CN102854749A - Photosensitive resin composition for color filter and color filter using same - Google Patents
Photosensitive resin composition for color filter and color filter using same Download PDFInfo
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- CN102854749A CN102854749A CN2012100078045A CN201210007804A CN102854749A CN 102854749 A CN102854749 A CN 102854749A CN 2012100078045 A CN2012100078045 A CN 2012100078045A CN 201210007804 A CN201210007804 A CN 201210007804A CN 102854749 A CN102854749 A CN 102854749A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/23—Photochromic filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Abstract
The invention discloses a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent. In the above Chemical Formula, each definition of R1, R2, R3 and R4 is the same as defined in the detailed description. The photosensitive resin composition for a color filter according to embodiments may have excellent heat resistance and chemical resistance and thus excellent hole and patterning properties, and accordingly it can be used to form a color filter on a TFT array substrate to provide a high aperture ratio and a high contrast ratio.
Description
Quoting of related application
The application requires right of priority and the rights and interests of korean patent application No.10-2011-0063964, and this application is committed to Korea S Department of Intellectual Property on June 29th, 2011, and its full content is incorporated among the application by reference.
Technical field
The application's disclosure relates to a kind of photosensitive resin composition for colored filter (color filter, color filter, color filter), and the colored filter that uses this photosensitive resin composition.
Background technology
Usually, colored filter is used for the light filter of liquid crystal display (LCD), camera etc.It is to have the meticulous zone of three kinds or more colors to make by apply one deck in charge-coupled image sensor or transparent substrates.This colorful film generally can be made by dyeing, printing, electrophoretic deposition (EPD), Pigments etc.
In manufacture process, colored filter is processed through number of chemical and is prepared.Therefore, for the pattern that keeps forming under these conditions, need the color photosensitive resin to have development edge (development margin) but also have chemical resistance, thereby improve the productive rate of colored filter.
Especially, traditional colour liquid crystal display device (LCD) is normally made (the operation substrate (operating substrate) that the color filter substrate difference is provided with the TFT film thereon) by a kind of color filter substrate for color display of preparation (substrate), then color filter substrate and operation substrate is bonded together.Yet because they have lower installation accuracy (arrangement accuracy) in the bonding process, thereby they need wider shielding layer (shading layer).Therefore, be difficult to improve its aperture ratio (active light-emitting zone (active light-emitting area) accounts for the ratio of total pixel region).Because the substrate of glass of LCD and LCD screen is increasing recently, thereby in airless injection liquid crystal process, need the longer time that liquid-crystal composition is arranged on the front side of substrate.So someone proposes a kind of new method, the method can significantly reduce the printing and sealing material and drippage is used for the time of the liquid crystal of outer covering layer (over-coating), but exists the problem that installation accuracy is significantly reduced.
On the other hand, someone proposes the another kind of method that forms colored filter in the operation tft array substrate of TFT colour liquid crystal display device (LCD).Because this method does not need color filter substrate, but make transparent substrates and two substrates are bonded together by sputter, simplify the advantage of installing and improving aspect ratio so have.
Yet, when the tft array substrate forms colored filter, by adopting common positive photoresist, form pixel electrode with photoetching process at colored filter.Thereby resist layer need to be removed after forming electrode.In other words, form transparent electrode layer by the colour element at colored filter, apply the positive resist composition thereon, and make its patterning, make its exposure and development, thereby form pixel electrode.Then, the resist layer that remains on the pixel electrode should be peeled off and remove by anticorrosive additive stripping liquid controlling (resist stripper).Thereby, the positive resist composition need to anticorrosive additive stripping liquid controlling have resistance (tolerance, resistance).
According to conventional art, pixel electrode is made by forming the hyaline layer (pixel protective seam) with stripper resistance at colored filter.In addition, the manufacturing of pixel electrode can be by processing the longer time reducing stripper to the impact of colored filter to glass metal at low temperatures, thereby do not need to apply the pixel protective seam.
Yet, owing to needing more technique and longer time, the problem that these conventional arts exist yield and production efficiency to reduce.In order to address these problems, another kind of method has been proposed, be included in COA (array colored filter) method expansivity of using stripper and be lower than 5% radiation sensitive composition and remove the cured layer that forms color layer.In addition, by using multifunctional alicyclic epoxide compound as the thermal polymerization crosslinking chemical and passing through to use benzophenone base superoxide as thermal polymerization, colored filter can have the thermal polymerization cross-linking effect of improvement.According to the method, colored filter is short time curing at low temperatures, thereby can have excellent permanance and close contact characteristic.Yet, since increasing to the demand that has the more giant-screen of high image quality more than conventional art, higher aperture ratio and more high performance colored filter need to be had.
Summary of the invention
An embodiment of the invention provide a kind of photosensitive resin composition for colored filter, and this colored filter has the close contact characteristic to substrate.
Another embodiment of the invention provides a kind of colored filter that adopts above-mentioned photosensitive resin composition for colored filter.
According to an embodiment of the invention, a kind of photosensitive resin composition for colored filter is provided, comprise (A) acrylic resin glue (acryl-based binder resin), comprise the structural unit shown in the following Chemical formula 1; (B) acrylic photopolymerizable monomer (acryl-based photopolymerizable monomer); (C) Photoepolymerizationinitiater initiater; (D) colorant; (E) solvent.
[Chemical formula 1]
In above chemical formula,
R
1Be the alkyl of hydrogen, C1-C20, the aryl of C6-C20, the alkaryl of C7-C20, the naphthenic base of C3-C20 or the multi-ring alkyl of C5-C20,
R
2And R
3The alkyl of C1-C20, the aryl of C6-C20, the alkaryl of C7-C20, the naphthenic base of C3-C20 or the multi-ring alkyl of C5-C20 independently of one another, and
R
4Be the alkylidene of C1-C20, the arlydene of C6-C20, the alkylidene aryl of C7-C20, the cycloalkylidene of C3-C20 or the inferior multi-ring alkyl of C5-C20.
Based on the total amount of the monomer that consists of the acrylic resin glue, the content of structural unit shown in the Chemical formula 1 is 0.05-50wt%.
The photosensitive resin composition that is used for colored filter can comprise: the acrylic resin glue that comprises structural unit shown in the above-mentioned Chemical formula 1 of 1-50wt%
The acrylic photopolymerizable monomer of 0.5-20wt%
The Photoepolymerizationinitiater initiater of 0.1-10wt%
The colorant of 0.1-40wt%
The solvent of surplus
The acrylic resin glue
Weight-average molecular weight
Be 1000-100000.
The acrylic resin glue
Acid number can be 20-200mgKOH/g.
The acrylic resin glue
Can comprise at least a by the structural unit shown in the Chemical formula 2-6.
[Chemical formula 2]
In above-mentioned chemical formula,
R
5Be hydrogen or methyl, and
K is the integer of 1-5.
[chemical formula 3]
In above-mentioned chemical formula,
R
6Be hydrogen or methyl, and
R
7For hydrogen, hydroxyl, carboxyl, halogen (halogen, halogen), the alkyl of haloalkyl (wherein, alkyl is for replacing or the alkyl of unsubstituted C1-C10), replacement or unsubstituted C1-C20 or-CO-R
8-COOH (wherein, R
8The alkylidene of replacement or unsubstituted C1-C10, or the alkylene oxide group of replacement or unsubstituted C1-C10).
[chemical formula 4]
In above-mentioned chemical formula,
R
9And R
10Hydrogen or methyl independently of one another, and
R
11Carboxyl, R
12Be carboxyl or-CONHR
13(wherein, R
13The alkyl of replacement or unsubstituted C1-C10, or the aryl of replacement or unsubstituted C6-C20), or R
11And R
12Be bonded to each other and (condense, fuse) form ring.
[chemical formula 5]
In above-mentioned chemical formula,
R
14Be hydrogen or methyl, and
R
15Aryl for replacement or unsubstituted C6-C30.
[chemical formula 6]
In above-mentioned chemical formula,
R
16Be hydrogen or methyl, and
R
17For replacing or the aryl of alkyl, replacement or the unsubstituted C6-C30 of unsubstituted C1-C20 and the aralkyl of replacement or unsubstituted C7-C30.
When acrylic resin glue (A) comprises all structural units shown in the Chemical formula 2-6, and the mol ratio of the structural unit shown in the above-mentioned Chemical formula 2-6 is when being respectively m, n, o, p and q, then
1≤q≤80.
The content of the structural unit shown in the above-mentioned Chemical formula 2-6 can be the 0.1-80wt% based on acrylic resin glue (A) total amount.
Photosensitive resin composition also can comprise adjuvant, it is selected from spreading agent, malonic acid, 3-amino-1, the 2-propylene glycol, contain silylation coupling agent, the levelling agent (levelling agent of vinyl or (methyl) acryloxy, leveling agent), fluorine based surfactant, radical polymerization initiator, and their potpourri.
According to another embodiment of the invention, provide the colored filter that adopts the photosensitive resin composition manufacturing that is used for colored filter.
Hereinafter will describe embodiments of the present invention in detail.
Because the photosensitive resin composition for colored filter according to the present invention has excellent thermotolerance and chemical resistance, thereby hole and patterning performance with excellence, thus, it can be advantageously applied in the tft array substrate and forms colored filter, to realize high aperture ratio and high-contrast.
Description of drawings
Fig. 1 illustrates by using the prepared photo of every kind of film after the stripper evaluation of resistance of photosensitive resin composition that is used for colored filter according to embodiment.
Fig. 2 illustrates by using the prepared photo of every kind of film after the stripper evaluation of resistance of photosensitive resin composition that is used for colored filter according to comparative example.
Embodiment
To describe illustrative embodiments of the present invention in detail hereinafter.Yet these embodiments only are exemplary, do not limit the present invention.
Unless other restrictions are provided, otherwise term used herein " alkyl " can refer to the alkyl of C1-C20, term " aryl " can refer to the aryl of C6-C30, term " aralkyl " can refer to the aralkyl of C7-C30, term " alkylidene " can refer to the alkylidene of C1-C20, and term " alkylene oxide group " can refer to the alkylene oxide group of C1-C20.
Unless other restrictions are provided, otherwise term used herein " replacement " can refer to that at least one hydrogen in the functional group is selected from following substituting group and replaces: halogen (F, Cl, Br or I), hydroxyl, nitro, cyano group, imido grpup (=NH ,=NR, R is the alkyl of C1-C10), amino (NH
2,-NH (R ') ,-N (R ") (R " '), R ', R " and R " ' be the alkyl of C1-C10 independently), the Heterocyclylalkyl of heteroaryl, replacement or the unsubstituted C2-C30 of naphthenic base, replacement or the unsubstituted C3-C30 of aryl, replacement or the unsubstituted C3-C30 of alkyl, replacement or the unsubstituted C6-C30 of amidino groups, diazanyl or hydrazone group, carboxyl, replacement or unsubstituted C1-C20.
Unless other restrictions are provided, at least one atom that can refer to be selected among N, O, S and the P replaces otherwise term used herein " is mixed ".
According to an embodiment of the invention, the photosensitive resin composition that is used for colored filter comprises (A) acrylic resin glue, comprises the structural unit shown in the following Chemical formula 1; (B) acrylic photopolymerizable monomer; (C) Photoepolymerizationinitiater initiater; (D) colorant; And (E) solvent.
[Chemical formula 1]
In above chemical formula,
R
1Be the alkyl of hydrogen, C1-C20, the aryl of C6-C20, the alkaryl of C7-C20, the naphthenic base of C3-C20 or the multi-ring alkyl of C5-C20,
R
2And R
3The alkyl of C1-C20, the aryl of C6-C20, the alkaryl of C7-C20, the naphthenic base of C3-C20 or the multi-ring alkyl of C5-C20 independently of one another, and
R
4Be the alkylidene of C1-C20, the arlydene of C6-C20, the alkylidene aryl of C7-C20, the cycloalkylidene of C3-C20 or the inferior multi-ring alkyl of C5-C20.
The photosensitive resin composition that is used for colored filter also can comprise other adjuvants (F).
Hereinafter, the component of the photosensitive resin composition that is used for colored filter will be described in detail.
(A) acrylic resin glue
The acrylic resin glue comprises the structural unit shown in the following Chemical formula 1.
The content of the structural unit shown in the Chemical formula 1, the total amount based on the acrylic resin glue can be 0.05-50wt%, and in one embodiment, is 0.1-30wt%.When the content of structural unit is in this scope, can have excellent close contact characteristic and developing property between acrylic resin glue and the substrate.
[Chemical formula 1]
Wherein, in above chemical formula,
R
1Be the alkyl of hydrogen, C1-C20, the aryl of C6-C20, the alkaryl of C7-C20, the naphthenic base of C3-C20 or the multi-ring alkyl of C5-C20,
R
2And R
3The alkyl of C1-C20, the aryl of C6-C20, the alkaryl of C7-C20, the naphthenic base of C3-C20 or the multi-ring alkyl of C5-C20 independently of one another, and
R
4Be the alkylidene of C1-C20, the arlydene of C6-C20, the alkylidene aryl of C7-C20, the cycloalkylidene of C3-C20 or the inferior multi-ring alkyl of C5-C20.
The acrylic resin glue can be multipolymer, it comprises the structural unit shown in the above Chemical formula 1, and comprise derived from the ethylenically unsaturated monomers that contains at least one carboxyl (ethylenic unsaturated monomer) or can with the structural unit of the ethylenically unsaturated monomers of its copolymerization.
Carboxylic ethylenically unsaturated monomers can comprise, such as acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid etc. can be adopted wherein one or more, but be not limited to this.
Can comprise with the ethylenically unsaturated monomers of the ethylenically unsaturated monomers copolymerization that contains at least one carboxyl, for example: alkenyl aromatic compound (alkenyl aromatic compound), such as styrene, α-methyl styrene, vinyltoluene, vinyl benzyl methyl ether etc.; The unsaturated carbon ester compound is such as methyl acrylate, methyl methacrylate, ethyl acrylate, β-dimethyl-aminoethylmethacrylate, butyl acrylate, butyl methacrylate, acrylic acid 2-hydroxy methacrylate, 2-hydroxyethyl methacrylate, acrylic acid 2-hydroxyl butyl ester, methacrylic acid 2-hydroxyl butyl ester, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate etc.; Unsaturated carbonic acid aminoalkyl ester compound is such as acrylic acid 2-amino ethyl ester, N-phenylmaleimide, glycolmethacrylate (glycolmethacrylate), poly-valerolactone methacrylate (polyvalerolactone methacrylate), NVP, methacrylic acid 2-amino ethyl ester, acrylic acid 2-dimethylamino ethyl ester, methacrylic acid 2-dimethylamino ethyl ester etc.; The ethylene carbonate ester compounds is such as vinyl acetate, vinyl benzoate etc.; Unsaturated carbon acid glycidyl ester compounds is such as glycidyl acrylate, glycidyl methacrylate etc.; Acrylonitrile compound (vinyl cyanide compound, vinyl cyanide compound) is such as vinyl cyanide, methacrylonitrile etc.; Acrylamide, unsaturated acyl amines such as Methacrylamide, but be not limited to this.
In addition, photosensitive resin composition for colored filter according to the present invention can comprise more than a kind of AP-52, it comprises at least a repetitive that is selected from following Chemical formula 2-6, and the structural unit of above Chemical formula 1, guaranteeing excellent thermotolerance and chemical resistance, and realize the fine pattern of colored filter.
[Chemical formula 2]
In above-mentioned chemical formula,
R
5Be hydrogen or methyl, and
K is the integer of 1-5.
[chemical formula 3]
In above-mentioned chemical formula,
R
6Be hydrogen or methyl, and
R
7For the alkyl of hydrogen, hydroxyl, carboxyl, halogen, haloalkyl (wherein, alkyl is for replacing or the alkyl of unsubstituted C1-C10), replacement or unsubstituted C1-C20 or-CO-R
8-COOH (wherein, R
8Replacement or the alkylidene of unsubstituted C1-C10 or the alkylene oxide group of replacement or unsubstituted C1-C10).
[chemical formula 4]
In above-mentioned chemical formula,
R
9And R
10Hydrogen or methyl independently of one another,
R
11Carboxyl, R
12Be carboxyl or-CONHR
13 
In, R
13Replacement or the alkyl of unsubstituted C1-C10 or the aryl of replacement or unsubstituted C6-C20), or R
11And R
12Being bonded to each other forms ring, for example, and R
11And R
12Being bonded to each other forms ring, such as cyclic acid anhydride (cyclic acid anhydride, cyclic acid anhydride) or pyrrolidine-2, the annulus of 5-diketone.
[chemical formula 5]
In above-mentioned chemical formula,
R
14Be hydrogen or methyl, and
R
15Aryl for replacement or unsubstituted C6-C30.
[chemical formula 6]
In above-mentioned chemical formula,
R
16Be hydrogen or methyl, and
R
17Be the alkyl of replacement or unsubstituted C1-C20, the aryl of replacement or unsubstituted C6-C30, and the aralkyl of replacement or unsubstituted C7-C30.
When acrylic resin glue (A) comprises all structural units shown in the Chemical formula 2-6, and the mol ratio of the structural unit shown in the above-mentioned Chemical formula 2-6 is when being respectively m, n, o, p and q, then 1≤m≤80
1≤q≤80.
Be selected from the content of the structural unit of above Chemical formula 2-6, can be the 0.1-80wt% based on acrylic resin glue total amount.When the content of the structural unit that is selected from above Chemical formula 2-6 was in this scope, the acrylic resin glue can bring excellent thermotolerance and chemical resistance, and pattern stability, but can deteriorated light transmission.
Comprise at least a being selected from and have the acrylic resin glue (A) of the structural unit of aliphatic group at side chain end (side chain) shown in the Chemical formula 2-6, the contained light reaction functional group of its structure and acrylic photopolymerizable monomer is similar, and the free radical that can introduce by the Photoepolymerizationinitiater initiater of hereinafter describing, carry out photopolymerization and crosslinked.
The crosslinked ratio of acrylic resin glue (A) depends on the acrylic photopolymerizable monomer and the ratio of the Photoepolymerizationinitiater initiater hereinafter described, thereby the crosslinked ratio of acrylic resin glue (A) can be regulated by the ratio of control acrylic photopolymerizable monomer and Photoepolymerizationinitiater initiater.
The weight-average molecular weight of acrylic resin glue (A) can be 1000-100000, particularly 5000-50000.The acid number of acrylic resin glue (A) can be 20-200mgKOH/g, particularly 50-180mgKOH/g.When the weight-average molecular weight of acrylic resin glue (A) and acid number during in this scope, photosensitive resin composition can have excellent development.
The consumption of acrylic resin glue (A) can be 1-50wt% based on the total amount of the photosensitive resin composition that is used for colored filter.When the content of acrylic resin glue (A) during in this scope, said composition can have excellent development in aqueous slkali, and owing to good crosslinkedly bring lower surfaceness, and peel off (pattern peeling) because good chemical resistance does not have pattern.
(B) acrylic photopolymerizable monomer
Acrylic photopolymerizable monomer (B) can comprise: glycol diacrylate, triethylene glycol diacrylate, 1, the 4-butanediol diacrylate, 1, the 6-hexanediyl ester, neopentylglycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, the dipentaerythritol diacrylate, the dipentaerythritol triacrylate, dipentaerythritol five acrylate, pentaerythrite six acrylate, bisphenol a diacrylate, trimethylolpropane triacrylate, Epoxy Phenolic Acrylates (novolacepoxy acrylate), ethylene glycol dimethacrylate, the diethylene glycol dimethylacrylate, TEGDMA, the propylene glycol dimethylacrylate, 1, the 4-butanediol dimethylacrylate, 1,6-hexanediol dimethacrylate etc., but be not limited to this.
The consumption of acrylic photopolymerizable monomer (B) can be 0.5-20wt% based on the total amount of the photosensitive resin composition that is used for colored filter.When the consumption of acrylic photopolymerizable monomer during in this scope, pattern can have neat edge, and has good development in alkaline-based developer.
(C) Photoepolymerizationinitiater initiater
Photoepolymerizationinitiater initiater (C) can comprise: triazine-based compound, acetophenone based compound (acetophenone based compound, acetophenone-based compound), benzophenone based compound, thioxanthones based compound, benzoin based compound, oximido compound etc.
Triazine-based compound can comprise: 2,4,6-three chloro-s-triazines, 2-phenyl-4,6-two (trichloromethyl)-s-triazine, 2-(3 ', 4 '-dimethoxy-styryl)-4,6-two (trichloromethyl)-s-triazine, 2-(4 '-the methoxyl naphthyl)-4,6-two (trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-two (trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-two (trichloromethyl)-s-triazine, 2-diphenyl-4,6-two (trichloromethyl)-s-triazine, 2,4-two (trichloromethyl)-6-styryl-s-triazine, 2-(naphthols-1-yl)-4,6-two (trichloromethyl)-s-triazine, 2-(4-methoxynaphthol-1-yl)-4,6-two (trichloromethyl)-s-triazine, 2,4-two (trichloromethyl)-6-piperonyl-s-triazine, 2,4-two (trichloromethyl)-6-(4 '-methoxyl-styrene)-the s-triazine etc.
The acetophenone based compound can comprise: 2,2 '-diethoxy acetophenone, 2,2 '-dibutoxy acetophenone, 2-hydroxy-2-methyl propiophenone, p-tert-butyl group trichloroacetophenone, p-tert-butyl group dichloroacetophenone, 4-chloro-acetophenone, 2,2 '-two chloro-4-metaphenoxy acetophenones, 2-methyl isophthalic acid-(4-(methyl sulfo-) phenyl)-2-morpholinyl third-1-ketone, 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl)-Ding-1-ketone etc.
The benzophenone based compound can comprise: benzophenone, benzoylbenzoic acid, benzoylbenzoic acid methyl esters, 4-phenyl benzophenone, dihydroxy benaophenonel, acroleic acid esterification benzophenone (acrylated benzophenone), 4,4 '-two (dimethylamino) benzophenone, 4,4 '-dichloro benzophenone, 3,3 '-dimethyl-2-methoxy benzophenone etc.
The thioxanthones based compound can comprise: thioxanthones, 2-methyl thioxanthones, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthones, CTX etc.
The benzoin based compound can comprise: benzoin, benzoin methylether, benzoin ethyl ether, benzoin iso-propylether, benzoin isobutyl ether, benzyl dimethyl ketal etc.
As Photoepolymerizationinitiater initiater; oximido compound can comprise: 2-(ortho-, meta-or p-benzoyl oximes)-1-[4-(phenyl sulfo-) phenyl]-1,2-acetyl caproyl and 1-(o-acetyl-base oxime)-1-[9-ethyl-6-(2-methyl benzoyl)-9H-carbazyl-3-yl] ethyl ketone.
Photoepolymerizationinitiater initiater also can comprise carbazyl compound, diketo compound, boric acid sulfonium based compound (sulfonium borate based compound, sulfonium borate-based compound), diazo compound, diimidazole based compound etc.
The content of Photoepolymerizationinitiater initiater can be 0.1-10wt% based on the total amount of the photosensitive resin composition that is used for colored filter.When the content of Photoepolymerizationinitiater initiater during in this scope, in the exposure process in pattern forming technology, this resin combination can obtain sufficient photopolymerization, and after photopolymerization, can not cause because of residual unreacted initiating agent that also transmittance (transmittance) descends.
(D) colorant
Colorant (D) can be selected from pigment, their combination of dye well.Especially, when pigment and dyestuff use together, can improve brightness and pattern and form ability.
Pigment can comprise: red, green, blue, Huang and purple.Pigment can comprise that anthraquinonyl pigment, condensation polycyclic pigment (condensed polycyclic pigment) are such as perylene base pigment etc., phthalocyanine color, azo group pigment etc.They use separately, or being used in combination with two or more.In one embodiment, for regulate maximum absorption wavelength, point of crossing (cross point), crosstalk (cross-talk, crosstalk) etc., than single pigment, the more preferably combination of two or more pigment.
Photosensitive resin composition being used for colored filter can comprise pigment as dispersible pigment dispersion.
In addition, pigment can comprise spreading agent, so that pigment composition can disperse equably.Spreading agent can comprise all nonionics, negative ion or cation dispersing agent, for example, poly alkylene glycol and ester thereof, polyoxyalkylene, polyol ester oxyalkylene adjuvant, pure oxyalkylene adjuvant, sulphonic acid ester, sulfonate, carboxylate, carboxylate, alkyl amino oxyalkylene adjuvant, alkyl amine etc.These spreading agents can use separately, or being used in combination with two or more.
In addition, contain carboxy acrylic base resin and spreading agent and can join in the pigment, to improve the stability of pattern of pixels voltinism energy and dispersible pigment dispersion.
The initial particle of pigment is 5-80nm.In another embodiment, its initial particle is 10-70nm.When the initial particle of pigment during in above scope, it has excellent stability in dispersion liquid, but can not reduce the resolution of pixel.
Dyestuff can comprise: the anthraquinonyl compound, cyanines based compound (cyanine based compound, cyanine-based compound), part cyanines based compounds (merocyanine based compound, merocyanine-based compound), the aza porphyrin based compound, phthalocyanine compound, pyrrolopyrrole based compound (pyrrolopyrrole-based compound), diazo compound (diazo-based compound), carbonium ion based compound (carbonium-based compound), acridine (acridine) based compound, thiazolyl compounds, quinindium based compound (quinidine-based compound), compound (methine-based compound) based on methine, quinoline compound etc.
When colorant comprised the potpourri of pigment and dyestuff, based on the general assembly (TW) of colorant, the weight ratio that pigment and dyestuff can 1: 9 to 9: 1 was mixed.When colorant was prepared with this scope, said composition can produce high brightness and contrast, thereby realized required color characteristic.
The consumption of colorant (D) can be 0.1-40wt% based on the total amount of the photosensitive resin composition that is used for colored filter.When the content of colorant (D) during in this scope, said composition can have suitable coloring effect and development.
(E) solvent
Solvent (E) has the compatibility with acrylic resin glue and other component materials, but not with its reaction.
Solvent (E) can comprise, such as: ethylene glycol acetate, ethyl cellosolve (ethyl cellosolve), ethyl ethoxy-c acid esters (ethyl ethoxy propionate), ethyl lactate, polyglycol etc.Solvent can comprise: the ethylene glycol compound, such as ethylene glycol, diethylene glycol etc.; The glycol ethers based compound is such as glycol monomethyl methyl ether, diethylene glycol monomethyl ether, ethylene glycol bisthioglycolate ethylether, diethylene glycol dimethyl ether etc.; Glycol ethers acetate groups compound is such as ethylene glycol monomethyl ether acetate, TC acetate, diethylene glycol single-butyl ether acetate etc.; Propandiols is such as propylene glycol etc.; The propylene glycol based compound, such as propylene glycol monomethyl ether, propylene glycol list ethylether, propylene glycol list propyl ether, propylene glycol single-butyl ether, propylene glycol dimethyl ether, dipropylene glycol dimethyl ether, propylene glycol Anaesthetie Ether, dipropylene glycol Anaesthetie Ether etc.; The propylene-glycol ether acetate based compound is such as propylene glycol monomethyl ether acetate, dihydroxypropane single-ethyl ether acetate etc.; Amido compounds is such as 1-METHYLPYRROLIDONE, dimethyl formamide, dimethyl acetamide etc.Keto compounds is such as methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), cyclohexanone etc.; The petroleum base compound is such as toluene, dimethylbenzene, solvent oil (solvent naphtha) etc.; Ester group compound is such as ethyl acetate, butyl acetate, ethyl lactate etc.According to the present invention, these compounds can be used as solvent separately or with the potpourri more than two kinds.
Solvent (E) can surplus use, and particularly, consumption is 20-90wt%.When the consumption of solvent during in this scope, photosensitive resin composition can have excellent coating performance and be 1 micron or can keep flatness (flatness) when thicker at film thickness.
(F) other adjuvants
As indicated above, the photosensitive resin composition for colored filter according to the present invention can comprise the spreading agent except (A) to (E) component in addition so that colorant (D) as pigment can be in solvent (E) Uniform Dispersion.
In addition, for preventing when applying, producing spot or dirt, and since level dyeing characteristic (leveling characteristic) or do not develop and cause residual, can add other adjuvants, such as malonic acid; 3-amino-1,2-PD; Silylation coupling agent with vinyl or (methyl) acryloxy; Levelling agent; Fluorine based surfactant; Radical polymerization initiator etc.The consumption of these adjuvants can easily be controlled according to desired properties.
The silylation coupling agent can comprise: vinyltrimethoxy silane, vinyl three (2-methoxy ethoxy silane), 3-glycidoxypropyltrimewasxysilane (3-glycidoxypropyl trimethoxysilane), 2-(3,4-epoxycyclohexyl) ethyl trimethoxy silane, 3-chloropropylmethyldimethoxysilane, 3-r-chloropropyl trimethoxyl silane, 3-methacryloxypropyl trimethoxy silane, 3-sulfydryl propyl trimethoxy silicane etc.The content of silylation coupling agent can be 0.01-2wt% based on the total amount of resin combination.When the content of silylation coupling agent during in above scope, can improve adhesiveness, storage stability and paintability.
Fluorine based surfactant can comprise the surfactant with fluorocarbon chain.Fluorine based surfactant can comprise: FULORAD FC430 and FULORAD FC431 (SUMITOMO 3M CO., LTD.); MEGAFACE F142D, MEGAFACE F171, MEGAFACE F172, MEGAFACE F173, MEGAFACE F177, MEGAFACE F183, MEGAFACE F470, MEGAFACE F475 and MEGAFACE R30 (DAINIPPON INK KAGAKU KOGYO CO., LTD. (DIC)); EFTOP EF301, EFTOP EF303, EFTOP EF351 and EFTOP EF352 (Shin Akita Kasei Kabushiki Kaisha); SURFLON S381, SURFLON S382, SURFLON SC101 and SURFLON SC105 (ASAHI GLASS CO., LTD.); E5844 (Daikin Finechemical Laboratory); Etc..
The colored filter of another embodiment can adopt the photosensitive resin composition manufacturing for colored filter according to the present invention.
Hereinafter, describe the method that adopts the photosensitive resin composition that is used for colored filter to make colored filter in detail.
Can adopt proper method; such as method of spin coating, slot coated method etc.; will be for the photosensitive resin composition of colored filter, on the naked substrate of glass and be coated with on the substrate of glass of the thick SiNx of 500-1500 dust (protective seam), be coated to the 3.1-3.4 micron thick.Carry out illumination to form the required pattern of colored filter through the substrate that applies.After the irradiation, with alkaline development solution-treated coating, to dissolve irradiation part not and to be formed for the pattern of colored filter.The number of times that these processes repeat is equal to the number that forms the necessary red, green, blue color of colored filter with required pattern.In addition, this pattern can solidify by heating or irradiation dynamic rays (active ray), with further raising scratch resistance (crack resistance), solvent resistance etc.
Usually, owing to the negative light-sensitive resin can not easily be peeled off by organic solvent, thereby its residue may pollute lower level (lower layer).In addition, because than the positive light-sensitive resin, a little less than the adhesion of negative light-sensitive resin and lower level, thereby it may produce larger undercutting (under-cut).Yet the photosensitive resin composition for colored filter according to the present invention can improve the negative light-sensitive resin to the resistance of stripper, thereby can prevent the pollution to lower level, also can improve the adhesiveness to lower level.
Hereinafter, with illustrated embodiments and comparative example, to explain in more detail the present invention.Yet, will be appreciated that, following illustrative embodiments does not limit the present invention, but explains the present invention.
Synthetic example 1-5: acrylic resin glue synthetic
2 of total monomer weight 10wt% will be accounted for, 2 '-azo two (2, the 4-methyl pentane nitrile) (initiating agent), place flask with refrigeratory and stirrer with other monomers with each weight ratio in the table 1, and based on the summation of initiating agent and the monomer of 100 weight portions, to the propylene glycol monomethyl ether acetate that wherein adds 200 weight portions (PGMEA) (solvent).Under nitrogen atmosphere, slowly stir the mixture.Then, reactant liquor is heated to 75 ℃, stirred the acrylic resin glue of the fatty hydrocarbon of aggregate packet 8 hours.The acrylic resin glue has the solid concentration of 30wt%, and its weight-average molecular weight is as shown in table 1.Weight-average molecular weight be adopt that GPC (gel permeation chromatography) measures, with the weight-average molecular weight (weight average molecular weight reduced to polystyrene) of polystyrene conversion.
(table 1)
Be used for the preparation of the photosensitive resin composition of colored filter
[embodiment 1-3]
The following component of following employing prepares photosensitive resin composition.At first, Photoepolymerizationinitiater initiater is dissolved in the solvent.Solution was at room temperature stirred 2 hours.Next, each is joined in the solution according to AP-52 and acrylic photopolymerizable monomer that synthetic example 1-3 polymerization obtains.This potpourri at room temperature stirred 2 hours.Then, dispersible pigment dispersion is joined in the potpourri of stirring.The potpourri that obtains at room temperature stirs 1 hour, thereby makes according to the photosensitive resin composition for colored filter of the present invention.With this solution filter three times to remove impurity.
[comparative example 1-2]
Except adopting according to every kind of synthetic AP-52 of synthetic example 4-5, be used for the photosensitive resin composition of colored filter according to the method preparation identical with embodiment 1-3.
(table 2)
The evaluation of antistripping fluidity energy
Photosensitive resin composition according to embodiment 1-3 and comparative example 1-2 is used for evaluation to the resistance of stripper.
To according to the photosensitive resin composition of embodiment 1-3 and comparative example 1-2, adopt the rotary coating machine
DNS Co.Ltd.
Be coated to 3 micron thick in transparent circular glass substrate (naked glass) respectively.With the soft baking 150 seconds on 80 ℃ of hot plates of the substrate through applying, use exposer
Expose for the light of 60mJ take output (power), developed 60 seconds at 25 ℃, then, clean 60 seconds also Rotary dryings (spin-dry) 25 seconds.Here, development is that to adopt concentration be that the potassium hydroxide aqueous solution of 1wt% is finished.Then, the substrate of development is hard the baking 30 minutes in 230 ℃ of baking ovens, at 70 ℃ of strippers
Soaked 40 minutes.
Adopt the situation of peeling off of Microscopy photometry photosensitive resin composition bar.The result provides in Fig. 1 and 2.
In Fig. 1, (a), (b) and (c) be followed successively by embodiment 1, each result of 2 and 3.
In Fig. 2, (a) with each result who (b) is followed successively by comparative example 1 and 2.
Based on the result of Fig. 1, along with the minimizing of the amount of the monomethyl acryloxy methyl acid phosphate diethylester with Chemical formula 1 structure, the pattern generation layering among the embodiment of the invention 1-3.In Fig. 2, the most of layering of the pattern of comparative example 1.Yet, have the pattern of the comparative example 2 of low acid number, than having higher acid value, but comprising the pattern of the embodiment 1-3 of the monomethyl acryloxy methyl acid phosphate diethylester with Chemical formula 1 structure, layering is more serious.Therefore, photosensitive resin composition according to the present invention shows as in substrate of glass and has excellent close contact characteristic.
Although described the present invention in conjunction with being considered to put into practice exemplary embodiment at present, but be understood that, the present invention is not limited to disclosed embodiment, but opposite, is intended to cover be included in the various modifications in the claims spirit and scope and be equal to arrangement.Above-mentioned embodiment is exemplary, should not limit by any way the present invention.
Claims (10)
1. photosensitive resin composition that is used for colored filter comprises:
(A) acrylic resin glue comprises the structural unit shown in the following Chemical formula 1;
(B) acrylic photopolymerizable monomer;
(C) Photoepolymerizationinitiater initiater;
(D) colorant; And
(E) solvent,
[Chemical formula 1]
Wherein, in above chemical formula,
R
1Be the alkyl of hydrogen, C1-C20, the aryl of C6-C20, the alkaryl of C7-C20, the naphthenic base of C3-C20 or the multi-ring alkyl of C5-C20,
R
2And R
3The alkyl of C1-C20, the aryl of C6-C20, the alkaryl of C7-C20, the naphthenic base of C3-C20 or the multi-ring alkyl of C5-C20 independently of one another, and
R
4Be the alkylidene of C1-C20, the arlydene of C6-C20, the alkylidene aryl of C7-C20, the cycloalkylidene of C3-C20 or the inferior multi-ring alkyl of C5-C20.
2. the photosensitive resin composition for colored filter according to claim 1, wherein, based on the total amount of the monomer that consists of described acrylic resin glue, the content of the structural unit shown in the Chemical formula 1 is 0.05-50wt%.
3. the photosensitive resin composition for colored filter according to claim 1, wherein, described photosensitive resin composition for colored filter comprises:
The described acrylic resin glue (A) that comprises the structural unit shown in the above Chemical formula 1 of 1-50wt%;
The described acrylic photopolymerizable monomer (B) of 0.5-20wt%;
The described Photoepolymerizationinitiater initiater (C) of 0.1-10wt%;
The described colorant (D) of 0.1-40wt%; And
The described solvent (E) of surplus.
4. the photosensitive resin composition for colored filter according to claim 1, wherein, the weight-average molecular weight (Mw) of described acrylic resin glue (A) is 1000 to 100000.
5. the photosensitive resin composition for colored filter according to claim 1, wherein, the acid number of described acrylic resin glue (A) is 20 to 200mgKOH/g.
6. the photosensitive resin composition for colored filter according to claim 1, wherein, described acrylic resin glue (A) also comprises at least a in the structural unit shown in the Chemical formula 2-6:
[Chemical formula 2]
Wherein, in above-mentioned chemical formula,
R
5Be hydrogen or methyl, and
K is the integer of 1-5,
[chemical formula 3]
Wherein, in above-mentioned chemical formula,
R
6Be hydrogen or methyl, and
R
7For the alkyl of hydrogen, hydroxyl, carboxyl, halogen, haloalkyl, replacement or unsubstituted C1-C20 or-CO-R
8-COOH, wherein, the alkyl in the described haloalkyl is the alkyl of replacement or unsubstituted C1-C10, and wherein, R
8To replace or the alkylidene of unsubstituted C1-C10 or the alkylene oxide group of replacement or unsubstituted C1-C10,
[chemical formula 4]
Wherein, in above-mentioned chemical formula,
R
9And R
10Hydrogen or methyl independently of one another, and
R
11Carboxyl, R
12Be carboxyl or-CONHR
13, or R
11And R
12Being bonded to each other forms ring, wherein, and R
13To replace or the alkyl of unsubstituted C1-C10 or the aryl of replacement or unsubstituted C6-C20,
[chemical formula 5]
Wherein, in above-mentioned chemical formula,
R
14Be hydrogen or methyl, and
R
15Be the aryl of replacement or unsubstituted C6-C30,
[chemical formula 6]
Wherein, in above-mentioned chemical formula,
R
16Be hydrogen or methyl, and
R
17For replacing or the aryl of alkyl, replacement or the unsubstituted C6-C30 of unsubstituted C1-C20 and the aralkyl of replacement or unsubstituted C7-C30.
7. the photosensitive resin composition for colored filter according to claim 6, wherein, when described acrylic resin glue (A) comprises all structural units shown in the following Chemical formula 2-6, and when the mol ratio of the structural unit shown in the above-mentioned Chemical formula 2-6 is respectively m, n, o, p and q, then
1≤q≤80.
8. the photosensitive resin composition for colored filter according to claim 5, wherein, based on the total amount of described acrylic resin glue (A), the content of the structural unit shown in the above-mentioned Chemical formula 2-6 is 0.1-80wt%.
9. the photosensitive resin composition for colored filter according to claim 1, wherein, described photosensitive resin composition also comprises adjuvant, described adjuvant is selected from spreading agent, malonic acid, 3-amino-1,2-PD, has silylation coupling agent, levelling agent, fluorine based surfactant, radical polymerization initiator and their potpourri of vinyl or (methyl) acryloxy.
10. an employing each described colored filter of making for the photosensitive resin composition of colored filter in 9 according to claim 1.
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| KR1020110063964A KR20130002789A (en) | 2011-06-29 | 2011-06-29 | Photosensitive resin composition for color filter and color filter using the same |
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| CN103869621A (en) * | 2012-12-07 | 2014-06-18 | 第一毛织株式会社 | Photosensitive Resin Composition for Color Filter, and Color Filter Using Same |
| CN109839802A (en) * | 2017-11-28 | 2019-06-04 | 北京鼎材科技有限公司 | Photosensitive resin composition containing polymerizable type photoinitiator |
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| KR20110078238A (en) | 2009-12-30 | 2011-07-07 | 제일모직주식회사 | Flame retardant thermoplastic resin composition having excellent scratch-resistance |
| KR20110077881A (en) * | 2009-12-30 | 2011-07-07 | 제일모직주식회사 | Phosphoric and acrylic copolymer resin having excellent transparency, flame-resistance and resin composition thereof |
| CN101805567B (en) | 2010-03-12 | 2012-10-31 | 北京化工大学 | Preparation method of combined phosphorus type flame-retardant acrylate pressure-sensitive adhesive |
| KR101293787B1 (en) | 2010-07-28 | 2013-08-06 | 제일모직주식회사 | Transparent Thermoplastic Resin Composition with Excellent Flame-resistance and Heat-resistance |
| KR101351614B1 (en) | 2010-11-05 | 2014-02-17 | 제일모직주식회사 | Polycarbonate resin composition with flame retardancy and scratch resistance |
| KR20120048384A (en) | 2010-11-05 | 2012-05-15 | 제일모직주식회사 | Acrylic resin with flame retardancy and method for preparing the same |
| KR101400193B1 (en) * | 2010-12-10 | 2014-05-28 | 제일모직 주식회사 | Photosensitive resin composition for color filter and color filter using same |
| KR101374360B1 (en) | 2010-12-14 | 2014-03-18 | 제일모직주식회사 | Polycarbonate resin composition with flame retardancy and scratch resistance |
| KR101411004B1 (en) | 2010-12-23 | 2014-06-23 | 제일모직주식회사 | Acrylic copolymer resin composition |
| KR20130002789A (en) | 2011-06-29 | 2013-01-08 | 제일모직주식회사 | Photosensitive resin composition for color filter and color filter using the same |
-
2011
- 2011-06-29 KR KR1020110063964A patent/KR20130002789A/en not_active Application Discontinuation
-
2012
- 2012-01-11 CN CN201210007804.5A patent/CN102854749B/en active Active
- 2012-01-19 US US13/353,710 patent/US9005491B2/en active Active
- 2012-02-01 TW TW101103253A patent/TWI460542B/en active
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| US5827626A (en) * | 1995-03-16 | 1998-10-27 | Hitachi Chemical Co., Ltd. | Production of color filter |
| CN101464631A (en) * | 2007-12-18 | 2009-06-24 | 第一毛织株式会社 | Photosensitive resin composition with good stripper-resistance for color filter and color filter formed using the same |
| KR20100098882A (en) * | 2009-03-02 | 2010-09-10 | 제일모직주식회사 | Photosensitive resin composition for color filter and color filter using same |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103869621A (en) * | 2012-12-07 | 2014-06-18 | 第一毛织株式会社 | Photosensitive Resin Composition for Color Filter, and Color Filter Using Same |
| US9864272B2 (en) | 2012-12-07 | 2018-01-09 | Samsung Sdi Co., Ltd. | Photosensitive resin composition for color filter, and color filter using the same |
| CN109839802A (en) * | 2017-11-28 | 2019-06-04 | 北京鼎材科技有限公司 | Photosensitive resin composition containing polymerizable type photoinitiator |
| CN109839802B (en) * | 2017-11-28 | 2022-11-22 | 北京鼎材科技有限公司 | Photosensitive resin composition containing polymerizable photoinitiator |
Also Published As
| Publication number | Publication date |
|---|---|
| US20130001483A1 (en) | 2013-01-03 |
| US9005491B2 (en) | 2015-04-14 |
| KR20130002789A (en) | 2013-01-08 |
| CN102854749B (en) | 2015-05-27 |
| TW201300953A (en) | 2013-01-01 |
| TWI460542B (en) | 2014-11-11 |
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