CN102844461A - 用调质材料内涂覆功能层的方法 - Google Patents

用调质材料内涂覆功能层的方法 Download PDF

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Publication number
CN102844461A
CN102844461A CN2011800193259A CN201180019325A CN102844461A CN 102844461 A CN102844461 A CN 102844461A CN 2011800193259 A CN2011800193259 A CN 2011800193259A CN 201180019325 A CN201180019325 A CN 201180019325A CN 102844461 A CN102844461 A CN 102844461A
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CN
China
Prior art keywords
layer
base material
precursor
pores
functional layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011800193259A
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English (en)
Chinese (zh)
Inventor
R.瓦森
F.冯达伦
D.塞博尔德
D.E.马克
G.莫尔
D.施特弗
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Forschungszentrum Jülich
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Forschungszentrum Jülich
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Filing date
Publication date
Application filed by Forschungszentrum Jülich filed Critical Forschungszentrum Jülich
Publication of CN102844461A publication Critical patent/CN102844461A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B19/00—Machines or methods for applying the material to surfaces to form a permanent layer thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
    • F01D5/00—Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
    • F01D5/12—Blades
    • F01D5/28—Selecting particular materials; Particular measures relating thereto; Measures against erosion or corrosion
    • F01D5/288—Protective coatings for blades
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/24997—Of metal-containing material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
CN2011800193259A 2010-04-16 2011-04-05 用调质材料内涂覆功能层的方法 Pending CN102844461A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102010015470.9 2010-04-16
DE201010015470 DE102010015470A1 (de) 2010-04-16 2010-04-16 Verfahren zur Innenbeschichtung von Funktionsschichten mit einem Vergütungsmaterial
PCT/DE2011/000370 WO2011127896A1 (de) 2010-04-16 2011-04-05 Verfahren zur innenbeschichtung von funktionsschichten mit einem vergütungsmaterial.

Publications (1)

Publication Number Publication Date
CN102844461A true CN102844461A (zh) 2012-12-26

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011800193259A Pending CN102844461A (zh) 2010-04-16 2011-04-05 用调质材料内涂覆功能层的方法

Country Status (6)

Country Link
US (1) US20130196141A1 (cg-RX-API-DMAC10.html)
EP (1) EP2558611A1 (cg-RX-API-DMAC10.html)
JP (1) JP2013525599A (cg-RX-API-DMAC10.html)
CN (1) CN102844461A (cg-RX-API-DMAC10.html)
DE (1) DE102010015470A1 (cg-RX-API-DMAC10.html)
WO (1) WO2011127896A1 (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116234784A (zh) * 2020-09-29 2023-06-06 赛峰集团陶瓷 制造环境屏障的方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9290836B2 (en) * 2012-08-17 2016-03-22 General Electric Company Crack-resistant environmental barrier coatings
US11326253B2 (en) * 2016-04-27 2022-05-10 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US10186400B2 (en) 2017-01-20 2019-01-22 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
US10975469B2 (en) * 2017-03-17 2021-04-13 Applied Materials, Inc. Plasma resistant coating of porous body by atomic layer deposition
US11473197B2 (en) 2018-03-16 2022-10-18 Raytheon Technologies Corporation HPC and HPT disks coated by atomic layer deposition
US10443126B1 (en) 2018-04-06 2019-10-15 Applied Materials, Inc. Zone-controlled rare-earth oxide ALD and CVD coatings
US11015252B2 (en) * 2018-04-27 2021-05-25 Applied Materials, Inc. Protection of components from corrosion
US11053855B2 (en) * 2019-06-06 2021-07-06 Raytheon Technologies Corporation Reflective coating and coating process therefor
EP3754049A1 (en) 2019-06-21 2020-12-23 Raytheon Technologies Corporation Reactive thermal barrier coating
CN113529075B (zh) * 2020-04-20 2022-05-03 厦门大学 一种液态金属复合多孔膜及其制备方法和应用
US20240343917A1 (en) * 2023-04-14 2024-10-17 Raytheon Technologies Corporation Environmental barrier coating and method of applying the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050202168A1 (en) * 2002-08-16 2005-09-15 General Electric Company Thermally-stabilized thermal barrier coating and process therefor
US7285312B2 (en) * 2004-01-16 2007-10-23 Honeywell International, Inc. Atomic layer deposition for turbine components

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0852223A1 (en) * 1996-12-04 1998-07-08 European Atomic Energy Community (Euratom) Method of sealing open-pore ceramic coatings, in particular thermal barriers
US6887588B2 (en) * 2001-09-21 2005-05-03 General Electric Company Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication
DE10200803A1 (de) 2002-01-11 2003-07-31 Forschungszentrum Juelich Gmbh Herstellung eines keramischen Werkstoffes für eine Wärmedämmschicht sowie eine den Werkstoff enthaltene Wärmedämmschicht
US20050287826A1 (en) * 2004-06-29 2005-12-29 Abell Thomas J Method of sealing low-k dielectrics and devices made thereby
RU2399432C2 (ru) * 2005-03-22 2010-09-20 Стюарт Дж. мл. БЕРЧИЛЛ Высокопористые мелкие частицы с покрытием, композиция и способ производства
US7678712B2 (en) * 2005-03-22 2010-03-16 Honeywell International, Inc. Vapor phase treatment of dielectric materials
US8039050B2 (en) * 2005-12-21 2011-10-18 Geo2 Technologies, Inc. Method and apparatus for strengthening a porous substrate
FI20095630A0 (fi) * 2009-06-05 2009-06-05 Beneq Oy Suojapinnoitus, menetelmä alustan suojaamiseksi ja menetelmän käyttö

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050202168A1 (en) * 2002-08-16 2005-09-15 General Electric Company Thermally-stabilized thermal barrier coating and process therefor
US7285312B2 (en) * 2004-01-16 2007-10-23 Honeywell International, Inc. Atomic layer deposition for turbine components

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116234784A (zh) * 2020-09-29 2023-06-06 赛峰集团陶瓷 制造环境屏障的方法

Also Published As

Publication number Publication date
US20130196141A1 (en) 2013-08-01
EP2558611A1 (de) 2013-02-20
JP2013525599A (ja) 2013-06-20
WO2011127896A1 (de) 2011-10-20
DE102010015470A1 (de) 2011-10-20

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Application publication date: 20121226