CN102515566A - Magnetron sputtering self-cleaning glass with visible light response, and preparation method thereof - Google Patents
Magnetron sputtering self-cleaning glass with visible light response, and preparation method thereof Download PDFInfo
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- CN102515566A CN102515566A CN201110348492XA CN201110348492A CN102515566A CN 102515566 A CN102515566 A CN 102515566A CN 201110348492X A CN201110348492X A CN 201110348492XA CN 201110348492 A CN201110348492 A CN 201110348492A CN 102515566 A CN102515566 A CN 102515566A
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Abstract
The invention discloses a magnetron sputtering self-cleaning glass with visible light response. The glass is characterized in that a magnetron sputtering method is adopted to plate a functional thin film on the surface of the glass, wherein the functional thin film has a self-cleaning function under the visible light, and the functional thin film is a modified nanometer titanium dioxide thin film. The purpose of the invention is to overcome the defects in the prior art, and provide the magnetron sputtering self-cleaning glass with the visible light response, wherein the transmissivity of the glass is high, the binding force of the film plating layer and the glass substrate is strong, the film plating layer is compact and uniform, and the glass has the self-cleaning function under the visible light. The invention further provides a preparation method for the magnetron sputtering self-cleaning glass with the visible light response.
Description
[technical field]
The present invention relates to a kind of visible light-responded magnetron sputtering self-cleaning glass that has, the invention still further relates to a kind of preparation method with visible light-responded magnetron sputtering self-cleaning glass.
[background technology]
Glass is in the production in the present age and life, to play the part of important role, and glass is all used in the many places of the door and window automotive window of buildings and windshield glass or the like, brings a lot of convenience for production and life.Glass is put for a long time with extraneous and is contacted, and is made dirty by contamination by dust extremely easily.The back transmitance of glass making dirty will reduce, thereby influences translucent effect, and the bonding force of the coatings of existing coated glass and glass baseplate is weak, coatings is loose, inhomogeneous.
[summary of the invention]
The present invention seeks to overcome the deficiency of prior art; Provide a kind of transmitance high; The bonding force of coatings and glass baseplate is strong, coatings is fine and close, even; Under visible light, have the visible light-responded magnetron sputtering self-cleaning glass of having of self-cleaning function, the present invention also provides a kind of preparation method with visible light-responded magnetron sputtering self-cleaning glass.
The present invention realizes through following technical scheme:
A kind of have a visible light-responded magnetron sputtering self-cleaning glass, it is characterized in that: be coated with at glass surface through magnetron sputtering method and reach the function film that under visible light, has self-cleaning function, described function film is a modified nano-titanium dioxide thin film.
Aforesaid have a visible light-responded magnetron sputtering self-cleaning glass, it is characterized in that: be provided with one deck nano tin dioxide between described glass surface and the described function film.
Aforesaid have a visible light-responded magnetron sputtering self-cleaning glass, and it is characterized in that: described function film and described nano tin dioxide interlayer are provided with one deck nanometer titanium dioxide silicon film.
The preparation method with visible light-responded magnetron sputtering self-cleaning glass that a kind of claim is above-mentioned is characterized in that comprising the steps:
(1) preparation sputter titanium oxide hybrid target: in titanium oxide, add five Tungsten oxide 99.999s, mix the back and adopt pyrolytic coating;
(2) preparation tin target is cast in making tin target on the stainless steel tube with tin fusing back with the indium binding;
(3) the preparation silicon target adopts hot spray process, by weight being Si: Al (98: 2) preparation silicon target;
(4) oven dry glass surface utilizes deionized water to clean with horizontal cleaning machine and the oven dry glass surface;
(5) utilize magnetron sputtering method at glass surface sputter tin dioxide thin film, adopt oxygen partial pressure control, adopting argon oxygen mol ratio is 1: 2 reactive sputtering, generates tin dioxide thin film;
(6) the sputter silica membrane utilizes magnetron sputtering method, adopts oxygen partial pressure control, and argon oxygen mol ratio is 1: 2.5 reactive sputtering, generates silica membrane;
(7) sputter titanium deoxid film, on large-area coating film equipment, with the titanium oxide hybrid target that is mixed with five Tungsten oxide 99.999s that two Rotating Double cathode sputtering steps (1) prepare, sputtering atmosphere is argon gas and oxygen, Ar/O in molar ratio
2Be 25: 1, obtain oozing the titanium deoxid film that five Tungsten oxide 99.999s are arranged.
Aforesaid preparation method is characterized in that: the tin dioxide thin film thickness that generates in the step (5) is 18～22nm.
Aforesaid preparation method is characterized in that: the silica membrane thickness that generates in the step (6) is 13～17nm.
Aforesaid preparation method is characterized in that: sputtering power is 70KW in the step (7), and sputtering rate is 5m/min, and the sputter reaction pressure is 4 * 10
-3Mbar.
Aforesaid preparation method is characterized in that: it is 30～50nm that oozing of generating in the step (7) has the titanium deoxid film of five Tungsten oxide 99.999s thickness.
Compared with prior art, the present invention has following advantage:
Advantages such as the bonding force of coatings and glass baseplate is strong, coatings is fine and close, even.
1, the present invention's modified nano-titanium dioxide thin film of adopting magnetron sputtering method will under visible light, have self-cleaning function sputters on the glass baseplate, under visible light, has self-cleaning function, and the bonding force of coatings and glass baseplate is strong, coatings is fine and close, even.Can make member outside face automatically cleaning, be difficult for contaminatedly, keep clean easily.Can make the external surface of structural member automatically cleaning.
2, this present invention glass has higher visible light transmissivity.
[description of drawings]
Fig. 1 is a process flow sheet of the present invention.
[embodiment]
A kind of have a visible light-responded magnetron sputtering self-cleaning glass, is coated with at glass surface through magnetron sputtering method to reach the function film that under visible light, has self-cleaning function, and described function film is a modified nano-titanium dioxide thin film.
Be provided with one deck nano tin dioxide between described glass surface and the described function film.
Described function film and described nano tin dioxide interlayer are provided with one deck nanometer titanium dioxide silicon film.
A kind of preparation method with visible light-responded magnetron sputtering self-cleaning glass is characterized in that comprising the steps:
(8) preparation sputter titanium oxide hybrid target: in titanium oxide, add five Tungsten oxide 99.999s, mix the back and adopt pyrolytic coating;
(9) preparation tin target is cast in making tin target on the stainless steel tube with tin fusing back with the indium binding;
(10) the preparation silicon target adopts hot spray process, by weight being Si: Al (98: 2) preparation silicon target, to improve the electroconductibility of silicon target;
(11) utilize deionized water to clean with horizontal cleaning machine and the oven dry glass surface;
(12) utilize magnetron sputtering method at glass surface sputter tin dioxide thin film, adopt oxygen partial pressure control, adopting argon oxygen mol ratio is 1: 2 reactive sputtering, generates tin dioxide thin film;
(13) utilize magnetron sputtering method, adopt oxygen partial pressure control, argon oxygen mol ratio is 1: 2.5 reactive sputtering, generates silica membrane; The thin stack of film through above-mentioned two-layer different refractivity improves transmitance.
(14) on large-area coating film equipment, with the titanium oxide hybrid target that is mixed with five Tungsten oxide 99.999s that two Rotating Double cathode sputtering steps (1) prepare, sputtering atmosphere is argon gas and oxygen, Ar/O in molar ratio
2Be 25: 1, obtain oozing the titanium deoxid film that five Tungsten oxide 99.999s are arranged.
The tin dioxide thin film thickness that generates in the step (5) is 18～22nm, the preferred 20nm of tin dioxide thin film thickness.
The silica membrane thickness that generates in the step (6) is 13～17nm.Silica membrane thickness is preferred 15nm.
Sputtering power is 70KW in the step (7), and sputtering rate is 5m/min, and the sputter reaction pressure is 4 * 10
-3Mbar.
It is 30～50nm that oozing of generating in the step (7) has the titanium deoxid film of five Tungsten oxide 99.999s thickness.
The modified nano-titanium dioxide thin film that the present invention adopts magnetron sputtering method will under visible light, have self-cleaning function sputters on the glass baseplate, under visible light, has self-cleaning function, and the bonding force of coatings and glass baseplate is strong, coatings is fine and close, even.Can make member outside face automatically cleaning, be difficult for contaminatedly, keep clean easily.Can make the external surface of structural member automatically cleaning.This present invention glass has higher visible light transmissivity.
Claims (8)
1. one kind has visible light-responded magnetron sputtering self-cleaning glass, it is characterized in that: be coated with at glass surface through magnetron sputtering method and reach the function film that under visible light, has self-cleaning function, described function film is a modified nano-titanium dioxide thin film.
2. according to claim 1 have a visible light-responded magnetron sputtering self-cleaning glass, it is characterized in that: be provided with one deck nano tin dioxide between described glass surface and the described function film.
3. according to claim 2 have a visible light-responded magnetron sputtering self-cleaning glass, and it is characterized in that: described function film and described nano tin dioxide interlayer are provided with one deck nanometer titanium dioxide silicon film.
4. the described preparation method with visible light-responded magnetron sputtering self-cleaning glass of claim 3 is characterized in that comprising the steps:
(1) preparation sputter titanium oxide hybrid target: in titanium oxide, add five Tungsten oxide 99.999s, mix the back and adopt pyrolytic coating;
(2) preparation tin target is cast in making tin target on the stainless steel tube with tin fusing back with the indium binding;
(3) the preparation silicon target adopts hot spray process, by weight being Si: Al (98: 2) preparation silicon target;
(4) oven dry glass surface utilizes deionized water to clean with horizontal cleaning machine and the oven dry glass surface;
(5) utilize magnetron sputtering method at glass surface sputter tin dioxide thin film, adopt oxygen partial pressure control, adopting argon oxygen mol ratio is 1: 2 reactive sputtering, generates tin dioxide thin film;
(6) the sputter silica membrane utilizes magnetron sputtering method, adopts oxygen partial pressure control, and argon oxygen mol ratio is 1: 2.5 reactive sputtering, generates silica membrane;
(7) sputter titanium deoxid film, on large-area coating film equipment, with the titanium oxide hybrid target that is mixed with five Tungsten oxide 99.999s that two Rotating Double cathode sputtering steps (1) prepare, sputtering atmosphere is argon gas and oxygen, Ar/O in molar ratio
2Be 25: 1, obtain oozing the titanium deoxid film that five Tungsten oxide 99.999s are arranged.
5. preparation method according to claim 4 is characterized in that: the tin dioxide thin film thickness that generates in the step (5) is 18～22nm.
6. preparation method according to claim 4 is characterized in that: the silica membrane thickness that generates in the step (6) is 13～17nm.
7. preparation method according to claim 4 is characterized in that: sputtering power is 70KW in the step (7), and sputtering rate is 5m/min, and the sputter reaction pressure is 4 * 10
-3Mbar.
8. preparation method according to claim 4 is characterized in that: it is 30～50nm that oozing of generating in the step (7) has the titanium deoxid film of five Tungsten oxide 99.999s thickness.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 201110348492 CN102515566B (en) | 2011-11-07 | 2011-11-07 | Preparation method of magnetron sputtering self-cleaning glass with visible light response |
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| CN 201110348492 CN102515566B (en) | 2011-11-07 | 2011-11-07 | Preparation method of magnetron sputtering self-cleaning glass with visible light response |
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| CN102515566B CN102515566B (en) | 2013-10-30 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105463247A (en) * | 2015-12-03 | 2016-04-06 | 江阴恩特莱特镀膜科技有限公司 | Alloy for binding target and manufacturing method and application of alloy |
| CN117210155A (en) * | 2023-09-15 | 2023-12-12 | 精一门(常州)光学薄膜有限公司 | Self-cleaning anti-pollution energy-saving film for building and preparation method thereof |
| CN117210155B (en) * | 2023-09-15 | 2024-05-14 | 精一门(常州)光学薄膜有限公司 | Self-cleaning anti-pollution energy-saving film for building and preparation method thereof |
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| CN1435276A (en) * | 2002-01-31 | 2003-08-13 | 富士施乐株式会社 | Photocatalyst titania film and method for mfg. same |
| CN1844000A (en) * | 2006-04-21 | 2006-10-11 | 暨南大学 | Permanent self-cleaning glass with visible light responsibility and preparation method thereof |
| CN1887760A (en) * | 2006-07-20 | 2007-01-03 | 杭州钱塘江特种玻璃技术有限公司 | Self-cleaning household appliance glass capable of shielding electromagnetic radiation and its prepn |
| WO2009148779A2 (en) * | 2008-05-29 | 2009-12-10 | The Board Of Trustees Of The University Of Illinois | Heavily doped metal oxides and methods for making the same |
| CN101621087A (en) * | 2008-06-30 | 2010-01-06 | 杨与胜 | Film layer, manufacturing method thereof and photovoltaic device with film layer |
-
2011
- 2011-11-07 CN CN 201110348492 patent/CN102515566B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1435276A (en) * | 2002-01-31 | 2003-08-13 | 富士施乐株式会社 | Photocatalyst titania film and method for mfg. same |
| CN1844000A (en) * | 2006-04-21 | 2006-10-11 | 暨南大学 | Permanent self-cleaning glass with visible light responsibility and preparation method thereof |
| CN1887760A (en) * | 2006-07-20 | 2007-01-03 | 杭州钱塘江特种玻璃技术有限公司 | Self-cleaning household appliance glass capable of shielding electromagnetic radiation and its prepn |
| WO2009148779A2 (en) * | 2008-05-29 | 2009-12-10 | The Board Of Trustees Of The University Of Illinois | Heavily doped metal oxides and methods for making the same |
| CN101621087A (en) * | 2008-06-30 | 2010-01-06 | 杨与胜 | Film layer, manufacturing method thereof and photovoltaic device with film layer |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105463247A (en) * | 2015-12-03 | 2016-04-06 | 江阴恩特莱特镀膜科技有限公司 | Alloy for binding target and manufacturing method and application of alloy |
| CN117210155A (en) * | 2023-09-15 | 2023-12-12 | 精一门(常州)光学薄膜有限公司 | Self-cleaning anti-pollution energy-saving film for building and preparation method thereof |
| CN117210155B (en) * | 2023-09-15 | 2024-05-14 | 精一门(常州)光学薄膜有限公司 | Self-cleaning anti-pollution energy-saving film for building and preparation method thereof |
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