CN102566334A - Supply system and method of photoresist stripper - Google Patents
Supply system and method of photoresist stripper Download PDFInfo
- Publication number
- CN102566334A CN102566334A CN2012100686159A CN201210068615A CN102566334A CN 102566334 A CN102566334 A CN 102566334A CN 2012100686159 A CN2012100686159 A CN 2012100686159A CN 201210068615 A CN201210068615 A CN 201210068615A CN 102566334 A CN102566334 A CN 102566334A
- Authority
- CN
- China
- Prior art keywords
- photoresistance
- accumulator tank
- treatment facility
- stripper
- pipeline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 17
- 229920002120 photoresistant polymer Polymers 0.000 title abstract description 14
- 239000002699 waste material Substances 0.000 claims abstract description 103
- 239000007788 liquid Substances 0.000 abstract description 20
- 238000012545 processing Methods 0.000 abstract description 7
- 238000010586 diagram Methods 0.000 description 12
- 238000005516 engineering process Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004821 distillation Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000009835 boiling Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Images
Abstract
The invention discloses a supply system and a supply method of a photoresist stripping liquid, wherein the supply system of the photoresist stripping liquid comprises a first storage tank, a second storage tank and a third storage tank, wherein the first storage tank is used for storing and supplying a first photoresist stripping waste liquid; the processing equipment is used for receiving and processing the first photoresist stripping waste liquid from the first storage tank and respectively outputting the photoresist stripping liquid and the second photoresist stripping waste liquid; a second storage tank for storing and outputting the photoresist stripper from the processing equipment; and a third storage tank for storing the second resist stripping waste liquid from the processing apparatus. When the supply system is in the first operation stage, the processing equipment outputs the second photoresist stripping waste liquid to the first storage tank and stops outputting the second photoresist stripping waste liquid to the third storage tank; when the supply system is in the second operation stage, the processing equipment outputs the second waste photoresist stripper to the third storage tank and stops outputting the second waste photoresist stripper to the first storage tank.
Description
Technical field
The present invention relates to a kind of liquid delivery system and Supply Method thereof, and be particularly related to a kind of supply system and Supply Method thereof of photoresistance stripper.
Background technology
In recent years, because that LCD has is in light weight, volume is little and advantage such as low power consumption, so LCD is widely used on various electronic products (for example: TV, mobile phone, notebook computer or Satellite Navigation Set etc.).
The technology of LCD mainly can be divided into thin film transistor (TFT) array (TFT Array) technology, colorized optical filtering (color filter) technology, liquid crystal panel assembling (LC Cell Assembly) and liquid crystal panel module assembling (module Assembly); Wherein in the technology of thin film transistor (TFT) array; On substrate, use photoresist and through processes such as overexposure and developments; On substrate, to form required circuit pattern, unreacted photoresist then uses photoresistance stripper (Stripper) to remove in etch phase.
But because the use amount of photoresistance stripper is big and unit price is high; Therefore; Subtract useless purpose for saving the chemicals consumption and reaching environmental protection, (Stripper Recycle System is SRS) according to the different principle of boiling point substance for present photoresistance stripper reclaimer capable of using; Utilize the distillating method of heating that moisture in the photoresistance stripping waste liquor and photoresistance are removed, use to obtain pure photoresistance stripper and to be fed to etching machine once again.
Yet the organic efficiency of above-mentioned photoresistance stripper reclaimer still has amendatory space.For instance, please with reference to Fig. 1, Fig. 1 is the organic efficiency of present photoresistance stripper reclaimer and the synoptic diagram of time relationship, and wherein the phase run of photoresistance stripper reclaimer can be divided into cold start-up, steady running and shutdown.The described cold start-up stage for example is that photoresistance stripper reclaimer is in the stage that normal temperature and pressure has just been started shooting down.Described steady motion period for example is that photoresistance stripper reclaimer is stablized output photoresistance stripper under the high temperature negative pressure.Described shut-down-phase for example is that the charging storage tank liquid level of working as photoresistance stripper reclaimer has arrived low spot.
As shown in Figure 1; Can find that the organic efficiency of photoresistance stripper reclaimer before time point t1 is relatively poor; That is to say that photoresistance stripper reclaimer is relatively poor in the organic efficiency in cold start-up stage, this reason possibly be because temperature does not reach boiling point substance as yet; So the still spendable photoresistance stripper of suitable vast scale is arranged along with waste liquid is discharged, and causes photoresistance stripper organic efficiency to descend and the problem of wasting.
Summary of the invention
The present invention proposes a kind of photoresistance stripper supply system and Supply Method thereof, through the configuration of pipeline and the allotment of operation valve, adapting to different phase runs, and promotes the organic efficiency of photoresistance stripper.
The supply system of the photoresistance stripper of embodiments of the invention comprises first accumulator tank, treatment facility, second accumulator tank and the 3rd accumulator tank.First accumulator tank is in order to store and to supply the first photoresistance stripping waste liquor.Treatment facility is connected with first accumulator tank, and described treatment facility is in order to receive and to handle the first photoresistance stripping waste liquor, to export the photoresistance stripper and the second photoresistance stripping waste liquor respectively.Second accumulator tank is connected with treatment facility, and described second accumulator tank is in order to store and to export the photoresistance stripper from treatment facility.The 3rd accumulator tank is connected with treatment facility; And described the 3rd accumulator tank is in order to store the second photoresistance stripping waste liquor from treatment facility; Wherein when first phase run; Treatment facility is exported second photoresistance stripping waste liquor to the first accumulator tank, and stops to export the second photoresistance stripping waste liquor to the, three accumulator tanks.When second phase run, treatment facility is exported the second photoresistance stripping waste liquor to the, three accumulator tanks, and stops to export second photoresistance stripping waste liquor to the first accumulator tank.
In addition, the Supply Method of photoresistance stripper of the present invention comprises the following steps: at first, and the supply system of photoresistance stripper is provided, and comprises first accumulator tank, treatment facility, second accumulator tank and the 3rd accumulator tank.Described first accumulator tank is in order to store and to supply the first photoresistance stripping waste liquor; Described treatment facility is in order to receive and to handle the first photoresistance stripping waste liquor; And the output photoresistance stripper and the second photoresistance stripping waste liquor; Described second accumulator tank is in order to store the photoresistance stripper of treatment facility output, and described the 3rd accumulator tank is in order to store the second photoresistance stripping waste liquor of treatment facility output; Then, when first phase run, treatment facility is exported second photoresistance stripping waste liquor to the first accumulator tank, and stops to export the second photoresistance stripping waste liquor to the, three accumulator tanks; And when second phase run, treatment facility is exported the second photoresistance stripping waste liquor to the, three accumulator tanks, and stops to export second photoresistance stripping waste liquor to the first accumulator tank.
In sum; Photoresistance stripper supply system of the present invention and Supply Method thereof; Through the configuration of pipeline and the allotment of operation valve; So that the treatment facility of photoresistance stripper supply system can repeatedly carry out circular treatment to the first photoresistance stripping waste liquor when first phase run,, and then promote the organic efficiency of photoresistance stripper supply system so that photoresistance stripper supply system can recovery obtain the photoresistance stripper of higher proportion from the first photoresistance stripping waste liquor.
For let above-mentioned and other purposes of the present invention, feature and advantage can be more obviously understandable, hereinafter is special lifts preferred embodiment, and conjunction with figs., elaborates as follows.
Description of drawings
Fig. 1 is depicted as organic efficiency and the synoptic diagram of time relationship of the photoresistance stripper reclaimer of known technology.
Fig. 2 A is depicted as the photoresistance stripper supply system of the first embodiment of the present invention in the synoptic diagram of first phase run.
Fig. 2 B is depicted as the photoresistance stripper supply system of the first embodiment of the present invention in the synoptic diagram of second phase run.
Fig. 3 A is depicted as the photoresistance stripper supply system of the second embodiment of the present invention in the synoptic diagram of first phase run.
Fig. 3 B is depicted as the photoresistance stripper supply system of the second embodiment of the present invention in the synoptic diagram of second phase run.
Fig. 4 A is depicted as the photoresistance stripper supply system of the third embodiment of the present invention in the synoptic diagram of first phase run.
Fig. 4 B is depicted as the photoresistance stripper supply system of the third embodiment of the present invention in the synoptic diagram of second phase run.
Fig. 5 is depicted as the flow chart of steps of the photoresistance stripper Supply Method of embodiments of the invention.
Fig. 6 is depicted as organic efficiency and the synoptic diagram of time relationship of the photoresistance stripper reclaimer of embodiments of the invention.
Wherein, description of reference numerals is following:
10 first accumulator tanks
12 first photoresistance stripping waste liquors
120 first pipelines
122 second pipelines
124 the 3rd pipelines
126 the 4th pipelines
128 the 5th pipelines
20 treatment facilities
22 photoresistance strippers
24 second photoresistance stripping waste liquors
200 photoresistance stripper supply systems
30 second accumulator tanks
300 photoresistance stripper supply systems
40 the 3rd accumulator tanks
400 photoresistance stripper supply systems
50 first operation valves
52 second operation valves
The t1 time point
The t2 time point
The V1 operation valve
The V2 operation valve
The V3 operation valve
The V4 operation valve
S501～S505 steps flow chart explanation
Embodiment
Please with reference to Fig. 2 A, Fig. 2 A is that the photoresistance stripper supply system of the first embodiment of the present invention is in the synoptic diagram of first phase run.Shown in Fig. 2 A, the photoresistance stripper supply system 200 of the first embodiment of the present invention includes first accumulator tank 10, treatment facility 20, second accumulator tank 30 and the 3rd accumulator tank 40.Wherein, treatment facility 20 is connected with first accumulator tank 10, second accumulator tank 30 and the 3rd accumulator tank 40 respectively.
Low liquid level sensor (not shown) can be set in first accumulator tank 10; And in the storage liquid level of the first photoresistance stripping waste liquor 12 of first accumulator tank 10 be less than or equal to liquid level sensor the position is set the time; The message prompting operating personnel that give a warning perhaps send control signal and stop treatment facility 20.Likewise; Height/low liquid level sensor (not shown) can be set in second accumulator tank 30; And in the storage liquid level of the photoresistance stripper 22 of second accumulator tank 30 be less than or equal to liquid level sensor the position is set the time; The message prompting operating personnel that give a warning perhaps receive/replenish new photoresistance stripper by another pipeline (not shown); In the storage liquid level of the photoresistance stripper 22 of second accumulator tank 30 be greater than or equal to high liquid level sensor (not shown) the position is set the time; The message prompting operating personnel give a warning; Perhaps send control signal and stop treatment facility 20, with the problem of avoiding photoresistance stripper supply system 200 to take place when machine.
Furtherly, second accumulator tank 30 is connected with treatment facility 20 through second pipeline 122, and the 4th pipeline 126 connects first accumulator tank 10 and second pipeline 122, and first operation valve 50 is arranged at the connection of second pipeline 122 and the 4th pipeline 126.First operation valve 50 for example is manual or automatic T-valve.First operation valve 50 can connect the controller (not shown), and through controller control first operation valve 50 unlatching, close or switch in the path.The 3rd accumulator tank 40 is connected with treatment facility 20 through the 3rd pipeline 124, and the 5th pipeline 128 connects first accumulator tank 10 and the 3rd pipeline 124.Second operation valve 52 is arranged at the connection of the 3rd pipeline 124 and the 5th pipeline 128.Second operation valve 52 for example is manual or automatic T-valve.Second operation valve 52 can connect the controller (not shown), and through controller control second operation valve 52 unlatching, close or switch in the path.
Following general description photoresistance stripper supply system 200 is in the running situation of first phase run.At first, the first photoresistance stripping waste liquor 12 in first accumulator tank 10 is delivered to treatment facility 20 through first pipeline 120.Then; 20 pairs first photoresistance stripping waste liquors of treatment facility 12 carry out (the for example heating of impurity separating treatment; Be preferably distillation), after removing impurities such as photoresistance and moisture in the first photoresistance stripping waste liquor 12, and then isolate the photoresistance stripper 22 and the second photoresistance stripping waste liquor 24.Then, the second photoresistance stripping waste liquor 24 is delivered to first accumulator tank 10 through the 5th pipeline 128, and circulates according to this up to getting into second phase run.
What deserves to be mentioned is; Because the organic efficiency of first phase run in the known technology is relatively poor; So the embodiment of the invention is when first phase run; The second photoresistance stripping waste liquor 24 is delivered to first accumulator tank 10 through the 5th pipeline 128, and in first phase run, treatment facility 20 stops to carry the second photoresistance stripping waste liquor, 24 to the 3rd accumulator tanks 40.Reclaim the organic efficiency that recycle design can further promote first phase run through planting thus.In addition; Also optionally photoresistance stripper 22 is delivered to first accumulator tank 10 through the 4th pipeline 126 in an embodiment of the present invention; And stop to carry photoresistance stripper 22 to second accumulator tanks 30, change excessive with the composition of avoiding the first photoresistance stripping waste liquor 22 in first accumulator tank 10.But be not limited thereto, in first phase run, also can make treatment facility carry photoresistance stripper 22 to second accumulator tanks 30, and photoresistance stripper 22 is not delivered to first accumulator tank 10 through the 4th pipeline 126.Subsidiary one carries, and also the flowmeter (not shown) can be set in each above-mentioned pipeline, and through the monitoring of computer system (not shown) or write down the data such as flow value, force value of each pipeline, with the state of further long-range each operation valve of adjustment.
Please with reference to Fig. 2 B, Fig. 2 B is that the photoresistance stripper supply system of the first embodiment of the present invention is in the synoptic diagram of second phase run.Shown in Fig. 2 B; When the temperature of the heated first photoresistance stripping waste liquor 12 arrives a predetermined temperature in treatment facility 20; Then photoresistance stripper supply system 200 gets into second phase run by first phase run; And described predetermined temperature can for example be 80 ℃ to 100 ℃, preferably is about 90 ℃.In other words, before predetermined temperature arrived, photoresistance stripper supply system 200 was in first phase run.
Following general description photoresistance stripper supply system 200 is in the running situation of second phase run.At first, the first photoresistance stripping waste liquor 12 in first accumulator tank 10 is delivered to treatment facility 20 through first pipeline 120.Then; 20 pairs first photoresistance stripping waste liquors of treatment facility 12 carry out (the for example heating of impurity separating treatment; Be preferably distillation), after removing impurities such as photoresistance and moisture in the first photoresistance stripping waste liquor 12, and then isolate the photoresistance stripper 22 and the second photoresistance stripping waste liquor 24.Then, photoresistance stripper 22 is delivered to second accumulator tank 30 through second pipeline 122, and the second photoresistance stripping waste liquor 24 is delivered to the 3rd accumulator tank 40 through the 3rd pipeline 124, and circulates according to this up to getting into shut-down-phase.
Furtherly; The first embodiment of the present invention is when second phase run; Treatment facility 20 is delivered to second accumulator tank 30 with photoresistance stripper 22 through second pipeline 122, and the second photoresistance stripping waste liquor 24 is delivered to the 3rd accumulator tank 40 through the 3rd pipeline 124.In addition, in second phase run, treatment facility 20 stops to carry photoresistance stripper 22 to first accumulator tanks 10 and stops to carry the second photoresistance stripping waste liquor, 24 to first accumulator tanks 10.
In the second embodiment of the present invention; Shown in Fig. 3 A; Photoresistance stripper supply system 300 can be cancelled the setting of first operation valve 50 and second operation valve 52; And change a plurality of operation valve V1～V4 into; Be arranged at second pipeline 122, the 4th pipeline 126, the 3rd pipeline 124 and the 5th pipeline 128 respectively, with through these operation valves V1～V4 whether being communicated with of control and treatment equipment 20 and 30 of second accumulator tanks, treatment facility 20 and 10 of first accumulator tanks, treatment facility 20 and 40 of the 3rd accumulator tanks and treatment facility 20 and 10 of first accumulator tanks respectively.For instance; When first phase run; Operation valve V1 and operation valve V3 are respectively dissengaged positions; Be delivered to second accumulator tank 30 and stop the second photoresistance stripping waste liquor 24 to be delivered to the 3rd accumulator tank 40 with prevention photoresistance stripper 22, and operation valve V2 and operation valve V4 are respectively conducting state, so that the photoresistance stripper 22 and the second photoresistance stripping waste liquor 24 are delivered to first accumulator tank 10.Shown in Fig. 3 B; When second phase run; Operation valve V1 and operation valve V3 are respectively conducting state; So that photoresistance stripper 22 is delivered to second accumulator tank 30 and make the second photoresistance stripping waste liquor 24 be delivered to the 3rd accumulator tank 40, and operation valve V2 and operation valve V4 are respectively dissengaged positions, are delivered to first accumulator tank 10 to stop the photoresistance stripper 22 and the second photoresistance stripping waste liquor 24.
In the third embodiment of the present invention; Shown in Fig. 4 A; Photoresistance stripper supply system 400 can make the 4th pipeline 126 or the 5th pipeline 128 direct connection processing equipment 20 and first accumulator tanks 10; Make the 4th pipeline 126 be connected in treatment facility 20, perhaps make the 5th pipeline 128 be connected in treatment facility 20 through the 3rd pipeline 124 of part through second pipeline 122 of part.And a plurality of operation valve V1～V4 are arranged at second pipeline 122, the 4th pipeline 126, the 3rd pipeline 124 and the 5th pipeline 128 respectively.For instance; When first phase run; Operation valve V1 and operation valve V3 are respectively dissengaged positions; Be delivered to second accumulator tank 30 and stop the second photoresistance stripping waste liquor 24 to be delivered to the 3rd accumulator tank 40 with prevention photoresistance stripper 22, and operation valve V2 and operation valve V4 are respectively conducting state, so that the photoresistance stripper 22 and the second photoresistance stripping waste liquor 24 are delivered to first accumulator tank 10.Shown in Fig. 4 B; When second phase run; Operation valve V1 and operation valve V3 are respectively conducting state; So that photoresistance stripper 22 is delivered to second accumulator tank 30 and make the second photoresistance stripping waste liquor 24 be delivered to the 3rd accumulator tank 40, and operation valve V2 and operation valve V4 are respectively dissengaged positions, are delivered to first accumulator tank 10 to stop the photoresistance stripper 22 and the second photoresistance stripping waste liquor 24.
Next, please with reference to Fig. 5, Fig. 5 is the flow chart of steps of the photoresistance stripper Supply Method of the first embodiment of the present invention.For convenience of description, can consult Fig. 2 A, Fig. 2 B and Fig. 5 in the lump.At first; In step S501; The supply system 200 of photoresistance stripper is provided, comprise first accumulator tank 10 that stores and supply the first photoresistance stripping waste liquor 12, receive and handle the first photoresistance stripping waste liquor 12 with the treatment facility 20 of output photoresistance stripper 22 and the second photoresistance stripping waste liquor 24, store second accumulator tank 30 and the 3rd accumulator tank 40 that stores the second photoresistance stripping waste liquor 24 that treatment facility 20 exports of the photoresistance stripper 22 of treatment facility 20 outputs.
As stated, first accumulator tank 10 is connected with treatment facility 20 through first pipeline 120.In addition, first accumulator tank 10 also is connected with second pipeline 122 through the 4th pipeline 126, and is connected with the 3rd pipeline 124 through the 5th pipeline 128.Described treatment facility 20 is connected with second accumulator tank 30 through second pipeline 122, and treatment facility 20 also is connected with the 3rd accumulator tank 40 through the 3rd pipeline 124.And first operation valve 50 is arranged at the junction of second pipeline 122 and the 4th pipeline 126, and second operation valve 52 is arranged at the junction of the 3rd pipeline 124 and the 5th pipeline 128.
Next, in step S503, when first phase run, the treatment facility 20 outputs second photoresistance stripping waste liquor 24 to first accumulator tanks 10, and stop to export the second photoresistance stripping waste liquor, 24 to the 3rd accumulator tanks 40.In addition, when first phase run, treatment facility 20 is also optionally exported photoresistance stripper 22 to first accumulator tanks 10, and stops to export photoresistance stripper 22 to second accumulator tanks 30.
Then, in step S505, when second phase run, the treatment facility 20 outputs second photoresistance stripping waste liquor 24 to the 3rd accumulator tanks 40, and stop to export the second photoresistance stripping waste liquor, 24 to first accumulator tanks 10.In addition, in another embodiment of embodiments of the invention, when second phase run, treatment facility 20 is also exported photoresistance stripper 22 to second accumulator tanks 30, and stops to export photoresistance stripper 22 to first accumulator tanks 10.In addition; But the treatment facility 20 heat treated first photoresistance stripping waste liquor 12; When the temperature of the heated first photoresistance stripping waste liquor 12 arrives a predetermined temperature in treatment facility 20; Then get into second phase run, and described predetermined temperature can for example be 80 ℃ to 100 ℃, preferably be about 90 ℃ by first phase run.
Please with reference to Fig. 6, Fig. 6 is organic efficiency and the synoptic diagram of time relationship of the photoresistance stripper reclaimer of embodiments of the invention.As shown in Figure 6, embodiments of the invention are when first phase run, and the organic efficiency of photoresistance stripper supply system 200 before time point t1 is promoted to about 90%; And when second phase run; Organic efficiency between time point t1 and time point t2 also is about 90%, and described time point t1 is according to the difference of the specification type of treatment facility, for example; Be about 4 hours to 6 hours, but be not limited thereto.That is to say; The treatment facility 20 of photoresistance stripper supply system 200 reaches when stablizing in treatment temperature; Just supply the second photoresistance stripping waste liquor 24 to the 3rd accumulator tanks 40; Too much callable photoresistance stripper is expelled to the problem of the 3rd accumulator tank 40 with the second photoresistance stripping waste liquor 24 in the known technology to improve, and then promotes the organic efficiency of photoresistance stripper supply system 200.
In sum; Photoresistance stripper supply system of the present invention and Supply Method thereof; Through the configuration of pipeline and the allotment of operation valve; So that the treatment facility of photoresistance stripper supply system can repeatedly carry out circular treatment to the first photoresistance stripping waste liquor when first phase run,, and then promote the organic efficiency of photoresistance stripper supply system so that photoresistance stripper supply system can recovery obtain the photoresistance stripper of higher proportion from the first photoresistance stripping waste liquor.
Though the present invention discloses as above with preferred embodiment; Right its is not in order to limit the present invention; Any those skilled in the art; Do not breaking away from the spirit and scope of the present invention, when can doing many changes and change, so protection scope of the present invention is as the criterion when looking the scope that the claims of enclosing define.
Claims (14)
1. the supply system of a photoresistance stripper comprises:
One first accumulator tank is in order to store and to supply one first photoresistance stripping waste liquor;
One treatment facility is connected with this first accumulator tank, and this treatment facility receives and handles this first photoresistance stripping waste liquor, to export a photoresistance stripper and one second photoresistance stripping waste liquor respectively;
One second accumulator tank is connected with this treatment facility, and this second accumulator tank is in order to store and to export this photoresistance stripper from this treatment facility; And
One the 3rd accumulator tank is connected with this treatment facility, and the 3rd accumulator tank is in order to store this second photoresistance stripping waste liquor from this treatment facility;
Wherein when one first phase run, this treatment facility is exported this second photoresistance stripping waste liquor to this first accumulator tank, and stops to export this second photoresistance stripping waste liquor to the 3rd accumulator tank; When one second phase run, these these second photoresistance stripping waste liquor to the, three accumulator tanks of treatment facility output, and stop to export this second photoresistance stripping waste liquor to this first accumulator tank.
2. the supply system of photoresistance stripper as claimed in claim 1; Wherein when this first phase run; This treatment facility is also exported this photoresistance stripper to this first accumulator tank, and stops to export this photoresistance stripper to this second accumulator tank, when this second phase run; This treatment facility is also exported this photoresistance stripper to this second accumulator tank, and stops to export this photoresistance stripper to this first accumulator tank.
3. the supply system of photoresistance stripper as claimed in claim 1; Wherein this treatment facility heats this first photoresistance stripping waste liquor; When the temperature of heated this first photoresistance stripping waste liquor arrives a predetermined temperature in this treatment facility; Then get into this second phase run, and this predetermined temperature is between 80 ℃～100 ℃ by this first phase run.
4. the supply system of photoresistance stripper as claimed in claim 3, wherein this predetermined temperature is about 90 ℃.
5. the supply system of photoresistance stripper as claimed in claim 1 comprises:
One first pipeline connects this first accumulator tank and this treatment facility;
One second pipeline connects this treatment facility and this second accumulator tank;
One the 3rd pipeline connects this treatment facility and the 3rd accumulator tank;
One the 4th pipeline connects this first accumulator tank and this treatment facility; And
One the 5th pipeline connects this first accumulator tank and this treatment facility.
6. the supply system of photoresistance stripper as claimed in claim 5; Wherein the 4th pipeline also is connected in this second pipeline; The 5th pipeline also is connected in the 3rd pipeline; The 4th pipeline is connected in this treatment facility through this second pipeline of part, and the 5th pipeline is connected in this treatment facility through the 3rd pipeline of part.
7. the supply system of photoresistance stripper as claimed in claim 6 also comprises an operation valve, is arranged at this second pipeline and the 4th pipeline connection, perhaps, is arranged at the 3rd pipeline and the 5th pipeline connection.
8. the supply system of photoresistance stripper as claimed in claim 7, wherein this operation valve is a T-valve.
9. the supply system of photoresistance stripper as claimed in claim 5 also comprises an operation valve, is arranged at this second pipeline, the 3rd pipeline, the 4th pipeline or the 5th pipeline.
10. like the supply system of claim 7 or 9 described photoresistance strippers, also comprise a controller, this controller connects this operation valve to control the keying of this operation valve.
11. the Supply Method of a photoresistance stripper includes the following step:
The supply system of one photoresistance stripper is provided, comprises one first accumulator tank, to store and to supply one first photoresistance stripping waste liquor; One treatment facility receiving and to handle this first photoresistance stripping waste liquor, and is exported a photoresistance stripper and one second photoresistance stripping waste liquor; One second accumulator tank is to store this photoresistance stripper of this treatment facility output; One the 3rd accumulator tank is to store this second photoresistance stripping waste liquor of this treatment facility output;
When one first phase run, this treatment facility is exported this second photoresistance stripping waste liquor to this first accumulator tank, and stops to export this second photoresistance stripping waste liquor to the 3rd accumulator tank; And
When one second phase run, this treatment facility is exported this second photoresistance stripping waste liquor to the 3rd accumulator tank, and stops to export this second photoresistance stripping waste liquor to this first accumulator tank.
12. the Supply Method of photoresistance stripper as claimed in claim 11; Wherein when this first phase run; This treatment facility is also exported this photoresistance stripper to this first accumulator tank, and stops to export this photoresistance stripper to this second accumulator tank, when this second phase run; This treatment facility is also exported this photoresistance stripper to this second accumulator tank, and stops to export this photoresistance stripper to this first accumulator tank.
13. the Supply Method of photoresistance stripper as claimed in claim 11; Wherein this treatment facility heats this first photoresistance stripping waste liquor; When the temperature of heated this first photoresistance stripping waste liquor arrives a predetermined temperature in this treatment facility; Then get into this second phase run, and this predetermined temperature is between 80 ℃～100 ℃ by this first phase run.
14. the Supply Method of photoresistance stripper as claimed in claim 13, wherein this predetermined temperature is about 90 ℃.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100148436A TWI535494B (en) | 2011-12-23 | 2011-12-23 | Photoresist removing solution supply system and method thereof |
| TW100148436 | 2011-12-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102566334A true CN102566334A (en) | 2012-07-11 |
| CN102566334B CN102566334B (en) | 2014-03-12 |
Family
ID=46412041
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210068615.9A Expired - Fee Related CN102566334B (en) | 2011-12-23 | 2012-03-14 | Supply system and method of photoresist stripper |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102566334B (en) |
| TW (1) | TWI535494B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105118770A (en) * | 2015-08-25 | 2015-12-02 | 武汉华星光电技术有限公司 | Stripping liquid supply system |
| WO2024000828A1 (en) * | 2022-06-30 | 2024-01-04 | 福建天甫电子材料有限公司 | Automatic batching system for production of photoresist stripping liquid, and batching method therefor |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1208362A (en) * | 1996-01-12 | 1999-02-17 | 希巴特殊化学控股公司 | Method of filtering the organic solutions arising in the production of circuit boards |
| WO1999059693A1 (en) * | 1998-05-19 | 1999-11-25 | Phoenankh Corp. | Apparatus and method for recovering photoresist developers and strippers |
| JP2001194807A (en) * | 1999-01-29 | 2001-07-19 | Matsushita Environment Airconditioning Eng Co Ltd | Reproducing method and device of stripping solution |
| JP2007051340A (en) * | 2005-08-18 | 2007-03-01 | Kurita Water Ind Ltd | Sulfuric acid recycle type persulfuric acid feeder |
| WO2009031731A1 (en) * | 2007-09-05 | 2009-03-12 | Korex Corporation | Method and apparatus for recycling photoresist stripper waste |
| CN101689480A (en) * | 2007-07-03 | 2010-03-31 | 东亚合成株式会社 | System for continuously using resist stripper liquid based on nanofiltration |
-
2011
- 2011-12-23 TW TW100148436A patent/TWI535494B/en not_active IP Right Cessation
-
2012
- 2012-03-14 CN CN201210068615.9A patent/CN102566334B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1208362A (en) * | 1996-01-12 | 1999-02-17 | 希巴特殊化学控股公司 | Method of filtering the organic solutions arising in the production of circuit boards |
| WO1999059693A1 (en) * | 1998-05-19 | 1999-11-25 | Phoenankh Corp. | Apparatus and method for recovering photoresist developers and strippers |
| JP2001194807A (en) * | 1999-01-29 | 2001-07-19 | Matsushita Environment Airconditioning Eng Co Ltd | Reproducing method and device of stripping solution |
| JP2007051340A (en) * | 2005-08-18 | 2007-03-01 | Kurita Water Ind Ltd | Sulfuric acid recycle type persulfuric acid feeder |
| CN101689480A (en) * | 2007-07-03 | 2010-03-31 | 东亚合成株式会社 | System for continuously using resist stripper liquid based on nanofiltration |
| WO2009031731A1 (en) * | 2007-09-05 | 2009-03-12 | Korex Corporation | Method and apparatus for recycling photoresist stripper waste |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105118770A (en) * | 2015-08-25 | 2015-12-02 | 武汉华星光电技术有限公司 | Stripping liquid supply system |
| CN105118770B (en) * | 2015-08-25 | 2017-12-26 | 武汉华星光电技术有限公司 | One kind peels off liquid supply system |
| WO2024000828A1 (en) * | 2022-06-30 | 2024-01-04 | 福建天甫电子材料有限公司 | Automatic batching system for production of photoresist stripping liquid, and batching method therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102566334B (en) | 2014-03-12 |
| TWI535494B (en) | 2016-06-01 |
| TW201325738A (en) | 2013-07-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105185330B (en) | A kind of display device and driving method | |
| CN109436804B (en) | Carrying method and carrying system for display panel | |
| CN102339264B (en) | A kind of satellite borne electronic system equipment plug and play control method and system | |
| CN102566334B (en) | Supply system and method of photoresist stripper | |
| EP2788624B1 (en) | Pump using multi voltage electronics with run dry and over current protection | |
| CN104104763A (en) | Detection device and detection method for mainboard type of mobile terminal | |
| CN102902337B (en) | Power supply switching system, computer system and restarting control method thereof | |
| US20210021136A1 (en) | Dual-battery charging and discharging method and apparatus, terminal, and storage medium | |
| CN109410824A (en) | Display device drive system and display-apparatus driving method | |
| CN106111389A (en) | Optical cable water-blocking cable cream atomization intermittent spray device | |
| CN104778140B (en) | System and method are connected in the USB automatic identification of starlike framework | |
| CN104538335A (en) | Method for prolonging service life of etching solution and increasing yield in copper wire manufacture procedure and copper wire etching device | |
| CN104045242B (en) | The engraving method of glass substrate and etching infuser device | |
| CN105977186B (en) | Wet-method etching device and its explosion-proof method | |
| CN201601137U (en) | Novel heating temperature control system of solar energy silicon wafer cleaning wool making | |
| CN106663962A (en) | Power supply control device and information processing device | |
| CN101604195A (en) | The system and method for cooling supercomputer | |
| CN108211839A (en) | Nitration mixture equipment | |
| JP5385924B2 (en) | Separation and recovery method of glass and transparent electrode material from liquid crystal panel | |
| CN206751472U (en) | A kind of electronics industry waste water acid recovery system | |
| CN109637494A (en) | Driving method, the power supply IC, display device of display control circuit | |
| US20160243594A1 (en) | Discharge Method and Device of Washing Chamber | |
| CN116540792B (en) | Flow automatic control method and system for preparation of oxalic acid ITO etching solution | |
| CN204074597U (en) | A kind of Wafer Cleaning wastewater recycling system | |
| CN105138443A (en) | CAN bus information monitoring method based on Feiteng processor |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140312 Termination date: 20210314 |