CN102627028A - Method for preparing high-resolution pattern based on self-infiltration-removal of ink droplet - Google Patents
Method for preparing high-resolution pattern based on self-infiltration-removal of ink droplet Download PDFInfo
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Abstract
The invention belongs to the technical field of spray ink printing and relates to a method for preparing a high-resolution pattern based on self-infiltration-removal of an ink droplet. According to the method, inorganic nano particles, metal nano particles, organic nano particles and polymers are dispersed in a dispersing agent to obtain ink, of which solid content is 0.0000001-70wt percent and which is suitable for a piece of spray ink printing equipment and has the property of infiltration removal; then the obtained ink having the property of infiltration removal is filled in an ink box of the spray ink printing equipment; and the ink is sprayed by the spray ink printing equipment to a base material having the property of infiltration removal, so that the dispersing agent in the ink droplet is evaporated. The ink droplet automatically performs infiltration removal while the dispersing agent in the ink droplet is evaporated, so that the volume of the ink droplet on the base material is reduced and the deposition area is reduced, after the dispersing agent in the ink droplet is completely evaporated, the ink droplet on the base material is finally contracted to a small point, in this way, the high-resolution pattern is prepared, and the minimum spot size of the resolution of the obtained spray ink printing pattern ranges from 2nm to 30um.
Description
Technical field
The invention belongs to the inkjet technology field, relate to the preparation method of high resolution design, relate in particular to based on ink droplet is spontaneous and go to soak into the method for preparing high resolution design.
Background technology
In recent years, high resolution design is obtaining concern widely aspect the preparation of high-performance micro semiconductor, electronic device, biosystem.Inkjet technology and becomes one of the most promising patterning preparation method because of advantages such as design convenience, low operation cost because its large tracts of land that can realize complicacy, precise pattern is directly write.Yet,, limited the application of inkjet technology aspect the preparation of high-performance micro element greatly because the restriction of existing common ink-jet printer injection diameter uses the resolution ratio of common ink-jet printer institute print pattern to have only 20～30 μ m.
Mainly comprise following three aspects about the method that improves the inkjet printing pattern resolution at present: the first, improve ink-jet apparatus, through reducing injection diameter or improving ejector principle and improve resolution ratio.(the Nat.Mater. of Rogers seminar in illinois university Urbana branch school; 2007,6,782) developed a kind of electrodynamics inkjet printing principle; They contain charged ink through use, and adopt the shower nozzle in 300nm aperture to obtain 240nm point resolution ratio directly.(the Nature Nanotechnology of Ferraro seminar of Italy CNR institute; 2010,5,429) developed a kind of burnt electrojet technology; They are placed on ink droplet under the burnt electric material; Make the top of ink droplet produce electric field through applying infrared laser or heat point source, induce ink droplet jet to go out the littler sub-ink droplet of diameter thus, use this method can obtain the resolution ratio of diameter as 300nm.The second, change base material, by the physics and/or the chemical confinement effect of base material, sprawling of ink-jet drop of restriction and improve resolution ratio.(the Nat.Mater. of Sirringhau seminar of Cambridge University; 2004,3,171) method through etching obtains narrow hydrophobic pattern on hydrophilic base material; Induce ink droplet to go to soak into by physics and chemical confinement effect, obtain and the be rather narrow breach of width of hydrophobic pattern at hydrophobic region.The 3rd, the adjustment ink is formed.Schubert seminar (J.Mater.Chem., 2007,17 of Holland Ai Ende Huo Wen University of Science and Technology; 677) selected a kind of special stable phase parting material, made the ink droplet instantaneous solidification, limited ink droplet sprawling on base material through heating; Improve resolution ratio, this seminar (Adv.Mater.2008,20; 343) also developed a kind of hot substrate printing technique, stoped it further to sprawl, thereby improved resolution ratio through the curing of quickening ink-jet drop.Though above-mentioned improvement shower nozzle and ejector principle can improve resolution ratio by a relatively large margin, ink-jet apparatus or ejector principle are complicated, and expensive, universality are not strong; And base material treatment improves the etching that resolution ratio needs mask and precision usually, and process is loaded down with trivial details, and cost is higher; The adjustment ink forms that to improve the resolution ratio process simple, but selectable material is less relatively, and the amplitude of the raising resolution ratio of having reported is still little.
Generally, when ink droplet was injected on the base material, drop was sprawled.Because " coffee ring " effect; The three-phase line of contact of ink droplet can be fixed on the base material in the evaporation process; Particle or solute contained in the ink droplet can deposit along three-phase line of contact, cause the inner particle of ink droplet or deposition of solute is inhomogeneous and the some footpath of the final deposition of ink droplet is bigger, and resolution ratio descends.
Summary of the invention
The objective of the invention is to utilize inkjet technology, provide a kind of and go to soak into the method for preparing high resolution design based on ink droplet is spontaneous.
Of the present inventionly go to soak into the method for preparing high resolution design and be based on ink droplet is spontaneous: inorganic nano-particle, metal nanoparticle, organic nano particle or polymer are dispersed in obtain in the suitable dispersant to be applicable to that having of ink jet printing device highly remove infiltrating ink (can further carry out mechanical agitation or ultrasonic dispersion), described to have the solid content that highly goes in the infiltrating ink be 0.0000001～70wt%; Having of will obtaining then highly goes infiltrating ink to be loaded in the print cartridge of common ink jet printing device; Inkjet printing methods according to routine; Through ink jet printing device this ink is injected into to have and highly goes on the infiltrating base material, make the dispersant evaporation in the ink droplet.Spontaneous the going of dispersant in ink droplet ink droplet in evaporation process soaked into; Cause the volume of ink droplet on base material to shrink; Depositional area reduces, and after the dispersant in the ink droplet evaporates, finally is shrunk to a small point; Thereby realize the preparation of high resolution design, the minimum spot size of the resolution ratio of the pattern that obtains can reach 2nm.
The minimum spot size scope of the resolution ratio of the inkjet printing pattern that method of the present invention obtains is 2nm～30 μ m.
The particle diameter of described inorganic nano-particle, metal nanoparticle and organic nano particle all is 2～1500nm.
Described inorganic nano-particle is selected from one or more in hydrophily Nano particles of silicon dioxide, hydrophobic silica nano particle, titanium dioxide nano-particle, CdSe nano-particle, vulcanized lead nano particle, cadmium telluride nano particle, indium phosphide nano particle, ferriferrous oxide nano-particle and the zinc oxide nano-particle.
Described metal nanoparticle is selected from a kind of in golden nanometer particle, Nano silver grain and the copper nano-particle.
Described organic nano particle is selected from one or more in commercially available polymethyl methacrylate nano particle, polyurethane nano particle, sulfate polystyrene nanoparticle, carboxylic acid group's polystyrene nanoparticle and the aminopolystyrene nano particle.
Described polymer is preferably polyethylene glycol, polyvinyl alcohol, novolac polymer, polyurethane, polyacrylic acid, styrene-propene acid block copolymer, poly 2 vinyl pyridine, styrene-2-vinylpyridine block copolymer or gathers (2-methoxyl group-5-(2-ethyl hexyl oxy)-1,4-phenylene ethylene).
Described dispersant is preferably selected from one or more in ethanol, toluene, isopropyl alcohol, water, glycol dimethyl ether, ethylene glycol and the glycerine.
Described have the aluminium flake that the quartz plate that highly goes infiltrating base material to be preferably polyethylene film, polypropylene screen, polystyrene film, polychloroethylene film, polymethyl methacrylate film, PETG (PET) film, dimethyl silicone polymer (PDMS) film, poly tetrafluoroethylene, hydrophobization to handle, mica sheet that hydrophobization is handled, sheet glass that hydrophobization is handled, silicon chip that hydrophobization is handled or hydrophobization handle (described hydrophobization Treatment Technology scheme can be referring to [Adv.Funct.Mater.; 2011; 21,3297]).
The condition of described evaporation is 5～40 ℃ of scopes in temperature preferably, and relative humidity is to evaporate under 20%～60% scope.
Described ink jet printing device is preferably piezoelectric ink jet printer or industry point colloid system etc., and the aperture of the shower nozzle in piezoelectric ink jet printer or the industry point colloid system is preferably 25 μ m, 50 μ m or 150 μ m.
The present invention has infiltrating base material through the concentration and the selection of regulation and control ink, realized ink droplet go fully soak into, obtain the high resolution design that minimum spot size can reach 2nm.
After the ink that the present invention adopts is injected on the base material; Under certain evaporation conditions; A little less than the interaction owing to inorganic nano-particle, metal nanoparticle, organic nano particle or polymer contained in the ink droplet and base material; And the ink droplet meniscus imposes on the bigger active force of inorganic nano-particle, metal nanoparticle, organic nano particle or polymer; Cause ink droplet in evaporation process, its three-phase line of contact is unfixing, and inorganic nano-particle, metal nanoparticle, organic nano particle or polymer contained in the ink droplet are along with three-phase line of contact moves to the ink droplet center; Finally be deposited as small point, realized the preparation of high-resolution ink-jet printing pattern in the ink droplet center.Method of the present invention is simple to operate, and universality is strong, and is with low cost, and the preparation of high-resolution, high performance little pattern and micro element is had important directive significance.
Description of drawings
Fig. 1. the minimum spot size of the resolution ratio of the pattern that the embodiment of the invention 14 obtains (diameter) is the dot matrix pattern of 2nm.
The specific embodiment
Embodiment 1
At room temperature (25 ℃) are that the hydrophobic silica nano particle of 20nm is scattered in the mixed solution of water and glycerine with particle diameter, and water is 2: 1 with the mass fraction ratio of glycerine.The content of hydrophobic silica nano particle in the mixed solution of water and glycerine is 5wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of industry point colloid system having of obtaining, being equipped with the aperture is the Picodot shower nozzle of 150 μ m.Ink is 20 ℃ in temperature on spray arriving poly tetrafluoroethylene from shower nozzle, and relative humidity is under 20% the environment, the water in the ink droplet to be evaporated with glycerine.Water in the ink droplet and glycerine spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.The hydrophobic silica nano particle moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and glycerine evaporated, obtaining by the diameter that numerous hydrophobic silica nano particles deposition forms was the high resolution design that the point of 30 μ m constitutes.
Embodiment 2
At room temperature (25 ℃) are that the hydrophily Nano particles of silicon dioxide of 30nm is scattered in the water with particle diameter.The content of hydrophily Nano particles of silicon dioxide in water is 5wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of industry point colloid system having of obtaining, being equipped with the aperture is the Picodot shower nozzle of 150 μ m.Ink is 5 ℃ in temperature on spray arriving poly tetrafluoroethylene from shower nozzle, and relative humidity is under 30% the environment, to make the water evaporation in the ink droplet.Water in the ink droplet spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.The hydrophily Nano particles of silicon dioxide moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water evaporated, obtaining by the diameter that numerous hydrophily Nano particles of silicon dioxide deposition forms was the high resolution design that the point of 15 μ m constitutes.
Embodiment 3
At room temperature (25 ℃) are that the titanium dioxide nano-particle of 50nm is scattered in the mixed solution of water and isopropyl alcohol with particle diameter, and water is 3: 1 with the mass fraction ratio of isopropyl alcohol.The content of titanium dioxide nano-particle in the mixed solution of water and isopropyl alcohol is 0.0002wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of industry point colloid system having of obtaining, being equipped with the aperture is the Picodot shower nozzle of 25 μ m.Ink is 10 ℃ in temperature on spray arriving poly tetrafluoroethylene from shower nozzle, and relative humidity is under 60% the environment, the water in the ink droplet to be evaporated with isopropyl alcohol.Water in the ink droplet and isopropyl alcohol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.Titanium dioxide nano-particle moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and isopropyl alcohol evaporated, obtaining by the diameter that numerous titanium dioxide nano-particles deposition forms was the high resolution design that the point of 3 μ m constitutes.
Embodiment 4
At room temperature (25 ℃); With particle diameter is that the titanium dioxide nano-particle of 200nm and hydrophily Nano particles of silicon dioxide that particle diameter is 100nm are scattered in the mixed solution of water and glycol dimethyl ether; Wherein: titanium dioxide nano-particle is 1: 1 with the mass fraction ratio of hydrophily Nano particles of silicon dioxide, and water is 3: 1 with the mass fraction ratio of glycol dimethyl ether.Titanium dioxide nano-particle and the content of hydrophily Nano particles of silicon dioxide in the mixed solution of water and glycol dimethyl ether are 0.0005wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of industry point colloid system having of obtaining, being equipped with the aperture is the Picodot shower nozzle of 50 μ m.Ink is 40 ℃ in temperature on spray arriving poly tetrafluoroethylene from shower nozzle, and relative humidity is under 60% the environment, the water in the ink droplet to be evaporated with glycol dimethyl ether.Water in the ink droplet and glycol dimethyl ether spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.Titanium dioxide nano-particle and hydrophily Nano particles of silicon dioxide move to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and glycol dimethyl ether evaporated, obtaining by the diameter that numerous titanium dioxide nano-particles and hydrophily Nano particles of silicon dioxide deposition forms was the high resolution design that the point of 10 μ m constitutes.
Embodiment 5
At room temperature (25 ℃) are that the ferriferrous oxide nano-particle of 200nm is scattered in the mixed solution of water, glycerine with particle diameter, and water is 3: 2 with the mass fraction ratio of glycerine.The content of ferriferrous oxide nano-particle in the mixed solution of water and glycerine is 0.0005wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of industry point colloid system having of obtaining, being equipped with the aperture is the Picodot shower nozzle of 50 μ m.Ink is 40 ℃ in temperature on spray arriving poly tetrafluoroethylene from shower nozzle, and relative humidity is under 60% the environment, the water in the ink droplet to be evaporated with glycerine.Water in the ink droplet and glycerine spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.Ferriferrous oxide nano-particle moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and glycerine evaporated, obtaining by the diameter that numerous ferriferrous oxide nano-particles deposition forms was the high resolution design that the point of 10 μ m constitutes.
Embodiment 6
At room temperature (25 ℃) are that the sulfate polystyrene nanoparticle of 100nm is scattered in the mixed solution of water and ethylene glycol with particle diameter, and water is 4: 3 with the mass fraction ratio of ethylene glycol.The content of sulfate polystyrene nanoparticle in the mixed solution of water and ethylene glycol is 3wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of industry point colloid system having of obtaining, being equipped with the aperture is the Picodot shower nozzle of 50 μ m.Ink is 10 ℃ in temperature on spray arriving polystyrene film from shower nozzle, and relative humidity is under 45% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on polystyrene film to shrink, and depositional area reduces.The sulfate polystyrene nanoparticle moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporated, obtaining by the diameter that numerous sulfate polystyrene nanoparticles deposition forms was the high resolution design that the point of 7 μ m constitutes.
Embodiment 7
At room temperature (25 ℃) are that the sulfate polystyrene nanoparticle of 150nm is scattered in the mixed solution of water and ethylene glycol with particle diameter, and water is 4: 3 with the mass fraction ratio of ethylene glycol.The content of sulfate polystyrene nanoparticle in the mixed solution of water and ethylene glycol is 0.000002wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of industry point colloid system having of obtaining, being equipped with the aperture is the Picodot shower nozzle of 25 μ m.Ink is 10 ℃ in temperature on spray arriving polystyrene film from shower nozzle, and relative humidity is under 45% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on polystyrene film to shrink, and depositional area reduces.The sulfate polystyrene nanoparticle moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporated, obtaining by the diameter that numerous sulfate polystyrene nanoparticles deposition forms was the high resolution design that the point of 800nm constitutes.
Embodiment 8
At room temperature (25 ℃); With particle diameter is that the sulfate polystyrene nanoparticle of 1500nm and carboxylic acid group's polystyrene nanoparticle that particle diameter is 1500nm are scattered in the mixed solution of water and ethylene glycol; Wherein: the sulfate polystyrene nanoparticle is 1: 1 with the mass fraction ratio of carboxylic acid group's polystyrene nanoparticle, and water is 3: 2 with the mass fraction ratio of ethylene glycol.Sulfate polystyrene nanoparticle and the content of carboxylic acid group's polystyrene nanoparticle in the mixed solution of water and ethylene glycol are 0.005wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of commercial printer having of obtaining, the aperture of shower nozzle is 25 μ m.Ink is 40 ℃ in temperature on spray arriving polystyrene film from shower nozzle, and relative humidity is under 60% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on polystyrene film to shrink, and depositional area reduces.Sulfate polystyrene nanoparticle and carboxylic acid group's polystyrene nanoparticle move to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporated, obtaining by the diameter that numerous sulfate polystyrene nanoparticles and carboxylic acid group's polystyrene nanoparticle deposition forms was the high resolution design that the point of 15 μ m constitutes.
Embodiment 9
At room temperature (25 ℃) are scattered in polyethylene glycol in the mixed solution of water and ethylene glycol, and water is 5: 3 with the mass fraction ratio of ethylene glycol.The content of polyethylene glycol in the mixed solution of water and ethylene glycol is 0.00005wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of commercial printer having of obtaining, the aperture of shower nozzle is 25 μ m.Ink spray to arrive on the sheet glass that hydrophobization is handled from shower nozzle, is 25 ℃ in temperature, and relative humidity is under 30% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on the sheet glass of handling through hydrophobization to shrink, and depositional area reduces.Polyethylene glycol moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporated, obtaining by the diameter that numerous polyethylene glycol deposition forms was the high resolution design that the point of 2.5 μ m constitutes.
Embodiment 10
At room temperature (25 ℃) are scattered in polyvinyl alcohol and polyethylene glycol in the mixed solution of water and ethylene glycol, wherein: polyvinyl alcohol is 1: 1 with the mass fraction ratio of polyethylene glycol, and water is 5: 3 with the mass fraction ratio of ethylene glycol.Polyvinyl alcohol and the polyethylene glycol content in the mixed solution of water and ethylene glycol is 0.0002wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of commercial printer having of obtaining, the aperture of shower nozzle is 25 μ m.Ink spray to arrive on the sheet glass that hydrophobization is handled from shower nozzle, is 25 ℃ in temperature, and relative humidity is under 30% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on the sheet glass of handling through hydrophobization to shrink, and depositional area reduces.Polyvinyl alcohol and polyethylene glycol move to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporated, obtaining by the diameter that numerous polyvinyl alcohol and polyethylene glycol deposition forms was the high resolution design that the point of 3 μ m constitutes.
Embodiment 11
At room temperature (25 ℃) are scattered in polyurethane in the mixed solution of water and ethylene glycol, and wherein water is 5: 3 with the mass fraction ratio of ethylene glycol.The content of polyurethane in the mixed solution of water and ethylene glycol is 70wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of commercial printer having of obtaining, the aperture of shower nozzle is 150 μ m.Ink spray to arrive on the sheet glass that hydrophobization is handled from shower nozzle, is 25 ℃ in temperature, and relative humidity is under 40% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on the sheet glass of handling through hydrophobization to shrink, and depositional area reduces.Polyurethane moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporated, obtaining by the diameter that numerous polyurethane deposition forms was the high resolution design that the point of 30 μ m constitutes.
Embodiment 12
At room temperature (25 ℃), be that the golden nanometer particle of 20nm is scattered in the mixed solution of water and ethylene glycol, wherein with particle diameter: water is 4: 3 with the mass fraction ratio of ethylene glycol.The content of golden nanometer particle in the mixed solution of water and ethylene glycol is 0.0001wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of commercial printer having of obtaining, the aperture of shower nozzle is 25 μ m.Ink spray to arrive on the silicon chip that hydrophobization is handled from shower nozzle, is 40 ℃ in temperature, and relative humidity is under 60% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on the silicon chip of handling through hydrophobization to shrink, and depositional area reduces.Golden nanometer particle moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporated, obtaining by the diameter that numerous golden nanometer particles deposition forms was the high resolution design that the point of 2 μ m constitutes.
Embodiment 13
At room temperature (25 ℃), be that the golden nanometer particle of 10nm is scattered in the mixed solution of water and ethylene glycol, wherein with particle diameter: water is 1: 1 with the mass fraction ratio of ethylene glycol.The content of golden nanometer particle in the mixed solution of water and ethylene glycol is 0.00001wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of commercial printer having of obtaining, the aperture of shower nozzle is 25 μ m.Ink spray to arrive on PETG (PET) film from shower nozzle, is 40 ℃ in temperature, and relative humidity is under 40% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on PETG (PET) film to shrink, and depositional area reduces.Golden nanometer particle moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporated, obtaining by the diameter that numerous golden nanometer particles deposition forms was the high resolution design that the point of 1 μ m constitutes.
Embodiment 14
At room temperature (25 ℃), be that the CdSe nano-particle of 2nm is scattered in the mixed solution of water and ethylene glycol, wherein with particle diameter: water is 4: 3 with the mass fraction ratio of ethylene glycol.The content of CdSe nano-particle in the mixed solution of water and ethylene glycol is 0.0000001wt%.Ultrasonic 30 minutes, obtain to have highly to remove infiltrating ink.Highly go infiltrating ink to be loaded in the print cartridge of commercial printer having of obtaining, the aperture of shower nozzle is 25 μ m.Ink spray to arrive on the silicon chip that hydrophobization is handled from shower nozzle, is 40 ℃ in temperature, and relative humidity is under 60% the environment, the water in the ink droplet to be evaporated with ethylene glycol.Water in the ink droplet and ethylene glycol spontaneous going in evaporation process soaked into, and causes the volume of ink droplet on the silicon chip of handling through hydrophobization to shrink, and depositional area reduces.CdSe nano-particle moves to the ink droplet center along with moving of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, obtain being the high resolution design that the point of 2nm constitutes by the diameter that single CdSe nano-particle deposition forms, as shown in Figure 1.
Claims (7)
1. one kind is gone to soak into the method for preparing high resolution design based on ink droplet is spontaneous; It is characterized in that: inorganic nano-particle, metal nanoparticle, organic nano particle or polymer dispersed are obtained the ink that solid content is 0.0000001～70wt% in dispersant; Then the ink that obtains is loaded in the print cartridge of ink jet printing device; Through ink jet printing device this ink is injected into and has on the infiltrating base material; Spontaneous the going of dispersant in ink droplet ink droplet in evaporation process soaked into, and realizes the preparation of high resolution design, and the minimum spot size scope of the resolution ratio of the inkjet printing pattern that obtains is 2nm～30 μ m;
Described dispersant is selected from one or more in ethanol, toluene, isopropyl alcohol, water, glycol dimethyl ether, ethylene glycol and the glycerine.
2. method according to claim 1 is characterized in that: the particle diameter of described inorganic nano-particle, metal nanoparticle and organic nano particle all is 2～1500nm.
3. method according to claim 1 and 2 is characterized in that: described inorganic nano-particle is selected from one or more in hydrophily Nano particles of silicon dioxide, hydrophobic silica nano particle, titanium dioxide nano-particle, CdSe nano-particle, vulcanized lead nano particle, cadmium telluride nano particle, indium phosphide nano particle, ferriferrous oxide nano-particle and the zinc oxide nano-particle;
Described metal nanoparticle is selected from a kind of in golden nanometer particle, Nano silver grain and the copper nano-particle;
Described organic nano particle is selected from one or more in polymethyl methacrylate nano particle, polyurethane nano particle, sulfate polystyrene nanoparticle, carboxylic acid group's polystyrene nanoparticle and the aminopolystyrene nano particle.
4. method according to claim 1; It is characterized in that: described polymer is polyethylene glycol, polyvinyl alcohol, novolac polymer, polyurethane, polyacrylic acid, styrene-propene acid block copolymer, poly 2 vinyl pyridine, styrene-2-vinylpyridine block copolymer or gathers (2-methoxyl group-5-(2-ethyl hexyl oxy)-1,4-phenylene ethylene).
5. method according to claim 1 is characterized in that: described have an aluminium flake that infiltrating base material is the quartz plate handled of polyethylene film, polypropylene screen, polystyrene film, polychloroethylene film, polymethyl methacrylate film, PETG film, dimethyl silicone polymer film, poly tetrafluoroethylene, hydrophobization, hydrophobization is handled mica sheet, sheet glass that hydrophobization is handled, silicon chip that hydrophobization is handled or hydrophobization are handled.
6. method according to claim 1 is characterized in that: the condition of described evaporation is to be 5～40 ℃ of scopes in temperature, and relative humidity is to evaporate under 20%～60% scope.
7. method according to claim 1 is characterized in that: described ink jet printing device is piezoelectric ink jet printer or industry point colloid system, and the aperture of the shower nozzle in piezoelectric ink jet printer or the industry point colloid system is 25 μ m, 50 μ m or 150 μ m.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103666094A (en) * | 2013-11-18 | 2014-03-26 | 蚌埠天光传感器有限公司 | Refractory printing ink and preparation method thereof |
| CN108569059A (en) * | 2018-03-06 | 2018-09-25 | 中国科学院化学研究所 | Braille printing product and preparation method thereof |
| WO2020168590A1 (en) * | 2019-02-18 | 2020-08-27 | 中国科学院化学研究所 | 3d printing device, and method for preparing 3d printed structure |
| CN112480741A (en) * | 2020-11-27 | 2021-03-12 | 江苏唐彩新材料科技股份有限公司 | High-resolution aqueous flexographic printing ink |
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| CN103666094A (en) * | 2013-11-18 | 2014-03-26 | 蚌埠天光传感器有限公司 | Refractory printing ink and preparation method thereof |
| CN103666094B (en) * | 2013-11-18 | 2016-06-15 | 蚌埠天光传感器有限公司 | A kind of printing-ink and its preparation method |
| CN108569059A (en) * | 2018-03-06 | 2018-09-25 | 中国科学院化学研究所 | Braille printing product and preparation method thereof |
| WO2020168590A1 (en) * | 2019-02-18 | 2020-08-27 | 中国科学院化学研究所 | 3d printing device, and method for preparing 3d printed structure |
| CN112480741A (en) * | 2020-11-27 | 2021-03-12 | 江苏唐彩新材料科技股份有限公司 | High-resolution aqueous flexographic printing ink |
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| CN102627028B (en) | 2014-10-15 |
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