CN102778708A - Optical-band wave absorber - Google Patents
Optical-band wave absorber Download PDFInfo
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- CN102778708A CN102778708A CN201210259930XA CN201210259930A CN102778708A CN 102778708 A CN102778708 A CN 102778708A CN 201210259930X A CN201210259930X A CN 201210259930XA CN 201210259930 A CN201210259930 A CN 201210259930A CN 102778708 A CN102778708 A CN 102778708A
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Abstract
The invention discloses an optical-band wave absorber belonging to an optical device and aims to provide the optical-band wave absorber which has wave absorbing characteristics irrelevant to polarization in wide band on the wave band from visible light to near infrared wave and has the following characteristics of small device size, compact structure and easiness for integration. N evenly distributed metal grid units are deposited on a quartz glass base plate, wherein each metal grid unit is composed of three metal helical lines which have the same helical chirality and circular vertical projection; each metal grid unit is arranged like a square; and the helical chirality of each metal grid unit is inverse to the helical chirality of four metal grid units close to the upper side, the lower side, the left side and the right side of the metal grid unit. The optical-band wave absorber has the characteristics of small device size, compact structure and easiness for integration, is capable of overlapping the wideband wave absorbing from the visible light to the near infrared wave, has the wave absorbing characteristics irrelevant to polarization, and is suitable for the fields such as thermal radiation detection, solar energy use, light decay, stealth material, and the like.
Description
Technical field
The invention belongs to optical device, particularly a kind of optical band is inhaled the ripple device.
Background technology
Absorbing material relates to a kind of material of optics and microwave regime, and it has obtained the application that attracts people's attention in fields such as electromagnetic screen, detection and stealth materials.Traditional absorbing material mainly comprises following several kinds: ferrite, metal fine powder, barium titanate, silit, graphite and conductive fiber etc.Traditional absorbing material is being absorbed as main target by force, but there are characteristics such as absorption band is narrow, density is big usually in they.Novel wave-absorbing material comprises nano material, polycrystalline iron fiber, " hand is levied " material etc.; Target is to satisfy " thin, wide, light, strong " this several characteristics; Promptly (1) makes the electromagnetic wave that incides material internal thin that thickness is absorbed by quick loss as far as possible in working band; (2) in enough wide frequency band range, realize microwave absorbing property preferably; (3) require the absorbing material surface density little, in light weight; (4) higher mechanical property and good environmental suitability and physicochemical property are arranged.
The research of novel wave-absorbing material is at first proposed by the people such as researchist N.I.Landy of boston, u.s.a institute the earliest; See N.I.Landy, etc. " Perfect metamaterial absorber, " Physical review letter; 100,207402 (2008).The face type double-decker that they utilize split ring resonator (SRR) and otch metal wire (Cut wire) to be constituted has been realized 88% wave absorbing efficiency at 11.5GHz.But the working frequency range of this absorbing material is narrower, and can only absorb along the linear polarization electromagnetic wave (promptly having polarization correlated) of a certain direction vibration.Subsequently, many researchists have proposed more face type double-decker, have realized linear polarization independence, many absorption peaks and have satisfied performances such as wide incident angle.The current novel wave-absorbing material that proposes, it is inhaled wave effect and mainly depends on the EMR electromagnetic resonance between two-layer up and down, thereby working band is extremely narrow, has limited their application in fields such as heat radiation detection, sun power utilization and stealth materials greatly.Secondly, their polarization irrelevant characteristic is applicable to the linear polarization electromagnetic wave, and does not report to some extent as yet for the electromagnetic absorbing material of circular polarization, and the latter has widespread use in fields such as communication, sensing and military detectings.In addition, these researchs mainly concentrate on microwave, and titanium hertz and far infrared frequency range rarely have report and work in visible light with the novel wave-absorbing material that advances infrared frequency range.
Summary of the invention
The present invention proposes a kind of optical band and inhales the ripple device, and purpose is the microwave absorbing property that has wideband and polarization irrelevant at visible light～near-infrared band, and device size is little, compact conformation, be easy to integrated.
A kind of optical band of the present invention is inhaled the ripple device, on quartz glass substrate, deposits N equally distributed wire grating unit, and the material of wire grating unit is an aluminium, N>=10
6It is characterized in that:
Each wire grating unit constitutes by three identical wire spirals of diameter; The metal spiral linear diameter is 20～40 nanometers; The spiral chirality of three wire spirals is identical, and the vertical projection of wire spiral is circular, and round diameter is 100～200 nanometers; The number of active coils of wire spiral is 2～5, and pitch is 100～300 nanometers;
Each wire grating unit is square arrangement, and the wire spiral spiral chirality of four wire grating unit that the wire spiral spiral chirality of each wire grating unit is adjacent up and down with it is opposite, and each wire grating unit interval is 170～210 nanometers.
Said optical band is inhaled the preparation method of ripple device, comprises the steps:
(1). at quartz glass substrate surface deposition conducting film;
(2). spin coating photoresist on conducting film;
(3). through deep ultraviolet phase dry etching, in photoresist, form tens nanometer scale N equally distributed round spiral air-gaps, N>=10
6Each round spiral air-gap constitutes by three identical spiral of air cracks of diameter; Spiral of air crack diameter is 20～40 nanometers; The spiral chirality in three spiral of air cracks is identical, and the vertical projection in spiral of air crack is circular, and round diameter is 100～200 nanometers; The number of active coils in spiral of air crack is 2～5, and pitch is 100～300 nanometers;
Each round spiral air-gap is square arrangement; The spiral of air crack spiral chirality of four round spiral air-gaps that the spiral of air crack spiral chirality of each round spiral air-gap is adjacent up and down with it is opposite, and each round spiral air-gap spacing is 170～210 nanometers;
(4). through electrochemical deposition, plated metal aluminum in N equally distributed round spiral air-gap forms the wire grating unit that is made up of three identical wire spirals of diameter;
(5). remove the photoresist between the wire grating unit.
In the preparation process, step (3) and step (4) are two important steps.The structure that forms tens nano-scale linewidths acquires a certain degree of difficulty for general photoetching, and the method for the U.S. one research group successful application deep ultraviolet phase dry etching in 2007 has obtained on a large scale live width and seen J.J.Wang less than the wire grating structure of 40 nanometers; F.Walters, X.M.Liu, P.Sciortino; And X.G.Deng; " High-performance, large area, deep ultraviolet to infrared polarizers based on 40nm line/78 nm space nanowire grids; " Appl.Phys.Lett.90,61104 (2007); This is that the enforcement of step (3) provides foundation.In addition; Method deposit metallic material in helical structure of utilization electrochemical deposition also is fully feasible, sees Justyna K.Gansel, etc. " Circular Polarizer Gold Helix Photonic Metamaterial as Broadband; " Science 325,1513 (2009).
Device size of the present invention is little, compact conformation, be easy to integrated; Constitute elementary cell-wire grating unit of inhaling the ripple original paper by the body three-dimensional structure; Through the parameter of adjustment and optimization wire grating unit, as: wire grating diameter, number of active coils etc., it is 90.3% that the present invention on average inhales the ripple rate at 0.37 μ m～1.7 μ m operating wavelength ranges; Has 97.8% absorption peak at 0.5 mum wavelength place; Compare with the suction ripple device in the background technology part documents, the present invention can cover the wideband of visible light and near infrared frequency range and inhale ripple, has remedied the narrow defective of face type double-decker working band; Realize having the microwave absorbing property of polarization independence, be applicable to fields such as heat radiation detection, sun power utilization, optical attenuation and stealth material.
Description of drawings
Fig. 1 (a) is a structural representation of the present invention;
Fig. 1 (b) is a vertical view of the present invention;
Fig. 1 (c) is a side view of the present invention;
Fig. 2 is the optical indicatrix of embodiment 1;
Fig. 3 is the optical indicatrix of embodiment 2;
Fig. 4 is the optical indicatrix of embodiment 3;
Fig. 5 is the optical indicatrix of embodiment 4;
Fig. 6 is the optical indicatrix of embodiment 5;
Fig. 7 (a)～Fig. 7 (e) is preparation method's process chart of the present invention.
Embodiment
Shown in Fig. 1 (a), Fig. 1 (b), Fig. 1 (c), the present invention deposits N equally distributed wire grating unit 2 on quartz glass substrate 1, and the material of wire grating unit is an aluminium, N>=10
6Each wire grating unit constitutes by three identical wire spirals of diameter; Metal spiral linear diameter DW is 20～40 nanometers; The spiral chirality of three wire spirals is identical, and the vertical projection of wire spiral is circular, and round diameter DH is 100～200 nanometers; The number of active coils NP of wire spiral is 2～5, and pitch P is 100～300 nanometers;
Shown in Fig. 1 (b); Each wire grating unit is square arrangement; The wire spiral spiral chirality of four wire grating unit that the wire spiral spiral chirality of each wire grating unit is adjacent up and down with it is opposite; Among Fig. 1 (b), represent left hand helix chirality and right-handed helix chirality respectively with L and R, each wire grating unit interval SG is 170～210 nanometers.
Embodiment 1: deposit 10 on the quartz glass substrate
6Individual equally distributed spiral helicine wire grating unit; Metal spiral linear diameter DW is 20 nanometers; The vertical projection of wire spiral is circular, and round diameter DH is 100 nanometers, and the number of active coils NP of wire spiral equals 3; Pitch P is 300 nanometers; Each wire grating unit is square arrangement, and the wire spiral spiral chirality of four wire grating unit that the wire spiral spiral chirality of each wire grating unit is adjacent up and down with it is opposite, and each wire grating unit interval SG equals 170 nanometers.
Shown in Figure 2 is the optical indicatrix of embodiment 1, and the family curve of left-handed rotatory polarization and dextrorotation rotatory polarization is identical, so Fig. 2 only describes the family curve of left-handed rotatory polarization.Among the figure, the curve that the hollow rectangle frame is described is the circularly polarized light transmitance, and the curve that the hollow triangle frame is described is the circularly polarized light reflectivity, and the curve that the solid black frame is described is an absorptivity; Present embodiment operating wavelength range, average absorption rate, peak absorbance rate are respectively 0.37～1.70 micron, 90.3%, 97.8%.
Embodiment 2: deposit 10 on the quartz glass substrate
6Individual equally distributed spiral helicine wire grating unit; Metal spiral linear diameter DW is 20 nanometers; The vertical projection of wire spiral is circular, and round diameter DH is 100 nanometers, and the number of active coils NP of wire spiral equals 2; Pitch P is 100 nanometers; Each wire grating unit is square arrangement, and the wire spiral spiral chirality of four wire grating unit that the wire spiral spiral chirality of each wire grating unit is adjacent up and down with it is opposite, and each wire grating unit interval SG equals 170 nanometers.
Shown in Figure 3 is the optical indicatrix of embodiment 2, and the family curve of left-handed rotatory polarization and dextrorotation rotatory polarization is identical, so Fig. 3 only describes the family curve of left-handed rotatory polarization.Among the figure, the curve that the hollow rectangle frame is described is the circularly polarized light transmitance, and the curve that the hollow triangle frame is described is the circularly polarized light reflectivity, and the curve that the solid black frame is described is an absorptivity; Present embodiment operating wavelength range, average absorption rate, peak absorbance rate are respectively 0.31～0.72 micron, 83.4%, 90.8%.
Embodiment 3: deposit 5 * 10 on the quartz glass substrate
6Individual equally distributed spiral helicine wire grating unit; Metal spiral linear diameter DW is 20 nanometers; The vertical projection of wire spiral is circular, and round diameter DH is 200 nanometers, and the number of active coils NP of wire spiral equals 3; Pitch P is 300 nanometers; Each wire grating unit is square arrangement, and the wire spiral spiral chirality of four wire grating unit that the wire spiral spiral chirality of each wire grating unit is adjacent up and down with it is opposite, and each wire grating unit interval SG equals 210 nanometers.
Shown in Figure 4 is the optical indicatrix of embodiment 3, and the family curve of left-handed rotatory polarization and dextrorotation rotatory polarization is identical, so Fig. 4 only describes the family curve of left-handed rotatory polarization.Among the figure, the curve that the hollow rectangle frame is described is the circularly polarized light transmitance, and the curve that the hollow triangle frame is described is the circularly polarized light reflectivity, and the curve that the solid black frame is described is an absorptivity; Present embodiment operating wavelength range, average absorption rate, peak absorbance rate are respectively 0.53～1.70 micron, 91.5%, 98.3%.
Embodiment 4: deposit 10 on the quartz glass substrate
6Individual equally distributed spiral helicine wire grating unit; Metal spiral linear diameter DW is 40 nanometers; The vertical projection of wire spiral is circular, and round diameter DH is 100 nanometers, and the number of active coils NP of wire spiral equals 5; Pitch P is 300 nanometers; Each wire grating unit is square arrangement, and the wire spiral spiral chirality of four wire grating unit that the wire spiral spiral chirality of each wire grating unit is adjacent up and down with it is opposite, and each wire grating unit interval SG equals 170 nanometers.
Shown in Figure 5 is the optical indicatrix of embodiment 4, and the family curve of left-handed rotatory polarization and dextrorotation rotatory polarization is identical, so Fig. 5 only describes the family curve of left-handed rotatory polarization.Among the figure, the curve that the hollow rectangle frame is described is the circularly polarized light transmitance, and the curve that the hollow triangle frame is described is the circularly polarized light reflectivity, and the curve that the solid black frame is described is an absorptivity; Present embodiment operating wavelength range, average absorption rate, peak absorbance rate are respectively 0.59～1.18 micron, 90.1%, 95.1%.
Embodiment 5: deposit 10 on the quartz glass substrate
6Individual equally distributed spiral helicine wire grating unit; Metal spiral linear diameter DW is 20 nanometers; The vertical projection of wire spiral is circular, and round diameter DH is 100 nanometers, and the number of active coils NP of wire spiral equals 3; Pitch P is 300 nanometers; Each wire grating unit is square arrangement, and the wire spiral spiral chirality of four wire grating unit that the wire spiral spiral chirality of each wire grating unit is adjacent up and down with it is opposite, and each wire grating unit interval SG equals 210 nanometers.
Shown in Figure 6 is the optical indicatrix of embodiment 5, and the family curve of left-handed rotatory polarization and dextrorotation rotatory polarization is identical, so Fig. 6 only describes the family curve of left-handed rotatory polarization.Among the figure, the curve that the hollow rectangle frame is described is the circularly polarized light transmitance, and the curve that the hollow triangle frame is described is the circularly polarized light reflectivity, and the curve that the solid black frame is described is an absorptivity; Present embodiment operating wavelength range, average absorption rate, peak absorbance rate are respectively 0.41～1.35 micron, 84.7%, 99.7%.
Fig. 7 (a)～Fig. 7 (e) is depicted as preparation method's process chart of the present invention.
Fig. 7 (a): at quartz glass substrate surface deposition conducting film;
Fig. 7 (b): spin coating photoresist on conducting film;
Fig. 7 (c):, in photoresist, form tens nanometer scale N equally distributed round spiral air-gaps, N>=10 through deep ultraviolet phase dry etching
6Each round spiral air-gap constitutes by three identical spiral of air cracks of diameter; Spiral of air crack diameter is 20～40 nanometers; The spiral chirality in three spiral of air cracks is identical, and the vertical projection in spiral of air crack is circular, and round diameter is 100～200 nanometers; The number of active coils in spiral of air crack is 2～5, and pitch is 100～300 nanometers;
Each round spiral air-gap is square arrangement; The spiral of air crack spiral chirality of four round spiral air-gaps that the spiral of air crack spiral chirality of each round spiral air-gap is adjacent up and down with it is opposite, and each round spiral air-gap spacing is 170～210 nanometers;
Fig. 7 (d): through electrochemical deposition, plated metal aluminum in N equally distributed round spiral air-gap forms the wire grating unit that is made up of three identical wire spirals of diameter;
Fig. 7 (e): remove the photoresist between the wire grating unit, finally form optical band and inhale the ripple device.
Claims (1)
1. an optical band is inhaled the ripple device, on quartz glass substrate, deposits N equally distributed wire grating unit, and the material of wire grating unit is an aluminium, N>=10
6It is characterized in that:
Each wire grating unit constitutes by three identical wire spirals of diameter; The metal spiral linear diameter is 20～40 nanometers; The spiral chirality of three wire spirals is identical, and the vertical projection of wire spiral is circular, and round diameter is 100～200 nanometers; The number of active coils of wire spiral is 2～5, and pitch is 100～300 nanometers;
Each wire grating unit is square arrangement, and the wire spiral spiral chirality of four wire grating unit that the wire spiral spiral chirality of each wire grating unit is adjacent up and down with it is opposite, and each wire grating unit interval is 170～210 nanometers.
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| CN201210259930XA CN102778708A (en) | 2012-07-20 | 2012-07-20 | Optical-band wave absorber |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104765094A (en) * | 2015-04-24 | 2015-07-08 | 张家港康得新光电材料有限公司 | Polarization structure, preparing method thereof and display device comprising same |
| CN104865628A (en) * | 2015-06-02 | 2015-08-26 | 中国科学院上海技术物理研究所 | Spiral-like metal chiral metamaterial circular polarizer |
| CN107356999A (en) * | 2017-06-26 | 2017-11-17 | 陕西师范大学 | A kind of single layer nanometer structure for realizing long-wave band asymmetric transmission and preparation method thereof |
| WO2019198760A1 (en) * | 2018-04-12 | 2019-10-17 | 国立研究開発法人理化学研究所 | Light-absorbing element, light-absorbing body, and method for manufacturing light-absorbing element |
| CN111457236A (en) * | 2020-03-21 | 2020-07-28 | 复旦大学 | Full-thermal super surface presenting infrared thermal illusion and being invisible under visible light |
| CN112255715A (en) * | 2020-10-23 | 2021-01-22 | 江南大学 | Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device |
-
2012
- 2012-07-20 CN CN201210259930XA patent/CN102778708A/en active Pending
Non-Patent Citations (6)
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| A.H.GEVORGYAN: "photonic band gaps from a stack of right-and left-hand chiral photonic cryatal layers", 《PHYSICAL REVIEW E》 * |
| ANDRE RADKE: "three-dimensional bichiral plasmonic crystals fabricated by direct laser writing and electroless silver plating", 《ADVANCED MATERIALS》 * |
| JUSTYNA K.GANSEL: "gold helix photonic metamaterials:a numerical parameter study", 《OPTICAL EXPRESS》 * |
| JUSTYNA K: "gold helix photonic metamaterial as broadband circular polarizer", 《SCIENCE》 * |
| Z.Y.YANG: "a numerical study on helix nanowire metamaterials as optical circular polarizers in the visble region", 《IEEE PHOTONICS TECHNOLOGY LETTERS》 * |
| ZHENYU YANG: "how to improve the signal-to-noise ratio for circular polarizers consisting of helical metamaterials?", 《OPTICS EXPRESS》 * |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104765094A (en) * | 2015-04-24 | 2015-07-08 | 张家港康得新光电材料有限公司 | Polarization structure, preparing method thereof and display device comprising same |
| CN104865628A (en) * | 2015-06-02 | 2015-08-26 | 中国科学院上海技术物理研究所 | Spiral-like metal chiral metamaterial circular polarizer |
| CN107356999A (en) * | 2017-06-26 | 2017-11-17 | 陕西师范大学 | A kind of single layer nanometer structure for realizing long-wave band asymmetric transmission and preparation method thereof |
| CN107356999B (en) * | 2017-06-26 | 2020-03-24 | 陕西师范大学 | Single-layer nano structure for realizing long-wave band asymmetric transmission and preparation method thereof |
| WO2019198760A1 (en) * | 2018-04-12 | 2019-10-17 | 国立研究開発法人理化学研究所 | Light-absorbing element, light-absorbing body, and method for manufacturing light-absorbing element |
| JPWO2019198760A1 (en) * | 2018-04-12 | 2021-04-22 | 国立研究開発法人理化学研究所 | Light Absorber, Light Absorber, and Method for Manufacturing Light Absorber |
| JP7325122B2 (en) | 2018-04-12 | 2023-08-14 | 国立研究開発法人理化学研究所 | Light absorbing element, light absorber, and method for manufacturing light absorbing element |
| CN111457236A (en) * | 2020-03-21 | 2020-07-28 | 复旦大学 | Full-thermal super surface presenting infrared thermal illusion and being invisible under visible light |
| CN111457236B (en) * | 2020-03-21 | 2022-05-20 | 复旦大学 | Full-thermal super surface presenting infrared thermal illusion and being invisible under visible light |
| CN112255715A (en) * | 2020-10-23 | 2021-01-22 | 江南大学 | Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device |
| CN112255715B (en) * | 2020-10-23 | 2021-12-03 | 江南大学 | Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device |
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