CN102757148B - System and method for processing waste gas and waste liquor in polysilicon production - Google Patents
System and method for processing waste gas and waste liquor in polysilicon production Download PDFInfo
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Abstract
The invention discloses a system and a method for processing waste gas and waste liquor in polysilicon production, wherein poisonous chlorosilane (containing SiHCl3, SiCl4 and SiH2Cl2) difficult to treat is processed through pyrohydrolysis to generate hydrogen chloride (HCl), silicon dioxide (SiO2) and a small quantity of Cl2 in a combustion furnace, and the hydrogen chloride (HCl), silicon dioxide (SiO2) and Cl2 have stable properties and are easy to treat. Hydrogen chloride is processed through repeated sprinkling absorption and circulating thickening and then is changed into hydrochloric acid, and then can be recovered. Silicon dioxide is processed through dust collecting and recovery by a filter. Incinerating gas is processed through temperature reduction of a waste heat boiler to generate heat quantity (low pressure steam) that can be provided to a vaporization concentration device (JVC), and the rest heat quantity can also be merged in a plant area main steam pipe network and then can be recovered. Therefore, chlorine, SiO2 and heat energy in the whole system can be recycled, so that certain economic benefits can be generated, the running cost of the system for processing waste gas and waste liquor is lowered, resource waste can also be reduced, and secondary pollution of pollutants can be avoided.
Description
Technical field
The present invention relates to the technical field that chlorine-containing silane to producing in polysilicon production process and a small amount of metallic chloride impurities waste gas, waste liquid are processed, reclaimed.A kind of system and innovative technology thereof of the waste gas producing in polysilicon production process and waste liquid being implemented to burn dry process, recovery specifically.
Background technology
High purity polycrystalline silicon is the important foundation starting material of Developing microelectronic industry and solar energy industry.Across multidisciplinary, multi-field new high-tech products such as chemical industry, metallurgy, machinery, electronics.
At present, along with the fast development of global microelectronic industry and photovoltaic industry, pulled by the powerful of photovoltaic industry, polysilicon market is domestic, and supply falls short of demand always.For this reason, recent year forms polysilicon heat, is permitted great polysilicon project and has started or be about to and start.According to incompletely statistics, China is building or is having more than 60 by the polysilicon enterprise building, production capacity reaches 100,000 tons, from 2005, underproduce hundred tons to 2010 domestic polycrystalline output of domestic polysilicon will reach 4.0 ten thousand tons of left and right, can say that development is at full speed.
Along with the develop rapidly of domestic polysilicon industry, the continuous expansion of scale, output, safety and the environmental issue of the waste gas of discharging in consequent polysilicon production process, waste liquid and by product become increasingly conspicuous.Due to the domestic core technology of grasping production of polysilicon not yet completely, consumption indicators, generally than external height, consumes liquid chlorine as example take every production 1kg polysilicon.External 0.4～0.6kg, domestic 1～1.5kg or higher, has increased the weight for the treatment of capacity and the difficulty of waste gas, waste liquid, more highlights the importance of the pollutent comprehensive regulation.
In production of polysilicon, the main component of waste gas, waste liquid is: the chlorosilanes such as trichlorosilane, silicon tetrachloride and dichloro-dihydro silicon.Also have a small amount of metallic impurity muriate and hydrogen, nitrogen, these undressed chlorosilanes are poisonous and harmful liquid or the gas with severe corrosive, very large to safety and environmental hazard.Therefore, safe, effective, the stable treatment process of chlorosilane waste gas and waste liquid has become one of bottleneck of being badly in need of in whole polysilicon industrial chain solution.
Current domestic polysilicon industry adopts following several method conventionally to the treatment process of chlorosilane waste gas, waste liquid:
Hydrolysising alkali absorption process: hydrolysis, alkali absorb method are by chlorosilane waste gas, the waste liquid of each operation discharge in raw polysilicon journey, all send into waste gas eluting column with pipeline respectively, by 10%NaOH solution continuous washing, go out the leacheate at the bottom of tower, after filtering, slag outward transport landfill, filtered liquid continues to process with being pumped into wastewater treatment operation, and residual air is through chimney qualified discharge.
Although hydrolysising alkali absorption process can be processed waste gas and waste liquid in polysilicon production process, poisonous chlorosilane can be converted into harmless material, but a large amount of waste water, waste residue are also produced simultaneously, especially quantity of alkali consumption is large, the easy slagging scorification of hydrolytic tank causes equipment normally not move, and environmental pollution is larger.
(2) by conventional milk of lime Ca (OH) 2 neutralization precipitation methods because the solubleness of calcium chloride in water is high, chlorion is still present in water, process after water be brackish water, this brackish water can not discharge, and causes treatment effect bad.
Because the amount of feeding lime is large, on-the-spot very large floor space stacking lime and the dissolving lime of needing, make waste gas, liquid waste disposal need occupy larger place, and execute-in-place environment is very poor.
(3) add reverse osmosis method with neutralization precipitation, although effect is pretty good, in the last concentrated waste water producing, chlorine ion concentration is higher, is more difficult to process up to standard.
(4) neutralization precipitation adds evaporative crystallization method: although method is good, treatment capacity is large, investment, running cost Fei Taigao, energy consumption are also high, and general data is difficult to bear, and chlorine is not discharged and reclaims with the form of slag.
(5) burn wet treatment method: compared with above-mentioned all methods, this method has been introduced combustion technology.Poisonous unmanageable chlorosilane (SiHCl3, SiCl4, SiH2Cl2) is generated to the high-temperature flue gas of SiO2, HCI, CO2, H2O and a small amount of Cl2 in incinerator through pyrohydrolysis.Then water carries out chilling cooling, and after Venturi scrubbing, wet electrostatic precipitation etc. are processed, slag also will be processed respectively qualified discharge again with acid waste liquid.
There is advantage although burn wet processing technology compared with traditional hydrolysising alkali absorption techniques, have employing abroad, also have serious defect: it is the recovery function to material and waste heat not, causes wasting of resource.For example, the flue gas of chlorosilane after burning, the hydrogenchloride (HCl), the silicon-dioxide (SiO2) that contain higher concentration, and heat energy, recoverable completely, particle diameter is in micron, submicron rank, and aerosil (white carbon black) is widely used in the fields such as rubber, plastics, coating, ink paint, electronics, agricultural, medicine, food, makeup with performances such as its superior reinforcement, thickening, thixotroping, absorption, and economic benefit is very high; (HCl) is soluble in water for hydrogenchloride, can utilize water absorption method to recycle completely.Heat energy can be transformed into steam for production of polysilicon.
Above-mentioned these situations, are the present situations of comprehensive treating process chlorine-containing silane waste gas, waste liquid in domestic polysilicon industry, and it has seriously fettered the sound development of this industry.
Summary of the invention
The object of the present invention is to provide processing recovery system and the method thereof of waste gas and waste liquid in a kind of innovation, improved production of polysilicon, it can overcome in prior art processes not thorough to chlorosilane, resultant secondary pollution is serious, running cost is high, energy consumption is large, can not be to all deficiencies such as silicon-dioxide, hydrochloric acid, waste heat reclaim.
To achieve these goals, technical scheme of the present invention is: the treatment system of waste gas and waste liquid in production of polysilicon, it mainly comprises waste gas, waste liquid transport pipe, with smoke stack emission pipeline, it is characterized in that: between waste gas, waste liquid transport pipe and smoke stack emission pipeline, be provided with successively incinerator, waste heat boiler, strainer, HCl recovery device, soda-wash tower and steam separator, between above-mentioned each unit, be connected by flue, HCl recovery device is connected with a hydrochloric acid tank, soda-wash tower is connected with a brine tank, and brine tank is connected with an evaporation concentration device.
The treatment process of waste gas and waste liquid in production of polysilicon, is characterized in that: described treatment process comprises the steps: fully to burn after a, waste gas, waste liquid enter incinerator, obtains high-temperature flue gas; B, high-temperature flue gas enter waste heat boiler by flue lowers the temperature, and the flue gas after cooling enters strainer, and silicon-dioxide is separated from flue gas; C, remaining flue gas enter HCl recovery device, and spray column carries out reducing temperature twice to flue gas, and the flue gas after cooling enters enrichment tank and carries out enrichment absorption, and the hydrochloric acid of acquisition enters in hydrochloric acid tank; D, remaining flue gas are further removed remaining hydrogenchloride and chlorine in flue gas by the alkali lye drip washing of soda-wash tower, and the brine waste that alkali cleaning produces drains into brine tank, then make landfill disposal after evaporation concentration device is processed; The flue gas obtaining after e, alkali cleaning enters air water separator, finally by smoke stack emission discharge of pipes.
When use, the present invention is stable in properties, tractable hydrogenchloride (HCI), silicon-dioxide (SiO2) and a small amount of Cl2 by poisonous unmanageable chlorosilane (SiHCl3, SiCl4, SiH2Cl2) pyrohydrolysis in incinerator.Hydrogenchloride passes through spray-absorption repeatedly, after circulation enrichment, becomes hydrochloric acid, just can be reclaimed.Silicon-dioxide is by the strainer recovery of gathering dust.The heat (low-pressure steam) that incineration flue gas produces through waste heat boiler cooling is except for evaporation concentration device (JVC), and remainder also can be incorporated to plant area's main steam pipe network and be reclaimed.The chlorine of whole system, SiO2, heat energy are all recycled like this, have not only produced certain economic benefit, have reduced the running cost of waste gas, liquid waste treatment system, have also reduced the wasting of resources, have avoided the secondary pollution of pollutent to turn.
Accompanying drawing explanation
Fig. 1 is that treatment system of the present invention connects block diagram.
Fig. 2 is the structural representation of HCl recovery device of the present invention.
Fig. 3 is the structural representation of incinerator of the present invention.
Embodiment
Below in conjunction with drawings and Examples, the invention will be further described.
The present invention mainly comprises waste gas, waste liquid transport pipe, with smoke stack emission pipeline, its difference with the prior art is: between waste gas, waste liquid transport pipe and smoke stack emission pipeline, be provided with successively incinerator, waste heat boiler, strainer, HCl recovery device, soda-wash tower and steam separator, between above-mentioned each parts, be connected by flue, HCl recovery device is connected with a hydrochloric acid tank, soda-wash tower is connected with a brine tank, and brine tank is connected with an evaporation concentration device.
The principle of work of incinerator reacts and produces water vapour and produce high temperature simultaneously with airborne oxygen (will send into combustion air and cooling air when burning) in stove based on fuel hydrogen or Sweet natural gas (CH4), and concrete chemical reaction is as follows: 2H2+O2---2H2O and CH4+O2-2H2O+CO2.When the waste gas of chlorine-containing silane, waste liquid enters after incinerator, can there is high-temperature thermal oxidation hydrolysis reaction, take trichlorosilane (TCS) as example: 2SiHC3+4H2O-2SiO2+HCl+2H2, finally become and contain silicon-dioxide, hydrogenchloride, high-temperature flue gas with a small amount of chlorine, in order to guarantee to enter the waste gas in incinerator, waste liquid is complete, clear burning, key will be controlled incineration temperature (800 ℃-1000 ℃) well, 2-5 time second that flue gas stops in stove, air current composition and in stove mobile characteristic and burn safety, for guaranteeing safety, except being provided with the combustion managing system (BMS) of controlling with PLC, when incinerator work, it is micro-pressure operation.Here the combustion managing system (BMS) that the PLC of institute's art controls is prior art, has just repeated no more its principle of work here.
Strainer: employing has certain pore size, and (0.1～0.8 micron of) Bu Rust steel metal filtering core (inlet outlet pressure differential loss 2000～6000Pa) under certain operating pressure, flue gas is by filter core, the SiO in flue gas
2tackled and be adsorbed on cartridge surface by filter core, reach SiO
2the object separating from flue gas, flue gas enters next procedure by filter core, and it is one group that strainer adopts two, one works online, when reaching after the working hour (about 20 minutes) of setting, off-line carries out blowback with nitrogen to filter core, the SiO that blowback is got off
2collect in a container and enter Vacuum Packaging Machine, another strainer enters and works online.Because strainer is prior art, just no longer its concrete structure and principle of work are provided here.
HCl recovery device mainly comprises that spraying cooling and hydrochloric acid circulation enrichment absorb two processes, spraying cooling, because of the high HCl of the being unfavorable for enrichment recovery of temperature from strainer flue gas out, lower the temperature by spray column water, the hot water (containing a small amount of HCl) that cooling obtains recycles after interchanger cooling, and flue gas enters next procedure; In the time that HCl Enrichment is to finite concentration in cooling rear solution, entering HCl circulation enrichment absorbs.Hydrochloric acid circulation enrichment absorbs: be to utilize HCl principle soluble in water to adopt the form clear water on absorption tower to absorb the HCl in flue gas, reach and nitrogen, the object that carbonic acid gas etc. separate, HCl recovery device is by 4 circulation enrichment cell formations, each circulation enrichment unit is formed by connecting by 1 spray column and 1 enrichment tank, after being connected by circulation tube and shower between spray column and enrichment tank, form the loop of a circulation, between circulation enrichment unit and circulation enrichment unit, be connected by fume pipe, the HCl solution that reaches design concentration requirement is discharged from first circulation enrichment unit, enter hydrochloric acid tank.
Specifically, the core technology of HCl recovery device has 2 points, and the concrete technology that (1) makes hydrogenchloride be dissolved in water adopts by dense to light forward spraying process; (2) concrete technology that the solution that has made to absorb hydrogenchloride obtains enrichment adopts by light to dense reverse moisturizing method.
Forward spraying process is to implement like this (referring to Fig. 2): flue gas enters 1# spray column from smoke inlet pipe 1, the spray of the 1# enrichment tank condensed water being provided by 1# spray pump 4 is provided, solution absorption the water of hydrogenchloride enter 1# enrichment tank through 1# circulation tube 2, promoted and make circulated sprinkling by 1# spray pump 4 again; The flue gas of process spray, under the effect of induced draft fan 16, enters 2# spray column along 2# fume pipe 3.The spray water of 2# spray column, is promoted to 2# spray column by 2# spray pump 8 and makes circulated sprinkling to 2# enrichment tank through 2# circulation tube 6.Known by analysis, enter the flue gas of 2# spray column, owing to passing through the solution absorption of 1# spray column, the existing institute of hydrogen cloride concentration in flue gas declines, and the hydrogenchloride that the spray water of 2# spray column dissolves is lower than the spray water of 1# spray column again.So under the spray of 2# spray column, the hydrogenchloride in flue gas is further by spray water solution absorption.
Flue gas enters 3# spray column from 2# spray column along 3# fume pipe 7 and sprays, enters 4# spray column spray again from 3# spray column along 4# fume pipe 11.Because hydrogen cloride concentration in flue gas reduces step by step, so the hydrogen cloride concentration that spray water absorbs also reduces step by step, through level Four, circulation absorbs, and in flue gas, hydrogen chloride content is absorbed totally substantially.The flue gas that 4# spray column is drawn, finally enters after alkali washing process is processed and discharges.
Reverse moisturizing method is to implement like this: under the effect of 4 grades of spray thickening devices, spray water hydrogen cloride concentration in 1# enrichment tank is more and more higher, by analysis in the time that hydrogen cloride concentration reaches 30 ﹪, concentration of hydrochloric acid meter 23 in 1# concentration tank sends instruction, the hydrogenchloride (being hydrochloric acid) of opening hydrochloric acid output motorized valve 22,30 ﹪ enters hydrochloric acid tank storage.After hydrochloric acid reaches the liquid level of setting in storage tank, hydrochloric acid output motorized valve 22 cuts out automatically.
1# concentration tank is discharged after hydrochloric acid, and liquid level declines, and liquidometer 21 sends moisturizing instruction, opens 1# water compensating valve 5, and the spray water of 2# enrichment tank enters 1# enrichment tank.In tank, after water level rise, 1# liquidometer 21 sends instruction, and 1# water compensating valve is closed, and 2# water compensating valve 9 is opened, and the spray water of 3# enrichment tank enters 2# enrichment tank.In tank, after water level rise, 2# liquidometer 20 sends instruction, and 2# water compensating valve 9 is closed, and 3# water compensating valve 13 is opened, and in 4# enrichment tank, spray water enters 3# enrichment tank.In tank, after water level rise, 3# liquidometer 19 sends instruction, and 3# water compensating valve is closed, and 4# water compensating valve is opened, and clear water (normal temperature tap water) enters 4# enrichment tank.Water level rise in tank, 4# liquidometer 18 sends instruction, and 4# water compensating valve 17 is closed, and moisturizing operation finishes.During moisturizing, spray and circulation are carried out in the same old way.(label 10 in Fig. 2 represents 3# circulation tube, and label 12 represents 3# spray pump, and label 14 represents 4# circulation tube, and label 15 represents 4# spray pump)
Because the spray water in 4#, 3#, 2# enrichment tank all contains certain hydrogen cloride concentration, and raise step by step.So, the effect of moisturizing is exactly continuously spray water the highest hydrogen cloride concentration to be sent into 1# enrichment tank to continue enrichment, to guarantee 1# enrichment tank discharge hydrochloric acid up to standard continually.
Soda-wash tower and air water separator: in the flue gas after enrichment absorbs, also have a small amount of HCl and Cl
2remnants, water cannot absorb recovery again, utilizes HCl can react with alkali (NaOH) principle that generates sodium-chlor, passes through HCl and the Cl of remnants in soda-wash tower and in flue gas with alkali
2, after flue gas separates by air water separator, up to standard through smoke stack emission, the aqueous solution of sodium chloride-containing utilizes self-produced steam through evaporation concentration device (JVC) evaporation, and sodium-chlor is with the form discharge of solid slag, and water is recycled.Soda-wash tower, air water separator and evaporation concentration device (JVC) are prior art, have just repeated no more its concrete structure and principle of work here.
The treatment process of waste gas and waste liquid in production of polysilicon, is characterized in that: described treatment process comprises the steps: fully to burn after a, waste gas, waste liquid enter incinerator, obtains high-temperature flue gas; B, high-temperature flue gas enter waste heat boiler by flue lowers the temperature, and the flue gas after cooling enters strainer, and silicon-dioxide is separated from flue gas; C, remaining flue gas enter HCl recovery device, and spray column carries out reducing temperature twice to flue gas, and the flue gas after cooling enters enrichment tank and carries out enrichment absorption, and the hydrochloric acid of acquisition enters in hydrochloric acid tank; The flue gas of d, remnants, by soda-wash tower 10%NaOH alkali lye drip washing, is further removed remaining hydrogenchloride and chlorine in flue gas, and the brine waste that alkali cleaning produces drains into brine tank, then makes landfill disposal after evaporation concentration device is processed; The flue gas obtaining after e, alkali cleaning enters air water separator, finally by smoke stack emission discharge of pipes.
In a step, waste gas, waste liquid are made combustion-supporting fuel with Sweet natural gas and are burnt in incinerator, and temperature of combustion remains on 900-1000 ℃, produce high-temperature hydrolysis, obtain and contain SiO
2, HCl, CO
2, N
2and CL
2high-temperature flue gas.In b step, high-temperature flue gas is cooled to 200-300 ℃ in waste heat boiler, produces low-pressure steam simultaneously reclaim heat by heating de-salted water; The powdery SiO separating in strainer
2after processing, reclaimed vacuum negative pressure device.
In c step, flue gas enters spray column and carries out reducing temperature twice, and flue-gas temperature is down to below 60 ℃.
In force, chlorosilane (muriate) waste gas producing in polysilicon production process enters incinerator mixed firing with the waste liquid through atomization processing and produces high-temperature hydrolysis together with combustion-supporting fuel, combustion air.Incinerator comprises body of heater, with the cooling blower, the burner blower that are connected with body of heater, body of heater is formed by connecting by combustion chamber 38 and reaction chamber 40, the top of combustion chamber is provided with lighter for ignition 37, the top of lighter for ignition is provided with fuel inlet, the both sides of combustion chamber are provided with blast inlet, and the bottom of reaction chamber is provided with gas exhaust duct.(lighter for ignition is prior art, has just no longer narrated its principle of work here).Fuel inlet has three, is respectively exhaust gas inlet 32, gas-liquid mixture import and compressed air inlet 36, and gas-liquid mixture import top is provided with Imported gas 33, diesel oil import 34 and waste liquid import 35.One side of combustion chamber is provided with cooling air import 31, and opposite side is provided with combustion air inlet 39.Cooling air import and combustion air inlet place are equipped with by-pass valve control.The surface of reaction chamber is provided with thermal insulation layer 41.
Combustion-supporting fuel provides heat, to reach the temperature of combustion needing; Combustion air provides oxygen more than needed, makes chlorine-containing compound abundant pyrohydrolysis in combustion processes; Spray gun on cooling/igniting air cooling incinerator burner, and the air of igniting use is provided.Temperature in combustion processes need to be controlled at 800 ℃-1000 ℃, and this temperature makes chlorine-containing compound under hot conditions, fully be hydrolyzed to silicon-dioxide, hydrogenchloride, and a small amount of chlorine.Excess Temperature can make silicon-dioxide soften into vitreum, is bonded on furnace wall, incinerator refractory brick, refractory mortar is come off from body of heater, thereby affect combustion processes; The too low meeting of temperature makes chlorine-containing compound pyrolytic decomposition deficiency.
From incinerator out contain silicon-dioxide, hydrogenchloride, and the high-temperature flue gas of a small amount of chlorine enters waste heat boiler cooling, is cooled to 200 ℃, the object of cooling is that the filter separator of rear one-level can normally be worked under this low-temperature condition.Simultaneously in the process of cooling, high-temperature flue gas in incinerator enters by pipeline in the heat exchange chamber of waste heat boiler, carry out heat exchange with the vaporizer in waste heat boiler, de-salted water is from water-in flows into low-temperature zone vaporizer, carry out after heat exchange with low-temperature zone flue gas in this waste heat boiler, import high temperature section vaporizer from low-temperature zone vaporizer delivery port, the high temperature section of flowing through vaporizer and middle-temperature section vaporizer, with enter the high temperature section of waste heat boiler and the flue gas of middle-temperature section and carry out after heat exchange, derive and carry out steam separation through air water separator from middle-temperature section vaporizer delivery port, steam is discharged from vapour outlet, hot water return is to high temperature section vaporizer, the high-temperature flue gas simultaneously entering in heat exchange chamber is discharged from low-temperature flue gas air outlet after heat exchange becomes low-temperature flue gas.Waste heat boiler has reclaimed a large amount of waste heats existing with vapor form.Part steam can be used as crystallizing evaporator thermal source below, and the main steam line that part is sent into plant area reclaims.The concrete structure of waste heat boiler is prior art, is not the content that the present invention protects, and has just repeated no more its constitutional features and principle of work here.
The strainer of rear one-level has very high collection effciency to powdered silica, and the silicon-dioxide of collecting can carry out commercialization recovery.
The high-temperature flue gas of removing after powdered silica enters HCl recovery device.HCl recovery device is by 4 circulation enrichment cell formations, each circulation enrichment unit is formed by connecting by 1 spray column and 1 enrichment tank, the loop that forms a circulation after being connected by circulation tube and shower between spray column and enrichment tank, is connected by fume pipe between circulation enrichment unit and circulation enrichment unit.Spray-water is normal temperature tap water, and the effect of spray makes middle temperature flue gas further be cooled to 50 ℃, makes it to adapt to the heat resistance of next stage multiple stage circulation thickening device plastic member.The water droplet of spray absorbs the hydrogenchloride in flue gas simultaneously, makes in hydrogenchloride dissolved water, generates low-concentration hcl, and enters the continuous enrichment of next stage multiple stage circulation thickening device, finally generates 20 ~ 30 ﹪ commodity hydrochloric acid, enters hydrochloric acid tank.
Even if the high-temperature flue gas after removal powdered silica passes through level Four spray-absorption, but can't guarantee the hydrogenchloride in flue gas to be absorbed cleanly completely.For this reason, this flue gas is entered to two-stage soda-wash tower, further to remove remaining hydrogenchloride and chlorine in flue gas.So far,, after just the flue gas after alkali cleaning can being processed by air water separator, introduce smoke stack emission by induced draft fan.
When alkali cleaning, sodium hydroxide and hydrogenchloride, chlorine reaction, generate sodium-chlor.This brine waste is concentrated to brine tank, by evaporation concentration device processing, by the moisture removal in salt solution.Salinity crystallization is solid, the way processing such as this solid landfill.Evaporation concentration device adopts " jet steam suction technology ", can significantly reduce equipment making expense and reduce energy consumption.
Above-mentioned innovative technology can in polysilicon production process, produce contain muriatic waste gas, waste liquid is implemented comprehensive processing, makes it reach " zero release ".And the muriate such as silicon-dioxide, hydrochloric acid and waste heat are realized to recovery to greatest extent.
Claims (7)
1. the treatment system of waste gas and waste liquid in production of polysilicon, it mainly comprises waste gas, waste liquid transport pipe, with smoke stack emission pipeline, it is characterized in that: waste gas, between waste liquid transport pipe and smoke stack emission pipeline, be provided with successively incinerator, waste heat boiler, strainer, HCl recovery device, soda-wash tower and steam separator, between above-mentioned each parts, be connected by flue, HCl recovery device is connected with a hydrochloric acid tank, soda-wash tower is connected with a brine tank, brine tank is connected with an evaporation concentration device, described incinerator comprises body of heater, with the cooling blower being connected with body of heater, burner blower, body of heater is formed by connecting by combustion chamber and reaction chamber, the top of combustion chamber is provided with lighter for ignition, the top of lighter for ignition is provided with fuel inlet, the both sides of combustion chamber are provided with blast inlet, the bottom of reaction chamber is provided with gas exhaust duct, fuel inlet has three, be respectively exhaust gas inlet, gas-liquid mixture import and compressed air inlet, one side of combustion chamber is provided with cooling air import, opposite side is provided with combustion air inlet.
2. the treatment system of waste gas and waste liquid in production of polysilicon according to claim 1, is characterized in that: strainer is connected with a silicon-dioxide storage tank, and soda-wash tower adopts two-stage soda-wash tower.
3. the treatment system of waste gas and waste liquid in production of polysilicon according to claim 1, it is characterized in that: HCl recovery device is by 4 circulation enrichment cell formations, each circulation enrichment unit is formed by connecting by 1 spray column and 1 enrichment tank, the loop that forms a circulation after being connected by circulation tube and shower between spray column and enrichment tank, is connected by fume pipe between circulation enrichment unit and circulation enrichment unit.
4. the treatment process of waste gas and waste liquid in production of polysilicon, is characterized in that: described treatment process comprises the steps: fully to burn after a, waste gas, waste liquid enter incinerator, obtains high-temperature flue gas; B, high-temperature flue gas enter waste heat boiler by flue lowers the temperature, and the flue gas after cooling enters strainer, and silicon-dioxide is separated from flue gas; C, remaining flue gas enter HCl recovery device, and spray column carries out reducing temperature twice to flue gas, and the flue gas after cooling enters enrichment tank and carries out enrichment absorption, and the hydrochloric acid of acquisition enters in hydrochloric acid tank; D, remaining flue gas are further removed remaining hydrogenchloride and chlorine in flue gas by the alkali lye drip washing of soda-wash tower, and the brine waste that alkali cleaning produces drains into brine tank, then make landfill disposal after evaporation concentration device is processed; The flue gas obtaining after e, alkali cleaning enters air water separator, finally by smoke stack emission discharge of pipes; In a step, described incinerator comprises body of heater, and with the cooling blower, the burner blower that are connected with body of heater, body of heater is formed by connecting by combustion chamber and reaction chamber, the top of combustion chamber is provided with lighter for ignition, the top of lighter for ignition is provided with fuel inlet, and the both sides of combustion chamber are provided with blast inlet, and the bottom of reaction chamber is provided with gas exhaust duct, fuel inlet has three, be respectively exhaust gas inlet, gas-liquid mixture import and compressed air inlet, a side of combustion chamber is provided with cooling air import, and opposite side is provided with combustion air inlet.
5. the treatment process of waste gas and waste liquid in production of polysilicon according to claim 4, it is characterized in that: in a step, waste gas, waste liquid are made combustion-supporting fuel with Sweet natural gas and burnt in incinerator, and temperature of combustion remains on 900-1000 ℃, produce high-temperature hydrolysis, obtain and contain SiO
2, HCl, CO
2, N
2and CL
2high-temperature flue gas.
6. the treatment process of waste gas and waste liquid in production of polysilicon according to claim 4, is characterized in that: in b step, high-temperature flue gas is cooled to 200-300 ℃ in waste heat boiler, produces low-pressure steam simultaneously reclaim heat by heating de-salted water; The powdery SiO separating in strainer
2after processing, reclaimed vacuum negative pressure device.
7. the treatment process of waste gas and waste liquid in production of polysilicon according to claim 4, is characterized in that: in c step, flue gas enters spray column and carries out reducing temperature twice, makes below flue-gas temperature to 60 ℃.
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| CN103727548B (en) * | 2013-12-14 | 2016-06-08 | 蚌埠玻璃工业设计研究院 | A kind of online low-radiation coating waste gas treatment device of APCVD |
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