1), and reaction babinet is plugged with inside the mounting bracket (3)
(6), filtration body (11) is installed at reaction babinet (6) the bosom position, is arranged on the outside of the filtration body (11)
There is sheet frame (16), filter screen (18) is installed inside the sheet frame (16), sheet frame (16) side is equipped with handle (17), institute
It states reaction babinet (6) inner tip and internal circulation apparatus (7) is installed, internal circulation apparatus (7) upper end is provided with gas pressure
It pumps (14), gas pressure pump (14) side is equipped with taper air intake duct (13), gas pressure pump (14) the lower end installation
There is ammonia recycle pipe (15).
2. a kind of plasma chemical vapor reaction according to claim 1 prepares silicon nitride device, it is characterised in that：It is described anti-
There are four sliding stabilizer blade (1) and support column (2) are all provided with, and four support foots (1) and support column (2) are divided into mounting bracket (3) four
At the position at a angle.
3. a kind of plasma chemical vapor reaction according to claim 1 prepares silicon nitride device, it is characterised in that：It is described anti-
Answer babinet (6) lower end side that wastewater outlet pipe (12) is installed.
4. a kind of plasma chemical vapor reaction according to claim 1 prepares silicon nitride device, it is characterised in that：The mistake
Filter main body (11) lower end is equipped with limited block (4).
5. a kind of plasma chemical vapor reaction according to claim 1 prepares silicon nitride device, it is characterised in that：The mistake
Tremie pipe partition board (9) is installed above filter main body (11).
6. a kind of plasma chemical vapor reaction according to claim 1 prepares silicon nitride device, it is characterised in that：The mistake
Filter main body (11) and blanking partition board (9) side middle position, which is equipped with, picks and places door (10).
7. a kind of plasma chemical vapor reaction according to claim 1 prepares silicon nitride device, it is characterised in that：It is described anti-
Answer babinet (6) top that the gas overflow valve (8) being equally spaced is installed, and there are three gas overflow valve (8) sets altogether.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721772463.5U CN207756132U (en) | 2017-12-18 | 2017-12-18 | A kind of plasma chemical vapor reaction prepares silicon nitride device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721772463.5U CN207756132U (en) | 2017-12-18 | 2017-12-18 | A kind of plasma chemical vapor reaction prepares silicon nitride device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207756132U true CN207756132U (en) | 2018-08-24 |
Family
ID=63187012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721772463.5U Expired - Fee Related CN207756132U (en) | 2017-12-18 | 2017-12-18 | A kind of plasma chemical vapor reaction prepares silicon nitride device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207756132U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110026063A (en) * | 2019-05-25 | 2019-07-19 | 安徽顺达环保科技股份有限公司 | A kind of flue gas desulfurization and denitrification processing unit of cycle multistage processing |
-
2017
- 2017-12-18 CN CN201721772463.5U patent/CN207756132U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110026063A (en) * | 2019-05-25 | 2019-07-19 | 安徽顺达环保科技股份有限公司 | A kind of flue gas desulfurization and denitrification processing unit of cycle multistage processing |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180824 Termination date: 20181218 |