CN102834759A - Observation optical system and laser processing device - Google Patents
Observation optical system and laser processing device Download PDFInfo
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- CN102834759A CN102834759A CN2011800152846A CN201180015284A CN102834759A CN 102834759 A CN102834759 A CN 102834759A CN 2011800152846 A CN2011800152846 A CN 2011800152846A CN 201180015284 A CN201180015284 A CN 201180015284A CN 102834759 A CN102834759 A CN 102834759A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 59
- 210000001747 pupil Anatomy 0.000 claims abstract description 9
- 238000005286 illumination Methods 0.000 claims description 78
- 238000000034 method Methods 0.000 claims description 29
- 238000003384 imaging method Methods 0.000 claims description 26
- 230000000903 blocking effect Effects 0.000 claims description 13
- 230000003760 hair shine Effects 0.000 claims description 2
- 230000014509 gene expression Effects 0.000 description 19
- 230000000694 effects Effects 0.000 description 9
- KPHWPUGNDIVLNH-UHFFFAOYSA-M diclofenac sodium Chemical compound [Na+].[O-]C(=O)CC1=CC=CC=C1NC1=C(Cl)C=CC=C1Cl KPHWPUGNDIVLNH-UHFFFAOYSA-M 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 230000009977 dual effect Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000637 aluminium metallisation Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/10—Condensers affording dark-field illumination
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/365—Control or image processing arrangements for digital or video microscopes
Abstract
An observation optical system with which it is possible to observe well both a shading pattern and a mark for determining the position of an object. After light emitted from the light source of a lighting device (117) passes through a condensing lens (118), is reflected by a half mirror (120), passes through a dichroic mirror (115), and forms an image in the pupil of an objective lens (116), the light then radiates a photovoltaic cell panel (102) through the objective lens (116). The light reflected from the photovoltaic cell panel (102) passes through the objective lens (116), the dichroic mirror (115), and the half mirror (120), and forms an image on an image-forming lens (121). Given that the wavelength of the light is and the line width of the alignment mark of the photovoltaic cell panel (102) is w, then a light shield (119) blocks light that is striking within the range of a numerical aperture less than substantially 2 /w of the objective lens (116). The present invention can be applied to, for example, a laser processing device.
Description
Technical field
The present invention relates to viewing optical system and laser process equipment, particularly the viewing optical system and the laser process equipment of the mark of the location usefulness of object of observation thing and gradation pattern well.
Background technology
In the past, used the bright field optical system, the viewing optical system of using during as the alignment mark of the location usefulness that is arranged at objects such as substrate in observation.But if bright field optical system in the past, the flashlight of the alignment mark that comprises in the reflected light from object is sometimes compared little with other noise light, can only observe alignment mark with lower contrast.
Therefore, use the dark field optical system (for example, with reference to patent documentation 1) that to observe alignment mark with high-contrast sometimes.
Patent documentation 1: japanese kokai publication hei 8-306609 communique
But if dark field optical system in the past, for example, the zone (below, be called non-scattering region) that smooth plane etc. does not produce the scattered light of object becomes pitch-dark, and can't observe this regional gradation pattern.Therefore, in order to observe the gradation pattern of non-scattering region, must employed optical system be switched to the bright field optical system from the dark field optical system.
Summary of the invention
The present invention is in light of this situation and accomplishes, well both of the alignment mark of object of observation thing and gradation pattern.
The viewing optical system of the 1st aspect of the present invention is to be used for the viewing optical system of the location of object of observation thing with mark, comprising: object lens; The collector lens that the illumination light sent from light source is formed images in the pupil of said object lens; Make from through said object lens illuminated said illumination light said object reflected light, promptly see through the imaging len of the reflected light imaging behind the said object lens; Between said collector lens and the said object lens and between said object lens and the said imaging len, said illumination light and said catoptrical light path are carried out the branch units of branch; Said illumination light wavelength is being made as λ, the width of narrow part of said location with mark is being made as under the situation of w; Be arranged between said collector lens and the said branch units, will incide said object lens roughly less than the lightproof unit of the said illumination light blocking in the numerical aperture scope of 2 λ/w, and be arranged between said branch units and the said object lens, will incide said object lens roughly less than at least one side in the lightproof unit of the said reflected light blocking in the numerical aperture scope of 2 λ/w.
In the viewing optical system aspect the of the present invention the 1st, illumination light is formed images in the pupil of object lens, shine object through object lens, the reflected light that reflects from object sees through object lens, utilizes the imaging len imaging.In addition, incide roughly being interdicted of object lens less than illumination light or reflected light in the numerical aperture scope of 2 λ/w.
Thereby the location of object of observation thing is with mark and gradation pattern well.In addition, improved the bearing accuracy of object, and shortened positioning time.
This light source for example is made up of LED.This branch units for example is made up of semi-transparent semi-reflecting lens.This lightproof unit is for example by the occulter that utilizes sheet metal to form, or film forming has photomask and the occulter that obtains constitutes on glass plate.
This lightproof unit can constitute the lightproof area that has with the roughly the same shape in cross section of said illumination light.
Thus, can eliminate the spot of the illumination light that shines object.
This illumination light can be a monochromatic light.
Thus, can more clearly observe the location and use mark.
The laser process equipment of the 2nd aspect of the present invention; Have the location that is used for object of observation thing and with being used for the processing optical system with laser is processed in said object irradiation with the viewing optical system of mark; Said viewing optical system comprises: the light source that sends illumination light; Object lens; The collector lens that said illumination light is formed images in the pupil of said object lens; Make from through said object lens illuminated said illumination light said object reflected light, promptly see through the imaging len of the reflected light imaging behind the said object lens; Between said collector lens and the said object lens and between said object lens and the said imaging len, said illumination light and said catoptrical light path are carried out the branch units of branch; Said illumination light wavelength is being made as λ, the width of narrow part of said location with mark is being made as under the situation of w; Be arranged between said collector lens and the said branch units, will incide said object lens roughly less than the lightproof unit of the said illumination light blocking in the numerical aperture scope of 2 λ/w, and be arranged between said branch units and the said object lens, will incide said object lens roughly less than at least one side in the lightproof unit of the said reflected light blocking in the numerical aperture scope of 2 λ/w.
Thereby the location of object of observation thing is with both of mark and gradation pattern well.In addition, improved the bearing accuracy of object and shortened positioning time.Its result has improved the machining precision of Laser Processing and has shortened process time.
This light source for example is made up of LED.This branch units for example is made up of semi-transparent semi-reflecting lens.This lightproof unit for example is made up of occulter that utilizes sheet metal to form or the occulter that obtains at glass plate film forming photomask.
This laser can shine said object through said object lens.
Thus, can the object lens of viewing optical system and processing optical system be changed jointly, thereby can reduce the part number of packages.
According to the 1st aspect of the present invention or the 2nd aspect, the location that can observe the object that becomes the object that will observe well is with both of mark and gradation pattern.
Description of drawings
Fig. 1 is the block diagram that an embodiment of laser process equipment of the present invention has been used in expression.
Fig. 2 is the figure of the 1st example of expression occulter.
Fig. 3 is the figure of the 2nd example of expression occulter.
Fig. 4 is the figure of the 3rd example of expression occulter.
Fig. 5 is the figure of the 4th example of expression occulter.
Fig. 6 is the figure of the example of expression alignment mark.
Fig. 7 is the figure that is used to explain the condition that can observe alignment mark.
Fig. 8 is the curve map of example of the OTF characteristic of expression object lens.
Fig. 9 is the curve map of the example of removing the OTF characteristic behind the middle section of expression object lens.
Figure 10 is the figure that is used to explain the action effect of laser process equipment.
Figure 11 is the figure that is used to explain the action effect of laser process equipment.
Figure 12 is the figure that is used to explain the action effect of laser process equipment.
Figure 13 is the figure that is used to explain the action effect of laser process equipment.
Figure 14 is the figure that is used to explain the action effect of laser process equipment.
Figure 15 is the figure of example in the cross section of expression illumination light.
Figure 16 is the figure of expression through the example in the cross section of the illumination light behind the collector lens.
Figure 17 is the figure of the example in the expression cross section that sees through the illumination light behind the occulter with circular lightproof area.
Figure 18 is the figure of the example in the expression cross section that sees through the illumination light behind the occulter of the lightproof area with rectangle.
Figure 19 is the figure of the 5th example of expression occulter.
Figure 20 is the figure of the 6th example of expression occulter.
Embodiment
Describe down in the face of the mode that is used for embodiment of the present invention (below be called embodiment).In addition, describe by following order.
1. embodiment
2. variation
1. embodiment
[the formation example of laser process equipment]
Fig. 1 is the figure of an embodiment that the optical system of laser process equipment 101 of the present invention has been used in expression.
Laser process equipment 101 is the equipment that carries out the Laser Processing of processing object things such as substrate.In addition, below, as an example of processing object thing, the solar panel 102 of giving an example describes.
The optical system structure of laser process equipment 101 comprises: laser oscillator 111, optical beam expander 112, slit 113, imaging len 114, dichronic mirror 115, object lens 116, lighting device 117, collector lens 118, occulter 119, semi-transparent semi-reflecting lens 120, imaging len 121 and CCD (Charge Coupled Device) video camera 122.Wherein, be configured for the processing optical system of solar panel 102 irradiation processing by laser oscillator 111, optical beam expander 112, slit 113, imaging len 114, dichronic mirror 115 and object lens 116 with laser.In addition, the viewing optical system that is configured for observing solar panel 102 by object lens 116, lighting device 117, collector lens 118, occulter 119, semi-transparent semi-reflecting lens 120, imaging len 121 and ccd video camera 122.
At first the effect to the processing optical system describes.
From the laser that laser oscillator 111 penetrates, expanded beam diameter by optical beam expander 112, and by collimation, and through slit 113, thus, beam diameter is restricted to the size of regulation.Through the laser behind the slit 113, by imaging len 114 collimations, and by the direction reflection of dichronic mirror 115 to object lens 116, by the machined surface of object lens 116 optically focused to solar panel 102.In addition, utilize scanning elements (not shown) such as vibration mirror reflected mirror, scan laser on the machined surface of solar panel 102.And, utilize this laser that the machined surface of solar panel 102 is processed.
Effect in the face of viewing optical system describes down.
Lighting device 117 for example comprises the light source by the circle of monochromatic LED (Light Emitting Diode, the light emitting diode) formation of provision wavelengths (for example 0.6 μ m).In addition, can consider to make light source of the present invention is area source.And, be circular illumination light from the cross section that the light source of lighting device 117 penetrates, by collector lens 118 optically focused, reflect by the direction of semi-transparent semi-reflecting lens 120 to object lens 116, and in the pupil imaging of object lens 116.Illumination light in the pupil of object lens 116 after the imaging is carried out Fourier transform by object lens 116, and is shone solar panel 102.
The light (below be called reflected light) of reflection in solar panel 102 sees through object lens 116, dichronic mirror 115, semi-transparent semi-reflecting lens 120 and imaging len 121 and incides ccd video camera 122.At this moment, reflected light utilizes imaging len 121 on the sensitive surface of the ccd image sensor (not shown) of ccd video camera 122, to form images after seeing through object lens 116, and catoptrical picture is taken by ccd video camera 122.
In addition, between collector lens 118 and object lens 116, near semi-transparent semi-reflecting lens 120 sides of collector lens 118, be provided with occulter 119.Occulter 119 is for example processed sheet metals such as stainless steels and is obtained, and blocking sees through near the light the optical axis in the illumination light of collector lens 118, collector lens 118.
[the formation example of occulter]
At this,, the formation example of the occulter that uses in the laser process equipment 101 is described with reference to Fig. 2 to Fig. 5.In addition, in Fig. 2 to Fig. 5, the lightproof area that the illumination light of incident is interdicted with grid representation.
In the occulter 151 of Fig. 2, be provided with circular lightproof area 151A in central authorities.In addition, in order to support lightproof area 151A, the peripheral part 151B of lightproof area 151A and ring-type is connected through the connecting portion 151C to 151F of linearity.Become consistent through center configuration, make that the light that sees through near the circular lightproof area 151A of optical axis in the illumination light of collector lens 118, that incide collector lens 118 is interdicted with the optical axis of collector lens 118 with this occulter 151.
In the occulter 152 of Fig. 3,, equally spaced be arranged with the peristome of a plurality of equal-sized circles in the form of a ring with the mode of lightproof area 152A of the circular of surrounding central authorities.Become consistent with the optical axis of collector lens 118 through the center configuration with this occulter 152, the feasible light that sees through near the lightproof area 152A of the circular of optical axis in the illumination light of collector lens 118, that incide collector lens 118 is interdicted.
In addition, if the occulter of Fig. 2 151 is interdicted owing to incide the light of connecting portion 151C to 151F; The brightness of the light through occulter 151; Produce owing to the different deviations that cause of direction from optical axis, still, through the light of occulter 152; Do not produce such luminance deviation, and become almost impartial brightness.
The occulter 153 of Fig. 4 and the occulter 154 of Fig. 5 are variation of the occulter 152 of Fig. 3.In the occulter 153 of Fig. 4, the mode of lightproof area 153A with the circular of surrounding central authorities is the peristome that dual ring-type equally spaced is arranged with a plurality of equal-sized circles.In the occulter 154 of Fig. 5, the mode of lightproof area 154A with the circular of surrounding central authorities be the peristome that dual ring-type equally spaced is arranged with a plurality of circles, and the peristome in the outside is bigger than inboard peristome.Like this, through size and the arrangement of adjusting circular peristome, can adjust the size of central lightproof area etc.
[the shading scope of occulter 119]
With reference to Fig. 6 to Fig. 9 the shading scope of occulter 119 is discussed below.
Fig. 6 is illustrated in solar panel 102 as the example of locating the alignment mark 201 that is provided with mark.Alignment mark 201 has the line segment of width w (for example 20 μ m), length l (for example 120 μ m), thickness t (for example 2 μ m) by the shape after the right-angled intersection.Alignment mark 201 for example is through the glass substrate AM aluminum metallization film at solar panel 102, or in the manufacturing process of solar panel 102, a range upon range of film removal part is formed.In addition, mainly the situation that forms alignment mark 201 through vapor deposition is described following.
In order to observe the alignment mark 201 of this live width w, according to Shannon information theorem, the viewing optical system of laser process equipment 101 need have the ability of the relief pattern that can observe pitch P≤w/2.Describe simply with reference to Fig. 7 for this condition.
If with the pitch of the diffraction grating 211 of Fig. 7 be made as p=w/2, with the angle of diffraction of 1 diffraction light of diffraction grating 211 be made as α, the light wavelength of will throw light on is made as λ, then following formula establishment.
sinα＝λ/p p＝2λ/w ?...(1)
Thereby,, then, can observe the relief pattern of pitch P=w/2 through making sin β >=sin α=2 λ/w if the airborne numerical aperture (NA) of object lens 116 is made as sin β.In addition, angle beta is the maximum visual angle of object lens 116.
In addition, according to formula (1), 1 angle of diffraction α of the more little then diffraction grating 211 of pitch P is big more, and 1 angle of diffraction α of the bigger then diffraction grating 211 of pitch P is more little.Thereby, comprise the light of relief pattern information of thin (spatial frequency is higher) on solar panel 102 surface, through the peripheral zone of object lens 116, promptly come angle (visual angle) the big zone of read fortune for optical axis from solar panel 102.On the other hand, the information of the relief pattern of thick (spatial frequency is low) on solar panel 102 surface, is little zone, visual angle at the middle section through object lens 116.
Fig. 8 is the curve map of example of the optical transfer function (below be called OTF) of expression object lens 116.Transverse axis representation space frequency (unit is cycle/mm), the longitudinal axis is represented OTF.In addition; The OTF curve of curve 221 expression object lens 116 integral body; The middle section of the object lens 116 of curve 222 expressions and view angle theta＜α (below be called middle section α), in other words, object lens 116 less than sin α (the corresponding OTF curve in zone in the numerical aperture scope of=2 λ/w).OTF curve 222 and OTF curve 221 relatively, the frequency band of spatial frequency narrows down, and particularly, becomes from 0 to 1/p (=2/w) scope.
In addition, obtain the OTF curve under the situation of the middle section α shading of object lens 116, be the OTF curve of neighboring area of the object lens 116 of view angle theta >=α, particularly, be curve shown in Figure 9 231 through deduct curve 222 from curve 221.This OTF curve 231, have spatial frequency be 1/p (=2/w) locate to have the characteristic of peak value.
Thereby, carry out shading through middle section α to object lens 116, can make the relief pattern decay of spatial frequency less than 2/w, the relief pattern of the emphasical pitch that equates with alignment mark 201 live width w is observed.Its result can stress that the alignment mark 201 of live width w is observed.
Therefore, in laser process equipment 101,, utilize the part of occulter 119 blocking illumination light so that illumination light does not incide the mode of the middle section α of object lens 116.That is, through the illumination light behind the collector lens 118, near the scope its optical axis after the imaging, is incided the exterior lateral area more outer than the middle section α of object lens 116 by occulter 119 blockings in the pupil of object lens 116, irradiation solar panel 102.Thereby; Compare with the situation of a part of not utilizing occulter 119 blocking illumination light; In the relief pattern of the sightingpiston of solar panel 102 (=machined surface), spatial frequency is excited less than the low-frequency component of 2/w more weakly, to be the above radio-frequency component of 2/w be excited with much at one intensity spatial frequency.Thus, in fact the OTF characteristic of object lens 116 becomes and characteristic much at one shown in Figure 9, can stress that alignment mark 201 observes.
[action effect of laser process equipment 101]
With reference to Figure 10 to Figure 14 the action effect of laser process equipment 101 is further carried out detailed explanation at this.
That kind shown in figure 10, the illumination light that penetrates from object lens 116 is become almost parallel corrugated at the sightingpiston of solar panel 102 by optically focused, turns back to object lens 116 at the reflected light of sightingpiston reflection.
Figure 11 and Figure 12 are near the enlarged drawings of the scope 251 of the focal point that dotted line surrounded of Figure 10.In addition, Figure 11 schematically shows the situation that illumination light incides the solar panel 102 in the manufacturing process, and Figure 12 is shown schematically in the situation that illumination light is reflected in the solar panel 101 in the manufacturing process.
In the example of Figure 11 and Figure 12, solar panel 102 constitutes from 3 layers of beginning down by layer 102A, layer 102B, layer 102C, forms power generation region by a layer 102B and a layer 102C.The reflectivity of the luminance factor layer 102C of layer 102B is high, and the zone that has been manifested layer 102B by the zone that is formed with layer 102C with not being formed with layer 102C on the surface forms gradation pattern.In addition, the wavelength X of illumination light is configured to than the big value of poor L1 (for example 0.3 μ m) between layer 102B and the layer 102C.
In addition, right-hand member is not formed with the zone of layer 102B and layer 102C in figure, is formed with alignment mark 201 at the upper surface of layer 102A.In addition, the wavelength X of illumination light is configured to than the little value of poor L2 (for example 2.0 μ m) between alignment mark 201 and the layer 102A.
In the sightingpiston of solar panel 102 illumination light, modulated and become reflected light at the sightingpiston of solar panel 102 with parallel corrugated incident.In the light in the reflected light, that on the gradation pattern of utilizing layer 102B and layer 102C to form, reflect, overlapping have deep or light information.Because L1 is less than wavelength X for difference, so, the overlapping reflected light that deep or light information is arranged, like that kind shown in the scope 261 that the with dashed lines of Figure 12 surrounds, with respect to incident angle, reflection angle does not almost change, and just variation has taken place in amplitude.In addition, in the figure, represent oscillation amplitude change with the thickness of line.On the other hand, near the light in the reflected light, that alignment mark 201, be reflected, also overlapping concavo-convex information except deep or light information.Because L2 is bigger than wavelength X for difference, so the overlapping reflected light that concavo-convex information is arranged, like that kind shown in the scope 262 that the with dashed lines of Figure 12 surrounds, amplitude changes, and with respect to incident angle, variation has taken place reflection angle.
To this; Turn back near object lens 116 far fields considers near the near field the focal point; That kind shown in figure 13 is if be made as the incident angle of illumination light A1 θ i, the reflection angle of reflected light B1 is made as θ o, then when deep or light information being arranged in that the sightingpiston of solar panel 102 is only overlapping; Under the underlapped situation that concavo-convex information arranged, become incident angle θ i=reflection angle θ o.On the other hand, when under the overlapping situation that concavo-convex information arranged of the sightingpiston of solar panel 102, become incident angle θ i ≠ reflection angle θ o.
If dark field optical system in the past, become incident angle θ i=reflection angle θ o, only overlappingly have the reflected light of deep or light information to drain to the outside of object lens, or on the way interdicted, and do not observed.On the other hand, become incident angle θ i ≠ reflection angle θ o, the overlapping reflected light that concavo-convex information is arranged, its part incides object lens, on the way is not observed by blocking.Thereby,, also can observe alignment mark 201 certainly with high SNR if, can observe the relief pattern of the sightingpiston of solar panel 102 with high SNR as using dark field optical system in the past.On the other hand, can not observe the gradation pattern of the sightingpiston of solar panel 102.
In addition, if bright field optical system in the past, only overlapping have the reflected light of deep or light information, an overlapping reflected light that concavo-convex information is arranged, and its part also incides object lens, and is observed.Thereby,, can observe both of gradation pattern and relief pattern of the sightingpiston of solar panel 102 if use bright field optical system in the past.On the other hand, the SNR of the relief pattern of the sightingpiston of solar panel 102 reduces, and compares with the dark field optical system, can't observe alignment mark 201 with high SNR.
On the other hand, in laser process equipment 101, no matter whether reflection angle θ o is different with incident angle θ i, so long as in the scope of α≤θ o≤β, reflected light incides object lens 116, and can observe.For example, in the example of Figure 14, the both of reflected light B11 that equates with respect to incident light A11 reflection angle θ o and the reflected light B12 different with respect to incident light A11 reflection angle θ o is incided object lens 116, so that observe.Thereby, can observe both of gradation pattern and relief pattern of the sightingpiston of solar panel 102.
In addition, the light of the reflected light B13 of reflection angle θ o＞β does not incide object lens 116 among Figure 14, thus identical with in the past dark field optical system and bright field optical system, can't observe.
In addition, illumination light does not incide the middle section α that representes with oblique line in Figure 14, so the reflected light that becomes reflection angle θ o≤α in fact intensity reduces.Thereby, can make composition decay in the relief pattern of sightingpiston of solar panel 102, that be lower than the spatial frequency corresponding with the live width w of alignment mark 201.Thereby, can observe with the emphasical alignment mark 201 of high SNR.
And then, for example, formed under the situation of alignment mark 201 in the part of the film through removing solar panel 102, in alignment mark 201, be formed with the gradation pattern that forms through Laser Processing sometimes.In laser process equipment 101, also can observe the gradation pattern in this alignment mark 201, its result can more clearly observe alignment mark 201.
As previously discussed, in laser process equipment 101, can observe both of alignment mark 201 and gradation pattern of solar panel 102 well.In addition, owing to can observe alignment mark 201 well, thus can improve the bearing accuracy of solar panel 102, and shorten the needed time of location.Its result can improve the machining precision of solar panel 102, and shorten process time.
2. variation
In addition; In above explanation, show the example that occulter 119 is set between collector lens 118 and semi-transparent semi-reflecting lens 120, still; Also can be between semi-transparent semi-reflecting lens 120 and object lens 116; Say tightlyer, also can be between semi-transparent semi-reflecting lens 120 and dichronic mirror 115, with the mode of the illumination light that must interdict the middle section α that incides object lens 116 occulter is set.Thus, in fact the OTF characteristic of object lens 116 becomes and characteristic much at one shown in Figure 9.Its result, identical with above-mentioned embodiment, can observe both of gradation pattern and relief pattern of solar panel 102, and can stress that alignment mark 201 observes.
In addition, in this case, just do not incide the illumination light of middle section α, also can interdict from the reflected light of solar panel 102 reflection, through near the light the optical axis of object lens 116.Thereby, can interdict more in the relief pattern of sightingpiston of solar panel 102, than the spatial frequency low composition corresponding with the live width w of alignment mark 201, can stress more that alignment mark 201 observes.
In addition, in above explanation, show the example that circular light source is set in the lighting device 117, still, also can constitute the light source that other shape is set.For example, that kind shown in figure 15 also can constitute, and is provided with to send the light source that the cross section is the illumination light of rectangle.But in this case, as following the narration, hoping to make the shape of the lightproof area of occulter is rectangle rather than circle.
Figure 16 representes that the cross section is the example that the illumination light of shape shown in Figure 15 sees through the shape in the cross section behind the collector lens 118.See through the cross section of the illumination light behind the collector lens 118, with the section ratio of illumination light in the lighting device 117, it is round that the bight becomes a little.
Figure 17 representes illumination light shown in Figure 16, uses the occulter of the lightproof area of narrating with reference to Fig. 2 to Fig. 5 that kind, that have circular to carry out under the situation of shading in the above, by the zone of shading with not by the example in the zone of shading.In addition, among the figure with the region representation of grid representation by the zone of shading.That kind as shown in the drawing has been carried out under the situation of shading with circular lightproof area in the illumination light that with the cross section is essentially rectangular, in the brightness through the illumination light behind the occulter, produces owing to the different deviations that cause in position.That is, near four jiaos of the cross section of illumination light, then the illumination light through occulter increases, and away from four jiaos, then the illumination light through occulter reduces.Thereby, near four jiaos of cross section, the brighter display of illumination light then, then the brightness of illumination light is dark more away from four jiaos.Its result, shine produce in the brightness of illumination light of solar panel 102 uneven.
Thereby, to hope to constitute, that kind shown in figure 18 cooperates with the cross section of illumination light, and shading is carried out in the rectangular area of the central authorities of contrast Mingguang City.
Figure 19 and Figure 20 are the figure of the example of the rectangular area of the central authorities of the expression contrast Mingguang City occulter that carries out shading.In the occulter 301 of Figure 19, be provided with the lightproof area 301A of rectangle in central authorities.In addition, in order to support lightproof area 301A, utilize the support component 301C to 301F of linearity to connect the bight of lightproof area 301A and the peripheral part 301B of ring-type.In the occulter 311 of Figure 20, also identical with occulter 301, be provided with the lightproof area 311A of rectangle in central authorities.In addition, in order to support lightproof area 311A, utilize the support component 311C to 311F of linearity to connect central portion and the peripheral part 311B of ring-type on each limit of lightproof area 311A.
Through so that the center of this occulter 301 or occulter 311 mode consistent with the optical axis of collector lens 118 is configured, the lightproof area 301A or the lightproof area 311A light that see through near the rectangle the optical axis in the illumination light of collector lens 118, that incide collector lens 118 are interdicted.
Like this, hope that roughly the shape with the cross section of illumination light is identical to make the shape of lightproof area of occulter.
In addition, in above explanation, show the example of utilizing sheet metal to constitute occulter 119, still, also can constitute, use at transparent parts such as glass and form the occulter that obtains based on the lightproof area of photomask etc.And then, also can constitute, directly at object lens 116 or collector lens 118 film forming photomasks.
In addition, in above explanation, show the example that applies the present invention to laser process equipment 101, still, the present invention can be applied to carry out based on alignment mark the equipment of the location of object at large.And then, become the object of the object of observation of the present invention, be not limited to solar panel 102, also can be with various substrates that are provided with alignment mark etc. as object.
In addition, in above explanation, show and use the example of LED, but also can use the light source of other kind as the light source of lighting device 117.
In addition, in above explanation, show illumination light is made as monochromatic example, still, also can use illumination light with provision wavelengths width.In this case, for the wavelength X of the illumination light of in above-mentioned formula (1) etc., using, use the representative wavelength, for example peak wavelength, centre wavelength, maximum wavelength etc. of illumination light to get final product.For example, using under the situation of white light as illumination light, can consider to use the wavelength (546.1nm) of central green.
In addition, making illumination light is monochromatic light, can more clearly observe alignment mark.On the other hand, illumination light is being made as under the situation of white light the gradation pattern of object just, color that also can object of observation thing.
And in above explanation, the shape that shows alignment mark is made as criss-cross example, still, is not limited to this example, can adopt shape arbitrarily.In addition, be made as in shape under the situation of the shape beyond the cruciform alignment mark, the width w that uses in waiting for above-mentioned formula (1), for example, the width of the narrowest part of use alignment mark.
In addition; In above explanation, show utilize semi-transparent semi-reflecting lens 120 change the illumination directions of light with from lighting device 117 to semi-transparent semi-reflecting lens 120 optical path of illuminating light and from semi-transparent semi-reflecting lens 120 to ccd video camera 122 catoptrical light path carry out the example of branch, still; Also can constitute; Through changing catoptrical direction, or change the direction of illumination light and reflected light, two light paths are carried out branch.
In addition, also can constitute,, separate, and be arranged on the outside of laser process equipment 101 with laser process equipment 101 with laser oscillator 111, lighting device 117 and ccd video camera 122.
In addition, embodiment of the present invention is not limited to above-mentioned embodiment, in the scope that does not break away from purport of the present invention, can carry out various changes.
Description of reference numerals
101 laser process equipments
102 solar panels
111 laser oscillators
112 optical beam expanders
113 slits
114 imaging lens
115 dichronic mirrors
116 object lens
117 lighting devices
118 collector lenses
119 occulters
120 semi-transparent semi-reflecting lens
121 imaging lens
122 ccd video cameras
151 to 154 occulters
151A to 154A lightproof area
201 alignment marks
301 occulters
The 301A lightproof area.
Claims (5)
1. viewing optical system, mark is used in the location that is used for object of observation thing, it is characterized in that,
Comprise:
Object lens;
The collector lens that the illumination light sent from light source is formed images in the pupil of said object lens;
Make from through said object lens illuminated said illumination light said object reflected light, promptly see through the imaging len of the reflected light imaging behind the said object lens;
Between said collector lens and the said object lens and between said object lens and the said imaging len, said illumination light and said catoptrical light path are carried out the branch units of branch;
Said illumination light wavelength is being made as λ, the width of narrow part of said location with mark is being made as under the situation of w; Be arranged between said collector lens and the said branch units, will incide said object lens roughly less than the lightproof unit of the said illumination light blocking in the numerical aperture scope of 2 λ/w, and be arranged between said branch units and the said object lens, will incide said object lens roughly less than at least one side in the lightproof unit of the said reflected light blocking in the numerical aperture scope of 2 λ/w.
2. viewing optical system according to claim 1 is characterized in that,
Said lightproof unit has the lightproof area with the roughly the same shape in cross section of said illumination light.
3. viewing optical system according to claim 1 is characterized in that,
Said illumination light is a monochromatic light.
4. a laser process equipment has the location that is used for object of observation thing and with being used for the processing optical system with laser is processed in said object irradiation with the viewing optical system of mark, it is characterized in that,
Said viewing optical system comprises:
Send the light source of illumination light;
Object lens;
The collector lens that said illumination light is formed images in the pupil of said object lens;
Make from through said object lens illuminated said illumination light said object reflected light, promptly see through the imaging len of the reflected light imaging behind the said object lens;
Between said collector lens and the said object lens and between said object lens and the said imaging len, said illumination light and said catoptrical light path are carried out the branch units of branch;
Said illumination light wavelength is being made as λ, the width of narrow part of said location with mark is being made as under the situation of w; Be arranged between said collector lens and the said branch units, will incide said object lens roughly less than the lightproof unit of the said illumination light blocking in the numerical aperture scope of 2 λ/w, and be arranged between said branch units and the said object lens, will incide said object lens roughly less than at least one side in the lightproof unit of the said reflected light blocking in the numerical aperture scope of 2Uw.
5. viewing optical system according to claim 4 is characterized in that,
Said laser shines said object through said object lens.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010205146A JP5201185B2 (en) | 2010-09-14 | 2010-09-14 | Observation optical system and laser processing apparatus |
| JP2010-205146 | 2010-09-14 | ||
| PCT/JP2011/056288 WO2012035804A1 (en) | 2010-09-14 | 2011-03-16 | Observation optical system and laser processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102834759A true CN102834759A (en) | 2012-12-19 |
| CN102834759B CN102834759B (en) | 2014-11-26 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180015284.6A Expired - Fee Related CN102834759B (en) | 2010-09-14 | 2011-03-16 | Observation optical system and laser processing device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5201185B2 (en) |
| KR (1) | KR101385013B1 (en) |
| CN (1) | CN102834759B (en) |
| TW (1) | TWI437263B (en) |
| WO (1) | WO2012035804A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012217081B4 (en) * | 2012-09-21 | 2016-06-16 | Lpkf Laser & Electronics Ag | Device for position control of a laser machining beam |
| CN104827191A (en) * | 2015-05-12 | 2015-08-12 | 大族激光科技产业集团股份有限公司 | Laser cutting method for sapphire |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11295608A (en) * | 1998-04-13 | 1999-10-29 | Nikon Corp | Observation device, detection device for mark to be detected and exposure device |
| CN1342054A (en) * | 1998-11-05 | 2002-03-27 | 斯托迈奇克公司 | Method and apparatus for providing high contrast imaging |
| WO2003067230A1 (en) * | 2002-02-07 | 2003-08-14 | Fuji Electric Holdings Co.,Ltd. | Fluorescent image measuring method and device |
| JP2004101406A (en) * | 2002-09-11 | 2004-04-02 | Tokyo Seimitsu Co Ltd | Visual inspection device |
| JP2004354650A (en) * | 2003-05-28 | 2004-12-16 | Olympus Corp | Microscopic observation method and microscope used therefor |
| JP2007121749A (en) * | 2005-10-28 | 2007-05-17 | Nikon Corp | Microscope |
| JP2009014877A (en) * | 2007-07-03 | 2009-01-22 | Nikon Corp | Microscope for inspection by dispersion dyeing method |
| US20100053740A1 (en) * | 2008-08-26 | 2010-03-04 | Olympus Corporation | Microscope |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2698671B2 (en) * | 1989-03-20 | 1998-01-19 | 株式会社日立製作所 | Pattern position detecting device and exposure device |
| JP3600920B2 (en) * | 1995-04-28 | 2004-12-15 | 株式会社ニコン | Position detecting apparatus, exposure apparatus using the same, and element manufacturing method using the exposure apparatus. |
| JPH08327324A (en) * | 1995-06-05 | 1996-12-13 | Toshiba Corp | Registering apparatus |
| JP2005166785A (en) * | 2003-12-01 | 2005-06-23 | Canon Inc | Device and method for detecting position and aligner |
| JP4582762B2 (en) * | 2003-12-12 | 2010-11-17 | オリンパス株式会社 | Microscope observation method and microscope for using the same |
-
2010
- 2010-09-14 JP JP2010205146A patent/JP5201185B2/en not_active Expired - Fee Related
-
2011
- 2011-03-16 KR KR1020127024584A patent/KR101385013B1/en not_active IP Right Cessation
- 2011-03-16 WO PCT/JP2011/056288 patent/WO2012035804A1/en active Application Filing
- 2011-03-16 CN CN201180015284.6A patent/CN102834759B/en not_active Expired - Fee Related
- 2011-09-13 TW TW100132833A patent/TWI437263B/en not_active IP Right Cessation
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11295608A (en) * | 1998-04-13 | 1999-10-29 | Nikon Corp | Observation device, detection device for mark to be detected and exposure device |
| CN1342054A (en) * | 1998-11-05 | 2002-03-27 | 斯托迈奇克公司 | Method and apparatus for providing high contrast imaging |
| WO2003067230A1 (en) * | 2002-02-07 | 2003-08-14 | Fuji Electric Holdings Co.,Ltd. | Fluorescent image measuring method and device |
| JP2004101406A (en) * | 2002-09-11 | 2004-04-02 | Tokyo Seimitsu Co Ltd | Visual inspection device |
| JP2004354650A (en) * | 2003-05-28 | 2004-12-16 | Olympus Corp | Microscopic observation method and microscope used therefor |
| JP2007121749A (en) * | 2005-10-28 | 2007-05-17 | Nikon Corp | Microscope |
| JP2009014877A (en) * | 2007-07-03 | 2009-01-22 | Nikon Corp | Microscope for inspection by dispersion dyeing method |
| US20100053740A1 (en) * | 2008-08-26 | 2010-03-04 | Olympus Corporation | Microscope |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201229556A (en) | 2012-07-16 |
| JP5201185B2 (en) | 2013-06-05 |
| CN102834759B (en) | 2014-11-26 |
| JP2012063382A (en) | 2012-03-29 |
| WO2012035804A1 (en) | 2012-03-22 |
| KR20120135264A (en) | 2012-12-12 |
| TWI437263B (en) | 2014-05-11 |
| KR101385013B1 (en) | 2014-04-15 |
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