CN102796993B - CVD (Chemical Vapor Deposition) equipment and control method thereof - Google Patents
CVD (Chemical Vapor Deposition) equipment and control method thereof Download PDFInfo
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- CN102796993B CN102796993B CN201110141318.8A CN201110141318A CN102796993B CN 102796993 B CN102796993 B CN 102796993B CN 201110141318 A CN201110141318 A CN 201110141318A CN 102796993 B CN102796993 B CN 102796993B
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Abstract
The invention provides CVD (Chemical Vapor Deposition) equipment comprising a cavity, an electrode plate, a plurality of horizontally arranged driving wheels, a carrier plate, first lifting mechanisms and a controller, wherein the cavity is used for forming a chamber; the electrode plate is arranged on the top of the chamber; the driving wheels are arranged in the chamber; the carrier plate is arranged on the driving wheels; the first lifting mechanisms are respectively located at two ends of the electrode plate and used for supporting the electrode plate and controlling the electrode plate to vertically move; and the controller is connected with the driving wheels and the first lifting mechanisms and used for controlling the rotation of the driving wheels and the lifting of the first lifting mechanism so as to move the electrode plate and the carrier plate in or out of the chamber. The invention also provides a control method. The CVD equipment provided by the embodiment of the invention has the advantages of high electrode plate replacement speed and low energy consumption. The control method of the CVD equipment has the advantages of simplicity in control and high control precision.
Description
Technical field
The present invention relates to microelectronics technology, particularly the control method of a kind of CVD equipment and this CVD equipment.
Background technology
Plasma enhanced chemical vapor deposition (PECVD) equipment is mainly divided into two kinds of direct method and indirect methods according to the difference of thin film-forming method, and these two kinds of equipment are all to bear wafer by support plate.The support plate ground connection of direct method, top electrode connects intermediate frequency or radio frequency, between top electrode and support plate, forms plasma body.The support plate of indirect method is earth-free, only plays transmitting effect, and battery lead plate connects high frequency or microwave, and ion is combined into antireflective film and is deposited in wafer surface by diffusion in discharge space.
Indirect method mostly is lower plated film mode, and when plated film, wafer is placed on chamber roof, plasma source below, film forming face down, but because indirect method can only realize surface passivation, so limited the lifting of short-circuit current.And the densification of direct method film forming can realize the body passivation of film forming, therefore can promote short-circuit current.As shown in Figure 1, be plated film PECVD device 100 in traditional flat direct method.Chamber 111 is interior generally in vacuum state, process gas enters chamber 111 by air inlet port 120, radio-frequency power supply 170 provides energy by battery lead plate 130 in chamber 111, the direct ground connection of support plate 140, between battery lead plate 130 and support plate 140, produce rf electric field, process gas is excited into plasma body, thereby the wafer being positioned on support plate 140 is carried out to plated film.But due to film formation surface upward, the particle therefore producing in technological process, or the particle that long-play rear electrode plate 130 peels off may drop on film formation surface, and then affect outward appearance and the quality of wafer.
Therefore,, in the time that battery lead plate 130 surfaces form particle, the battery lead plate 130 that need clean or more renew is to improve the yield of wafer.But, because the battery lead plate 130 of plated film PECVD device 100 in traditional flat direct method is for being fixed on chamber 111 upper surfaces, causes changing loaded down with trivial details and lose time.And in Renewal process, well heater 160 need to stop heating, cooling, and after battery lead plate 130 changed, well heater 160 need to be heated to the temperature of the required plated film of wafer again to support plate 140, causes energy consumption raising, and battery lead plate 130 maintenance times are long.
Summary of the invention
Object of the present invention is intended at least solve one of above-mentioned technological deficiency.
For this reason, the object of the invention is to propose a kind of CVD equipment, this CVD equipment can quick-replaceable battery lead plate, and then improves the working efficiency of CVD equipment.And in Renewal process, do not need to stop heating, reach the requirement that reduces energy consumption.
Another object of the present invention is to propose a kind of control method of above-mentioned CVD equipment, the method has advantages of controls simple, precise control.
For achieving the above object, the CVD equipment that the embodiment of first aspect present invention proposes, comprising: cavity, and described cavity forms chamber; Be arranged on the battery lead plate of described chamber roof; Be multiple power wheels of horizontal positioned, within described multiple power wheels are arranged on described chamber; Support plate, described support plate is placed on described multiple power wheel, and described power wheel rotates to drive described support plate to move horizontally; The first hoisting appliance, described the first hoisting appliance lays respectively at the two ends of described battery lead plate, and described the first hoisting appliance is used for supporting described battery lead plate, and controls described battery lead plate and vertically move; And controller, described controller is connected with described the first hoisting appliance with described power wheel, described controller is for controlling the rotation of described multiple power wheels and the lifting of described the first hoisting appliance, so that described battery lead plate and described support plate are shifted out or move into described chamber.。
In the CVD of embodiment of the present invention equipment, when battery lead plate is when taking out in chamber, first controller is controlled power wheel and is rotated, to the support plate being placed on power wheel is shifted out to chamber, then controller control the first hoisting appliance declines, so that be supported on the battery lead plate decline on the first hoisting appliance, and finally depart from the support of the first hoisting appliance and be placed on power wheel, finally, controller control power wheel rotates battery lead plate is shifted out to chamber.In the time that battery lead plate is put into chamber, controller control power wheel rotates so that the battery lead plate that cleans or change is placed in the predetermined position on power wheel, then controller control the first hoisting appliance rises, thereby and supports battery lead plate after cleaning or changing and rise to reaction desired location and complete the replacing of battery lead plate.The battery lead plate of the CVD equipment of the embodiment of the present invention is placed on the first hoisting appliance, does not need to be fixedly mounted on the top of chamber, therefore, in battery lead plate Renewal process, has saved the installing/dismounting time of battery lead plate, and has changed simple and convenient.In addition, multiple power wheels of the CVD equipment by the embodiment of the present invention, shift out chamber by the battery lead plate level being placed on multiple power wheels rapidly, thereby have improved the working efficiency of this CVD equipment.
In addition, CVD equipment according to the present invention can also have following additional technical characterictic:
In one embodiment of the invention, described the first hoisting appliance comprises: elevator; The connection mechanism being connected with described elevator; Abschirmblech, one end of described Abschirmblech is connected with described connection mechanism, and the other end of described Abschirmblech is used for supporting described battery lead plate shielded radio frequency.
In one embodiment of the invention, the width of described Abschirmblech is greater than the width of described support plate.
In one embodiment of the invention, among described Abschirmblech, be provided with opening, in the time that described in described the first hoisting appliance control, battery lead plate rises to response location, described opening so that described support plate relative with described support plate is through described opening and shift out described chamber.
In one embodiment of the invention, the area of described support plate is less than the area of described battery lead plate.
In one embodiment of the invention, described CVD equipment also comprises: well heater, described well heater is positioned under described support plate.
In one embodiment of the invention, described CVD equipment also comprises: the second hoisting appliance, and described the second hoisting appliance is positioned under described support plate, and described the second hoisting appliance is used for supporting described support plate, and controls described support plate and vertically move.
In one embodiment of the invention, described battery lead plate is connected with power supply, and described support plate is connected to the ground.
The control method of the CVD equipment of the above-mentioned first aspect embodiment that the embodiment of second aspect present invention proposes, comprises the following steps: multiple rotor wheels of controlling described CVD equipment rotate so that described support plate is shifted out to described chamber; Control described the first hoisting appliance and decline so that described battery lead plate contacts with described multiple rotor wheels, and make described battery lead plate depart from the support of described the first hoisting appliance; Controlling described multiple rotor wheel rotates so that described battery lead plate is shifted out to described chamber; Battery lead plate after cleaning or changing is moved into described chamber; Control described the first hoisting appliance rising so that described the first hoisting appliance supports the battery lead plate after described cleaning or replacing, and the battery lead plate controlling after described cleaning or replacing is risen to response location; With described support plate is moved into described chamber.
By the control method of the embodiment of the present invention, realize automatic integratedization of the battery lead plate replacing of CVD equipment, reduce manpower, and replacing is simple, replacing speed is fast.In addition, the control method of the embodiment of the present invention can be changed control to battery lead plate in real time, does not need to change the required temperature of reaction in chamber, thereby reduces energy consumption, and then improve the rate of utilization of embodiment of the present invention CVD equipment.
The aspect that the present invention is additional and advantage in the following description part provide, and part will become obviously from the following description, or recognize by practice of the present invention.
Accompanying drawing explanation
The present invention above-mentioned and/or additional aspect and advantage will become from the following description of the accompanying drawings of embodiments obviously and easily and understand, wherein:
Fig. 1 is the schematic diagram of plated film CVD equipment in traditional flat direct method;
Fig. 2 is the schematic diagram of the CVD equipment of the embodiment of the present invention; And
Fig. 3 is the schema of the control method of the embodiment of the present invention.
Embodiment
Describe embodiments of the invention below in detail, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has the element of identical or similar functions from start to finish.Be exemplary below by the embodiment being described with reference to the drawings, only for explaining the present invention, and can not be interpreted as limitation of the present invention.
In description of the invention, it will be appreciated that, term " " center ", " longitudinally ", " laterally ", " on ", D score, " front ", " afterwards ", " left side ", " right side ", " vertically ", " level ", " top ", " end ", " interior ", orientation or the position relationship of indications such as " outward " are based on orientation shown in the drawings or position relationship, only the present invention for convenience of description and simplified characterization, rather than device or the element of indication or hint indication must have specific orientation, with specific orientation structure and operation, therefore can not be interpreted as limitation of the present invention.In addition, term " first ", " second " be only for describing object, and can not be interpreted as indication or hint relative importance.
In description of the invention, it should be noted that, unless otherwise clearly defined and limited, term " installation ", " being connected ", " connection " should be interpreted broadly, and for example, can be to be fixedly connected with, and can be also to removably connect, or connect integratedly; Can be mechanical connection, can be also electrical connection; Can be to be directly connected, also can indirectly be connected by intermediary, can be the connection of two element internals.For the ordinary skill in the art, can understand as the case may be above-mentioned term concrete meaning in the present invention.
Below in conjunction with accompanying drawing 2, first the CVD equipment according to the embodiment of the present invention described.
As shown in Figure 2, be the schematic diagram of the CVD equipment of the embodiment of the present invention.The CVD equipment of the embodiment of the present invention is for carrying out plasma enhanced chemical vapor deposition (PECVD) to wafer surface.Comprise cavity 210, process gas allocation component 220, battery lead plate 230, multiple power wheel 240, support plate 250, the first hoisting appliance 260 and controller according to the CVD equipment 200 of the embodiment of the present invention.In other embodiments of the invention, battery lead plate 230 can be also gas distribution plate, and therefore CVD equipment can not comprise process gas allocation component 220 in other embodiments of the invention, and its function is integrated among battery lead plate 230.In following examples, the CVD equipment to have process gas allocation component 220 is introduced as example, except process gas allocation component 220, other embodiment of the present invention and following examples are similar, do not repeat them here.
Wherein, in cavity 210, be formed with chamber 211.Process gas allocation component 220 and battery lead plate 230 are arranged on the top of chamber 211.As Fig. 2, process gas allocation component 220 is placed on battery lead plate 230, and when battery lead plate 230 is placed in response location A, CVD equipment 200 is in response behaviour.In example of the present invention, for example battery lead plate 230 can be connected with power supply 231 to produce intermediate frequency or radio-frequency current, and support plate 250 is connected to the ground.Now, process gas forms plasma body under the effect of intermediate frequency or radio-frequency current between battery lead plate 230 and support plate 250, and is diffused into the wafer surface being carried on support plate 250, to form deposit film in wafer surface.
Within multiple power wheels 240 are horizontal positioned and are arranged on chamber 211.Support plate 250 is placed on multiple power wheels 240, and power wheel 240 rotates to drive support plate 250 to move horizontally.The first hoisting appliance 260 lays respectively at the two ends (two ends, left and right in Fig. 2) of battery lead plate 230, and the first hoisting appliance 260 is for support electrode plate 230, and control electrode plate 230 vertically moves.
On substrate when deposit film, the first hoisting appliance 260 support electrode plates 230 to response location A, in the time that needs clean or change battery lead plate 230, first support plate 250 is shifted out to cavity 210, again the first hoisting appliance 260 is vertically dropped to B place, position, as shown in Figure 2, battery lead plate 230 will drop on multiple power wheels 240 and depart from the support of the first hoisting appliance 260.Then battery lead plate 230 is along with thereby the rotation level of multiple power wheels 240 shifts out chamber 211.
In conjunction with Fig. 2, in an example of the present invention, for example the first hoisting appliance 260 can be made up of elevator 261, connection mechanism 262 and Abschirmblech 263.Wherein, connection mechanism 262 is connected with elevator 261.One end of Abschirmblech 263 is connected with connection mechanism 262, and the other end of Abschirmblech 263 is for the radio frequency of support electrode plate 230 guarded electrode plate 230.The position A of Abschirmblech 263 support electrode plates 230 during to normal process, makes battery lead plate 230 not need to be fixedly mounted on the top of chamber 211, has saved the installing/dismounting time of battery lead plate 230.Can arrive on multiple power wheels 240 by fast-descending by elevator 261 control electrode plates 230, and along with chamber 211 is shifted out in the rotation of multiple power wheels 240.Thereby not only realize fast the quick travel of battery lead plate 230 between response location A and position B by elevator 261, and realize battery lead plate 230 by multiple power wheels 240 and shift out fast chamber 211 or move into fast chamber 211 from position B.
Another of Abschirmblech 263 act as the radio frequency that guarded electrode plate 230 sends, and plasma body is enclosed in a relatively airtight uniform space, to improve plasma body utilization ratio, thus the one-tenth film uniformity of raising wafer.Preferably, for example Abschirmblech 263 is made up of stupalith.That pottery has is high temperature resistant, the characteristic of insulation, shielded radio frequency successful.Certainly, embodiments of the invention are not limited to this, and for example Abschirmblech 263 can also be made up of tetrafluoro, glass and mica material.In addition, the width of Abschirmblech 263 should be greater than the width of support plate 250, so that Abschirmblech 263 can surround whole support plate 250, makes plasma body more even on support plate surface.In another embodiment of the present invention, for example the area of support plate 250 should be less than the area of battery lead plate 230, makes battery lead plate 230 after lowering, can contact and depart from power wheel 240 support of the first hoisting appliance 260.Guarantee that all there is plasma body the surperficial neighboring area of support plate 250, thereby it is more even to guarantee to be placed in wafer film forming on support plate 250, film-formation result is better.
The controller of the CVD equipment 200 of the embodiment of the present invention is connected with the first hoisting appliance 260 with power wheel 240, controller is for controlling the rotation of multiple power wheels 240 and the lifting of the first hoisting appliance 260, so that battery lead plate 230 and support plate 250 are shifted out or move into chamber 211.Particularly, for example, in the time cleaning or change battery lead plate 230, control power wheel 240 rotates support plate 250 is shifted out to chamber 211.Then, controller control the first hoisting appliance 260 declines so that battery lead plate 230 and multiple power wheels 240 contact and depart from the support of the first hoisting appliance 260, controller is then controlled multiple power wheels 240 and is rotated that battery lead plate 230 is shifted out to chamber 211, and controls power wheel 240 and rotate the battery lead plate shift-in chamber 211 after cleaning or changing.
In one embodiment of the invention, for example among Abschirmblech 263, can be provided with opening, in the time that the first hoisting appliance 260 control electrode plates 230 rise to response location, the opening of Abschirmblech 263 is just relative with support plate 250, and the opening of Abschirmblech 263 should be greater than the vertical section of support plate 250, so that power wheel 240 rotates and makes support plate 250 can be smoothly through the opening of Abschirmblech 263 and shift out chamber 211.Similarly, also can support plate 250 be moved among chamber 211 by this opening.
In conjunction with Fig. 2, in example of the present invention, for example CVD equipment 200 also comprises well heater 270, and well heater 270 is positioned under support plate 250.Well heater 270 reacts temperature required to support plate heating so that support plate 250 reaches fast, the CVD equipment 200 of the embodiment of the present invention is in the time changing battery lead plate 230, controller control the first hoisting appliance 260 VTOL (vertical take off and landing) and multiple power wheel 240 rotate to realize the automatization of changing battery lead plate 230, Renewal process does not need manpower, therefore, well heater does not need to stop heating, cooling.Reduce the energy consumption of well heater 270, saved the time cooling, that reheat, improved the utilization ratio of CVD equipment 200.And in an embodiment of the present invention, due in changing battery lead plate 230, support plate 250 has been moved out of chamber 211, the particle of therefore having avoided battery lead plate plated film to produce is fallen on wafer, therefore can further improve the yield of wafer.
In addition, alternatively, in one embodiment of the invention, CVD equipment 200 also can comprise that the second hoisting appliance 280, the second hoisting appliances 280 are positioned under support plate 250, and the second hoisting appliance 280 is for supports loadboard 250, and controls support plate 250 and vertically move.Distance when the second hoisting appliance 280 can be controlled reaction between battery lead plate 230 and support plate 250, is applicable to distance between the two, thereby improves the quality of forming film of wafer.
According to the CVD equipment 200 of the embodiment of the present invention, when by battery lead plate 230 during from the interior taking-up of chamber 211, first controller is controlled power wheel 240 and is rotated, to the support plate 250 being placed on power wheel 240 is shifted out to chamber 211, then controller control the first hoisting appliance 260 declines, so that the battery lead plate 230 being supported on the first hoisting appliance 260 declines, and finally depart from the support of the first hoisting appliance 260 and be placed on power wheel 240, finally, controller control power wheel 240 rotates battery lead plate 230 is shifted out to chamber 211.When battery lead plate 230 being moved into chamber 211 when interior, controller control power wheel 240 rotates so that the battery lead plate 230 that cleans or change is placed on power wheel 240, then controller control the first hoisting appliance 260 rises, thereby and supports battery lead plate 230 after cleaning or changing and rise to the required response location of reaction and complete the replacing of battery lead plate 230.The battery lead plate 230 of the CVD equipment 200 of the embodiment of the present invention is placed on the first hoisting appliance 260, do not need to be fixedly mounted on the top of chamber 211, therefore, in battery lead plate 230 Renewal process, save the installing/dismounting time of battery lead plate 230, and changed simple and convenient.In addition, multiple power wheels 240 of the CVD equipment 200 by the embodiment of the present invention, shift out chamber by battery lead plate 230 levels that are placed on multiple power wheels 240 rapidly, improve the working efficiency of this CVD equipment 200.
Below in conjunction with accompanying drawing 3, the control method according to the embodiment of the present invention is described.
As shown in Figure 3, for the schema of the control method of the embodiment of the present invention, in conjunction with Fig. 2.Comprise the following steps according to the control method of the embodiment of the present invention:
Step S301, multiple rotor wheels 240 of controlling CVD equipment 200 rotate that support plate 250 is shifted out to chamber 211.
Step S302, controls the first hoisting appliance 260 and declines so that battery lead plate 230 contacts with multiple rotor wheels 240, and make battery lead plate 230 depart from the support of the first hoisting appliance 260.
Step S303, controls multiple rotor wheels 240 and rotates that battery lead plate 230 is shifted out to chamber 211.
Step S304, moves into chamber 211 by the battery lead plate 230 after cleaning or changing.
Step S305, controls that the first hoisting appliance 260 rises so that the first hoisting appliance 260 supports the battery lead plate 230 after cleaning or changing, and the battery lead plate 230 controlling after cleaning or changing rises to response location.
Step S306, moves into chamber 211 by support plate 250.
According to the control method of the embodiment of the present invention, realize automatic integratedization of the battery lead plate replacing of CVD equipment, reduce manpower, and replacing is simple, replacing speed is fast.In addition, the control method of the embodiment of the present invention can be changed control to battery lead plate in real time, does not need to change the required temperature of reaction in chamber, thereby reduces energy consumption, and then improve the rate of utilization of the CVD equipment of the embodiment of the present invention.
In the description of this specification sheets, the description of reference term " embodiment ", " some embodiment ", " example ", " concrete example " or " some examples " etc. means to be contained at least one embodiment of the present invention or example in conjunction with specific features, structure, material or the feature of this embodiment or example description.In this manual, the schematic statement of above-mentioned term is not necessarily referred to identical embodiment or example.And specific features, structure, material or the feature of description can be with suitable mode combination in any one or more embodiment or example.
Although illustrated and described embodiments of the invention, for the ordinary skill in the art, be appreciated that without departing from the principles and spirit of the present invention and can carry out multiple variation, modification, replacement and modification to these embodiment, scope of the present invention is by claims and be equal to and limit.
Claims (9)
1. a CVD equipment, is characterized in that, comprising:
Cavity, described cavity forms chamber;
Be arranged on the battery lead plate of described chamber roof;
Be multiple power wheels of horizontal positioned, within described multiple power wheels are arranged on described chamber;
Support plate, described support plate is placed on described multiple power wheel, and described power wheel rotates to drive described support plate to move horizontally;
The first hoisting appliance, described the first hoisting appliance lays respectively at the two ends of described battery lead plate, described the first hoisting appliance is used for supporting described battery lead plate, and by lifting change vertical range between described battery lead plate and described support plate and
Controller, described controller is connected with described the first hoisting appliance with described multiple power wheels, described controller is for controlling the rotation of described multiple power wheels and the lifting of described the first hoisting appliance, so that described battery lead plate and described support plate are shifted out or move into described chamber.
2. CVD equipment as claimed in claim 1, is characterized in that, described the first hoisting appliance comprises:
Elevator;
The connection mechanism being connected with described elevator;
Abschirmblech, one end of described Abschirmblech is connected with described connection mechanism, and the other end of described Abschirmblech is used for supporting described battery lead plate shielded radio frequency.
3. CVD equipment as claimed in claim 2, is characterized in that, the width of described Abschirmblech is greater than the width of described support plate.
4. CVD equipment as claimed in claim 3, it is characterized in that, among described Abschirmblech, be provided with opening, in the time that described in described the first hoisting appliance control, battery lead plate rises to response location, described opening so that described support plate relative with described support plate is through described opening and shift out described chamber.
5. CVD equipment as claimed in claim 3, is characterized in that, the area of described support plate is less than the area of described battery lead plate.
6. CVD equipment as claimed in claim 1, is characterized in that, also comprises:
Well heater, described well heater is positioned under described support plate.
7. CVD equipment as claimed in claim 1, is characterized in that, also comprises:
The second hoisting appliance, described the second hoisting appliance is positioned under described support plate, and described the second hoisting appliance is used for supporting described support plate, and controls described support plate and vertically move.
8. CVD equipment as claimed in claim 1, is characterized in that, described battery lead plate is connected with power supply, and described support plate is connected to the ground.
9. a control method for the CVD equipment as described in claim 1-8 any one, is characterized in that, comprises the following steps:
Multiple rotor wheels of controlling described CVD equipment rotate so that described support plate is shifted out to described chamber;
Control described the first hoisting appliance and decline so that described battery lead plate contacts with described multiple rotor wheels, and make described battery lead plate depart from the support of described the first hoisting appliance;
Controlling described multiple rotor wheel rotates so that described battery lead plate is shifted out to described chamber;
Battery lead plate after cleaning or changing is moved into described chamber;
Control described the first hoisting appliance rising so that described the first hoisting appliance supports the battery lead plate after described cleaning or replacing, and the battery lead plate controlling after described cleaning or replacing is risen to response location; With
Described support plate is moved into described chamber.
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| CN201110141318.8A CN102796993B (en) | 2011-05-27 | 2011-05-27 | CVD (Chemical Vapor Deposition) equipment and control method thereof |
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| CN201110141318.8A CN102796993B (en) | 2011-05-27 | 2011-05-27 | CVD (Chemical Vapor Deposition) equipment and control method thereof |
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| CN103866282B (en) * | 2012-12-14 | 2016-12-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Pecvd device |
| CN109402599A (en) * | 2017-08-17 | 2019-03-01 | 中国科学院苏州纳米技术与纳米仿生研究所 | A kind of plasma device and its application |
| CN109136884A (en) * | 2018-07-23 | 2019-01-04 | 中国电子科技集团公司第四十八研究所 | The automatic transmission control unit of plate type PECVD apparatus support plate, PECVD device and method |
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