CN109592905A - The conformal acid dip pickle and cleaning method of heavy-calibre planar element - Google Patents
The conformal acid dip pickle and cleaning method of heavy-calibre planar element Download PDFInfo
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- CN109592905A CN109592905A CN201910000562.9A CN201910000562A CN109592905A CN 109592905 A CN109592905 A CN 109592905A CN 201910000562 A CN201910000562 A CN 201910000562A CN 109592905 A CN109592905 A CN 109592905A
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- China
- Prior art keywords
- heavy
- descaling bath
- planar element
- rinsing bowl
- calibre planar
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
Abstract
A kind of conformal acid dip pickle and cleaning method of heavy-calibre planar element, the cleaning device includes a fixed cross beam, balancing pole, balance weight, frock clamp, rinsing bowl, the first descaling bath, the second descaling bath, first circulation pump, second circulation pump, pure water slot, third circulating pump and wastewater trough, the present invention can realize efficient surface acid-washing under the premise of holding heavy-calibre planar element original face shape.
Description
Technical field
The present invention relates to heavy-calibre planar element, the conformal acid dip pickle of especially a kind of heavy-calibre planar element and cleaning
Method.
Background technique
Surface laser damages the service life for reducing optical element in high energy laser system, works in frequency tripled laser spoke
The resisting laser damage ability of fused quartz device according under more limits the maximum output flux of system.Damage is lacked originating from sub-surface
Sunken sub- with gap optical absorption, wherein absorbability defect, i.e. chemical impurity in polishing layer (also referred to as Beilby layers), as Ce,
La, Al, Cu, Fe etc. show very strong Asia with gap absorption characteristic, are main wound inducement sources.
With the fast development of modern science and technology, the optical element being applied in various optical systems is proposed more next
Higher requirement.For large-sized optical elements (being about 810mm, wide about 430mm, thickness about 90mm), traditional processing method, such as
Plasticity grinding, chemical polishing, floating polishing etc., polishing efficiency is lower, or polishing is not easy to control, and certain lack is individually present
It falls into.For rice magnitude optical element, mainly by annular polishing technology, and annular polishing technology work in-process can have astigmatism,
Machining accuracy is not high.The introducing very good solution of Magnetorheological Polishing problem above.Magnetorheological Polishing is to utilize Magnetorheological Polishing
Rheological characteristic of the liquid in magnetic field carries out the technology of local shape modifications and polishing to workpiece.Magnetorheological fluid by carrier fluid (such as water, silicone oil etc.),
Carbonyl iron dust, surfactant, polishing particles and the additive composition with other function.Magnetorheological fluid is by polishing disk tape loop
In the polishing area for entering the small spacing formed between workpiece and polishing disk, in the region, magnetorheological fluid is in high-gradient magnetic field
Under effect, rheological effect occurring and is hardened, viscosity increase, magnetic-particle therein arranges chaining along the direction of magnetic field strength,
The effigurate raised ribbon of tool is formed, and polishing powder particles therein do not have magnetism, therefore can be extruded and float to magnetic
The weak top of field intensity, the raised ribbon for floating one layer of polishing particles above so just constitute one " flexible polishing mould ", when
When the flexible polishing mould flows through the small―gap suture that workpiece and moving coil are formed under the drive of moving coil, workpiece surface can be generated very
Big shearing force is realized workpiece surface material and is removed.In whole process, magnetorheological fluid is controlled by the circulatory system, is deposited
Storage is pumped into output pipe by output, then be sprayed on polishing disk by nozzle, after leaving machining area in the comprehensive container tank of aluminum
Magnetorheological fluid by recovery pump by recovery pipe, be recovered in comprehensive container tank.
Although Magnetorheological Polishing has apparent advantage, during the polishing process, iron powder in terms of stability and certainty
Meeting embedded plane element surface about 45nm, forms induced damage source, seriously affects the antibody Monoclonal threshold value of element.Pickling can be effective
Promote the damage-retardation Flaw characterization of fused quartz, HF and NH4Fluorine ion (F in F mixed aqueous solution-) and two fluorine ion (HF2-) corrode and melt
Quartz surfaces generate stable fluosilicic acid radical ion Pass through element surface
Uniform etching, the iron powder in polishing layer is removed with polishing layer.The material of surface 60nm is etched away, can remove embedding in polishing layer
Iron powder in sub-surface crackle eliminates point damage, and improves damage threshold to a certain extent.At present still without for such as
This large-size components carries out simple, efficiently and quickly pickling relevant report under the premise of not destroying original face shape.
Summary of the invention
The object of the present invention is to provide a kind of conformal acid dip pickle of heavy-calibre planar element and cleaning method, pickling dresses
To set can carry out quantitative pickling to heavy-calibre planar element and not change the original face shape of element, with easy to operate and rapidly and efficiently
Feature.
Technical solution of the invention is as follows:
A kind of conformal acid dip pickle of heavy-calibre planar element, it is characterized in that: including a fixed cross beam, under the crossbeam
A balancing pole is hung, one end of the balancing pole hangs element and frock clamp to be cleaned, and the other end is loaded with certain amount balance
Block, the total weight of the balance weight are slightly smaller than element and frock clamp to be cleaned, in the element and frock clamp to be cleaned
Lower section sets the first descaling bath, the second descaling bath and rinsing bowl, and the first descaling bath and the second descaling bath are connected in bottom, described
Descaling bath is provided with hydrofluoric acid and ammonium fluoride mixed aqueous solution, and one end of first circulation pump is connected to the first pickling by plastic conduit
Slot, the other end are connected to the second descaling bath by plastic conduit, and two end interfaces are below liquid level in slot；On on the outside of the rinsing bowl
Port is sequentially connected second circulation pump by pipeline and pure water slot, lower port are sequentially connected third circulating pump and waste water by pipeline
Slot, is equipped with deionized water in the rinsing bowl, and the upper and lower port is below the liquid level of the rinsing bowl.
The hydrofluoric acid and ammonium fluoride mixed aqueous solution, wherein the weight percent of hydrofluoric acid is 1-2wt%, ammonium fluoride
Weight percent be 10-20wt%.
First descaling bath, the second descaling bath and the rinsing bowl is made of polytetrafluoroethylene material, the tooling folder
Have by coating the stainless steel material of polytetrafluoroethylene (PTFE) and being made.
Using the conformal acid dip pickle of heavy-calibre planar element to the cleaning method of heavy-calibre planar element, including following step
It is rapid:
1) hydrofluoric acid and ammonium fluoride mixed aqueous solution are prepared, wherein the weight percent of hydrofluoric acid is 1-
2wt%, the weight percent of ammonium fluoride are 10-20wt%, and the first descaling bath, the second pickling is added in the mixed aqueous solution prepared
In slot, the liquid level of the first descaling bath did not had heavy-calibre planar element to be cleaned completely；Deionization is injected into rinsing bowl
Water, when element is put into rinsing bowl, the height of the water surface did not had heavy-calibre planar element to be cleaned completely；
2) first circulation pump is opened, the acid solution in the first descaling bath and the second descaling bath is circulated.Open the
Two circulating pumps and third circulating pump realize that the flowing of deionized water updates；
3) by balancing pole, heavy-calibre planar element to be cleaned is put into the rinsing bowl, to member before pickling
Part surface carries out initial water wash 5 minutes；
4) then heavy-calibre planar element to be cleaned is put into the first descaling bath by balancing pole, pickling 1 divides 45 seconds；
5) heavy-calibre planar element to be cleaned is quickly then transferred to from the first descaling bath by rinsing bowl by balancing pole
In, the time controlled within 2 seconds；
6) after embathing 30 minutes in rinsing bowl, heavy-calibre planar element is taken out from rinsing bowl by balancing pole, it will
Heavy-calibre planar element naturally dry.
Technical effect of the invention is as follows:
The present invention is big for bore, the pickling work of weight weight and the heavy-calibre planar element required with great surface quality
Skill has the characteristics of easy to operate, stability and high efficiency；Control large-size glass that can be stable by balancing pole and frock clamp is first
Fast transfer of the part between descaling bath and rinsing bowl overcomes glass elements pickling rear surface in conjunction with the acid solution of autonomous configuration
The problem of face deformation difference can uniformly etch element surface under the premise of guaranteeing that element surface face shape is constant, be realized
Polishing layer effectively removes, and improves the surface damage threshold value of element.
Detailed description of the invention
Fig. 1 is the conformal acid dip pickle schematic diagram of heavy-calibre planar element of the present invention.
Fig. 2 is heavy-calibre planar element and frock clamp schematic diagram.
Specific embodiment
Below with reference to embodiment and attached drawing, the invention will be further described, but protection model of the invention should not be limited with this
It encloses.
Fig. 1 and Fig. 2 are first please referred to, Fig. 1 is the conformal acid dip pickle schematic diagram of heavy-calibre planar element of the present invention, and Fig. 2 is
Heavy-calibre planar element and frock clamp schematic diagram.As seen from the figure, the conformal acid dip pickle of heavy-calibre planar element of the present invention, packet
A fixed cross beam 1 is included, a balancing pole 2 is hung under the crossbeam 1, one end of the balancing pole 2 hangs element 13 to be cleaned and work
Clamps 4, the other end are loaded with a certain number of balance weights 3, and the total weight of the balance weight 3 is slightly smaller than element 13 to be cleaned and tooling
The total weight of fixture 4 sets the first descaling bath 6, the second descaling bath 7 in the lower section of the element to be cleaned 13 and frock clamp 4
With rinsing bowl 5, the first descaling bath 6 is connected to the second descaling bath 7 in bottom, is provided with hydrofluoric acid and fluorination in the descaling bath
One end of ammonium mixed aqueous solution, first circulation pump 8 is connected to the first descaling bath 6 by plastic conduit, and the other end passes through plastic conduit
It is connected to the second descaling bath 7, two end interfaces are below liquid level in slot；The upper port in 5 outside of rinsing bowl passes through pipeline successively
Second circulation pump 9 and pure water slot 10 are connected, lower port is sequentially connected third circulating pump 11 and wastewater trough 12 by pipeline, described
Rinsing bowl 5 in deionized water is housed, upper and lower port is below the liquid level of rinsing bowl 5.
The hydrofluoric acid and ammonium fluoride mixed aqueous solution, wherein the weight percent of hydrofluoric acid is 1-2%, ammonium fluoride
Weight percent be 10-20%.
First descaling bath 6, the second descaling bath 7 and rinsing bowl 5 are made of polytetrafluoroethylene material, the frock clamp 4
It is made by coating the stainless steel material of polytetrafluoroethylene (PTFE).
Embodiment 1
For specification be 810mm × 430mm × 90mm plane fused quartz element, primary face shape be 0.3 λ (λ=
632.8nm), it is desirable that uniformly etching 60nm removes polishing layer, and does not destroy original face shape.
Using the conformal acid dip pickle of heavy-calibre planar element to the cleaning method of heavy-calibre planar element, including following step
It is rapid:
1) hydrofluoric acid and ammonium fluoride mixed aqueous solution are prepared, wherein the weight percent of hydrofluoric acid is 1.1%,
The weight percent of ammonium fluoride is 14.8%, and the first descaling bath 6, the is added in the hydrofluoric acid prepared and ammonium fluoride mixed aqueous solution
In two descaling baths 7, the liquid level of the first descaling bath 6 should be able to ensure did not had heavy caliber plane component completely；It is infused into rinsing bowl 5
Enter deionized water, when heavy-calibre planar element is put into rinsing bowl 5, the height of the water surface should be able to ensure did not had heavy caliber flat completely
Face element part；
2) first circulation pump is opened, the acid solution in the first descaling bath 6 and the second descaling bath 7 is circulated.It opens
Second circulation pump 9 and third circulating pump 11 realize that the flowing of deionized water updates；
3) by balancing pole 2, heavy-calibre planar element is put into rinsing bowl 5, element surface is carried out just before pickling
Step washing 5 minutes；
4) then heavy-calibre planar element is put into the first descaling bath 6 by balancing pole 2, pickling 1 divides 45 seconds；
5) then heavy-calibre planar element is quickly transferred in rinsing bowl 5 from the first descaling bath 6 by balancing pole 2, when
Between control within 2 seconds；
6) after embathing 30 minutes in rinsing bowl 5, heavy-calibre planar element is taken out from rinsing bowl 5 by balancing pole 2,
Then by heavy-calibre planar element naturally dry.
Many experiments show that specification is 810mm × 430mm × 90mm plane fused quartz element, after uniformly etching 60nm,
Realize effectively removing for polishing layer, element damage threshold value significantly improves, and keep surface face shape it is constant, still for 0.3 λ (λ=
632.8nm)。
Experiment shows that the present invention can carry out quantitative pickling to heavy-calibre planar element and not change the original face shape of element,
Have the characteristics that easy to operate and rapidly and efficiently.
Claims (3)
1. a kind of conformal acid dip pickle of heavy-calibre planar element, it is characterised in that: including a fixed cross beam (1), the crossbeam
(1) balancing pole (2) is hung under, one end of the balancing pole (2) hangs element (13) to be cleaned and frock clamp (4), another
End is loaded with certain amount balance weight (3), and the total weight of the balance weight (3) is slightly smaller than element to be cleaned (13) and frock clamp (4)
Total weight, set the first descaling bath (6), the second descaling bath below the element to be cleaned (13) and frock clamp (4)
(7) it is connected to the second descaling bath (7) in bottom with rinsing bowl (5), the first descaling bath (6), is provided with hydrogen in the descaling bath
One end of fluoric acid and ammonium fluoride mixed aqueous solution, first circulation pump (8) is connected to the first descaling bath (6) by plastic conduit, another
End is connected to the second descaling bath (7) by plastic conduit, and two end interfaces are below liquid level in slot；On described rinsing bowl (5) outside
Port is sequentially connected second circulation pump (9) and pure water slot (10) by pipeline, and lower port is sequentially connected third by pipeline and recycles
(11) and wastewater trough (12) are pumped, deionized water is housed in the rinsing bowl (5), the upper and lower port is below described
The liquid level of rinsing bowl (5).
2. the acid dip pickle of heavy-calibre planar element according to claim 1, it is characterised in that: first descaling bath
(6), the second descaling bath (7) and rinsing bowl (5) are made of polytetrafluoroethylene material, and the frock clamp (4) is cladding poly- four
The stainless steel material of vinyl fluoride is made.
3. utilizing the conformal acid dip pickle of heavy-calibre planar element described in claim 1 to the cleaning side of heavy-calibre planar element
Method, including the following steps:
1) hydrofluoric acid and ammonium fluoride mixed aqueous solution are prepared, wherein the weight percent of hydrofluoric acid is 1-2wt%, fluorine
The weight percent for changing ammonium is 10-20wt%, and the first descaling bath, the is added in the hydrofluoric acid prepared and ammonium fluoride mixed aqueous solution
In two descaling baths, the liquid level of the first descaling bath did not had heavy-calibre planar element to be cleaned completely；It is injected into rinsing bowl
Deionized water, when heavy-calibre planar element to be cleaned is put into rinsing bowl, the height of the water surface did not had to be cleaned big completely
Bore plane component；
2) first circulation pump is opened, the acid solution in the first descaling bath and the second descaling bath is circulated.Second is opened to follow
Ring pump and third circulating pump realize that the flowing of deionized water updates；
3) by balancing pole, heavy-calibre planar element to be cleaned is put into the rinsing bowl, to element table before pickling
Face carries out initial water wash 5 minutes；
4) then heavy-calibre planar element to be cleaned is put into the first descaling bath by balancing pole, pickling 1 divides 45 seconds；
5) then heavy-calibre planar element to be cleaned is quickly transferred in rinsing bowl from the first descaling bath by balancing pole, when
Between control within 2 seconds；
6) after embathing 30 minutes in rinsing bowl, heavy-calibre planar element is taken out from rinsing bowl by balancing pole, Jiang great Kou
Diameter plane component naturally dry.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910000562.9A CN109592905A (en) | 2019-01-02 | 2019-01-02 | The conformal acid dip pickle and cleaning method of heavy-calibre planar element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910000562.9A CN109592905A (en) | 2019-01-02 | 2019-01-02 | The conformal acid dip pickle and cleaning method of heavy-calibre planar element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109592905A true CN109592905A (en) | 2019-04-09 |
Family
ID=65965866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910000562.9A Pending CN109592905A (en) | 2019-01-02 | 2019-01-02 | The conformal acid dip pickle and cleaning method of heavy-calibre planar element |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1496655A1 (en) * | 1963-01-12 | 1969-05-29 | Saelzle Dr Erich | Process for polishing lead crystal and crystal glass |
| JPS63123821A (en) * | 1986-07-10 | 1988-05-27 | Sumita Kogaku Glass Seizosho:Kk | Production of material for glass molding |
| CN101051603A (en) * | 2006-04-07 | 2007-10-10 | 悦城科技股份有限公司 | Method and device for panel etching process |
| CN101367618A (en) * | 2008-09-23 | 2009-02-18 | 沈阳汉科半导体材料有限公司 | Chemical granulation processing method for quartz surface |
| CN102910830A (en) * | 2012-11-15 | 2013-02-06 | 徐培炎 | Quartz crystal wafer corrosion machine |
| CN203639343U (en) * | 2013-12-13 | 2014-06-11 | 汕头市拓捷科技有限公司 | Strength recovering equipment of OGS (One Glass Solution) glass |
| CN105481259A (en) * | 2015-12-08 | 2016-04-13 | 中国工程物理研究院激光聚变研究中心 | Post-processing method to enhance the damage threshold of fused quartz optical element |
-
2019
- 2019-01-02 CN CN201910000562.9A patent/CN109592905A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1496655A1 (en) * | 1963-01-12 | 1969-05-29 | Saelzle Dr Erich | Process for polishing lead crystal and crystal glass |
| JPS63123821A (en) * | 1986-07-10 | 1988-05-27 | Sumita Kogaku Glass Seizosho:Kk | Production of material for glass molding |
| CN101051603A (en) * | 2006-04-07 | 2007-10-10 | 悦城科技股份有限公司 | Method and device for panel etching process |
| CN101367618A (en) * | 2008-09-23 | 2009-02-18 | 沈阳汉科半导体材料有限公司 | Chemical granulation processing method for quartz surface |
| CN102910830A (en) * | 2012-11-15 | 2013-02-06 | 徐培炎 | Quartz crystal wafer corrosion machine |
| CN203639343U (en) * | 2013-12-13 | 2014-06-11 | 汕头市拓捷科技有限公司 | Strength recovering equipment of OGS (One Glass Solution) glass |
| CN105481259A (en) * | 2015-12-08 | 2016-04-13 | 中国工程物理研究院激光聚变研究中心 | Post-processing method to enhance the damage threshold of fused quartz optical element |
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Application publication date: 20190409 |