CN102627028B - Method for preparing high-resolution pattern based on self-infiltration-removal of ink droplet - Google Patents

Method for preparing high-resolution pattern based on self-infiltration-removal of ink droplet Download PDF

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CN102627028B
CN102627028B CN201210088347.7A CN201210088347A CN102627028B CN 102627028 B CN102627028 B CN 102627028B CN 201210088347 A CN201210088347 A CN 201210088347A CN 102627028 B CN102627028 B CN 102627028B
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ink droplet
water
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CN102627028A (en
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邝旻翾
王京霞
宋延林
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Institute of Chemistry CAS
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Abstract

The invention belongs to the technical field of spray ink printing and relates to a method for preparing a high-resolution pattern based on self-infiltration-removal of an ink droplet. According to the method, inorganic nano particles, metal nano particles, organic nano particles and polymers are dispersed in a dispersing agent to obtain ink, of which solid content is 0.0000001-70wt percent and which is suitable for a piece of spray ink printing equipment and has the property of infiltration removal; then the obtained ink having the property of infiltration removal is filled in an ink box of the spray ink printing equipment; and the ink is sprayed by the spray ink printing equipment to a base material having the property of infiltration removal, so that the dispersing agent in the ink droplet is evaporated. The ink droplet automatically performs infiltration removal while the dispersing agent in the ink droplet is evaporated, so that the volume of the ink droplet on the base material is reduced and the deposition area is reduced, after the dispersing agent in the ink droplet is completely evaporated, the ink droplet on the base material is finally contracted to a small point, in this way, the high-resolution pattern is prepared, and the minimum spot size of the resolution of the obtained spray ink printing pattern ranges from 2nm to 30um.

Description

Based on the spontaneous method of going infiltration to prepare high resolution design of ink droplet
Technical field
The invention belongs to inkjet technology field, relate to the preparation method of high resolution design, relate in particular to based on the spontaneous method of going infiltration to prepare high resolution design of ink droplet.
Background technology
In recent years, high resolution design is obtaining concern widely aspect the preparation of high-performance micro semiconductor, electronic device, biosystem.Inkjet technology is because its large area that can realize complexity, precise pattern is directly write, and becomes one of the most promising patterning preparation method because of advantages such as design convenience, low operation cost.Yet, due to the restriction of existing common ink-jet printer injection diameter, use the resolution ratio of common ink-jet printer institute print pattern to only have 20~30 μ m, limited greatly the application of inkjet technology aspect the preparation of high-performance micro element.
About improving the method for inkjet printing pattern resolution, mainly comprise following three aspects at present: the first, improve ink-jet apparatus, by reducing injection diameter or improving ejector principle and improve resolution ratio.(the Nat.Mater. of Rogers seminar in illinois university Urbana branch school, 2007,6,782) developed a kind of electrodynamics inkjet printing principle, they contain charged ink by use, and the shower nozzle in employing 300nm aperture has obtained the resolution ratio in 240nm point footpath.(the Nature Nanotechnology of Ferraro seminar of Italy CNR institute, 2010,5,429) developed a kind of burnt electrojet technology, they are placed on ink droplet under burnt electric material, by applying infrared laser or heat point source, make the top of ink droplet produce electric field, induce thus ink droplet to eject the sub-ink droplet that diameter is less, use the method can obtain the resolution ratio that diameter is 300nm.The second, change base material, by physics and/or the chemical confinement effect of base material, sprawling of ink-jet drop of restriction and improve resolution ratio.(the Nat.Mater. of Sirringhau seminar of Cambridge University, 2004,3,171) method by etching obtains narrow hydrophobic pattern on hydrophilic base material, by physics and chemistry confinement effect induction ink droplet, at hydrophobic region, go to infiltrate, obtain and the be rather narrow breach of width of hydrophobic pattern.The 3rd, adjust ink and form.(the J.Mater.Chem. of Schubert seminar of Holland Ai Ende Huo Wen University of Science and Technology, 2007,17,677) selected a kind of special stable phase parting material, by heating, make ink droplet instantaneous solidification, limit ink droplet sprawling on base material, improved resolution ratio, (the Adv.Mater.2008 of this seminar, 20,343) also developed a kind of hot substrate printing technique, by accelerate ink-jet drop curing prevention its further sprawl, thereby improve resolution ratio.Although above-mentioned improvement shower nozzle and ejector principle can improve resolution ratio by a relatively large margin, ink-jet apparatus or ejector principle are complicated, somewhat expensive, and universality is not strong; And base material treatment raising resolution ratio needs mask and accurate etching conventionally, process is loaded down with trivial details, and cost is higher; Adjusting ink, to form to improve resolution ratio process simple, but selectable material is relatively less, and reported to put forward high-resolution amplitude still little.
Generally, when ink droplet is injected on base material, drop is sprawled.Due to " coffee ring " effect, in evaporation process, the three-phase line of contact of ink droplet can be fixed on base material, particle or solute contained in ink droplet can deposit along three-phase line of contact, cause the particle of ink droplet inside or deposition of solute is inhomogeneous and the some footpath of the final deposition of ink droplet is larger, and resolution ratio declines.
Summary of the invention
The object of the invention is to utilize inkjet technology, provide a kind of based on the spontaneous method of going infiltration to prepare high resolution design of ink droplet.
Of the present inventionly based on ink droplet is spontaneous, goes to infiltrate method prepare high resolution design and be: inorganic nano-particle, metal nanoparticle, organic nano particle or polymer are dispersed in suitable dispersant to acquisition and are applicable to having of ink jet printing device and highly remove infiltrating ink (can further carry out mechanical agitation or ultrasonic dispersion), the described solid content highly going in infiltrating ink that has is 0.0000001~70wt%; Then by having in the print cartridge that highly goes infiltrating ink to be loaded on common ink jet printing device of obtaining, according to conventional inkjet printing methods, by ink jet printing device, this ink is injected into have and highly goes on infiltrating base material, make the dispersant evaporation in ink droplet.Spontaneous the going of dispersant in ink droplet ink droplet in evaporation process infiltrates, cause the volume of ink droplet on base material to shrink, depositional area reduces, after dispersant in ink droplet evaporates, finally be shrunk to a small point, thereby realize the preparation of high resolution design, the minimum spot size of the resolution ratio of the pattern obtaining can reach 2nm.
The minimum spot size scope of the resolution ratio of the inkjet printing pattern that method of the present invention obtains is 2nm~30 μ m.
The particle diameter of described inorganic nano-particle, metal nanoparticle and organic nano particle is all 2~1500nm.
Described inorganic nano-particle is selected from one or more in hydrophily Nano particles of silicon dioxide, hydrophobic silica nano particle, titanium dioxide nano-particle, CdSe nano-particle, PbS nanoparticle, cadmium telluride nano particles, indium phosphide nano particle, ferriferrous oxide nano-particle and zinc oxide nano-particle.
Described metal nanoparticle is selected from a kind of in golden nanometer particle, Nano silver grain and copper nano-particle.
Described organic nano particle is selected from one or more in commercially available polymethyl methacrylate nano particle, polyurethane nano particle, sulfate polystyrene nanoparticle, carboxylic acid group's polystyrene nanoparticle and aminopolystyrene nano particle.
Described polymer is preferably polyethylene glycol, polyvinyl alcohol, novolac polymer, polyurethane, polyacrylic acid, Styrene And Chloroalkyl Acrylates block copolymer, poly 2 vinyl pyridine, styrene-2-vinylpyridine block copolymer or gathers (2-methoxyl group-5-(2-ethyl hexyl oxy)-Isosorbide-5-Nitrae-phenylene ethylene).
Described dispersant is preferably selected from one or more in ethanol, toluene, isopropyl alcohol, water, glycol dimethyl ether, ethylene glycol and glycerine.
Described have highly go infiltrating base material to be preferably quartz plate that polyethylene film, polypropylene screen, polystyrene film, polychloroethylene film, polymethyl methacrylate film, PETG (PET) film, dimethyl silicone polymer (PDMS) film, poly tetrafluoroethylene, hydrophobization process, the mica sheet that hydrophobization is processed, the sheet glass that hydrophobization is processed (technical scheme processed of described hydrophobization can be referring to [Adv.Funct.Mater., the aluminium flake that the silicon chip that hydrophobization is processed or hydrophobization are processed, 2011,21,3297]).
The condition of described evaporation is preferably 5~40 ℃ of scopes in temperature, and relative humidity is to evaporate under 20%~60% scope.
Described ink jet printing device is preferably piezoelectric ink jet printer or industrial sites colloid system etc., and the aperture of the shower nozzle in piezoelectric ink jet printer or industrial sites colloid system is preferably 25 μ m, 50 μ m or 150 μ m.
The present invention has infiltrating base material by concentration and the selection of regulation and control ink, realized ink droplet go completely infiltrate, obtain the high resolution design that minimum spot size can reach 2nm.
After the ink that the present invention adopts is injected on base material, under certain evaporation conditions, due to inorganic nano-particle contained in ink droplet, metal nanoparticle, a little less than the interaction of organic nano particle or polymer and base material, and ink droplet meniscus imposes on inorganic nano-particle, metal nanoparticle, the active force that organic nano particle or polymer are larger, cause ink droplet in evaporation process, its three-phase line of contact is unfixing, contained inorganic nano-particle in ink droplet, metal nanoparticle, organic nano particle or polymer are along with three-phase line of contact moves to ink droplet center, finally in ink droplet center, be deposited as small point, realized the preparation of high-resolution ink-jet printing pattern.Method of the present invention is simple to operate, and universality is strong, with low cost, and the preparation of high-resolution, high performance micro-pattern and micro element is had to important directive significance.
Accompanying drawing explanation
Fig. 1. the minimum spot size of the resolution ratio of the pattern that the embodiment of the present invention 14 obtains (diameter) is the dot matrix pattern of 2nm.
The specific embodiment
Embodiment 1
At room temperature (25 ℃), the hydrophobic silica nano particle that is 20nm by particle diameter is scattered in the mixed solution of water and glycerine, and water is 2: 1 with the mass fraction ratio of glycerine.The content of hydrophobic silica nano particle in the mixed solution of water and glycerine is 5wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on industrial sites colloid system of obtaining, being equipped with aperture is the Picodot shower nozzle of 150 μ m.Ink sprays and arrives poly tetrafluoroethylene from shower nozzle, in temperature, is 20 ℃, under the environment that relative humidity is 20%, makes water and glycerine evaporation in ink droplet.Water in ink droplet and glycerine spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.Hydrophobic silica nano particle moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and glycerine evaporate, the diameter that obtains being formed by numerous hydrophobic silica nano particle depositions is the high resolution design that the point of 30 μ m forms.
Embodiment 2
At room temperature (25 ℃), the hydrophily Nano particles of silicon dioxide that is 30nm by particle diameter is scattered in water.The content of hydrophily Nano particles of silicon dioxide in water is 5wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on industrial sites colloid system of obtaining, being equipped with aperture is the Picodot shower nozzle of 150 μ m.Ink sprays and arrives poly tetrafluoroethylene from shower nozzle, in temperature, is 5 ℃, under the environment that relative humidity is 30%, makes the water evaporation in ink droplet.Water in ink droplet spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.Hydrophily Nano particles of silicon dioxide moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water evaporates, the diameter that obtains being formed by numerous hydrophily Nano particles of silicon dioxide depositions is the high resolution design that the point of 15 μ m forms.
Embodiment 3
At room temperature (25 ℃), the titanium dioxide nano-particle that is 50nm by particle diameter is scattered in the mixed solution of water and isopropyl alcohol, and water is 3: 1 with the mass fraction ratio of isopropyl alcohol.The content of titanium dioxide nano-particle in the mixed solution of water and isopropyl alcohol is 0.0002wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on industrial sites colloid system of obtaining, being equipped with aperture is the Picodot shower nozzle of 25 μ m.Ink sprays and arrives poly tetrafluoroethylene from shower nozzle, in temperature, is 10 ℃, under the environment that relative humidity is 60%, makes water and isopropyl alcohol evaporation in ink droplet.Water in ink droplet and isopropyl alcohol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.Titanium dioxide nano-particle moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and isopropyl alcohol evaporate, the diameter that obtains being formed by numerous titanium dioxide nano-particle depositions is the high resolution design that the point of 3 μ m forms.
Embodiment 4
At room temperature (25 ℃), the titanium dioxide nano-particle that is 200nm by particle diameter and particle diameter are that the hydrophily Nano particles of silicon dioxide of 100nm is scattered in the mixed solution of water and glycol dimethyl ether, wherein: titanium dioxide nano-particle is 1: 1 with the mass fraction ratio of hydrophily Nano particles of silicon dioxide, water is 3: 1 with the mass fraction ratio of glycol dimethyl ether.Titanium dioxide nano-particle and the content of hydrophily Nano particles of silicon dioxide in the mixed solution of water and glycol dimethyl ether are 0.0005wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on industrial sites colloid system of obtaining, being equipped with aperture is the Picodot shower nozzle of 50 μ m.Ink sprays and arrives poly tetrafluoroethylene from shower nozzle, in temperature, is 40 ℃, under the environment that relative humidity is 60%, makes water and glycol dimethyl ether evaporation in ink droplet.Water in ink droplet and glycol dimethyl ether spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.Titanium dioxide nano-particle and hydrophily Nano particles of silicon dioxide move to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and glycol dimethyl ether evaporate, the diameter that obtains being formed by numerous titanium dioxide nano-particles and hydrophily Nano particles of silicon dioxide deposition is the high resolution design that the point of 10 μ m forms.
Embodiment 5
At room temperature (25 ℃), the ferriferrous oxide nano-particle that is 200nm by particle diameter is scattered in the mixed solution of water, glycerine, and water is 3: 2 with the mass fraction ratio of glycerine.The content of ferriferrous oxide nano-particle in the mixed solution of water and glycerine is 0.0005wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on industrial sites colloid system of obtaining, being equipped with aperture is the Picodot shower nozzle of 50 μ m.Ink sprays and arrives poly tetrafluoroethylene from shower nozzle, in temperature, is 40 ℃, under the environment that relative humidity is 60%, makes water and glycerine evaporation in ink droplet.Water in ink droplet and glycerine spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on poly tetrafluoroethylene to shrink, and depositional area reduces.Ferriferrous oxide nano-particle moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and glycerine evaporate, the diameter that obtains being formed by numerous ferriferrous oxide nano-particle depositions is the high resolution design that the point of 10 μ m forms.
Embodiment 6
At room temperature (25 ℃), the sulfate polystyrene nanoparticle that is 100nm by particle diameter is scattered in the mixed solution of water and ethylene glycol, and water is 4: 3 with the mass fraction ratio of ethylene glycol.The content of sulfate polystyrene nanoparticle in the mixed solution of water and ethylene glycol is 3wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on industrial sites colloid system of obtaining, being equipped with aperture is the Picodot shower nozzle of 50 μ m.Ink sprays and arrives polystyrene film from shower nozzle, in temperature, is 10 ℃, under the environment that relative humidity is 45%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on polystyrene film to shrink, and depositional area reduces.Sulfate polystyrene nanoparticle moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the diameter that obtains being formed by numerous sulfate polystyrene nanoparticle depositions is the high resolution design that the point of 7 μ m forms.
Embodiment 7
At room temperature (25 ℃), the sulfate polystyrene nanoparticle that is 150nm by particle diameter is scattered in the mixed solution of water and ethylene glycol, and water is 4: 3 with the mass fraction ratio of ethylene glycol.The content of sulfate polystyrene nanoparticle in the mixed solution of water and ethylene glycol is 0.000002wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on industrial sites colloid system of obtaining, being equipped with aperture is the Picodot shower nozzle of 25 μ m.Ink sprays and arrives polystyrene film from shower nozzle, in temperature, is 10 ℃, under the environment that relative humidity is 45%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on polystyrene film to shrink, and depositional area reduces.Sulfate polystyrene nanoparticle moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the high resolution design that the point that the diameter that obtains being formed by numerous sulfate polystyrene nanoparticle depositions is 800nm forms.
Embodiment 8
At room temperature (25 ℃), carboxylic acid group's polystyrene nanoparticle that the sulfate polystyrene nanoparticle that is 1500nm by particle diameter and particle diameter are 1500nm is scattered in the mixed solution of water and ethylene glycol, wherein: sulfate polystyrene nanoparticle is 1: 1 with the mass fraction ratio of carboxylic acid group's polystyrene nanoparticle, water is 3: 2 with the mass fraction ratio of ethylene glycol.Sulfate polystyrene nanoparticle and the content of carboxylic acid group's polystyrene nanoparticle in the mixed solution of water and ethylene glycol are 0.005wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on commercial printer of obtaining, the aperture of shower nozzle is 25 μ m.Ink sprays and arrives polystyrene film from shower nozzle, in temperature, is 40 ℃, under the environment that relative humidity is 60%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on polystyrene film to shrink, and depositional area reduces.Sulfate polystyrene nanoparticle and carboxylic acid group's polystyrene nanoparticle move to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the diameter that obtains being formed by numerous sulfate polystyrene nanoparticles and carboxylic acid group's polystyrene nanoparticle deposition is the high resolution design that the point of 15 μ m forms.
Embodiment 9
At room temperature (25 ℃), are scattered in polyethylene glycol in the mixed solution of water and ethylene glycol, and water is 5: 3 with the mass fraction ratio of ethylene glycol.The content of polyethylene glycol in the mixed solution of water and ethylene glycol is 0.00005wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on commercial printer of obtaining, the aperture of shower nozzle is 25 μ m.Ink sprays and arrives the sheet glass of processing through hydrophobization from shower nozzle, in temperature, is 25 ℃, under the environment that relative humidity is 30%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on the sheet glass of processing through hydrophobization to shrink, and depositional area reduces.Polyethylene glycol moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the diameter that obtains being formed by numerous polyethylene glycol depositions is the high resolution design that the point of 2.5 μ m forms.
Embodiment 10
At room temperature (25 ℃), are scattered in polyvinyl alcohol and polyethylene glycol in the mixed solution of water and ethylene glycol, wherein: polyvinyl alcohol is 1: 1 with the mass fraction ratio of polyethylene glycol, and water is 5: 3 with the mass fraction ratio of ethylene glycol.Polyvinyl alcohol and the polyethylene glycol content in the mixed solution of water and ethylene glycol is 0.0002wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on commercial printer of obtaining, the aperture of shower nozzle is 25 μ m.Ink sprays and arrives the sheet glass of processing through hydrophobization from shower nozzle, in temperature, is 25 ℃, under the environment that relative humidity is 30%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on the sheet glass of processing through hydrophobization to shrink, and depositional area reduces.Polyvinyl alcohol and polyethylene glycol move to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the diameter that obtains being formed by numerous polyvinyl alcohol and polyethylene glycol deposition is the high resolution design that the point of 3 μ m forms.
Embodiment 11
At room temperature (25 ℃), are scattered in polyurethane in the mixed solution of water and ethylene glycol, and wherein water is 5: 3 with the mass fraction ratio of ethylene glycol.The content of polyurethane in the mixed solution of water and ethylene glycol is 70wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on commercial printer of obtaining, the aperture of shower nozzle is 150 μ m.Ink sprays and arrives the sheet glass of processing through hydrophobization from shower nozzle, in temperature, is 25 ℃, under the environment that relative humidity is 40%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on the sheet glass of processing through hydrophobization to shrink, and depositional area reduces.Polyurethane moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the diameter that obtains being formed by numerous polyurethane depositions is the high resolution design that the point of 30 μ m forms.
Embodiment 12
At room temperature (25 ℃), the golden nanometer particle that is 20nm by particle diameter is scattered in the mixed solution of water and ethylene glycol, wherein: water is 4: 3 with the mass fraction ratio of ethylene glycol.The content of golden nanometer particle in the mixed solution of water and ethylene glycol is 0.0001wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on commercial printer of obtaining, the aperture of shower nozzle is 25 μ m.Ink sprays and arrives the silicon chip of processing through hydrophobization from shower nozzle, in temperature, is 40 ℃, under the environment that relative humidity is 60%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on the silicon chip of processing through hydrophobization to shrink, and depositional area reduces.Golden nanometer particle moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the diameter that obtains being formed by numerous golden nanometer particle depositions is the high resolution design that the point of 2 μ m forms.
Embodiment 13
At room temperature (25 ℃), the golden nanometer particle that is 10nm by particle diameter is scattered in the mixed solution of water and ethylene glycol, wherein: water is 1: 1 with the mass fraction ratio of ethylene glycol.The content of golden nanometer particle in the mixed solution of water and ethylene glycol is 0.00001wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on commercial printer of obtaining, the aperture of shower nozzle is 25 μ m.Ink sprays and arrives PETG (PET) film from shower nozzle, in temperature, is 40 ℃, under the environment that relative humidity is 40%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on PETG (PET) film to shrink, and depositional area reduces.Golden nanometer particle moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the diameter that obtains being formed by numerous golden nanometer particle depositions is the high resolution design that the point of 1 μ m forms.
Embodiment 14
At room temperature (25 ℃), the CdSe nano-particle that is 2nm by particle diameter is scattered in the mixed solution of water and ethylene glycol, wherein: water is 4: 3 with the mass fraction ratio of ethylene glycol.The content of CdSe nano-particle in the mixed solution of water and ethylene glycol is 0.0000001wt%.Ultrasonic 30 minutes, obtain to have and highly remove infiltrating ink.By having in the print cartridge that highly goes infiltrating ink to be loaded on commercial printer of obtaining, the aperture of shower nozzle is 25 μ m.Ink sprays and arrives the silicon chip of processing through hydrophobization from shower nozzle, in temperature, is 40 ℃, under the environment that relative humidity is 60%, makes water and ethylene glycol evaporation in ink droplet.Water in ink droplet and ethylene glycol spontaneous going in evaporation process infiltrates, and causes the volume of ink droplet on the silicon chip of processing through hydrophobization to shrink, and depositional area reduces.CdSe nano-particle moves to ink droplet center along with the movement of three-phase line of contact in the volume contraction process of ink droplet.After water and ethylene glycol evaporate, the high resolution design that the point that the diameter that obtains being formed by single CdSe nano-particle deposition is 2nm forms, as shown in Figure 1.

Claims (4)

1. one kind is gone to infiltrate based on ink droplet is spontaneous the method prepare high resolution design, it is characterized in that: by inorganic nano-particle, metal nanoparticle, organic nano particle or polymer dispersed obtain the ink that solid content is 0.0000001~70wt% in dispersant, then the ink obtaining is loaded in the print cartridge of ink jet printing device, by ink jet printing device, this ink is injected into and is had on infiltrating base material, spontaneous the going of dispersant in ink droplet ink droplet in evaporation process infiltrates, realize the preparation of high resolution design, the minimum spot size scope of the resolution ratio of the inkjet printing pattern obtaining is 2nm~30 μ m,
Described inorganic nano-particle is selected from one or more in hydrophily Nano particles of silicon dioxide, hydrophobic silica nano particle, titanium dioxide nano-particle, CdSe nano-particle, PbS nanoparticle, cadmium telluride nano particles, indium phosphide nano particle, ferriferrous oxide nano-particle and zinc oxide nano-particle;
Described metal nanoparticle is selected from a kind of in golden nanometer particle, Nano silver grain and copper nano-particle;
Described organic nano particle is selected from one or more in polymethyl methacrylate nano particle, polyurethane nano particle, sulfate polystyrene nanoparticle, carboxylic acid group's polystyrene nanoparticle and aminopolystyrene nano particle;
Described polymer is polyethylene glycol, polyvinyl alcohol, novolac polymer, polyurethane, polyacrylic acid, Styrene And Chloroalkyl Acrylates block copolymer, poly 2 vinyl pyridine, styrene-2-vinylpyridine block copolymer or gathers (2-methoxyl group-5-(2-ethyl hexyl oxy)-Isosorbide-5-Nitrae-phenylene ethylene);
The described infiltrating base material that has is polyethylene film, polypropylene screen, polystyrene film, polychloroethylene film, polymethyl methacrylate film, PETG film, PDMS membrane, poly tetrafluoroethylene, the quartz plate that hydrophobization is processed, the mica sheet that hydrophobization is processed, the sheet glass that hydrophobization is processed, the silicon chip of hydrophobization processing or the aluminium flake that hydrophobization is processed;
Described dispersant is selected from one or more in ethanol, toluene, isopropyl alcohol, water, glycol dimethyl ether, ethylene glycol and glycerine.
2. method according to claim 1, is characterized in that: the particle diameter of described inorganic nano-particle, metal nanoparticle and organic nano particle is all 2~1500nm.
3. method according to claim 1, is characterized in that: the condition of described evaporation is to be 5~40 ℃ of scopes in temperature, and relative humidity is to evaporate under 20%~60% scope.
4. method according to claim 1, is characterized in that: described ink jet printing device is piezoelectric ink jet printer or industrial sites colloid system, and the aperture of the shower nozzle in piezoelectric ink jet printer or industrial sites colloid system is 25 μ m, 50 μ m or 150 μ m.
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