CN102867717A - Protection plate supporting component and ion source with same - Google Patents
Protection plate supporting component and ion source with same Download PDFInfo
- Publication number
- CN102867717A CN102867717A CN2012100575137A CN201210057513A CN102867717A CN 102867717 A CN102867717 A CN 102867717A CN 2012100575137 A CN2012100575137 A CN 2012100575137A CN 201210057513 A CN201210057513 A CN 201210057513A CN 102867717 A CN102867717 A CN 102867717A
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- Prior art keywords
- plasma
- preventing
- container
- plate support
- support unit
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32559—Protection means, e.g. coatings
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Abstract
The present invention provides a protection plate supporting component and an ion source with the same, which can increase the efficiency of mounting a protection plate on a plasma generation container and dismounting the protection plate from the plasma generation container, wherein the protection plate supporting component (15) is configured in the plasma generation container (4) used by a plasma processing apparatus and an ion beam radiation apparatus, comprises a main body portion with at least one portion abutting against the inner wall of the plasma generation container (4) and an end portion (17) arranged to extend from the main body portion (16), and when the protection plate supporting component (15) is assembled on the plasma generation container (4), the end portion (17) deviates from the inner wall of the plasma generation container (4).
Description
Technical field
The present invention relates to for preventing that plate is installed in plasma processing apparatus and the employed plasma of ion beam irradiation apparatus generates preventing the plate support unit and having the ion source that this is preventing the plate support unit of internal tank.
Background technology
In the plasma processing unit such as plasma doping apparatus that are called as plasma CVD equipment or PLAD, ion implantation apparatus and ion beam orienting device beam-plasma irradiation unit, in order to prevent that plasma from generating container inner wall and being corroded and carrying out efficiently plasma and generate cleaning in the container, generate container inner wall along plasma and be provided with shown in Figure 3, detachable lining (be also referred to as liner plate, preventing plate) such as patent documentation 1.
Patent documentation 1: Japanese Patent Publication communique Unexamined Patent 5-182623 number (Fig. 3)
According to the ruuning situation of device, need to change preventing plate.For example, make device operation to a certain degree during after, preventing can adhering to deposit on the plate.In addition, because plasma generates the heat in the container, make sometimes anti-plate produce thermal deformation.This state if leave and no matter, bring obstacle can for the operation of device, thus for example will be termly to preventing that plate changes.
Preventing that plate is fixed by bolts on the inwall of plasma generation container usually.Therefore, in the time will preventing that plate is installed on the inwall that plasma generates container or will prevent that inwall that plate generates container from plasma is pulled down, the bolt that must will fix anti-plate is all installed or will be fixed the bolt of anti-plate and all pulls down the time that such action need is long.And, if regularly carry out such operation, then can make time of maintenance of device elongated, can affect the operation ratio of device.
In recent years, the size of processed object is increasing year by year.For example, for ion beam irradiation apparatus, in the situation that processed object is glass substrate (substrate), its size can reach approximately 2200mm * 2600mm.Be accompanied by such substrate and maximize, the size that plasma generates container has also become greatly.
When using large-scale like this plasma to generate container, preventing that also change corresponding to the size of plate is large.Therefore, installing large-sizedly when preventing plate, needing more bolt, the installation of preventing plate with pull down the needed time of operation and also can become longer.And, need a lot of labours to install and pull down anti-the operation of plate.
Summary of the invention
Main purpose of the present invention is to provide anti-plate support unit and has the ion source that this is preventing the plate support unit, can improve and will prevent that plate is installed in plasma and generates and will prevent maybe on the container that plate generates the operating efficiency that container is pulled down from plasma.
The invention provides a kind of plate support unit of preventing, being configured in plasma generates in the container, described plasma generates container and uses in plasma processing apparatus and ion beam irradiation apparatus, describedly preventing that the plate support unit is characterised in that, have: main part, at least a portion and described plasma generate the inwall butt of container; And the end, extend from described main part and to arrange, and in the time will describedly preventing that the plate support unit is assembled in described plasma and generates on the container, described end is left from the inwall of described plasma generation container.
Use the described plate support unit of preventing, can improve and to prevent that plate is installed in plasma and generates on the container and the operating efficiency will prevent that plate generates container and pulls down from plasma the time.
In addition, in order further to increase work efficiency, preferably, described end is along the described inwall extension setting of preventing the described plasma generation container of plate support unit is installed.
Like this, the installation of preventing plate with pull down and can successfully carry out.
In addition, describedly preventing that the plate support unit is made of nonmagnetic material and magnetic.
In addition, the present invention also provides a kind of ion source, in generating container, plasma generates plasma, produce ion beam from this plasma, and described ion beam is advanced to the direction of regulation, in generating container, described plasma disposes a plurality of aforesaid plate support units of preventing, on the plane vertical with the direct of travel cardinal principle of described ion beam, described end of preventing the plate support unit generates the mutually relatively configuration of inwall of container along described plasma, and is preventing disposing between the end of plate support unit anti-plate relative configuration described.
In addition, the present invention also provides a kind of ion source, the plasma that disposes around a plurality of permanent magnets generates and generates plasma in the container, produce ion beam from this plasma, and described ion beam is advanced to the direction of regulation, in generating container, described plasma disposes a plurality of aforesaid plate support units of preventing, on the plane vertical with the direct of travel cardinal principle of described ion beam, described end of preventing the plate support unit generates the mutually relatively configuration of inwall of container along described plasma, preventing disposing between the end of plate support unit anti-plate relative configuration described, and at least a portion that consists of the described magnetic of preventing the plate support unit generates the wall of a container face and is configured in described plasma and generates container relative configuration of described permanent magnet on every side across described plasma.
Preventing the plate support unit by generate in the container configuration at plasma, and installing or pulling down anti-plate so that preventing plate with respect to the mode of preventing the plate support unit and sliding, therefore can shorten preventing that plate positions the needed time.In addition, because the end of preventing plate is by preventing the supporting of plate support unit, so can reduce the quantity of the bolt of fixedly preventing plate itself.In addition, owing to being used for fixedly preventing the quantity minimizing of the bolt of plate itself, so the needed time in the time of can shortening installation or pull down anti-plate.
Description of drawings
Fig. 1 is the cutaway view of an expression ionogenic execution mode of the present invention.
Fig. 2 is along A-A line shown in Figure 1 cutaway view when directions X cuts off plasma generation container.
Fig. 3 is the stereogram that the plate support unit is being prevented in expression.
Fig. 4 is illustrated in the inside that Fig. 1, plasma shown in Figure 2 generate container further to have appended the situation of preventing the plate support unit.
Fig. 5 is illustrated in the stereogram of preventing the plate support unit that appends in the structure of Fig. 4.
Fig. 6 is that expression is arranged on the ios dhcp sample configuration IOS DHCP that plasma generates the permanent magnet around the container, (a) expression of Fig. 6 make the Z direction towards the oblique rear of paper the time situation, (b) expression of Fig. 6 makes the situation of Z direction when oblique the place ahead of paper.
Fig. 7 is illustrated in the stereogram that end that plasma shown in Figure 6 generates container is equipped with the situation of preventing the plate support unit that is made of magnetic and nonmagnetic material.(a) of Fig. 7 be expression magnetic and nonmagnetic material along the example of preventing the plate support unit that illustrates arrow IB direction alternate configurations, (b) of Fig. 7 is the example of preventing the plate support unit that the internal configurations that is illustrated in nonmagnetic material has a plurality of magnetics.
Fig. 8 is the stereogram of preventing the plate support unit shown in the presentation graphs 7 (a), the integral body that the plate support unit is being prevented in Fig. 8 (a) expression, the situation when (b) expression of Fig. 8 will consist of the magnetic of preventing the plate support unit and nonmagnetic material decomposition.
Fig. 9 is the stereogram of preventing the plate support unit shown in the presentation graphs 7 (b), the integral body that the plate support unit is being prevented in Fig. 9 (a) expression, the situation when (b) expression of Fig. 9 will consist of the magnetic of preventing the plate support unit and nonmagnetic material decomposition.
Figure 10 is the variation of preventing the plate support unit shown in Figure 5, the integral body that the plate support unit is being prevented in Figure 10 (a) expression, the situation when (b) expression of Figure 10 will consist of the magnetic of preventing the plate support unit and nonmagnetic material decomposition.
Figure 11 is the stereogram that the other variation of plate support unit is being prevented in expression.
Description of reference numerals
1---ion source
4---plasma generates container
10---filament
12---permanent magnet
13---magnetic
14---nonmagnetic material
15---preventing the plate support unit
16---main part
17---the end
20---preventing plate
21---the gap
Embodiment
Put down in writing the cutaway view of an execution mode of employed ion source 1 in the expression ion beam irradiation apparatus among Fig. 1.This ion source 1 is be called as the bucket type ion source type ionogenic a kind of.
The plasma that this ion source 1 has cuboid generates container 4, generates container 4 from plasma and draws the ion beam 3 that is roughly band shape.
On plasma generation container 4, by not shown valve gas source 2 is installed, from the gas of these gas source 2 supplies as the raw material of ion beam 3.In addition, be connected with not shown gas flow adjuster (mass flow controller) in this gas source 2, regulate thus the quantity delivered of the gas that generation container 4 inside provide from gas source 2 to plasma.
Generate at plasma on the side of container 4, the filament 10 of a plurality of U-shapeds is installed along Y-direction.These filaments 10 have following structure: use the power supply V that is connected between the terminal with filament 10
F, regulate the magnitude of current that flows through each filament 10.By such structure, can regulate the electric current distribution of the ion beam 3 of drawing from ion source 1.
Electric current flows through filament 10, filament 10 is heated, thus from filament 10 ejected electrons.This electronics and the gas (PH that supplies to plasma generation container 4 inside
3, BF
3Deng) bumping causes ionisation of gas, thereby generate container 4 interior generation plasmas 9 at plasma.
In this ion source 1, around plasma generation container 4, a plurality of permanent magnets 12 are installed.Form the cusped magnetic field by this permanent magnet 12 at the interior zone that plasma generates container 4, will close in predetermined zone from the electronics that filament 10 is emitted.In addition, a plurality of permanent magnets 12 are installed in plasma and generate on the container 4 under the state that is accommodated in as several mode take each carriage on the not shown carriage.
Ion source 1 has four electrodes as extraction electrode system, and generating container 4 from plasma has accelerating electrode 5, extraction electrode 6, suppresses electrode 7, grounding electrode 8 along drawing to (diagram Z direction) arranged in order of ion beam 3.Each electrode and plasma generate the current potential of container 4 by a plurality of power supply (V
1～V
4) being set as different respectively values, each electrode is installed on the insulating flange 11 aspect electric independently.
On each electrode that uses as extraction electrode system, for example be provided with the slit-shaped openings section 22 of a plurality of length at directions X, by these slit-shaped openings sections 22, draw ion beam 3.In addition, although this record be the ion source 1 that has four electrode structures as extraction electrode system, be not limited to this, the number of electrode is so long as get final product more than one.And the quantity of filament 10 also is not limited to a plurality of, only have one good.
As shown in Figure 1, in ion source 1, the inner wall arrangement that generates container 4 along plasma has anti-plate 20.This is preventing that plate 20 is nonmagnetic material materials, for example, can be the refractory metals such as austenitic stainless steel or molybdenum.Generate the end of preventing plate 20 of the inner wall arrangement of container 4 along plasma, supported by the not shown plate support unit of preventing.About this structure of preventing the plate support unit, below describe.
Described among Fig. 2 along the situation in the cross section of A-A line when directions X cuts off plasma generation container 4 of Fig. 1 record.As shown in the figure, in this example, generate the part at the angle of container 4 at plasma, dispose anti-plate support unit 15.This is preventing plate support unit 15, uses not shown bolt, is fixed on plasma and generates on the container 4.And, preventing that the end of plate support unit 15 is left from the inwall that plasma generates container 4, between this end and inwall, be formed with gap 21.Preventing that plate 20 installs by slip along the Z direction with respect to this gap 21.Therefore, preventing that plate 20 becomes simple with respect to the positioning action that plasma generates container 4.
Although preventing that plate 20 makes is fixed by bolts to plasma and generates on the container 4, because the end of preventing plate 20 is by preventing that plate support unit 15 supports, so can reduce accordingly the quantity for the bolt of fixedly preventing plate 20.Because the quantity of bolt reduces, so can shorten the needed time in the time of to prevent that plate 20 is installed on the inwall that plasma generates container 4 or pull down anti-plate 20 from the inwall that plasma generates container 4.
Put down in writing the stereogram of preventing plate support unit 15 of Fig. 2 among Fig. 3.As shown in the figure, preventing that plate support unit 15 has: main part 16, at least a portion and plasma generate the inwall butt of container 4; And end 17, extend setting from described main part 16.
If make the part of main part 16 and the inwall butt that plasma generates container 4, then in the part of this butt, can easily use bolt will prevent that plate support unit 15 is fixed on plasma and generates on the container 4.And, in the situation that generating container 4, plasma has cooling body, can generate 4 pairs in container by plasma and prevent that plate support unit 15 cools off, thereby can prevent that plate support unit 15 is owing to heat produces distortion.In addition, preferably, will extend the end 17 that arranges from main part 16 and extend setting along the inwall that plasma generates container 4.Because preventing the shape of plate 20 is the shapes that generate the inwall of container 4 along plasma, if so make the bearing of trend of the end 17 of anti-plate support unit 15 generate the inwall of container 4 along plasma, the installation of then preventing plate 20 with pull down and can carry out smoothly.
When plasma when to generate container 4 be large-scale, preventing that the size of plate 20 also becomes large.Owing to preventing that plate 20 is installed and need a lot of labours when pulling down large, therefore consider preventing that plate 20 cuts apart.In this case, as shown in Figure 4, can consider also to append in the side that is positioned at plasma and generates the directions X of container 4 anti-plate support unit 15.
Described to be illustrated in the stereogram of the integral body of preventing the plate support unit of appending in the structure of Fig. 4 among Fig. 5.This is preventing plate support unit 15, and also the example with the front is identical, has: main part 16, and at least a portion and plasma generate the inwall butt of container 4; And end 17, extend setting from described main part 16.
Ion source 1 as shown in Figure 1 generates disposing in the situation of a plurality of permanent magnets 12 of container 4 on every side at plasma, can consider to utilize permanent magnet 12, will prevent that plate support unit 15 remains on the inwall of plasma generation container 4.
In Fig. 6 (a), Fig. 6 (b), describe plasma at the ion source 1 of Fig. 1 record and generated the example that disposes the configurations of magnets of a plurality of permanent magnets 12 around the container 4.(a) of Fig. 6 is the same structure of describing from different viewpoints from (b) of Fig. 6.In addition, although on the face of the plasma generation container 4 that is positioned at a side opposite to Y-direction, also dispose a plurality of permanent magnets 12, but owing to having the identical structure of the configurations of magnets of a plurality of permanent magnets that arrange with the face that generates container 4 at the plasma that is positioned at Y-direction one side, so omitted diagram to it at this.
Plasma generate container 4 around carried out in the situation of such configurations of magnets, as the structure of preventing plate support unit 15, structure that can be shown in Fig. 7 (a) and Fig. 7 (b).In these figure, for clear and definite permanent magnet 12 and the position relationship of preventing plate support unit 15, omitted the diagram of plasma generation container 4.In addition, although in the internal configurations of plasma generation container 4 a plurality of plate support units 15 of preventing are arranged, the structure of preventing plate support unit 15 that configures in other positions is also with illustrated identical, so omitted this diagram at this.
Shown in Fig. 7 (a), Fig. 7 (b), the plate support unit 15 of preventing here is made of magnetic 13 (for example ferritic stainless steel) and nonmagnetic material 14, and the wall that the part of magnetic 13 generates container 4 across plasma is configured in the position relative with permanent magnet 12.
In (a) of Fig. 7, the IB direction shown in the arrow in the figure, alternate configurations has nonmagnetic material 14 and magnetic 13.In addition, in (b) of Fig. 7, dispose a plurality of magnetics 13 in the inside region of large nonmagnetic material 14.
In (a) of Fig. 8, described the stereogram of preventing plate support unit 15 integral body shown in (a) of presentation graphs 7.Except being provided with magnetic 13, identical with structure shown in Figure 3, have: main part 16, at least a portion and plasma generate the inwall butt of container 4; And end 17, extend setting from described main part 16.
Situation when in (b) of Fig. 8, having described the magnetic of preventing plate support unit 15 13 shown in (a) of pie graph 8 and nonmagnetic material 14 decomposition.As shown in the drawing, insert in the hole 18 that is formed on the nonmagnetic material 14 by the pin 19 that will uprightly be arranged on magnetic 13 sides, thus two assembling parts are got up.In addition, in (b) of Fig. 8, describe be on 14 two sides of nonmagnetic material, form respectively porose 18, but being arranged on anti-the nonmagnetic material 14 of plate support unit 15 ends, on the side that does not configure magnetic 13, do not form hole 18.
In (a) of Fig. 9, described the stereogram of preventing plate support unit 15 integral body shown in (b) of presentation graphs 7.Except being provided with magnetic 13, this is preventing plate support unit 15, and also the structure with shown in Figure 3 is identical, has: main part 16, and at least a portion and plasma generate the inwall butt of container 4; And end 17, extend setting from main part 16.
Situation when in (b) of Fig. 9, having described the magnetic of preventing plate support unit 15 13 shown in (a) of pie graph 9 and decomposing with nonmagnetic material 14.As shown in the drawing, by magnetic 13 being pressed in the hole that is arranged on nonmagnetic material 14, thus two assembling parts are got up.
If preventing that plate support unit 15 arranges described magnetic 13, then the part of magnetic 13 is held by permanent magnet 12, can will prevent that plate support unit 15 attracting holdings generate on the inwall of container 4 at plasma thus.In addition, in the situation that this attraction is weak, also can use not shown bolt will prevent that plate support unit 15 is fixed on the inwall of plasma generation container 4.But, even in this case, owing to there being the attraction of permanent magnet 12, use little so be used for fixedly preventing plate support unit 15 employed bolts can not use large.In addition, even bolt is big or small constant, but the quantity of the bolt of fixedly preventing plate support unit 15 is reduced.
Other variation
In the above embodiment, the situation that is shaped as cuboid that plasma generates container 4 is illustrated, and is not limited to cuboid but plasma generates the shape of container 4, such as also can being cylindric etc.
In addition, except the structure of preventing plate support unit 15 that illustrated in the above embodiment, can also generate corresponding to plasma the shape of container 4, the structure shown in (a)～Figure 11 of use Figure 11 (d).
In addition, preventing that plate support unit 15 there is no need along the whole zone of preventing plate 20 ends to preventing that plate 20 supports, also can support anti-the part of plate 20 ends.
In the above embodiment, be illustrated as an example of ion beam irradiation apparatus example, but of the present inventionly preventing that the plate support unit also goes for plasma processing apparatus.In addition, in each electrode of the extraction electrode system of formation ion source 1 shown in Figure 1, be illustrated as example to be provided with a plurality of slit-shaped openings section 22 at directions X, but the shape of peristome also can be different shape.For example, also can be when observing each electrode surperficial from the Z direction, be provided with the circular hole of a plurality of circles.Such electrode is called as porous electrode, has just used since in the past.
Certainly, except foregoing, without departing from the spirit and scope of the present invention, can also carry out various improvement and distortion.
Claims (5)
1. preventing the plate support unit for one kind, be configured in plasma and generate in the container, described plasma generates container and uses in plasma processing apparatus and ion beam irradiation apparatus, is describedly preventing that the plate support unit is characterised in that,
Have: main part, at least a portion and described plasma generate the inwall butt of container; And the end, extend setting from described main part,
And with described when preventing that the plate support unit is assembled in described plasma and generates on the container, described end is left from the inwall that described plasma generates container.
2. according to claim 1ly preventing the plate support unit, it is characterized in that: described end is extended and is arranged along inwall that the described described plasma of preventing the plate support unit generates container is installed.
3. according to claim 1 and 2ly preventing the plate support unit, it is characterized in that: describedly preventing that the plate support unit is made of nonmagnetic material and magnetic.
4. an ion source generates plasma in plasma generates container, produces ion beam from this plasma, and described ion beam is advanced to the direction of regulation, described ionogenic being characterised in that,
In generating container, described plasma disposes a plurality of plate support units of preventing as claimed in claim 1 or 2,
On the plane vertical with the direct of travel cardinal principle of described ion beam, described end of preventing the plate support unit generates the mutually relatively configuration of inwall of container along described plasma, and is preventing disposing between the end of plate support unit anti-plate relative configuration described.
5. ion source, the plasma that disposes around a plurality of permanent magnets generates and generates plasma in the container, produces ion beam from this plasma, and described ion beam is advanced to the direction of regulation, described ionogenic being characterised in that,
In generating container, described plasma disposes a plurality of plate support units of preventing as claimed in claim 3,
On the plane vertical with the direct of travel cardinal principle of described ion beam, described end of preventing the plate support unit generates the mutually relatively configuration of inwall of container along described plasma, preventing disposing between the end of plate support unit anti-plate relative configuration described, and at least a portion that consists of the described magnetic of preventing the plate support unit generates the wall of a container face and is configured in described plasma and generates container relative configuration of described permanent magnet on every side across described plasma.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011151326A JP2013020737A (en) | 2011-07-08 | 2011-07-08 | Deposition preventing plate supporting member and ion source with it |
| JP2011-151326 | 2011-07-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102867717A true CN102867717A (en) | 2013-01-09 |
| CN102867717B CN102867717B (en) | 2015-04-08 |
Family
ID=47446508
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210057513.7A Expired - Fee Related CN102867717B (en) | 2011-07-08 | 2012-03-06 | Protection plate supporting component and ion source with same |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2013020737A (en) |
| KR (1) | KR101384571B1 (en) |
| CN (1) | CN102867717B (en) |
| TW (1) | TW201303950A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018223770A1 (en) * | 2017-06-08 | 2018-12-13 | 京东方科技集团股份有限公司 | Film forming device |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6307825B2 (en) * | 2013-09-25 | 2018-04-11 | 日新イオン機器株式会社 | Protective plate support member, plasma source, and ion beam irradiation apparatus |
| JP6642612B2 (en) * | 2018-04-12 | 2020-02-05 | 日新イオン機器株式会社 | Ion source, ion beam irradiation device, and method of operating ion source |
| KR102458164B1 (en) * | 2020-11-05 | 2022-10-24 | (주)제이피오토메이션 | Vacuum evaporation device with anti-pollution shield plate |
| CN114850003B (en) * | 2021-02-03 | 2023-06-27 | 芝浦机械电子装置株式会社 | Heating treatment device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4847476A (en) * | 1986-06-16 | 1989-07-11 | Hitachi, Ltd. | Ion source device |
| CN101764020A (en) * | 2008-12-24 | 2010-06-30 | 株式会社昭和真空 | Ion pipe |
| CN101930891A (en) * | 2009-06-25 | 2010-12-29 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber and lining device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5573596A (en) | 1994-01-28 | 1996-11-12 | Applied Materials, Inc. | Arc suppression in a plasma processing system |
| JP4717186B2 (en) * | 2000-07-25 | 2011-07-06 | 株式会社アルバック | Sputtering equipment |
| JP4703828B2 (en) * | 2000-09-07 | 2011-06-15 | 株式会社アルバック | Sputtering apparatus and thin film manufacturing method |
| KR20050009516A (en) * | 2003-07-16 | 2005-01-25 | 매그나칩 반도체 유한회사 | Method for manufacturing planar capacitor structure with low coupling noise |
-
2011
- 2011-07-08 JP JP2011151326A patent/JP2013020737A/en not_active Withdrawn
-
2012
- 2012-03-06 CN CN201210057513.7A patent/CN102867717B/en not_active Expired - Fee Related
- 2012-03-14 TW TW101108698A patent/TW201303950A/en unknown
- 2012-03-27 KR KR1020120030938A patent/KR101384571B1/en active IP Right Grant
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4847476A (en) * | 1986-06-16 | 1989-07-11 | Hitachi, Ltd. | Ion source device |
| CN101764020A (en) * | 2008-12-24 | 2010-06-30 | 株式会社昭和真空 | Ion pipe |
| CN101930891A (en) * | 2009-06-25 | 2010-12-29 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber and lining device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018223770A1 (en) * | 2017-06-08 | 2018-12-13 | 京东方科技集团股份有限公司 | Film forming device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013020737A (en) | 2013-01-31 |
| KR101384571B1 (en) | 2014-04-11 |
| CN102867717B (en) | 2015-04-08 |
| TW201303950A (en) | 2013-01-16 |
| KR20130006273A (en) | 2013-01-16 |
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