CN102830859A - Optical touch panel, manufacturing method thereof and optical touch display panel - Google Patents
Optical touch panel, manufacturing method thereof and optical touch display panel Download PDFInfo
- Publication number
- CN102830859A CN102830859A CN2012103277591A CN201210327759A CN102830859A CN 102830859 A CN102830859 A CN 102830859A CN 2012103277591 A CN2012103277591 A CN 2012103277591A CN 201210327759 A CN201210327759 A CN 201210327759A CN 102830859 A CN102830859 A CN 102830859A
- Authority
- CN
- China
- Prior art keywords
- layer
- substrate
- electrode
- silicon
- germanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 72
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 128
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 29
- 229910052710 silicon Inorganic materials 0.000 claims description 29
- 239000010703 silicon Substances 0.000 claims description 29
- 238000000059 patterning Methods 0.000 claims description 20
- VGRFVJMYCCLWPQ-UHFFFAOYSA-N germanium Chemical compound [Ge].[Ge] VGRFVJMYCCLWPQ-UHFFFAOYSA-N 0.000 claims description 16
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims description 15
- 229910052732 germanium Inorganic materials 0.000 claims description 14
- -1 germanium hydroxide germanium Chemical compound 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 150000002291 germanium compounds Chemical class 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 6
- 238000003763 carbonization Methods 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- JFWWLEIVWNPOAL-UHFFFAOYSA-N [Ge].[Si].[Ge] Chemical compound [Ge].[Si].[Ge] JFWWLEIVWNPOAL-UHFFFAOYSA-N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- BIXHRBFZLLFBFL-UHFFFAOYSA-N germanium nitride Chemical compound N#[Ge]N([Ge]#N)[Ge]#N BIXHRBFZLLFBFL-UHFFFAOYSA-N 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 238000003475 lamination Methods 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- OLTNLCBXQXQWFU-UHFFFAOYSA-N [C].[Ge].[Si].[Ge]=O.[Si] Chemical compound [C].[Ge].[Si].[Ge]=O.[Si] OLTNLCBXQXQWFU-UHFFFAOYSA-N 0.000 claims description 2
- HCOTVPPCUSAUGC-UHFFFAOYSA-N [Ge]=O.[Ge] Chemical compound [Ge]=O.[Ge] HCOTVPPCUSAUGC-UHFFFAOYSA-N 0.000 claims description 2
- 239000003245 coal Substances 0.000 claims description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 2
- 230000035945 sensitivity Effects 0.000 abstract description 4
- 238000001914 filtration Methods 0.000 abstract 1
- 230000035515 penetration Effects 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000011368 organic material Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- RQIPKMUHKBASFK-UHFFFAOYSA-N [O-2].[Zn+2].[Ge+2].[In+3] Chemical compound [O-2].[Zn+2].[Ge+2].[In+3] RQIPKMUHKBASFK-UHFFFAOYSA-N 0.000 description 1
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Position Input By Displaying (AREA)
Abstract
The invention provides an optical touch panel, a manufacturing method thereof and an optical touch display panel. The optical touch panel comprises the following components. The infrared light filter layer is disposed on the inner surface of the substrate. The first patterned conductive layer includes a gate electrode and a scan line on an inner surface of the substrate. The first dielectric layer covers the grid and the scanning line. The channel layer is configured on the first dielectric layer and is positioned above the grid electrode. The second patterned conductive layer comprises a source electrode and a drain electrode which are respectively positioned at two sides of the channel layer. The transparent electrode is arranged on the infrared light filtering layer and is electrically connected with one of the source electrode and the drain electrode. The second dielectric layer covers the second patterned conductive layer and part of the transparent electrode. The infrared light sensing layer is configured on the transparent electrode. The patterned shading conductive layer comprises a sensing electrode and a shading electrode, the sensing electrode is arranged on the infrared light sensing layer, and the shading electrode is arranged on the second dielectric layer and aligned to the channel layer. The invention has better penetration rate and touch sensitivity.
Description
Technical field
The present invention relates to a kind of contact panel, relate in particular to a kind of optical touch control panel and optical touch display panel.
Background technology
Contact panel (touch panel) is integrated in LCD (Liquid Crystal Display; LCD) not only can let the user carry out facility, input fast; And interactive access facility can be provided; Therefore be applied to gradually in some portable electronic equipments, for example mobile phone, PDA(Personal Digital Assistant) or notebook computer.
At present, technology is arranged through in the pel array (pixel array) of LCD, embedding the integration that Photosensing Units is realized touch-control and Presentation Function.Particularly, the touch-control sensing mode is that the induction light source (such as infrared light) that backlight module provides can pass display, reflexes to Photosensing Units via reverberation (such as finger) again.So, under irradiation, judge the generation whether touch event is arranged through Photosensing Units because of producing the pressure drop that photocurrent caused.
Yet because Photosensing Units is the pel array side that is positioned at LCD with reading circuit, therefore the photic zone area of meeting packed pixel array side causes the penetrance of display to reduce.Under this situation; Backlight module must provide higher power just can reach identical induced signal; Cause to expend more electric power; In addition, because the parsing power (resolution) of Photosensing Units is subject to the parsing power of display, so be difficult to the parsing power of Photosensing Units is promoted the parsing power greater than display.
Summary of the invention
In order to overcome the defective of prior art, the present invention provides a kind of optical touch control panel, has preferable penetrance and touch-control sensitivity.
The present invention provides a kind of manufacturing approach of optical touch control panel in addition, to make above-mentioned optical touch control panel.
The present invention provides a kind of optical touch display panel again, has high aperture opening ratio, and wherein sensing element has preferable resolution.
The present invention provides a kind of manufacturing approach of optical touch display panel again, to make above-mentioned optical touch control panel.
The present invention proposes a kind of optical touch control panel, and it comprises first substrate, infrared light filter layer, first patterned conductive layer, first dielectric layer, channel layer, second patterned conductive layer, transparency electrode, second dielectric layer, infrared light sensed layer and patterning shading conductive layer.First substrate has inside surface.The infrared light filter layer is disposed on the inside surface of substrate.First patterned conductive layer comprises the sweep trace that at least one grid and at least one is connected with grid, and wherein grid and sweep trace are positioned on the inside surface of substrate.First dielectric layer is disposed on the substrate, with cover gate, sweep trace.Channel layer is disposed on first dielectric layer, and is positioned at the grid top.Second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of channel layer, and electrically connects channel layer.Transparency electrode is disposed on the infrared light filter layer, electrically connects source electrode and drains one of them.Second dielectric layer covers second patterned conductive layer and partially transparent electrode.The infrared light sensed layer is disposed on the transparency electrode.Patterning shading conductive layer comprises sensing electrode and shading electrode, and sensing electrode is disposed on the infrared light sensed layer, and the shading electrode is disposed on second dielectric layer, and the aligned with channel layer.
The present invention proposes a kind of manufacturing approach of optical touch control panel in addition.On the inside surface of substrate, form the infrared light filter layer.On substrate, form first patterned conductive layer, comprise the sweep trace that at least one grid and at least one is connected with grid, wherein grid and sweep trace are positioned on the inside surface of substrate.On substrate, form first dielectric layer, with cover gate, sweep trace.On first dielectric layer, form channel layer, wherein channel layer is positioned at the grid top.On substrate, form second patterned conductive layer, second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of channel layer, and electrically connects channel layer.On the infrared light filter layer, form transparency electrode, electrically connect source electrode and drain one of them.On substrate, form second dielectric layer, cover second patterned conductive layer and partially transparent electrode.On transparency electrode, form the infrared light sensed layer.On substrate, form patterning shading conductive layer, comprise sensing electrode and shading electrode, sensing electrode is disposed on the infrared light sensed layer, and the shading electrode is disposed on second dielectric layer, and the aligned with channel layer.
The present invention proposes a kind of optical touch display panel again, and it comprises first substrate, infrared light filter layer, first patterned conductive layer, first dielectric layer, channel layer, second patterned conductive layer, transparency electrode, second dielectric layer, infrared light sensed layer, patterning shading conductive layer, second substrate and display dielectric layer.First substrate has inside surface.The infrared light filter layer is disposed on the inside surface of substrate.First patterned conductive layer comprises the sweep trace that at least one grid and at least one is connected with grid, and wherein grid and sweep trace are positioned on the inside surface of substrate.First dielectric layer is disposed on the substrate, with cover gate, sweep trace.Channel layer is disposed on first dielectric layer, and is positioned at the grid top.Second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of channel layer, and electrically connects channel layer.Transparency electrode is disposed on the infrared light filter layer, electrically connects source electrode and drains one of them.Second dielectric layer covers second patterned conductive layer and partially transparent electrode.The infrared light sensed layer is disposed on the transparency electrode.Patterning shading conductive layer comprises sensing electrode and shading electrode, and sensing electrode is disposed on the infrared light sensed layer, and the shading electrode is disposed on second dielectric layer, and the aligned with channel layer.Second substrate is oppositely arranged with first substrate, and second real estate is to the inside surface of first substrate.Display dielectric layer is arranged between first substrate and second substrate.
The present invention reintroduces a kind of manufacturing approach of optical touch display panel.Substrate is provided, and substrate has inside surface.On the inside surface of substrate, form the infrared light filter layer.On substrate, form first patterned conductive layer, comprise the sweep trace that at least one grid and at least one is connected with grid, wherein grid and sweep trace are positioned on the inside surface of substrate.On substrate, form first dielectric layer, with cover gate, sweep trace.On first dielectric layer, form channel layer, wherein channel layer is positioned at the grid top.On substrate, form second patterned conductive layer, second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of channel layer, and electrically connects channel layer.On the infrared light filter layer, form transparency electrode, electrically connect source electrode and drain one of them.On substrate, form second dielectric layer, cover second patterned conductive layer and partially transparent electrode.On transparency electrode, form the infrared light sensed layer.On substrate, form patterning shading conductive layer, comprise sensing electrode and shading electrode, sensing electrode is disposed on the infrared light sensed layer, and the shading electrode is disposed on second dielectric layer, and the aligned with channel layer.Second substrate is provided, second substrate and first substrate are oppositely arranged, and second real estate is to the inside surface of first substrate.Between first substrate and second substrate, form display dielectric layer.
Based on above-mentioned, optical touch control panel of the present invention and optical touch display panel have preferable penetrance and touch-control sensitivity.Wherein, in the manufacturing approach of optical touch control panel and optical touch display panel, the shading electrode is to make with sensing electrode, therefore can have easy technology and lower cost of manufacture.In addition, because therefore shading electrode alignment channel layer can avoid channel layer to receive influences such as rayed, to promote the stability of channel layer.So optical touch control panel and optical touch display panel have preferable element characteristic.
For letting the above-mentioned feature and advantage of the present invention can be more obviously understandable, hereinafter is special lifts embodiment, and cooperates appended graphic elaborating as follows.
Description of drawings
Figure 1A to Fig. 1 I is the diagrammatic cross-section of manufacturing approach of the optical touch control panel of first embodiment of the invention.
Fig. 2 A to Fig. 2 I is the diagrammatic cross-section of manufacturing approach of the optical touch control panel of second embodiment of the invention.
Fig. 3 A and Fig. 3 D are the diagrammatic cross-sections of manufacturing approach of the optical touch display panel of third embodiment of the invention.
Wherein, description of reference numerals is following:
10: optical touch display panel
100: optical touch control panel
110,200: substrate
110a: inside surface
110b: outside surface
120: the first patterned conductive layers
130: the second patterned conductive layers
140: patterning shading conductive layer
142: the shading electrode
300: display dielectric layer
BLU: backlight
CH: channel layer
DE: drain electrode
E1: sensing electrode
F: finger
GE: grid
GI: first dielectric layer
IRF: infrared light filter layer
IRS: infrared light sensed layer
L, L ': light
OC: ohmic contact layer
OCP: Ohmic contact pattern
PV1: second dielectric layer
PV2: protective seam
S: Photosensing Units
SE: source electrode
T1: signal is read transistor
T2: active member
TE: transparency electrode
W1: opening
Embodiment
[first embodiment]
Figure 1A to Fig. 1 I is the diagrammatic cross-section of manufacturing approach of the optical touch control panel of first embodiment of the invention.Please with reference to Figure 1A, at first, substrate 110 is provided, wherein substrate 110 has inside surface 110a and outside surface 110b, and 110b is towards the user for its outer surface.Then, go up formation infrared light filter layer IRF in the inside surface 110a of substrate 110.In the present embodiment, the material of infrared light filter layer IRF for example is to comprise germanium compound or germanium silicon compound.
Please with reference to Figure 1B; Then; On substrate 110, form the sweep trace (not indicating) that first patterned conductive layer, 120, the first patterned conductive layers 120 comprise that at least one grid G E and at least one is connected with grid G E, wherein grid G E and sweep trace are positioned on the inside surface 110a of substrate 110.The material of first patterned conductive layer 120 for example is a conduction good metal or metal laminated.
Please, then, on substrate 110, form the first dielectric layer GI, with cover gate GE and sweep trace SL with reference to Fig. 1 C.In the present embodiment, the first dielectric layer GI also covers infrared light filter layer IRF.The material of the first dielectric layer GI can be insulation materials such as monox or the silicon nitride of high-dielectric coefficient.Then, go up formation transparency electrode TE in infrared light filter layer IRF.The material of transparency electrode TE can be a metal oxide, like indium tin oxide, indium-zinc oxide, aluminium tin-oxide, aluminium zinc oxide, indium germanium zinc oxide or other suitable oxide or above-mentioned at least two stack layer.
Please with reference to Fig. 1 D, then, go up formation channel layer CH in the first dielectric layer GI, wherein channel layer CH is positioned at grid G E top.In the present embodiment, after channel layer CH forms, can further form ohmic contact layer OC on the channel layer CH of correspondence, to reduce the resistance between channel layer CH and the subsequent film (source electrode and drain electrode).
Please with reference to Fig. 1 E; Then; On substrate 110, form second patterned conductive layer, 130, the second patterned conductive layers 130 and comprise at least one source S E and at least one drain D E, lay respectively at the both sides of channel layer CH; And electrically connect channel layer CH, wherein transparency electrode TE electrically connect source S E and drain D E one of them.In the present embodiment; The formation method of second patterned conductive layer 130 for example is to form a metal level or metal laminated; This metal level of patterning or metal laminated again; To form source S E and drain D E, simultaneously, serve as that the cover curtain removes ohmic contact layer OC partly to form Ohmic contact pattern OCP with source S E and drain D E.Here, grid G E, channel layer CH, source S E and drain D E constitute a plurality of signals and read transistor T 1.
Please, then, on substrate 110, form the second dielectric layer PV1, cover second patterned conductive layer 130 and partially transparent electrode TE with reference to Fig. 1 F.In addition, the second dielectric layer PV1 covers source S E and drain D E.In the present embodiment, comprise that also the patterning second dielectric layer PV1 with in wherein forming an opening W1, exposes transparency electrode TE.The material of the second dielectric layer PV1 for example be inorganic material (for example: the stack layer of monox, silicon nitride, silicon oxynitride, sieve and silica-sesquioxide or above-mentioned at least two kinds of materials), organic material or above-mentioned combination.Certainly, present embodiment is not as limit, and every material of insulation characterisitic that can provide can be selectively used for present embodiment.
Please with reference to Fig. 1 G, then, go up formation infrared light sensed layer IRS in transparency electrode TE, infrared light sensed layer IRS contacts with transparency electrode TE via opening W1.The material of infrared light sensed layer IRS for example comprises rich germanium compound, Silicon-rich compound or rich germanium silicon compound, and preferable sensing effect can be arranged.Wherein, rich germanium compound for example comprises rich germanium germanium oxide, rich germanium germanium nitride, rich germanium carbonization germanium, rich germanium germanium oxynitride, rich germanium oxidation of coal germanium, rich germanium hydroxide germanium, rich germanium hydrogen germanium nitride, rich germanium hydrogen carbonization germanium.The Silicon-rich compound for example comprises silicon rich silicon oxide, silicon-rich silicon nitride, Silicon-rich silit, Silicon-rich silicon oxynitride, Silicon-rich silicon oxide carbide, Silicon-rich silicon hydroxide, Silicon-rich hydrogen silicon nitride, Silicon-rich hydrogen silit.Rich germanium silicon compound for example comprises rich germanium silicon oxidation germanium silicon, rich germanium silicon germanium nitride silicon, rich germanium silicon-carbon germanium silicon, rich germanium silicon germanium oxynitride silicon, rich germanium silicon-carbon germanium oxide silicon, rich germanium silicon hydroxide germanium silicon, rich germanium silicon hydrogen germanium nitride silicon, rich germanium silicon hydrogen carbonization germanium silicon.Below only be used to illustrate, do not limit the material of infrared light sensed layer IRS.
Please, then, on substrate 110, form patterning shading conductive layer 140 with reference to Fig. 1 H; Comprise sensing electrode E1 and shading electrode 142; Sensing electrode E1 is disposed on the infrared light sensed layer IRS, and shading electrode 142 is disposed on the second dielectric layer PV1, and aligned with channel layer CH.Here, transparency electrode TE, infrared light sensed layer IRS and sensing electrode E1 constitute a plurality of Photosensing Units S, and each signal is read transistor T 1 and electrically connected with corresponding Photosensing Units S respectively.Moreover shading electrode 142 can cover the interference that channel layer CH is caused backlight.Thus, can reduce signal and read transistor T 1, and then promote the photoelectric characteristic that signal is read transistor T 1 because of the light leakage current that irradiation produced.
Please with reference to Fig. 1 I, the optical touch control panel 100 of present embodiment can further comprise a backlight BLU, for example is the infrared light backlight, is used to promote the effect of touch-control sensing, and wherein patterning shading conductive layer 140 is between backlight BLU and channel layer CH.Particularly, in the optical touch control panel 100 of present embodiment, above-mentioned each rete is between substrate 110 and backlight BLU.Be can be under, avoid signal to read transistor T 1 and Photosensing Units S and receive external environment and artificial factor and cause its damage without other protective devices of additional configuration with, the optical touch control panel 100 of present embodiment.Wherein, Shading electrode 142 can cover the interference that channel layer CH is caused backlight, in addition, because shading electrode 142 is to form with sensing electrode E1; Therefore, the optical touch control panel 100 of present embodiment can have easy technology and lower technology cost.
Under this kind framework, when the user did not touch optical touch control panel 100, electric current was read by signal and is transferred to drain D E again after (not illustrating) transfers to source S E.And as user during with the finger F or the outside surface of any element touching contact panel 100 that can be reflective; The light L that backlight BLU is sent can be reflected by finger F; Light L ' the meeting of reflection is absorbed by light sensing layer IRS and produces photocurrent, and then makes sensing electrode E1 produce pressure drop (being between sensing electrode E1 and the bridging line (not illustrating) pressure reduction to be arranged).This pressure drop meeting is read by wafer through signal sense wire (not illustrating), to determine the position of user's touching.Certainly, the framework of the application's contact panel (configuration of light source and rete) is not limited thereto.As for detailed signal read circuit design architecture with and plane cabling layout, be this area and know that usually the knowledgeable knows, therefore repeat no more.
In the present embodiment, optical touch control panel 100 comprises substrate 110, infrared light filter layer IRF, first patterned conductive layer 120, the first dielectric layer GI, channel layer CH, second patterned conductive layer 130, transparency electrode TE, the second dielectric layer PV1, infrared light sensed layer IRS and patterning shading conductive layer 140.Substrate 110 has inside surface 110a.Infrared light filter layer IRF is disposed on the inside surface 110a of substrate 110.First patterned conductive layer 120 comprises the sweep trace (not illustrating) that at least one grid G E and at least one is connected with grid G E, and wherein grid G E and sweep trace are positioned on the inside surface 110a of substrate 110.
The first dielectric layer GI is disposed on the substrate 110, with cover gate GE and sweep trace.Channel layer CH is disposed on the first dielectric layer GI, and is positioned at grid G E top.Second patterned conductive layer 130 comprises at least one source S E and at least one drain D E, lays respectively at the both sides of channel layer CH, and electrically connects channel layer CH.Transparency electrode TE is disposed on the infrared light filter layer IRF, electrically connect source S E and drain D E one of them.The second dielectric layer PV1 covers second patterned conductive layer 130 and partially transparent electrode TE.Infrared light sensed layer IRS is disposed on the transparency electrode TE.Patterning shading conductive layer 140 comprises sensing electrode E1 and shading electrode 142, and sensing electrode E1 is disposed on the infrared light sensed layer IRS, and shading electrode 142 is disposed on the second dielectric layer PV1, and aligned with channel layer CH.
In the present embodiment, because shading electrode 142 can cover the interference that channel layer CH is caused backlight.Thus, can reduce signal and read transistor T 1, and then promote the photoelectric characteristic that signal is read transistor T 1 because of the light leakage current that irradiation produced.In addition, because shading electrode 142 is to form with sensing electrode E1, therefore, the optical touch control panel 100 of present embodiment can have easy technology and lower technology cost.
[second embodiment]
Fig. 2 A to Fig. 2 I is the diagrammatic cross-section of manufacturing approach of the optical touch control panel of second embodiment of the invention.Because the member of the optical touch control panel of second embodiment is identical with person described in first embodiment, therefore below to steps flow chart and do not exist together and describe, remainder can not given unnecessary details in this with reference to first embodiment.Please with reference to Fig. 2 A, at first, substrate 110 is provided, wherein substrate 110 has inside surface 110a.Then, go up the sweep trace (indicating) that formation first patterned conductive layer 120, the first patterned conductive layers 120 comprise that at least one grid G E and at least one is connected with grid G E in the inside surface 110a of substrate 110.
Please, then, on substrate 110, form the first dielectric layer GI, with cover gate GE and sweep trace SL with reference to Fig. 2 B.Then, go up formation infrared light filter layer IRF in the inside surface 110a of substrate 110.In the present embodiment, infrared light filter layer IRF is formed on the first dielectric layer GI.
Please, then, go up formation transparency electrode TE in infrared light filter layer IRF with reference to Fig. 2 C.
Please with reference to Fig. 2 D, then, go up formation channel layer CH in the first dielectric layer GI, wherein channel layer CH is positioned at grid G E top.In the present embodiment, after channel layer CH forms, can further form Ohmic contact pattern OCP on the channel layer CH of correspondence.
Please with reference to Fig. 2 E; Then; On substrate 110, form second patterned conductive layer, 130, the second patterned conductive layers 130 and comprise at least one source S E and at least one drain D E, lay respectively at the both sides of channel layer CH; And electrically connect channel layer CH, wherein transparency electrode TE electrically connect source S E and drain D E one of them.Here, grid G E, channel layer CH, source S E and drain D E constitute a plurality of signals and read transistor T 1.
Please, then, on substrate 110, form the second dielectric layer PV1, cover second patterned conductive layer 130 and partially transparent electrode TE with reference to Fig. 2 F.Wherein, the second dielectric layer PV1 covers source S E and drain D E.In the present embodiment, comprise that also the patterning second dielectric layer PV1 with in wherein forming an opening W1, exposes transparency electrode TE.
Please with reference to Fig. 2 G, then, go up formation infrared light sensed layer IRS in transparency electrode TE, infrared light sensed layer IRS contacts with transparency electrode TE via opening W1.
Please, then, on substrate 110, form patterning shading conductive layer 140 with reference to Fig. 2 H; Comprise sensing electrode E1 and shading electrode 142; Sensing electrode E1 is disposed on the infrared light sensed layer IRS, and shading electrode 142 is disposed on the second dielectric layer PV1, and aligned with channel layer CH.Here, transparency electrode TE, infrared light sensed layer IRS and sensing electrode E1 constitute a plurality of Photosensing Units S, and each signal is read transistor T 1 and electrically connected with corresponding Photosensing Units S respectively.
Compared to first embodiment; Present embodiment is to make first patterned conductive layer 120 earlier; Make infrared light filter layer IRF again; That is to say that the user can exchange the production order of first patterned conductive layer 120 and infrared light filter layer IRF according to demand, so produced optical touch control panel 100 still has the identical characteristics described in first embodiment.
[the 3rd embodiment]
Fig. 3 A and Fig. 3 D are the diagrammatic cross-sections of manufacturing approach of the optical touch display panel of third embodiment of the invention.Please, at first, first substrate 110 is provided, wherein has been formed with the structure shown in Fig. 1 H on the inside surface 110a of first substrate 110 with reference to Fig. 3 A.Wherein, the structure shown in Fig. 1 H can be made through the method described in first embodiment or second embodiment.
Please, then, on the inside surface 110a of first substrate 110, can form black matrix" BM earlier with reference to Fig. 3 B.Then, can go up formation chromatic filter layer CF in the inside surface 110a of first substrate 110.Continue it, can on the inside surface 110a of first substrate 110, form protective seam PV2 and transparency conducting layer TCL, wherein protective seam PV2 covers black matrix" BM and chromatic filter layer CF.In the present embodiment, chromatic filter layer CF comprises red filter layer, green glow filter layer and blue light filter layer.Black matrix" BM is disposed between the chromatic filter layer CF.
Please, then, second substrate 200 is provided, second substrate 200 and first substrate 110 are oppositely arranged, and second substrate 200 is towards the inside surface 110a of first substrate 110 with reference to Fig. 3 C.Provide the step of second substrate 200 to comprise upright first substrate 110 of group and second substrate 200.In the present embodiment, second substrate 200 for example is an image element array substrates, and it comprises a plurality of active member T2.Signal on first substrate 110 is read transistor T 1, and the Photosensing Units S on first substrate 110 for example is and the corresponding setting of one of them active member T2.Thus, can avoid signal to read the photic zone area that compression second substrate 200 sides are set of transistor T 1 and Photosensing Units S.Then, between first substrate 110 and second substrate 200, form display dielectric layer 300.Display dielectric layer 300 for example is a liquid crystal layer, and display dielectric layer 300 can also be the luminous organic material layer, and this is all this area and knows that usually the knowledgeable knows, and therefore repeats no more.
Please with reference to Fig. 3 D, backlight BLU is provided, wherein second substrate 200 is between the backlight BLU and first substrate 110.If when display dielectric layer 300 uses the luminous organic material layer, also can partly use infrared light luminous organic material layer, as backlight BLU.Under this kind framework, when the user did not touch optical touch display panel 10, electric current was read by signal and is transferred to drain D E again after (not illustrating) transfers to source S E.And as user during with the finger F or the outside surface of any element touching optical touch display panel 10 that can be reflective; The light L that backlight BLU is sent can be reflected by finger F; Light L ' the meeting of reflection is absorbed by light sensing layer IRS and produces photocurrent, and then makes sensing electrode E1 produce pressure drop (being between sensing electrode E1 and the bridging line (not illustrating) pressure reduction to be arranged).This pressure drop meeting is read by wafer through signal sense wire (not illustrating), to determine the position of user's touching.Certainly, the framework of the application's optical touch display panel (configuration of light source and rete) is not limited thereto.
In an alternate embodiment, (do not illustrate); Infrared light filter layer IRF can also comprise that the lamination of blue light filter layer, green glow filter layer and ruddiness filter layer substitutes; So; Infrared light filter layer IRF can make with chromatic filter layer CF, to simplify the technology of optical touch display panel.In addition; (do not illustrate) in one embodiment; Chromatic filter layer CF and black matrix" BM are produced on second substrate 200, with chromatic filter layer CF directly is integrated on the image element array substrates (Color Filter on Array, COA); Or chromatic filter layer CF directly is integrated under the image element array substrates (Array on Color Filter, AOC).
In the present embodiment, because shading electrode 142 can cover the interference that channel layer CH is caused backlight.Thus, can reduce signal and read transistor T 1, and then promote the photoelectric characteristic that signal is read transistor T 1 because of the light leakage current that irradiation produced.In addition, because shading electrode 142 is to form with sensing electrode E1, therefore, the optical touch display panel 10 of present embodiment can have easy technology and lower technology cost.
In sum, optical touch control panel of the present invention and optical touch display panel have preferable penetrance and touch-control sensitivity.Wherein, in the manufacturing approach of optical touch control panel and optical touch display panel, the shading electrode is to make with sensing electrode, therefore can have easy technology and lower cost of manufacture.In addition, because therefore shading electrode alignment channel layer can avoid channel layer to receive influences such as rayed, to promote the stability of channel layer.So optical touch control panel and optical touch display panel have preferable element characteristic.
Though the present invention discloses as above with embodiment; Right its is not in order to limit the present invention; Any those of ordinary skills; Do not breaking away from the spirit and scope of the present invention, when doing a little change and retouching, so protection scope of the present invention is as the criterion when looking appended the scope that claim defined.
Claims (19)
1. optical touch control panel comprises:
One first substrate has an inside surface;
One infrared light filter layer is disposed on this inside surface of this substrate;
One first patterned conductive layer comprises the sweep trace that at least one grid and at least one is connected with this grid, and wherein this grid and this sweep trace are positioned on this inside surface of this substrate;
One first dielectric layer is disposed on this substrate, to cover this grid, this sweep trace;
One channel layer is disposed on this first dielectric layer, and is positioned at this grid top;
One second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of this channel layer, and electrically connects this channel layer;
One transparency electrode is disposed on this infrared light filter layer, electrically connect this source electrode and this drain electrode one of them;
One second dielectric layer covers this second patterned conductive layer and this transparency electrode of part;
One infrared light sensed layer is disposed on this transparency electrode; And
One patterning shading conductive layer comprises a sensing electrode and a shading electrode, and this sensing electrode is disposed on this infrared light sensed layer, and this shading electrode is disposed on this second dielectric layer, and aims at this channel layer.
2. optical touch control panel as claimed in claim 1, wherein the material of this infrared light filter layer comprises germanium compound or germanium silicon compound.
3. optical touch control panel as claimed in claim 1, wherein this infrared light filter layer comprises the lamination of a blue light filter layer, a green glow filter layer and a ruddiness filter layer.
4. optical touch control panel as claimed in claim 1 wherein also comprises a chromatic filter layer, is arranged on this inside surface of this first substrate.
5. optical touch control panel as claimed in claim 1 wherein also comprises a black matrix", is arranged on this inside surface of this first substrate.
6. optical touch control panel as claimed in claim 1, wherein the material of this infrared light sensed layer comprises rich germanium compound, Silicon-rich compound or rich germanium silicon compound.
7. optical touch control panel as claimed in claim 6, wherein those rich germanium compounds comprise rich germanium germanium oxide, rich germanium germanium nitride, rich germanium carbonization germanium, rich germanium germanium oxynitride, rich germanium oxidation of coal germanium, rich germanium hydroxide germanium, rich germanium hydrogen germanium nitride, rich germanium hydrogen carbonization germanium.
8. optical touch control panel as claimed in claim 6, wherein those Silicon-rich compounds comprise silicon rich silicon oxide, silicon-rich silicon nitride, Silicon-rich silit, Silicon-rich silicon oxynitride, Silicon-rich silicon oxide carbide, Silicon-rich silicon hydroxide, Silicon-rich hydrogen silicon nitride, Silicon-rich hydrogen silit.
9. optical touch control panel as claimed in claim 6, wherein those rich germanium silicon compounds comprise rich germanium silicon oxidation germanium silicon, rich germanium silicon germanium nitride silicon, rich germanium silicon-carbon germanium silicon, rich germanium silicon germanium oxynitride silicon, rich germanium silicon-carbon germanium oxide silicon, rich germanium silicon hydroxide germanium silicon, rich germanium silicon hydrogen germanium nitride silicon, rich germanium silicon hydrogen carbonization germanium silicon.
10. optical touch control panel as claimed in claim 1, wherein this second dielectric layer has an opening, exposes this transparency electrode, and this infrared light sensed layer contacts with this transparency electrode via this opening.
11. optical touch control panel as claimed in claim 1 also comprises a backlight, wherein this patterning shading conductive layer is between this backlight and those channel layers.
12. the manufacturing approach of an optical touch control panel comprises:
One substrate is provided, and this substrate has an inside surface;
On this inside surface of this substrate, form an infrared light filter layer;
On this substrate, form one first patterned conductive layer, comprise the sweep trace that at least one grid and at least one is connected with this grid, wherein this grid and this sweep trace are positioned on this inside surface of this substrate;
On this substrate, form one first dielectric layer, to cover this grid, this sweep trace;
On this first dielectric layer, form a channel layer, wherein this channel layer is positioned at this grid top;
On this substrate, form one second patterned conductive layer, this second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of this channel layer, and electrically connects this channel layer;
On this infrared light filter layer, form a transparency electrode, electrically connect this source electrode and this drain electrode one of them;
On this substrate, form one second dielectric layer, cover this second patterned conductive layer and this transparency electrode of part;
On this transparency electrode, form an infrared light sensed layer; And
On this substrate, form a patterning shading conductive layer, comprise a sensing electrode and a shading electrode, this sensing electrode is disposed on this infrared light sensed layer, and this shading electrode is disposed on this second dielectric layer, and aims at this channel layer.
13. the manufacturing approach of optical touch control panel as claimed in claim 12, wherein the material of this infrared light filter layer comprises germanium compound or germanium silicon compound.
14. the manufacturing approach of optical touch control panel as claimed in claim 12, wherein this infrared light filter layer comprises the lamination of a blue light filter layer, a green glow filter layer and a ruddiness filter layer.
15. the manufacturing approach of optical touch control panel as claimed in claim 12 also is included in and forms a chromatic filter layer on this inside surface of this first substrate.
16. the manufacturing approach of optical touch control panel as claimed in claim 12 also is included in and forms a black matrix" on this inside surface of this first substrate.
17. the manufacturing approach of optical touch control panel as claimed in claim 12, wherein this second dielectric layer has an opening, exposes this transparency electrode, and this infrared light sensed layer contacts with this transparency electrode via this opening.
18. an optical touch display panel comprises:
One first substrate has an inside surface;
One infrared light filter layer is disposed on this inside surface of this substrate:
One first patterned conductive layer comprises the sweep trace that at least one grid and at least one is connected with this grid, and wherein this grid and this sweep trace are positioned on this inside surface of this substrate;
One first dielectric layer is disposed on this substrate, to cover this grid, this sweep trace;
One channel layer is disposed on this first dielectric layer, and is positioned at this grid top;
One second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of this channel layer, and electrically connects this channel layer;
One transparency electrode is disposed on this infrared light filter layer, electrically connect this source electrode and this drain electrode one of them;
One second dielectric layer covers this second patterned conductive layer and this transparency electrode of part;
One infrared light sensed layer is disposed on this transparency electrode;
One patterning shading conductive layer comprises a sensing electrode and a shading electrode, and this sensing electrode is disposed on this infrared light sensed layer, and this shading electrode is disposed on this second dielectric layer, and aims at this channel layer;
One second substrate be oppositely arranged with this first substrate, and this second real estate is to this inside surface of this first substrate; And
One display dielectric layer is arranged between this first substrate and this second substrate.
19. the manufacturing approach of an optical touch control panel comprises:
On an inside surface of one first substrate, form an infrared light filter layer;
On this first substrate, form one first patterned conductive layer, comprise the sweep trace that at least one grid and at least one is connected with this grid, wherein this grid and this sweep trace are positioned on this inside surface of this first substrate;
On this first substrate, form one first dielectric layer, to cover this grid, this sweep trace;
On this first dielectric layer, form a channel layer, wherein this channel layer is positioned at this grid top;
On this first substrate, form one second patterned conductive layer, this second patterned conductive layer comprises at least one source electrode and at least one drain electrode, lays respectively at the both sides of this channel layer, and electrically connects this channel layer;
On this infrared light filter layer, form a transparency electrode, electrically connect this source electrode and this drain electrode one of them;
On this first substrate, form one second dielectric layer, cover this second patterned conductive layer and this transparency electrode of part;
On this transparency electrode, form an infrared light sensed layer;
On this first substrate, form a patterning shading conductive layer, comprise a sensing electrode and a shading electrode, this sensing electrode is disposed on this infrared light sensed layer, and this shading electrode is disposed on this second dielectric layer, and aims at this channel layer;
One second substrate is provided, this second substrate and this first substrate are oppositely arranged, and this second real estate is to this inside surface of this first substrate; And
Between this first substrate and this second substrate, form a display dielectric layer.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101123017 | 2012-06-27 | ||
| TW101123017A TWI587197B (en) | 2012-06-27 | 2012-06-27 | Optical touch panel and fabricating method thereof and optical touch display panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102830859A true CN102830859A (en) | 2012-12-19 |
| CN102830859B CN102830859B (en) | 2015-09-09 |
Family
ID=47334021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210327759.1A Expired - Fee Related CN102830859B (en) | 2012-06-27 | 2012-09-06 | Optical touch panel, manufacturing method thereof and optical touch display panel |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102830859B (en) |
| TW (1) | TWI587197B (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105117074A (en) * | 2015-08-19 | 2015-12-02 | 业成光电（深圳）有限公司 | Light sensing structure and manufacturing method of light sensing structure |
| CN105511134A (en) * | 2016-02-03 | 2016-04-20 | 京东方科技集团股份有限公司 | Box alignment substrate, liquid crystal display panel and driving method thereof, and display device |
| CN107203293A (en) * | 2016-03-18 | 2017-09-26 | 三星显示有限公司 | Display device and its manufacture method with integrated touch sensing element |
| CN108663838A (en) * | 2017-03-31 | 2018-10-16 | 合肥鑫晟光电科技有限公司 | A kind of touch panel and display device |
| TWI664719B (en) * | 2018-04-16 | 2019-07-01 | Visera Technologies Company Limited | Optical sensors and methods for forming the same |
| US10528169B2 (en) | 2017-06-28 | 2020-01-07 | Boe Technology Group Co., Ltd. | Pixel circuit and driving method thereof, display module and driving method thereof, and display device |
| US10585514B2 (en) | 2017-05-22 | 2020-03-10 | Boe Technology Group Co., Ltd. | Pixel circuit, display panel and driving method thereof |
| US11010584B2 (en) * | 2018-07-24 | 2021-05-18 | Au Optronics Corporation | Display device and sensing element substrate capable of increasing ratio between photo current and dark current |
| CN113591694A (en) * | 2020-08-27 | 2021-11-02 | 友达光电股份有限公司 | Sensing element substrate and display device comprising same |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106598321B (en) * | 2015-10-16 | 2019-10-18 | 群创光电股份有限公司 | Touch-control display panel and dot structure |
| TWI700621B (en) * | 2019-04-15 | 2020-08-01 | 友達光電股份有限公司 | Touch panel |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090032824A1 (en) * | 2007-07-30 | 2009-02-05 | Hitachi Displays, Ltd. | Image displaying device |
| CN101464753A (en) * | 2007-12-19 | 2009-06-24 | 索尼株式会社 | Display device |
| US20090243020A1 (en) * | 2007-12-19 | 2009-10-01 | Palo Alto Research Center Incorporated | Producing Layered Structures With Layers That Transport Charge Carriers |
| TW201005833A (en) * | 2008-07-21 | 2010-02-01 | Au Optronics Corp | Thin film transistor array substrate and method for fabricating the same |
| CN102193676A (en) * | 2010-11-30 | 2011-09-21 | 友达光电股份有限公司 | Touch display panel, touch panel, touch element and touch circuit |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI328884B (en) * | 2007-05-14 | 2010-08-11 | Au Optronics Corp | Photo detector and method for forming thereof |
| TWI353063B (en) * | 2007-07-27 | 2011-11-21 | Au Optronics Corp | Photo detector and method for fabricating the same |
-
2012
- 2012-06-27 TW TW101123017A patent/TWI587197B/en not_active IP Right Cessation
- 2012-09-06 CN CN201210327759.1A patent/CN102830859B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090032824A1 (en) * | 2007-07-30 | 2009-02-05 | Hitachi Displays, Ltd. | Image displaying device |
| CN101464753A (en) * | 2007-12-19 | 2009-06-24 | 索尼株式会社 | Display device |
| US20090243020A1 (en) * | 2007-12-19 | 2009-10-01 | Palo Alto Research Center Incorporated | Producing Layered Structures With Layers That Transport Charge Carriers |
| TW201005833A (en) * | 2008-07-21 | 2010-02-01 | Au Optronics Corp | Thin film transistor array substrate and method for fabricating the same |
| CN102193676A (en) * | 2010-11-30 | 2011-09-21 | 友达光电股份有限公司 | Touch display panel, touch panel, touch element and touch circuit |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105117074B (en) * | 2015-08-19 | 2018-06-29 | 业成光电（深圳）有限公司 | Light sensation geodesic structure and its manufacturing method |
| CN105117074A (en) * | 2015-08-19 | 2015-12-02 | 业成光电（深圳）有限公司 | Light sensing structure and manufacturing method of light sensing structure |
| CN105511134A (en) * | 2016-02-03 | 2016-04-20 | 京东方科技集团股份有限公司 | Box alignment substrate, liquid crystal display panel and driving method thereof, and display device |
| CN105511134B (en) * | 2016-02-03 | 2019-01-11 | 京东方科技集团股份有限公司 | To box substrate, liquid crystal display panel and its driving method and display device |
| CN107203293A (en) * | 2016-03-18 | 2017-09-26 | 三星显示有限公司 | Display device and its manufacture method with integrated touch sensing element |
| US11347093B2 (en) | 2017-03-31 | 2022-05-31 | Boe Technology Group Co., Ltd. | Touch panel, touch control method thereof, and touch control apparatus |
| CN108663838A (en) * | 2017-03-31 | 2018-10-16 | 合肥鑫晟光电科技有限公司 | A kind of touch panel and display device |
| US10585514B2 (en) | 2017-05-22 | 2020-03-10 | Boe Technology Group Co., Ltd. | Pixel circuit, display panel and driving method thereof |
| US10528169B2 (en) | 2017-06-28 | 2020-01-07 | Boe Technology Group Co., Ltd. | Pixel circuit and driving method thereof, display module and driving method thereof, and display device |
| TWI664719B (en) * | 2018-04-16 | 2019-07-01 | Visera Technologies Company Limited | Optical sensors and methods for forming the same |
| US10770496B2 (en) | 2018-04-16 | 2020-09-08 | Visera Technologies Company Limited | Optical sensors and methods for forming the same |
| US11010584B2 (en) * | 2018-07-24 | 2021-05-18 | Au Optronics Corporation | Display device and sensing element substrate capable of increasing ratio between photo current and dark current |
| CN113591694A (en) * | 2020-08-27 | 2021-11-02 | 友达光电股份有限公司 | Sensing element substrate and display device comprising same |
| CN113591694B (en) * | 2020-08-27 | 2023-11-07 | 友达光电股份有限公司 | Sensing element substrate and display device comprising same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102830859B (en) | 2015-09-09 |
| TWI587197B (en) | 2017-06-11 |
| TW201401133A (en) | 2014-01-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102830859B (en) | Optical touch panel, manufacturing method thereof and optical touch display panel | |
| US11972071B2 (en) | Display device | |
| US20240103653A1 (en) | Display device | |
| CN102707843B (en) | Touch panel and manufacturing method thereof | |
| CN102023440B (en) | Structure of touch screen and manufacturing method thereof | |
| CN106775165B (en) | Embedded touch display panel and electronic device | |
| TW201250355A (en) | Pixel array and display panel having the same | |
| CN103713778B (en) | Color membrane substrates and preparation method, light-controlled indicator for light-controlled indicator | |
| CN108595041A (en) | Touch control display panel | |
| CN101510037A (en) | LCD panel | |
| CN109031823B (en) | Display screen, electronic equipment and control method thereof | |
| CN109031825B (en) | Array substrate, display screen and electronic equipment | |
| CN101561609A (en) | Active array substrate, liquid crystal display panel and method for manufacturing active array substrate | |
| TWI700621B (en) | Touch panel | |
| TWI409533B (en) | Touch display panel | |
| JP2007299012A (en) | Display device | |
| CN112666734B (en) | Liquid crystal display panel and display device | |
| JP5604579B2 (en) | Display device | |
| JP5622812B2 (en) | Display device | |
| JP5100799B2 (en) | Liquid crystal display | |
| KR20240015791A (en) | Display device and electronic device having the same | |
| CN113050324A (en) | Display module and electronic equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150909 Termination date: 20200906 |