CN102722092A - Developing solution applicable to photo-polymerization type lithographic printing plate - Google Patents

Developing solution applicable to photo-polymerization type lithographic printing plate Download PDF

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Publication number
CN102722092A
CN102722092A CN2012101841382A CN201210184138A CN102722092A CN 102722092 A CN102722092 A CN 102722092A CN 2012101841382 A CN2012101841382 A CN 2012101841382A CN 201210184138 A CN201210184138 A CN 201210184138A CN 102722092 A CN102722092 A CN 102722092A
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grams
surfactant
developer solution
photo
printing plate
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王晓平
王泳
张学萍
郭伟锋
高峰
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Lucky Huaguang Graphics Co Ltd
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Lucky Huaguang Graphics Co Ltd
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Abstract

The invention discloses developing solution applicable to a photo-polymerization type lithographic printing plate. The developing solution mainly comprises an alkaline compound, a buffer system, a surfactant and solvent, the surfactant is a composite surface activity system consisting of an anion surfactant, an amphiprotic surfactant and a nonionic surfactant, and dosages of the anion surfactant, the amphiprotic surfactant and the nonionic surfactant respectively account for 67-79%, 14-33% and 2-7% of the total mass of the composite surface activity system. The lithographic printing plate developing solution prepared by the method effectively solves the problem of development sediment, and has the advantages of high development tolerance level, low damage to image-text areas, and the like.

Description

A kind of developer solution that is applicable to photo-polymerization type lithographic printing plate
Technical field
The present invention relates to a kind of developer solution that is used for photo-polymerization type lithographic printing plate, be specifically related to a kind of developer solution that is used for photo-polymerization type CTP (CTP) lithographic plate development treatment.
Technical background
The purpose that photo-polymerization type lithographic printing plate develops is: plate is after the exposure of suitable (laser) light source; Immerse in the specific developer solution; The light sensitive layer of unexposed portion is removed; The dummy plate base that exposes possess hydrophilic property does not then make it sustain damage to the exposure image zone as much as possible, thereby forms the camegraph of oil loving slight convexity.There is dissolution velocity in developing process based on photo-polymerization type lithographic printing plate exposure area and unexposed area after exposure in developer solution difference, promptly the dissolution velocity of unexposed area in alkaline-based developer is much larger than the exposure area.Immerse the plate in the developer solution liquid, under the friction of develop brush or sponge, unexposed coating enters into developer solution in a large number.If use single surfactant, the blank local cleaning of edition base is unclean, like this, can go up dirty when machine prints on the plate.Last dirty in, a large amount of dissolvings coating down can form insoluble matter, i.e. sediment because of the dispersibility of developer solution deficiency in developing trough.This sediment can be eliminated the dummy plate base absorption of coating, thereby makes forme dirty on when printing.Simultaneously also can in developing trough, stop up the developing trough circulation system, cause the developing machine fault.
Summary of the invention
The objective of the invention is to solve the above-mentioned technical matters that exists in the prior art, a kind of developer solution that is applicable to photo-polymerization type lithographic printing plate is provided.
For realizing the foregoing invention purpose, the technical scheme that the present invention adopts is following:
The developer solution that is applicable to photo-polymerization type lithographic printing plate of the present invention; Mainly by alkali compounds, buffer system, surfactant and solvent composition, the composite surface reactive systems that described surfactant is made up of anionic surfactant, amphoteric surfactant and non-ionic surfactant.
The percentage composition that contained composite surface reactive systems general assembly (TW) accounts for the developer solution general assembly (TW) is 3% ~ 7%.If described surfactant general assembly (TW) is lower than 3.0% of developer solution general assembly (TW) percentage composition, then the removal of plate unexposed portion is unclean, promptly keeps on file, goes up dirty during printing easily; If described surfactant general assembly (TW) is higher than 7.0% of developer solution general assembly (TW) percentage composition, then plate exposure image zone sustains damage.
The consumption of described anionic surfactant, amphoteric surfactant and non-ionic surfactant accounts for 67-79%, 14-33% and the 2-7% of composite surface reactive systems gross mass respectively.
Said anionic surfactant comprises sulphonate, higher alcohol sulfate salt and fat alkane carboxylate.
Said anionic surfactant comprises the sodium salt of dodecyl benzene sulfonate, the sodium salt of butyl naphthalene sulfonate, naphthalene disulfonate, m-nitrobenzene sodium sulfonate; Dodecanol sulfuric ester sodium salt, octanol sulfuric ester sodium salt and sodium oleate.
Said suitable anionic surfactant comprises alkyl aryl sulfonate, like the sodium salt of dodecyl benzene sulfonate, the sodium salt of butyl naphthalene sulfonate, the sodium salt of dinaphthalene disulfonate and the sodium salt of m-nitrobenzene sulfonate; Higher alcohol sulfate salt is received like the sodium salt of dodecanol sulfuric ester, the sodium salt and the oleic acid of octanol sulfuric ester.These anionic surfactants can be used alone or in combination.Preferred especially Sulfonates.
Described amphoteric surfactant is aminocarboxylic acids or sulfaminic acid class surfactant, the maximum characteristics of this surfactant be no matter in acid, neutrality or alkaline solution dissolubility all good, therefore when isoelectric point, can not produce deposition yet.
Said suitable ionic surfactant pack is drawn together in polyox-yethylene-polyoxypropylene block copolymer, APES, naphthyl phenol polyethenoxy ether, senior fatty polyoxyethylene ether, polyoxyethylene carboxylate, the polyoxyethylene sorbitan monolaurate and can be used alone or in combination.These non-ionic surfactants can be used alone or in combination.Preferred especially polyoxyethylene polyoxypropylene block copolymer, APES, naphthyl phenol polyethenoxy ether.Ionization does not take place in non-ionic surfactant in water; Be to be the hydrophilic group group with hydroxyl or ehter bond; Because a little less than the water wettability of hydroxyl or ehter bond; Therefore must contain a plurality of such groups in the molecule and just can show certain water wettability, this is to differ widely with having only the anionic surfactant of a hydrophilic radical.Non-ionic surfactant has characteristics non-ionizing in water just, has determined it superior than ionic surfactant in some aspects.As in water, with organic solvent dissolubility preferably being arranged, stability is high in solution, does not allow to be subject to the influence of strong electrolyte.The surfactant compatibility of it and other type is good, and non-ionic surfactant has good stability in hard water, and in developing process, has certain froth breaking effect.
Described detergent and sequestrant are disodium edta and gluconic acid sodium salt.
The degree that the weight of described alkali compounds accounts for the developer solution general assembly (TW) is 0.1% ~ 2.0%.Comprise inorganic base such as potassium hydroxide, NaOH, potassium silicate and sodium silicate; Organic base such as diethanolamine, triethanolamine, triethylamine and monoethanolamine can be used alone or in combination.Between the pH value preferred 11.8 ~ 12.5.
Described solvent can be phenmethylol, ethylene glycol phenyl ether, propylene glycol phenylate.Weight of solvent accounts for 0.5% ~ 0.7% of developer solution general assembly (TW).
Described damping fluid can select for use sulfosalicylic acid (PKa:11.7), this type of weak acid highly basic of phosphoric acid (PKa:12.4) to form.
Described development host adopts deionized water.After it adds a certain proportion of alkaline matter, under the stirring, add other material more successively, stirred one hour.
In order to ensure the stability of developer solution in automatic flushing process, control the concentration particular importance of various components in developer solution.Therefore, often make-up solution (promptly replenishing liquid) is joined in the developer solution.Because photographic layer is acid, need suitably to improve alkali content so replenish liquid, surfactant consumption is little, and consumption is constant in replenishing liquid.In dashing the version process, increase along with what developer solution contacted with Carbon Dioxide in Air, performance decays gradually, and is stable for making developer solution, in replenishing liquid, improves buffer usage.The pH value that replenishes liquid is preferably greater than more than 12.6 at least greater than 12.
According to foregoing invention, the photo-polymerization type surface printing plate after overexposure is immersed in the developing trough, the non-image areas of coating is taked mechanical type friction (for example through hairbrush in the developing trough or sponge), in this specific developer solution, remove.
In dashing the version process, can in continuous or a spot of developer solution that joins in the developing trough, be the concentration adjustment of developer solution the substantially constant level by certain amount with replenishing liquid.
Because the present invention adopted above technical scheme, therefore developer solution provided by the present invention overcomes the defective that high alkalinity and a kind of surfactant of single use exist in developer solution, can effectively solve in the developing process sediment problem in the developing trough.
The developer solution that is used for photo-polymerization type lithographic printing plate of the present invention; Mainly by alkali compounds, buffer system, surfactant and solvent composition; Because of adopting, it contains the composite surface reactive systems of forming by anionic surfactant, amphoteric surfactant and non-ionic surfactant; Advantages such as solved the scattering problem of development sediment preferably, it is big to have the development tolerance simultaneously, and the image areas damage is little.
This developer solution can make the unexposed removal of plate clean; Little to the imaging region damage; Contain anionic surfactant simultaneously; Amphoteric surfactant and non-ionic surfactant, thus overcome the defective that a kind of surfactant of single use exists in developer solution, can also solve sediment problem in the developing trough simultaneously.
Embodiment
Through several embodiment and comparative example the invention explanation is described in further detail below, but obviously the present invention is not limited to these embodiment.During the preparation of all developer solutions of giving an example, the temperature that requires deionized water is 20 to spend between 30 degree.
The explanation of embodiment starting material:
NBL butyl naphthalene sulfonate (Japanese Kao company)
2SF-40CG cocounut oil acyl both sexes base dipropionate (Chongqing Fu Bo chemical industry company limited)
PE-6200 polyox-yethylene-polyoxypropylene block copolymer (BASF AG)
Embodiment 1-2, different alkali compounds, pH value: 12.3
Embodiment 1
Measuring 820 ml deionized water is mother liquor, and it is 60 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 18 milliliters in sulfosalicylic acid buffer solution; Anionic surfactant NBL55 gram; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG 10 grams; PE-6200 2 grams, gluconic acid sodium salt 4 grams.Stirred one hour.
Embodiment 2
Measuring 890 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams, 18 milliliters in sulfosalicylic acid buffer solution successively; Anionic surfactant NBL55 gram, ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams; 2SF-40CG 10 grams, PE-6200 2 grams, gluconic acid sodium salt 4 grams.Stirred one hour.
Corresponding additional liquid:
Replenishing liquid 1, measuring 710 ml deionized water is mother liquor, and it is 180 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 36 milliliters in sulfosalicylic acid buffer solution; Anionic surfactant NBL 55 grams; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG 10 grams; PE-6200 2 grams, gluconic acid sodium salt 8 grams.Stirred one hour.
Replenishing liquid 2, measuring 820 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 6 grams, 36 milliliters in sulfosalicylic acid buffer solution successively; Anionic surfactant NBL55 gram; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG 10 grams; PE-6200 2 grams, gluconic acid sodium salt 4 grams.Stirred one hour.
Applying detection
1. the developer solution of the developer solution intermiscibility that is disposed: embodiment 1 configuration is transparent, and the developer solution of embodiment 2 configurations is transparent.
2. drop: get the purple laser journalism of magnificent light board version, exposure station does not drip to and stops the test of 5-30 decoating second on the space of a whole page
The space of a whole page residence time 30 seconds 25 seconds 20 seconds versions 15 seconds 10 seconds 5 seconds
1 edition basic OD value of embodiment 0.27 0.27 0.27 0.30 0.35 0.66
2 editions basic OD values of embodiment 0.27 0.27 0.27 0.27 0.27 0.27
3. 1 liter of developer solution is placed in the clean beaker of sealing after purple laser version, place a week after, embodiment 1, embodiment 2 all do not have sediment at the bottom of the beaker.
4. image-region loss: embodiment 1 every square meter average loss 0.12 gram, embodiment 2 every square meter average loss 0.14 grams.
Embodiment 3-6, different surface active agents
Embodiment 3
Measuring 850 ml deionized water is mother liquor, and it is 60 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 18 milliliters in sulfosalicylic acid buffer solution; Anionic surfactant sodium dodecylbenzene sulfonate 30 grams; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG10 gram; PE-6200 2 grams, tetrasodium ethylenediamine tetraacetate 4 grams.Stirred one hour.
Embodiment 4
Measuring 920 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams, 18 milliliters in sulfosalicylic acid buffer solution successively; C12-alkyl diphenyl ether disulfonate (DOW Chemical) 30 grams; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG10 gram; PE-6200 2 grams, tetrasodium ethylenediamine tetraacetate 4 grams..Stirred one hour.
Embodiment 5
Measuring 920 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams, 18 milliliters in sulfosalicylic acid buffer solution successively; Anionic surfactant NBL20 gram, naphthols polyoxyethylene ether 3 grams, ethylene glycol phenyl ether 6 grams; Diethanolamine 5 grams; The 2SF-40CG10 gram, PE-6200 2 grams, tetrasodium ethylenediamine tetraacetate 4 grams.Stirred one hour.
Embodiment 6
Measuring 920 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 2.0 grams, 18 milliliters in sulfosalicylic acid buffer solution successively; Anionic surfactant NBL30 gram, ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams; LAB-30 10 grams, PE-6200 2 grams, tetrasodium ethylenediamine tetraacetate 4 grams..Stirred one hour.
Embodiment 7-embodiment 8 different solvents
Embodiment 7
Measuring 820 ml deionized water is mother liquor, and it is 60 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 18 milliliters in sulfosalicylic acid buffer solution; Anionic surfactant NBL55 gram; Phenmethylol 4 grams, diethanolamine 5 grams, 2SF-40CG 10 grams; PE-6200 2 grams, gluconic acid sodium salt 4 grams.Stirred one hour.
Embodiment 8
Measuring 890 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams, 18 milliliters in sulfosalicylic acid buffer solution successively; Anionic surfactant NBL55 gram, phenmethylol 4 grams, diethanolamine 5 grams; The 2SF-40CG10 gram, PE-6200 2 grams, gluconic acid sodium salt 4 grams..Stirred one hour.
Embodiment 9-embodiment 10 different damping fluids
Embodiment 9
Measuring 820 ml deionized water is mother liquor, and it is 60 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 25 milliliters of PBSs; Anionic surfactant NBL55 gram; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG 10 grams; PE-6200 2 grams, EDTA-4Na 4 grams.Stirred one hour.
Embodiment 10
Measuring 890 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams, 25 milliliters of PBSs successively; Anionic surfactant NBL55 gram, ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams; The 2SF-40CG10 gram, PE-6200 2 grams, EDTA-4Na 4 grams.Stirred one hour.
Corresponding additional liquid:
Replenish liquid 3
Measuring 710 ml deionized water is mother liquor, and it is 180 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 36 milliliters in sulfosalicylic acid buffer solution; Anionic surfactant NBL30 gram; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG10 gram; PE-6200 2 grams, tetrasodium ethylenediamine tetraacetate 8 grams.Stirred one hour.
Replenish liquid 4
Measuring 820 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 6 grams, 36 milliliters in sulfosalicylic acid buffer solution successively; C12-alkyl diphenyl ether disulfonate (DOW Chemical) 30 grams; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG10 gram; PE-6200 2 grams, tetrasodium ethylenediamine tetraacetate 4 grams..Stirred one hour.
Replenish liquid 5
Measuring 710 ml deionized water is mother liquor, and it is 180 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 36 milliliters in buffer solution; Anionic surfactant NBL20 gram, naphthols polyoxyethylene ether 3 grams, ethylene glycol phenyl ether 6 grams; Diethanolamine 5 grams; The 2SF-40CG10 gram, PE-6200 2 grams, tetrasodium ethylenediamine tetraacetate 8 grams.Stirred one hour.
Replenish liquid 6
Measuring 820 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 6 grams, 36 milliliters in buffer solution successively; Anionic surfactant NBL10 gram, NPE 50 grams (LG-DOW company buys), ethylene glycol phenyl ether 6 grams; Diethanolamine 5 grams,, LAB-30 10 grams; PE-6200 2 grams, tetrasodium ethylenediamine tetraacetate 4 grams..Stirred one hour.
Replenish liquid 7
Measuring 720 ml deionized water is mother liquor, and it is 180 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 36 milliliters in sulfosalicylic acid buffer solution; Anionic surfactant NBL55 gram; Phenmethylol 4 grams, diethanolamine 5 grams, 2SF-40CG 10 grams; PE-6200 2 grams, gluconic acid sodium salt 4 grams..Stirred one hour.
Replenish liquid 8
Measuring 890 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams, 36 milliliters in sulfosalicylic acid buffer solution successively; Anionic surfactant NBL55 gram, phenmethylol 4 grams, diethanolamine 5 grams; The 2SF-40CG10 gram, PE-6200 2 grams, gluconic acid sodium salt 4 grams..Stirred one hour.
Different damping fluids
Replenish liquid 9
Measuring 710 ml deionized water is mother liquor, and it is 180 milliliters of 1.5 potassium silicate solutions that the middling speed stirring adds the modulus for preparing in advance successively, 25 milliliters of PBSs; Anionic surfactant NBL55 gram; Ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG 10 grams; PE-6200 2 grams, EDTA-4Na 4 grams..Stirred one hour.
Replenish liquid 10
Measuring 890 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams, 50 milliliters of PBSs successively; Anionic surfactant NBL55 gram, ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams; The 2SF-40CG10 gram, PE-6200 2 grams, EDTA-4Na 4 grams.Stirred one hour.
Applying detection
The developer solution intermiscibility that is disposed: embodiment 3,4,5,6,7,8,9 and 10 configuration back developer solutions are transparent.
1, drop: get the purple laser journalism of magnificent light board version, not making public to using the developer solution that is disposed to put respectively to drip to stops the test of 5-30 decoating second on the space of a whole page
The residence time 30 seconds 25 seconds 20 seconds 15 seconds 10 seconds 5 seconds
3 editions basic OD values of example 0.27 0.27 0.27 0.27 0.30 0.99
4 editions basic OD values of example 0.27 0.27 0.27 0.27 0.27 0.99
5 editions basic OD values of example 0.27 0.27 0.27 0.27 0.31 1.01
6 editions basic OD values of example 0.27 0.27 0.27 0.30 0.50 1.0
7 editions basic OD values of example .027 0.27 0.27 0.27 0.27 0.99
8 editions basic OD values of example 0.27 0.27 0.27 0.27 0.27 0.98
9 editions basic OD values of example 0.27 0.27 0.27 0.27 0.34 0.45
10 editions basic OD values of example 0.27 0.27 0.27 0.30 0.6 0.38
3, one liter of developer solution is placed in the clean beaker of sealing after purple laser version, place a week after, beaker bottom embodiment 3 has slight sediment, embodiment 4,5,6,7,8,9,10 does not all have sediment.
4, image-region loss: embodiment 3 every square meter average loss 0.11 grams; Embodiment 4 every square meter average loss 0.15 grams, embodiment 5 every square meter average loss 0.17 grams, embodiment 6 every square meter average loss 0.17 grams; Embodiment 7 every square meter average loss 0.19 grams; Embodiment 8 every square meter average loss 0.18 grams, embodiment 9 every square meter average loss 0.14 grams, embodiment 10 every square meter average loss 0.15 grams.
Comparative Examples
Comparative Examples 1 no alkaline compound
Measuring 890 ml deionized water is mother liquor, and middling speed stirs 18 milliliters in buffer solution, anionic surfactant NBL55 gram, ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG10 gram, PE-6200 2 grams, gluconic acid sodium salt 4 grams..Stirred one hour.
Comparative Examples 2 is not added anionic surfactant
Measuring 890 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams successively, 18 milliliters in buffer solution, ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG 10 grams, PE-6200 2 grams, gluconic acid sodium salt 4 grams..Stirred one hour.
Comparative Examples 3 is not added amphoteric surfactant
Measuring 890 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams successively, 18 milliliters in buffer solution, anionic surfactant NBL 55 grams, ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, PE-6200 2 grams, gluconic acid sodium salt 4 grams..Stirred one hour.
Comparative Examples 4 is not added non-ionic surfactant
Measuring 890 ml deionized water is mother liquor, and middling speed stirs and adds potassium hydroxide 1.5 grams successively, 18 milliliters in buffer solution, anionic surfactant NBL 55 grams, ethylene glycol phenyl ether 6 grams, diethanolamine 5 grams, 2SF-40CG10 gram, gluconic acid sodium salt 4 grams..Stirred one hour.
Applying detection
1, the developer solution intermiscibility that is disposed: the developer solution of Comparative Examples 1 configuration is transparent, and the developer solution of Comparative Examples 2 configurations is transparent.
The developer solution of Comparative Examples 3 configurations is muddy, and the developer solution of Comparative Examples 4 configurations is muddy, and the developer solution of Comparative Examples 5 configurations is transparent.
2, drop: get the purple laser journalism of magnificent light board version, not making public to using the developer solution that is disposed to put respectively to drip to stops the test of 5-30 decoating second on the space of a whole page
The residence time 30 seconds 25 seconds 20 seconds 15 seconds 10 seconds 5 seconds
1 edition basic OD value of Comparative Examples 0.6 0.78 0.90 0.99 0.98 0.99
2 editions basic OD values of Comparative Examples 0.8 0.9 0.9 0.9 0.99 0.99
3 editions basic OD values of Comparative Examples 0.60 0.81 0.99 0.99 0.99 0.99
4 editions basic OD values of Comparative Examples 0.40 0.40 0.72 0.85 0.98 0.98

Claims (10)

1. developer solution that is applicable to photo-polymerization type lithographic printing plate; Mainly, it is characterized in that: the composite surface reactive systems that described surfactant is made up of anionic surfactant, amphoteric surfactant and non-ionic surfactant by alkali compounds, buffer system, surfactant and solvent composition.
2. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 1 is characterized in that: the percentage composition that contained composite surface reactive systems general assembly (TW) accounts for the developer solution general assembly (TW) is 3% ~ 7%.
3. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 1 and 2 is characterized in that: the consumption of described anionic surfactant, amphoteric surfactant and non-ionic surfactant accounts for 67-79%, 14-33% and the 2-7% of composite surface reactive systems gross mass respectively.
4. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 1 and 2 is characterized in that: said anionic surfactant comprises sulphonate, higher alcohol sulfate salt and fat alkane carboxylate.
5. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 4; It is characterized in that: said anionic surfactant comprises the sodium salt of dodecyl benzene sulfonate, the sodium salt of butyl naphthalene sulfonate, naphthalene disulfonate, m-nitrobenzene sodium sulfonate; Dodecanol sulfuric ester sodium salt, octanol sulfuric ester sodium salt and sodium oleate.
6. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 1 and 2 is characterized in that: said amphoteric surfactant is aminocarboxylic acids or sulfaminic acid class surfactant.
7. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 1 and 2 is characterized in that: described ionic surfactant pack is drawn together one or more in polyox-yethylene-polyoxypropylene block copolymer, APES, naphthyl phenol polyethenoxy ether, higher aliphatic polyoxyethylene ether, polyoxyethylene carboxylate, the polyoxyethylene sorbitan monolaurate.
8. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 1 is characterized in that: described alkali compounds comprises potassium hydroxide, NaOH, potassium silicate and sodium silicate, sodium carbonate, diethanolamine, triethanolamine, triethylamine and monoethanolamine; The percentage composition that the weight of described alkali compounds accounts for developer solution weight is 0.1% ~ 2.0%.
9. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 1 is characterized in that: described solvent comprises phenmethylol, ethylene glycol phenyl ether and propylene glycol phenylate; The percentage composition that the weight of solvent accounts for developer solution weight is 0.5% ~ 4%.
10. the developer solution that is applicable to photo-polymerization type lithographic printing plate according to claim 1 is characterized in that: described buffer solution is that strong base-weak acid salt is formed, and the PKa value of weak acid is between 11.5 ~ 12.5.
CN2012101841382A 2012-06-06 2012-06-06 Developing solution applicable to photo-polymerization type lithographic printing plate Pending CN102722092A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104597727A (en) * 2015-01-14 2015-05-06 深圳市国华光电科技有限公司 KOH developing liquid for KMPR photoresist
CN104777724A (en) * 2015-04-14 2015-07-15 广东成德电路股份有限公司 Modified developer and load measuring method thereof
CN106227003A (en) * 2016-09-29 2016-12-14 杭州格林达化学有限公司 A kind of developer composition and preparation method thereof
CN106842833A (en) * 2017-04-12 2017-06-13 安徽强邦印刷材料有限公司 A kind of preparation method of new developer solution
CN106842834A (en) * 2017-04-12 2017-06-13 安徽强邦印刷材料有限公司 A kind of developer solution for heat-sensitive positive picture CTP plate
CN112394622A (en) * 2020-09-26 2021-02-23 芯越微电子材料(嘉兴)有限公司 Low-etching-rate developer composition and preparation method thereof
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1421742A (en) * 2001-11-30 2003-06-04 富士胶片株式会社 Infrared light-sensitive composition
CN101770186A (en) * 2008-12-30 2010-07-07 乐凯集团第二胶片厂 Developer solution for positive lithoprinting plate
CN102053508A (en) * 2010-11-09 2011-05-11 泰兴市东方实业公司 Developer for positive thermosensitive CTP (Computer to Plate)
CN102063024A (en) * 2010-12-24 2011-05-18 东莞市智高化学原料有限公司 Developing solution composition
WO2011125913A1 (en) * 2010-03-31 2011-10-13 富士フイルム株式会社 Developer for processing planographic printing plate precursor, method for preparing planographic printing plate using the developer, and method for printing

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1421742A (en) * 2001-11-30 2003-06-04 富士胶片株式会社 Infrared light-sensitive composition
CN101770186A (en) * 2008-12-30 2010-07-07 乐凯集团第二胶片厂 Developer solution for positive lithoprinting plate
WO2011125913A1 (en) * 2010-03-31 2011-10-13 富士フイルム株式会社 Developer for processing planographic printing plate precursor, method for preparing planographic printing plate using the developer, and method for printing
CN102053508A (en) * 2010-11-09 2011-05-11 泰兴市东方实业公司 Developer for positive thermosensitive CTP (Computer to Plate)
CN102063024A (en) * 2010-12-24 2011-05-18 东莞市智高化学原料有限公司 Developing solution composition

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CN104597727A (en) * 2015-01-14 2015-05-06 深圳市国华光电科技有限公司 KOH developing liquid for KMPR photoresist
CN104777724A (en) * 2015-04-14 2015-07-15 广东成德电路股份有限公司 Modified developer and load measuring method thereof
CN106227003A (en) * 2016-09-29 2016-12-14 杭州格林达化学有限公司 A kind of developer composition and preparation method thereof
CN106842833A (en) * 2017-04-12 2017-06-13 安徽强邦印刷材料有限公司 A kind of preparation method of new developer solution
CN106842834A (en) * 2017-04-12 2017-06-13 安徽强邦印刷材料有限公司 A kind of developer solution for heat-sensitive positive picture CTP plate
CN106842834B (en) * 2017-04-12 2020-01-03 安徽强邦印刷材料有限公司 Developing solution for heat-sensitive positive image CTP plate
CN113835314A (en) * 2019-11-28 2021-12-24 湖南巨水环保科技有限公司 Circuit board developing solution and developing facility cleaning method
CN112394622A (en) * 2020-09-26 2021-02-23 芯越微电子材料(嘉兴)有限公司 Low-etching-rate developer composition and preparation method thereof

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