CN102910830A - Quartz crystal wafer corrosion machine - Google Patents
Quartz crystal wafer corrosion machine Download PDFInfo
- Publication number
- CN102910830A CN102910830A CN2012104591919A CN201210459191A CN102910830A CN 102910830 A CN102910830 A CN 102910830A CN 2012104591919 A CN2012104591919 A CN 2012104591919A CN 201210459191 A CN201210459191 A CN 201210459191A CN 102910830 A CN102910830 A CN 102910830A
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- corrosion
- cleaning
- liquid pool
- corrosive fluid
- pool
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- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a quartz crystal wafer corrosion machine which comprises a box body, wherein the box body is internally provided with a corrosion liquid pool and a cleaning pool; an automatic cleaning swing mechanism is arranged on a table board between the corrosion liquid pool and the cleaning pool; the upper end of a support arm of the automatic cleaning swing mechanism is connected with a crossbeam through a rotating shaft; the front end of the crossbeam is connected with a cleaning frame for placing a wafer basket; the crossbeam is internally provided with a driving gear and a driven gear which are meshed with each other; the driving gear is connected with a driving motor output shaft on the crossbeam; the driven gear is connected with the cleaning frame; and a corrosion liquid spray head which is connected with the corrosion liquid pool and a cleaning liquid spray head which is connected with the cleaning pool are respectively arranged above the corrosion liquid pool and the cleaning pool. According to the quartz crystal wafer corrosion machine, the automatic cleaning swing mechanism is arranged, so that the cleaning frame is capable of driving the wafer basket to alternate between the corrosion liquid pool and the cleaning pool and automatically rotates 360 DEG, the cleaning and the corrosion are more even, the manual operation is replaced, the work efficiency is improved and the labor intensity of the workers is reduced.
Description
Technical field
The present invention relates to a kind of quartz crystal wafer corrosion machine.
Background technology
Quartz crystal wafer corrosion machine is for to etching, during use, crystal wafer is contained in wafer basket, then is placed in the corrosion liquid pool, shakes wafer basket wafer is corroded, and wafer basket is placed in the service sink after corroding again, and shakes and cleans.All be to take wafer basket with hand in the prior art, manually shake and clean, make that labor strength is large in this way, production efficiency is low.
Summary of the invention
Technical problem to be solved by this invention is for the deficiencies in the prior art, provides a kind of rational in infrastructure, and production efficiency is high, need not the quartz crystal wafer corrosion machine of artificial automatic operation.
Technical problem to be solved by this invention is to realize by following technical scheme, the present invention is a kind of quartz crystal wafer corrosion machine, comprise casing, be provided with corrosion liquid pool and service sink in the casing, be characterized in: the table top between corrosion liquid pool and service sink is provided with automatic cleaning tilting mechanism, described automatic cleaning tilting mechanism comprises the support arm that is connected and drives its lifting with cylinder, the support arm upper end is connected with crossbeam by rotating shaft, the front end of crossbeam is connected with the rack for cleaning that holds wafer basket, be provided with intermeshing driving toothed gear and follower gear in the described crossbeam, driving toothed gear links to each other with drive-motor output shaft on the crossbeam, and follower gear and rack for cleaning join;
Above corrosion liquid pool and service sink, be respectively equipped with corrosive fluid spray header and scavenging solution spray header, the corrosive fluid spray header is connected with the corrosion liquid pool by the corrosive fluid pipeline, the corrosive fluid pipeline is provided with the corrosive fluid spray pump, the scavenging solution spray header links to each other with service sink by the scavenging solution pipeline, and detergent line is provided with the scavenging solution spray pump.
Technical problem to be solved by this invention can also further realize by following technical scheme, and described casing is provided with the corrosive fluid storage pool outward, is provided with the corrosive fluid circulation line between corrosive fluid storage pool and the corrosion liquid pool, and circulation line is provided with recycle pump.
Technical problem to be solved by this invention can also further realize by following technical scheme, and the bottom of described corrosion liquid pool is provided with the corrosive fluid heating unit.
Technical problem to be solved by this invention can also further realize by following technical scheme, and described corrosion liquid pool below is provided with and the mixing pump of corroding liquid pool and being communicated with.
Technical problem to be solved by this invention can also further realize by following technical scheme, and described casing is provided with action pane, and action pane is provided with viewing window.
Technical problem to be solved by this invention can also further realize by following technical scheme, and the top of described casing is provided with suction opening, and suction opening is connected by the outer vacuum fan of induced exhaust and casing.
Compared with prior art, the present invention cleans tilting mechanism automatically by installing, can make rack for cleaning drive wafer basket alternately rotates at corrosion liquid pool and service sink, drive driving toothed gear and follower gear by drive-motor simultaneously, make rack for cleaning realize 360 ° of automatic rotations, clean, corrode more even, thereby replaced manual operation, improved working efficiency, reduced labor strength, spray from the top down by corrosive fluid spray header and scavenging solution spray header and can make quartz wafer corrosion evenly, washing evenly.
Description of drawings
Fig. 1 is structural representation of the present invention.
Fig. 2 is the left TV structure schematic diagram of Fig. 1.
Embodiment
Referring to accompanying drawing, further describe concrete technical scheme of the present invention, so that those skilled in the art understands the present invention further, and do not consist of its Copyright law.
With reference to accompanying drawing, a kind of quartz crystal wafer corrosion machine, comprise casing 1, be provided with corrosion liquid pool 10 and service sink 8 in the casing 1, corrosion liquid pool 10 is pickling tub, service sink 8 is washing pool, table top between corrosion liquid pool 10 and service sink 8 is provided with automatic cleaning tilting mechanism, described automatic cleaning tilting mechanism comprises the support arm 12 that is connected and drives its lifting with cylinder, support arm 12 upper ends are connected with crossbeam 14 by rotating shaft, crossbeam 14 can rotate back and forth swing above corrosion liquid pool 10 and service sink 8, the front end of crossbeam 14 is connected with the rack for cleaning 9 that holds wafer basket, is provided with intermeshing driving toothed gear 5 and follower gear 13 in the described crossbeam 14, and driving toothed gear 5 links to each other with drive-motor output shaft on the crossbeam 14, follower gear 13 joins with rack for cleaning 9, realizes 360 ° of rotations thereby can drive rack for cleaning 9.
Above corrosion liquid pool 10 and service sink 8, be respectively equipped with corrosive fluid spray header 4 and scavenging solution spray header 7, corrosive fluid spray header 4 is connected with corrosion liquid pool 10 by corrosive fluid pipeline 2, corrosive fluid pipeline 2 is provided with the corrosive fluid spray pump, scavenging solution spray header 7 links to each other with service sink 8 by scavenging solution pipeline 6, detergent line is provided with the scavenging solution spray pump, can corrosive fluid or scavenging solution be sprayed from corrosive fluid spray header 4 or scavenging solution spray header 7 by corrosive fluid spray pump or scavenging solution spray pump, thereby make the quartz wafer corrosion or clean more even.
The casing 1 outer corrosive fluid storage pool 3 that is provided with is provided with corrosive fluid circulation line 11 between corrosive fluid storage pool 3 and the corrosion liquid pool 10, and circulation line is provided with recycle pump.When being cold, prevent that corrosive fluid from freezing, should this can prevent from freezing by corrosive fluid is circulated, also can be provided with heating unit in the corrosive fluid storage pool 3.
The bottom of corrosion liquid pool 10 is provided with the corrosive fluid heating unit, can start the corrosive fluid heating unit when the corrosive fluid temperature is low, and the corrosive fluid heating unit can be electric stove wire.
Corrosion liquid pool 10 belows are provided with and the mixing pump of corroding liquid pool 10 and being communicated with, start mixing pump, and corrosive fluid circulates in corrosion liquid pool 10 and can make corrosive fluid temperature and concentration even.
The top of casing 1 is provided with suction opening, and suction opening is connected with casing 1 vacuum fan outward by induced exhaust, the corrosive fluid fog in the casing 1 can be extracted out, the anti-damage operator's.
Claims (6)
1. quartz crystal wafer corrosion machine, comprise casing, be provided with corrosion liquid pool and service sink in the casing, it is characterized in that: the table top between corrosion liquid pool and service sink is provided with automatic cleaning tilting mechanism, described automatic cleaning tilting mechanism comprises the support arm that is connected and drives its lifting with cylinder, the support arm upper end is connected with crossbeam by rotating shaft, the front end of crossbeam is connected with the rack for cleaning that holds wafer basket, be provided with intermeshing driving toothed gear and follower gear in the described crossbeam, driving toothed gear links to each other with drive-motor output shaft on the crossbeam, and follower gear and rack for cleaning join;
Above corrosion liquid pool and service sink, be respectively equipped with corrosive fluid spray header and scavenging solution spray header, the corrosive fluid spray header is connected with the corrosion liquid pool by the corrosive fluid pipeline, the corrosive fluid pipeline is provided with the corrosive fluid spray pump, the scavenging solution spray header links to each other with service sink by the scavenging solution pipeline, and detergent line is provided with the scavenging solution spray pump.
2. quartz crystal wafer corrosion machine according to claim 1, it is characterized in that: described casing is provided with the corrosive fluid storage pool outward, is provided with the corrosive fluid circulation line between corrosive fluid storage pool and the corrosion liquid pool, and circulation line is provided with recycle pump.
3. quartz crystal wafer corrosion machine according to claim 1, it is characterized in that: the bottom of described corrosion liquid pool is provided with the corrosive fluid heating unit.
4. quartz crystal wafer corrosion machine according to claim 1 is characterized in that: described corrosion liquid pool below is provided with and the mixing pump of corroding liquid pool and being communicated with.
5. quartz crystal wafer corrosion machine according to claim 1, it is characterized in that: described casing is provided with action pane, and action pane is provided with viewing window.
6. quartz crystal wafer corrosion machine according to claim 1, it is characterized in that: the top of described casing is provided with suction opening, and suction opening is connected by the outer vacuum fan of induced exhaust and casing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210459191.9A CN102910830B (en) | 2012-11-15 | 2012-11-15 | Quartz crystal wafer corrosion machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201210459191.9A CN102910830B (en) | 2012-11-15 | 2012-11-15 | Quartz crystal wafer corrosion machine |
Publications (2)
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CN102910830A true CN102910830A (en) | 2013-02-06 |
CN102910830B CN102910830B (en) | 2016-01-06 |
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Application Number | Title | Priority Date | Filing Date |
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CN201210459191.9A Expired - Fee Related CN102910830B (en) | 2012-11-15 | 2012-11-15 | Quartz crystal wafer corrosion machine |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106637419A (en) * | 2016-12-27 | 2017-05-10 | 重庆晶宇光电科技有限公司 | Corrosion device for wafers |
CN106746699A (en) * | 2016-12-28 | 2017-05-31 | 重庆晶宇光电科技有限公司 | Quartz wafer corrosion device |
CN109371456A (en) * | 2018-10-17 | 2019-02-22 | 山东博达光电有限公司 | The corrosion device and caustic solution of synthetic quartzcrystal seed wafer |
CN109592905A (en) * | 2019-01-02 | 2019-04-09 | 中国科学院上海光学精密机械研究所 | The conformal acid dip pickle and cleaning method of heavy-calibre planar element |
CN110473818A (en) * | 2019-09-25 | 2019-11-19 | 广东先导先进材料股份有限公司 | A kind of chip automatic corrosion sprinkling equipment |
CN115159855A (en) * | 2022-07-22 | 2022-10-11 | 重庆华渝电气集团有限公司 | Full-automatic swing piece corrosion equipment |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07315872A (en) * | 1994-03-31 | 1995-12-05 | Shinetsu Quartz Prod Co Ltd | Method for processing surface of quartz glass |
CN201272743Y (en) * | 2008-05-28 | 2009-07-15 | 深圳泰美克晶体技术有限公司 | Quartz wafer etching machine |
CN101837355A (en) * | 2010-04-30 | 2010-09-22 | 唐山晶源裕丰电子股份有限公司 | Quartz crystal post cleaning device |
-
2012
- 2012-11-15 CN CN201210459191.9A patent/CN102910830B/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07315872A (en) * | 1994-03-31 | 1995-12-05 | Shinetsu Quartz Prod Co Ltd | Method for processing surface of quartz glass |
CN201272743Y (en) * | 2008-05-28 | 2009-07-15 | 深圳泰美克晶体技术有限公司 | Quartz wafer etching machine |
CN101837355A (en) * | 2010-04-30 | 2010-09-22 | 唐山晶源裕丰电子股份有限公司 | Quartz crystal post cleaning device |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106637419A (en) * | 2016-12-27 | 2017-05-10 | 重庆晶宇光电科技有限公司 | Corrosion device for wafers |
CN106746699A (en) * | 2016-12-28 | 2017-05-31 | 重庆晶宇光电科技有限公司 | Quartz wafer corrosion device |
CN109371456A (en) * | 2018-10-17 | 2019-02-22 | 山东博达光电有限公司 | The corrosion device and caustic solution of synthetic quartzcrystal seed wafer |
CN109592905A (en) * | 2019-01-02 | 2019-04-09 | 中国科学院上海光学精密机械研究所 | The conformal acid dip pickle and cleaning method of heavy-calibre planar element |
CN110473818A (en) * | 2019-09-25 | 2019-11-19 | 广东先导先进材料股份有限公司 | A kind of chip automatic corrosion sprinkling equipment |
CN115159855A (en) * | 2022-07-22 | 2022-10-11 | 重庆华渝电气集团有限公司 | Full-automatic swing piece corrosion equipment |
CN115159855B (en) * | 2022-07-22 | 2023-10-27 | 重庆华渝电气集团有限公司 | Full-automatic swing piece corrosion equipment |
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CN102910830B (en) | 2016-01-06 |
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