CN102698981A - Method for cleaning slicing machine - Google Patents
Method for cleaning slicing machine Download PDFInfo
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- CN102698981A CN102698981A CN2012101858190A CN201210185819A CN102698981A CN 102698981 A CN102698981 A CN 102698981A CN 2012101858190 A CN2012101858190 A CN 2012101858190A CN 201210185819 A CN201210185819 A CN 201210185819A CN 102698981 A CN102698981 A CN 102698981A
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- Prior art keywords
- cleaning
- peg
- slicing machine
- pipeline
- machine
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Abstract
The invention discloses a method for cleaning a slicing machine. The method comprises the processes of cleaning an operation region inside a machine table and cleaning a pipeline and is characterized in that in the cleaning process, PEG (polyethylene glycol) is adopted for cleaning the pipeline and the operation region inside the machine table. According to the method, the PEG is used as cleaning agents, the PEG is one ingredient of mortar, so after the method is used for cleaning the slicing machine, the stability is higher than that of a machine table system of the slicing machine cleaned by the traditional cleaning method, and meanwhile, the mortar water content and the product quality can be ensured. The slicing machine is prevented from getting rust. The PEG after being used for cleaning can also be recovered and reutilized, and the utilization rate of the PEG is improved.
Description
Technical field
The invention belongs to silicon cutting technique field, particularly relate to the method that a kind of slicer cleans.
Background technology
The method of conventional clean slicer be water to operation area in the board, pipeline cleans, and uses PEG (polyethylene glycol) to filter again.Cleaning in the after table has water residual, influences mortar water content (water imbibition of mortar is stronger); And after the long-term water inlet, the board parts are prone to go up rust.
Summary of the invention
The object of the invention is to the defective of prior art a kind of cleaning performance method that better slicer cleans to be provided.
The present invention adopts following technical scheme for realizing above-mentioned purpose:
The method that a kind of slicer cleans comprises that the operation area is cleaned with pipeline in the board to clean, and it is characterized in that: use PEG carries out the cleaning of operation area and pipeline in the board in cleaning process.
The present invention uses PEG as cleaning agent, because PEG is one of composition of mortar, so after using this method to clean slicer, system is more stable than traditional cleaning method section board, can also guarantee mortar water content and product quality simultaneously.Prevent that slicer from getting rusty.The PEG that cleaned can also recycle, and improves its utilization rate.
The specific embodiment
The method that a kind of slicer cleans comprises that the operation area is cleaned with pipeline in the board to clean, and use PEG carries out the cleaning of operation area and pipeline in the board in cleaning process.
The present invention uses PEG as cleaning agent, because PEG is one of composition of mortar, so after using this method to clean slicer, system is more stable than traditional cleaning method section board, can also guarantee mortar water content and product quality simultaneously.Prevent that slicer from getting rusty.The PEG that cleaned can also recycle, and improves its utilization rate.
Claims (1)
1. the slicer method of cleaning comprises that the operation area is cleaned with pipeline in the board to clean, and it is characterized in that: use PEG carries out the cleaning of operation area and pipeline in the board in cleaning process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101858190A CN102698981A (en) | 2012-06-07 | 2012-06-07 | Method for cleaning slicing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101858190A CN102698981A (en) | 2012-06-07 | 2012-06-07 | Method for cleaning slicing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102698981A true CN102698981A (en) | 2012-10-03 |
Family
ID=46892200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012101858190A Pending CN102698981A (en) | 2012-06-07 | 2012-06-07 | Method for cleaning slicing machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102698981A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106216276A (en) * | 2016-08-24 | 2016-12-14 | 安徽正田能源科技有限公司 | A kind of cleaning method of single gold silicon silicon body cutting microtome |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08215649A (en) * | 1995-02-15 | 1996-08-27 | Olympus Optical Co Ltd | Cleaning method |
| JP2001276756A (en) * | 2001-02-16 | 2001-10-09 | Olympus Optical Co Ltd | Cleaning method |
| JP3658257B2 (en) * | 1998-12-24 | 2005-06-08 | キヤノン株式会社 | Cleaning method, cleaning apparatus, electrophotographic photosensitive member, and manufacturing method of electrophotographic photosensitive member |
| CN101204706A (en) * | 2006-12-21 | 2008-06-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Cleaning method of quartz material parts |
| CN101972756A (en) * | 2010-08-30 | 2011-02-16 | 苏州五方光电科技有限公司 | Lens cleaning process during processing |
| CN102163645A (en) * | 2010-11-25 | 2011-08-24 | 浙江昱辉阳光能源有限公司 | Pre-flushing method for silicon chip subjected to multi-wire cutting |
-
2012
- 2012-06-07 CN CN2012101858190A patent/CN102698981A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08215649A (en) * | 1995-02-15 | 1996-08-27 | Olympus Optical Co Ltd | Cleaning method |
| JP3658257B2 (en) * | 1998-12-24 | 2005-06-08 | キヤノン株式会社 | Cleaning method, cleaning apparatus, electrophotographic photosensitive member, and manufacturing method of electrophotographic photosensitive member |
| JP2001276756A (en) * | 2001-02-16 | 2001-10-09 | Olympus Optical Co Ltd | Cleaning method |
| CN101204706A (en) * | 2006-12-21 | 2008-06-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Cleaning method of quartz material parts |
| CN101972756A (en) * | 2010-08-30 | 2011-02-16 | 苏州五方光电科技有限公司 | Lens cleaning process during processing |
| CN102163645A (en) * | 2010-11-25 | 2011-08-24 | 浙江昱辉阳光能源有限公司 | Pre-flushing method for silicon chip subjected to multi-wire cutting |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106216276A (en) * | 2016-08-24 | 2016-12-14 | 安徽正田能源科技有限公司 | A kind of cleaning method of single gold silicon silicon body cutting microtome |
| CN106216276B (en) * | 2016-08-24 | 2018-09-18 | 安徽正田能源科技有限公司 | A kind of cleaning method of monocrystalline silicon silicon body cutting slicer |
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Legal Events
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20121003 |