CN102605396A - Application of ultrasonic waves in electroplating process - Google Patents

Application of ultrasonic waves in electroplating process Download PDF

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Publication number
CN102605396A
CN102605396A CN2012101128658A CN201210112865A CN102605396A CN 102605396 A CN102605396 A CN 102605396A CN 2012101128658 A CN2012101128658 A CN 2012101128658A CN 201210112865 A CN201210112865 A CN 201210112865A CN 102605396 A CN102605396 A CN 102605396A
Authority
CN
China
Prior art keywords
ultrasonic
electroplating process
ultrasonic waves
cathode
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2012101128658A
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Chinese (zh)
Inventor
何荣贵
代英
何东霖
颜鹏林
申小孟
李付军
伍碧桃
刘兵
曹国良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JI'AN RONGTAI TELECOMMUNICATION TECHNOLOGY Co Ltd
Original Assignee
JI'AN RONGTAI TELECOMMUNICATION TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JI'AN RONGTAI TELECOMMUNICATION TECHNOLOGY Co Ltd filed Critical JI'AN RONGTAI TELECOMMUNICATION TECHNOLOGY Co Ltd
Priority to CN2012101128658A priority Critical patent/CN102605396A/en
Publication of CN102605396A publication Critical patent/CN102605396A/en
Pending legal-status Critical Current

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Abstract

The invention provides an application of ultrasonic waves in an electroplating process. In the electroplating process, an ultrasonic amplitude transformer extends into electroplating liquid for continuous ultrasonic treatment with an ultrasonic power of 400-600 W. The ultrasonic application provided by the invention has the technical effects as follows: the concentrations of metal ions which are close to a cathode are balanced by increasing the current density due to ultrasonic stirring, so that no leakage of the metal ions which are close to the cathode is caused, and the concentration polarization is reduced; and hydrogen on the surface of the cathode is easy to overflow by improving the light intensity, so that the quantity of spurs and needle holes are reduced, and a plated layer with thinner and uniform crystallization grains is obtained. The ultrasonic waves are applied to ultrathin coil foil preparation, so that the surface of a copper foil is flatter, compact and uniform in thickness, the combination between the surface of the copper foil and a base body is good, and the quality of the plated layer is effectively improved. Furthermore, the generation rate of the crystal can be accelerated due to the introduction of the ultrasonic waves, so as to prevent coalescence from occurring. Meanwhile, the structure of the crystal can be modified, so as to improve the properties of the crystal product.

Description

The application of UW in electroplating process
Technical field
The present invention relates to a kind of hyperacoustic application, relate in particular to the application of a kind of UW in electroplating process.
Background technology
Common stirring action in the electroplating process; Move, rotate stirring, mechanical stirring and hand mixing mode etc. such as circulate like negative electrode, all can only reduce near the thickness of the diffusion layer negative electrode to a certain extent, its stirring action can not directly arrive electrode surface; Thereby; Still have certain thickness diffusion layer to exist near the electrode surface, the solution in the diffusion layer remains immobilized, and convection current does not take place.
Summary of the invention
The object of the present invention is to provide the application of a kind of UW in electroplating process, ultrasonic vibration and cavitation phenomenon are equivalent to plating bath has been applied a thundering extremely intensive stirring action.The intense impact ripple that cavitation phenomenon produces acts near the diffusion layer the electrode; Produce the intensive stirring action, this effect has reached electrode surface, makes diffusion layer almost not exist; Improve the effective concentration of metals ion in the electroplate liquid greatly, quickened electrodeposition process.
The present invention realizes like this, in electroplating process, ultrasonic amplitude transformer is stretched into lasting supersound process in the electroplate liquid, and ultrasonic power is 400W~600W.
Technique effect of the present invention is: when adopting ultrasonic stirring, can increase current density, make near the concentration of metal ions of negative electrode balanced, not cause near the metals ion of negative electrode to lack, reduce concentration polarization; Improve luminance brightness, and make the hydrogen of cathode surface be easy to overflow, reduce burr and pin hole, obtain more tiny, the uniform coating of crystalline particle.Using ultrasound ripple in the extra thin copper foil preparation makes copper foil surface more smooth, fine and close, and thickness is even, and is good with matrix bond, improved quality of coating effectively.In addition, hyperacoustic inducing one can be accelerated the crystalline growth velocity, prevents the generation of coalescence, can also change the crystalline structure simultaneously, thereby improves the performance of crystalline product.
Embodiment
Embodiment 1
The present invention realizes like this, in electroplating process, ultrasonic amplitude transformer is stretched into lasting supersound process in the electroplate liquid, and ultrasonic power is 400W.
Embodiment 2
The present invention realizes like this, in electroplating process, ultrasonic amplitude transformer is stretched into lasting supersound process in the electroplate liquid, and ultrasonic power is 500W.
Embodiment 3
The present invention realizes like this, in electroplating process, ultrasonic amplitude transformer is stretched into lasting supersound process in the electroplate liquid, and ultrasonic power is 600W.

Claims (1)

1. the application of UW in electroplating process is characterized in that in electroplating process, ultrasonic amplitude transformer stretched into continue supersound process in the electroplate liquid, and ultrasonic power is 400W~600W.
CN2012101128658A 2012-04-18 2012-04-18 Application of ultrasonic waves in electroplating process Pending CN102605396A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2012101128658A CN102605396A (en) 2012-04-18 2012-04-18 Application of ultrasonic waves in electroplating process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2012101128658A CN102605396A (en) 2012-04-18 2012-04-18 Application of ultrasonic waves in electroplating process

Publications (1)

Publication Number Publication Date
CN102605396A true CN102605396A (en) 2012-07-25

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2012101128658A Pending CN102605396A (en) 2012-04-18 2012-04-18 Application of ultrasonic waves in electroplating process

Country Status (1)

Country Link
CN (1) CN102605396A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103643269A (en) * 2013-11-11 2014-03-19 江西省首诺铜业有限公司 Process of ultrasonic wave electroplating of copper foil
CN103882483A (en) * 2014-04-11 2014-06-25 集美大学 Device and method for making high-reflectance microprism working mold
CN106011962A (en) * 2016-07-13 2016-10-12 中南大学 TSV electroplating method and TSV electroplating system under action of ultrasonic outfield
CN110791789A (en) * 2019-11-26 2020-02-14 湖州努特表面处理科技有限公司 Ultrasonic wave integrated silver plating method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101122044A (en) * 2007-05-16 2008-02-13 深圳清华大学研究院 Nickel-base composite coat containing nano diamond and ultrasound wave auxiliary preparation method thereof
CN101392394A (en) * 2008-10-10 2009-03-25 中南大学 Method for electrodepositing chromium and chromium alloy composite coating through ultrasound-pulse for trivalent chromium plating liquid system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101122044A (en) * 2007-05-16 2008-02-13 深圳清华大学研究院 Nickel-base composite coat containing nano diamond and ultrasound wave auxiliary preparation method thereof
CN101392394A (en) * 2008-10-10 2009-03-25 中南大学 Method for electrodepositing chromium and chromium alloy composite coating through ultrasound-pulse for trivalent chromium plating liquid system

Non-Patent Citations (5)

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Title
何龙等: ""超声波在电镀技术中应用"", 《电镀与精饰》, vol. 33, no. 7, 31 July 2011 (2011-07-31), pages 29 - 34 *
方小红: ""超声波电镀镍及镍基复合镀层的研究进展"", 《材料保护》, vol. 41, no. 5, 31 May 2008 (2008-05-31), pages 58 - 61 *
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王秦生等: ""超声波强化电镀过程及改善镀层质量的机理"", 《金刚石与磨料磨具工程》, no. 4, 31 August 2003 (2003-08-31), pages 32 - 2 *
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103643269A (en) * 2013-11-11 2014-03-19 江西省首诺铜业有限公司 Process of ultrasonic wave electroplating of copper foil
CN103882483A (en) * 2014-04-11 2014-06-25 集美大学 Device and method for making high-reflectance microprism working mold
CN103882483B (en) * 2014-04-11 2016-06-15 集美大学 High reflectance microprism Working mould preparation facilities and its preparation method
CN106011962A (en) * 2016-07-13 2016-10-12 中南大学 TSV electroplating method and TSV electroplating system under action of ultrasonic outfield
CN110791789A (en) * 2019-11-26 2020-02-14 湖州努特表面处理科技有限公司 Ultrasonic wave integrated silver plating method

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Application publication date: 20120725