CN102910830B - Quartz crystal wafer corrosion machine - Google Patents
Quartz crystal wafer corrosion machine Download PDFInfo
- Publication number
- CN102910830B CN102910830B CN201210459191.9A CN201210459191A CN102910830B CN 102910830 B CN102910830 B CN 102910830B CN 201210459191 A CN201210459191 A CN 201210459191A CN 102910830 B CN102910830 B CN 102910830B
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- China
- Prior art keywords
- liquid pool
- corrosive fluid
- corrosion
- cleaning
- service sink
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Abstract
The present invention is a kind of quartz crystal wafer corrosion machine, comprise casing, corrosion liquid pool and service sink is provided with in casing, table top between corrosion liquid pool and service sink is provided with and automatically cleans tilting mechanism, the support arm upper end that automatic cleaning tilting mechanism comprises is connected with crossbeam by rotating shaft, and the front end of crossbeam is connected with the rack for cleaning holding wafer basket, is provided with intermeshing driving toothed gear and follower gear in crossbeam, driving toothed gear is connected with the drive-motor output shaft on crossbeam, and follower gear connects with rack for cleaning; Be respectively equipped with above corrosion liquid pool with service sink and corrode the corrosive fluid spray header that liquid pool is connected and the scavenging solution spray header be connected with service sink.The present invention cleans tilting mechanism automatically by installing, and rack for cleaning can be made to drive wafer basket to replace rotation at corrosion liquid pool and service sink, and make rack for cleaning realize 360 ° of automatic rotations, cleaning, corrosion evenly, thus instead of manual operation, improve working efficiency, reduce labor strength.
Description
Technical field
The present invention relates to a kind of quartz crystal wafer corrosion machine.
Background technology
Quartz crystal wafer corrosion machine is for etching, during use, crystal wafer is contained in wafer basket, and be then placed in corrosion liquid pool, shake wafer basket corrodes wafer, again wafer basket is placed in service sink after corroding, and shake is cleaned.Be all use hand-held wafer basket in prior art, manually shake is cleaned, and make labor strength in this way large, production efficiency is low.
Summary of the invention
Technical problem to be solved by this invention is for the deficiencies in the prior art, and provide a kind of rational in infrastructure, production efficiency is high, without the need to the quartz crystal wafer corrosion machine of overriding automatic operation.
Technical problem to be solved by this invention is realized by following technical scheme, the present invention is a kind of quartz crystal wafer corrosion machine, comprise casing, corrosion liquid pool and service sink is provided with in casing, be characterized in: the table top between corrosion liquid pool and service sink is provided with and automatically cleans tilting mechanism, described automatic cleaning tilting mechanism comprises and to be connected with cylinder and to drive the support arm that it is elevated, support arm upper end is connected with crossbeam by rotating shaft, the front end of crossbeam is connected with the rack for cleaning holding wafer basket, intermeshing driving toothed gear and follower gear is provided with in described crossbeam, driving toothed gear is connected with the drive-motor output shaft on crossbeam, follower gear connects with rack for cleaning,
Corrosive fluid spray header and scavenging solution spray header is respectively equipped with above corrosion liquid pool and service sink, corrosive fluid spray header is connected with corrosion liquid pool by corrosive fluid pipeline, corrosive fluid pipeline is provided with corrosive fluid spray pump, scavenging solution spray header is connected with service sink by scavenging solution pipeline, and detergent line is provided with scavenging solution spray pump.
Technical problem to be solved by this invention can also be realized further by following technical scheme, is provided with corrosive fluid storage pool outside described casing, and be provided with corrosive fluid circulation line between corrosive fluid storage pool and corrosion liquid pool, circulation line is provided with recycle pump.
Technical problem to be solved by this invention can also be realized further by following technical scheme, and the bottom of described corrosion liquid pool is provided with corrosive fluid heating unit.
Technical problem to be solved by this invention can also be realized further by following technical scheme, is provided with and the mixing pump of corroding liquid pool and being communicated with below described corrosion liquid pool.
Technical problem to be solved by this invention can also be realized further by following technical scheme, and described casing is provided with action pane, and action pane is provided with viewing window.
Technical problem to be solved by this invention can also be realized further by following technical scheme, and the top of described casing is provided with suction opening, and suction opening is connected with the vacuum fan outside casing by induced exhaust.
Compared with prior art, the present invention cleans tilting mechanism automatically by installing, rack for cleaning can be made to drive wafer basket to replace rotation at corrosion liquid pool and service sink, drive driving toothed gear and follower gear by drive-motor simultaneously, rack for cleaning is made to realize 360 ° of automatic rotations, cleaning, corrosion evenly, thus instead of manual operation, improve working efficiency, reduce labor strength, being sprayed from the top down by corrosive fluid spray header and scavenging solution spray header to make quartz wafer corrode evenly, and washing evenly.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
Fig. 2 is the left TV structure schematic diagram of Fig. 1.
Embodiment
Referring to accompanying drawing, further describe concrete technical scheme of the present invention, so that those skilled in the art understands the present invention further, and do not form the restriction to its right.
With reference to accompanying drawing, a kind of quartz crystal wafer corrosion machine, comprise casing 1, corrosion liquid pool 10 and service sink 8 is provided with in casing 1, corrosion liquid pool 10 is pickling tub, service sink 8 is washing pool, table top between corrosion liquid pool 10 and service sink 8 is provided with and automatically cleans tilting mechanism, described automatic cleaning tilting mechanism comprises and being connected and the support arm 12 driving it to be elevated with cylinder, support arm 12 upper end is connected with crossbeam 14 by rotating shaft, crossbeam 14 can rotate back and forth swing above corrosion liquid pool 10 and service sink 8, the front end of crossbeam 14 is connected with the rack for cleaning 9 holding wafer basket, intermeshing driving toothed gear 5 and follower gear 13 is provided with in described crossbeam 14, driving toothed gear 5 is connected with the drive-motor output shaft on crossbeam 14, follower gear 13 connects with rack for cleaning 9, thus rack for cleaning 9 can be driven to realize 360 ° of rotations.
Corrosive fluid spray header 4 and scavenging solution spray header 7 is respectively equipped with above corrosion liquid pool 10 and service sink 8, corrosive fluid spray header 4 is connected with corrosion liquid pool 10 by corrosive fluid pipeline 2, corrosive fluid pipeline 2 is provided with corrosive fluid spray pump, scavenging solution spray header 7 is connected with service sink 8 by scavenging solution pipeline 6, detergent line is provided with scavenging solution spray pump, corrosive fluid or scavenging solution can be sprayed from corrosive fluid spray header 4 or scavenging solution spray header 7 by corrosive fluid spray pump or scavenging solution spray pump, thus make quartz wafer corrode or cleaning evenly.
Be provided with corrosive fluid storage pool 3 outside casing 1, be provided with corrosive fluid circulation line 11 between corrosive fluid storage pool 3 and corrosion liquid pool 10, circulation line is provided with recycle pump.When being cold, preventing corrosive fluid from freezing, this by corrosive fluid circulation is carried out making ice, in corrosive fluid storage pool 3, also should can be provided with heating unit.
The bottom of corrosion liquid pool 10 is provided with corrosive fluid heating unit, and can start corrosive fluid heating unit when corrosive fluid temperature is low, corrosive fluid heating unit can be electric stove wire.
Be provided with and the mixing pump of corroding liquid pool 10 and being communicated with below corrosion liquid pool 10, start mixing pump, corrosive fluid circulates in corrosion liquid pool 10 can make corrosive fluid temperature and even concentration.
Casing 1 is provided with action pane, and action pane is provided with viewing window, shuts viewing window, prevent corrosive fluid from spilling in the process of cleaning or corrode.Whole quartz crystal wafer corrosion machine be all adopt made of plastic.
The top of casing 1 is provided with suction opening, and suction opening is connected with the vacuum fan outside casing 1 by induced exhaust, the corrosive fluid fog in casing 1 can be extracted out, prevents from injuring operator's.
Claims (3)
1. a quartz crystal wafer corrosion machine, comprise casing, corrosion liquid pool and service sink is provided with in casing, it is characterized in that: the table top between corrosion liquid pool and service sink is provided with and automatically cleans tilting mechanism, described automatic cleaning tilting mechanism comprises and to be connected with cylinder and to drive the support arm that it is elevated, support arm upper end is connected with crossbeam by rotating shaft, the front end of crossbeam is connected with the rack for cleaning holding wafer basket, intermeshing driving toothed gear and follower gear is provided with in described crossbeam, driving toothed gear is connected with the drive-motor output shaft on crossbeam, follower gear connects with rack for cleaning,
Corrosive fluid spray header and scavenging solution spray header is respectively equipped with above corrosion liquid pool and service sink, corrosive fluid spray header is connected with corrosion liquid pool by corrosive fluid pipeline, corrosive fluid pipeline is provided with corrosive fluid spray pump, scavenging solution spray header is connected with service sink by scavenging solution pipeline, and detergent line is provided with scavenging solution spray pump; Be provided with corrosive fluid storage pool outside described casing, be provided with corrosive fluid circulation line between corrosive fluid storage pool and corrosion liquid pool, circulation line is provided with recycle pump; The bottom of described corrosion liquid pool is provided with corrosive fluid heating unit; Be provided with below described corrosion liquid pool and the mixing pump of corroding liquid pool and being communicated with.
2. quartz crystal wafer corrosion machine according to claim 1, is characterized in that: described casing is provided with action pane, and action pane is provided with viewing window.
3. quartz crystal wafer corrosion machine according to claim 1, is characterized in that: the top of described casing is provided with suction opening, and suction opening is connected with the vacuum fan outside casing by induced exhaust.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210459191.9A CN102910830B (en) | 2012-11-15 | 2012-11-15 | Quartz crystal wafer corrosion machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210459191.9A CN102910830B (en) | 2012-11-15 | 2012-11-15 | Quartz crystal wafer corrosion machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102910830A CN102910830A (en) | 2013-02-06 |
| CN102910830B true CN102910830B (en) | 2016-01-06 |
Family
ID=47609437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210459191.9A Expired - Fee Related CN102910830B (en) | 2012-11-15 | 2012-11-15 | Quartz crystal wafer corrosion machine |
Country Status (1)
| Country | Link |
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| CN (1) | CN102910830B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106637419B (en) * | 2016-12-27 | 2019-02-15 | 重庆晶宇光电科技有限公司 | Corrosion device for chip |
| CN106746699B (en) * | 2016-12-28 | 2019-02-22 | 重庆晶宇光电科技有限公司 | Quartz wafer corrosion device |
| CN109371456B (en) * | 2018-10-17 | 2021-01-08 | 山东博达光电有限公司 | Etching device and etching method for artificial quartz crystal seed wafer |
| CN109592905A (en) * | 2019-01-02 | 2019-04-09 | 中国科学院上海光学精密机械研究所 | The conformal acid dip pickle and cleaning method of heavy-calibre planar element |
| CN110473818A (en) * | 2019-09-25 | 2019-11-19 | 广东先导先进材料股份有限公司 | A kind of chip automatic corrosion sprinkling equipment |
| CN115159855B (en) * | 2022-07-22 | 2023-10-27 | 重庆华渝电气集团有限公司 | Full-automatic swing piece corrosion equipment |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07315872A (en) * | 1994-03-31 | 1995-12-05 | Shinetsu Quartz Prod Co Ltd | Method for processing surface of quartz glass |
| CN201272743Y (en) * | 2008-05-28 | 2009-07-15 | 深圳泰美克晶体技术有限公司 | Quartz wafer etching machine |
| CN101837355A (en) * | 2010-04-30 | 2010-09-22 | 唐山晶源裕丰电子股份有限公司 | Quartz crystal post cleaning device |
-
2012
- 2012-11-15 CN CN201210459191.9A patent/CN102910830B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07315872A (en) * | 1994-03-31 | 1995-12-05 | Shinetsu Quartz Prod Co Ltd | Method for processing surface of quartz glass |
| CN201272743Y (en) * | 2008-05-28 | 2009-07-15 | 深圳泰美克晶体技术有限公司 | Quartz wafer etching machine |
| CN101837355A (en) * | 2010-04-30 | 2010-09-22 | 唐山晶源裕丰电子股份有限公司 | Quartz crystal post cleaning device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102910830A (en) | 2013-02-06 |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160106 Termination date: 20161115 |