CN102830859B - Optical touch panel, manufacturing method thereof and optical touch display panel - Google Patents
Optical touch panel, manufacturing method thereof and optical touch display panel Download PDFInfo
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- CN102830859B CN102830859B CN201210327759.1A CN201210327759A CN102830859B CN 102830859 B CN102830859 B CN 102830859B CN 201210327759 A CN201210327759 A CN 201210327759A CN 102830859 B CN102830859 B CN 102830859B
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Abstract
The invention provides an optical touch panel, a manufacturing method thereof and an optical touch display panel. The optical touch panel comprises the following components. The infrared light filter layer is disposed on the inner surface of the substrate. The first patterned conductive layer includes a gate electrode and a scan line on an inner surface of the substrate. The first dielectric layer covers the grid and the scanning line. The channel layer is configured on the first dielectric layer and is positioned above the grid electrode. The second patterned conductive layer comprises a source electrode and a drain electrode which are respectively positioned at two sides of the channel layer. The transparent electrode is arranged on the infrared light filtering layer and is electrically connected with one of the source electrode and the drain electrode. The second dielectric layer covers the second patterned conductive layer and part of the transparent electrode. The infrared light sensing layer is configured on the transparent electrode. The patterned shading conductive layer comprises a sensing electrode and a shading electrode, the sensing electrode is arranged on the infrared light sensing layer, and the shading electrode is arranged on the second dielectric layer and aligned to the channel layer. The invention has better penetration rate and touch sensitivity.
Description
Technical field
The present invention relates to a kind of contact panel, particularly relate to a kind of optical touch control panel and optical touch display panel.
Background technology
Contact panel (touch panel) is integrated in liquid crystal display (Liquid Crystal Display, LCD) user not only can be allowed to carry out facility, input fast, and interactive access facility can be provided, therefore be applied to gradually in some portable electronic equipments, such as mobile phone, personal digital assistant (PDA) or notebook computer.
At present, technology is had by embedding the integration that Photosensing Units realizes touch-control and Presentation Function in the pel array (pixel array) of liquid crystal display.Specifically, the induction light source (such as infrared light) that touch-control sensing mode provides for backlight module through display, then can reflex to Photosensing Units via reverberation (such as pointing).So, the pressure drop caused because producing photocurrent under irradiation by Photosensing Units determines whether the generation of touch event.
But, because Photosensing Units and reading circuit are the pel array sides being positioned at liquid crystal display, therefore can the photic zone area of packed pixel array side, cause the penetrance of display to reduce.In this situation, backlight module must provide higher power just can reach identical induced signal, cause expending more electric power, in addition, parsing power (resolution) due to Photosensing Units is limited to the parsing power of display, therefore is difficult to the parsing power of Photosensing Units to promote into the parsing power being greater than display.
Summary of the invention
In order to overcome the defect of prior art, the invention provides a kind of optical touch control panel, there is preferably penetrance and touch-control sensitivity.
The present invention separately provides a kind of manufacture method of optical touch control panel, to make above-mentioned optical touch control panel.
The present invention provides again a kind of optical touch display panel, has higher aperture opening ratio, and wherein sensing element has preferably resolution.
The present invention reoffers a kind of manufacture method of optical touch display panel, to make above-mentioned optical touch control panel.
The present invention proposes a kind of optical touch control panel, and it comprises first substrate, infrared light filter layer, the first patterned conductive layer, the first dielectric layer, channel layer, the second patterned conductive layer, transparency electrode, the second dielectric layer, infrared light sensed layer and patterning light-shielding conductive layer.First substrate has inside surface.Infrared light filter layer is configured on the inside surface of substrate.First patterned conductive layer comprises at least one grid and at least one sweep trace be connected with grid, and wherein grid and sweep trace are positioned on the inside surface of substrate.First dielectric layer is configured on substrate, with cover gate, sweep trace.Channel layer is configured on the first dielectric layer, and is positioned at above grid.Second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of channel layer, and is electrically connected channel layer.Transparency electrode is configured on infrared light filter layer, is electrically connected source electrode and drains one of them.Second dielectric layer covers the second patterned conductive layer and partially transparent electrode.Infrared light sensed layer is configured in transparency electrode.Patterning light-shielding conductive layer comprises sensing electrode and shading electrode, and sensing electrode is configured in infrared light sensed layer, and shading electrode is configured on the second dielectric layer, and aligned with channel layer.
The present invention separately proposes a kind of manufacture method of optical touch control panel.Infrared light filter layer is formed on the inside surface of substrate.On substrate, form the first patterned conductive layer, comprise at least one grid and at least one sweep trace be connected with grid, wherein grid and sweep trace are positioned on the inside surface of substrate.The first dielectric layer is formed, with cover gate, sweep trace on substrate.On the first dielectric layer, form channel layer, wherein channel layer is positioned at above grid.On substrate, form the second patterned conductive layer, the second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of channel layer, and is electrically connected channel layer.On infrared light filter layer, form transparency electrode, be electrically connected source electrode and drain one of them.On substrate, form the second dielectric layer, cover the second patterned conductive layer and partially transparent electrode.Infrared light sensed layer is formed in transparency electrode.On substrate, form patterning light-shielding conductive layer, comprise sensing electrode and shading electrode, sensing electrode is configured in infrared light sensed layer, and shading electrode is configured on the second dielectric layer, and aligned with channel layer.
The present invention proposes again a kind of optical touch display panel, and it comprises first substrate, infrared light filter layer, the first patterned conductive layer, the first dielectric layer, channel layer, the second patterned conductive layer, transparency electrode, the second dielectric layer, infrared light sensed layer, patterning light-shielding conductive layer, second substrate and display dielectric layer.First substrate has inside surface.Infrared light filter layer is configured on the inside surface of substrate.First patterned conductive layer comprises at least one grid and at least one sweep trace be connected with grid, and wherein grid and sweep trace are positioned on the inside surface of substrate.First dielectric layer is configured on substrate, with cover gate, sweep trace.Channel layer is configured on the first dielectric layer, and is positioned at above grid.Second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of channel layer, and is electrically connected channel layer.Transparency electrode is configured on infrared light filter layer, is electrically connected source electrode and drains one of them.Second dielectric layer covers the second patterned conductive layer and partially transparent electrode.Infrared light sensed layer is configured in transparency electrode.Patterning light-shielding conductive layer comprises sensing electrode and shading electrode, and sensing electrode is configured in infrared light sensed layer, and shading electrode is configured on the second dielectric layer, and aligned with channel layer.Second substrate is oppositely arranged with first substrate, and second substrate is towards the inside surface of first substrate.Display dielectric layer is arranged between first substrate and second substrate.
The present invention reintroduces a kind of manufacture method of optical touch display panel.There is provided substrate, substrate has inside surface.Infrared light filter layer is formed on the inside surface of substrate.On substrate, form the first patterned conductive layer, comprise at least one grid and at least one sweep trace be connected with grid, wherein grid and sweep trace are positioned on the inside surface of substrate.The first dielectric layer is formed, with cover gate, sweep trace on substrate.On the first dielectric layer, form channel layer, wherein channel layer is positioned at above grid.On substrate, form the second patterned conductive layer, the second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of channel layer, and is electrically connected channel layer.On infrared light filter layer, form transparency electrode, be electrically connected source electrode and drain one of them.On substrate, form the second dielectric layer, cover the second patterned conductive layer and partially transparent electrode.Infrared light sensed layer is formed in transparency electrode.On substrate, form patterning light-shielding conductive layer, comprise sensing electrode and shading electrode, sensing electrode is configured in infrared light sensed layer, and shading electrode is configured on the second dielectric layer, and aligned with channel layer.Second substrate is provided, second substrate and first substrate are oppositely arranged, and second substrate is towards the inside surface of first substrate.Display dielectric layer is formed between first substrate and second substrate.
Based on above-mentioned, optical touch control panel of the present invention and optical touch display panel have preferably penetrance and touch-control sensitivity.Wherein, in the manufacture method of optical touch control panel and optical touch display panel, shading electrode makes together with sensing electrode, therefore can have more easy technique and lower cost of manufacture.In addition, due to shading electrode alignment channel layer, channel layer therefore can be avoided to be subject to illumination and the impact such as to penetrate, to promote the stability of channel layer.Therefore optical touch control panel and optical touch display panel have preferably element characteristic.
For above-mentioned feature and advantage of the present invention can be become apparent, special embodiment below, and coordinate institute's accompanying drawings to be described in detail below.
Accompanying drawing explanation
Figure 1A to Fig. 1 I is the diagrammatic cross-section of the manufacture method of the optical touch control panel of first embodiment of the invention.
Fig. 2 A to Fig. 2 I is the diagrammatic cross-section of the manufacture method of the optical touch control panel of second embodiment of the invention.
Fig. 3 A and Fig. 3 D is the diagrammatic cross-section of the manufacture method of the optical touch display panel of third embodiment of the invention.
Wherein, description of reference numerals is as follows:
10: optical touch display panel
100: optical touch control panel
110,200: substrate
110a: inside surface
110b: outside surface
120: the first patterned conductive layers
130: the second patterned conductive layers
140: patterning light-shielding conductive layer
142: shading electrode
300: display dielectric layer
BLU: backlight
CH: channel layer
DE: drain electrode
E1: sensing electrode
F: finger
GE: grid
GI: the first dielectric layer
IRF: infrared light filter layer
IRS: infrared light sensed layer
L, L ': light
OC: ohmic contact layer
OCP: ohmic contact pattern
PV1: the second dielectric layer
PV2: protective seam
S: Photosensing Units
SE: source electrode
T1: signal reads transistor
T2: active member
TE: transparency electrode
W1: opening
Embodiment
[the first embodiment]
Figure 1A to Fig. 1 I is the diagrammatic cross-section of the manufacture method of the optical touch control panel of first embodiment of the invention.Please refer to Figure 1A, first, provide substrate 110, wherein substrate 110 has inside surface 110a and outside surface 110b, and its outer surface 110b is towards user.Then, on the inside surface 110a of substrate 110, infrared light filter layer IRF is formed.In the present embodiment, the material of infrared light filter layer IRF is such as comprise germanium compound or germanium silicon compound.
Please refer to Figure 1B, then, the first patterned conductive layer 120 is formed on substrate 110, first patterned conductive layer 120 comprises the sweep trace (sign) that at least one grid G E and at least one is connected with grid G E, and wherein grid G E and sweep trace are positioned on the inside surface 110a of substrate 110.The material of the first patterned conductive layer 120 is such as conduction good metal or metal laminated.
Please refer to Fig. 1 C, then, on substrate 110, form the first dielectric layer GI, with cover gate GE and sweep trace SL.In the present embodiment, the first dielectric layer GI also covers infrared light filter layer IRF.The material of the first dielectric layer GI can be the isolation material such as monox or silicon nitride of high-dielectric coefficient.Then, on infrared light filter layer IRF, transparency electrode TE is formed.The material of transparency electrode TE can be metal oxide, as the stack layer of indium tin oxide, indium-zinc oxide, aluminium tin-oxide, aluminium zinc oxide, indium germanium zinc oxide or other suitable oxide or above-mentioned at least two.
Please refer to Fig. 1 D, then, on the first dielectric layer GI, form channel layer CH, wherein channel layer CH is positioned at above grid G E.In the present embodiment, after channel layer CH is formed, ohmic contact layer OC can be formed further on the channel layer CH of correspondence, to reduce the resistance between channel layer CH and subsequent film (source electrode and drain electrode).
Please refer to Fig. 1 E, then, the second patterned conductive layer 130 is formed on substrate 110, second patterned conductive layer 130 comprises at least one source S E and at least one drain D E, lay respectively at the both sides of channel layer CH, and be electrically connected channel layer CH, wherein transparency electrode TE be electrically connected source S E and drain D E one of them.In the present embodiment, the formation method of the second patterned conductive layer 130 is such as formation one metal level or metal laminated, patterning this metal level or metal laminated again, to form source S E and drain D E, meanwhile, with source S E and drain D E for cover curtain remove part ohmic contact layer OC to form ohmic contact pattern OCP.Herein, grid G E, channel layer CH, source S E and drain D E form multiple signal and read transistor T1.
Please refer to Fig. 1 F, then, on substrate 110, form the second dielectric layer PV1, cover the second patterned conductive layer 130 and partially transparent electrode TE.In addition, the second dielectric layer PV1 covers source S E and drain D E.In the present embodiment, also comprising patterning second dielectric layer PV1 with in wherein forming an opening W1, exposing transparency electrode TE.The material of the second dielectric layer PV1 is such as inorganic material (such as: the stack layer of monox, silicon nitride, silicon oxynitride, sieve and silica-sesquioxide or above-mentioned at least two kinds of materials), organic material or above-mentioned combination.Certainly, the present embodiment is not as limit, and every material of insulation characterisitic that can provide can be selectively used for the present embodiment.
Please refer to Fig. 1 G, then, on transparency electrode TE, form infrared light sensed layer IRS, infrared light sensed layer IRS contacts with transparency electrode TE via opening W1.The material of infrared light sensed layer IRS such as comprises rich germanium compound, Silicon-rich compound or rich germanium silicon compound, can have and preferably sense effect.Wherein, rich germanium compound such as comprises rich germanium germanium oxide, rich germanium germanium nitride, rich germanium carbonization germanium, rich germanium germanium oxynitride, rich germanium oxidation of coal germanium, rich germanium hydroxide germanium, rich germanium hydrogen germanium nitride, rich germanium hydrogen carbonization germanium.Silicon-rich compound such as comprises silicon rich silicon oxide, silicon-rich silicon nitride, Silicon-rich silit, silicon-rich silicon oxy-nitride, Silicon-rich silicon oxide carbide, Silicon-rich silicon hydroxide, Silicon-rich hydrogen silicon nitride, Silicon-rich hydrogen silit.Rich germanium silicon compound such as comprises rich germanium silicon germanium oxide silicon, rich germanium silicon germanium nitride silicon, rich germanium SiGeC germanium silicon, rich germanium silicon germanium oxynitride silicon, rich germanium silicon-carbon germanium oxide silicon, rich germanium silicon hydroxide germanium silicon, rich germanium silicon hydrogen germanium nitride silicon, rich germanium silicon hydrogen carbonization germanium silicon.Below only for illustrating, the material of infrared light sensed layer IRS is not limited.
Please refer to Fig. 1 H, then, on substrate 110, form patterning light-shielding conductive layer 140, comprise sensing electrode E1 and shading electrode 142, sensing electrode E1 is configured on infrared light sensed layer IRS, and shading electrode 142 is configured on the second dielectric layer PV1, and aligned with channel layer CH.Herein, transparency electrode TE, infrared light sensed layer IRS and sensing electrode E1 form multiple Photosensing Units S, and each signal reading transistor T1 is electrically connected with corresponding Photosensing Units S respectively.Moreover shading electrode 142 can cover the interference that backlight causes channel layer CH.Thus, the light leakage current that signal reading transistor T1 produces because of irradiation can be reduced, and then promotion signal reads the photoelectric characteristic of transistor T1.
Please refer to Fig. 1 I, the optical touch control panel 100 of the present embodiment can comprise a backlight BLU further, such as, be infrared light backlight, and for promoting the effect of touch-control sensing, wherein patterning light-shielding conductive layer 140 is between backlight BLU and channel layer CH.Specifically, in the optical touch control panel 100 of the present embodiment, above-mentioned each rete is between substrate 110 and backlight BLU.Therefore the optical touch control panel 100 of the present embodiment without under other protective devices of additional configuration, can be avoided signal to read transistor T1 and Photosensing Units S and is subject to the impact of external environment and human factor and causes it to damage.Wherein, shading electrode 142 can cover the interference that backlight causes channel layer CH, in addition, because shading electrode 142 is formed together with sensing electrode E1, therefore, the optical touch control panel 100 of the present embodiment can have more easy technique and lower process costs.
Under this kind of framework, when user does not touch optical touch control panel 100, electric current is read after (not illustrating) transfers to source S E by signal and transfers to drain D E again.And when user with finger F or any can be reflective element touching contact panel 100 outside surface time, the light L that backlight BLU sends can be reflected by finger F, the light L ' of reflection can absorb by light sensing layer IRS and produce photocurrent, and then make sensing electrode E1 produce pressure drop (namely having pressure reduction between sensing electrode E1 and bridging line (not illustrating)).This pressure drop can be read by wafer by signal sense wire (not illustrating), to determine the position of user's touching.Certainly, the framework (configuration of light source and rete) of the contact panel of the application is not limited thereto.As for detailed signal read circuit design architecture and its plane cabling layout, be this area and usually know known by the knowledgeable, therefore repeat no more.
In the present embodiment, optical touch control panel 100 comprises substrate 110, infrared light filter layer IRF, the first patterned conductive layer 120, first dielectric layer GI, channel layer CH, the second patterned conductive layer 130, transparency electrode TE, the second dielectric layer PV1, infrared light sensed layer IRS and patterning light-shielding conductive layer 140.Substrate 110 has inside surface 110a.Infrared light filter layer IRF is configured on the inside surface 110a of substrate 110.First patterned conductive layer 120 comprises the sweep trace (not illustrating) that at least one grid G E and at least one is connected with grid G E, and wherein grid G E and sweep trace are positioned on the inside surface 110a of substrate 110.
First dielectric layer GI is configured on substrate 110, with cover gate GE and sweep trace.Channel layer CH is configured on the first dielectric layer GI, and is positioned at above grid G E.Second patterned conductive layer 130 comprises at least one source S E and at least one drain D E, lays respectively at the both sides of channel layer CH, and is electrically connected channel layer CH.Transparency electrode TE is configured on infrared light filter layer IRF, be electrically connected source S E and drain D E one of them.Second dielectric layer PV1 covers the second patterned conductive layer 130 and partially transparent electrode TE.Infrared light sensed layer IRS is configured on transparency electrode TE.Patterning light-shielding conductive layer 140 comprises sensing electrode E1 and shading electrode 142, and sensing electrode E1 is configured on infrared light sensed layer IRS, and shading electrode 142 is configured on the second dielectric layer PV1, and aligned with channel layer CH.
In the present embodiment, because shading electrode 142 can cover the interference that backlight causes channel layer CH.Thus, the light leakage current that signal reading transistor T1 produces because of irradiation can be reduced, and then promotion signal reads the photoelectric characteristic of transistor T1.In addition, because shading electrode 142 is formed together with sensing electrode E1, therefore, the optical touch control panel 100 of the present embodiment can have more easy technique and lower process costs.
[the second embodiment]
Fig. 2 A to Fig. 2 I is the diagrammatic cross-section of the manufacture method of the optical touch control panel of second embodiment of the invention.Because the component of the optical touch control panel of the second embodiment is identical with person described in the first embodiment, to be described with not existing together for steps flow chart therefore below, remainder can refer to the first embodiment, does not repeat in this.Please refer to Fig. 2 A, first, provide substrate 110, wherein substrate 110 has inside surface 110a.Then, on the inside surface 110a of substrate 110, formation first patterned conductive layer 120, first patterned conductive layer 120 comprises the sweep trace (sign) that at least one grid G E and at least one is connected with grid G E.
Please refer to Fig. 2 B, then, on substrate 110, form the first dielectric layer GI, with cover gate GE and sweep trace SL.Then, on the inside surface 110a of substrate 110, infrared light filter layer IRF is formed.In the present embodiment, infrared light filter layer IRF is formed on the first dielectric layer GI.
Please refer to Fig. 2 C, then, on infrared light filter layer IRF, form transparency electrode TE.
Please refer to Fig. 2 D, then, on the first dielectric layer GI, form channel layer CH, wherein channel layer CH is positioned at above grid G E.In the present embodiment, after channel layer CH is formed, ohmic contact pattern OCP can be formed further on the channel layer CH of correspondence.
Please refer to Fig. 2 E, then, the second patterned conductive layer 130 is formed on substrate 110, second patterned conductive layer 130 comprises at least one source S E and at least one drain D E, lay respectively at the both sides of channel layer CH, and be electrically connected channel layer CH, wherein transparency electrode TE be electrically connected source S E and drain D E one of them.Herein, grid G E, channel layer CH, source S E and drain D E form multiple signal and read transistor T1.
Please refer to Fig. 2 F, then, on substrate 110, form the second dielectric layer PV1, cover the second patterned conductive layer 130 and partially transparent electrode TE.Wherein, the second dielectric layer PV1 covers source S E and drain D E.In the present embodiment, also comprising patterning second dielectric layer PV1 with in wherein forming an opening W1, exposing transparency electrode TE.
Please refer to Fig. 2 G, then, on transparency electrode TE, form infrared light sensed layer IRS, infrared light sensed layer IRS contacts with transparency electrode TE via opening W1.
Please refer to Fig. 2 H, then, on substrate 110, form patterning light-shielding conductive layer 140, comprise sensing electrode E1 and shading electrode 142, sensing electrode E1 is configured on infrared light sensed layer IRS, and shading electrode 142 is configured on the second dielectric layer PV1, and aligned with channel layer CH.Herein, transparency electrode TE, infrared light sensed layer IRS and sensing electrode E1 form multiple Photosensing Units S, and each signal reading transistor T1 is electrically connected with corresponding Photosensing Units S respectively.
Compared to the first embodiment, the present embodiment first makes the first patterned conductive layer 120, make infrared light filter layer IRF again, that is, user can exchange the production order of the first patterned conductive layer 120 and infrared light filter layer IRF according to demand, and so produced optical touch control panel 100 still has the identical characteristics described in the first embodiment.
[the 3rd embodiment]
Fig. 3 A and Fig. 3 D is the diagrammatic cross-section of the manufacture method of the optical touch display panel of third embodiment of the invention.Please refer to Fig. 3 A, first, provide first substrate 110, the inside surface 110a of wherein first substrate 110 has been formed with structure as shown in fig. 1h.Wherein, structure as shown in fig. 1h can be made by the first embodiment or the method described in the second embodiment.
Please refer to Fig. 3 B, then, can first form black matrix" BM on the inside surface 110a of first substrate 110.Then, chromatic filter layer CF can be formed on the inside surface 110a of first substrate 110.Then, can form protective seam PV2 and transparency conducting layer TCL on the inside surface 110a of first substrate 110, wherein protective seam PV2 covers black matrix" BM and chromatic filter layer CF.In the present embodiment, chromatic filter layer CF comprises red filter layer, green glow filter layer and blue light filter layer.Black matrix" BM is configured between chromatic filter layer CF.
Please refer to Fig. 3 C, then, provide second substrate 200, second substrate 200 and first substrate 110 are oppositely arranged, and second substrate 200 is towards the inside surface 110a of first substrate 110.The step of second substrate 200 is provided to comprise the vertical first substrate 110 of group and second substrate 200.In the present embodiment, second substrate 200 is such as image element array substrates, and it comprises multiple active member T2.It is such as arrange corresponding with one of them active member T2 that signal on first substrate 110 reads transistor T1, and the Photosensing Units S on first substrate 110 is such as arranges corresponding with one of them active member T2.Thus, that can avoid signal reading transistor T1 and Photosensing Units S arranges the photic zone area compressing second substrate 200 side.Then, between first substrate 110 and second substrate 200, display dielectric layer 300 is formed.Display dielectric layer 300 is such as liquid crystal layer, and display dielectric layer 300 can also be organic light emitting material, and this is all this area and usually knows known by the knowledgeable, therefore repeats no more.
Please refer to Fig. 3 D, provide backlight BLU, wherein second substrate 200 is between backlight BLU and first substrate 110.If when display dielectric layer 300 uses organic light emitting material, also can partly use infrared light organic light emitting material, as backlight BLU.Under this kind of framework, when user does not touch optical touch display panel 10, electric current is read after (not illustrating) transfers to source S E by signal and transfers to drain D E again.And when user with finger F or any can be reflective element touching optical touch display panel 10 outside surface time, the light L that backlight BLU sends can be reflected by finger F, the light L ' of reflection can absorb by light sensing layer IRS and produce photocurrent, and then make sensing electrode E1 produce pressure drop (namely having pressure reduction between sensing electrode E1 and bridging line (not illustrating)).This pressure drop can be read by wafer by signal sense wire (not illustrating), to determine the position of user's touching.Certainly, the framework (configuration of light source and rete) of the optical touch display panel of the application is not limited thereto.
(do not illustrate) in an alternate embodiment, the lamination that infrared light filter layer IRF can also comprise blue light filter layer, green glow filter layer and ruddiness filter layer substitutes, so, infrared light filter layer IRF can make together with chromatic filter layer CF, to simplify the technique of optical touch display panel.In addition, (do not illustrate) in one embodiment, chromatic filter layer CF and black matrix" BM is produced on second substrate 200, chromatic filter layer CF to be directly integrated in (Color Filter on Array on image element array substrates, COA), or under chromatic filter layer CF is directly integrated in image element array substrates (Array on Color Filter, AOC).
In the present embodiment, because shading electrode 142 can cover the interference that backlight causes channel layer CH.Thus, the light leakage current that signal reading transistor T1 produces because of irradiation can be reduced, and then promotion signal reads the photoelectric characteristic of transistor T1.In addition, because shading electrode 142 is formed together with sensing electrode E1, therefore, the optical touch display panel 10 of the present embodiment can have more easy technique and lower process costs.
In sum, optical touch control panel of the present invention and optical touch display panel have preferably penetrance and touch-control sensitivity.Wherein, in the manufacture method of optical touch control panel and optical touch display panel, shading electrode makes together with sensing electrode, therefore can have more easy technique and lower cost of manufacture.In addition, due to shading electrode alignment channel layer, channel layer therefore can be avoided to be subject to illumination and the impact such as to penetrate, to promote the stability of channel layer.Therefore optical touch control panel and optical touch display panel have preferably element characteristic.
Although the present invention discloses as above with embodiment; so itself and be not used to limit the present invention; any those of ordinary skill in the art; without departing from the spirit and scope of the present invention; when doing a little change and retouching, therefore the scope that protection scope of the present invention ought define depending on appended claim is as the criterion.
Claims (19)
1. an optical touch control panel, comprising:
One substrate, has an inside surface;
One infrared light filter layer, is configured on this inside surface of this substrate;
One first patterned conductive layer, comprise at least one grid and at least one sweep trace be connected with this grid, wherein this grid and this sweep trace are positioned on this inside surface of this substrate;
One first dielectric layer, is configured on this substrate, to cover this grid, this sweep trace;
One channel layer, is configured on this first dielectric layer, and is positioned at above this grid;
One second patterned conductive layer, comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of this channel layer, and be electrically connected this channel layer;
One transparency electrode, is configured on this infrared light filter layer, be electrically connected this source electrode and this drain electrode one of them;
One second dielectric layer, covers this second patterned conductive layer and this transparency electrode of part;
One infrared light sensed layer, is configured in this transparency electrode; And
One patterning light-shielding conductive layer, comprises a sensing electrode and a shading electrode, and this sensing electrode is configured in this infrared light sensed layer, and this shading electrode is configured on this second dielectric layer, and aims at this channel layer.
2. optical touch control panel as claimed in claim 1, wherein the material of this infrared light filter layer comprises germanium compound or germanium silicon compound.
3. optical touch control panel as claimed in claim 1, wherein this infrared light filter layer comprises the lamination of a blue light filter layer, a green glow filter layer and a ruddiness filter layer.
4. optical touch control panel as claimed in claim 1, wherein also comprises a chromatic filter layer, is arranged on this inside surface of this substrate.
5. optical touch control panel as claimed in claim 1, wherein also comprises a black matrix", is arranged on this inside surface of this substrate.
6. optical touch control panel as claimed in claim 1, wherein the material of this infrared light sensed layer comprises rich germanium compound, Silicon-rich compound or rich germanium silicon compound.
7. optical touch control panel as claimed in claim 6, wherein this rich germanium compound comprises rich germanium germanium oxide, rich germanium germanium nitride, rich germanium carbonization germanium, rich germanium germanium oxynitride, rich germanium oxidation of coal germanium, rich germanium hydroxide germanium, rich germanium hydrogen germanium nitride, rich germanium hydrogen carbonization germanium.
8. optical touch control panel as claimed in claim 6, wherein this Silicon-rich compound comprises silicon rich silicon oxide, silicon-rich silicon nitride, Silicon-rich silit, silicon-rich silicon oxy-nitride, Silicon-rich silicon oxide carbide, Silicon-rich silicon hydroxide, Silicon-rich hydrogen silicon nitride, Silicon-rich hydrogen silit.
9. optical touch control panel as claimed in claim 6, wherein this rich germanium silicon compound comprises rich germanium silicon germanium oxide silicon, rich germanium silicon germanium nitride silicon, rich germanium SiGeC germanium silicon, rich germanium silicon germanium oxynitride silicon, rich germanium silicon-carbon germanium oxide silicon, rich germanium silicon hydroxide germanium silicon, rich germanium silicon hydrogen germanium nitride silicon, rich germanium silicon hydrogen carbonization germanium silicon.
10. optical touch control panel as claimed in claim 1, wherein this second dielectric layer has an opening, exposes this transparency electrode, and this infrared light sensed layer contacts with this transparency electrode via this opening.
11. optical touch control panels as claimed in claim 1, also comprise a backlight, and wherein this patterning light-shielding conductive layer is between this backlight and this channel layer.
The manufacture method of 12. 1 kinds of optical touch control panels, comprising:
There is provided a substrate, this substrate has an inside surface;
An infrared light filter layer is formed on this inside surface of this substrate;
On this substrate, form one first patterned conductive layer, comprise at least one grid and at least one sweep trace be connected with this grid, wherein this grid and this sweep trace are positioned on this inside surface of this substrate;
One first dielectric layer is formed, to cover this grid, this sweep trace on this substrate;
On this first dielectric layer, form a channel layer, wherein this channel layer is positioned at above this grid;
On this substrate, form one second patterned conductive layer, this second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of this channel layer, and is electrically connected this channel layer;
On this infrared light filter layer, form a transparency electrode, be electrically connected this source electrode and this drain electrode one of them;
On this substrate, form one second dielectric layer, cover this second patterned conductive layer and this transparency electrode of part;
An infrared light sensed layer is formed in this transparency electrode; And
A patterning light-shielding conductive layer is formed on this substrate, comprise a sensing electrode and a shading electrode, this sensing electrode is configured in this infrared light sensed layer, and this shading electrode is configured on this second dielectric layer, and aim at this channel layer, wherein this shading electrode is formed together with this sensing electrode.
The manufacture method of 13. optical touch control panels as claimed in claim 12, wherein the material of this infrared light filter layer comprises germanium compound or germanium silicon compound.
The manufacture method of 14. optical touch control panels as claimed in claim 12, wherein this infrared light filter layer comprises the lamination of a blue light filter layer, a green glow filter layer and a ruddiness filter layer.
The manufacture method of 15. optical touch control panels as claimed in claim 12, this inside surface being also included in this substrate forms a chromatic filter layer.
The manufacture method of 16. optical touch control panels as claimed in claim 12, this inside surface being also included in this substrate forms a black matrix".
The manufacture method of 17. optical touch control panels as claimed in claim 12, wherein this second dielectric layer has an opening, exposes this transparency electrode, and this infrared light sensed layer contacts with this transparency electrode via this opening.
18. 1 kinds of optical touch display panels, comprising:
One first substrate, has an inside surface;
One infrared light filter layer, is configured on this inside surface of this first substrate:
One first patterned conductive layer, comprise at least one grid and at least one sweep trace be connected with this grid, wherein this grid and this sweep trace are positioned on this inside surface of this first substrate;
One first dielectric layer, is configured on this first substrate, to cover this grid, this sweep trace;
One channel layer, is configured on this first dielectric layer, and is positioned at above this grid;
One second patterned conductive layer, comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of this channel layer, and be electrically connected this channel layer;
One transparency electrode, is configured on this infrared light filter layer, be electrically connected this source electrode and this drain electrode one of them;
One second dielectric layer, covers this second patterned conductive layer and this transparency electrode of part;
One infrared light sensed layer, is configured in this transparency electrode;
One patterning light-shielding conductive layer, comprises a sensing electrode and a shading electrode, and this sensing electrode is configured in this infrared light sensed layer, and this shading electrode is configured on this second dielectric layer, and aims at this channel layer;
One second substrate, is oppositely arranged with this first substrate, and this second substrate is towards this inside surface of this first substrate; And
One display dielectric layer, is arranged between this first substrate and this second substrate.
The manufacture method of 19. 1 kinds of optical touch control panels, comprising:
An infrared light filter layer is formed on an inside surface of a first substrate;
On this first substrate, form one first patterned conductive layer, comprise at least one grid and at least one sweep trace be connected with this grid, wherein this grid and this sweep trace are positioned on this inside surface of this first substrate;
One first dielectric layer is formed, to cover this grid, this sweep trace on this first substrate;
On this first dielectric layer, form a channel layer, wherein this channel layer is positioned at above this grid;
On this first substrate, form one second patterned conductive layer, this second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of this channel layer, and is electrically connected this channel layer;
On this infrared light filter layer, form a transparency electrode, be electrically connected this source electrode and this drain electrode one of them;
On this first substrate, form one second dielectric layer, cover this second patterned conductive layer and this transparency electrode of part;
An infrared light sensed layer is formed in this transparency electrode;
A patterning light-shielding conductive layer is formed on this first substrate, comprise a sensing electrode and a shading electrode, this sensing electrode is configured in this infrared light sensed layer, and this shading electrode is configured on this second dielectric layer, and aim at this channel layer, wherein this shading electrode is formed together with this sensing electrode;
One second substrate is provided, this second substrate and this first substrate are oppositely arranged, and this second substrate is towards this inside surface of this first substrate; And
A display dielectric layer is formed between this first substrate and this second substrate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101123017 | 2012-06-27 | ||
| TW101123017A TWI587197B (en) | 2012-06-27 | 2012-06-27 | Optical touch panel and fabricating method thereof and optical touch display panel |
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| CN102830859A CN102830859A (en) | 2012-12-19 |
| CN102830859B true CN102830859B (en) | 2015-09-09 |
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| TW (1) | TWI587197B (en) |
Cited By (1)
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| TWI585648B (en) * | 2015-10-16 | 2017-06-01 | 群創光電股份有限公司 | Touch display panel and pixel structure |
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| CN105117074B (en) * | 2015-08-19 | 2018-06-29 | 业成光电（深圳）有限公司 | Light sensation geodesic structure and its manufacturing method |
| CN105511134B (en) * | 2016-02-03 | 2019-01-11 | 京东方科技集团股份有限公司 | To box substrate, liquid crystal display panel and its driving method and display device |
| KR102555392B1 (en) * | 2016-03-18 | 2023-07-14 | 삼성디스플레이 주식회사 | Display device and fabricating method thereof |
| CN108663838B (en) | 2017-03-31 | 2020-10-23 | 合肥鑫晟光电科技有限公司 | Touch panel and display device |
| CN106952612B (en) | 2017-05-22 | 2019-09-03 | 京东方科技集团股份有限公司 | Pixel circuit, display panel and its driving method |
| CN107134259B (en) | 2017-06-28 | 2019-04-30 | 京东方科技集团股份有限公司 | Pixel circuit, driving method, display module, driving method and display device |
| US10770496B2 (en) * | 2018-04-16 | 2020-09-08 | Visera Technologies Company Limited | Optical sensors and methods for forming the same |
| TWI672621B (en) * | 2018-07-24 | 2019-09-21 | 友達光電股份有限公司 | Display device and sensing element substrate |
| TWI700621B (en) * | 2019-04-15 | 2020-08-01 | 友達光電股份有限公司 | Touch panel |
| CN113591694B (en) * | 2020-08-27 | 2023-11-07 | 友达光电股份有限公司 | Sensing element substrate and display device comprising same |
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| CN102830859A (en) | 2012-12-19 |
| TW201401133A (en) | 2014-01-01 |
| TWI587197B (en) | 2017-06-11 |
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