CN1348928A - Glass substrate for recorder and its manufacture - Google Patents

Glass substrate for recorder and its manufacture Download PDF

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Publication number
CN1348928A
CN1348928A CN 00116080 CN00116080A CN1348928A CN 1348928 A CN1348928 A CN 1348928A CN 00116080 CN00116080 CN 00116080 CN 00116080 A CN00116080 A CN 00116080A CN 1348928 A CN1348928 A CN 1348928A
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China
Prior art keywords
glass
glass substrate
substrate
less
dusts
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Pending
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CN 00116080
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Chinese (zh)
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彭波
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Individual
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Individual
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Priority to CN 00116080 priority Critical patent/CN1348928A/en
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

A mfg. method of lgass substrate for recording device is to select any non-alkali metal glass with Young's modulus higher than 60 GPa/cm2, specific gravity less than 2.8g/cm2 and glass softening point higher than 800 deg.C, and after the said glass is drawn into form by the existing floating or descent method production line and annealed, it is made into a glass sheet with 0.7-1.4 mm thick smooth surface (Ra less than 150 angstrom) and high-precision dimensions (thickness tolerance +0.1/-0), and after it is cut, its inner and outer radii are edged and bevelled, and it is short-time precision polished up to less than 5 angstrom, then the glass substrate for recording device is obtained. Its advantages include the existing production equipment being used, low investment and renovation cost, and reduced production cost.

Description

The recording unit manufacture method and the glass substrate thereof of glass substrate
The present invention is a kind of recording unit manufacture method and the glass substrate thereof with glass substrate, is to patent applied for " recording unit with the manufacture method and the glass substrate thereof of glass substrate " (number of patent application: replenishing 00114591.6).
In recent years, because the development of magnetic head and magnetic memory film technology, the recording density and the read or write speed of hard disc of computer are greatly improved, the performance of coiling base is also had higher requirement: in order to increase the recording density of unit surface, disk must increase the density of link and magnetic track, thereby must make magnetic head more approach card, the amount of floating that present magnetic head makes progress from card has reached 0.015 μ m, accomplishes that this point requires the surfaceness of disc below 5 dusts; The read or write speed height makes hard disk not have one of major reason on the verge of being replaced just, along with the information processing rate of the miscellaneous parts such as CPU of the quick growth of recording density and computer is more and more faster, the read or write speed of inevitable requirement hard disk is also improved accordingly, consequently require hard disk to have high memory density, or the rotating speed raising, make the increase that reads and writes data in the unit time.
Traditional hard disk dish base is an aluminium alloy, but because aluminium alloy is difficult to be ground to the following surfaceness of 5 dusts, present memory film all is the metallic membrane of vitreous state, the substrate of glass will be preferably, particularly the memory film of new development is wished that all higher film-forming temperature is arranged (be higher than 650 degree) is improved memory characteristic with this, but the ultimate temperature of aluminium alloy can only arrive about 360 degree.Simultaneously its physical strength of high-intensity glass also is better than aluminium alloy, and based on above reason, the trend that progressively replaced by chemically reinforced glass substrate and crystallite glass substrate has appearred in traditional aluminium alloy base plate in recent years.
But the tooling cost of chemically reinforced glass substrate and crystallite glass substrate is too expensive, and this contradiction still is not well solved.Though the hot properties of chemically reinforced glass substrate and crystallite glass substrate is better than aluminium alloy simultaneously, chemically reinforced glass substrate ultimate temperature can reach about 500 degree, the crystallite glass substrate ultimate temperature can reach about 600 degree, but film forming relatively ideal temperature still is on the low side.Chemically reinforced glass substrate and crystallite glass substrate all contain a large amount of basic metal in addition, and these light elements are very easy to be hit by plasma during the memory film film forming, pollute memory film, influence the problem of surfaceness simultaneously.
Though the patent applied for manufacture method and the glass substrate thereof of glass substrate " recording unit with " (number of patent application: 00114591.6) successful solution above-mentioned contradiction and problem, but in order to reach the described effect of patent, must be newly-built or reconstruct original production line, directly have influence on cost, price and the competitive power of product from cost keeping.
The object of the present invention is to provide manufacture method and the glass substrate thereof of a kind of recording unit with glass substrate, it can overcome the deficiency of above-mentioned prior art, utilize existing sheet glass production technology and production line production to have the physical strength height, the film forming recording unit glass substrate of energy high temperature, reduce huge facility investment and improvement expenses, thereby reduce production costs.
The present invention provides a solution to the problems referred to above.The present invention at first selects with young modulus greater than 60GPa/cm 2, proportion is less than 2.8g/cm 3, glass transformation temperature (Tg) is higher than the alkali metal-free glass of 800 degree.The advantage that existing physical strength is high can satisfy the film forming requirement of high temperature again.They are two years old, it also is core of the present invention, we adopt existing production general window glass, and the float glass process of panel for construction glass and descent method production line draw smooth-flat-surface (Ra is less than 150 dusts) that thickness is 0.7-1.4mm and the high precision size (sheets of glass of thickness deviation+0.1/-0).This sheets of glass is through the cutting rolling, and precise polished arriving less than behind 5 dusts of short period of time can be directly used in the memory film film forming, no longer needs traditional corase grind, and operations such as correct grinding can be utilized existing float glass process or descent method production line simultaneously, reduce cost greatly.Its three, can corresponding to different optical maser wavelength, when fusion cast glass, add transition metal in advance according to user's needs, be Fe with the weight percent 2O 31-3%, or CuO 1-3%, or Cr 2O 31-3%, or V 2O 51-3%, or thulium CeO 21-3% makes it can directly carry out the processing of laser reticulate pattern.Its four, alkali-free metal in the glass, P etc. are hit when plasma plating magnetic film easily, pollute memory film, influence the element of surfaceness simultaneously.
Recording unit of the present invention is to select for use any young modulus greater than 60GPa/cm with the manufacture method of glass substrate 2, proportion is less than 2.8g/cm 3Glass transition temperature is higher than the alkali metal-free glass of 800 degree, after existing float glass process or drawing moulding of descent method production line and annealing, make smooth-flat-surface that thickness is 0.7-1.4mm (Ra is less than 150 dusts) and the high precision size (sheets of glass of thickness deviation+0.1/-0), through cutting, interior external diameter rolling chamfering, the short period of time is precise polished to less than behind 5 dusts, can obtain the recording unit glass substrate.
The glass substrate of method manufacturing is characterized in that glass consists of: SiO as mentioned above 245-65%, Al 2O 36-25%, B 2O 31-15%, RO 15-28%, R are alkaline-earth metal and divalent metal.SiO wherein 2Be the generation body of glass, be less than 45%, the glass instability is difficult to found in this system more than 65% again.Al 2O 3Being the generation body of glass, also is the modification body of glass, can make glass more stable, and can improve the chemical stability of glass, is less than 6% DeGrain, is higher than 25%, and glass is difficult to found.B 2O 3With Al 2O 3Have similar purposes, can make glass be easier to found simultaneously.But B 2O 3Belong to light element, hit few as far as possible usefulness when reality is used when avoiding in the future becoming magnetic film.RO is the modification body of glass, adds in right amount, glass is founded easily, and made stabilization.Add and be less than 15%, effect is undesirable, is higher than 28% glass instability.
The glass substrate of method manufacturing is characterized in that: can mix As in addition as mentioned above 2O 3+ Sb 2O 30.1-1%.Be used for helping clarification, eliminate bubble in the glass.But because of As 2O 3, Sb 2O 3Belong to poisonous, while and B 2O 3Hit careful use in the actual production when equally becoming magnetic film easily.
The glass substrate made of method as mentioned above is characterized in that: when glass smelting, also can be mixed with following any one or multiple transition metal: Fe 2O 31-3%, CuO 1-3%, Cr 2O 31-3%, V 2O 51-3%, thulium CeO 21-3%.But make glass substrate have the characteristic of laser reticulate pattern processing.Above-mentioned transition metal and thulium are less than 1%, and effect is bad, if too many, influence other characteristics of glass.
The present invention compared with prior art, has following effect: the advantage of existing existing glass substrate and advantage, simultaneously owing to do not need traditional corase grind, operations such as correct grinding, can utilize existing float glass process or descent method production line again, for the factory that has existed, can reduce cost greatly, overcome the high shortcoming of existing glass substrate cost.Manufacturing is more prone to.
The present invention and existing substrate process compare:
Existing substrate process:
Aluminium alloy base plate, moulding, rolling, polishing is polished to less than 5 dusts again, and transition metal films is promptly plated in surface treatment, and transition metal films is gone in the processing of laser reticulate pattern, and substrate is finished, and can plate magnetic film on this substrate.
The chemically reinforced glass substrate (HOYA, Bao Gu): after the 1450C fusing, moulding, rolling, polishing, chemical enhanced, be polished to less than 10 dusts, transition metal films is promptly plated in surface treatment again, the processing of laser reticulate pattern is gone transition metal films, surface treatment, the anti-K of i.e. plating, N etc. overflow, and substrate is finished, and can plate magnetic film on this substrate.
After crystallite glass substrate (OHARA, little former): the 1480C fusing, moulding, thermal treatment, the punching rolling, polishing (greater than 10 dusts), special stubborn again light (less than 10 dusts), substrate is finished, and can plate magnetic film on this base is analysed.This technology can not be processed by the laser reticulate pattern, and when having the plating magnetic film simultaneously, light element overflows the pollution magnetic film.
Technology of the present invention: with glass melting, floating send out a moulding or a decline moulding with existing float glass process or descent method production line, rolling, the short period of time is precise polished to less than 5 dusts, the processing of laser reticulate pattern, substrate is finished, and can plate magnetic film on this substrate.
As seen technology of the present invention is simple by top, and process is few, and cost is low.When large-scale trial-production, can reduce cost and surpass 50%.
In order to set forth the effect of this invention better, it is as follows that we enumerate embodiment:
Embodiment 1
The composition of glass is expressed as with weight percent: SiO 259.5 Al 2O 315.5 B 2O 35.5 BaO 18.5MgO 0.5.Behind high temperature melting, the decline moulding pulls into the smooth-flat-surface of millimeter (wide) * 0.7,500 millimeters (length) * 100 millimeter (thick) and the sheets of glass of high precision size.Thickness deviation+the 0.08mm of this plate, surfaceness 85 dusts.Young modulus 68GPa/cm 2, proportion 2.58g/cm 3, glass transition temperature 920 degree.This plate is through the cutting rolling, and the short period of time is precise polished to 4 dusts, has both become the substrate of memory storage, can plate various memory films such as magnetic film on this substrate.
Embodiment 2
The composition of glass is expressed as with weight percent: SiO 252.3 Al 2O 321.8 B 2O 32.2 BaO 1.9MgO 7.2 CaO 7.2.Behind high temperature melting, the decline moulding pulls into the smooth-flat-surface of 500 millimeters (length) * 100 millimeter (wide) X1.0 millimeter (thick) and the sheets of glass of high precision size.Thickness deviation+the 0.07mm of this plate, surfaceness 65 dusts.Young modulus 70GPa/cm 2, proportion 2.56g/cm 3, glass transition temperature 950 degree.This plate is through the cutting rolling, and the short period of time is precise polished behind 3.5 dusts, has both become the substrate of memory storage, can plate various memory films such as magnetic film on this substrate.
Embodiment 3
The composition of glass is expressed as with weight percent: SiO 249.1 Al 2O 39.9 B 2O 315.1 BaO 25.1As 2O 30.8.Behind high temperature melting, the decline moulding pulls into the smooth-flat-surface of millimeter (wide) * 1.0,500 millimeters (length) * 100 millimeter (thick) and the sheets of glass of high precision size.Thickness deviation+the 0.05mm of this plate, surfaceness 35 dusts.Young modulus 67GPa/cm 2, proportion 2.76g/cm 3, glass transition temperature 850 degree.This plate is through the cutting rolling, and the short period of time is precise polished behind 3 dusts, has both become the substrate of memory storage, can plate various memory films such as magnetic film on this substrate.
Embodiment 4
The composition of glass is expressed as with weight percent: SiO 256.1 Al 2O 315.1 B 2O 31.7 BaO 27.1.Behind high temperature melting, the decline moulding pulls into the smooth-flat-surface of millimeter (wide) * 1.3,500 millimeters (length) * 100 millimeter (thick) and the sheets of glass of high precision size.Thickness deviation+the 0.05mm of this plate, surfaceness 48 dusts.Young modulus 68GPa/cm 2, proportion 2.78g/cm 3, glass transition temperature 910 degree.This plate is through the cutting rolling, and the short period of time is precise polished behind 3 dusts, has both become the substrate of memory storage, can plate various memory films such as magnetic film on this substrate.
Embodiment 5
The composition of glass is expressed as with weight percent: SiO 254.4 Al 2O 314.6 B 2O 31.7 BaO 26.3CeO 23.Behind high temperature melting, the decline moulding pulls into the smooth-flat-surface of millimeter (wide) * 1.3,500 millimeters (length) * 100 millimeter (thick) and the sheets of glass of high precision size.Thickness deviation+the 0.05mm of this plate, surfaceness 55 dusts.Young modulus 68GPa/cm 2, proportion 2.79g/cm 3, glass transition temperature 910 degree.This plate is through the cutting rolling, and the short period of time is precise polished behind 4 dusts, and the laser reticulate pattern is processed, and has both become the substrate of memory storage, can plate various memory films such as magnetic film on this substrate.
Embodiment 6
The composition of glass is expressed as with weight percent: SiO 254.4 Al 2O 314.6 B 2O 31.7 BaO 26.3Fe 2O 32 V 2O 51.Behind high temperature melting, the decline moulding pulls into the smooth-flat-surface of millimeter (wide) * 1.0,500 millimeters (length) * 100 millimeter (thick) and the sheets of glass of high precision size.Thickness deviation+the 0.06mm of this plate, surfaceness 46 dusts.Young modulus 68GPa/cm 2, proportion 2.79g/cm 3, glass transition temperature 910 degree.This plate is through the cutting rolling, and the short period of time is precise polished behind 4 dusts, and the laser reticulate pattern is processed, and has both become the substrate of memory storage, can plate various memory films such as magnetic film on this substrate.
Embodiment 7
The composition of glass is expressed as with weight percent: SiO 254.4 Al 2O 314.6 B 2O 31.7 BaO 26.3Cr 2O 33.Behind high temperature melting, the float glass process moulding pulls into the smooth-flat-surface of millimeter (wide) * 1.0,500 millimeters (length) * 100 millimeter (thick) and the sheets of glass of high precision size.Thickness deviation+the 0.04mm of this plate, surfaceness 18 dusts.Young modulus 68GPa/cm 2, proportion 2.79g/cm 3, glass transition temperature 910 degree.This plate is precise polished behind 3 dusts through the cutting rolling short period of time, and the laser reticulate pattern is processed, and has both become the substrate of memory storage, can plate various memory films such as magnetic film on this substrate.

Claims (4)

1, recording unit is characterized in that selecting for use any young modulus greater than 60GPa/cm with the manufacture method of glass substrate 2, proportion is less than 2.8g/cm 3Glass transition temperature is higher than the alkali metal-free glass of 800 degree, after float glass process or descent method drawing moulding and annealing, make smooth-flat-surface that thickness is 0.7-1.4mm (Ra is less than 150 dusts) and the high precision size (sheets of glass of thickness deviation+0.1/-0), through cutting, after the interior external diameter rolling chamfering, directly carry out precise polishedly, can obtain the recording unit glass substrate.
2, the glass substrate made of manufacture method according to claim 1 is characterized in that its glass consists of: SiO 245-65%, Al 2O 36-25%, B 2O 31-15%, RO 15-28%, R are alkaline-earth metal and divalent metal.
3, the glass substrate of making as manufacture method as described in the claim 2 is characterized in that: can mix As in addition 2O 3+ Sb 2O 30.1-1%.
4, glass substrate as claimed in claim 3 is characterized in that also can being mixed with following any one or multiple transition metal: Fe 2O 31-3%, CuO 1-3%, Cr 2O 31-3%, V 2O 51-3%, thulium CeO 21-3%.
CN 00116080 2000-10-18 2000-10-18 Glass substrate for recorder and its manufacture Pending CN1348928A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 00116080 CN1348928A (en) 2000-10-18 2000-10-18 Glass substrate for recorder and its manufacture

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Application Number Priority Date Filing Date Title
CN 00116080 CN1348928A (en) 2000-10-18 2000-10-18 Glass substrate for recorder and its manufacture

Publications (1)

Publication Number Publication Date
CN1348928A true CN1348928A (en) 2002-05-15

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CN 00116080 Pending CN1348928A (en) 2000-10-18 2000-10-18 Glass substrate for recorder and its manufacture

Country Status (1)

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CN (1) CN1348928A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102794685A (en) * 2011-05-27 2012-11-28 旭硝子株式会社 Peripheral surface polishing brush and method of producing glass substrate used for magnetic recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102794685A (en) * 2011-05-27 2012-11-28 旭硝子株式会社 Peripheral surface polishing brush and method of producing glass substrate used for magnetic recording medium
CN102794685B (en) * 2011-05-27 2015-11-18 旭硝子株式会社 The method of perimeter surface polish brush and production magnetic recording medium glass substrate

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