DE69612630T2 - Photosensitive resin composition and method for producing fine structures therewith - Google Patents
Photosensitive resin composition and method for producing fine structures therewithInfo
- Publication number
- DE69612630T2 DE69612630T2 DE1996612630 DE69612630T DE69612630T2 DE 69612630 T2 DE69612630 T2 DE 69612630T2 DE 1996612630 DE1996612630 DE 1996612630 DE 69612630 T DE69612630 T DE 69612630T DE 69612630 T2 DE69612630 T2 DE 69612630T2
- Authority
- DE
- Germany
- Prior art keywords
- resin composition
- photosensitive resin
- producing fine
- fine structures
- structures therewith
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1010395 | 1995-01-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69612630D1 DE69612630D1 (en) | 2001-06-07 |
DE69612630T2 true DE69612630T2 (en) | 2001-10-11 |
Family
ID=11740986
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1996612630 Expired - Lifetime DE69612630T2 (en) | 1995-01-25 | 1996-01-22 | Photosensitive resin composition and method for producing fine structures therewith |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0725315B1 (en) |
KR (1) | KR100382443B1 (en) |
DE (1) | DE69612630T2 (en) |
TW (1) | TW408248B (en) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100245180B1 (en) * | 1996-05-29 | 2000-02-15 | 니시무로 타이죠 | A phothosensitive composition, a method of forming a pattern and electronic parts |
EP1376229B1 (en) | 1997-08-08 | 2010-10-13 | Dai Nippon Printing Co., Ltd. | Plate for lithography and process for producing the same |
JP4096138B2 (en) * | 1999-04-12 | 2008-06-04 | Jsr株式会社 | Method for producing resist underlayer film composition |
WO2002077714A1 (en) * | 2001-03-26 | 2002-10-03 | Nippon Paint Co., Ltd. | Self-flame-retardant resist material and insulating material |
KR20040005896A (en) * | 2001-03-26 | 2004-01-16 | 닛뽕 뻬인또 가부시키가이샤 | Method for forming metal pattern |
JP2002290018A (en) * | 2001-03-26 | 2002-10-04 | Nippon Paint Co Ltd | Method of manufacturing printed wiring board and resist material |
US6830818B2 (en) * | 2001-04-13 | 2004-12-14 | Hitachi Cable, Ltd. | Polymer material and polymer film |
US7035518B2 (en) | 2001-04-13 | 2006-04-25 | Hitachi Cable, Ltd. | Polymer waveguides and process for producing the same |
US6699748B2 (en) | 2002-05-30 | 2004-03-02 | Mitsubishi Denki Kabushiki Kaisha | Method of fabricating capacitor having a photosensitive resin layer as a dielectric |
JP2007537337A (en) * | 2004-05-14 | 2007-12-20 | ダウ・コーニング・コーポレイション | Method for preparing branched polysilanes |
KR100881860B1 (en) | 2007-01-17 | 2009-02-06 | 제일모직주식회사 | Photosensitive resin composition for color filter and color filter of image sensor using the composition |
KR100959187B1 (en) | 2007-10-18 | 2010-05-24 | 제일모직주식회사 | Ink composition for color filter, method for preparing a color filter using the same, and color filter |
US8486591B2 (en) | 2008-10-24 | 2013-07-16 | Cheil Industries Inc. | Photosensitive resin composition for color filter and color filter prepared using the same |
KR101344790B1 (en) | 2010-06-10 | 2013-12-24 | 제일모직주식회사 | Blue color resin composition for color filter and color filter using same |
KR101293787B1 (en) | 2010-07-28 | 2013-08-06 | 제일모직주식회사 | Transparent Thermoplastic Resin Composition with Excellent Flame-resistance and Heat-resistance |
CN102436142B (en) | 2010-09-29 | 2013-11-06 | 第一毛织株式会社 | Black photosensitive resin composition and light blocking layer using the same |
KR101351614B1 (en) | 2010-11-05 | 2014-02-17 | 제일모직주식회사 | Polycarbonate resin composition with flame retardancy and scratch resistance |
KR101443757B1 (en) | 2010-11-08 | 2014-09-25 | 제일모직 주식회사 | Photosensitive resin composition for color filter and color filter using same |
KR101453771B1 (en) | 2010-11-08 | 2014-10-23 | 제일모직 주식회사 | Photosensitive resin composition for color filter and color filter using same |
KR101400194B1 (en) | 2010-12-01 | 2014-05-27 | 제일모직 주식회사 | Photosensitive resin composition for color filter, and color filter using the same |
KR101400193B1 (en) | 2010-12-10 | 2014-05-28 | 제일모직 주식회사 | Photosensitive resin composition for color filter and color filter using same |
KR101374360B1 (en) | 2010-12-14 | 2014-03-18 | 제일모직주식회사 | Polycarbonate resin composition with flame retardancy and scratch resistance |
KR20130002789A (en) | 2011-06-29 | 2013-01-08 | 제일모직주식회사 | Photosensitive resin composition for color filter and color filter using the same |
KR101344786B1 (en) | 2011-12-02 | 2013-12-26 | 제일모직주식회사 | Photosensitive resin composition for color filter comprising the same and color filter using the same |
KR101674990B1 (en) | 2012-12-07 | 2016-11-10 | 제일모직 주식회사 | Photosensitive resin composition for color filter, and color filter using the same |
KR20140076320A (en) | 2012-12-12 | 2014-06-20 | 제일모직주식회사 | Photosensitive resin composition and black spacer using the same |
KR20140083620A (en) | 2012-12-26 | 2014-07-04 | 제일모직주식회사 | Photosensitive resin composition for light blocking layer and light blocking layer using the same |
US10018912B2 (en) | 2014-06-13 | 2018-07-10 | Sharp Kabushiki Kaisha | Photosensitive resin composition, wavelength conversion substrate and light emitting device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61189533A (en) * | 1985-02-19 | 1986-08-23 | Hitachi Ltd | Photosensitive resin composition |
JPH0643655A (en) * | 1991-03-04 | 1994-02-18 | Internatl Business Mach Corp <Ibm> | Forming process of resist image and electronic device |
CA2087110A1 (en) * | 1992-01-14 | 1993-07-15 | Hiroshi Tsushima | Method of forming color pattern |
JPH06289528A (en) * | 1993-04-07 | 1994-10-18 | Nippon Paint Co Ltd | Photosensitive color developing composition |
-
1996
- 1996-01-22 EP EP19960300399 patent/EP0725315B1/en not_active Expired - Lifetime
- 1996-01-22 DE DE1996612630 patent/DE69612630T2/en not_active Expired - Lifetime
- 1996-01-24 TW TW85100827A patent/TW408248B/en active
- 1996-01-24 KR KR1019960001486A patent/KR100382443B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0725315A3 (en) | 1997-05-02 |
EP0725315B1 (en) | 2001-05-02 |
DE69612630D1 (en) | 2001-06-07 |
TW408248B (en) | 2000-10-11 |
KR100382443B1 (en) | 2004-05-31 |
EP0725315A2 (en) | 1996-08-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |