CN102891098B - 用于制造半导体的设备和方法 - Google Patents
用于制造半导体的设备和方法 Download PDFInfo
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- CN102891098B CN102891098B CN201210256773.7A CN201210256773A CN102891098B CN 102891098 B CN102891098 B CN 102891098B CN 201210256773 A CN201210256773 A CN 201210256773A CN 102891098 B CN102891098 B CN 102891098B
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- 238000000034 method Methods 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 239000004065 semiconductor Substances 0.000 claims abstract description 41
- 230000007246 mechanism Effects 0.000 claims abstract description 40
- 230000001105 regulatory effect Effects 0.000 claims abstract description 7
- 230000008859 change Effects 0.000 claims description 20
- 238000009434 installation Methods 0.000 claims description 17
- 239000004020 conductor Substances 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 description 24
- 230000033001 locomotion Effects 0.000 description 24
- 230000008569 process Effects 0.000 description 20
- 150000001875 compounds Chemical class 0.000 description 12
- 230000002950 deficient Effects 0.000 description 12
- 239000000126 substance Substances 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 9
- 238000005520 cutting process Methods 0.000 description 7
- 238000007689 inspection Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 238000001514 detection method Methods 0.000 description 4
- 230000003139 buffering effect Effects 0.000 description 3
- 230000000717 retained effect Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000000875 corresponding effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000007781 pre-processing Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Die Bonding (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011160984A JP5920864B2 (ja) | 2011-07-22 | 2011-07-22 | 半導体製造装置及び半導体製造方法 |
JP2011-160984 | 2011-07-22 | ||
KR1020120034225A KR101665393B1 (ko) | 2011-07-22 | 2012-04-03 | 반도체 제조 장치 |
KR10-2012-0034225 | 2012-04-03 |
Publications (2)
Publication Number | Publication Date |
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CN102891098A CN102891098A (zh) | 2013-01-23 |
CN102891098B true CN102891098B (zh) | 2016-12-21 |
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Application Number | Title | Priority Date | Filing Date |
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CN201210256773.7A Active CN102891098B (zh) | 2011-07-22 | 2012-07-23 | 用于制造半导体的设备和方法 |
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CN (1) | CN102891098B (zh) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100959372B1 (ko) * | 2008-03-24 | 2010-05-24 | 미래산업 주식회사 | 반도체 소자 이송장치, 핸들러, 및 반도체 소자 제조방법 |
US7851721B2 (en) * | 2009-02-17 | 2010-12-14 | Asm Assembly Automation Ltd | Electronic device sorter comprising dual buffers |
JP5369313B2 (ja) * | 2009-04-10 | 2013-12-18 | アキム株式会社 | 半導体チップ搭載装置 |
JP4811499B2 (ja) * | 2009-06-02 | 2011-11-09 | パナソニック株式会社 | 部品実装装置 |
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2012
- 2012-07-23 CN CN201210256773.7A patent/CN102891098B/zh active Active
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CN102891098A (zh) | 2013-01-23 |
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Address after: Gyeongnam Changwon City, South Korea Applicant after: HANWHA TECHWIN Co.,Ltd. Address before: Gyeongnam Changwon City, South Korea Applicant before: Samsung Techwin Co.,Ltd. |
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Free format text: CORRECT: ADDRESS; FROM: Free format text: CORRECT: APPLICANT; FROM: SAMSUNG TAI KEWEI CO., LTD. TO: HANWHA TECHWIN CO., LTD. |
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C14 | Grant of patent or utility model | ||
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Address after: Gyeongnam Changwon City, South Korea Patentee after: HANWHA AEROSPACE Co.,Ltd. Address before: Gyeongnam Changwon City, South Korea Patentee before: HANWHA TECHWIN Co.,Ltd. |
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Effective date of registration: 20190403 Address after: Gyeongnam Changwon City, South Korea Patentee after: Hanwha Precision Machinery Co.,Ltd. Address before: Gyeongnam Changwon City, South Korea Patentee before: HANWHA AEROSPACE Co.,Ltd. |
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