CN102794685A - Peripheral surface polishing brush and method of producing glass substrate used for magnetic recording medium - Google Patents
Peripheral surface polishing brush and method of producing glass substrate used for magnetic recording medium Download PDFInfo
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- CN102794685A CN102794685A CN2012101665944A CN201210166594A CN102794685A CN 102794685 A CN102794685 A CN 102794685A CN 2012101665944 A CN2012101665944 A CN 2012101665944A CN 201210166594 A CN201210166594 A CN 201210166594A CN 102794685 A CN102794685 A CN 102794685A
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- glass substrate
- axle
- perimeter surface
- brush
- polishing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/005—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents using brushes
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- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B9/00—Arrangements of the bristles in the brush body
- A46B9/08—Supports or guides for bristles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
- B24B9/10—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B2200/00—Brushes characterized by their functions, uses or applications
- A46B2200/30—Brushes for cleaning or polishing
- A46B2200/3086—Brushes for polishing
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Ceramic Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The invention relates to a peripheral surface polishing brush and a method of producing a glass substrate used for a magnetic recording medium. The polishing brush is used to polish the inner peripheral surface of the glass substrate used for the magnetic recording medium and equipped with a round hole in the center thereof, wherein the peripheral surface polishing brush comprises a shaft on which brush wires are planted, and when being applied a load of 19.6 N, the shaft possesses a maximum bending value of 420 micrometers or smaller.
Description
Technical field
The present invention relates to the perimeter surface polish brush and use the perimeter surface polish brush to produce the method for magnetic recording medium with glass substrate.
Background technology
Along with the increase of the high record density of disk in recent years, magnetic recording medium becomes more and more stricter with the required characteristic of glass substrate.Particularly, when its center has the edge surface of the dish type glass substrate that is used for magnetic recording medium of circular port when polished, the required precision of the quality of the shape and size of the edge surface of glass substrate increases.
Magnetic recording medium stands the perimeter surface polishing with glass substrate in the process of producing said glass substrate, thereby also Surface Finishing is become smooth minute surface so that remove the side surface or the scratch on the chamfered part of glass substrate with roughness.Side surface or chamfered part through with glass substrate are finish-machined to smooth minute surface, and the mechanical performance of glass substrate is improved.The particle that the wearing and tearing of the resinous wood magazine that the foreign matter that exists on the roughness on side surface or the edge surface in addition, is reduced and is produced by the roughness of side surface or edge surface cause is reduced.
In the interior perimeter surface polishing of glass substrate, for example, the glass-based sheetpile that glass substrate is stacked is installed on the perimeter surface polishing machine, and polish brush is inserted in the glass-based sheetpile with polishing.Yet when polish brush was pushed in the interior perimeter surface of glass-based sheetpile, the axle that has polish brush was because the repulsive force of glass-based sheetpile and crooked problem.
Therefore, patent documentation 1 discloses through polished glass substrate under the state that polish brush is applied down load and has piled the bending that suppresses polish brush.
[patent documentation 1] JP-A-2006-007350
Summary of the invention
Yet in the method for patent documentation 1, equipment and perimeter surface polishing machine that existence need apply down load have the problem of complicated structure.In addition, in fact can not assess the variation of polishing and the mirror defects in the glass-based sheetpile.
Therefore, the purpose of this invention is to provide a kind of perimeter surface polish brush, its can be equably and polishing stably in all chamfered parts and interior all side surfaces and needn't use any perimeter surface polishing machine with complicated structure.
The present invention provides a kind of perimeter surface polish brush, is used for magnetic recording medium is polished with the interior perimeter surface of glass substrate, has circular port in the center of said glass substrate,
Wherein said perimeter surface polish brush comprises axle, and on said axle, implanting has the brush silk, and when said axle was applied the load of 19.6N, said axle had 420 μ m or littler maximum deflection value.
Effect of the present invention is following.
The present invention provides a kind of perimeter surface polish brush, its can be equably and polishing stably in all chamfered parts and interior all side surfaces and needn't use any perimeter surface polishing machine with complicated structure.
Description of drawings
Fig. 1 illustrates through the perspective cross-sectional view of production magnetic recording medium according to the present invention with the method construct glass substrate of glass substrate.
Fig. 2 illustrates the sketch map of magnetic recording medium with the polished state of the interior perimeter surface of glass substrate.
Fig. 3 is the schematic cross-sectional view that illustrates according to perimeter surface polish brush of the present invention.
Fig. 4 is the viewgraph of cross-section according to the amplification of perimeter surface polish brush of the present invention.
Description of reference numerals
1... glass substrate
2... first type surface
3... circular port
4... outer surface
5... outer circumferential side is surperficial
6... periphery chamfered part
7... interior perimeter surface
8... interior all side surfaces
9... interior all chamfered parts
10... distance piece
11... glass-based sheetpile
12... perimeter surface polish brush
13... brush silk
14... axle
15... passage component
16... the length of the silk of implanting
17... the height of passage component
18... thread-placing part branch
19... the pitch width of passage component
20... the external diameter of perimeter surface polish brush
21... the length of brush silk
The specific embodiment
Hereinafter, will describe the preferred embodiments of the present invention, but the invention is not restricted to this.
At first, use the structure of perimeter surface polish brush polishing magnetic recording medium with describing with glass substrate.Fig. 1 is the perspective cross-section view that the structure of glass substrate is shown.In Fig. 1, glass substrate 1 has the ring shape, and its center at first type surface 2 has circular port 3.The side surface of the periphery of glass substrate 1 is an outer surface 4, and the side surface of circular port 3 is interior perimeter surface 7.Outer surface 4 comprises the outer circumferential side surface 5 and the periphery chamfered part 6 that contacts first type surface 2 at periphery side surface 5 places that forms an angle of 90 degrees degree with first type surface 2.And interior perimeter surface 7 comprises: with interior all side surfaces 8 of first type surface 2 formation an angle of 90 degrees degree; With contact first type surface 2 and in interior all chamfered parts 9 of all side surfaces 8.
Fig. 2 illustrates the sketch map of magnetic recording medium with the polished state of the interior perimeter surface of glass substrate.When magnetic recording medium was polished with the interior perimeter surface of glass substrate, a plurality of dish type glass substrates made circular port overlapping, made glass substrate corresponding to the position of circular port, thereby formed the glass-based sheetpile.At this moment, as shown in Figure 2, distance piece 10 can for example insert between the adjacent dish type glass substrate 1.Through distance piece 10 is inserted therebetween, brush silk and polishing slurries enter into the border between first type surface 2 and the interior all chamfered parts 9 easily, and interior perimeter surface 7 can be by further polishing equably.In addition, can prevent scraping to the first type surface of glass substrate.Usually, in the glass-based sheetpile, the circular port of distance piece 10 has the central axis identical with the circular port of glass substrate and central axis and on the direction perpendicular to the first type surface 2 of glass substrate 1, extends.
Preferably, the internal diameter of the circular port of distance piece 10 is slightly greater than the diameter that is formed by the border between interior all chamfered parts 9 of the first type surface 2 of glass substrate 1 and first type surface 2.The internal diameter of the circular port through making distance piece 10 is slightly larger than the diameter that is formed by the border between interior all chamfered parts 9 of the first type surface 2 of glass substrate 1 and first type surface 2, and the whole surface of interior all chamfered parts 9 can be by polishing equably.And the thickness of distance piece 10 is 0.2mm to 0.5mm preferably.When the thickness of distance piece 10 during less than 0.2mm, the whole surface of all chamfered parts 9 in possibly being difficult to polish equably.On the other hand, when the thickness of distance piece 10 during, because the size of glass-based sheetpile increases, so be not preferred greater than 0.5mm.Equally, the material of distance piece 10 is specifically unrestricted, but for example can use rubber, plastics, aluminium alloy, stainless steel etc.
The glass-based sheetpile 11 that piles up a plurality of glass substrates is installed in the retaining part the glass-based sheetpile is remained in the well-known interior perimeter surface polishing machine.Then, following perimeter surface polish brush 12 is inserted in the circular port 3 of the center that is formed on glass-based sheetpile 11, make glass substrate interior all side surfaces 8 and in all chamfered parts 9 and brush threads 13 contact.The polishing slurries that afterwards, will comprise abrasive is fed to interior all side surfaces 8 and interior all chamfered parts 9 of glass substrate.Under this state, through carrying out polishing with perimeter surface polish brush 12 at opposite direction rotary glass substrate heap 11.
At this moment, for example, perimeter surface polish brush 12 can be pressed onto the degree of depth to about 2.0mm of about 1.5mm on the glass-based sheetpile 11 forcefully.And, can carry out polishing through perimeter surface polish brush 12 is moved back and forth on the brush direction of insertion.And, perimeter surface polish brush 12 reciprocating reciprocating motion lengths be preferably glass substrate pile up length on the direction 15% or more.When perimeter surface polish brush 12 reciprocating reciprocating motion lengths be lower than the glass-based sheetpile along the length of heap direction 15% the time, may cause the variable quantity of polishing by the glass-based sheetpile along the variation characteristic of the axial direction of polish brush.
In Fig. 2, formed the glass-based sheetpile through piling up six dish type glass substrates, but the invention is not restricted to this.The piling up the concrete unrestricted and glass-based sheetpile of number and can form and for example pile up 100,200 or 300 glass substrates of a plurality of dish type glass substrates to be piled up.Usually, the number of the glass substrate that piles up through increase, many glass substrates can by polishing simultaneously and in view of business efficiency and usefulness be preferred.
[perimeter surface polish brush]
Fig. 3 is the schematic cross-sectional view that illustrates according to perimeter surface polish brush 12 of the present invention.And Fig. 4 is the viewgraph of cross-section of the amplification of perimeter surface polish brush 12.Perimeter surface polish brush 12 generally includes circumferential axis 14 and the brush silk 13 that is installed on the axle 14.Brush silk 13 is implanted on the direction of cardinal principle perpendicular to the circumferential direction of axle 14.
Circumferential axis 14 (mm) is defined as following formula (1) with the Young's modulus E (GPa) of constituent material at the diameter r (radius of bottom) that uses length L (mm) on axial direction of the load p (N) apply, axle 14, axle at the maximum deflection value δ of center (μ m) on the axial direction.
δ=PL
3/(12πr
4E) (1)
The method of the maximum deflection value of measure equation (1) illustrates in the above and the invention is not restricted to this.For example, the 10mm inboard at the two ends on axial direction of axle is supported, on axial direction, utilizes push-and-pull rule etc. that the load of 19.6N is applied to the center of axle and utilizes graduation apparatus etc. to measure move distance (that is maximum deflection value).
In perimeter surface polish brush 12 of the present invention; The bending value that is applied in the situation of axle 14 in the load of 19.6N is preferably 420 μ m or littler; More preferably being 400 μ m or littler, even more preferably being 300 μ m or littler, particularly preferably is 250 μ m or littler.Bending value is 420 μ m or littler perimeter surface polish brush when using wherein load as 19.6N to be applied to axle 14, and axle can bending and glass-based sheetpile thereby can be polished equably when interior perimeter surface is polished.Particularly, the polishing in same glass-based sheetpile batch changes can be controlled to 7 μ m or littler, thereby the even and stable polishing of all chamfered parts and interior all side surfaces in can realizing.At this moment, the radius r of the bottom of the Young's modulus E of axle, axle and the length L of axle are specifically unrestricted, as long as the bending value δ of axle satisfies all aforementioned condition based on formula (1).
The method that brush silk 13 is implanted on the perimeter surface polish brush 12 is specifically unrestricted, and for example as shown in Figure 3, the passage component 15 of being implanted brush silk 13 is wrapped on the axle 14, and is fixing subsequently.In another method, brush silk 13 directly is implanted in the spill recess that is formed on the axle 14.Implanted the passage component 15 that brush silk 13 is arranged and be wrapped on the axle 14 subsequently that fixed method is preferred, because when design perimeter surface polish brush 12, there is very big flexibility.
In addition; In axle 14, preferably, the thread-placing part of being implanted brush thread divides 18 length 16 (hereinafter; Be called " planting filament length degree 16 " (referring to Fig. 3)) be designed to total length greater than glass-based sheetpile 11, because interior perimeter surface can be polished equably and can be guaranteed enough polishing speeds.
In addition; Divide in 18 at thread-placing part; The length 16A that plants the regional 18A of silk and the length 16A (planting filament length degree 16) that plants the regional 18A of silk are preferably 25% to 95% with the ratio (mentioning to planting the regional area ratio of silk) of the summation of the non-length 16B that plants the regional 18B of silk; More preferably be 30% to 90%, even more preferably be 30% to 85%.When the area ratio of planting the silk zone was lower than 25%, polishing speed possibly be lowered.On the other hand; When the area ratio of planting the silk zone is higher than 95%; When the perimeter surface polish brush was pressed on the glass-based sheetpile forcefully, the repulsive force that is caused by the glass that piles up increased, and the axle 14 of perimeter surface polish brush 12 is bent and interior all chamfered parts thereby can not be by polishing fully.
In addition, a measuring method of planting the area ratio in silk zone is, for example the unit length through measuring axle on axial direction (for example, is planted the length of the regional 18A of silk in 100mm) and by measured value reference area ratio.And, when using passage component 15,, plant the width in silk zone, the pitch width of passage component 15 etc. in the passage component 15 not by special restriction as long as the area ratio that thread-placing part divides is 25% to 95%.
Comprise that the external diameter 20 of the perimeter surface polish brush 12 of axle, brush silk and passage component can be greater than or less than the diameter of the circular port of the polished glass substrate of wherein interior perimeter surface.When the external diameter 20 of perimeter surface polish brush 12 during, need to move the interior perimeter surface of perimeter surface polish brush 12 up to its contact glass substrate less than the diameter of the circular port of glass substrate.In addition, axle 14 diameter preferably circular port diameter 30% to 60%.When the diameter of axle 14 less than 30% the time, be difficult to reduce the bending value of axle 14, and retrained the brush design, for example the length of brush silk needs longer.On the other hand, the diameter of axle 14 is greater than 60%, because the space between the edge surface of glass substrate and the axle 14 is narrow, so be difficult to supply polishing slurries.As a result of, possibly do not polished equably by whole glass-based sheetpile 11, and retrained the brush design, for example the length of brush silk need be shorter.
When the length of brush silk 21 is oversize, interior perimeter surface that the brush silk can not be through suitable pressure contact glass substrate and polishing speed thereby possibly worsen.On the other hand, when the length of brush silk too in short-term, the brush silk can not accurately move to inboard and interior all chamfered parts of interior all chamfered parts of glass substrate can not be by polishing fully.For this reason, importantly, suitably select the brush silk according to the material of the height 17 of the diameter of the circular port of the external diameter 20 of the diameter of axle, perimeter surface polish brush 12, glass substrate, passage component and following brush silk and linear diameter etc.
The material that is used to brush silk is suitably selected from routine brush silk by those skilled in the art, and said conventional brush silk comprises: chemical synthetic fiber, such as nylon fiber, polypropylene fibre, vinyl chloride fibers, poly fiber; Animal is such as the hair of pig or horse; Wire is like piano wire or stainless steel fibre; Carbon fiber etc.
As stated, the diameter of brush silk depends on the length of brush silk etc., and is preferably 0.1mm to 0.3mm usually.When the diameter of brush silk is lower than 0.1mm, interior perimeter surface that the brush silk can not be through suitable pressure contact glass substrate and polishing speed thereby possibly worsen.In addition, the temporary transient variation of brush silk possibly increase.On the other hand, when the diameter of brush silk during greater than 0.3mm, the brush silk can not accurately move to interior all chamfered parts inboard of glass substrate and in some cases, interior all chamfered parts thereby can not be by polishing fully.
[polishing slurries]
It is specifically unrestricted to use perimeter surface polish brush of the present invention to polish employed polishing slurries.For example, polishing slurries can be dispersed in water or the water-miscible organic solvent through the abrasive with following example and obtain.Polishing slurries can randomly comprise dispersant, pH conditioning agent, viscosity modifier, chelating agent etc.
The abrasive that comprises in the polishing slurries is specifically unrestricted.For example, can use the polishing slurries that comprises such as the abrasive of rare earth oxide (such as cerium oxide, zirconia), aluminium oxide, magnesia, silica, carborundum, manganese oxide, iron oxide, diamond, boron nitride and zircon etc.In above-mentioned abrasive, preferably use the abrasive that comprises cerium oxide, zirconia, aluminium oxide and zircon.These abrasives can use separately or use with the combination of two kinds or more kinds of types.
The average particulate diameter of abrasive (D50) is concrete unrestricted and be generally 0.5 μ m to 5 μ m, is preferably 0.5 μ m to 2 μ m, more preferably is 0.7 μ m to 1.5 μ m.
[producing the method for magnetic recording medium] with glass substrate
Hereinafter, with describing the method for production magnetic recording medium according to the present invention with glass substrate.
Production magnetic recording medium of the present invention is specifically unrestricted with the method for glass substrate, as long as use the perimeter surface polish brush to polish interior perimeter surface.
For example, magnetic recording medium is produced through following method with glass substrate, and said method comprises:
(1) be processed into glass sheet therein that heart place has the disc-like shape of circular port, internal afterwards all side surfaces and outer circumferential side surface chamfering be with preparation glass substrate (forming step),
(2) outer surface of polished glass substrate (outer surface polishing step),
(3) interior all side surfaces and the interior all chamfered parts to the interior perimeter surface of glass substrate polishes (interior perimeter surface polishing step),
(4) two of the polished glass substrate (upper and lower) first type surfaces (first type surface polishing step),
(5) cleaning glass substrate accurately, dry afterwards to obtain magnetic recording medium with glass substrate (cleaning).
The invention is not restricted to this method, but the interior perimeter surface of the perimeter surface polish brush polished glass substrate of (3) the application of the invention is carried out interior perimeter surface polishing step.
(2) the outer surface polishing step can be regardless of sequentially carrying out with (3) interior perimeter surface polishing step.And; At least one stood first type surface in (2) and (3) perimeter surface polishing step grinds (grinding and fixedly abrasive grinding such as free abrasive), and glass substrate can clean (cleaning between the step) or glass substrate between each step surface can be etched (etching between step).And in the wide in range meaning of term, the grinding of the first type surface that here uses refers to the wide in range polishing of first type surface.
Polishing step can be carried out through the combination of independent main polishing or main polishing and second polishing.After second polishing, can further carry out polishing for the third time.
In the present invention, the glass that constitutes glass substrate can be amorphous glass or glass ceramics, perhaps on superficial layer, has the reinforced glass (for example, chemical reinforced glass) of enhancement Layer.And; When magnetic recording medium needs high mechanical properties with glass substrate; The reinforcement step of formation enhancement Layer (for example on the superficial layer of glass substrate; Chemistry is strengthened step) can be before initial polishing step or after last polishing step, or during between each polishing step any one, carry out.And, according to the glass plate of glass substrate of the present invention can be through location free procedure, melting process, drawing process or compression molded process are come molded and the invention is not restricted to this again.
(2) embodiment of outer surface polishing step, (4) first type surface polishing step and (5) glass substrate cleaning will be described below and the invention is not restricted to this.
In (2) outer surface polishing step, the scratch on the outer circumferential side of glass substrate surface and the periphery chamfered part is removed and side surface is processed to minute surface.At this moment, for example, can use polish brush and the polishing slurries that comprises abrasive to carry out polishing.The abrasive that comprises in the polishing slurries is specifically unrestricted.For example, can use the polishing slurries that comprises such as the abrasive of cerium oxide, zirconic rare earth oxide, aluminium oxide, magnesia, silica, carborundum, manganese oxide, iron oxide, diamond, boron nitride and zircon etc.In above-mentioned abrasive, the preferred abrasive that comprises cerium oxide, zirconia, aluminium oxide and zircon that uses.These abrasives can use separately or use with the combination of two kinds or more kinds of types.
The average particulate diameter of abrasive (D50) is concrete unrestricted and be generally 0.5 μ m to 5 μ m, is preferably 0.5 μ m to 2 μ m, more preferably is 0.7 μ m to 1.5 μ m.After the outer circumferential mirror polish step, remove cerium oxide and glass substrate is used for step subsequently through cleaning.
In (4) first type surface polishing step, for example, twin polishing machine capable of using uses as the hard urethane pad of polishing tool and polishes top major surface and bottom major surface with the polishing slurries that comprises the cerium oxide abrasive material.And; For example, twin polishing machine capable of using uses as the hard urethane pad of polishing tool and polishes top major surface and bottom major surface (can use the cerium oxide abrasive material with average particulate diameter littler than top cerium oxide abrasive material) with the polishing slurries that comprises the cerium oxide abrasive material.In addition, utilize the twin polishing machine to use and come final polishing top major surface and bottom major surface with comprising as the polishing slurries component of having of main component about 20 to the silica gel of the average particulate diameter of about 30nm host grain diameter as the hard urethane pad of polishing tool.
In (5) cleaning; Make the glass substrate of final polishing stand to use the scrub clean of alkaline detergent subsequently; Use to invade the ultrasonic clean in the alkaline detergent solution, and use the ultrasonic clean of invading in the pure water, and under methanol vapor etc., carry out drying.
Be stacked on such as the layer of basic unit, magnetosphere, protective layer or lubricating layer the magnetic recording medium that obtains through this method with on the glass substrate to produce disk.Every layer etc. stacking method can suitably be selected from conventional method.The size of disk is concrete unrestricted and can produce various disks; Such as the disk (internal diameter 6mm, external diameter 21.6mm, thickness 0.381mm) of 0.85 inch type, disk (internal diameter 7mm, the external diameter 27.4mm of 1.0 inches types; Thickness 0.381mm), the disk of 1.8 inches types (internal diameter 12mm; External diameter 48mm, thickness 0.508mm), the disk (internal diameter 20mm, external diameter 65mm, thickness 0.635mm or 0.8mm) of 2.5 inches types.
Instance
[instance 1]
Hereinafter, the present invention describes reference example and comparative example in detail.The invention is not restricted to this instance.
In instance used herein and the comparative example in the polishing bending value of the employed perimeter surface polish brush of perimeter surface be value through the 10mm inboard at the two ends on the axial direction of axle being supported, on axial direction, utilized push-and-pull rule etc. the center of axle is applied the load of 19.6N and utilizing measurement move distance such as graduation apparatus to obtain.
In addition, the perimeter surface polish brush that uses of instance and comparative example has the channel height of 2.5mm, the brush filament length degree of 3.7mm, the brush silk thread property diameter of 0.2mm and 30% thread-placing part and divides area ratio.
And polishing slurries used herein is to comprise as the cerium oxide abrasive material of the average particulate diameter with 1.4 μ m of main component and the polishing slurries with proportion of 1.2.To describe the polishing program in detail below.
To form and comprise SiO through location free procedure as main component
2Glass substrate be processed into therein that heart place has the disc-like shape of circular port, use glass substrate as magnetic recording medium, it has the external diameter of 65mm, the internal diameter of 20mm and the thickness of 0.635mm.
Therein heart place have circular port interior all side surfaces and the outer circumferential side surface chamfering of dish type glass substrate to obtain using glass substrate as the magnetic recording medium with 0.15mm width and 45 ° of chamferings of final products.Use top major surface and the bottom major surface of alumina lap material (average particulate diameter 7 to 7.5 μ m) grinding glass substrate then and remove abrasive through cleaning.
Afterwards, utilize line-up jig to pile up glass substrate to form the glass-based sheetpile.In addition, insert the distance piece of the 0.2mm thickness that is formed from a resin between the adjacent glass substrate and pile up 200 glass substrates to form the glass-based sheetpile.
The glass-based sheetpile that is obtained is inserted anchor clamps fix, and line-up jig is separated from the glass-based sheetpile with perimeter surface in polishing and through on the above-below direction of glass-based sheetpile, being firmly fastened to the glass-based sheetpile.Perimeter surface polishing machine in the glass-based sheetpile is installed in (make ProductName by UTK System Co., Ltd: on polishing material retaining part BTK-08), and, the perimeter surface polish brush is inserted in the circular port of center of glass-based sheetpile.Perimeter surface polish brush used herein has: the Young's modulus of 206GPa; The shaft length of the perimeter surface polish brush of 375mm; The ratio of the circular port diameter of 50% shaft diameter and glass substrate; And the bending value that passes through 210 μ m of this method measurement.
The perimeter surface polish brush moves from the center of the circular port of glass-based sheetpile and the brush silk of scheduled volume is pushed the interior all side surfaces and interior all chamfered parts of glass-based sheetpile along direction.Aforementioned polishing slurries is fed to the interior perimeter surface of glass-based sheetpile, rotates polish brush and glass-based sheetpile in opposite direction, and carry out polishing when on the stacking direction of glass-based sheetpile, shaking the perimeter surface polish brush.
And; In instance and comparative example; Set 7 to 8L/min polishing slurries flow velocity, 2500rpm the polish brush speed of rotation, 39rpm the glass-based sheetpile speed of rotation and 100 to 1500mm/min shake speed, and to carry out polishing be 25 μ m (surfaces: 12.5 μ m) up to the removal quantitative change of interior all side surfaces.
In polishing after the perimeter surface, the anchor clamps releasing such glass substrate of perimeter surface is piled in be used to polish, and glass substrate is separated from the glass-based sheetpile one by one.The glass substrate that separates is used for assessment subsequently after removing the abrasive that exists on it through cleaning.
(instance 2)
With with instance 1 in identical mode carry out polishing, only used perimeter surface polish brush has: the Young's modulus of 199GPa; The shaft length of the perimeter surface polish brush of 375mm; The ratio of the diameter of 50% the shaft diameter and the circular port of glass substrate; And the bending value that passes through 220 μ m of this method measurement.
(instance 3)
With with instance 1 in identical mode carry out polishing, only used perimeter surface polish brush has: the Young's modulus of 199GPa; The shaft length of the perimeter surface polish brush of 230mm; The ratio of the diameter of 40% the shaft diameter and the circular port of glass substrate; And the bending value that passes through 120 μ m of this method measurement.
(instance 4)
With with instance 1 in identical mode carry out polishing, only used perimeter surface polish brush has: the Young's modulus of 199GPa; The shaft length of the perimeter surface polish brush of 230mm; The ratio of the diameter of 30% the shaft diameter and the circular port of glass substrate; And the bending value that passes through 390 μ m of this method measurement.
(comparative example 1)
With with instance 1 in identical mode carry out polishing, only used perimeter surface polish brush has: the Young's modulus of 101GPa; The shaft length of the perimeter surface polish brush of 375mm; The ratio of the diameter of 50% the shaft diameter and the circular port of glass substrate; And the bending value that passes through 430 μ m of this method measurement.
(comparative example 2)
With with instance 1 in identical mode carry out polishing, only used perimeter surface polish brush has: the Young's modulus of 69GPa; The shaft length of the perimeter surface polish brush of 375mm; The ratio of the diameter of 50% the shaft diameter and the circular port of glass substrate; And the bending value that passes through 640 μ m of this method measurement.
[assessment]
(difference of removal amount)
The glass substrate that obtains after glass substrate before the perimeter surface polishing and the perimeter surface polishing is cleaned and is dry, and said glass substrate is used to use high accuracy 2 dimension size meters (to be made ProductName by Keyence Co., Ltd: VM8040) measure the removal amount subsequently.Particularly, before the diameter of the circular port of the center of measuring glass substrate on interior all side surfaces and the perimeter surface polishing and the diameter difference of the circular port afterwards be used as the removal amount.
20 glass substrates of arbitrary extracting from 200 glass-based sheetpiles batch are measured its aforementioned removal amount and the difference between maximum and the minimum of a value are defined as the poor of removal amount in one batch.
(pit defect number)
The interior perimeter surface of the glass substrate after the acidic etching solution that use contains hydrofluoric acid and nitric acid will polish etches into the thickness of 5 μ m on depth direction.As a result, design observed damaged layer (cut) easily as pit defect.Then, cleaning and dry glass substrate.At last, glass substrate is cut to certain size, the sample that is used to observe the pit defect number of all side surfaces 8 and interior all chamfered parts 9 in the feasible pit defect of assessment easily number comprises with production.
Assess the pit defect number through using light microscope (producing BX60M, bright field differential interference contrast metallographic microscope by Olympus Corp) counting pit defect number.The surface of all side surfaces 8 or interior all chamfered parts 9 was parallel to the lens surface of the object lens of light microscope in each sample that will be used to observe was fixed on and makes on the sample stage.20 times of object lens that utilize light microscope are counted the circle with 10 μ m or larger diameter or the number of oblong pits defective under the visual field of 480 μ m * 328 μ m.And, calculate the value of cutting apart measured pit defect number through viewing area.
Glass substrate with 200 glass substrates batch is the upper, middle and lower by rough segmentation; And from the zone of each division, at random extract 3 glass substrates and it is measured, and the mean value that uses these values is as the pit defect number through preceding method.Usually, the value that is obtained is lower than 5/mm
2Finishing method be preferred, and the value that is obtained is not less than 5/mm
2Finishing method be not preferred.
Table 1
Perimeter surface polish brush of the present invention can be equably and stably interior all chamfered parts and interior all side surfaces of polished glass substrate, because it has 420 μ m or littler bending value under the imposed load of 19.6N.
Although describe the present invention in detail with reference to specific embodiment of the present invention, will be apparent that to those skilled in the art, under situation without departing from the spirit and scope of the present invention, can make variations and modifications therein.
By the way, the application incorporates into here based on Japanese patent application JP2011-119586 and the content submitted on May 27th, 2011 by reference.
And all document integral body of quoting are here incorporated into.
Claims (6)
1. a perimeter surface polish brush is used for magnetic recording medium is polished with the interior perimeter surface of glass substrate, has circular port in the center of said glass substrate,
Wherein said perimeter surface polish brush comprises axle, and on said axle, implanting has the brush silk, and when said axle was applied the load of 19.6N, said axle had 420 μ m or littler maximum deflection value.
2. perimeter surface polish brush according to claim 1, wherein said axle has 150GPa or bigger Young's modulus.
3. perimeter surface polish brush according to claim 1 and 2, wherein, in said axle, the thread-placing part branch of being implanted said brush silk comprises:
Plant the silk zone; And
The non-silk zone of planting,
The axial length that wherein said axle said planted the silk zone with following and ratio be 25% to 95%, said be said axle said axial length and the said non-axial length of planting the silk zone of planting the silk zone with.
4. method of producing magnetic recording medium with glass substrate, said method comprises:
Forming step forms the dish type glass substrate, all side surfaces, outer circumferential side surface and first type surface in said dish type glass substrate has, and have circular port in the center of said glass substrate;
In all chamfering steps, all chamfered parts in the cross-shaped portion office of all side surfaces and said first type surface forms in said glass substrate said;
Interior perimeter surface polishing step, to all side surfaces in said and said in all chamfered parts polish; And
The first type surface polishing step polishes the said first type surface of said glass substrate,
The perimeter surface polishing comprises in wherein said:
The polishing slurries that piles up a plurality of said glass substrates and will comprise abrasive be fed to all side surfaces in the glass substrate that piles up said and said in the step of all chamfered parts; And
When making perimeter surface polish brush rotation, make said perimeter surface polish brush with said in all side surfaces and said in the step that contacts of all chamfered parts; Wherein said perimeter surface polish brush has axle and the brush silk that is implanted on the said axle; And when said axle was applied the load of 19.6N, said axle had 420 μ m or littler maximum deflection value.
5. production magnetic recording medium according to claim 4 is with the method for glass substrate, the diameter of wherein said axle be said circular port diameter 30% to 60%.
6. according to claim 4 or the 5 described production magnetic recording mediums method with glass substrate, wherein said axle has 150GPa or bigger Young's modulus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510641690.3A CN105364688A (en) | 2011-05-27 | 2012-05-25 | Peripheral surface polishing brush and method of producing glass substrate used for magnetic recording medium |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-119586 | 2011-05-27 | ||
| JP2011119586A JP5327275B2 (en) | 2011-05-27 | 2011-05-27 | End polishing brush and method for manufacturing glass substrate for magnetic recording medium |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510641690.3A Division CN105364688A (en) | 2011-05-27 | 2012-05-25 | Peripheral surface polishing brush and method of producing glass substrate used for magnetic recording medium |
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| CN102794685A true CN102794685A (en) | 2012-11-28 |
| CN102794685B CN102794685B (en) | 2015-11-18 |
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| CN201510641690.3A Withdrawn CN105364688A (en) | 2011-05-27 | 2012-05-25 | Peripheral surface polishing brush and method of producing glass substrate used for magnetic recording medium |
| CN201210166594.4A Expired - Fee Related CN102794685B (en) | 2011-05-27 | 2012-05-25 | The method of perimeter surface polish brush and production magnetic recording medium glass substrate |
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| JP (1) | JP5327275B2 (en) |
| CN (2) | CN105364688A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105538184A (en) * | 2015-12-16 | 2016-05-04 | 蓝思科技（长沙）有限公司 | Glass polishing brush and polishing method and polishing device |
| CN105830156A (en) * | 2013-12-27 | 2016-08-03 | Hoya株式会社 | Magnetic disk-use substrate and magnetic disk |
| CN108290777A (en) * | 2016-03-02 | 2018-07-17 | 日本电气硝子株式会社 | Plate glass and its manufacturing method |
| CN112250313A (en) * | 2015-02-02 | 2021-01-22 | 康宁股份有限公司 | Method of strengthening edges of laminated glass articles and laminated glass articles formed thereby |
Families Citing this family (1)
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| CN115056151A (en) * | 2022-04-18 | 2022-09-16 | 安徽琼钰刷业有限公司 | Twill polishing roller brush and production process thereof |
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| JP2002046065A (en) * | 2000-08-07 | 2002-02-12 | Hoya Corp | Polishing apparatus and method and method of manufacturing glass substrate for magnetic storage medium and magnetic storage medium |
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- 2011-05-27 JP JP2011119586A patent/JP5327275B2/en not_active Expired - Fee Related
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- 2012-05-25 CN CN201510641690.3A patent/CN105364688A/en not_active Withdrawn
- 2012-05-25 CN CN201210166594.4A patent/CN102794685B/en not_active Expired - Fee Related
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| CN1348928A (en) * | 2000-10-18 | 2002-05-15 | 彭波 | Glass substrate for recorder and its manufacture |
| JP2006007350A (en) * | 2004-06-24 | 2006-01-12 | Akihiko Uzawa | Glass disk inner peripheral polishing device |
| CN1755801A (en) * | 2004-08-30 | 2006-04-05 | Hoya株式会社 | Method of producing a glass substrate for a magnetic disk, method of producing a magnetic disk, and a cylindrical glass material for a glass substrate |
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| CN105830156A (en) * | 2013-12-27 | 2016-08-03 | Hoya株式会社 | Magnetic disk-use substrate and magnetic disk |
| CN112250313A (en) * | 2015-02-02 | 2021-01-22 | 康宁股份有限公司 | Method of strengthening edges of laminated glass articles and laminated glass articles formed thereby |
| CN105538184A (en) * | 2015-12-16 | 2016-05-04 | 蓝思科技（长沙）有限公司 | Glass polishing brush and polishing method and polishing device |
| CN108290777A (en) * | 2016-03-02 | 2018-07-17 | 日本电气硝子株式会社 | Plate glass and its manufacturing method |
| CN108290777B (en) * | 2016-03-02 | 2022-08-02 | 日本电气硝子株式会社 | Plate-shaped glass and method for producing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012245588A (en) | 2012-12-13 |
| CN105364688A (en) | 2016-03-02 |
| JP5327275B2 (en) | 2013-10-30 |
| CN102794685B (en) | 2015-11-18 |
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