CN102816659B - Electronic component cleaning agent - Google Patents
Electronic component cleaning agent Download PDFInfo
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- CN102816659B CN102816659B CN201210325113XA CN201210325113A CN102816659B CN 102816659 B CN102816659 B CN 102816659B CN 201210325113X A CN201210325113X A CN 201210325113XA CN 201210325113 A CN201210325113 A CN 201210325113A CN 102816659 B CN102816659 B CN 102816659B
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Abstract
The invention provides an electronic component cleaning agent which comprises the following ingredients in percentage by mass: 50-75% of magnetic water, 2-14% of organic base, 15-35% of surfactant and 0.1-1.0% of chelator. The electronic component cleaning agent provided by the invention is low in cost, wide in raw material sources and high in cleaning capability. can effectively remove pollution of metal ions, can not damage the integrity of an electronic component, can not influence the current-illumination characteristic, electromagnetic characteristic, permeability, surface physical characteristic and other properties of the electronic component, and is environment-friendly and pollution-free. Thus, the electronic component cleaning agent can be widely used for cleaning in the manufacturing processes of electronic components, integrated circuits, PCBs (printed circuit board), liquid crystal displays and the like, and has a wide application range.
Description
Technical field
The present invention relates to a kind of clean-out system, relate in particular to a kind of electronic component cleaning agent.
Background technology
Cleaning in the electronic components fabrication process, except the matting of using clean-out system, also comprise the cleaning ways such as electricimpulse cleaning, light cleaning, Cleaning by High Pressure Water Jet and ultrasonic cleaning.In actual applications, existing various cleaning ways always exist the various technological deficiencies that are difficult to overcome or the restriction on rules, are difficult to meet the requirement of development of modern industry.
In various cleaning ways, in the majority with matting, use the cleaning process of chemical with a certain setting, electronic component is cleaned.The clean-out system that current matting is used comprises organic cleaning solvent, half aqueous cleaning agent and aqueous cleaning agent, and cleaning way mainly contains spray, embathes, ultrasonic wave etc., under the technical parameter of setting, electronic component is cleaned.Organic cleaning solvent, mostly adopt volatile such as acetone, ethanol, sherwood oil, hexanaphthene, methylene dichloride, trieline, freonll-11 etc., there is serious topsoil in such clean-out system, to the ozonosphere very disruptive, belong to ODS class material ，Yi Bei international related organization restriction or ban use of.Existing water base or half water-base electron clean-out system, although avoided the pollution to atmospheric environment, but with regard to its result of use, in the cleaning of electronic component, lack functional, be difficult to guarantee the complete of electronic component, haptic element, contact, sealing compound, ITO plated film, screen printing pattern etc. are had to considerable influence, to photoelectric characteristic, electromagnetic property, permeability, device surface physical property etc., also may impact, cause the qualification rate of electronic component low, good article rate is low, cost increases, reduce work-ing life, is difficult to meet fully the cleaning requirement of electronic component.
Light cleans, although the cleanliness factor cleaned is high, the required equipment costliness, mostly be import, invests excessively, and may the photoelectric characteristic of electronic component be impacted.
Electricimpulse cleans, and cleans required equipment complicated, expensive, and, because electrohydraulic effect exists, may electricity, the magnetic properties of electronic component be impacted.
Therefore, excellent performance, Environmental Safety, the water-base electron element clean-out system that can not impact electronic component performance has wide market outlook.
Summary of the invention
For solving problems of the prior art, the contriver against expectation finds, the preparation by the reactive applications of organic basic material and sequestrant in water-base electron element clean-out system can generate more macromolecular sequestrant, effectively removes the pollution of metal ion; Magnetized water is applied to the preparation of water-base electron element clean-out system simultaneously, takes full advantage of the paramagnetic characteristic of magnetized water, can greatly strengthen the cleansing power of clean-out system.Based on above-mentioned discovery, thereby complete the present invention.
The invention provides a kind of electronic component cleaning agent, the component and the mass percent thereof that comprise are as follows: magnetized water 50～75%, organic bases 2～14%, tensio-active agent 15～35%, sequestrant 0.1～1.0%.
Adopt technique scheme, electronic component cleaning agent provided by the invention is with low cost, raw material sources are extensive, cleansing power is strong, consumption is few, can effectively remove the pollution of metal ion, can the integrity of electronic component not caused damage, can not affect its photoelectric characteristic yet, electromagnetic property, permeability, the performances such as device surface physical property, environment friendly and pollution-free, activeconstituents can be degradable, synergy by each component, can be widely used in electronic devices and components, unicircuit, cleaning in the manufacturing processedes such as PCB wiring board and liquid crystal display, applied widely.
Magnetized water be with the water of certain flow rate by magnetic field, vertically, through magnetic line of force, make water obtain certain magnetic induction density, magnetized.Water is after magnetization, and because its spatial configuration of molecules changes, water molecules hydrogen-oxygen key bond angle dwindles, by 105
0become 103
0, moment of dipole deflects, and the paramagnetism of water is strengthened, and water molecules becomes 5～6 small molecules bunch groups, even single small molecules by 13～18 macromole bunch groups.The perviousness of magnetized water, solvency power increase, and surface tension significantly reduces.The magnetic induction density of magnetized water is generally 2000～5000 Gausses.It is magnetic source at the rubidium iron boron magnet of 2000～12000GS that the present invention adopts watt type, magneticstrength, and deionized water is carried out to superpower magnetization, and magnetized water is applied to prepare water-base electron element clean-out system.The also preparation in electronic component cleaning agent the reactive applications of organic bases and sequestrant of the present invention, not only strengthened the cleansing power of clean-out system, reduce surface tension, formed more macromolecular sequestrant simultaneously, with the water-soluble stable chelate of 13 to 17 chelate rings of pollution metal ion formation that produce in Electronic Components Manufacturing, the pollution of metal ion is able to effective removal.
As a further improvement on the present invention, the magnetic source that described magnetized water adopts is neodymium iron boron magnetic body, and magnet shape is a watt type, and magneticstrength is 2000～12000 Gausses.When the magneticstrength of magnetized water, during lower than 2000 Gauss, the cleansing power of the clean-out system of preparation significantly descends.
As a further improvement on the present invention, described magneticstrength is 4000～8200 Gausses.
As a further improvement on the present invention, described magnetized water is deionized water, its specific conductivity 2～5 μ s/cm, resistivity >=18.2M Ω cm.
As a further improvement on the present invention, described organic bases is selected from N, N '-dihydroxy ethyl quadrol, beta-hydroxyethyl quadrol, N-(2-hydroxyethyl) quadrol, N, N, N ', N '-tetrahydroxyethyl-ethylene diamine, N-hydroxyethyl propylene diamine, trimethylammonium hydroxyethyl propylene diamine and N, N '-bis-(2-hydroxyethyl)-1, one or more in the 3-propylene diamine.
As a further improvement on the present invention, described tensio-active agent is selected from one or more in APG, Sunmorl N 60S, cocoanut fatty acid diethanolamide and isomery alcohol ether.
As a further improvement on the present invention, described sequestrant is selected from one or more in ethylenediamine tetraacetic acid (EDTA), diethylene triamine pentacetic acid (DTPA), N mono-hydroxyethyl ethamine nitrilotriacetic, nitrilotriacetic acid, citric acid and tartrate.
As a further improvement on the present invention, the component and the mass percent thereof that comprise are as follows: magnetized water 65%, organic bases 8.5%, tensio-active agent 26%, sequestrant 0.5%.
Compared with prior art, the invention has the beneficial effects as follows: electronic component cleaning agent provided by the invention is with low cost, raw material sources are extensive, cleansing power is strong, consumption is few, can effectively remove the pollution of metal ion, can the integrity of electronic component not caused damage, can not affect its photoelectric characteristic yet, electromagnetic property, permeability, the performances such as device surface physical property, environment friendly and pollution-free, activeconstituents can be degradable, synergy by each component, can be widely used in electronic devices and components, unicircuit, cleaning in the manufacturing processedes such as PCB wiring board and liquid crystal display, applied widely.
Embodiment
Below by specific embodiment, the present invention is described in further detail.
embodiment mono-
Take the magnetized water of 65 parts by weight, toward the N that adds successively 8.5 parts by weight in magnetized water, the ethylenediamine tetraacetic acid (EDTA) of N '-dihydroxy ethyl quadrol, 0.5 parts by weight, after stirring 15min, add again the APG 0810 of 10 parts by weight and the isomery alcohol ether E-1310 of 16 parts by weight, mix, obtain electronic component cleaning agent.The magnetic source that described magnetized water adopts is neodymium iron boron magnetic body, and magnet shape is a watt type, and magneticstrength is 4000 Gausses.
Detect analytical system by imaging and detect surface cleanliness, the electronic component cleaning agent that the present embodiment obtains shows the wash result of electronic component, unicircuit, PCB wiring board and liquid crystal display etc.: without the particle contamination that is greater than 0.5 μ m, the mass concentration of non-volatile residuum (NVR) is less than 0.5 μ g/cm
2; With other type clean-out system, compare, the element surface cleanliness factor improves more than 30%, and after element cleans, good article rate is increased to more than 99.5%, and the clean-out system consumption reduces 25%, the holding element not damaged, and percentage of head rice reaches 100%.
embodiment bis-
Take the magnetized water of 50 parts by weight, toward the N that adds successively 4 parts by weight in magnetized water, the nitrilotriacetic acid of the beta-hydroxyethyl quadrol of N '-dihydroxy ethyl quadrol, 10 parts by weight, the citric acid of 0.5 parts by weight, 0.5 parts by weight, after stirring 15min, the Sunmorl N 60S that adds again APG 0816,15 parts by weight of 20 parts by weight, mix, obtain electronic component cleaning agent.The magnetic source that described magnetized water adopts is neodymium iron boron magnetic body, and magnet shape is a watt type, and magneticstrength is 6000 Gausses.
Detect analytical system by imaging and detect surface cleanliness, the electronic component cleaning agent that the present embodiment obtains is identical with embodiment mono-to the cleaning performance of electronic component, unicircuit, PCB wiring board and liquid crystal display etc.
embodiment tri-
Take the magnetized water of 70 parts by weight, add successively N-(2-hydroxyethyl) quadrol of 8 parts by weight, the ethylenediamine tetraacetic acid (EDTA) of 0.5 parts by weight, the nitrilotriacetic acid of 0.5 parts by weight in magnetized water, after stirring 15min, the Sunmorl N 60S that adds again 21 parts by weight, mix, obtain electronic component cleaning agent.The magnetic source that described magnetized water adopts is neodymium iron boron magnetic body, and magnet shape is a watt type, and magneticstrength is 8200 Gausses.
Detect analytical system by imaging and detect surface cleanliness, the electronic component cleaning agent that the present embodiment obtains is identical with embodiment mono-to the cleaning performance of electronic component, unicircuit, PCB wiring board and liquid crystal display etc.
embodiment tetra-
Take the magnetized water of 75 parts by weight, add successively N-(2-hydroxyethyl) quadrol of 2.8 parts by weight, the N-hydroxyethyl propylene diamine of 2 parts by weight, the nitrilotriacetic acid of 0.2 parts by weight in magnetized water, after stirring 15min, add again the Sunmorl N 60S of 10 parts by weight and the isomery alcohol ether E-1310 of 10 parts by weight, mix, obtain electronic component cleaning agent.The magnetic source that described magnetized water adopts is neodymium iron boron magnetic body, and magnet shape is a watt type, and magneticstrength is 2000 Gausses.
Detect analytical system by imaging and detect surface cleanliness, the electronic component cleaning agent that the present embodiment obtains is identical with embodiment mono-to the cleaning performance of electronic component, unicircuit, PCB wiring board and liquid crystal display etc.
embodiment five
Take the magnetized water of 75 parts by weight, add successively N-(2-hydroxyethyl) quadrol of 4.5 parts by weight, the nitrilotriacetic acid of 0.5 parts by weight in magnetized water, after stirring 15min, add again the Sunmorl N 60S of 10 parts by weight and the isomery alcohol ether E-1310 of 10 parts by weight, mix, obtain electronic component cleaning agent.The magnetic source that described magnetized water adopts is neodymium iron boron magnetic body, and magnet shape is a watt type, and magneticstrength is 12000 Gausses.
Detect analytical system by imaging and detect surface cleanliness, the electronic component cleaning agent that the present embodiment obtains is identical with embodiment mono-to the cleaning performance of electronic component, unicircuit, PCB wiring board and liquid crystal display etc.
Above content is in conjunction with concrete preferred implementation further description made for the present invention, can not assert that specific embodiment of the invention is confined to these explanations.For the general technical staff of the technical field of the invention, without departing from the inventive concept of the premise, can also make some simple deduction or replace, all should be considered as belonging to protection scope of the present invention.
Claims (4)
1. an electronic component cleaning agent, is characterized in that: by mass percentage, following component, consist of: magnetized water 50～75%, organic bases 2～14%, tensio-active agent 15～35%, sequestrant 0.1～1.0%; The magnetic source that described magnetized water adopts is neodymium iron boron magnetic body, and magnet shape is a watt type, and magneticstrength is 2000～12000 Gausses;
Described organic bases is selected from N, N '-dihydroxy ethyl quadrol, beta-hydroxyethyl quadrol, N-(2-hydroxyethyl) quadrol, N, N, N ', N '-tetrahydroxyethyl-ethylene diamine, N-hydroxyethyl propylene diamine, trimethylammonium hydroxyethyl propylene diamine and N, N '-bis-(2-hydroxyethyl)-1, one or more in the 3-propylene diamine;
Described tensio-active agent is selected from one or more in APG, Sunmorl N 60S, cocoanut fatty acid diethanolamide and isomery alcohol ether;
Described sequestrant is selected from one or more in ethylenediamine tetraacetic acid (EDTA), diethylene triamine pentacetic acid (DTPA), N mono-hydroxyethyl ethamine nitrilotriacetic, nitrilotriacetic acid, citric acid and tartrate.
2. electronic component cleaning agent according to claim 1, it is characterized in that: described magneticstrength is 4000～8200 Gausses.
3. electronic component cleaning agent according to claim 1, it is characterized in that: described magnetized water is deionized water, its specific conductivity 2～5 μ s/ cm, resistivity >=18.2M Ω cm.
4. according to the described electronic component cleaning agent of any one in claims 1 to 3, it is characterized in that: by following component form and mass percent as follows: magnetized water 65%, organic bases 8.5%, tensio-active agent 26%, sequestrant 0.5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210325113XA CN102816659B (en) | 2012-09-05 | 2012-09-05 | Electronic component cleaning agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210325113XA CN102816659B (en) | 2012-09-05 | 2012-09-05 | Electronic component cleaning agent |
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| CN102816659A CN102816659A (en) | 2012-12-12 |
| CN102816659B true CN102816659B (en) | 2013-12-11 |
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| CN201210325113XA Active CN102816659B (en) | 2012-09-05 | 2012-09-05 | Electronic component cleaning agent |
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Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103074179A (en) * | 2012-12-14 | 2013-05-01 | 内蒙古河西航天科技发展有限公司 | Alkaline cleaner for food contact surface of liquid milk equipment |
| CN104278283A (en) * | 2014-09-25 | 2015-01-14 | 巢湖广丰金属制品有限公司 | Special water-based cleaning agent for aluminum magnesium alloy |
| CN104450281A (en) * | 2014-11-17 | 2015-03-25 | 如皋市大昌电子有限公司 | Special cleaning solution for diode |
| CN104911042A (en) * | 2015-07-03 | 2015-09-16 | 陈泽林 | Washing liquid for display screen for electronic device |
| CN105710760A (en) * | 2016-04-22 | 2016-06-29 | 衡阳市宏达威环保科技有限公司 | Aluminium alloy alkaline grinding fluid |
| CN106434016A (en) * | 2016-08-30 | 2017-02-22 | 成都市翻鑫家科技有限公司 | Water-based cleaning agent for electronic products |
| CN106398880A (en) * | 2016-08-30 | 2017-02-15 | 成都市翻鑫家科技有限公司 | High-efficiency electronic product cleaning agent |
| CN106434005A (en) * | 2016-08-30 | 2017-02-22 | 成都市翻鑫家科技有限公司 | Novel detergent for electronic product |
| CN106398877A (en) * | 2016-08-30 | 2017-02-15 | 成都市翻鑫家科技有限公司 | Environment-friendly electronic product cleaning agent |
| CN106367218A (en) * | 2016-08-30 | 2017-02-01 | 成都市翻鑫家科技有限公司 | Electronic product cleaning agent |
| CN107354018A (en) * | 2017-05-20 | 2017-11-17 | 合肥市惠科精密模具有限公司 | A kind of high-efficiency environment friendly LCDs cleaning agent |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2327680Y (en) * | 1998-03-16 | 1999-07-07 | 张仁本 | Magnetizer for treatment of cleaning water |
| CN1944613A (en) * | 2006-06-07 | 2007-04-11 | 天津晶岭电子材料科技有限公司 | Cleaning agent for integrated circuit substrate silicon chip and its cleaning method |
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2012
- 2012-09-05 CN CN201210325113XA patent/CN102816659B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2327680Y (en) * | 1998-03-16 | 1999-07-07 | 张仁本 | Magnetizer for treatment of cleaning water |
| CN1944613A (en) * | 2006-06-07 | 2007-04-11 | 天津晶岭电子材料科技有限公司 | Cleaning agent for integrated circuit substrate silicon chip and its cleaning method |
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| CN102816659A (en) | 2012-12-12 |
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Effective date of registration: 20180606 Address after: 421200 Jinlong Industrial Park, Kai Yun town, Heng Mountain County, Hunan Province Patentee after: HENGYANG HONDAWEI ENVIRONMENTAL TECHNOLOGY CO., LTD. Address before: 518000 Guangdong Shenzhen 115 Baoan District District Xixiang road and Qianjin Road Interchange, Bao Yun Tatsu logistics information building 610-612 Patentee before: Shenzhen Hongdawei Chemical Co., Ltd. |